CN108873603A - The devices and methods therefor of cleaning light shield - Google Patents
The devices and methods therefor of cleaning light shield Download PDFInfo
- Publication number
- CN108873603A CN108873603A CN201810956074.0A CN201810956074A CN108873603A CN 108873603 A CN108873603 A CN 108873603A CN 201810956074 A CN201810956074 A CN 201810956074A CN 108873603 A CN108873603 A CN 108873603A
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- Prior art keywords
- light shield
- cleaning
- unit
- heater
- drying
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
The application provides a kind of devices and methods therefor of cleaning light shield, the device of the cleaning light shield, including:One body;One conveying device comprising one can carry the load bearing unit of light shield, can move into light shield in the body;One cleaning unit is set in the fixed frame of the body, and the cleaning unit includes a cleaning head that can correspond to light shield stretching or retraction;And a heating unit, it is set to the bottom of the body, cleaning solution is heated to proper temperature.
Description
Technical field
This application involves display fields, more particularly to a kind of devices and methods therefor of cleaning light shield.
Background technique
In field of display technology, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat-panel monitors such as display (Organic Light Emitting Diode, OLED) oneself through gradually replacing cathode-ray tube
(Cathode Ray Tube, CRT) display, be widely used in LCD TV, mobile phone, personal digital assistant, digital camera,
Computer screen or laptop screen etc..
Glass light shield, also referred to as light shield, photomask, MASK, optical glass, common glass light are covered with chromium plate, dry plate etc.,
Refer to and use high-quality quartz glass or soda glass as substrate, plates one layer of crome metal and photoresists above it, become one
Kind photosensitive material, is exposed on designed circuitous pattern on photoresists by laser equipment precision positioning, the area being exposed
Domain developed can come out, and form the product of circuitous pattern on crome metal after overetch, demoulding.
And in the manufacturing process of flat-panel monitor, it can repeatedly utilize patterning processes.Specifically, in the base for being coated with photoresist
Light shield (Mask) is placed above plate, then substrate is exposed using exposure machine, specifically, exposure machine is by opening super-pressure
Mercury vapor lamp issues ultraviolet light (Ultraviolet, UV) light, and the image information on light shield is transferred to the substrate table for being coated with photoresist
On face, the pattern based on light shield, photoresist has the part being exposed and the part not being exposed.Recycle developer solution to photoetching
Glue develops, and can remove the part that photoresist is exposed, and retains the part (positive photoresist) that photoresist is not exposed, or
Person removes the part that photoresist is not exposed, retains the part (negative photoresist) that photoresist is exposed, to make photoresist shape
At required figure.
In the manufacturing process of patterning processes, when UV illumination is mapped on substrate, the initiator scission of link on substrate will cause
Small molecule is formed, small molecule and solvent intermiscibility are preferable, can dissolve in a solvent, and evaporate into air with solvent, and then attached
On light shield, cause light shield to be atomized.After light shield atomization, pattern (Pattern) can be deformed on light shield, eventually by light shield
The deformation of products of formation, influences product quality.In addition environmental problem also results in and is formed with impurity on light shield in board
(particle), it equally will affect product quality.
It just needs to clean light shield after light shield is dirty, the cleaning method generallyd use at present is:By light shield from exposure
It is removed on machine, then is transported on optical enclosure cleaning machine and is cleaned, be installed on exposure machine again after washing.
About the cleaning of light shield, more develop in recent years it is a kind of using seismic wave caused by gas or fluid by particle from
Reticle surface removal, the equipment cost of this cleaning technique is high, while raising due to it is that particle is enabled to be acted on by seismic wave, but its
Vacuum equipment not necessarily can effectively siphon away particle, and particle is caused further to pollute other equipment and material.
And current cleaning method is mainly to be rotated with the cleaning solution cooperation driving light shield of flow-like, is using clear
The tractive force for washing process medium fluid causes particle to rotate, and is the removed Main physical mechanism of particle, and work as potassium hydroxide (KOH)
For mixed liquid in tank heater (Tank Heater) if encountering leakage, Drug leakage causes line short (such as to heater connecting line
Shown in Fig. 1), burning out heater causes two heaters that can not heat, and causes light shield in cleaning process, cleaning capacity decline.
Double-heater (Heater) route is a series loop (as shown in Figure 2):First, in case of line short etc. is different
Often, two heaters (Heater) will be unable to work, and heating stops;Second, single a heater (Heater) damage, route will
Open circuit, whole group heater (Heater) do not work, and heating stops, and influence auxiliary device working efficiency, and double-heater
(Heater) device of the connecting line without anticorrosive property, potassium hydroxide (KOH), which mixes liquid, has corrosivity, and route is easy by mixed corrosion
Electric leakage, open circuit afterwards.
Therefore, the main purpose of the application is to provide a kind of devices and methods therefor of cleaning light shield, with more optimized above-mentioned
The problem mentioned.
Summary of the invention
In order to solve the above-mentioned technical problem, the purpose of the application is, provides a kind of device of cleaning light shield, including:One
Body;One conveying device comprising one can carry the load bearing unit of light shield, can move into light shield in the body;One cleaning is single
Member is set in the fixed frame of the body, and the cleaning unit includes a cleaning head that can correspond to light shield stretching or retraction;
And a heating unit, it is set to the bottom of the body, cleaning solution is heated to proper temperature.
The another object of the application is a kind of device of cleaning light shield, including:One body;One conveying device comprising one
The load bearing unit of light shield can be carried, light shield can be moved into the body;One cleaning unit is set to the fixed frame of the body
In frame, the cleaning unit includes a cleaning head that can correspond to light shield stretching or retraction;And a heating unit, it is set to described
The bottom of body, cleaning solution is heated to proper temperature;Wherein, the heating unit further include a primary heater and
One secondary heater;The primary heater and the secondary heater are connected in a manner of parallel circuit;The cleaning unit into
One step corresponds to light shield charging side in cleaning head and is equipped with a removal unit, can remove in advance before wiping light shield micro- on light shield
Grain.
The further object of the application is a kind of method of cleaning light shield, including:One body is provided;One conveying device is provided,
It has a load bearing unit that can carry light shield, can move into light shield in body;One cleaning unit is provided, the body is set to
Fixed frame in, the cleaning unit have one can correspond to light shield stretch out or retraction cleaning head;And provide a heating list
Member is set to the bottom of the body, cleaning solution is heated to proper temperature.
It the purpose of the application and solves its technical problem and adopts the following technical solutions to realize.
In the embodiment of the application, the heating unit further includes a primary heater and a secondary heater,
Respectively to heat cleaning solution.
In the embodiment of the application, the primary heater and the secondary heater are connected in a manner of parallel circuit
It connects.
In the embodiment of the application, the cleaning unit further corresponds to light shield discharging side in cleaning head and is equipped with one
Drying unit, for drying the light shield after cleaning immediately using compression drying air or nitrogen when light shield is after wiping.
In the embodiment of the application, the drying unit has a heating component, so that it is can provide hot compression dry
Air or hot nitrogen further promote its drying effect.
In the embodiment of the application, the method for the cleaning light shield, the heating unit further includes one first heating
Device and a secondary heater, respectively to heat cleaning solution.
In the embodiment of the application, the method for the cleaning light shield, the primary heater and it is described second heating
Device is connected in a manner of parallel circuit.
In the embodiment of the application, the method for the cleaning light shield, the cleaning unit is further in cleaning head pair
Light shield discharging side is answered to be equipped with a drying unit, for when light shield is after wiping, immediately using compression drying air or nitrogen
Light shield after drying cleaning.
The application can prevent leakage etching lines from short circuit occur, increase board safety;Prevent a heater failure from going out
Existing open circuit, causes another heater that cannot work, and increases cleaning light shield stability in board work;And parallel circuit can control
Multiple components work independently, and are independent of each other after each component damage.
Detailed description of the invention
Fig. 1 is the Drug leakage of example formula to heater connecting line schematic diagram.
Fig. 2 is the series loop circuit diagram of the double-heater route of example formula.
Fig. 3 a is the shunt circuit circuit diagram of the double-heater route of one embodiment of the application.
Fig. 3 b is the double-heater schematic diagram of one embodiment of the application.
Fig. 4 a is the schematic device of the cleaning light shield of one embodiment of the application.
Fig. 4 b is the schematic device of the cleaning light shield of another embodiment of the application.
Fig. 4 c is the heating unit schematic diagram in the device of the cleaning light shield of one embodiment of the application.
Fig. 5 is the method flow diagram of the cleaning light shield of one embodiment of the application.
Specific embodiment
The explanation of following embodiment is to can be used to the particular implementation of implementation to illustrate the application with reference to additional schema
Example.The direction term that the application is previously mentioned, such as "upper", "lower", "front", "rear", "left", "right", "inner", "outside", " side "
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used be to illustrate and understand the application, rather than to
Limit the application.
Attached drawing and explanation are considered inherently illustrative, rather than restrictive.The similar list of structure in the figure
Member is to be given the same reference numerals.In addition, in order to understand and be convenient for description, the size and thickness of each component shown in the accompanying drawings are
It is arbitrarily shown, but the application is without being limited thereto.
In the accompanying drawings, for clarity, the thickness in layer, film, panel, region etc. is exaggerated.In the accompanying drawings, in order to understand
With convenient for description, the thickness of some layer and region is exaggerated.It will be appreciated that ought such as layer, film, region or substrate component quilt
Referred to as " " another component "upper" when, the component can be directly on another component, or there may also be middle groups
Part.
In addition, in the description, unless explicitly described as opposite, otherwise word " comprising " will be understood as meaning to wrap
The component is included, but is not excluded for any other component.In addition, in the description, " above " means to be located at target group
Part either above or below, and be not intended to must be positioned on the top based on gravity direction.
Further to illustrate that the application is the technical means and efficacy reaching predetermined goal of the invention and being taken, below in conjunction with
Attached drawing and specific embodiment, the devices and methods therefor to a kind of cleaning light shield proposed according to the application, specific embodiment party
Formula, structure, feature and its effect, detailed description is as follows.
Fig. 3 a is the shunt circuit circuit diagram of the double-heater route of one embodiment of the application and Fig. 3 b is that the application one is real
Apply the double-heater schematic diagram of example.Fig. 3 a and Fig. 3 b is please referred to, in the embodiment of the application, a kind of double-heater route
Shunt circuit circuit 10, including:One power switch 130, a primary heater 110 and a secondary heater 120;Described first adds
Hot device 110 and the secondary heater 120 are connected in a manner of parallel circuit.
Fig. 4 a is the schematic device of the cleaning light shield of one embodiment of the application, Fig. 4 b is the clear of another embodiment of the application
The schematic device and Fig. 4 c of washing light shield are the heating unit schematic diagram in the device of the cleaning light shield of one embodiment of the application.?
In the embodiment of the application, a kind of device 20 of cleaning light shield, including:One body 200;One conveying device 230 comprising one
The load bearing unit 232 of light shield can be carried, light shield can be moved into the body 200;One cleaning unit (not shown), is set to institute
In the fixed frame for stating body 200, the cleaning unit includes a cleaning head that can correspond to light shield stretching or retraction;And one plus
Hot cell 240 is set to the bottom of the body 200, cleaning solution is heated to proper temperature.
In the embodiment of the application, the heating unit 240 further includes a primary heater 110 and one second and adds
Hot device 120, respectively to heat cleaning solution.
In the embodiment of the application, the primary heater 110 and the secondary heater 120 are with parallel circuit side
Formula connection.
In the embodiment of the application, the cleaning unit further corresponds to light shield discharging side in cleaning head and is equipped with one
Drying unit, for drying the light shield after cleaning immediately using compression drying air or nitrogen when light shield is after wiping.
In the embodiment of the application, the drying unit has a heating component, so that it is can provide hot compression dry
Air or hot nitrogen further promote its drying effect.
Fig. 4 a, Fig. 4 b and Fig. 4 c are please referred to, in the embodiment of the application, a kind of device 20 of cleaning light shield, including:
One body 200;One conveying device 230 comprising one can carry the load bearing unit 232 of light shield, and light shield can be moved into the body
In 200;One cleaning unit (not shown) is set in the fixed frame of the body 200, and the cleaning unit can be right including one
Answer the cleaning head of light shield stretching or retraction;And a heating unit 240, it is set to the bottom of the body 200, will clean
Liquid is heated to proper temperature;Wherein, the heating unit 240 further includes a primary heater 110 and a secondary heater
120;The primary heater 110 and the secondary heater 120 are connected in a manner of parallel circuit;(figure is not for the cleaning unit
Show) further light shield charging side is corresponded to equipped with a removal unit (not shown) in cleaning head, it can be gone in advance before wiping light shield
Except the particle on light shield.
In the embodiment of the application, the cleaning unit further corresponds to light shield discharging side in cleaning head and is equipped with one
Drying unit, for drying the light shield after cleaning immediately using compression drying air or nitrogen when light shield is after wiping.
In the embodiment of the application, the drying unit has a heating component, so that it is can provide hot compression dry
Air or hot nitrogen further promote its drying effect.
Fig. 5 is the method flow diagram of the cleaning light shield of one embodiment of the application.In the embodiment of the application, please refer to
Fig. 4 a, Fig. 4 b, Fig. 4 c and Fig. 5, a kind of method of cleaning light shield, including:One body 200 is provided;One conveying device 230 is provided,
It has a load bearing unit 230 that can carry light shield, can move into light shield in body 200;One cleaning unit (not shown) is provided,
It is set in the fixed frame of the body, the cleaning unit has a cleaning head that can correspond to light shield stretching or retraction;With
And a heating unit 240 is provided, it is set to the bottom of the body 200, cleaning solution is heated to proper temperature.
Fig. 4 b, Fig. 4 c and Fig. 5 are please referred to, in the embodiment of the application, the method for the cleaning light shield, the heating
Unit 240 further includes a primary heater 110 and a secondary heater 120, respectively to heat cleaning solution.
Fig. 4 b, Fig. 4 c and Fig. 5 are please referred to, in the embodiment of the application, the method for the cleaning light shield, described first
Heater 110 and the secondary heater 120 are connected in a manner of parallel circuit.
Fig. 4 b, Fig. 4 c and Fig. 5 are please referred to, in the embodiment of the application, the method for the cleaning light shield, the cleaning
Unit (not shown) further corresponds to light shield discharging side in cleaning head and is equipped with a drying unit (not shown), for passing through when light shield
After wiping, the light shield after cleaning is dried immediately using compression drying air or nitrogen.
Fig. 3 a, Fig. 3 b and Fig. 4 a are please referred to, in the embodiment of the application, the method for the cleaning light shield first will
Optical enclosure cleaning machine 20 is shut down, and it is complete rear clean that potassium hydroxide mixes liquid chemicals liquid discharge;Heater line power-off, multimeter confirmation add
After hot device route no current;Old heater is replaced down with screwdriver, replaces with two new primary heaters 110 and secondary heater
120, then the primary heater 110 and the secondary heater 120 are connected in a manner of parallel circuit;And multimeter confirmation
Circuit is without exception, and after the test double-heater 110,120 that is powered individually powers off, whether another worked normally.
Referring to FIG. 5, providing a body in process S511.
Referring to figure 5., in process S512, a conveying device is provided, the load bearing unit that can carry light shield with one can
Light shield is moved into body.
Referring to figure 5., in process S513, a cleaning unit is provided, is set in the fixed frame of the body, it is described
Cleaning unit has a cleaning head that can correspond to light shield stretching or retraction.
Referring to figure 5., in process S514, a heating unit is provided, is set to the bottom of the body, will clean
Liquid is heated to proper temperature.
The application can prevent leakage etching lines from short circuit occur, increase board safety;Prevent a heater failure from going out
Existing open circuit, causes another heater that cannot work, and increases cleaning light shield stability in board work;And parallel circuit can control
Multiple components work independently, and are independent of each other after each component damage.
" in some embodiments " and " in various embodiments " terms are used repeatedly etc..The term is not usually
Refer to identical embodiment;But it may also mean that identical embodiment.The words such as "comprising", " having " and " comprising " are synonymous
Word, unless its context meaning shows other meanings.
The above is only embodiments herein, not makes any form of restriction to the application, although the application
It is disclosed above with specific embodiment, however it is not limited to the application, any person skilled in the art, not
It is detached within the scope of technical scheme, when the technology contents using the disclosure above make a little change or are modified to equivalent change
The equivalent embodiment of change, but all contents without departing from technical scheme, the technical spirit according to the application is to the above reality
Any simple modification, equivalent change and modification made by example are applied, in the range of still falling within technical scheme.
Claims (10)
1. a kind of device of cleaning light shield, which is characterized in that including:
One body;
One conveying device comprising one can carry the load bearing unit of light shield, can move into light shield in the body;
One cleaning unit is set in the fixed frame of the body, the cleaning unit include one can correspond to light shield stretch out or
The cleaning head of retraction;And
One heating unit is set to the bottom of the body, cleaning solution is heated to proper temperature.
2. the device of cleaning light shield as described in claim 1, which is characterized in that the heating unit further includes a primary heater
And a secondary heater, respectively to heat cleaning solution.
3. the device of cleaning light shield as claimed in claim 2, which is characterized in that the primary heater and the secondary heater
It is connected in a manner of parallel circuit.
4. the device of cleaning light shield as described in claim 1, which is characterized in that the cleaning unit is further corresponding in cleaning head
The light shield side that discharges is equipped with a drying unit, for being dried immediately using compression drying air or nitrogen when light shield is after wiping
Light shield after dry cleaning.
5. the device of cleaning light shield as claimed in claim 4, which is characterized in that the drying unit has a heating component, makes
It can provide hot compression dry air or hot nitrogen, further promote its drying effect.
6. a kind of device of cleaning light shield, which is characterized in that including:
One body;
One conveying device comprising one can carry the load bearing unit of light shield, can move into light shield in the body;
One cleaning unit is set in the fixed frame of the body, the cleaning unit include one can correspond to light shield stretch out or
The cleaning head of retraction;And
One heating unit is set to the bottom of the body, cleaning solution is heated to proper temperature;
Wherein, the heating unit further includes a primary heater and a secondary heater;The primary heater and described
Secondary heater is connected in a manner of parallel circuit;The cleaning unit further corresponds to light shield charging side in cleaning head and is equipped with one
Removal unit can remove in advance the particle on light shield before wiping light shield.
7. a kind of method of cleaning light shield, which is characterized in that including:
One body is provided;
A conveying device is provided, the load bearing unit that can carry light shield with one can move into light shield in body;
One cleaning unit is provided, is set in the fixed frame of the body, the cleaning unit can correspond to light shield with one and stretch
Out or the cleaning head of retraction;And
One heating unit is provided, the bottom of the body is set to, cleaning solution is heated to proper temperature.
8. the method for cleaning light shield as claimed in claim 7, which is characterized in that the heating unit further includes a primary heater
And a secondary heater, respectively to heat cleaning solution.
9. the method for cleaning light shield as claimed in claim 8, which is characterized in that the primary heater and the secondary heater
It is connected in a manner of parallel circuit.
10. the method for cleaning light shield as claimed in claim 7, which is characterized in that the cleaning unit is further in cleaning head pair
Light shield discharging side is answered to be equipped with a drying unit, for when light shield is after wiping, immediately using compression drying air or nitrogen
Light shield after drying cleaning.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810956074.0A CN108873603A (en) | 2018-08-21 | 2018-08-21 | The devices and methods therefor of cleaning light shield |
PCT/CN2019/072251 WO2020037947A1 (en) | 2018-08-21 | 2019-01-18 | Apparatus and method for cleaning mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810956074.0A CN108873603A (en) | 2018-08-21 | 2018-08-21 | The devices and methods therefor of cleaning light shield |
Publications (1)
Publication Number | Publication Date |
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CN108873603A true CN108873603A (en) | 2018-11-23 |
Family
ID=64321034
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201810956074.0A Pending CN108873603A (en) | 2018-08-21 | 2018-08-21 | The devices and methods therefor of cleaning light shield |
Country Status (2)
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CN (1) | CN108873603A (en) |
WO (1) | WO2020037947A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020037947A1 (en) * | 2018-08-21 | 2020-02-27 | 惠科股份有限公司 | Apparatus and method for cleaning mask |
WO2020252852A1 (en) * | 2019-06-17 | 2020-12-24 | Tcl华星光电技术有限公司 | Device and method for cleaning substrate glass |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5916374A (en) * | 1998-02-09 | 1999-06-29 | International Business Machines Corporation | Optimized in-line mask cleaning system |
JP2004234874A (en) * | 2003-01-28 | 2004-08-19 | Toray Eng Co Ltd | Washing method and washing device of metal mask |
CN1891358A (en) * | 2005-06-27 | 2007-01-10 | 岛田理化工业株式会社 | Substrate cleaning system and substrate cleaning method |
CN101221355A (en) * | 2007-11-28 | 2008-07-16 | 上海广电电子股份有限公司 | Cleaning method and device for photo-etching mask plate in manufacture process of organic electroluminescence device |
CN201122229Y (en) * | 2007-08-10 | 2008-09-24 | 廖莉雯 | Light shield washing device |
CN105977187A (en) * | 2016-05-27 | 2016-09-28 | 湖南新中合光电科技股份有限公司 | Wet-method-based cleaning apparatus for optical waveguide wafer production and cleaning method thereof |
CN207579512U (en) * | 2017-11-30 | 2018-07-06 | 北京汽车股份有限公司 | Electric vehicle and its air-conditioning system |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080241711A1 (en) * | 2007-03-30 | 2008-10-02 | Yun Henry K | Removal and prevention of photo-induced defects on photomasks used in photolithography |
TW200904551A (en) * | 2007-07-20 | 2009-02-01 | Li-Wei Liao | Optical mask wiping and cleaning method and device |
TWM332933U (en) * | 2007-07-20 | 2008-05-21 | Li-Wei Liao | A mask cleaner |
CN101364041A (en) * | 2007-08-09 | 2009-02-11 | 廖莉雯 | Method and equipment for wiping and cleaning light shield |
CN202779110U (en) * | 2012-08-31 | 2013-03-13 | 波达通信设备(广州)有限公司 | Ultrasonic automatic preheating system for cleaning |
CN204557048U (en) * | 2015-04-24 | 2015-08-12 | 安徽三安光电有限公司 | There is exposure, detection, cleaning and the all-in-one of functions/drying |
CN108873603A (en) * | 2018-08-21 | 2018-11-23 | 惠科股份有限公司 | The devices and methods therefor of cleaning light shield |
-
2018
- 2018-08-21 CN CN201810956074.0A patent/CN108873603A/en active Pending
-
2019
- 2019-01-18 WO PCT/CN2019/072251 patent/WO2020037947A1/en active Application Filing
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5916374A (en) * | 1998-02-09 | 1999-06-29 | International Business Machines Corporation | Optimized in-line mask cleaning system |
JP2004234874A (en) * | 2003-01-28 | 2004-08-19 | Toray Eng Co Ltd | Washing method and washing device of metal mask |
CN1891358A (en) * | 2005-06-27 | 2007-01-10 | 岛田理化工业株式会社 | Substrate cleaning system and substrate cleaning method |
CN201122229Y (en) * | 2007-08-10 | 2008-09-24 | 廖莉雯 | Light shield washing device |
CN101221355A (en) * | 2007-11-28 | 2008-07-16 | 上海广电电子股份有限公司 | Cleaning method and device for photo-etching mask plate in manufacture process of organic electroluminescence device |
CN105977187A (en) * | 2016-05-27 | 2016-09-28 | 湖南新中合光电科技股份有限公司 | Wet-method-based cleaning apparatus for optical waveguide wafer production and cleaning method thereof |
CN207579512U (en) * | 2017-11-30 | 2018-07-06 | 北京汽车股份有限公司 | Electric vehicle and its air-conditioning system |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020037947A1 (en) * | 2018-08-21 | 2020-02-27 | 惠科股份有限公司 | Apparatus and method for cleaning mask |
WO2020252852A1 (en) * | 2019-06-17 | 2020-12-24 | Tcl华星光电技术有限公司 | Device and method for cleaning substrate glass |
US11607714B2 (en) * | 2019-06-17 | 2023-03-21 | Tcl China Star Optoelectronics Technology Co., Ltd. | Device for cleaning glass substrate and method of cleaning glass substrate |
Also Published As
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WO2020037947A1 (en) | 2020-02-27 |
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