CN106094443A - Exposure machine and the method carrying out optical enclosure cleaning in exposure machine - Google Patents
Exposure machine and the method carrying out optical enclosure cleaning in exposure machine Download PDFInfo
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- CN106094443A CN106094443A CN201610379285.3A CN201610379285A CN106094443A CN 106094443 A CN106094443 A CN 106094443A CN 201610379285 A CN201610379285 A CN 201610379285A CN 106094443 A CN106094443 A CN 106094443A
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- Prior art keywords
- cleaning cover
- cleaning
- cover
- light shield
- base plate
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Abstract
The present invention provides a kind of exposure machine and the method carrying out optical enclosure cleaning in exposure machine, by setting up the first cleaning cover in exposure machine, second cleaning cover, cleanout fluid provides equipment, and vaccum-pumping equipment, when needs carry out optical enclosure cleaning, first cleaning cover and the second cleaning cover are moved the surface to light shield and underface, again the first cleaning cover and the second cleaning cover are sealed laminating, make light shield between the first cleaning cover and the second cleaning cover, light shield is carried out and is dried, when needs are exposed, first cleaning cover and the second cleaning cover are moved to region nonoverlapping with light shield, thus avoid exposure process is produced impact, optical enclosure cleaning can be directly carried out in exposure machine, need not dismount light shield, promote the efficiency of optical enclosure cleaning, keep light shield clean, improving product production capacity and product quality.
Description
Technical field
The present invention relates to show manufacturing technology field, particularly relate to a kind of exposure machine and in exposure machine, carry out optical enclosure cleaning
Method.
Background technology
In Display Technique field, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat faced displays such as display (Organic Light Emitting Diode, OLED) the most progressively replace cathode ray tube
(Cathode Ray Tube, CRT) display, be widely used in LCD TV, mobile phone, personal digital assistant, digital camera,
Computer screen or notebook computer screen etc..
In the manufacture process of flat faced display, can repeatedly utilize patterning processes.Specifically, scribbling the substrate of photoresist
Light shield (Mask) is placed in top, then utilizes exposure machine to be exposed substrate, concrete, and exposure machine is by opening high-pressure water
Silver lamp sends ultraviolet (Ultraviolet, UV) light, transfers to scribble the substrate surface of photoresist by the image information on light shield
On, pattern based on light shield, photoresist has the part being exposed and the part not being exposed.Recycling developer solution is to photoresist
Develop, the part that the most removable photoresist is exposed, retain the part (positive photoresist) that photoresist is not exposed, or
Remove the part that photoresist is not exposed, retain the part (negative photoresist) that photoresist is exposed, so that photoresist is formed
Required figure.
In the manufacturing process of patterning processes, when UV light is irradiated on substrate, the initiator scission of link on substrate can be caused
Forming little molecule, little molecule is preferable with solvent phase dissolubility, can dissolve in a solvent, and evaporate in air with solvent, and then attached
On light shield, cause light shield to be atomized.After light shield atomization, on light shield, pattern (Pattern) can be deformed, eventually through light shield
The deformation of products formed, affects product quality.Additionally in board, environmental problem also results in and is formed with impurity on light shield
(particle), product quality can be affected equally.
Being accomplished by after light shield is dirty being carried out light shield, the cleaning method the most generally used is: by light shield from exposure
Pull down on machine, then be transported on optical enclosure cleaning machine be carried out, be installed to again on exposure machine after washing.This cleaning method needs
Will be by light shield experience disassembly process repeatedly and handling process, the efficiency that result in optical enclosure cleaning is the lowest, the biggest on production capacity impact.
It addition, the cleaning method for light shield atomization employing at present is routine cleaning, but light shield atomization is time-continuing process, is not cleaning
Before, product quality can persistently be deteriorated, and affects the stability of product quality.And the cleaning to impurity is irregular, miscellaneous in discovery
Matter is accomplished by being carried out when affecting product quality, and this paroxysmal irregular cleaning is the most clear for production capacity impact even ratio
Wash bigger.
Summary of the invention
It is an object of the invention to provide a kind of exposure machine, it is possible in exposure machine, directly carry out optical enclosure cleaning, promote light
The efficiency that cover cleans, keeps light shield clean, improving product production capacity and product quality.
The present invention also aims to provide a kind of method carrying out optical enclosure cleaning in exposure machine, it is possible to promote light shield clear
The efficiency washed, keeps light shield clean, improving product production capacity and product quality.
For achieving the above object, present invention firstly provides a kind of exposure machine, including: housing, be located in described housing
Mask stage, first support of both sides up and down of the mask stage being respectively arranged in described housing and the second support and described
The second cleaning cover and described first that the first cleaning cover that one support is flexibly connected is flexibly connected with described second support cleans
Cleanout fluid offer equipment that cover all connects with the second cleaning cover and all connect with described first cleaning cover and the second cleaning cover
Vaccum-pumping equipment；
The centre of described mask stage is provided with the hollow-out parts for placing light shield；
Described first cleaning cover can do axial-rotation around described first support and do vertical lifting along described first support,
Described second cleaning cover can do axial-rotation around described second support and do vertical lifting along described second support；
During cleaning, make the first cleaning cover by the axial-rotation of described first cleaning cover and the axial-rotation of the second cleaning cover
Lay respectively at the surface of light shield and the underface of light shield with the second cleaning cover, by the vertical lifting of described first cleaning cover with
The vertical lifting of the second cleaning cover makes the first cleaning cover and the second cleaning cover seal laminating, provides equipment to provide clear by cleanout fluid
The light shield that washing liquid is pointed between the first cleaning cover and the second cleaning cover is carried out, by vaccum-pumping equipment evacuation to cleaning
After light shield be dried.
The first base plate and the second base plate it is respectively equipped with at the cover mouth of described first cleaning cover and the second cleaning cover, described first
The sealing paste at its cover mouth of multiple through hole, described first cleaning cover and the second cleaning cover it is equipped with on base plate and the second base plate
Closing, described light shield is between the first base plate and the second base plate.
The cleanout fluid that described cleanout fluid provides equipment to provide flows to be positioned at via the through hole on the first base plate and the second base plate
On light shield between first base plate and the second base plate.
During described exposure machine normal exposure operation, described first cleaning cover and the second cleaning cover are positioned at and do not weigh with described light shield
Folded region.
The cover mouth edge of described first cleaning cover and the second cleaning cover is provided with sealing joint strip.
The present invention also provides for a kind of method carrying out optical enclosure cleaning in exposure machine, comprises the steps:
Step 1, provide an exposure machine, including: housing, the mask stage being located in described housing, it is respectively arranged on described shell
The first cleaning that first support of the both sides up and down of internal mask stage and the second support are flexibly connected with described first support
The second cleaning cover that cover is flexibly connected with described second support is clear with what described first cleaning cover and the second cleaning cover all connected
Washing liquid provides equipment and the vaccum-pumping equipment all connected with described first cleaning cover and the second cleaning cover；Described mask stage
Centre be provided with hollow-out parts；
Step 2, in the hollow-out parts of described mask stage, place light shield, dividing of described first cleaning cover and the second cleaning cover
Do not do axial-rotation around described first support and the second support, until the first cleaning cover and the second cleaning cover lay respectively at light shield
Surface and the underface of light shield；
Step 3, described first cleaning cover are vertically lowered along described first support, and described the two the second cleaning covers are along described
Two supports vertically rise, until the first cleaning cover and the second cleaning cover seal laminating, light shield are placed in the first cleaning cover and the
Between two cleaning covers；
Step 4, cleanout fluid provide equipment to provide cleanout fluid to be carried out described light shield, have cleaned rear vaccum-pumping equipment
Described first cleaning cover and the second cleaning cover are carried out evacuation, by the cleaning between described first cleaning cover and the second cleaning cover
Liquid is completely drawn out so that light shield is dried.
The first base plate and the second base plate it is respectively equipped with at the cover mouth of described first cleaning cover and the second cleaning cover, described first
It is equipped with multiple through hole, described first cleaning cover and the second cleaning cover on base plate and the second base plate at its cover mouth, seals laminating,
Described light shield is between the first base plate and the second base plate.
In described step 4, cleanout fluid provides the cleanout fluid of equipment offer via the through hole stream on the first base plate and the second base plate
On the light shield between the first base plate and the second base plate.
After also including step 5, having cleaned, described first cleaning cover vertically rises along described first support, and described second
Cleaning cover is vertically lowered along described second support, until the first cleaning cover and the second cleaning cover completely disengage from, and the most described first
Cleaning cover and the second cleaning cover do axial-rotation rotating around described first support and the second support, until described first cleaning cover
It is positioned at region nonoverlapping with described light shield, so that exposure machine can be continued by the light shield after cleaning with the second cleaning cover
It is exposed operation.
The cover mouth edge of described first cleaning cover and the second cleaning cover is provided with sealing joint strip.
Beneficial effects of the present invention: the invention provides a kind of exposure machine, by set up in exposure machine the first cleaning cover,
Second cleaning cover, cleanout fluid provide equipment and vaccum-pumping equipment, when needs carry out optical enclosure cleaning, by the first cleaning cover with
Second cleaning cover moves the surface to light shield and underface, then the first cleaning cover and the second cleaning cover are sealed laminating so that
Light shield is between the first cleaning cover and the second cleaning cover, and provides equipment to clean to the first cleaning cover and second by cleanout fluid
Between cover provide cleanout fluid, utilize cleanout fluid that light shield is carried out, subsequently recycling vaccum-pumping equipment by the first cleaning cover with
Cleanout fluid between second cleaning cover is completely drawn out so that light shield is dried, when needs are exposed, by the first cleaning cover and
Two cleaning covers move to region nonoverlapping with light shield, thus avoid exposure process is produced impact, it is possible to straight in exposure machine
Tap into row optical enclosure cleaning, it is not necessary to dismounting light shield, promote the efficiency of optical enclosure cleaning, keep light shield clean, improving product production capacity and
Product quality.Present invention also offers a kind of method carrying out optical enclosure cleaning in exposure machine, it is possible to promote the effect of optical enclosure cleaning
Rate, keeps light shield clean, improving product production capacity and product quality.
Accompanying drawing explanation
In order to be able to be further understood that inventive feature and technology contents, refer to below in connection with the present invention is detailed
Illustrate and accompanying drawing, but accompanying drawing only provides reference and explanation use, be not used for the present invention is any limitation as.
In accompanying drawing,
Fig. 1 is structural representation and the method carrying out optical enclosure cleaning in exposure machine of the present invention of the exposure machine of the present invention
The schematic diagram of step 2；
Fig. 2 is the schematic diagram of the step 5 of the method carrying out optical enclosure cleaning in exposure machine of the present invention；
Fig. 3 be the present invention exposure machine in the first cleaning cover and the second cleaning cover generalized section when sealing laminating；
Fig. 4 be the present invention exposure machine in the first cleaning cover and the schematic perspective view of the second cleaning cover；
Fig. 5 is the flow chart of the method carrying out optical enclosure cleaning in exposure machine of the present invention.
Detailed description of the invention
By further illustrating the technological means and effect, being preferable to carry out below in conjunction with the present invention that the present invention taked
Example and accompanying drawing thereof are described in detail.
Refer to Fig. 1, present invention firstly provides a kind of exposure machine, including: housing 1, the light shield being located in described housing 1 carry
Platform 2, first support 3 and second support 4 and described first of both sides up and down of the mask stage 2 being respectively arranged in described housing 1
The second cleaning cover 6 of being flexibly connected with described second support 4 of the first cleaning cover 5 that support 3 is flexibly connected is first clear with described
Wash the cleanout fluid that cover 5 all connects with the second cleaning cover 6 provide equipment 7 and with described first cleaning cover 5 and the second cleaning cover 6
The vaccum-pumping equipment 8 all connected；
The centre of described mask stage 2 is provided with the hollow-out parts 21 for placing light shield.
Specifically, described mask stage 2 is also arranged above ultraviolet light source, is used for being exposed processing procedure.Described
One cleaning cover 5 is connected with described first support 3 and the second support 4 by two connecting rods respectively with the second cleaning cover 6, and described first
It is provided with bearing between support 3 and the second support 4 and connecting rod, thus described first cleaning cover 5 can do around described first support 3
Axial-rotation also does vertical lifting along described first support 3, and described second cleaning cover 6 can do axially around described second support 4
Rotate and do vertical lifting along described second support 4.Certainly, described first cleaning cover 5 and the second cleaning cover 6 and the first support 3
And the connected mode that the connected mode that second between support 4 can also be suitable for for other, as long as can complete the first cleaning cover 5 with
The motor process of the second cleaning cover 6, above-mentioned connected mode is the preferred connected mode of the present invention, does not enter the present invention
Row limits.
It should be noted that the working method of described exposure machine is: after described exposure machine exposure manufacture process terminates, i.e. expose
After the substrate completed leaves exposure machine, being carried out light shield, axial-rotation and second by described first cleaning cover 5 clean
The axial-rotation of cover 6 makes the first cleaning cover 5 and the second cleaning cover 6 lay respectively at the surface of light shield and the underface of light shield, logical
The vertical lifting of the vertical lifting and the second cleaning cover 6 of crossing described first cleaning cover 5 makes the first cleaning cover 5 and the second cleaning cover 6
Seal laminating, light shield is placed between the first cleaning cover 5 and the second cleaning cover 6, then provide equipment 7 to provide clear by cleanout fluid
Described light shield is carried out by washing liquid, is dried the light shield after cleaning by vaccum-pumping equipment 8 evacuation.It addition, it is described
During exposure machine normal exposure operation, when i.e. substrate being exposed processing procedure, for avoiding impact exposure, described first cleaning cover 5 with
Second cleaning cover 6 need to be positioned at region nonoverlapping with described light shield, is specially after cleaning, by vertical lifting and axial-rotation
The first cleaning cover 5 and the second cleaning cover 6 is made to move to above-mentioned position.Whole process need not dismount light shield, also will not be to exposure
The normal work of ray machine produces impact, it is possible to effectively promotes the efficiency of optical enclosure cleaning, promotes production capacity.
Further, referring to Fig. 3 and Fig. 4, described first cleaning cover 5 is respectively equipped with at the cover mouth of the second cleaning cover 6
First base plate 51 and the second base plate 61, described first base plate 51 and the second base plate 61 be equipped with multiple through hole, described first clear
Washing cover 5 and the second cleaning cover 6 and seal laminating at its cover mouth, described light shield is between the first base plate 51 and the second base plate 61.
The plurality of through hole is uniformly arranged on described first base plate 51 and the second base plate 61, the setting of this through hole so that described clearly
The cleanout fluid that washing liquid provides equipment 7 to provide flows on the light shield between the first base plate 51 and the second base plate 61 via through hole,
So that cleanout fluid is uniformly distributed on light shield.The cover mouth size of described first cleaning cover 5 and the second cleaning cover 6 is more than described light
The size of cover, such that it is able to be fully enclosed in described light shield between described first cleaning cover 5 and the second cleaning cover 6.
Additionally, further respectively have one or two connecting hole on described first cleaning cover 5 and the second cleaning cover 6, it is used for
Connect described cleanout fluid by connecting line and equipment 7 and vaccum-pumping equipment 8 are provided, when described first cleaning cover 5 and second cleans
When being provided only with a connecting hole respectively on cover 6, one end of described connecting line and described first cleaning cover 5 or the second cleaning cover 6
Connecting hole be connected, the other end is divided into two branch lines to connect cleanout fluid respectively provides equipment 7 and vaccum-pumping equipment 8, works as institute
State when being respectively equipped with two connecting holes on the first cleaning cover 5 and the second cleaning cover 6, then connect the respectively by two articles of connecting lines
Two connecting holes of one cleaning cover 5 or the second cleaning cover 6 provide equipment 7 and vaccum-pumping equipment 8 with cleanout fluid.
It is noted that the cover mouth edge of described first cleaning cover 5 and the second cleaning cover 6 is provided with sealing joint strip, thus
Strengthen the first cleaning cover 5 and sealing time the second cleaning cover 6 is fitted at cover mouth.
Referring to Fig. 5, the present invention also provides for a kind of method carrying out optical enclosure cleaning in exposure machine, comprises the steps:
Step 1, provide an exposure machine, including: housing 1, the mask stage 2 being located in described housing 1, be respectively arranged on described
First support 3 of the both sides up and down of the mask stage 2 in housing 1 and the second support 4 are flexibly connected with described first support 3
The second cleaning cover 6 and described first cleaning cover 5 and second that first cleaning cover 5 is flexibly connected with described second support 4 clean
The cleanout fluid that all connect of cover 6 provide equipment 7 and the evacuation that all connects with described first cleaning cover 5 and the second cleaning cover 6 to set
Standby 8；The centre of described mask stage 2 is provided with hollow-out parts 21.
Specifically, described mask stage 2 is also arranged above ultraviolet light source, is used for being exposed processing procedure.Described
One cleaning cover 5 is connected with described first support 3 and the second support 4 by two connecting rods respectively with the second cleaning cover 6, and described first
It is provided with bearing between support 3 and the second support 4 and connecting rod, thus described first cleaning cover 5 can do around described first support 3
Axial-rotation also does vertical lifting along described first support 3, and described second cleaning cover 6 can do axially around described second support 4
Rotate and do vertical lifting along described second support 4.Certainly, described first cleaning cover 5 and the second cleaning cover 6 and the first support 3
And the connected mode that the connected mode that second between support 4 can also be suitable for for other, as long as can complete the first cleaning cover 5 with
The motor process of the second cleaning cover 6, above-mentioned connected mode is the preferred connected mode of the present invention, does not enter the present invention
Row limits.
Step 2, refer to Fig. 1, in the hollow-out parts 21 of described mask stage 2, place light shield, described first cleaning cover 5 with
Second cleaning cover 6 do axial-rotation, until the first cleaning cover 5 is clear with second rotating around described first support 3 and the second support 4
Wash cover 6 and lay respectively at the surface of light shield and the underface of light shield.
Step 3, described first cleaning cover 5 are vertically lowered along described first support 3, and described second cleaning cover 6 is along described
Two supports 4 vertically rise, until the first cleaning cover 5 and the second cleaning cover 6 seal laminating, light shield are placed in the first cleaning cover 5
And between the second cleaning cover 6.
It is noted that the cover mouth edge of described first cleaning cover 5 and the second cleaning cover 6 is provided with sealing joint strip, thus
Strengthen the first cleaning cover 5 and sealing time the second cleaning cover 6 is fitted at cover mouth.
Step 4, cleanout fluid provide equipment 7 to provide cleanout fluid to be carried out described light shield, have cleaned rear evacuation and have set
Standby 8 carry out evacuation to described first cleaning cover 5 and the second cleaning cover 6, by described first cleaning cover 5 and the second cleaning cover 6 it
Between cleanout fluid be completely drawn out so that light shield is dried.
Further, referring to Fig. 3 and Fig. 4, described first cleaning cover 5 is respectively equipped with at the cover mouth of the second cleaning cover 6
First base plate 51 and the second base plate 61, described first base plate 51 and the second base plate 61 be equipped with multiple through hole, described first clear
Washing cover 5 and the second cleaning cover 6 and seal laminating at its cover mouth, described light shield is between the first base plate 51 and the second base plate 61.
The plurality of through hole is uniformly arranged on described first base plate 51 and the second base plate 61, the setting of this through hole so that described clearly
The cleanout fluid that washing liquid provides equipment 7 to provide flows on the light shield between the first base plate 51 and the second base plate 61 via through hole,
So that cleanout fluid is uniformly distributed on light shield.The cover mouth size of described first cleaning cover 5 and the second cleaning cover 6 is more than described light
The size of cover, such that it is able to be fully enclosed in described light shield between described first cleaning cover 5 and the second cleaning cover 6.
Additionally, further respectively have one or two connecting hole on described first cleaning cover 5 and the second cleaning cover 6, it is used for
Connect described cleanout fluid by connecting line and equipment 7 and vaccum-pumping equipment 8 are provided, when described first cleaning cover 5 and second cleans
When being provided only with a connecting hole respectively on cover 6, one end of described connecting line and described first cleaning cover 5 or the second cleaning cover 6
Connecting hole be connected, the other end is divided into two branch lines to connect cleanout fluid respectively provides equipment 7 and vaccum-pumping equipment 8, works as institute
State when being respectively equipped with two connecting holes on the first cleaning cover 5 and the second cleaning cover 6, then connect the respectively by two articles of connecting lines
Two connecting holes of one cleaning cover 5 or the second cleaning cover 6 provide equipment 7 and vaccum-pumping equipment 8 with cleanout fluid.
It addition, refer to Fig. 2, the described method carrying out optical enclosure cleaning in exposure machine also includes step 5, has cleaned
After, described first cleaning cover 5 vertically rises along described first support 3, and described second cleaning cover 6 is vertical along described second support 4
Decline, until the first cleaning cover 5 completely disengages from the second cleaning cover 6, the most described first cleaning cover 5 and the second cleaning cover 6
Axial-rotation is done, until described first cleaning cover 5 is positioned at the second cleaning cover 6 rotating around described first support 3 and the second support 4
Region nonoverlapping with described light shield, so that exposure machine can proceed exposure operation by the light shield after cleaning.
In sum, the invention provides a kind of exposure machine, by setting up the first cleaning cover, the second cleaning in exposure machine
Cover, cleanout fluid provide equipment and vaccum-pumping equipment, when needs carry out optical enclosure cleaning, the first cleaning cover and second are cleaned
The mobile surface to light shield of cover and underface, then the first cleaning cover and the second cleaning cover are sealed laminating so that light shield is positioned at
Between first cleaning cover and the second cleaning cover, and equipment is provided to carry between the first cleaning cover and the second cleaning cover by cleanout fluid
For cleanout fluid, utilizing cleanout fluid to be carried out light shield, the first cleaning cover and second are cleaned by recycling vaccum-pumping equipment subsequently
Cleanout fluid between cover is completely drawn out so that light shield is dried, when needs are exposed, by the first cleaning cover and the second cleaning cover
Mobile to region nonoverlapping with light shield, thus avoid exposure process is produced impact, it is possible in exposure machine, directly carry out light
Cover cleans, it is not necessary to dismounting light shield, promotes the efficiency of optical enclosure cleaning, keeps light shield clean, improving product production capacity and product quality.
Present invention also offers a kind of method carrying out optical enclosure cleaning in exposure machine, it is possible to promote the efficiency of optical enclosure cleaning, keep light
Cover cleaning, improving product production capacity and product quality.
The above, for the person of ordinary skill of the art, can be according to technical scheme and technology
Other various corresponding changes and deformation are made in design, and all these change and deformation all should belong to the claims in the present invention
Protection domain.
Claims (10)
1. an exposure machine, it is characterised in that including: housing (1), the mask stage (2) being located in described housing (1), difference
First support (3) of the both sides up and down of the mask stage (2) being located in described housing (1) and the second support (4) and described first
The second cleaning cover (6) that the first cleaning cover (5) that support (3) is flexibly connected is flexibly connected with described second support (4) and institute
State the cleanout fluid that the first cleaning cover (5) all connects with the second cleaning cover (6) provide equipment (7) and with described first cleaning cover
(5) vaccum-pumping equipment (8) that with the second cleaning cover (6) all connects；
The centre of described mask stage (2) is provided with the hollow-out parts (21) for placing light shield；
Described first cleaning cover (5) can be done axial-rotation around described first support (3) and do vertically along described first support (3)
Lifting, described second cleaning cover (6) can be done axial-rotation around described second support (4) and do perpendicular along described second support (4)
Go straight up to fall；
During cleaning, make the first cleaning by the axial-rotation of described first cleaning cover (5) and the axial-rotation of the second cleaning cover (6)
Cover (5) and the second cleaning cover (6) lay respectively at the surface of light shield and the underface of light shield, by described first cleaning cover (5)
Vertical lifting and the vertical lifting of the second cleaning cover (6) make the first cleaning cover (5) and the second cleaning cover (6) seal laminating, logical
The light shield that over cleaning liquid provides equipment (7) to provide cleanout fluid to be pointed between the first cleaning cover (5) and the second cleaning cover (6) is carried out
Clean, by vaccum-pumping equipment (8) evacuation, the light shield after cleaning is dried.
2. exposure machine as claimed in claim 1, it is characterised in that described first cleaning cover (5) and the cover of the second cleaning cover (6)
Being respectively equipped with the first base plate (51) and the second base plate (61) at Kou, described first base plate (51) is equipped with on the second base plate (61)
Multiple through holes, described first cleaning cover (5) and the second cleaning cover (6) seal laminating at its cover mouth, and described light shield is positioned at first
Between base plate (51) and the second base plate (61).
3. exposure machine as claimed in claim 2, it is characterised in that described cleanout fluid provides the cleanout fluid warp that equipment (7) provides
Flowed to be positioned between the first base plate (51) and the second base plate (61) by the through hole on the first base plate (51) and the second base plate (61)
On light shield.
4. exposure machine as claimed in claim 1, it is characterised in that during described exposure machine normal exposure operation is described first clear
Wash cover (5) and be positioned at region nonoverlapping with described light shield with the second cleaning cover (6).
5. exposure machine as claimed in claim 1, it is characterised in that described first cleaning cover (5) and the cover of the second cleaning cover (6)
Mouth edge is provided with sealing joint strip.
6. the method carrying out optical enclosure cleaning in exposure machine, it is characterised in that comprise the steps:
Step 1, provide an exposure machine, including: housing (1), the mask stage (2) being located in described housing (1), it is respectively arranged on institute
State first support (3) of the both sides up and down of mask stage (2) in housing (1) and the second support (4) and described first support
(3) the second cleaning cover (6) and described that the first cleaning cover (5) being flexibly connected is flexibly connected with described second support (4)
Cleanout fluid that one cleaning cover (5) all connects with the second cleaning cover (6) provide equipment (7) and with described first cleaning cover (5) and
The vaccum-pumping equipment (8) that second cleaning cover (6) all connects；The centre of described mask stage (2) is provided with hollow-out parts (21)；
Step 2, placement light shield, described first cleaning cover (5) and the second cleaning in the hollow-out parts (21) of described mask stage (2)
That covers (6) does axial-rotation, until the first cleaning cover (5) is clear with second rotating around described first support (3) and the second support (4)
Wash cover (6) and lay respectively at the surface of light shield and the underface of light shield；
Step 3, described first cleaning cover (5) are vertically lowered along described first support (3), described the two the second cleaning cover (6) edges
Described second support (4) vertically rises, until the first cleaning cover (5) seals laminating with the second cleaning cover (6), is placed in by light shield
Between first cleaning cover (5) and the second cleaning cover (6)；
Step 4, cleanout fluid provide equipment (7) to provide cleanout fluid to be carried out described light shield, have cleaned rear vaccum-pumping equipment
(8) described first cleaning cover (5) and the second cleaning cover (6) are carried out evacuation, described first cleaning cover (5) is cleaned with second
Cleanout fluid between cover (6) is completely drawn out so that light shield is dried.
7. the method carrying out optical enclosure cleaning in exposure machine as claimed in claim 6, it is characterised in that described first cleaning cover
(5) it is respectively equipped with the first base plate (51) and the second base plate (61), described first base plate (51) with at the cover mouth of the second cleaning cover (6)
Be equipped with multiple through hole on the second base plate (61), described first cleaning cover (5) and the second cleaning cover (6) seal at its cover mouth
Laminating, described light shield is positioned between the first base plate (51) and the second base plate (61).
8. the method carrying out optical enclosure cleaning in exposure machine as claimed in claim 7, it is characterised in that clear in described step 4
The cleanout fluid that washing liquid provides equipment (7) to provide flows to be positioned at first with the through hole on the second base plate (61) via the first base plate (51)
On light shield between base plate (51) and the second base plate (61).
9. the method as claimed in claim 6 carrying out optical enclosure cleaning in exposure machine, it is characterised in that also include step 5, clear
After washing into, described first cleaning cover (5) vertically rises along described first support (3), and described second cleaning cover (6) is along described
Two supports (4) are vertically lowered, until the first cleaning cover (5) completely disengages from the second cleaning cover (6), and the most described first cleaning cover
(5) with the second cleaning cover (6) do axial-rotation rotating around described first support (3) and the second support (4), until described first
Cleaning cover (5) and the second cleaning cover (6) are positioned at region nonoverlapping with described light shield, so that exposure machine can be by cleaning
After light shield proceed exposure operation.
10. the method carrying out optical enclosure cleaning in exposure machine as claimed in claim 6, it is characterised in that described first cleans
Cover (5) is provided with sealing joint strip with the cover mouth edge of the second cleaning cover (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610379285.3A CN106094443B (en) | 2016-05-31 | 2016-05-31 | Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610379285.3A CN106094443B (en) | 2016-05-31 | 2016-05-31 | Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106094443A true CN106094443A (en) | 2016-11-09 |
| CN106094443B CN106094443B (en) | 2017-12-29 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201610379285.3A Active CN106094443B (en) | 2016-05-31 | 2016-05-31 | Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110508524A (en) * | 2019-08-12 | 2019-11-29 | 江苏壹度科技股份有限公司 | A kind of device of cleaning light shield |
| US11287750B1 (en) | 2020-09-28 | 2022-03-29 | Changxin Memory Technologies, Inc. | Lithographic apparatus |
| US11662667B2 (en) | 2020-12-23 | 2023-05-30 | Changxin Memory Technologies, Inc. | Exposure machine |
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| JPH0235980A (en) * | 1988-07-25 | 1990-02-06 | Nec Corp | Exposure mask cleaner |
| CN202003138U (en) * | 2011-03-24 | 2011-10-05 | 京东方科技集团股份有限公司 | Exposure machine capable of cleaning maskplate |
| CN105467777A (en) * | 2015-12-14 | 2016-04-06 | 深圳市华星光电技术有限公司 | Exposure machine and photomask cleaning device |
| CN105607414A (en) * | 2016-03-28 | 2016-05-25 | 武汉华星光电技术有限公司 | Mask plate washing device and method |
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| JPH0235980A (en) * | 1988-07-25 | 1990-02-06 | Nec Corp | Exposure mask cleaner |
| CN202003138U (en) * | 2011-03-24 | 2011-10-05 | 京东方科技集团股份有限公司 | Exposure machine capable of cleaning maskplate |
| CN105467777A (en) * | 2015-12-14 | 2016-04-06 | 深圳市华星光电技术有限公司 | Exposure machine and photomask cleaning device |
| CN105607414A (en) * | 2016-03-28 | 2016-05-25 | 武汉华星光电技术有限公司 | Mask plate washing device and method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110508524A (en) * | 2019-08-12 | 2019-11-29 | 江苏壹度科技股份有限公司 | A kind of device of cleaning light shield |
| CN110508524B (en) * | 2019-08-12 | 2022-10-18 | 江苏壹度科技股份有限公司 | Device for cleaning photomask |
| US11287750B1 (en) | 2020-09-28 | 2022-03-29 | Changxin Memory Technologies, Inc. | Lithographic apparatus |
| US11662667B2 (en) | 2020-12-23 | 2023-05-30 | Changxin Memory Technologies, Inc. | Exposure machine |
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|---|---|
| CN106094443B (en) | 2017-12-29 |
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