DE10103524A1 - Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske - Google Patents

Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske

Info

Publication number
DE10103524A1
DE10103524A1 DE10103524A DE10103524A DE10103524A1 DE 10103524 A1 DE10103524 A1 DE 10103524A1 DE 10103524 A DE10103524 A DE 10103524A DE 10103524 A DE10103524 A DE 10103524A DE 10103524 A1 DE10103524 A1 DE 10103524A1
Authority
DE
Germany
Prior art keywords
layer
etching
silicon
mask layer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE10103524A
Other languages
German (de)
English (en)
Inventor
Matthias Goldbach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Priority to DE10103524A priority Critical patent/DE10103524A1/de
Priority to DE50209714T priority patent/DE50209714D1/de
Priority to PCT/DE2002/000130 priority patent/WO2002059951A1/de
Priority to EP02700152A priority patent/EP1360711B1/de
Priority to JP2002560183A priority patent/JP2004517505A/ja
Priority to KR10-2003-7009879A priority patent/KR100516839B1/ko
Priority to TW091100879A priority patent/TW548743B/zh
Publication of DE10103524A1 publication Critical patent/DE10103524A1/de
Priority to US10/454,518 priority patent/US6864188B2/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/32—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0332—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their composition, e.g. multilayer masks, materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0335—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by their behaviour during the process, e.g. soluble masks, redeposited masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H01L21/31116—Etching inorganic layers by chemical means by dry-etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31144—Etching the insulating layers by chemical or physical means using masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Drying Of Semiconductors (AREA)
DE10103524A 2001-01-26 2001-01-26 Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske Ceased DE10103524A1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE10103524A DE10103524A1 (de) 2001-01-26 2001-01-26 Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske
DE50209714T DE50209714D1 (de) 2001-01-26 2002-01-17 Halbleiteranordnung und verfahren zur ätzung einer schicht der halbleiteranordnung mittels einer siliziumhaltigen ätzmaske
PCT/DE2002/000130 WO2002059951A1 (de) 2001-01-26 2002-01-17 Halbleiteranordnung und verfahren zur ätzung einer schicht der halbleiteranordnung mittels einer siliziumhaltigen ätzmaske
EP02700152A EP1360711B1 (de) 2001-01-26 2002-01-17 Halbleiteranordnung und verfahren zur ätzung einer schicht der halbleiteranordnung mittels einer siliziumhaltigen ätzmaske
JP2002560183A JP2004517505A (ja) 2001-01-26 2002-01-17 半導体構造、および、シリコンを含有したエッチングマスクを用いた半導体構造の層のエッチング方法
KR10-2003-7009879A KR100516839B1 (ko) 2001-01-26 2002-01-17 반도체 장치 및 실리콘 함유 에칭 마스크를 사용해서반도체 장치의 층을 에칭하는 공정
TW091100879A TW548743B (en) 2001-01-26 2002-01-21 Semiconductor arrangement and process for etching a layer of the semiconductor arrangement by means of a silicon-containing etching mask
US10/454,518 US6864188B2 (en) 2001-01-26 2003-06-04 Semiconductor configuration and process for etching a layer of the semiconductor configuration using a silicon-containing etching mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10103524A DE10103524A1 (de) 2001-01-26 2001-01-26 Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske

Publications (1)

Publication Number Publication Date
DE10103524A1 true DE10103524A1 (de) 2002-08-22

Family

ID=7671843

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10103524A Ceased DE10103524A1 (de) 2001-01-26 2001-01-26 Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske
DE50209714T Expired - Fee Related DE50209714D1 (de) 2001-01-26 2002-01-17 Halbleiteranordnung und verfahren zur ätzung einer schicht der halbleiteranordnung mittels einer siliziumhaltigen ätzmaske

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE50209714T Expired - Fee Related DE50209714D1 (de) 2001-01-26 2002-01-17 Halbleiteranordnung und verfahren zur ätzung einer schicht der halbleiteranordnung mittels einer siliziumhaltigen ätzmaske

Country Status (7)

Country Link
US (1) US6864188B2 (enExample)
EP (1) EP1360711B1 (enExample)
JP (1) JP2004517505A (enExample)
KR (1) KR100516839B1 (enExample)
DE (2) DE10103524A1 (enExample)
TW (1) TW548743B (enExample)
WO (1) WO2002059951A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7553770B2 (en) 2007-06-06 2009-06-30 Micron Technology, Inc. Reverse masking profile improvements in high aspect ratio etch
KR101972159B1 (ko) 2012-08-24 2019-08-16 에스케이하이닉스 주식회사 실리콘함유하드마스크를 구비한 반도체장치 및 그 제조 방법
KR102051529B1 (ko) 2013-03-25 2020-01-08 에스케이하이닉스 주식회사 반도체 장치 및 그 제조방법, 그리고 반도체 장치를 포함하는 마이크로프로세서, 프로세서, 시스템, 데이터 저장 시스템 및 메모리 시스템
CN111584358A (zh) * 2020-04-09 2020-08-25 中国科学院微电子研究所 刻蚀沟槽的方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4514251A (en) * 1983-04-11 1985-04-30 U.S. Philips Corporation Method of manufacturing a semiconductor device, in which patterns are formed in a layer of silicon nitride by means of ion implantation
US5397431A (en) * 1992-07-24 1995-03-14 Sony Corporation Dry etching method
US5401359A (en) * 1990-07-27 1995-03-28 Sony Corporation Dry etching method
US6025273A (en) * 1998-04-06 2000-02-15 Taiwan Semiconductor Manufacturing Company, Ltd. Method for etching reliable small contact holes with improved profiles for semiconductor integrated circuits using a carbon doped hard mask

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GB1147014A (en) * 1967-01-27 1969-04-02 Westinghouse Electric Corp Improvements in diffusion masking
DE2557079C2 (de) * 1975-12-18 1984-05-24 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Herstellen einer Maskierungsschicht
JPS5351970A (en) * 1976-10-21 1978-05-11 Toshiba Corp Manufacture for semiconductor substrate
US4211601A (en) * 1978-07-31 1980-07-08 Bell Telephone Laboratories, Incorporated Device fabrication by plasma etching
US4283249A (en) * 1979-05-02 1981-08-11 International Business Machines Corporation Reactive ion etching
US5362682A (en) * 1980-04-10 1994-11-08 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom
JPS62224687A (ja) * 1986-03-25 1987-10-02 Anelva Corp エツチング方法
US5091047A (en) * 1986-09-11 1992-02-25 National Semiconductor Corp. Plasma etching using a bilayer mask
FR2610140B1 (fr) * 1987-01-26 1990-04-20 Commissariat Energie Atomique Circuit integre cmos et procede de fabrication de ses zones d'isolation electrique
US4782009A (en) * 1987-04-03 1988-11-01 General Electric Company Method of coating and imaging photopatternable silicone polyamic acid
FR2652448B1 (fr) * 1989-09-28 1994-04-29 Commissariat Energie Atomique Procede de fabrication d'un circuit integre mis haute tension.
KR960000375B1 (ko) * 1991-01-22 1996-01-05 가부시끼가이샤 도시바 반도체장치의 제조방법
US5217568A (en) * 1992-02-03 1993-06-08 Motorola, Inc. Silicon etching process using polymeric mask, for example, to form V-groove for an optical fiber coupling
US5350484A (en) * 1992-09-08 1994-09-27 Intel Corporation Method for the anisotropic etching of metal films in the fabrication of interconnects
US5525535A (en) * 1995-07-26 1996-06-11 United Microelectronics Corporation Method for making doped well and field regions on semiconductor substrates for field effect transistors using liquid phase deposition of oxides
JPH1160735A (ja) * 1996-12-09 1999-03-05 Toshiba Corp ポリシランおよびパターン形成方法
TW505984B (en) * 1997-12-12 2002-10-11 Applied Materials Inc Method of etching patterned layers useful as masking during subsequent etching or for damascene structures
US6387819B1 (en) * 1998-04-29 2002-05-14 Applied Materials, Inc. Method for etching low K dielectric layers
JP2001210726A (ja) * 2000-01-24 2001-08-03 Hitachi Ltd 半導体装置及びその製造方法
US6527968B1 (en) * 2000-03-27 2003-03-04 Applied Materials Inc. Two-stage self-cleaning silicon etch process
KR20030007904A (ko) * 2000-06-06 2003-01-23 이케이씨 테크놀로지, 인코포레이티드 전자 재료 제조 방법
US6583046B1 (en) * 2001-07-13 2003-06-24 Advanced Micro Devices, Inc. Post-treatment of low-k dielectric for prevention of photoresist poisoning

Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
US4514251A (en) * 1983-04-11 1985-04-30 U.S. Philips Corporation Method of manufacturing a semiconductor device, in which patterns are formed in a layer of silicon nitride by means of ion implantation
US5401359A (en) * 1990-07-27 1995-03-28 Sony Corporation Dry etching method
US5397431A (en) * 1992-07-24 1995-03-14 Sony Corporation Dry etching method
US6025273A (en) * 1998-04-06 2000-02-15 Taiwan Semiconductor Manufacturing Company, Ltd. Method for etching reliable small contact holes with improved profiles for semiconductor integrated circuits using a carbon doped hard mask

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
KOMEDA, H. et al.: Gas Chemistry Depundance of Si Surface Reactions in Flurocarston Pharmas during Conb of Hole Etchning, In: Ipn. J. Appl. Phys. Vol. 37, Part 1, No. 3 B, March 1998, pp. 1198-1201 *
LA MARCHE, P.H. et al.: Anorphons silicon as an inorganic resist, In: Proceedings of the SPIE, Vol 471, pp. 60-5, Conference Santa Clara, 15-16 March 1984, In: FILE: INSPEC, An: 1985:235178 *

Also Published As

Publication number Publication date
KR20030074745A (ko) 2003-09-19
KR100516839B1 (ko) 2005-09-26
US20030207588A1 (en) 2003-11-06
WO2002059951A1 (de) 2002-08-01
TW548743B (en) 2003-08-21
US6864188B2 (en) 2005-03-08
EP1360711B1 (de) 2007-03-14
EP1360711A1 (de) 2003-11-12
DE50209714D1 (de) 2007-04-26
JP2004517505A (ja) 2004-06-10

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