DE102005048677B8 - Transmissionselektronenmikroskop und Bildbetrachtungsverfahren unter Verwendung desselben - Google Patents

Transmissionselektronenmikroskop und Bildbetrachtungsverfahren unter Verwendung desselben Download PDF

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Publication number
DE102005048677B8
DE102005048677B8 DE102005048677A DE102005048677A DE102005048677B8 DE 102005048677 B8 DE102005048677 B8 DE 102005048677B8 DE 102005048677 A DE102005048677 A DE 102005048677A DE 102005048677 A DE102005048677 A DE 102005048677A DE 102005048677 B8 DE102005048677 B8 DE 102005048677B8
Authority
DE
Germany
Prior art keywords
same
electron microscope
transmission electron
observation method
image observation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102005048677A
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English (en)
Other versions
DE102005048677B4 (de
DE102005048677A1 (de
Inventor
Yoshifumi Hitachinaka Taniguchi
Hisafumi Hitachinaka Otsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Publication of DE102005048677A1 publication Critical patent/DE102005048677A1/de
Publication of DE102005048677B4 publication Critical patent/DE102005048677B4/de
Application granted granted Critical
Publication of DE102005048677B8 publication Critical patent/DE102005048677B8/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/224—Luminescent screens or photographic plates for imaging ; Apparatus specially adapted therefor, e.g. cameras, TV-cameras, photographic equipment, exposure control; Optical subsystems specially adapted therefor, e.g. microscopes for observing image on luminescent screen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/2025—Sensing velocity of translation or rotation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20292—Means for position and/or orientation registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Microscoopes, Condenser (AREA)
DE102005048677A 2004-10-12 2005-10-11 Transmissionselektronenmikroskop und Bildbetrachtungsverfahren unter Verwendung desselben Expired - Fee Related DE102005048677B8 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004/297958 2004-10-12
JP2004297958A JP4262184B2 (ja) 2004-10-12 2004-10-12 透過型電子顕微鏡およびそれを用いた像観察方法

Publications (3)

Publication Number Publication Date
DE102005048677A1 DE102005048677A1 (de) 2006-04-20
DE102005048677B4 DE102005048677B4 (de) 2008-03-27
DE102005048677B8 true DE102005048677B8 (de) 2008-06-26

Family

ID=36120797

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102005048677A Expired - Fee Related DE102005048677B8 (de) 2004-10-12 2005-10-11 Transmissionselektronenmikroskop und Bildbetrachtungsverfahren unter Verwendung desselben

Country Status (3)

Country Link
US (1) US7235784B2 (de)
JP (1) JP4262184B2 (de)
DE (1) DE102005048677B8 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4262184B2 (ja) * 2004-10-12 2009-05-13 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡およびそれを用いた像観察方法
CN103843105A (zh) * 2010-02-10 2014-06-04 摩奇有限公司(d/b/aVoxa) 暗视野像差矫正电子显微镜
JP5656444B2 (ja) * 2010-04-23 2015-01-21 株式会社日立ハイテクノロジーズ 透過電子顕微鏡、および視野ずれ補正方法
TW201216318A (en) * 2010-06-07 2012-04-16 Halcyon Molecular Inc Incoherent transmission electron microscopy
EP2461347A1 (de) * 2010-12-06 2012-06-06 Fei Company Detektorsystem für Transmissionselektronenmikroskop
DE102011077635A1 (de) * 2011-06-16 2012-12-20 Carl Zeiss Nts Gmbh Hochspannungsversorgungseinheit für ein Teilchenstrahlgerät
KR101235629B1 (ko) 2011-11-11 2013-02-21 한국기초과학지원연구원 전자현미경의 이미지유동보상장치
US8598527B2 (en) 2011-11-22 2013-12-03 Mochii, Inc. Scanning transmission electron microscopy
TWI457598B (zh) * 2012-01-20 2014-10-21 Academia Sinica 光學模組及顯微鏡
US9274070B2 (en) 2012-03-08 2016-03-01 Appfive, Llc System and process for measuring strain in materials at high spatial resolution
EP2738786A1 (de) * 2012-11-29 2014-06-04 Fei Company Verfahren zur Durchführung von Tomographiebildgebung einer Probe in einem Ladungsträger-Mikroskop
US9244025B2 (en) * 2013-07-05 2016-01-26 Semiconductor Energy Laboratory Co., Ltd. Transmission electron diffraction measurement apparatus and method for measuring transmission electron diffraction pattern
JP6240533B2 (ja) 2014-03-07 2017-11-29 株式会社日立製作所 試料微動機構及びその使用法、並びに荷電粒子線装置
EP3021347A1 (de) * 2014-11-12 2016-05-18 Fei Company Ladungsträgerteilchenmikroskop mit barometrischer Druckkorrektur
KR101756171B1 (ko) * 2015-12-15 2017-07-12 (주)새론테크놀로지 주사 전자 현미경
JP2017123320A (ja) * 2016-01-08 2017-07-13 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 気圧補正を行う荷電粒子顕微鏡
EP3931853B1 (de) * 2019-08-16 2024-06-19 Protochips, Inc. Automatische anwendung der driftkorrektur auf eine unter dem elektronenmikroskop untersuchte probe
US11902665B2 (en) 2019-08-16 2024-02-13 Protochips, Inc. Automated application of drift correction to sample studied under electron microscope

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2529735B2 (de) * 1975-07-01 1977-10-06 Max-Planck-Gesellschaft zur Forderung der Wissenschaften e V, 3400 Gottingen Korpuskularstrahlmikroskop, insbesondere elektronenmikroskop, mit verstelleinrichtungen zur aenderung der lage des abzubildenden objekts und verfahren zum betrieb
JPH07272665A (ja) * 1994-03-31 1995-10-20 Hitachi Ltd 透過形電子顕微鏡
JP2585833B2 (ja) * 1990-04-06 1997-02-26 株式会社日立製作所 電子レンズ
JP2000294185A (ja) * 1999-04-05 2000-10-20 Canon Inc 分析装置および透過電子顕微鏡
JP2001118535A (ja) * 1999-10-19 2001-04-27 Hitachi Ltd 透過型電子顕微鏡
JP3314422B2 (ja) * 1991-10-24 2002-08-12 株式会社日立製作所 電子顕微鏡用試料ホルダ
JP2004031126A (ja) * 2002-06-26 2004-01-29 Jeol Ltd エネルギーフィルタを備えた電子顕微鏡の走査透過電子像観察装置
JP2004055300A (ja) * 2002-07-18 2004-02-19 Jeol Ltd 顕微作業装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3454052B2 (ja) 1996-12-05 2003-10-06 株式会社日立製作所 電子線分析装置
JP3867524B2 (ja) * 2001-07-05 2007-01-10 株式会社日立製作所 電子線を用いた観察装置及び観察方法
JP3970656B2 (ja) * 2002-03-27 2007-09-05 株式会社日立ハイテクノロジーズ 透過電子顕微鏡による試料観察方法
JP2003331773A (ja) * 2002-05-13 2003-11-21 Jeol Ltd 電子顕微鏡
JP4057892B2 (ja) * 2002-11-08 2008-03-05 株式会社キーエンス 電子顕微鏡、電子顕微鏡の操作方法、電子顕微鏡の操作プログラムおよびコンピュータで読み取り可能な記録媒体
US7381968B2 (en) * 2004-04-16 2008-06-03 Hitachi High-Technologies Corporation Charged particle beam apparatus and specimen holder
JP4262184B2 (ja) * 2004-10-12 2009-05-13 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡およびそれを用いた像観察方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2529735B2 (de) * 1975-07-01 1977-10-06 Max-Planck-Gesellschaft zur Forderung der Wissenschaften e V, 3400 Gottingen Korpuskularstrahlmikroskop, insbesondere elektronenmikroskop, mit verstelleinrichtungen zur aenderung der lage des abzubildenden objekts und verfahren zum betrieb
JP2585833B2 (ja) * 1990-04-06 1997-02-26 株式会社日立製作所 電子レンズ
JP3314422B2 (ja) * 1991-10-24 2002-08-12 株式会社日立製作所 電子顕微鏡用試料ホルダ
JPH07272665A (ja) * 1994-03-31 1995-10-20 Hitachi Ltd 透過形電子顕微鏡
JP2000294185A (ja) * 1999-04-05 2000-10-20 Canon Inc 分析装置および透過電子顕微鏡
JP2001118535A (ja) * 1999-10-19 2001-04-27 Hitachi Ltd 透過型電子顕微鏡
JP2004031126A (ja) * 2002-06-26 2004-01-29 Jeol Ltd エネルギーフィルタを備えた電子顕微鏡の走査透過電子像観察装置
JP2004055300A (ja) * 2002-07-18 2004-02-19 Jeol Ltd 顕微作業装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Ultramicroscopy 54 (1994) 250-260 *

Also Published As

Publication number Publication date
DE102005048677B4 (de) 2008-03-27
DE102005048677A1 (de) 2006-04-20
US7235784B2 (en) 2007-06-26
JP2006114251A (ja) 2006-04-27
JP4262184B2 (ja) 2009-05-13
US20060076492A1 (en) 2006-04-13

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R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee