CN202649668U - Automatic mask cleaning system and exposure equipment - Google Patents
Automatic mask cleaning system and exposure equipment Download PDFInfo
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- CN202649668U CN202649668U CN 201220296951 CN201220296951U CN202649668U CN 202649668 U CN202649668 U CN 202649668U CN 201220296951 CN201220296951 CN 201220296951 CN 201220296951 U CN201220296951 U CN 201220296951U CN 202649668 U CN202649668 U CN 202649668U
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Abstract
The utility model relates to the technical field of display, in particular to an automatic mask cleaning system and exposure equipment. The automatic mask cleaning system comprises a mask storage device, a manipulator, a particle detection device, a mask cleaning device, a control device and an electrical supply device, wherein the mask storage device is used for storing masks; the manipulator is used for transporting the masks; the particle detection device is arranged above the mask storage device, and is used for scanning the upper surfaces and the lower surfaces of the masks and transmitting scanning information to the control device; the mask cleaning device is used for cleaning the masks which are detected by the particle detection device; the control device is used for controlling the turning-on /turning-off of the mask cleaning device according to the received scanning information; and the electrical supply device is electrically connected with the parts and is used for supplying power energy to the parts. The automatic mask cleaning system and exposure equipment provided by the utility model have the advantages that the masks can be automatically cleaned and the cleaning efficiency is improved; and the cleaning process is simple and rapid, the cleaning effect is good, the cleaning system is simple and convenient to operate, and the labor cost can be greatly saved.
Description
Technical field
The utility model relates to the display technique field, particularly relates to a kind of mask plate auto cleaning system and exposure sources.
Background technology
In recent years, along with the development of science and technology, LCD Technology is also thereupon constantly perfect.TFT-LCD(Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor (TFT)-liquid crystal display) with the critical positions of the advantages such as its display quality of image is good, energy consumption is low, environmental protection in occupation of field of display.
In the TFT-LCD production process, need to adopt mask plate (mask) that substrate is carried out the mask exposure operation.The cleanliness on mask plate surface directly affect the mask exposure effect, and in the prior art, it is longer usually to adopt the mode of artificial cleaning, this mode to clean the time that mask plate not only expends to the cleaning of mask plate, and the mask plate cleaning surfaces is also clean not, is difficult to reach the expection requirement.In addition, the mode that manually cleans mask plate is easy to the surface tear with mask plate, and operation affects to subsequent technique, and then affects the yield of final products.
The utility model content
The technical matters that (one) will solve
The technical problems to be solved in the utility model provides a kind of mask plate auto cleaning system and exposure sources, to overcome existing employing manual type mask plate is cleaned poor, the consuming time length of the cleaning effect that causes, and damage easily the mask plate surface and impact the defectives such as final products yield.
(2) technical scheme
In order to solve the problems of the technologies described above, the utility model provides a kind of mask plate auto cleaning system on the one hand, comprising:
Mask plate storage device is used for the storage mask plate;
Mechanical arm is used for carrying described mask plate;
Particle detection is positioned at the top of described mask plate storage device, is used for the upper and lower surface of described mask plate is scanned, and scanning information is sent to control device;
The mask plate cleaning device, be positioned at described mask plate storage device the top and with the cleaning chamber of the integrally formed sealing of described particle detection, described mask plate cleaning device is used for the mask plate of cleaning after described particle detection detects;
Control device is for the opened/closed of controlling described mask plate cleaning device according to the scanning information that receives;
Electric generator is used for providing power source.
Further, described mask plate storage device inside is relatively set with a plurality of support columns for storage mask plate box along the longitudinal direction, deposits mask plate in the described mask plate box.
Further, described particle detection comprises the bar shaped particulate scanner that is positioned at mask plate upper surface and lower surface, and described bar shaped particulate scanner is positioned at the Way in of described particle detection.
Further, described mask plate cleaning device comprises the air knife that is positioned at mask plate upper surface and lower surface, the built-in ion wind transmitting terminal of described air knife blows ion wind to the surface of described mask plate, and described air knife is arranged on the side away from the Way in of described particle detection.
Further, described air knife is horizontal by 30-60 ° of angle setting.
Further, described mask plate cleaning device also comprises at least two exhaust apparatus, and described exhaust apparatus is installed in respectively the space at mask plate upper and lower surface place, and described exhaust apparatus is away from air knife.
Further, described exhaust apparatus is bar shaped, and horizontal by 30-60 ° of angle setting.
Further, the bottom of described cleaning chamber and top are respectively equipped with electrostatic precipitator.
Further, described control device is integrated by programmable logic controller (PLC), and piecemeal is controlled each device in the mask plate auto cleaning system
On the other hand, the utility model also provides a kind of exposure sources, comprises above-mentioned mask plate auto cleaning system.
(3) beneficial effect
Technique scheme has following advantage: mask plate auto cleaning system and exposure sources that the utility model provides, can automatically clean mask plate, and improve cleaning efficiency; Cleaning course is simple, quick, and cleaning effect is good, and these cleaning systems are easy and simple to handle simultaneously, can save a large amount of human costs.
Description of drawings
Fig. 1 is the utility model embodiment mask plate auto cleaning system structural representation;
Fig. 2 is mask plate handling process synoptic diagram in the utility model embodiment mask plate auto cleaning system;
Fig. 3 is particle detection structure and detection of particulates synoptic diagram in the utility model embodiment mask plate auto cleaning system;
Fig. 4 is cleaning device air knife structure synoptic diagram in the utility model embodiment mask plate auto cleaning system;
Fig. 5 is airflow direction synoptic diagram in the cleaning course in the utility model embodiment mask plate auto cleaning system;
Fig. 6 is cleaning chamber electrostatic precipitator structural representation in the utility model embodiment mask plate auto cleaning system;
Fig. 7 is electrostatic precipitator installation site and adsorbent particles synoptic diagram in the utility model embodiment mask plate auto cleaning system.
Wherein: 1: mask plate storage device; 11: support column; 21: the first mechanical arms; 22: the second mechanical arms; 23: the three mechanical arms; 3 particle detection; 31: bar shaped particulate scanner; 4: the mask plate cleaning device; 41: air knife; 42: exhaust apparatus; 43: electrostatic precipitator; 5: mask plate; A: mask plate upper surface; B: mask plate lower surface; 6: the mask plate transport vehicle.
Embodiment
Below in conjunction with drawings and Examples, embodiment of the present utility model is described in further detail.Following examples are used for explanation the utility model, but are not used for limiting scope of the present utility model.
In description of the present utility model, it will be appreciated that, term " " center "; " vertically "; " laterally "; " on "; D score; " front ", " afterwards ", " left side ", " right side ", " vertically ", " level ", " top ", " end " " interior ", orientation or the position relationship of indications such as " outward " are based on orientation shown in the drawings or position relationship, only be for convenience of description the utility model and simplified characterization, rather than device or the element of indication or hint indication must have specific orientation, with specific orientation structure and operation, therefore can not be interpreted as restriction of the present utility model.In addition, term " first ", " second " only are used for describing purpose, and can not be interpreted as indication or hint relative importance.
In description of the present utility model, need to prove that unless clear and definite regulation and restriction are arranged in addition, term " installation ", " linking to each other ", " connection " should be done broad understanding, for example, can be to be fixedly connected with, also can be to removably connect, or connect integratedly; Can be mechanical connection, also can be to be electrically connected; Can be directly to link to each other, also can indirectly link to each other by intermediary, can be the connection of two element internals.For the ordinary skill in the art, can concrete condition understand the concrete meaning of above-mentioned term in the utility model.
As shown in Figure 1, the utility model embodiment provides a kind of mask plate auto cleaning system, comprising: mask plate storage device 1 is used for the storage mask plate;
Mechanical arm is used for carrying described mask plate;
Mask plate cleaning device 4, be positioned at mask plate storage device 1 the top and with the cleaning chamber of particle detection 3 integrally formed sealings, mask plate cleaning device 4 is used for the mask plate of cleaning after particle detection 3 detects;
Control device is for the opened/closed of controlling described mask plate cleaning device 4 according to the scanning information that receives;
Electric generator is used for providing power source.
The mask plate auto cleaning system that the utility model provides can clean mask plate automatically, improves cleaning efficiency; Cleaning course is simple, quick, and cleaning effect is good, and these cleaning systems are easy and simple to handle simultaneously, can save a large amount of human costs.
Embodiment 2
Shown in Fig. 1-7, the utility model embodiment provides a kind of mask plate auto cleaning system, specifically comprise: mask plate storage device 1, mechanical arm, particle detection (Pellicle Particle Detector, PPD) 3 and mask plate cleaning device 4, control device and electric generator.
Concrete, mask plate storage device 1 is used for storage mask plate 5; Mechanical arm is used for carrying mask plate 5.This mask plate storage device 1 inside is relatively set with a plurality of support columns 11 for placing the mask plate box along the longitudinal direction, and the mask plate box is placed on the support column 11 that is in the same level face.Deposit mask plate 5 in this mask plate box.The quantity of concrete support column 11 can be decided according to the actual requirements.Wherein the support column 11 in the same level face can only be deposited a mask plate box, can only deposit a mask plate 5 in the mask plate box.Every layer of sidewall that is positioned at the support column 11 of mask plate memory storage 1 opening direction is provided with the pneumatic member (not shown), this pneumatic member can back down the top cover on the mask plate box, wherein, the surface area of the surface area of this top cover at the bottom of greater than the mask plate box box, mechanical arm picks and places mask plate 5 from the mask plate box.
This mechanical arm is used for carrying mask plate 5.Need to prove that the mask plate at carrying diverse location place needs different mechanical arms to cooperate.According to the function of mechanical arm, mechanical arm can be divided into the first mechanical arm 21(Case arm), be used for picking and placeing the mask plate box from the support column 11 of mask plate storage device 1, this first mechanical arm can move at CX and CZ direction; The second mechanical arm 22(Exchange hand), can pick and place mask plate 5 the mask plate box from the first mechanical arm 21; The 3rd mechanical arm 23(PPD arm), be used for that mask plate 5 is sent into particle detection 3 and mask plate cleaning device 4 carries out detection of particulates and cleaning, also can and clean the mask plate 5 of finishing and send from particle detection 3 and mask plate cleaning device 4 detection of particulates, the 3rd mechanical arm can move in the PX direction.When mask plate 5 was sent from cleaning chamber by the 3rd mechanical arm 23, the second mechanical arm 22 can be fetched mask plate 5 from the 3rd mechanical arm 23, and this second mechanical arm 22 can move at EY and EZ direction.
Mask plate cleaning device 4 is used for the mask plate 5 of cleaning after particle detection 3 detects, its be positioned at mask plate storage device 1 the top and with the cleaning chamber of particle detection 3 integrally formed sealings.Concrete, this mask plate cleaning device 4 comprises the air knife 41 that is positioned at mask plate upper surface A and lower surface B, these air knife 41 built-in ion wind transmitting terminals, surface to mask plate 5 blows ion wind, air knife 41 is arranged on the left side of the particulate scanner that is positioned at homonymy, namely away from Way in one side of particle detection 3.
This mask plate cleaning device 4 can share the 3rd mechanical arm 23 with particle detection 3.Along Y-direction air knife 41 is installed, and this air knife 41 is 30-60 ° of angle with surface level (being mask plate 5 surfaces), more excellent is 45 ° of angles, can farthest guarantee like this effect that cleans.If air knife 41 is too large with the angle on mask plate 5 surfaces, cause easily gas disturbance in chamber, be not easy like this exhaust, affect cleaning effect; If air knife 41 is too little with the angle on mask plate 5 surfaces, under the condition of same gas pressure, gas blows to the dynamics on mask plate 5 surfaces can be relatively smaller, also can have influence on cleaning effect.
In addition, this mask plate cleaning device 4 also comprises at least two exhaust apparatus 42 of installing along Y-direction, and this exhaust apparatus 42 is installed in respectively the space at mask plate upper surface A and lower surface B place, and exhaust apparatus 42 is away from air knife 41.
Further, exhaust apparatus 42 is bar shaped, and this exhaust apparatus 42 is corresponding and horizontal by 30-60 ° of angle, more excellent is 45 ° of angles with air knife 41.In order to ensure exhaust effect, the angle that the bar shaped exhaust apparatus 42 corresponding with air knife 41 arranges also needs with the angle of air knife 41 corresponding, and namely both are consistent with mask plate 5 surfaces angle in opposite directions.
Control device is used for the opened/closed according to the scanning information control mask plate cleaning device 4 that receives.When the scanning information that receives did not need mask plate 5 cleaned, this control device cut out this mask plate cleaning device 4.When the scanning information that receives need to clean mask plate 5, control device was opened this mask plate cleaning device 4, and mask plate 5 is cleaned.
In addition, this control device can pass through PLC(Programmable Logic Controller, programmable logic controller (PLC)) integrated, piecemeal is controlled each device of mask plate auto cleaning system.
The control terminal of above-mentioned control device can comprise host computer, display (common display screen or touch-screen), mouse and keyboard etc.
Electric generator with above-mentioned parts electrical connection, is used for providing power source to above-mentioned parts.Concrete, this electric generator can provide electric power to each device, simultaneously, can provide pure air to mask plate storage device 1 and mask plate cleaning device 4, provides vacuum to the 3rd mechanical arm 23, is used for adsorbing the mask plate 5 of putting thereon; Can realize the functions such as purified treatment of adsorbent particles dust in the exhaust, electrostatic precipitator 43 in the chamber.
The below specifically describes the operating process of mask plate automatic cleaning apparatus:
(1) mask plate 5 is packed in the mask plate box, if (mask plate 5 has been arranged in the mask plate box, can omit this process), be transported in the mask plate auto cleaning system by mask plate transport vehicle 6, by the first mechanical arm 21 the mask plate box is written in the mask plate storage device 1 subsequently.
(2) pneumatic member that is provided with by support column 11 sidewalls that are positioned at mask plate memory storage 1 opening direction is opened the top cover of mask plate box, the mask plate box that the first mechanical arm 21 will be thrown off behind the top cover is in the horizontal direction taken away from support column 11, when the first mechanical arm 21 is held the mask plate box and is risen to the top of CZ axle, the second mechanical arm 22 takes out mask plate 5 from the mask plate box, the first mechanical arm 21 is sent empty mask plate box in previous support column 11 positions back to, and by pneumatic member that top cover is closed.
(3) second mechanical arms 22 crawl mask plates 5 pass to the 3rd mechanical arm 23 with being about to mask plate 5 directly over rising to the 3rd mechanical arm 23 along the EZ axle.At this moment, the 3rd mechanical arm 23 moves along the PX direction, and mask plate 5 passes through the detection of particulates of process realization mask plate 5 upper and lower surfaces of the bar shaped particulate scanner 31 that is arranged in the PPD3 end.
(4) when complete to the detection of particulates of mask plate 5 upper and lower surfaces, PPD3 is passed to control device with the information such as granule amount, distribution and size of mask plate 5 upper and lower surfaces, judges through control device whether mask plate 5 needs to clean.If mask plate 5 surface cleanliness can satisfy production requirement, then the detection of particulates process is finished, by send mask plate 5 back to the mask plate box along above-mentioned (1)-(3) reverse path and be stored in mask plate storage device 1(prepare for the production of); If mask plate 5 surface cleanliness can not satisfy production requirement, then mask plate 5 is cleaned: the 3rd mechanical arm 23 is asking mask plate 5 to move along the PX direction, 43 pairs of mask plate 5 surfaces of air knife 41 and electrostatic precipitator are cleaned, blowing out the gas (comprised particulate) of charged ion wind after mask plate 5 surfaces are reflected by air knife 41 is in time discharged outside the cleaning chamber with air knife 41 corresponding bar shaped exhaust apparatus 42, to avoid polluting mask plate 5 surfaces and the bar shaped particulate scanner 31 that cleaned, simultaneously, mask plate 5 has cleaned in the process that the part finished moves along the PX direction along with the 3rd mechanical arm 23 and again its surface has been scanned through the bar shaped particulate scanner 31 that is positioned at the PPD3 end, confirm that cleaning effect is (if the mask plate 5 upper and lower surface cleanliness factors after cleaning have satisfied production requirement, then clean up task is finished, by along above-mentioned (1)-(3) reverse path mask plate 5 being sent back to the mask plate box and is stored in mask plate storage device 1; If the mask plate 5 upper and lower surface cleanliness factors after the cleaning still do not satisfy production requirement, then repetitive mask plate cleaning and microparticles are confirmed action, until cleaning effect meets production requirement).
It is pointed out that and to use separately 41 pairs of mask plates 5 of air knife to clean, also air knife 41 can be used to realize better cleaning effect with electrostatic precipitator 43 both cooperations.Namely in air knife 41 cleaning mask plate surfaces, open electrostatic precipitator 43, guarantee under the out-of-date electric field force effect of particulate at electrostatic precipitator 43 that escapes into cavity space from mask plate 5 surperficial accidents, to be adsorbed onto in time electrostatic precipitator 43 surfaces at the wind face, thereby reach more thoroughly cleaning effect, also can further improve the cleaning efficiency of mask plate.
This auto cleaning system carries out the parameter setting by its control device program, more than each action by programmed control and automatically finishing.Its main control parameters comprises: pure air (CDA) pressure, the vacuum tightness of the 3rd mechanical arm 23 absorption mask plates 5, the movement velocity of each mechanical arm on its direction of motion, air knife 41 gas flow rates, the electric field intensity of electrostatic precipitator 43 etc.
Present embodiment provides a kind of exposure sources, comprise the mask plate auto cleaning system in above-described embodiment, the mask plate auto cleaning system embeds and is combined in the exposure sources, make it become the organic moiety of exposure sources, each component devices function of mask plate auto cleaning system and working method remain unchanged, and each component devices is controlled by the exposure sources central control system.Before exposing, system will carry out particulate dirt detection and cleaning to the mask plate 5 that is about in the mask plate storage device 1 use automatically, namely directly the mask plate conveyance be exposed to exposure sources by the second mechanical arm 22 in case meet production requirement.
Can draw by above-described embodiment, present embodiment mask plate auto cleaning system and exposure sources have the following advantages:
(1) automaticity is higher, cleaning efficiency is high, more simple and easy to do;
(2) avoid cleaning the mask plate of finishing and contact with extraneous, guarantee the cleanliness factor on mask plate surface;
(3) because after mask plate cleaning satisfies production requirement, system will directly expose the mask plate conveyance by the second mechanical arm to exposure sources, so that in the whole process of mask plate cleaning, the exposure sources stand-by time is shorter, less on the production capacity impact.
The above only is preferred implementation of the present utility model; should be understood that; for those skilled in the art; under the prerequisite that does not break away from the utility model know-why; can also make some improvement and replacement, these improvement and replacement also should be considered as protection domain of the present utility model.
Claims (10)
1. a mask plate auto cleaning system is characterized in that, comprising:
Mask plate storage device is used for the storage mask plate;
Mechanical arm is used for carrying described mask plate;
Particle detection is positioned at the top of described mask plate storage device, is used for the upper and lower surface of described mask plate is scanned, and scanning information is sent to control device;
The mask plate cleaning device, be positioned at described mask plate storage device the top and with the cleaning chamber of the integrally formed sealing of described particle detection, described mask plate cleaning device is used for the mask plate of cleaning after described particle detection detects;
Control device is for the opened/closed of controlling described mask plate cleaning device according to the scanning information that receives;
Electric generator is used for providing power source.
2. mask plate auto cleaning system as claimed in claim 1 is characterized in that, described mask plate storage device inside is relatively set with a plurality of support columns for placing the mask plate box along the longitudinal direction, deposits mask plate in the described mask plate box.
3. mask plate auto cleaning system as claimed in claim 1, it is characterized in that, described particle detection comprises the bar shaped particulate scanner that is positioned at mask plate upper surface and lower surface, and described bar shaped particulate scanner is positioned at the Way in of described particle detection.
4. mask plate auto cleaning system as claimed in claim 1, it is characterized in that, described mask plate cleaning device comprises the air knife that is positioned at mask plate upper surface and lower surface, the built-in ion wind transmitting terminal of described air knife, surface to described mask plate blows ion wind, and described air knife is arranged on the side away from the Way in of described particle detection.
5. mask plate auto cleaning system as claimed in claim 4 is characterized in that, described air knife is horizontal by 30-60 ° of angle setting.
6. mask plate auto cleaning system as claimed in claim 4 is characterized in that, described mask plate cleaning device also comprises at least two exhaust apparatus, and described exhaust apparatus is installed in respectively the space at mask plate upper and lower surface place, and described exhaust apparatus is away from air knife.
7. mask plate auto cleaning system as claimed in claim 6 is characterized in that, described exhaust apparatus is bar shaped, and horizontal by 30-60 ° of angle setting.
8. mask plate auto cleaning system as claimed in claim 4 is characterized in that, bottom and the top of described cleaning chamber are respectively equipped with electrostatic precipitator.
9. mask plate auto cleaning system as claimed in claim 1 is characterized in that, described control device is integrated by programmable logic controller (PLC), and piecemeal is controlled each device in the described mask plate auto cleaning system.
10. an exposure sources is characterized in that, comprises each described mask plate auto cleaning system of claim 1-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220296951 CN202649668U (en) | 2012-06-19 | 2012-06-19 | Automatic mask cleaning system and exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220296951 CN202649668U (en) | 2012-06-19 | 2012-06-19 | Automatic mask cleaning system and exposure equipment |
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| Publication Number | Publication Date |
|---|---|
| CN202649668U true CN202649668U (en) | 2013-01-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220296951 Expired - Lifetime CN202649668U (en) | 2012-06-19 | 2012-06-19 | Automatic mask cleaning system and exposure equipment |
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| CN (1) | CN202649668U (en) |
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103691703A (en) * | 2013-12-12 | 2014-04-02 | 京东方科技集团股份有限公司 | Cleaning device and automatic cleaning system |
| CN103926786A (en) * | 2014-04-08 | 2014-07-16 | 上海华力微电子有限公司 | Electrostatic precipitator for photomask |
| CN104049469A (en) * | 2013-03-15 | 2014-09-17 | 台湾积体电路制造股份有限公司 | Lithography System with an Embedded Cleaning Module |
| CN104139996A (en) * | 2013-05-08 | 2014-11-12 | 新东超精密有限公司 | A metal mask sheet supplying system |
| CN104423180A (en) * | 2013-08-30 | 2015-03-18 | 倍科有限公司 | Exposure apparatus |
| CN104438226A (en) * | 2014-12-02 | 2015-03-25 | 京东方科技集团股份有限公司 | Mask plate cleaning system |
| CN105278259A (en) * | 2015-07-27 | 2016-01-27 | 江苏影速光电技术有限公司 | Stand-alone double-table and multi-station automatic printed circuit board (PCB) exposure equipment and exposure method |
| CN106773528A (en) * | 2016-12-21 | 2017-05-31 | 武汉华星光电技术有限公司 | Mask plate automatic cleaning system and method |
| CN107243878A (en) * | 2017-07-28 | 2017-10-13 | 京东方科技集团股份有限公司 | A kind of mask plate storage device |
| CN107966459A (en) * | 2017-12-27 | 2018-04-27 | 湖南航天天麓新材料检测有限责任公司 | A kind of trickle scuffing on-line measuring device of wide cut surface glass |
| CN109298603A (en) * | 2018-11-20 | 2019-02-01 | 深圳市华星光电半导体显示技术有限公司 | A kind of integration of exposure light shield unpacks and cleaning systems |
| CN109772811A (en) * | 2017-11-10 | 2019-05-21 | 中芯国际集成电路制造(上海)有限公司 | Clearing apparatus and purging system |
| CN111051986A (en) * | 2017-08-28 | 2020-04-21 | Asml控股股份有限公司 | Apparatus and method for cleaning a support in a lithographic apparatus |
| CN111036616A (en) * | 2019-12-09 | 2020-04-21 | 北京华卓精科科技股份有限公司 | Device and method for removing particles on surface of wafer |
| CN111748768A (en) * | 2020-06-28 | 2020-10-09 | 武汉华星光电半导体显示技术有限公司 | Mask plate cleaning equipment and mask plate cleaning method |
| CN113042457A (en) * | 2021-03-12 | 2021-06-29 | Tcl华星光电技术有限公司 | Light shield cleaning device |
| CN113391521A (en) * | 2020-03-13 | 2021-09-14 | 长鑫存储技术有限公司 | Exposure machine and exposure method |
| CN113917805A (en) * | 2021-11-24 | 2022-01-11 | 华天科技（昆山）电子有限公司 | Full-automatic intelligent photomask management system and related method |
| CN114433570A (en) * | 2022-04-06 | 2022-05-06 | 深圳市龙图光电有限公司 | Method and equipment for cleaning foreign matters under mask for semiconductor chip |
| US11378894B2 (en) | 2013-03-15 | 2022-07-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography system with an embedded cleaning module |
| CN116593497A (en) * | 2023-07-17 | 2023-08-15 | 合肥派拓智能科技有限公司 | High-precision OLED metal mask plate visual defect detection equipment |
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| CN104049469A (en) * | 2013-03-15 | 2014-09-17 | 台湾积体电路制造股份有限公司 | Lithography System with an Embedded Cleaning Module |
| US11378894B2 (en) | 2013-03-15 | 2022-07-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography system with an embedded cleaning module |
| CN109375471A (en) * | 2013-03-15 | 2019-02-22 | 台湾积体电路制造股份有限公司 | Lithography system with embedded cleaning module |
| CN104139996A (en) * | 2013-05-08 | 2014-11-12 | 新东超精密有限公司 | A metal mask sheet supplying system |
| CN104423180A (en) * | 2013-08-30 | 2015-03-18 | 倍科有限公司 | Exposure apparatus |
| CN103691703A (en) * | 2013-12-12 | 2014-04-02 | 京东方科技集团股份有限公司 | Cleaning device and automatic cleaning system |
| CN103926786A (en) * | 2014-04-08 | 2014-07-16 | 上海华力微电子有限公司 | Electrostatic precipitator for photomask |
| CN104438226A (en) * | 2014-12-02 | 2015-03-25 | 京东方科技集团股份有限公司 | Mask plate cleaning system |
| CN105278259A (en) * | 2015-07-27 | 2016-01-27 | 江苏影速光电技术有限公司 | Stand-alone double-table and multi-station automatic printed circuit board (PCB) exposure equipment and exposure method |
| CN106773528A (en) * | 2016-12-21 | 2017-05-31 | 武汉华星光电技术有限公司 | Mask plate automatic cleaning system and method |
| CN107243878B (en) * | 2017-07-28 | 2019-08-02 | 京东方科技集团股份有限公司 | A kind of mask plate storage device |
| CN107243878A (en) * | 2017-07-28 | 2017-10-13 | 京东方科技集团股份有限公司 | A kind of mask plate storage device |
| CN111051986A (en) * | 2017-08-28 | 2020-04-21 | Asml控股股份有限公司 | Apparatus and method for cleaning a support in a lithographic apparatus |
| CN111051986B (en) * | 2017-08-28 | 2024-04-16 | Asml控股股份有限公司 | Apparatus and method for cleaning support in lithographic apparatus |
| CN109772811A (en) * | 2017-11-10 | 2019-05-21 | 中芯国际集成电路制造(上海)有限公司 | Clearing apparatus and purging system |
| CN107966459A (en) * | 2017-12-27 | 2018-04-27 | 湖南航天天麓新材料检测有限责任公司 | A kind of trickle scuffing on-line measuring device of wide cut surface glass |
| CN109298603A (en) * | 2018-11-20 | 2019-02-01 | 深圳市华星光电半导体显示技术有限公司 | A kind of integration of exposure light shield unpacks and cleaning systems |
| CN111036616A (en) * | 2019-12-09 | 2020-04-21 | 北京华卓精科科技股份有限公司 | Device and method for removing particles on surface of wafer |
| WO2021180140A1 (en) * | 2020-03-13 | 2021-09-16 | 长鑫存储技术有限公司 | Exposure machine and exposure method |
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