CN219399446U - Dry etching machine exhaust treatment equipment with improved air inlet end - Google Patents
Dry etching machine exhaust treatment equipment with improved air inlet end Download PDFInfo
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- CN219399446U CN219399446U CN202320235161.3U CN202320235161U CN219399446U CN 219399446 U CN219399446 U CN 219399446U CN 202320235161 U CN202320235161 U CN 202320235161U CN 219399446 U CN219399446 U CN 219399446U
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Abstract
A dry etcher exhaust gas treatment device with improved inlet end, comprising: the upper part of the air inlet end pipe body is provided with an air inlet flange tee joint communicated with waste gas, the lower part of the air inlet end pipe body is provided with an air inlet head assembly, and the side end of the lower part of the air inlet end pipe body is connected with a water inlet; a cylinder body is arranged in the air inlet end pipe body; a cartridge comprising: an upper large cylindrical portion, a middle transition portion, and a lower small cylindrical portion; the upper large cylinder part is a hollow cylinder, the hollow cylinder surrounds the air inlet flange tee joint and keeps a set gap with the air inlet flange tee joint, the middle transition part is a conical body with a big upper part and a small lower part, and the lower small cylinder part is a hollow cylinder and is in sealing connection with the air inlet head assembly. According to the utility model, the flow direction of circulating water in the air inlet end of the machine is changed by adding the cylindrical body part, so that waste gas is continuously diluted and discharged by the circulating water, and the phenomenon that products are continuously accumulated to cause crystallization blockage is avoided. The phenomenon of no crystallization blockage at the rear air inlet end is improved, the machine downtime caused by pipeline blockage due to crystallization at the air inlet end is avoided, the utilization rate of the machine is improved, and the productivity is improved.
Description
Technical Field
The utility model belongs to the technical field of waste gas treatment equipment, and particularly relates to waste gas treatment equipment of a dry etching machine with an improved air inlet end.
Background
With the development of display technology, flat display devices such as liquid crystal displays have been widely used in various consumer electronic products such as mobile phones, televisions, personal digital assistants, digital cameras, notebook computers, and desktop computers, and have become the mainstream of display devices, because of their advantages such as high image quality, power saving, thin body, and wide application range.
Most of the liquid crystal display devices in the market are backlight type liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is that liquid crystal molecules are placed in two parallel glass substrates, a plurality of vertical and horizontal tiny wires are arranged between the two glass substrates, the direction of the liquid crystal molecules is controlled to change by electrifying or not, and the light rays of the backlight module are refracted out to generate pictures.
The liquid crystal display panel generally comprises a color film substrate, a thin film transistor substrate, and a liquid crystal and sealant frame sandwiched between the color film substrate and the thin film transistor substrate, and the molding process generally comprises: front array process (film, yellow light, etching and stripping), middle box process (bonding of TFT substrate and CF substrate), and back module assembly process (lamination of drive IC and printed circuit board). Wherein, the front stage Array process mainly forms a TFT substrate so as to control the movement of liquid crystal molecules; the middle Cell process mainly comprises adding liquid crystal between a TFT substrate and a CF substrate; the back-end module assembly process is mainly to integrate the lamination of the driving IC and the printed circuit board so as to drive the liquid crystal molecules to rotate and display images.
The process of fabricating a liquid crystal display, particularly a thin film transistor array substrate, often requires dry etching equipment, and exhaust gas generated from the dry etching equipment is treated by dry etching equipment. The dry etching machine exhaust gas treatment device (for example, the Wet water washing series model EcoWet manufactured by Taiwan up-to-date company, inc.) is used for treating the exhaust gas (including helium, chlorine, sulfur hexafluoride, carbon tetrafluoride, etc.) of the process chamber of the dry etching device, so that the exhaust gas discharged by the machine after treatment reaches the national emission standard. In the production process, a large amount of waste gas products crystallize at the air inlet end (shown in figure 1) of the waste gas treatment equipment to cause pipeline blockage, the machine is down and can not be produced, and the machine productivity is greatly influenced by the need of regular cleaning and maintenance.
Disclosure of Invention
The utility model aims to provide dry etching machine waste gas treatment equipment with an improved air inlet end.
The utility model is realized in the following way:
a dry etcher exhaust gas treatment device with improved inlet end, comprising: the upper part of the air inlet end pipe body is provided with an air inlet flange tee joint communicated with waste gas, the lower part of the air inlet end pipe body is provided with an air inlet head assembly, and the side end of the lower part of the air inlet end pipe body is connected with a water inlet;
a cylindrical body is arranged in the air inlet end pipe body;
the cylinder includes: an upper large cylindrical portion, a middle transition portion, and a lower small cylindrical portion;
the upper large cylinder part is a hollow cylinder, which is arranged around the air inlet flange tee joint and keeps a set gap with the air inlet flange tee joint,
the middle transition part is a conical body with a large upper part and a small lower part,
the lower small cylinder part is a hollow cylinder and is in sealing connection with the air inlet head assembly.
Further, the gap which is formed by surrounding the air inlet flange tee joint and keeping the upper large cylinder part is 10mm.
Further, the cylinder is made of teflon.
Further, the thickness of the cylindrical body is 5mm.
Further, the height of the cylinder is 100mm, wherein the height of the upper large cylinder is 70mm, the outer diameter is 90mm, the height of the middle transition part is 10mm, and the height of the lower small cylinder is 20mm, the outer diameter is 75mm.
The utility model has the advantages that: through newly increasing the tube-shape body part, change the board inlet end inside circulating water flow direction, water gets into from the water inlet, overflows the tube-shape body lateral wall, reaches the tube-shape body top, flows into the tube-shape body inside from the big tube-shape portion in upper portion again, makes waste gas last by circulating water diluted treatment and discharge, avoids the resultant to last accumulation, leads to the crystallization jam. The phenomenon of no crystallization blockage at the rear air inlet end is improved, the machine downtime caused by pipeline blockage due to crystallization at the air inlet end is avoided, the utilization rate of the machine is improved, and the productivity is improved.
Drawings
The utility model will be further described with reference to the accompanying drawings, in conjunction with examples.
Fig. 1 is a schematic view showing the structure of an air inlet end of a dry etching machine according to the prior art.
Fig. 2 is a cross-sectional view of a cartridge in the present utility model.
FIG. 3 is a schematic view of the structure of the air inlet end of the dry etching machine according to the present utility model.
Reference numerals:
the air inlet device comprises a 1-air inlet end tubular body, a 2-air inlet flange tee joint, a 3-air inlet head assembly, a 4-water inlet, a 5-tubular body, a 51-upper large tubular part, a 52-middle transition part and a 53-lower small tubular part.
Detailed Description
As shown in fig. 2 and 3, a dry etching machine exhaust gas treatment apparatus with an improved air inlet end, comprising: an air inlet flange tee joint 2 for communicating waste gas is arranged at the upper part of the air inlet end pipe body 1, an air inlet head assembly 3 is arranged at the lower part of the air inlet end pipe body, and the side end of the lower part of the air inlet end pipe body is connected with a water inlet 4;
a cylindrical body 5 is arranged in the air inlet end pipe body 1;
the cylindrical body 5 includes: an upper large cylindrical portion 51, a middle transition portion 52, and a lower small cylindrical portion 53;
the upper large cylinder part 51 is a hollow cylinder, and surrounds the air inlet flange tee joint 2 and maintains a set gap with the air inlet flange tee joint, wherein the gap is 10mm;
the middle transition part 52 is a conical body with a large upper part and a small lower part;
the lower small cylinder part 53 is a hollow cylinder and is connected with the air inlet head assembly 3 in a sealing way.
The cylindrical body 5 is made of teflon.
The thickness of the cylindrical body 5 is 5mm and the height is 100mm, wherein the height of the upper large cylindrical portion 51 is 70mm, the outer diameter is 90mm, the height of the middle transition portion 52 is 10mm, the height of the lower small cylindrical portion 53 is 20mm, and the outer diameter is 75mm.
According to the utility model, through adding the cylindrical body part, the flow direction of circulating water in the air inlet end of the machine is changed, water enters from the water inlet, overflows the outer side wall of the cylindrical body and reaches the top of the cylindrical body, and then flows into the cylindrical body from the upper large cylindrical part, so that waste gas is continuously diluted and discharged by the circulating water, and the phenomenon that products are continuously accumulated to cause crystallization blockage is avoided. The phenomenon of no crystallization blockage at the rear air inlet end is improved, the machine downtime caused by pipeline blockage due to crystallization at the air inlet end is avoided, the utilization rate of the machine is improved, and the productivity is improved.
Before transformation (i.e. the prior art), the dry etching machine is produced for about one week, and the product crystals at the air inlet end of the waste gas treatment equipment are blocked and need to be shut down for cleaning. The waste gas before transformation is discharged on the surface of the circulating water, and the continuous accumulation can cause crystallization.
After the technical scheme of the utility model is modified, the waste gas is directly washed, diluted and discharged by the circulating water continuously, the crystallization phenomenon caused by dust accumulation removal of the air inlet is avoided, the machine operates normally, the utilization rate of the machine is improved, the productivity is improved, the modification test is effective, and the purpose of planning is achieved.
The above examples and drawings are not intended to limit the form or form of the present utility model, and any suitable variations or modifications thereof by those skilled in the art should be construed as not departing from the scope of the present utility model.
Claims (5)
1. A dry etcher exhaust gas treatment device with improved inlet end, comprising: the upper part of the air inlet end pipe body is provided with an air inlet flange tee joint communicated with waste gas, the lower part of the air inlet end pipe body is provided with an air inlet head assembly, and the side end of the lower part of the air inlet end pipe body is connected with a water inlet; the method is characterized in that:
a cylindrical body is arranged in the air inlet end pipe body;
the cylinder includes: an upper large cylindrical portion, a middle transition portion, and a lower small cylindrical portion;
the upper large cylinder part is a hollow cylinder, which is arranged around the air inlet flange tee joint and keeps a set gap with the air inlet flange tee joint,
the middle transition part is a conical body with a large upper part and a small lower part,
the lower small cylinder part is a hollow cylinder and is in sealing connection with the air inlet head assembly.
2. A dry etching machine exhaust gas treatment apparatus with an improved air inlet as set forth in claim 1, wherein: the upper large cylinder part is surrounded around the air inlet flange tee joint and keeps a set gap of 10mm with the air inlet flange tee joint.
3. A dry etching machine exhaust gas treatment apparatus with an improved air inlet as set forth in claim 1, wherein: the cylinder is made of teflon.
4. A dry etching machine exhaust gas treatment apparatus with an improved air inlet as set forth in claim 1, wherein: the thickness of the cylinder is 5mm.
5. A dry etching machine exhaust gas treatment apparatus with an improved air inlet as set forth in claim 1, wherein: the height of the cylinder body is 100mm, wherein the height of the upper large cylinder part is 70mm, the outer diameter is 90mm, the height of the middle transition part is 10mm, and the height of the lower small cylinder part is 20mm, and the outer diameter is 75mm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202320235161.3U CN219399446U (en) | 2023-02-16 | 2023-02-16 | Dry etching machine exhaust treatment equipment with improved air inlet end |
Applications Claiming Priority (1)
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CN202320235161.3U CN219399446U (en) | 2023-02-16 | 2023-02-16 | Dry etching machine exhaust treatment equipment with improved air inlet end |
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Publication Number | Publication Date |
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CN219399446U true CN219399446U (en) | 2023-07-25 |
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CN202320235161.3U Active CN219399446U (en) | 2023-02-16 | 2023-02-16 | Dry etching machine exhaust treatment equipment with improved air inlet end |
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2023
- 2023-02-16 CN CN202320235161.3U patent/CN219399446U/en active Active
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