DE10153204A1 - Ultraviolettlampensystem und Verfahren - Google Patents

Ultraviolettlampensystem und Verfahren

Info

Publication number
DE10153204A1
DE10153204A1 DE10153204A DE10153204A DE10153204A1 DE 10153204 A1 DE10153204 A1 DE 10153204A1 DE 10153204 A DE10153204 A DE 10153204A DE 10153204 A DE10153204 A DE 10153204A DE 10153204 A1 DE10153204 A1 DE 10153204A1
Authority
DE
Germany
Prior art keywords
radiation
substrate
microwave
processing space
reflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10153204A
Other languages
German (de)
English (en)
Inventor
Patrick Gerard Keogh
James W Schmitkons
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nordson Corp
Original Assignee
Nordson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nordson Corp filed Critical Nordson Corp
Publication of DE10153204A1 publication Critical patent/DE10153204A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/044Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Plasma Technology (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
DE10153204A 2000-10-31 2001-10-27 Ultraviolettlampensystem und Verfahren Withdrawn DE10153204A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/702,519 US6559460B1 (en) 2000-10-31 2000-10-31 Ultraviolet lamp system and methods

Publications (1)

Publication Number Publication Date
DE10153204A1 true DE10153204A1 (de) 2002-07-18

Family

ID=24821534

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10153204A Withdrawn DE10153204A1 (de) 2000-10-31 2001-10-27 Ultraviolettlampensystem und Verfahren

Country Status (4)

Country Link
US (2) US6559460B1 (https=)
JP (1) JP2002260595A (https=)
CN (1) CN1260013C (https=)
DE (1) DE10153204A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007031628A1 (de) * 2007-07-06 2009-01-15 Eastman Kodak Co. UV-Strahlungsquelle
DE102007031629B3 (de) * 2007-07-06 2009-03-19 Eastman Kodak Co. Mit Mikrowellen angeregte Strahlungsquelle
DE112007000821B4 (de) 2006-03-31 2022-08-18 Energetiq Technology Inc. Lasergetriebene Lichtquelle

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US20020079796A1 (en) * 2000-12-22 2002-06-27 Okamitsu Jeffrey K. Wavelength selective optical reflector with integral light trap
GB2375603B (en) * 2001-05-17 2005-08-10 Jenact Ltd Control system for microwave powered ultraviolet light sources
US20100242299A1 (en) * 2003-01-09 2010-09-30 Con-Trol-Cure, Inc. Uv curing system and process
US6933683B2 (en) * 2003-02-27 2005-08-23 Nordson Corporation Microwave powered lamphead having external shutter
CN1449872B (zh) * 2003-04-10 2010-05-12 上海复旦辰光科技有限公司 一种利用微波清洁材料表面的方法及其装置
JP2005193088A (ja) * 2003-12-26 2005-07-21 Japan Storage Battery Co Ltd エキシマランプ照射装置
US7109669B2 (en) * 2004-04-08 2006-09-19 Nordson Corporation Microwave lamp power supply that can withstand failure in high voltage circuit
FR2869719B1 (fr) * 2004-04-29 2007-03-30 Pascal Sortais Source lumineuse a resonance cyclotronique d'electrons
US20050250346A1 (en) * 2004-05-06 2005-11-10 Applied Materials, Inc. Process and apparatus for post deposition treatment of low k dielectric materials
US20050286263A1 (en) * 2004-06-23 2005-12-29 Champion David A Plasma lamp with light-transmissive waveguide
CN100435982C (zh) * 2004-07-09 2008-11-26 赫恩龙 物件涂装uv漆的固化方法及其设备
WO2006104731A2 (en) * 2005-03-31 2006-10-05 Wms Gaming Inc. Wagering games with unlockable bonus rounds
FR2884043A1 (fr) * 2005-04-01 2006-10-06 Pascal Sortais Source lumineuse alimentee par radiofrequence pour traitements de substances et procede d'utilisation d'une telle source
US20060251827A1 (en) * 2005-05-09 2006-11-09 Applied Materials, Inc. Tandem uv chamber for curing dielectric materials
US20060249175A1 (en) * 2005-05-09 2006-11-09 Applied Materials, Inc. High efficiency UV curing system
US7777198B2 (en) 2005-05-09 2010-08-17 Applied Materials, Inc. Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation
US7372058B2 (en) * 2005-09-27 2008-05-13 Asml Netherlands B.V. Ex-situ removal of deposition on an optical element
US7692171B2 (en) * 2006-03-17 2010-04-06 Andrzei Kaszuba Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors
US7909595B2 (en) * 2006-03-17 2011-03-22 Applied Materials, Inc. Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections
US7863834B2 (en) * 2007-06-29 2011-01-04 Nordson Corporation Ultraviolet lamp system and method for controlling emitted UV light
US7923706B2 (en) * 2008-10-03 2011-04-12 Nordson Corporation Ultraviolet curing apparatus for continuous material
US20100096569A1 (en) * 2008-10-21 2010-04-22 Applied Materials, Inc. Ultraviolet-transmitting microwave reflector comprising a micromesh screen
WO2010077132A1 (en) 2008-12-31 2010-07-08 Draka Comteq B.V. Uvled apparatus for curing glass-fiber coatings
EP2388239B1 (en) 2010-05-20 2017-02-15 Draka Comteq B.V. Curing apparatus employing angled UV-LEDs
US8871311B2 (en) 2010-06-03 2014-10-28 Draka Comteq, B.V. Curing method employing UV sources that emit differing ranges of UV radiation
WO2012009628A1 (en) * 2010-07-16 2012-01-19 Nordson Corporation Lamp systems and methods for generating ultraviolet light
EP2418183B1 (en) 2010-08-10 2018-07-25 Draka Comteq B.V. Method for curing coated glass fibres providing increased UVLED intensitiy
EP2445313B1 (en) * 2010-10-21 2015-05-13 Electrolux Home Products Corporation N.V. Microwave oven cavity and microwave oven
KR101928348B1 (ko) 2011-04-08 2018-12-12 어플라이드 머티어리얼스, 인코포레이티드 자외선 처리, 화학적 처리, 및 증착을 위한 장치 및 방법
US9750091B2 (en) * 2012-10-15 2017-08-29 Applied Materials, Inc. Apparatus and method for heat treatment of coatings on substrates
US20150123015A1 (en) * 2013-11-04 2015-05-07 Nordson Corporation Apparatus and methods for irradiating substrates with ultraviolet light
US9117619B2 (en) * 2013-11-07 2015-08-25 Electronics And Telecommunications Research Institute Device for generating heavy-ion beam and method thereof
US10002752B2 (en) 2014-07-07 2018-06-19 Nordson Corporation Systems and methods for determining the suitability of RF sources in ultraviolet systems
US10520251B2 (en) * 2015-01-15 2019-12-31 Heraeus Noblelight America Llc UV light curing systems, and methods of designing and operating the same
JP6379118B2 (ja) 2016-01-10 2018-08-22 Hoya Candeo Optronics株式会社 光照射装置
US11532328B2 (en) 2018-05-18 2022-12-20 Samsung Electronics Co., Ltd. Method for fabricating semiconductor chip by using multi-curing apparatus and multi-curing apparatus
EP4131655B1 (en) * 2020-03-31 2025-11-19 Agc Inc. Wireless transmission system
CN115090477A (zh) * 2022-08-05 2022-09-23 安徽艾雅伦新材料科技有限公司 一种pvc板材防静电镀膜设备及其镀膜方法

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US3872349A (en) * 1973-03-29 1975-03-18 Fusion Systems Corp Apparatus and method for generating radiation
CA1024246A (en) * 1973-08-22 1978-01-10 Donald M. Spero Apparatus and method for generating radiation
US4042850A (en) 1976-03-17 1977-08-16 Fusion Systems Corporation Microwave generated radiation apparatus
JPS55152567A (en) * 1979-05-18 1980-11-27 Oak Seisakusho:Kk Coating and drying apparatus for wire and bar
JPS60191038A (ja) * 1984-03-07 1985-09-28 Oak Seisakusho:Kk 紫外線照射装置
US4535753A (en) 1984-04-12 1985-08-20 Leo Zayauskas Radiant heat collector
US4710638A (en) * 1986-02-10 1987-12-01 Fusion Systems Corporation Apparatus for treating coatings
US4800090A (en) * 1987-03-11 1989-01-24 Musser's Potato Chips, Inc. Infrared and microwave energy treatment of food
JPH0621167Y2 (ja) * 1987-08-07 1994-06-01 高橋 柾弘 マイクロ波励起による紫外線発生装置
JPH0637521Y2 (ja) * 1988-10-05 1994-09-28 高橋 柾弘 マイクロ波励起による紫外線発生装置
JPH072184Y2 (ja) * 1988-07-27 1995-01-25 ウシオ電機株式会社 紫外線による処理装置
DE3919334A1 (de) 1989-06-13 1990-12-20 Tetsuhiro Kano Reflektor fuer eine leuchte
FR2674526B1 (fr) 1991-03-29 2002-05-03 France Telecom Dispositif a source de rayonnement ultraviolet induit par des micro-ondes, pour la polymerisation d'objets photopolymerisables.
EP1232673A1 (en) * 1999-10-27 2002-08-21 Fusion Uv Systems, Inc. Uv oven for curing magnet wire coatings

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112007000821B4 (de) 2006-03-31 2022-08-18 Energetiq Technology Inc. Lasergetriebene Lichtquelle
DE112007003819B4 (de) * 2006-03-31 2024-05-16 Energetiq Technology Inc. Lasergetriebene Lichtquelle
DE102007031628A1 (de) * 2007-07-06 2009-01-15 Eastman Kodak Co. UV-Strahlungsquelle
DE102007031629B3 (de) * 2007-07-06 2009-03-19 Eastman Kodak Co. Mit Mikrowellen angeregte Strahlungsquelle
DE102007031628B4 (de) * 2007-07-06 2012-06-21 Eastman Kodak Co. UV-Strahlungsquelle

Also Published As

Publication number Publication date
JP2002260595A (ja) 2002-09-13
US6559460B1 (en) 2003-05-06
CN1357415A (zh) 2002-07-10
US20020050575A1 (en) 2002-05-02
US6657206B2 (en) 2003-12-02
CN1260013C (zh) 2006-06-21

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee