JPH0235980A - Exposure mask cleaner - Google Patents

Abstract

PURPOSE:To perform an efficient cleaning by providing a mechanism for moving an exposure mask up and down and a mechanism for rotating the exposure mask about the axis of rotation, CONSTITUTION:An exposure mask 1 is retained in a vertical position by a pair of holders 2a which hold the opposite corners thereof A rotary mechanism B moves retaining arms 2 horizontally and vertically parallel to each other and rotates the exposure mask 1 about the axis of rotation vertical thereto. A lifting mechanism A moves the rotary mechanism B up and down to thereby move the exposure mask 1 up and down, whereby the dusts which come out of a brush and are attached to the edge of chrome pattern can be showered off with its position changed.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an exposure mask cleaning apparatus for light exposure used in the manufacture of semiconductor devices.

[Conventional technology]

Conventionally, this type of exposure mask cleaning apparatus performs brush cleaning and shower cleaning of the exposure mask in the first cleaning process by moving the exposure mask vertically.

FIG. 2 is an explanatory diagram of a shower cleaning section of a conventional exposure mask cleaning apparatus. 1 is an exposure mask, 3 is a chrome pattern which is a light shielding part in the exposure mask, 4 is a brush, and 5 is a shower pipe.

Conventionally, the front and back surfaces of the exposure mask 1 were cleaned with the brush 4 by moving the exposure mask 1 up and down while discharging the electrolyte from the shower pipe 5.

[Problem to be solved by the invention]

However, the brush 4 may wear out as it is used, and dust from the brush 4 may adhere to the edges of the chrome pattern 3. Although it can be washed away during shower cleaning, dust attached to the edges in the horizontal direction cannot be removed by shower cleaning in which the cleaning solution is flowed in the vertical direction, and if the exposure mask is used for exposure in this state, it will adhere to the edges of chrome pattern 3. There is a drawback that the dust that has been removed is transferred to the product, resulting in a defective product.

An object of the present invention is to provide an exposure mask cleaning apparatus that solves the above problems.

[Differences between the invention and the prior art]

While the conventional exposure mask cleaning device described above moves the exposure mask up and down during brush cleaning and shower cleaning, the exposure mask of the present invention not only moves up and down in order to improve the cleaning ability, but also moves the exposure mask flatly. The difference is that a rotational movement with the axis of rotation in the perpendicular direction is applied.

[Means to solve the problem]

In order to achieve the above object, the present invention provides an exposure mask cleaning apparatus for cleaning an exposure mask used in the manufacture of semiconductor devices by holding it in a vertical position, and a mechanism for vertically moving the exposure mask, and a mechanism for moving the exposure mask relative to the mask. It has a mechanism for rotating it around a vertical axis of rotation.

〔Example〕

Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

FIG. 1 is a block diagram showing one embodiment of the present invention. In FIG. 6, the present invention comprises a vertical machine mA for vertically moving an exposure mask 1 held in a vertical position, It is provided with a rotation mechanism B that rotates around a rotation axis perpendicular to the rotation axis.

The rotating machine J118 has two vertically suspended holding arms 2.
．． 2 and a pair of holders 2a, 2a attached to the lower end of the holding arm 2, and the rotating mechanism B is connected to the vertical mechanism A.
It is supported by the ability to lift and lower.

In the embodiment, a pair of holders 2a, 2at hold opposing corners of the exposure mask 1 and hold the exposure mask 1 in a vertical position. The rotation mechanism B moves the two-wooden holding arm 2.2 in parallel in the left-right direction as shown by the dotted line and also in the vertical direction, thereby moving the exposure mask 1 perpendicularly to the mask 1 as shown in the arrow C. Rotate around the rotation axis. On the other hand, the vertical R mechanism A moves the rotation mechanism B up and down to move the exposure mask 1 up and down as shown by the arrows.

According to the present invention, when brush cleaning and shower cleaning are performed by moving the exposure mask 1 up and down as shown in FIG. 2, the holding arm 2 is moved up and down alternately as shown in FIG. 1 to give movement in the rotational direction. In this condition g, even if dust from the brush adheres to the edge of the chrome pattern, the pattern can be washed away by shower cleaning by changing its position in the vertical direction.

〔Effect of the invention〕

As explained above, in the present invention, by moving the exposure mask in the vertical direction and rotating it, even if dust generated due to brush wear adheres to the edges of the chrome pattern, it can be washed away. This has the effect that the dust adhering to the exposure mask is almost completely eliminated, and the dust on the exposure mask is no longer transferred to the semiconductor substrate and causes defects in the product.

[Brief explanation of the drawing]

FIG. 1 is a block diagram showing an embodiment of the present invention, and FIG. 2 is a diagram showing a conventional example. 1... Exposure mask 2... Holding arm 2a.
...Holder A...Vertical mechanism B...Rotation a
Lateral patent applicant Representative of NEC Corporation Patent attorney Kanno
Churei・Shiji 1

Claims (1)

[Claims] (1) In an exposure mask cleaning device that cleans an exposure mask used in the manufacture of semiconductor devices by holding it in a vertical position,
An exposure mask cleaning device comprising: a mechanism for vertically moving an exposure mask; and a mechanism for rotating the exposure mask around a rotation axis perpendicular to the mask.