CN106094443B - Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine - Google Patents
Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine Download PDFInfo
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- CN106094443B CN106094443B CN201610379285.3A CN201610379285A CN106094443B CN 106094443 B CN106094443 B CN 106094443B CN 201610379285 A CN201610379285 A CN 201610379285A CN 106094443 B CN106094443 B CN 106094443B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
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- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Physics & Mathematics (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
A kind of method that the present invention provides exposure machine and optical enclosure cleaning is carried out in exposure machine, by setting up the first cleaning cover in exposure machine, second cleaning cover, cleaning fluid provides equipment, and vaccum-pumping equipment, when needing to carry out optical enclosure cleaning, first cleaning cover and the second cleaning cover are moved to the surface and underface of light shield, again by the first cleaning cover and the second cleaning cover palette, so that light shield is between the first cleaning cover and the second cleaning cover, light shield is cleaned and dried, when needing to be exposed, first cleaning cover and the second cleaning cover are moved to and the nonoverlapping region of light shield, so as to avoid that exposure process is had an impact, optical enclosure cleaning can be directly carried out in exposure machine, light shield need not be dismounted, lift the efficiency of optical enclosure cleaning, keep light shield clean, lift product production capacity and product quality.
Description
Technical field
The present invention relates to display manufacturing technology field, more particularly to a kind of exposure machine and optical enclosure cleaning is carried out in exposure machine
Method.
Background technology
In display technology field, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat-panel monitors such as display (Organic Light Emitting Diode, OLED) progressively substitute cathode-ray tube
(Cathode Ray Tube, CRT) display, be widely used in LCD TV, mobile phone, personal digital assistant, digital camera,
Computer screen or notebook computer screen etc..
In the manufacturing process of flat-panel monitor, patterning processes can be repeatedly utilized.Specifically, scribbling the substrate of photoresist
Light shield (Mask) is placed in top, then substrate is exposed using exposure machine, specifically, exposure machine is by opening high-pressure water
Silver-colored lamp sends ultraviolet (Ultraviolet, UV) light, and the image information on light shield is transferred to the substrate surface for scribbling photoresist
On, the pattern based on light shield, photoresist has the part being exposed and the part not being exposed.Developer solution is recycled to photoresist
Developed, you can the part that photoresist is exposed is removed, retains the part (positive photoresist) that photoresist is not exposed, or
The part that photoresist is not exposed is removed, retains the part (negative photoresist) that photoresist is exposed, so that photoresist is formed
Required figure.
In the manufacturing process of patterning processes, when UV illumination is mapped on substrate, the initiator scission of link on substrate can be caused
Small molecule is formed, small molecule and solvent intermiscibility are preferable, can dissolve in a solvent, and are evaporate into solvent in air, and then attached
On light shield, cause light shield to be atomized.After light shield atomization, pattern (Pattern) can be deformed on light shield, eventually through light shield
The deformation of products of formation, influences product quality.Environmental problem is also resulted on light shield formed with impurity in other board
(particle) product quality, can equally be influenceed.
Just need to clean light shield after light shield is dirty, the cleaning method of generally use is at present：By light shield from exposure
Pulled down on machine, then be transported on optical enclosure cleaning machine and cleaned, be installed to again on exposure machine after washing.This cleaning method needs
Light shield is undergone to multiple disassembly process and handling process, it is very low to result in the efficiency of optical enclosure cleaning, production capacity is influenceed very big.
In addition, the cleaning method used at present is atomized as periodic cleaning for light shield, but light shield atomization is time-continuing process, is not being cleaned
Before, product quality can continue to be deteriorated, and influence the stability of product quality.And the cleaning to impurity be it is irregular, find it is miscellaneous
Matter is influenceed just to need to be cleaned during product quality, and this paroxysmal irregular cleaning is influenceed even than periodically clear for production capacity
Wash bigger.
The content of the invention
It is an object of the invention to provide a kind of exposure machine, and optical enclosure cleaning can be directly carried out in exposure machine, lifts light
The efficiency of cleaning is covered, keeps light shield clean, lifts product production capacity and product quality.
The present invention also aims to provide a kind of method that optical enclosure cleaning is carried out in exposure machine, it is clear light shield can be lifted
The efficiency washed, keep light shield clean, lift product production capacity and product quality.
To achieve the above object, present invention firstly provides a kind of exposure machine, including：Housing, in the housing
Mask stage, the mask stage being respectively arranged in the housing both sides up and down first support and second support, with described the
First cleaning cover of one support flexible connection, the second cleaning cover being flexibly connected with the second support and the described first cleaning
The cleaning fluid offer equipment and connect with first cleaning cover and the second cleaning cover that cover and the second cleaning cover connect
Vaccum-pumping equipment；
The centre of the mask stage is provided with the hollow-out parts for being used for placing light shield；
First cleaning cover can do axial-rotation around the first support and do vertical lifting along the first support,
Second cleaning cover can do axial-rotation around the second support and do vertical lifting along the second support；
During cleaning, the first cleaning cover is made by the axial-rotation of first cleaning cover and the axial-rotation of the second cleaning cover
With the second cleaning cover respectively positioned at the surface of light shield and the underface of light shield, by the vertical lifting of first cleaning cover with
The vertical lifting of second cleaning cover makes the first cleaning cover and the second cleaning cover palette, and providing equipment by cleaning fluid provides clearly
The light shield that washing lotion is pointed between the first cleaning cover and the second cleaning cover is cleaned, and is vacuumized by vaccum-pumping equipment to cleaning
Light shield afterwards is dried.
It is respectively equipped with the first bottom plate and the second bottom plate at the cover mouth of first cleaning cover and the second cleaning cover, described first
Multiple through holes, the sealing paste at its cover mouth of first cleaning cover and the second cleaning cover are equipped with bottom plate and the second bottom plate
Close, the light shield is between the first bottom plate and the second bottom plate.
The cleaning fluid, which provides the cleaning fluid that equipment provides and flowed to via the first bottom plate with the through hole on the second bottom plate, to be located at
On light shield between first bottom plate and the second bottom plate.
During the exposure machine normal exposure operation, first cleaning cover is located at the second cleaning cover not to be weighed with the light shield
Folded region.
The cover mouth edge of first cleaning cover and the second cleaning cover is provided with sealing joint strip.
The present invention also provides a kind of method that optical enclosure cleaning is carried out in exposure machine, comprises the following steps：
Step 1, an exposure machine is provided, including：Housing, the mask stage in the housing, it is respectively arranged on the shell
The first support and second support of the both sides up and down of internal mask stage, first be flexibly connected with the first support are cleaned
Cover, the second cleaning cover being flexibly connected with the second support, connect with first cleaning cover and the second cleaning cover it is clear
Washing lotion provides equipment and the vaccum-pumping equipment connected with first cleaning cover and the second cleaning cover；The mask stage
Centre be provided with hollow-out parts；
Step 2, light shield, the first cleaning cover and the second cleaning cover difference are placed in the hollow-out parts of the mask stage
Axial-rotation is done around the first support and second support, until the first cleaning cover and the second cleaning cover are being located at light shield just respectively
Top and the underface of light shield；
Step 3, first cleaning cover are vertically lowered along the first support, and second cleaning cover is along described second
Frame rises vertically, until the first cleaning cover and the second cleaning cover palette, light shield is placed in into the first cleaning cover and second clear
Wash between cover；
Step 4, cleaning fluid provide equipment offer cleaning fluid and the light shield are cleaned, vaccum-pumping equipment after the completion of cleaning
First cleaning cover is vacuumized with the second cleaning cover, by the cleaning between first cleaning cover and the second cleaning cover
Liquid is completely drawn out so that light shield is dried.
It is respectively equipped with the first bottom plate and the second bottom plate at the cover mouth of first cleaning cover and the second cleaning cover, described first
It is equipped with multiple through holes on bottom plate and the second bottom plate, first cleaning cover and the second cleaning cover palette at its cover mouth,
The light shield is between the first bottom plate and the second bottom plate.
Cleaning fluid provides the cleaning fluid of equipment offer via the through hole stream on the first bottom plate and the second bottom plate in the step 4
Onto the light shield between the first bottom plate and the second bottom plate.
After the completion of also including step 5, cleaning, first cleaning cover rises vertically along the first support, and described second
Cleaning cover is vertically lowered along the second support, until the first cleaning cover completely disengages with the second cleaning cover, subsequent described first
Cleaning cover and the second cleaning cover do axial-rotation rotating around the first support and second support, until first cleaning cover with
Second cleaning cover be located at the nonoverlapping region of the light shield so that exposure machine can be continued by the light shield after cleaning into
Row exposure operation.
The cover mouth edge of first cleaning cover and the second cleaning cover is provided with sealing joint strip.
Beneficial effects of the present invention：The invention provides a kind of exposure machine, by set up in exposure machine the first cleaning cover,
Second cleaning cover, cleaning fluid provide equipment and vaccum-pumping equipment, when needing to carry out optical enclosure cleaning, by the first cleaning cover with
Second cleaning cover is moved to the surface and underface of light shield, then by the first cleaning cover and the second cleaning cover palette so that
Light shield provides equipment by cleaning fluid and cleaned to the first cleaning cover and second between the first cleaning cover and the second cleaning cover
Cleaning fluid is provided between cover, light shield cleaned using cleaning fluid, then recycle vaccum-pumping equipment by the first cleaning cover with
Cleaning fluid between second cleaning cover is completely drawn out so that light shield is dried, when needing to be exposed, by the first cleaning cover and the
Two cleaning covers be moved to the nonoverlapping region of light shield, can be straight in exposure machine so as to avoid that exposure process is had an impact
Tap into row optical enclosure cleaning, it is not necessary to dismount light shield, lift the efficiency of optical enclosure cleaning, keep light shield clean, lifting product production capacity and
Product quality.Present invention also offers a kind of method that optical enclosure cleaning is carried out in exposure machine, the effect of optical enclosure cleaning can be lifted
Rate, keep light shield clean, lift product production capacity and product quality.
Brief description of the drawings
In order to be further understood that the feature of the present invention and technology contents, refer to below in connection with the detailed of the present invention
Illustrate and accompanying drawing, however accompanying drawing only provide with reference to and explanation use, be not used for being any limitation as the present invention.
In accompanying drawing,
Fig. 1 is the structural representation of the exposure machine of the present invention and the method that optical enclosure cleaning is carried out in exposure machine of the present invention
Step 2 schematic diagram；
Fig. 2 is the schematic diagram of the step 5 of the method that optical enclosure cleaning is carried out in exposure machine of the present invention；
Fig. 3 be the present invention exposure machine in the first cleaning cover and diagrammatic cross-section during the second cleaning cover palette；
Fig. 4 is the schematic perspective view of the first cleaning cover and the second cleaning cover in exposure machine of the invention；
Fig. 5 is the flow chart of the method that optical enclosure cleaning is carried out in exposure machine of the present invention.
Embodiment
Further to illustrate the technological means and its effect of the invention taken, below in conjunction with being preferable to carry out for the present invention
Example and its accompanying drawing are described in detail.
Referring to Fig. 1, present invention firstly provides a kind of exposure machine, including：Housing 1, the light shield in the housing 1 carry
Platform 2, the mask stage 2 being respectively arranged in the housing 1 both sides up and down first support 3 and second support 4, with described first
The first cleaning cover 5 that support 3 is flexibly connected, the second cleaning cover 6 being flexibly connected with the second support 4, with it is described first clear
Wash the cleaning fluid that the cleaning cover 6 of cover 5 and second connects provide equipment 7 and with the cleaning cover 6 of the first cleaning cover 5 and second
The vaccum-pumping equipment 8 connected；
The centre of the mask stage 2 is provided with the hollow-out parts 21 for being used for placing light shield.
Specifically, the top on the mask stage 2 is additionally provided with ultraviolet light source, for being exposed processing procedure.Described
One cleaning cover 5 is connected by two connecting rods with the first support 3 and second support 4 respectively with the second cleaning cover 6, and described first
Bearing is provided between support 3 and second support 4 and connecting rod, so as to which first cleaning cover 5 can be done around the first support 3
Axial-rotation simultaneously does vertical lifting along the first support 3, and second cleaning cover 6 can do axial direction around the second support 4
Rotate and do vertical lifting along the second support 4.Certainly, the cleaning cover 6 of the first cleaning cover 5 and second and first support 3
Connected mode between second support 4 can also be other suitable connected modes, if can complete the first cleaning cover 5 with
The motion process of second cleaning cover 6, above-mentioned connected mode are the preferred connected mode of the present invention, the present invention are not entered
Row limitation.
It should be noted that the working method of the exposure machine is：After the exposure machine exposure manufacture process terminates, that is, expose
After the substrate of completion leaves exposure machine, light shield is cleaned, cleaned by the axial-rotation of first cleaning cover 5 and second
The axial-rotation of cover 6 makes the first cleaning cover 5 and the second cleaning cover 6 positioned at the surface of light shield and the underface of light shield, lead to respectively
The vertical lifting of the vertical lifting and the second cleaning cover 6 of crossing first cleaning cover 5 makes the first cleaning cover 5 and the second cleaning cover 6
Palette, light shield is placed between the first cleaning cover 5 and the second cleaning cover 6, then provides equipment 7 by cleaning fluid and provide clearly
Washing lotion is cleaned to the light shield, is vacuumized by vaccum-pumping equipment 8 and the light shield after cleaning is dried.It is in addition, described
During exposure machine normal exposure operation, i.e., when being exposed processing procedure to substrate, for avoid influence expose, first cleaning cover 5 with
Second cleaning cover 6 need to be located at the nonoverlapping region of the light shield, specially after cleaning, pass through vertical lifting and axial-rotation
So that the first cleaning cover 5 and the second cleaning cover 6 move to above-mentioned position.Whole process need not dismount light shield, also will not be to exposing
The normal work of ray machine has an impact, and can effectively lift the efficiency of optical enclosure cleaning, lifts production capacity.
Further, Fig. 3 and Fig. 4 is referred to, first cleaning cover 5 at the cover mouth of the second cleaning cover 6 with being respectively equipped with
First bottom plate 51 and the second bottom plate 61, multiple through holes are equipped with the bottom plate 61 of the first bottom plate 51 and second, described first is clear
The cleaning cover 6 of cover 5 and second palette at its cover mouth is washed, the light shield is between the first bottom plate 51 and the second bottom plate 61.
The multiple through hole is uniformly arranged on the bottom plate 61 of the first bottom plate 51 and second, and the setting of the through hole can cause described clear
Washing lotion provides the cleaning fluid that equipment 7 provides and flowed to via through hole on the light shield between the first bottom plate 51 and the second bottom plate 61,
So that cleaning fluid is uniformly distributed on light shield.The cover mouth size of the cleaning cover 6 of first cleaning cover 5 and second is more than the light
The size of cover, so as to which the light shield is fully enclosed between the cleaning cover 6 of the first cleaning cover 5 and second.
In addition, further respectively having one or two connecting hole on the cleaning cover 6 of the first cleaning cover 5 and second, it is used for
The cleaning fluid is connected by connecting line equipment 7 and vaccum-pumping equipment 8 are provided, when first cleaning cover 5 and second cleans
When being provided only with a connecting hole respectively on cover 6, one end of the connecting line and the cleaning cover 6 of the first cleaning cover 5 or second
Connecting hole be connected, the other end, which is divided into two branch lines and connects cleaning fluid respectively, provides equipment 7 and vaccum-pumping equipment 8, works as institute
State when being respectively equipped with two connecting holes on the first cleaning cover 5 and the second cleaning cover 6, then connect respectively by two articles of connecting lines
Two connecting holes of one cleaning cover 5 or the second cleaning cover 6 provide equipment 7 and vaccum-pumping equipment 8 with cleaning fluid.
It is noted that the cover mouth edge of the cleaning cover 6 of the first cleaning cover 5 and second is provided with sealing joint strip, so as to
Strengthen sealing when the first cleaning cover 5 is bonded with the second cleaning cover 6 at cover mouth.
Referring to Fig. 5, the present invention also provides a kind of method that optical enclosure cleaning is carried out in exposure machine, comprise the following steps：
Step 1, an exposure machine is provided, including：Housing 1, the mask stage 2 in the housing 1, be respectively arranged on it is described
The first support 3 and second support 4 of the both sides up and down of mask stage 2 in housing 1, it is flexibly connected with the first support 3
First cleaning cover 5, the second cleaning cover 6 being flexibly connected with the second support 4 and first cleaning cover 5 and second clean
The cleaning fluids that connect of cover 6 provide equipment 7 and set with vacuumizing of connecting of the cleaning cover 6 of the first cleaning cover 5 and second
Standby 8；The centre of the mask stage 2 is provided with hollow-out parts 21.
Specifically, the top on the mask stage 2 is additionally provided with ultraviolet light source, for being exposed processing procedure.Described
One cleaning cover 5 is connected by two connecting rods with the first support 3 and second support 4 respectively with the second cleaning cover 6, and described first
Bearing is provided between support 3 and second support 4 and connecting rod, so as to which first cleaning cover 5 can be done around the first support 3
Axial-rotation simultaneously does vertical lifting along the first support 3, and second cleaning cover 6 can do axial direction around the second support 4
Rotate and do vertical lifting along the second support 4.Certainly, the cleaning cover 6 of the first cleaning cover 5 and second and first support 3
Connected mode between second support 4 can also be other suitable connected modes, if can complete the first cleaning cover 5 with
The motion process of second cleaning cover 6, above-mentioned connected mode are the preferred connected mode of the present invention, the present invention are not entered
Row limitation.
Step 2, referring to Fig. 1, the mask stage 2 hollow-out parts 21 in place light shield, first cleaning cover 5 with
Second cleaning cover 6 does axial-rotation rotating around the first support 3 and second support 4, until the first cleaning cover 5 and the second cleaning
Cover 6 is respectively positioned at the surface of light shield and the underface of light shield.
Step 3, first cleaning cover 5 are vertically lowered along the first support 3, and second cleaning cover 6 is along described
Two supports 4 rise vertically, until the first cleaning cover 5 and the palette of the second cleaning cover 6, the first cleaning cover 5 is placed in by light shield
Between the second cleaning cover 6.
It is noted that the cover mouth edge of the cleaning cover 6 of the first cleaning cover 5 and second is provided with sealing joint strip, so as to
Strengthen sealing when the first cleaning cover 5 is bonded with the second cleaning cover 6 at cover mouth.
Step 4, cleaning fluid provide the offer cleaning fluid of equipment 7 and the light shield are cleaned, and vacuumize and set after the completion of cleaning
Standby 8 pairs of first cleaning covers 5 vacuumize with the second cleaning cover 6, by the cleaning cover 6 of the first cleaning cover 5 and second it
Between cleaning fluid be completely drawn out so that light shield dry.
Further, Fig. 3 and Fig. 4 is referred to, first cleaning cover 5 at the cover mouth of the second cleaning cover 6 with being respectively equipped with
First bottom plate 51 and the second bottom plate 61, multiple through holes are equipped with the bottom plate 61 of the first bottom plate 51 and second, described first is clear
The cleaning cover 6 of cover 5 and second palette at its cover mouth is washed, the light shield is between the first bottom plate 51 and the second bottom plate 61.
The multiple through hole is uniformly arranged on the bottom plate 61 of the first bottom plate 51 and second, and the setting of the through hole can cause described clear
Washing lotion provides the cleaning fluid that equipment 7 provides and flowed to via through hole on the light shield between the first bottom plate 51 and the second bottom plate 61,
So that cleaning fluid is uniformly distributed on light shield.The cover mouth size of the cleaning cover 6 of first cleaning cover 5 and second is more than the light
The size of cover, so as to which the light shield is fully enclosed between the cleaning cover 6 of the first cleaning cover 5 and second.
In addition, further respectively having one or two connecting hole on the cleaning cover 6 of the first cleaning cover 5 and second, it is used for
The cleaning fluid is connected by connecting line equipment 7 and vaccum-pumping equipment 8 are provided, when first cleaning cover 5 and second cleans
When being provided only with a connecting hole respectively on cover 6, one end of the connecting line and the cleaning cover 6 of the first cleaning cover 5 or second
Connecting hole be connected, the other end, which is divided into two branch lines and connects cleaning fluid respectively, provides equipment 7 and vaccum-pumping equipment 8, works as institute
State when being respectively equipped with two connecting holes on the first cleaning cover 5 and the second cleaning cover 6, then connect respectively by two articles of connecting lines
Two connecting holes of one cleaning cover 5 or the second cleaning cover 6 provide equipment 7 and vaccum-pumping equipment 8 with cleaning fluid.
In addition, referring to Fig. 2, the method that optical enclosure cleaning is carried out in exposure machine also includes step 5, cleaning is completed
Afterwards, first cleaning cover 5 rises vertically along the first support 3, and second cleaning cover 6 is vertical along the second support 4
Decline, until the first cleaning cover 5 completely disengages with the second cleaning cover 6, subsequent first cleaning cover 5 divides with the second cleaning cover 6
Do not do axial-rotation around the first support 3 and second support 4, until the cleaning cover 6 of the first cleaning cover 5 and second positioned at
The nonoverlapping region of light shield, so that exposure machine can continue exposure operation by the light shield after cleaning.
In summary, the invention provides a kind of exposure machine, by setting up the first cleaning cover, the second cleaning in exposure machine
Cover, cleaning fluid provide equipment and vaccum-pumping equipment, and when needing to carry out optical enclosure cleaning, the first cleaning cover and second are cleaned
Cover is moved to the surface and underface of light shield, then by the first cleaning cover and the second cleaning cover palette so that light shield is located at
Between first cleaning cover and the second cleaning cover, and provide equipment by cleaning fluid and carried between the first cleaning cover and the second cleaning cover
For cleaning fluid, light shield is cleaned using cleaning fluid, then recycles vaccum-pumping equipment to clean the first cleaning cover and second
Cleaning fluid between cover is completely drawn out so that light shield is dried, when needing to be exposed, by the first cleaning cover and the second cleaning cover
Be moved to the nonoverlapping region of light shield, so as to avoid that exposure process is had an impact, can in exposure machine directly carry out light
Cover cleaning, it is not necessary to dismount light shield, lift the efficiency of optical enclosure cleaning, keep light shield clean, lift product production capacity and product quality.
Present invention also offers a kind of method that optical enclosure cleaning is carried out in exposure machine, can lift the efficiency of optical enclosure cleaning, keep light
Cover is clean, lifts product production capacity and product quality.
It is described above, for the person of ordinary skill of the art, can be with technique according to the invention scheme and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to the claims in the present invention
Protection domain.
Claims (10)
- A kind of 1. exposure machine, it is characterised in that including：Housing (1), the mask stage (2) in the housing (1), difference The first support (3) and second support (4) of the both sides up and down of mask stage (2) in the housing (1) and described first The first cleaning cover (5) of support (3) flexible connection, the second cleaning cover (6) being flexibly connected with the second support (4) and institute State the cleaning fluid that the first cleaning cover (5) and the second cleaning cover (6) connect provide equipment (7) and with first cleaning cover (5) vaccum-pumping equipment (8) connected with the second cleaning cover (6)；The centre of the mask stage (2) is provided with the hollow-out parts (21) for being used for placing light shield；First cleaning cover (5) can do axial-rotation around the first support (3) and be done vertically along the first support (3) Lifting, second cleaning cover (6) can do axial-rotation around the second support (4) and be done along the second support (4) perpendicular Go straight up to drop；During cleaning, the first cleaning is made by the axial-rotation of first cleaning cover (5) and the axial-rotation of the second cleaning cover (6) (5) are covered with the second cleaning cover (6) respectively positioned at the surface of light shield and the underface of light shield, pass through first cleaning cover (5) Vertical lifting and the vertical lifting of the second cleaning cover (6) make the first cleaning cover (5) and the second cleaning cover (6) palette, lead to Over cleaning liquid provides equipment (7) and provides the light shield progress that cleaning fluid is pointed between the first cleaning cover (5) and the second cleaning cover (6) Cleaning, is vacuumized by vaccum-pumping equipment (8) and the light shield after cleaning is dried.
- 2. exposure machine as claimed in claim 1, it is characterised in that first cleaning cover (5) and the cover of the second cleaning cover (6) The first bottom plate (51) and the second bottom plate (61) are respectively equipped with mouthful, first bottom plate (51) on the second bottom plate (61) with being equipped with Multiple through holes, first cleaning cover (5) and the second cleaning cover (6) palette at its cover mouth, the light shield are located at first Between bottom plate (51) and the second bottom plate (61).
- 3. exposure machine as claimed in claim 2, it is characterised in that the cleaning fluid provides the cleaning fluid warp that equipment (7) provides Flowed to by the through hole on the first bottom plate (51) and the second bottom plate (61) between the first bottom plate (51) and the second bottom plate (61) On light shield.
- 4. exposure machine as claimed in claim 1, it is characterised in that during the exposure machine normal exposure operation, described first is clear Cover (5) is washed with the second cleaning cover (6) to be located at and the nonoverlapping region of the light shield.
- 5. exposure machine as claimed in claim 1, it is characterised in that first cleaning cover (5) and the cover of the second cleaning cover (6) Mouth edge is provided with sealing joint strip.
- A kind of 6. method that optical enclosure cleaning is carried out in exposure machine, it is characterised in that comprise the following steps：Step 1, an exposure machine is provided, including：Housing (1), the mask stage (2) in the housing (1), it is respectively arranged on institute State the first support (3) and second support (4) and the first support of the both sides up and down of the mask stage (2) in housing (1) (3) the first cleaning cover (5) being flexibly connected, the second cleaning cover (6) and described the being flexibly connected with the second support (4) Cleaning fluid that one cleaning cover (5) and the second cleaning cover (6) connect provide equipment (7) and with first cleaning cover (5) and The vaccum-pumping equipment (8) that second cleaning cover (6) connects；The centre of the mask stage (2) is provided with hollow-out parts (21)；Step 2, light shield, first cleaning cover (5) and the second cleaning are placed in the hollow-out parts (21) of the mask stage (2) Cover (6) does axial-rotation rotating around the first support (3) and second support (4), until the first cleaning cover (5) and the second cleaning (6) are covered respectively positioned at the surface of light shield and the underface of light shield；Step 3, first cleaning cover (5) are vertically lowered along the first support (3), and second cleaning cover (6) is along described Second support (4) rises vertically, until the first cleaning cover (5) and the second cleaning cover (6) palette, first is placed in by light shield Between cleaning cover (5) and the second cleaning cover (6)；Step 4, cleaning fluid provide equipment (7) offer cleaning fluid and the light shield are cleaned, vaccum-pumping equipment after the completion of cleaning (8) first cleaning cover (5) is vacuumized with the second cleaning cover (6), by first cleaning cover (5) and the second cleaning Cleaning fluid between cover (6) is completely drawn out so that light shield is dried.
- 7. the method for optical enclosure cleaning is carried out in exposure machine as claimed in claim 6, it is characterised in that first cleaning cover (5) with being respectively equipped with the first bottom plate (51) and the second bottom plate (61), first bottom plate (51) at the cover mouth of the second cleaning cover (6) With being equipped with multiple through holes on the second bottom plate (61), first cleaning cover (5) seals with the second cleaning cover (6) at its cover mouth Fitting, the light shield is between the first bottom plate (51) and the second bottom plate (61).
- 8. the method for optical enclosure cleaning is carried out in exposure machine as claimed in claim 7, it is characterised in that clear in the step 4 Washing lotion provides the cleaning fluid that equipment (7) provides and flowed to via the through hole on the first bottom plate (51) and the second bottom plate (61) positioned at first On light shield between bottom plate (51) and the second bottom plate (61).
- 9. the method for optical enclosure cleaning is carried out in exposure machine as claimed in claim 6, it is characterised in that also including step 5, clearly After the completion of washing, first cleaning cover (5) rises vertically along the first support (3), and second cleaning cover (6) is along described the Two supports (4) are vertically lowered, until the first cleaning cover (5) completely disengages with the second cleaning cover (6), subsequent first cleaning cover (5) axial-rotation is done rotating around the first support (3) and second support (4) with the second cleaning cover (6), until described first clear Wash cover (5) and the second cleaning cover (6) be located at the nonoverlapping region of the light shield so that after exposure machine can be by cleaning Light shield continue exposure operation.
- 10. the method for optical enclosure cleaning is carried out in exposure machine as claimed in claim 6, it is characterised in that first cleaning The cover mouth edge of cover (5) and the second cleaning cover (6) is provided with sealing joint strip.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610379285.3A CN106094443B (en) | 2016-05-31 | 2016-05-31 | Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610379285.3A CN106094443B (en) | 2016-05-31 | 2016-05-31 | Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106094443A CN106094443A (en) | 2016-11-09 |
| CN106094443B true CN106094443B (en) | 2017-12-29 |
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| CN110508524B (en) * | 2019-08-12 | 2022-10-18 | 江苏壹度科技股份有限公司 | Device for cleaning photomask |
| US11287750B1 (en) | 2020-09-28 | 2022-03-29 | Changxin Memory Technologies, Inc. | Lithographic apparatus |
| CN114660902A (en) | 2020-12-23 | 2022-06-24 | 长鑫存储技术有限公司 | Exposure machine |
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| JPH0235980A (en) * | 1988-07-25 | 1990-02-06 | Nec Corp | Exposure mask cleaner |
| CN202003138U (en) * | 2011-03-24 | 2011-10-05 | 京东方科技集团股份有限公司 | Exposure machine capable of cleaning maskplate |
| CN105467777A (en) * | 2015-12-14 | 2016-04-06 | 深圳市华星光电技术有限公司 | Exposure machine and photomask cleaning device |
| CN105607414A (en) * | 2016-03-28 | 2016-05-25 | 武汉华星光电技术有限公司 | Mask plate washing device and method |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH0235980A (en) * | 1988-07-25 | 1990-02-06 | Nec Corp | Exposure mask cleaner |
| CN202003138U (en) * | 2011-03-24 | 2011-10-05 | 京东方科技集团股份有限公司 | Exposure machine capable of cleaning maskplate |
| CN105467777A (en) * | 2015-12-14 | 2016-04-06 | 深圳市华星光电技术有限公司 | Exposure machine and photomask cleaning device |
| CN105607414A (en) * | 2016-03-28 | 2016-05-25 | 武汉华星光电技术有限公司 | Mask plate washing device and method |
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