CN202794840U - Dust-proof protective device for photomask plate - Google Patents
Dust-proof protective device for photomask plate Download PDFInfo
- Publication number
- CN202794840U CN202794840U CN 201220520484 CN201220520484U CN202794840U CN 202794840 U CN202794840 U CN 202794840U CN 201220520484 CN201220520484 CN 201220520484 CN 201220520484 U CN201220520484 U CN 201220520484U CN 202794840 U CN202794840 U CN 202794840U
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- China
- Prior art keywords
- dust
- protecting device
- photomask board
- proof protective
- protective film
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model provides a dust-proof protective device for a photomask plate. The dust-proof protective device is characterized in that a slideable moving window is additionally arranged on an open pore of a frame, when fine dust grains exist between the photomask plate and the dust-proof protecting film, the moving window is opened, a dust absorption pipe stretches into the open pore so as to suck out and take away the fine dust grains through a dust absorption principle; and a step that a dust-proof protecting film is removed and cleaned again is avoided, so that the cleaning time is saved, and the condition that the patterns on the photomask plate are damaged caused by removing the dust-proof protecting film can be avoided.
Description
Technical field
The utility model relates to the flat pannel display such as PDP, FED, LCD, and CRT relates in particular to a kind of photomask board (Photo mask blanks) anti-dust protecting device with fields such as shadow mask, printed circuit board (PCB), semiconductors.
Background technology
In exposure manufacture process, if polluted by dust particale on the photomask board, the image that then can form a distortion so namely produces a flaw on wafer on wafer.In order to increase the wafer manufacture yield, reduce simultaneously the number of times that cleans and check when photomask board uses, usually can at photomask board surface coverage last layer dust-proof protective film, directly drop in the photomask board surface in order to prevent dust particale.
When utilizing applying glue and framework that dust-proof protective film is covered on the photomask board surface, be subjected to the impact of the each side factors such as environment, machine, personnel, indivedual dust particales can be coated over the dust-proof protective film the inside, thereby are adsorbed on the photomask board surface.At this moment, just dust-proof protective film need to be removed, dust particale is removed, then again clean photomask board, paste again new dust-proof protective film.
Specifically please refer to Fig. 1 and Fig. 2, anti-dust protecting device for the protection of photomask board 10 in the prior art generally includes dust-proof protective film 20 and is used for the fixedly framework 60 of dust-proof protective film 20, and the space 60 ' that dust-proof protective film 20 and framework 60 limit covers the area of the pattern of photomask board 10; When having dust particale 30 to be coated in the space 60 ' that dust-proof protective film 20 and photomask board 10 limit, need first with dust-proof protective film 20 dismountings.Be to use a metal crow bar 50 to be placed on the crow bar fulcrum 40 as instrument during dismounting, utilize lever principle with dust-proof protective film 20 perks, then remove.In this course, crow bar fulcrum 40 may cause scratch to the figure on the photomask board 10, thereby causes scrapping of photomask board 10.On the other hand, after dust-proof protective film 20 is removed, need again to clean, and then paste new dust-proof protective film 20, this process will prolong the fabrication cycle of photomask board 10, incur loss through delay wafer manufacture, and serious meeting causes customer complaint.
The utility model content
The utility model proposes a kind of anti-dust protecting device for photomask board, its purpose is: convenient removal dust-proof protective film and the dust particale between the photomask board.
To achieve these goals, the anti-dust protecting device that is used for photomask board that the utility model proposes, described photomask board has area of the pattern, described anti-dust protecting device comprises dust-proof protective film and the framework that is used for fixing described dust-proof protective film, and the space that described dust-proof protective film and described framework limit covers described area of the pattern; Described anti-dust protecting device also comprises at least one Moving Window, offers at least one perforate on the described framework, and described Moving Window is slidingly mounted on described tapping.
Further, comprise that also one extend into sweep-up pipe in the described space by described perforate.
Further, also comprise the draw-in groove that is arranged on the described framework, described Moving Window is slidingly mounted on described tapping by described draw-in groove.
Further, described framework comprises a plurality of end to end frames.
Further, described framework comprises four end to end frames.
Further, described four frames are the rectangle strip.
Further, the height of described framework is 3mm ~ 7mm.
Further, offer at least a perforate on each frame.
Further, wherein respectively offer a perforate on two adjacent frames.
Further, described perforate is shaped as rectangle, circle or triangle.
Further, described dust-proof protective film is rectangle.
Compared with prior art; the beneficial effects of the utility model are mainly reflected in: add slidably Moving Window in the perforate of framework; when having dust particale between photomask board and the dust-proof protective film; open Moving Window; use sweep-up pipe to stretch into the dust particale sucking-off and remove from perforate by the dust suction principle; avoided the step removing dust-proof protective film and again clean dust-proof protective film, saved clearance time, in the time of can also avoiding removing dust-proof protective film to the injury of pattern on the photomask board.
Description of drawings
Fig. 1 is the structural representation of dust particale on photomask board;
Fig. 2 is the structural representation of removing dust-proof protective film in the prior art;
Fig. 3 is the structural representation of the anti-dust protecting device that is used for photomask board of the utility model one embodiment.
Embodiment
For the ease of understanding, come the utility model is carried out the description in a step below in conjunction with specific embodiment.
Please refer to Fig. 3, in the utility model, a kind of anti-dust protecting device for photomask board is proposed, described photomask board 11 has the area of the pattern (not shown), described anti-dust protecting device comprises dust-proof protective film 21 and the framework 61 that is used for fixing described dust-proof protective film 21, described dust-proof protective film 21 is attached on the described framework 61 by bonding agent, the space that described dust-proof protective film 21 and described framework 61 limit covers described area of the pattern, and described framework 61 is attached on the described photomask board 11 by bonding agent; Described anti-dust protecting device also comprises at least one Moving Window 71, offers at least one perforate 81 on the described framework 61, and described Moving Window 71 is slidingly mounted on described perforate 81 places.When having dust particale 31 between photomask board 11 and the dust-proof protective film 21, open Moving Window 70, can be by the dust suction principle from perforate 81 with dust particale 31 sucking-offs and remove.
In the present embodiment; described anti-dust protecting device for photomask board comprises that also one extend into sweep-up pipe 90 in the described space by described perforate 81; with hand control sweep-up pipe 90 contact dust particales 31; stick on the sweep-up pipe 90 according to absorption principle dust particale 31; take out sweep-up pipe 90 with hand again, thereby remove dust particale 31.
In the present embodiment, described anti-dust protecting device for photomask board also comprises the draw-in groove (not shown) that is arranged on the described framework 61, and described Moving Window 71 is slidingly mounted on described perforate 81 places by described draw-in groove.In other embodiment of the present utility model, Moving Window 71 also can be installed in described perforate 81 places by other means, for example is that thimble is installed, and it should be noted that thimble is installed need guarantee that Moving Window 71 can open and close.
In the present embodiment, described framework 61 comprises four end to end frames, and four frames are the rectangle strip, is complementary with the shape of the area of the pattern of photomask 11.Certainly; in other embodiment of the present utility model; the shape of described framework 61 also can be made adaptations according to the shape of the area of the pattern on the photomask 11; for example; described framework 61 also can comprise five end to end frames, also or, described framework 61 is annular; as long as guarantee that dust-proof protective film 21 can the overlay pattern zone, prevent from that dust particale 31 from directly dropping to get final product in photomask board 11 surfaces.Wherein, the shape of each frame also can adaptations, not only is confined to the rectangle strip.
In the present embodiment, only respectively offer a perforate 81 on two adjacent frames therein, two other adjacent frame is not offered perforate, reduces cost of manufacture.In other embodiment of the present utility model, also can on each frame, all offer a perforate 81, each place of area of the pattern of being convenient to 90 pairs of described photomask boards 21 of sweep-up pipe is cleared up.The height of described framework 61 for example is 4mm, 5mm or 6mm.
In the present embodiment, described perforate 81 be shaped as rectangle.Be understandable that perforate 81 and Moving Window 71 on the framework 61 are not limit shape, can be the shapes such as circle, rectangle and triangle.Mate as long as guarantee Moving Window 71 and the size of perforate 81, guarantee its sealing, can not allow dust particale enter when Moving Window 71 covers perforate 81 and get final product, guarantee photomask board 11 is not contaminated like this.
In the present embodiment, described dust-proof protective film 21 is rectangle, is made by transparent high molecular polymer, is convenient to seeing through of light.Certainly, described dedusting diaphragm 21 can be set to according to the requirement of technique other shapes, is perhaps made by other transparent material.
In conjunction with shown in Figure 3; the principle of work of described anti-dust protecting device for photomask board is as follows: in use; under normal circumstances; Moving Window 71 is closed; perforate 81 does not allow dust particale 31 enter; when dust particale 31 enters and sticks to photomask board 11 surperficial; just need to open Moving Window 71 pullings; stretch into sweep-up pipe 90, allow sweep-up pipe 90 contact dust particales 31, based on absorption principle; dust particale 31 can be adsorbed on the sweep-up pipe 90; remove subsequently sweep-up pipe 90, close again Moving Window 71, thereby reach the purpose of clean photomask board 11.
The anti-dust protecting device that is used for photomask board that the utility model proposes; by adding slidably Moving Window in the perforate of framework; when the dust particale that exists between photomask board and the dust-proof protective film; open Moving Window; use sweep-up pipe to stretch into the dust particale sucking-off and remove from perforate by the dust suction principle; avoided the step removing dust-proof protective film and again clean dust-proof protective film, saved clearance time, in the time of can also avoiding removing dust-proof protective film to the injury of pattern on the photomask board.
Only be preferred embodiment of the present utility model in sum, the utility model do not played any restriction.Any person of ordinary skill in the field; in the scope that does not break away from the technical solution of the utility model; technical scheme and technology contents that the utility model discloses are made any type of changes such as replacement or modification that are equal to; all belong to the content that does not break away from the technical solution of the utility model, still belong within the protection domain of the present utility model.
Claims (11)
1. anti-dust protecting device that is used for photomask board, described photomask board has area of the pattern, described anti-dust protecting device comprises dust-proof protective film and the framework that is used for fixing described dust-proof protective film, and the space that described dust-proof protective film and described framework limit covers described area of the pattern; It is characterized in that described anti-dust protecting device also comprises at least one Moving Window, offer at least one perforate on the described framework, described Moving Window is slidingly mounted on described tapping.
2. the anti-dust protecting device for photomask board as claimed in claim 1 is characterized in that, comprises that also one extend into sweep-up pipe in the described space by described perforate.
3. the anti-dust protecting device for photomask board as claimed in claim 1 is characterized in that, also comprises the draw-in groove that is arranged on the described framework, and described Moving Window is slidingly mounted on described tapping by described draw-in groove.
4. the anti-dust protecting device for photomask board as claimed in claim 1 is characterized in that, described framework comprises a plurality of end to end frames.
5. the anti-dust protecting device for photomask board as claimed in claim 4 is characterized in that, described framework comprises four end to end frames.
6. the anti-dust protecting device for photomask board as claimed in claim 4 is characterized in that, described four frames are the rectangle strip.
7. the anti-dust protecting device for photomask board as claimed in claim 4 is characterized in that, the height of described framework is 3mm ~ 7mm.
8. the anti-dust protecting device for photomask board as claimed in claim 4 is characterized in that, offers at least a perforate on each frame.
9. the anti-dust protecting device for photomask board as claimed in claim 4 is characterized in that, wherein respectively offers a perforate on two adjacent frames.
10. the anti-dust protecting device for photomask board as claimed in claim 1 is characterized in that, described perforate be shaped as rectangle, circle or triangle.
11. such as each described anti-dust protecting device for photomask board in the claim 1 to 10, it is characterized in that described dust-proof protective film is rectangle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220520484 CN202794840U (en) | 2012-10-11 | 2012-10-11 | Dust-proof protective device for photomask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220520484 CN202794840U (en) | 2012-10-11 | 2012-10-11 | Dust-proof protective device for photomask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202794840U true CN202794840U (en) | 2013-03-13 |
Family
ID=47822075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220520484 Expired - Fee Related CN202794840U (en) | 2012-10-11 | 2012-10-11 | Dust-proof protective device for photomask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202794840U (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105128503A (en) * | 2015-09-07 | 2015-12-09 | 深圳市路维光电股份有限公司 | Optical film prying and removing method |
| CN107111224A (en) * | 2014-11-17 | 2017-08-29 | Asml荷兰有限公司 | Equipment |
| WO2018023838A1 (en) * | 2016-08-05 | 2018-02-08 | 常州瑞择微电子科技有限公司 | Novel protection film for preventing from growing haze on photomask |
| CN109814333A (en) * | 2019-01-25 | 2019-05-28 | 上海微择科技有限公司 | A kind of light shield film of high performance anti-pollution particle |
| CN111128678A (en) * | 2019-12-17 | 2020-05-08 | 无锡中微掩模电子有限公司 | Method for removing particles on mask protective film |
| CN111876725A (en) * | 2020-07-31 | 2020-11-03 | 京东方科技集团股份有限公司 | Combined mask plate and mask supporting plate thereof |
| TWI758378B (en) * | 2016-12-22 | 2022-03-21 | 日商信越化學工業股份有限公司 | Dust-proof film module frame and dust-proof film module using the same |
-
2012
- 2012-10-11 CN CN 201220520484 patent/CN202794840U/en not_active Expired - Fee Related
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107111224A (en) * | 2014-11-17 | 2017-08-29 | Asml荷兰有限公司 | Equipment |
| US10969701B2 (en) | 2014-11-17 | 2021-04-06 | Asml Netherlands B.V. | Pellicle attachment apparatus |
| US11003098B2 (en) | 2014-11-17 | 2021-05-11 | Asml Netherlands B.V | Pellicle attachment apparatus |
| US11009803B2 (en) | 2014-11-17 | 2021-05-18 | Asml Netherlands B.V. | Mask assembly |
| CN105128503A (en) * | 2015-09-07 | 2015-12-09 | 深圳市路维光电股份有限公司 | Optical film prying and removing method |
| CN105128503B (en) * | 2015-09-07 | 2019-02-01 | 深圳市路维光电股份有限公司 | Optical film sled removes method |
| WO2018023838A1 (en) * | 2016-08-05 | 2018-02-08 | 常州瑞择微电子科技有限公司 | Novel protection film for preventing from growing haze on photomask |
| TWI758378B (en) * | 2016-12-22 | 2022-03-21 | 日商信越化學工業股份有限公司 | Dust-proof film module frame and dust-proof film module using the same |
| CN109814333A (en) * | 2019-01-25 | 2019-05-28 | 上海微择科技有限公司 | A kind of light shield film of high performance anti-pollution particle |
| CN111128678A (en) * | 2019-12-17 | 2020-05-08 | 无锡中微掩模电子有限公司 | Method for removing particles on mask protective film |
| CN111876725A (en) * | 2020-07-31 | 2020-11-03 | 京东方科技集团股份有限公司 | Combined mask plate and mask supporting plate thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130313 Termination date: 20181011 |