CN105467777A - Exposure machine and photomask cleaning device - Google Patents
Exposure machine and photomask cleaning device Download PDFInfo
- Publication number
- CN105467777A CN105467777A CN201510929155.8A CN201510929155A CN105467777A CN 105467777 A CN105467777 A CN 105467777A CN 201510929155 A CN201510929155 A CN 201510929155A CN 105467777 A CN105467777 A CN 105467777A
- Authority
- CN
- China
- Prior art keywords
- light shield
- cleaning apparatus
- exposure machine
- casing
- shutter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Cleaning In General (AREA)
Abstract
The invention provides an exposure machine and a photomask cleaning device. The photomask cleaning device is arranged in the exposure machine and used for cleaning a photomask in the exposure machine. The photomask cleaning device comprises a box body, a moving table, an ion air gun and an ultraviolet lamp tube, wherein the box body is provided with a shutter; the moving table is arranged in the box body and used for receiving the photomask from the shutter and moving the photocover in the box body; the ion air gun is arranged in the box body and used for blowing out ionic wind to clean away impurities and dust on the photomask; and the ultraviolet lamp tube is arranged in the box body and used for emitting ultraviolet rays to decompose organic matters on the photomask. According to the exposure machine and the photomask cleaning device therefor, the photomask can be cleaned in the exposure machine without the need for being cleaned outside the exposure machine, so that the working efficiency and the production capacity are greatly improved.
Description
Technical field
The present invention relates to liquid crystal panel manufacturing technology field, particularly a kind of exposure machine and light shield cleaning apparatus.
Background technology
Liquid crystal indicator has that fuselage is thin, power saving, the many merits such as radiationless, be widely used, as mobile phone, personal digital assistant (PDA), digital camera, computer screen or notebook computer screen etc.
The backlight module that usual liquid crystal indicator comprises housing, is located at the liquid crystal panel in housing and is located in housing.Wherein, the structure of liquid crystal panel is mainly made up of thin-film transistor array base-plate (TFT substrate), colored filter substrate (CF substrate) and the liquid crystal layer be configured between two substrates, its principle of work is by applying the rotation that driving voltage controls the liquid crystal molecule of liquid crystal layer on two panels glass substrate, the light refraction of backlight module out being produced picture.
Wherein, need in TFT substrate processing procedure to use exposure machine to the glass-based board to explosure completing light blockage coating.And in order to avoid light shield (Mask) surface foreign matter processing procedure is impacted, need the cleanliness factor ensureing light shield, once detect that the cleanliness factor of reticle surface is not up to standard, needing slip-stick artist manually taken out by light shield and clean, affect work efficiency and then affect production capacity.
Summary of the invention
The invention provides a kind of exposure machine and light shield cleaning apparatus, need to carry out in exposure machine outside to solve in prior art light shield cleaning, affect work efficiency and then affect the problem of production capacity.
For solving the problems of the technologies described above, the technical scheme that the present invention adopts is: provide a kind of light shield cleaning apparatus, described light shield cleaning apparatus is arranged in exposure machine, and for cleaning the light shield in exposure machine, described light shield cleaning apparatus comprises:
Casing, is provided with shutter;
Transfer table, is located in described casing, for receiving light shield from described shutter and moving in described casing;
Ion air gun, is located in described casing, for blowing out ion wind to remove the assorted dirt on described light shield;
Quartz burner, is located in described casing, for sending ultraviolet to decompose the organism on described light shield.
Described according to one preferred embodiment of the present invention casing is enclosed by upper plate, lower plate and side plate and forms, and described shutter is arranged on described side plate.
Described according to one preferred embodiment of the present invention transfer table comprises guide rail and is located at the brace table on described guide rail, and described brace table moves back and forth on described guide rail.
Described according to one preferred embodiment of the present invention brace table comprises vertical frame and back up pad, and described vertical frame is located on described guide rail, and described back up pad is located at the top of described vertical frame.
Described according to one preferred embodiment of the present invention brace table comprises further to be located between described vertical frame and the crossbearer be positioned at below described brace table.
Described according to one preferred embodiment of the present invention brace table is provided with supporting pin, and described supporting pin is used for described light shield being gripped also interval and is supported on the top of described brace table.
What arrange before and after described according to one preferred embodiment of the present invention ion air gun is included on described transfer table moving direction is multiple.
Described according to one preferred embodiment of the present invention ion air gun is included in two that arrange before and after on described transfer table moving direction, described quartz burner is arranged between described ion air gun, described transfer table receives light shield and when moving in described casing from described shutter, described light shield moves to the first ion wind gun place, described first ion wind gun starts clean large assorted dirt, move through described quartz burner simultaneously and irradiate the organism decomposed on light shield, described reticle surface is cleaned again, removing surface attachments by the second ion wind gun.
Described according to one preferred embodiment of the present invention light shield cleaning apparatus also comprise be located at described casing suction fan to provide negative pressure, and the assorted dirt that the exhaust gas filter layer being located at described cabinet wall cleans out from described reticle surface with absorptive collection.
For solving the problems of the technologies described above, another technical solution used in the present invention is: provide a kind of exposure machine, this exposure machine is used for carrying out exposure operation by light shield, be provided with mechanical transmission hand and above-mentioned light shield cleaning apparatus in described exposure machine, described light shield delivers to described transfer table by shutter described in described mechanical transmission hand channel.
The invention has the beneficial effects as follows: the situation being different from prior art, exposure machine provided by the invention and light shield cleaning apparatus thereof make light shield can clean in exposure machine inside, need not take out outside exposure machine and clean, substantially increase work efficiency and production capacity.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme in the embodiment of the present invention, below the accompanying drawing used required in describing embodiment is briefly described, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings, wherein:
Fig. 1 is the simplification structural representation of the exposure machine of the preferred embodiment of the present invention;
Fig. 2 is that the forward sight of the light shield cleaning apparatus of the preferred embodiment of the present invention simplifies structure phantom view;
Fig. 3 is that simplification structure phantom view is looked on a left side for the light shield cleaning apparatus of the preferred embodiment of the present invention;
Fig. 4 is that overlooking of the light shield cleaning apparatus of the preferred embodiment of the present invention simplifies structure phantom view.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only a part of embodiment of the present invention, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.
Refer to Fig. 1, the invention provides a kind of exposure machine 20, this exposure machine 20 is for carrying out exposure operation by light shield 30 to the glass substrate (diagram is not) having applied photoresistance, be provided with mechanical transmission hand 40 and light shield cleaning apparatus 10 in exposure machine 20, light shield 30 is delivered to the transfer table 120 (see Fig. 2) in light shield cleaning apparatus 10 by the shutter 111 of mechanical transmission hand 40 through light shield cleaning apparatus 10 and is cleaned.
Specifically, see also Fig. 2 to Fig. 4, Fig. 2 to Fig. 4 illustrates the three-view diagram of the light shield cleaning apparatus of the preferred embodiment of the present invention.
As shown in Figures 2 to 4, the invention provides a kind of light shield cleaning apparatus 10, this light shield cleaning apparatus 10 is arranged in exposure machine 20, for cleaning the light shield 30 in exposure machine 20, this light shield cleaning apparatus 10 mainly comprises casing 110, transfer table 120, ion air gun 130 and quartz burner 140.
Wherein, casing 110, is provided with shutter (shutter door) 111, and shutter 11 can switch rapidly, enters to avoid assorted dirt.
Transfer table 120 is located in casing 110, for receiving light shield 30 from shutter 111 and moving back and forth in casing 110.
Ion air gun 130 is located in casing 110, for blowing out ion wind to remove the assorted dirt on light shield 30.
Quartz burner 140 is located in casing 110, for sending ultraviolet to decompose the organism on light shield 30.
In embodiments of the present invention, casing 110 can be cuboid shape, and enclosed by upper plate 112, lower plate 113 and four blocks of side plates 114 and form, shutter 111 is arranged on side plate 114.In other embodiments, casing 110 also can be cylindrical body shape, by upper plate 112, lower plate 113 and one or polylith arc side plate enclose and form, shutter 111 is arranged on arc side plate.
In embodiments of the present invention, the brace table 122 that transfer table 120 comprises guide rail 121 and is located on guide rail 121, brace table 122 moves back and forth on guide rail 121.
Brace table 122 comprises vertical frame 123 and back up pad 124, and vertical frame 123 can be 4 or more, and be located on guide rail 121, back up pad 124 level is located at the top of vertical frame 123.
Brace table 122 comprises further to be located between vertical frame 123 and the crossbearer 125 be positioned at below brace table 122, the quantity of crossbearer 125 can be one, two or more, to improve the structural strength of brace table 122.
Brace table 122 is provided with supporting pin 126, and supporting pin 126 is supported on the top of brace table 122 for light shield 30 being gripped also interval.
What arrange before and after ion air gun 130 is included on transfer table 120 moving direction is multiple.
For example, as shown in Figure 3, ion air gun 130 is included in two that arrange before and after on transfer table 120 moving direction, quartz burner 140 is arranged between ion air gun 130, when transfer table 120 receives light shield 30 from shutter 111 and moves in casing 110, light shield 30 first moves to the first ion wind gun 131 place, first ion wind gun 131 starts clean relatively large assorted dirt, then carry light shield 30 by transfer table 120 and move through quartz burner 140, the organism decomposed on light shield 30 is irradiated by quartz burner 140, again by the second ion wind gun 132 photomask cleaning 30 surface, removing surface attachments.
In embodiments of the present invention, light shield cleaning apparatus 10 is inner whole is subnormal ambient, in a kind of feasible embodiment, by being located at suction fan 150 bottom casing 110 to provide negative pressure, certainly, the position of suction fan 150 is not limited to this, also can be arranged on side plate 114, or is arranged on base plate 112 and side plate 114 simultaneously.Accordingly, the exhaust gas filter layer 160 that is provided with of casing 110 inwall correspondence, the assorted dirt that this exhaust gas filter layer 160 can coordinate suction fan 150 absorptive collection to go out from light shield 30 surface cleaning, preferably, inwall comprises the top of casing, sidewall and bottom.
Complete one piece of light shield 30 clean after, moving by transfer table 120 and being changed by mechanical transmission hand 40 through shutter 111 needs clean light shield 30.Light shield cleaning apparatus 10 in use for some time, replaceable new exhaust gas filter layer 160.
In sum, those skilled in the art's easy understand, exposure machine 20 provided by the invention and light shield cleaning apparatus 10 thereof make light shield 30 can clean in exposure machine 20 inside, need not take out outside exposure machine 20 and clean, substantially increase work efficiency and production capacity.
The foregoing is only embodiments of the invention; not thereby the scope of the claims of the present invention is limited; every utilize instructions of the present invention and accompanying drawing content to do equivalent structure or equivalent flow process conversion; or be directly or indirectly used in other relevant technical fields, be all in like manner included in scope of patent protection of the present invention.
Claims (10)
1. a light shield cleaning apparatus, is characterized in that, described light shield cleaning apparatus is arranged in exposure machine, and for cleaning the light shield in exposure machine, described light shield cleaning apparatus comprises:
Casing, is provided with shutter;
Transfer table, is located in described casing, for receiving light shield from described shutter and moving in described casing;
Ion air gun, is located in described casing, for blowing out ion wind to remove the assorted dirt on described light shield;
Quartz burner, is located in described casing, for sending ultraviolet to decompose the organism on described light shield.
2. light shield cleaning apparatus according to claim 1, is characterized in that, described casing is enclosed by upper plate, lower plate and side plate and forms, and described shutter is arranged on described side plate.
3. light shield cleaning apparatus according to claim 2, is characterized in that, described transfer table comprises guide rail and is located at the brace table on described guide rail, and described brace table moves back and forth on described guide rail.
4. light shield cleaning apparatus according to claim 3, is characterized in that, described brace table comprises vertical frame and back up pad, and described vertical frame is located on described guide rail, and described back up pad is located at the top of described vertical frame.
5. light shield cleaning apparatus according to claim 4, is characterized in that, described brace table comprises further to be located between described vertical frame and the crossbearer be positioned at below described brace table.
6. light shield cleaning apparatus according to claim 6, is characterized in that, described brace table is provided with supporting pin, and described supporting pin is used for described light shield being gripped also interval and is supported on the top of described brace table.
7. light shield cleaning apparatus according to claim 6, is characterized in that, what arrange before and after described ion air gun is included on described transfer table moving direction is multiple.
8. light shield cleaning apparatus according to claim 7, it is characterized in that, described ion air gun is included in two that arrange before and after on described transfer table moving direction, described quartz burner is arranged between described ion air gun, when described transfer table receives described light shield from described shutter and moves in described casing, described light shield first moves to the first ion wind gun place, described first ion wind gun starts clean large assorted dirt, then described quartz burner is moved through, the organism decomposed on described light shield is irradiated by described quartz burner, described reticle surface is cleaned again by the second ion wind gun, removing surface attachments.
9. light shield cleaning apparatus according to claim 8, it is characterized in that, described light shield cleaning apparatus also comprise be located at described casing suction fan to provide negative pressure, and the assorted dirt that the exhaust gas filter layer being located at described cabinet wall cleans out from described reticle surface with absorptive collection.
10. an exposure machine, it is characterized in that, for carrying out exposure operation by light shield, be provided with the light shield cleaning apparatus according to any one of mechanical transmission hand and claim 1-9 in described exposure machine, described light shield delivers to described transfer table by shutter described in described mechanical transmission hand channel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510929155.8A CN105467777A (en) | 2015-12-14 | 2015-12-14 | Exposure machine and photomask cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510929155.8A CN105467777A (en) | 2015-12-14 | 2015-12-14 | Exposure machine and photomask cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105467777A true CN105467777A (en) | 2016-04-06 |
Family
ID=55605616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510929155.8A Pending CN105467777A (en) | 2015-12-14 | 2015-12-14 | Exposure machine and photomask cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105467777A (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106094443A (en) * | 2016-05-31 | 2016-11-09 | 深圳市华星光电技术有限公司 | Exposure machine and the method carrying out optical enclosure cleaning in exposure machine |
| CN106125501A (en) * | 2016-08-24 | 2016-11-16 | 武汉华星光电技术有限公司 | A kind of photomask macroscopic view polychrome checks machine and using method thereof |
| CN106269707A (en) * | 2016-09-07 | 2017-01-04 | 京东方科技集团股份有限公司 | The clean method of a kind of mask plate and cleaning device |
| CN106950797A (en) * | 2017-05-22 | 2017-07-14 | 深圳市华星光电技术有限公司 | Light shield clip cleaning device and exposure machine |
| CN107422599A (en) * | 2017-08-24 | 2017-12-01 | 武汉华星光电技术有限公司 | Exposure light shield cleaning device |
| CN107600687A (en) * | 2017-09-26 | 2018-01-19 | 武汉华星光电技术有限公司 | Automatically cleaning box for photomask |
| CN108469407A (en) * | 2018-03-16 | 2018-08-31 | 中国石油大学(华东) | A kind of device and method of detection clean surface degree |
| WO2019000256A1 (en) * | 2017-06-28 | 2019-01-03 | 深圳市柔宇科技有限公司 | Dust removal system within exposure machine and control method |
| CN109240045A (en) * | 2018-10-18 | 2019-01-18 | 上海华力微电子有限公司 | A kind of mask plate transmission device and mask plate dust removal method |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN113042457A (en) * | 2021-03-12 | 2021-06-29 | Tcl华星光电技术有限公司 | Light shield cleaning device |
| WO2022033180A1 (en) * | 2020-08-14 | 2022-02-17 | 长鑫存储技术有限公司 | Photomask conveying device and exposure system |
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Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106094443A (en) * | 2016-05-31 | 2016-11-09 | 深圳市华星光电技术有限公司 | Exposure machine and the method carrying out optical enclosure cleaning in exposure machine |
| CN106094443B (en) * | 2016-05-31 | 2017-12-29 | 深圳市华星光电技术有限公司 | Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine |
| CN106125501A (en) * | 2016-08-24 | 2016-11-16 | 武汉华星光电技术有限公司 | A kind of photomask macroscopic view polychrome checks machine and using method thereof |
| CN106125501B (en) * | 2016-08-24 | 2020-02-18 | 武汉华星光电技术有限公司 | Photomask macroscopic multicolor inspection machine and use method thereof |
| CN106269707A (en) * | 2016-09-07 | 2017-01-04 | 京东方科技集团股份有限公司 | The clean method of a kind of mask plate and cleaning device |
| CN106950797A (en) * | 2017-05-22 | 2017-07-14 | 深圳市华星光电技术有限公司 | Light shield clip cleaning device and exposure machine |
| WO2019000256A1 (en) * | 2017-06-28 | 2019-01-03 | 深圳市柔宇科技有限公司 | Dust removal system within exposure machine and control method |
| CN107422599A (en) * | 2017-08-24 | 2017-12-01 | 武汉华星光电技术有限公司 | Exposure light shield cleaning device |
| CN107600687A (en) * | 2017-09-26 | 2018-01-19 | 武汉华星光电技术有限公司 | Automatically cleaning box for photomask |
| CN108469407A (en) * | 2018-03-16 | 2018-08-31 | 中国石油大学(华东) | A kind of device and method of detection clean surface degree |
| CN108469407B (en) * | 2018-03-16 | 2021-01-12 | 中国石油大学(华东) | Device and method for detecting surface cleanliness |
| CN109240045A (en) * | 2018-10-18 | 2019-01-18 | 上海华力微电子有限公司 | A kind of mask plate transmission device and mask plate dust removal method |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| WO2022033180A1 (en) * | 2020-08-14 | 2022-02-17 | 长鑫存储技术有限公司 | Photomask conveying device and exposure system |
| US11599029B2 (en) | 2020-08-14 | 2023-03-07 | Changxin Memory Technologies, Inc. | Reticle transfer device and exposure system |
| CN113042457A (en) * | 2021-03-12 | 2021-06-29 | Tcl华星光电技术有限公司 | Light shield cleaning device |
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Application publication date: 20160406 |