CN113042457A - Light shield cleaning device - Google Patents
Light shield cleaning device Download PDFInfo
- Publication number
- CN113042457A CN113042457A CN202110269999.XA CN202110269999A CN113042457A CN 113042457 A CN113042457 A CN 113042457A CN 202110269999 A CN202110269999 A CN 202110269999A CN 113042457 A CN113042457 A CN 113042457A
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- China
- Prior art keywords
- ion wind
- ion
- support plate
- compressor
- air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 45
- 238000001514 detection method Methods 0.000 claims description 29
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 4
- 238000005192 partition Methods 0.000 claims description 3
- 239000011148 porous material Substances 0.000 claims description 2
- 239000011241 protective layer Substances 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 7
- 238000007664 blowing Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 238000011086 high cleaning Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
- G01V9/00—Prospecting or detecting by methods not provided for in groups G01V1/00 - G01V8/00
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geophysics (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The application discloses light shield belt cleaning device includes: a housing and a cleaning unit. The shell comprises a first supporting plate and a second supporting plate which are arranged oppositely, and the shell is provided with a cavity. The cleaning unit comprises a compressor and at least two ion air bars positioned between a first supporting plate and a second supporting plate; the ion air bar and the compressor are oppositely arranged at two ends of the chamber, so that the air direction in the photomask cleaning device is from the ion air bar to the compressor; the ion wind stick comprises a first ion wind stick and a second ion wind stick, wherein the first ion wind stick is close to the first supporting plate, and the second ion wind stick is close to the second supporting plate. The photomask cleaning device can blow and wash the photomask with high efficiency and is not easy to damage the surface film protective layer of the photomask.
Description
Technical Field
The application relates to the technical field of light shades, in particular to a light shade cleaning device.
Background
In the production process of the TFT substrate, different photomasks are required to be replaced according to different processes, and due to the influence of static electricity and the surrounding environment, the surfaces of the photomasks can be adhered with some ash layers after long-time use, and if the ash layers are not timely removed, the products are poor. If the surface of the photomask has an ash layer, the surface of the photomask must be cleaned, and the traditional cleaning method is that an operator holds an electrostatic removal ion air gun to blow and wash the surface of the photomask, and the particle detection is carried out again after the blow and wash until the ash layer is blown and cleaned. However, the cleaning method is not easy to control wind power, and has the risk of blowing the protective layer film on the lower surface of the photomask, thereby influencing the production progress; and the operation is under open environment, and the ash layer adheres to the light cover in the environment still exists in the operation process, causes the particle to detect and has the error, sometimes need many times to wash the operation repeatedly, and the cleaning efficiency is low.
Therefore, it is desirable to provide a mask cleaning device that is dust-free and has high cleaning efficiency, and can avoid damaging the surface film protection layer.
Disclosure of Invention
The embodiment of the application provides a light shield cleaning device, utilize light shield cleaning device can carry out efficient blasting to the light shield, and difficult damage light shield surface film protective layer.
The embodiment of the application provides a light shield cleaning device, light shield cleaning device includes:
the device comprises a shell, a first support plate and a second support plate, wherein the shell comprises a first support plate and a second support plate which are arranged oppositely and is provided with a cavity; and
the cleaning unit comprises a compressor and at least two ion air bars; each ion air bar is provided with a pipeline and a plurality of air outlet pore channels protruding out of the surface of the pipeline; the ion wind rod is positioned between the first supporting plate and the second supporting plate; the at least two ion air bars and the compressor are oppositely arranged at two ends of the chamber, so that the air direction in the photomask cleaning device is from the ion air bars to the compressor; wherein
At least two ion wind sticks include first ion wind stick and second ion wind stick, wherein first ion wind stick is close to first backup pad setting, second ion wind stick is close to the setting of second backup pad.
In some embodiments, the ion wind bar is configured to generate a nitrogen gas flow with positive and negative charges and blow out from the wind outlet channel.
In some embodiments, the first ion wind bar and the second ion wind bar can rotate around a rotating shaft to control the orientation of the wind outlet channel.
In some embodiments, the mask cleaning device is further provided with a first pressure sensor and a second pressure sensor for detecting the wind force of the wind outlet duct of the first ion wind bar and the second ion wind bar.
In some embodiments, the first pressure sensor is disposed on the first support plate; the second pressure sensor is disposed on the second support plate. And each air outlet duct of the ion air bar corresponds to the first pressure sensor or the second pressure sensor one by one. The first pressure sensor or the second pressure sensor is configured to detect a wind power magnitude of the corresponding air outlet duct.
In some embodiments, the first support plate is disposed horizontally, the second support plate is disposed at an included angle with the horizontal plane, and one side of the second support plate close to the compressor is lower than the other side of the second support plate close to the ion wind rod.
In some embodiments, the compressor is a gas extraction device.
In some embodiments, a grid-like baffle is disposed on each side of the compressor in the direction of airflow through the compressor.
In some embodiments, the apparatus further comprises a robot configured to place a reticle to be cleaned in the chamber such that the reticle to be cleaned is positioned between the first ion wind bar and the second ion wind bar.
In some embodiments, a first detection sensor is disposed on the first support plate; a second detection sensor is arranged on the second support plate; the first detection sensor and the second detection sensor are arranged oppositely, wherein the first detection sensor is used for sending signals, and the second detection sensor is used for receiving signals and detecting the position information of a photomask to be cleaned in the chamber.
In some embodiments, the first detection sensor and the second detection sensor are located between the compressor and the ion wind bar and are arranged close to the compressor to determine the placing position of the photomask to be cleaned.
The beneficial effect of this application lies in:
the light shield cleaning device provided by the embodiment of the application has high cleaning efficiency, the whole cleaning process is operated in a dust-free environment, and the wind power can be adjusted according to the requirement, so that the risk of blowing the film protective layer on the lower surface of the light shield is avoided.
Drawings
The technical solution and other advantages of the present application will become apparent from the detailed description of the embodiments of the present application with reference to the accompanying drawings.
Fig. 1 is a schematic cross-sectional view of a mask cleaning apparatus according to an embodiment of the present disclosure.
Fig. 2 is a schematic structural diagram of an ion wind rod according to the present application.
FIG. 3 is a cross-sectional view of a mask cleaning device according to the present application.
The reference numerals in the figures are respectively: a housing 10; a first support plate 11; a second support plate 12; a first pressure sensor 111; a first detection sensor 112; a second pressure sensor 121; a second detection sensor 122; a cleaning unit 20; a compressor 21; an ion wind bar 22; a first ion wind bar 22 a; a second ion wind rod 22 b; a pipe 221; an air outlet duct 222; a grid-like separator 30; a mask 50; a mask cleaning apparatus 100.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. It is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
The present application is further described with reference to the following drawings and specific examples:
referring to fig. 1, a reticle cleaning apparatus 100 includes a housing 10 and a cleaning unit 20. The housing 10 has a chamber 40 therein. The cleaning unit 20 is disposed in a chamber 40 within the housing 10.
In this embodiment, referring to fig. 1 or fig. 3, the housing 10 includes a first support plate 11 and a second support plate 12 disposed opposite to each other in the cavity 40. Specifically, the first support plate 11 is preferably horizontally disposed. The second support plate 12 is preferably arranged obliquely, in which case the second support plate 12 is arranged at an angle to the horizontal. Further, the included angle is less than 90 °. The specific degree of the included angle can be determined according to the size of the reticle cleaning device 100. Preferably, the included angle may be 30 °.
In this embodiment, the first support plate 11 is provided with a first pressure sensor 111. A second pressure sensor 121 is provided on the second support plate 12. The first pressure sensor 111 and the second pressure sensor 121 can detect the magnitude of wind force.
In this embodiment, the cleaning unit 20 includes a compressor 21 and at least two ion wind bars 22. The compressor 21 is an air extractor for sucking dust from the chamber 40. The at least two ion wind bars 22 and the compressor 21 are oppositely disposed at two ends of the chamber 40 in the housing 10, so that the wind direction in the mask cleaning device 100 is from the ion wind bars 22 to the compressor 21. Further, the housing 10 leaves only the opposite ends of the ion wind bar 22 and the compressor 21 disposed in fluid communication with the outside. The ion wind rod 22 is located between the first support plate 11 and the second support plate 12. The ion wind bar 22 is configured to generate a flow of positively and negatively charged nitrogen gas. Further, the air volume of the air outlet duct 222 is adjustable.
Referring to fig. 2, each of the ion wind bars 22 has a duct 221 and a plurality of wind outlet channels 222 protruding from the surface of the duct 221. Each air outlet channel 222 has a circular air outlet. The nitrogen gas flow in the ion wind rod 22 is blown out from the wind outlet channel 222. Each ion wind rod 22 can rotate around the rotation axis of the cylindrical pipe 221 to adjust the orientation of the wind outlet channel 222. For example, the ion wind bar 22 may be rotated 360 ° around the axis. The at least two ion wind rods 22 include a first ion wind rod 22a and a second ion wind rod 22b, wherein the first ion wind rod 22a is disposed near the first support plate 11, and the second ion wind rod 22b is disposed near the second support plate 12.
Further, referring to fig. 3, a space between the first ion wind bar 22a and the second ion wind bar 22b is used for placing a mask 50 to be cleaned.
Further, each air outlet duct 222 of the ion air bar 22 corresponds to the first pressure sensor 111 or the second pressure sensor 121. For example, the number of the first pressure sensors 111 is matched with the number of the air outlet ducts 222 of the first ion air bar 22a, and the first pressure sensors are correspondingly arranged; the number of the second pressure sensors 121 is matched with that of the second ion wind bars 22b, and the second pressure sensors are correspondingly arranged. The first pressure sensor 111 and/or the second pressure sensor 121 are configured to detect a wind force of the outlet air duct 222. For example, the first ion wind bar 22a and the second ion wind bar 22b can rotate around the rotation axis to adjust the orientation of the wind outlet duct 222.
One side of the second support plate 12 close to the compressor 21 is lower than the other side of the second support plate 12 close to the ion wind bar 22. Specifically, referring to fig. 3, the space between the first ion wind bar 22a and the second ion wind bar 22b extends into the mask 50 to be cleaned, the air outlet channels 222 on both sides of the mask 50 are adjusted to blow off both sides of the mask 50, and the dust on the surface of the mask 50 falls onto the second supporting plate 12. The second support plate 12 forms an included angle with the horizontal plane, which is helpful for moving the dust blown off by cleaning to the lower end of the second support plate 12, namely to the compressor 21; by utilizing the suction effect of the compressor 21, dust can be effectively discharged out of the chamber 40, the cleanliness in the chamber 40 is increased, and the chamber 40 becomes a dust-free chamber.
In an embodiment, the first support plate 11 is provided with a first detection sensor 112, the second support plate 12 is provided with a second detection sensor 122, and the first detection sensor 112 and the second detection sensor 122 are oppositely arranged. The first detecting sensor 112 is used for emitting signals, and the second detecting sensor 122 is used for receiving the signals emitted by the first detecting sensor 112. The first detection sensor 112 and the second detection sensor 122 which are oppositely arranged can accurately detect the position of the mask 50 in the cavity 40; in addition, the light shield 50 can be prevented from protruding into the cavity 40 too much to collide with other components. Further, the first detection sensor 112 and the second detection sensor 122 are preferably located between the compressor 21 and the ion wind bar 22, and are disposed near the compressor 21 for detecting and determining the placement position of the mask 50. For example, the first detection sensor 112 and the second detection sensor 122 may detect the existence of the mask 50, and may adjust and control the position of the mask 50 according to the detection result.
In one embodiment, a grid-like partition 30 is disposed on each side of the compressor 21 along the airflow direction of the compressor 21. The mesh-shaped partition plate 30 disposed between the compressor 21 and the first detection sensor 112 may protect the compressor 21 from being hit by the light shield 50.
In one embodiment, the mask cleaning apparatus 100 further comprises a robot (not shown) for moving the mask 50 to be cleaned into the chamber 40 such that the mask 50 is located between the first ion wind bar 22a and the second ion wind bar 22 b. By adjusting the orientations of the air outlet channels 222 of the first ion air bar 22a and the second ion air bar 22b, the upper and lower surfaces of the mask 50 can be simultaneously purged by the first ion air bar 22a and the second ion air bar 22 b. The blowing range of the air outlet channel 222 of the ion air bar 22 covers the whole mask 50. Preferably, the angle between the air outlet channel 222 and the light shield 50 during purging is less than 45 °.
Specifically, the robot arm is used to drive the mask 50 to move into the chamber 40 of the mask cleaning apparatus 100, and when the first detecting sensor 112 and the second detecting sensor 122 detect that the mask 50 reaches the target position, the robot arm stops moving; the compressor 21 and the ion wind bar 22 start to work, and the ion wind bar 22 performs purging on the surface of the light shield 50; the mechanical arm drives the light shield 50 to move towards the outside of the light shield cleaning device 100 (away from the compressor 21), and at this time, the air outlet channels 222 of the ion air bars 22 on the two sides are aligned with the light shield 50, so that the surface of the light shield 50 can be purged. In addition, the air volume of the air outlet duct 222 can be adjusted as required to avoid blowing the surface film protection layer of the mask 50.
The mask cleaning apparatus 100 of the present application may be installed in an exposure machine or may be installed separately.
To sum up, the light shield cleaning device of this application not only can avoid blowing through light shield lower surface film protective layer, and improves the cleaning efficiency.
The foregoing describes in detail a photomask cleaning apparatus provided in an embodiment of the present application, and the principle and the implementation of the present application are described herein by applying specific examples, and the description of the foregoing embodiments is only used to help understanding the technical solution and the core concept of the present application; those of ordinary skill in the art will understand that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications or substitutions do not depart from the spirit and scope of the present disclosure as defined by the appended claims.
Claims (10)
1. A reticle cleaning apparatus, comprising:
the device comprises a shell, a first support plate and a second support plate, wherein the shell comprises a first support plate and a second support plate which are arranged oppositely and is provided with a cavity; and
the cleaning unit comprises a compressor and at least two ion air bars; each ion air bar is provided with a pipeline and a plurality of air outlet pore channels protruding out of the surface of the pipeline; the ion wind rod is positioned between the first supporting plate and the second supporting plate; the at least two ion air bars and the compressor are oppositely arranged at two ends of the chamber, so that the air direction in the photomask cleaning device is from the ion air bars to the compressor; wherein
At least two ion wind sticks include first ion wind stick and second ion wind stick, wherein first ion wind stick is close to first backup pad setting, second ion wind stick is close to the setting of second backup pad.
2. The apparatus of claim 1, wherein the ion wind bar is configured to generate a positively-negatively-charged nitrogen gas flow and blow out from the air outlet channel.
3. The apparatus of claim 1, wherein the first ion wind bar and the second ion wind bar are rotatable around a rotation axis to control the orientation of the wind outlet channel.
4. The apparatus according to claim 1, wherein the apparatus further comprises a first pressure sensor and a second pressure sensor for detecting the wind force of the wind outlet duct of the first ion wind rod and the second ion wind rod.
5. The reticle cleaning device of claim 4, wherein the first pressure sensor is disposed on the first support plate; the second pressure sensor is arranged on the second supporting plate; each air outlet duct of the ion air bar corresponds to the first pressure sensor or the second pressure sensor one by one and is used for detecting the wind power of the corresponding air outlet duct.
6. The apparatus of claim 1, wherein the first support plate is disposed horizontally, the second support plate is disposed at an angle to the horizontal, and one side of the second support plate close to the compressor is lower than the other side of the second support plate close to the ion wind rod.
7. The reticle cleaning apparatus of claim 1, wherein the compressor is an air extractor.
8. The mask cleaning apparatus according to claim 7, wherein a grid-like partition is provided on each of both sides of the compressor in the direction of the air flow of the compressor.
9. The apparatus of claim 1, further comprising a robot configured to place a reticle to be cleaned in the chamber such that the reticle to be cleaned is positioned between the first ion wind bar and the second ion wind bar.
10. The apparatus according to claim 1, wherein the first support plate is provided with a first detection sensor; a second detection sensor is arranged on the second support plate; the first detection sensor and the second detection sensor are arranged oppositely, wherein the first detection sensor is used for sending signals, and the second detection sensor is used for receiving signals and detecting the position information of a photomask to be cleaned in the chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110269999.XA CN113042457A (en) | 2021-03-12 | 2021-03-12 | Light shield cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110269999.XA CN113042457A (en) | 2021-03-12 | 2021-03-12 | Light shield cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113042457A true CN113042457A (en) | 2021-06-29 |
Family
ID=76512435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110269999.XA Pending CN113042457A (en) | 2021-03-12 | 2021-03-12 | Light shield cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113042457A (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008051986A (en) * | 2006-08-24 | 2008-03-06 | Dainippon Printing Co Ltd | Method for cleaning photomask |
| TW200934591A (en) * | 2008-02-01 | 2009-08-16 | Century Display Shenxhen Co | Cleaning apparatus for gantry type photo mask |
| CN202649668U (en) * | 2012-06-19 | 2013-01-02 | 京东方科技集团股份有限公司 | Automatic mask cleaning system and exposure equipment |
| CN104438226A (en) * | 2014-12-02 | 2015-03-25 | 京东方科技集团股份有限公司 | Mask plate cleaning system |
| CN105467777A (en) * | 2015-12-14 | 2016-04-06 | 深圳市华星光电技术有限公司 | Exposure machine and photomask cleaning device |
| CN106903116A (en) * | 2017-05-03 | 2017-06-30 | 京东方科技集团股份有限公司 | A kind of surface cleaning apparatus, thermal station system and method for cleaning surface |
| CN208712411U (en) * | 2018-05-14 | 2019-04-09 | 京东方科技集团股份有限公司 | Exposure mask board cleaning device |
| CN109782551A (en) * | 2019-01-11 | 2019-05-21 | 深圳市华星光电技术有限公司 | Mask plate foreign body eliminating apparatus |
-
2021
- 2021-03-12 CN CN202110269999.XA patent/CN113042457A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008051986A (en) * | 2006-08-24 | 2008-03-06 | Dainippon Printing Co Ltd | Method for cleaning photomask |
| TW200934591A (en) * | 2008-02-01 | 2009-08-16 | Century Display Shenxhen Co | Cleaning apparatus for gantry type photo mask |
| CN202649668U (en) * | 2012-06-19 | 2013-01-02 | 京东方科技集团股份有限公司 | Automatic mask cleaning system and exposure equipment |
| CN104438226A (en) * | 2014-12-02 | 2015-03-25 | 京东方科技集团股份有限公司 | Mask plate cleaning system |
| CN105467777A (en) * | 2015-12-14 | 2016-04-06 | 深圳市华星光电技术有限公司 | Exposure machine and photomask cleaning device |
| CN106903116A (en) * | 2017-05-03 | 2017-06-30 | 京东方科技集团股份有限公司 | A kind of surface cleaning apparatus, thermal station system and method for cleaning surface |
| CN208712411U (en) * | 2018-05-14 | 2019-04-09 | 京东方科技集团股份有限公司 | Exposure mask board cleaning device |
| CN109782551A (en) * | 2019-01-11 | 2019-05-21 | 深圳市华星光电技术有限公司 | Mask plate foreign body eliminating apparatus |
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Application publication date: 20210629 |