CN101364041A - Method and equipment for wiping and cleaning light shield - Google Patents
Method and equipment for wiping and cleaning light shield Download PDFInfo
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- CN101364041A CN101364041A CNA2007101435547A CN200710143554A CN101364041A CN 101364041 A CN101364041 A CN 101364041A CN A2007101435547 A CNA2007101435547 A CN A2007101435547A CN 200710143554 A CN200710143554 A CN 200710143554A CN 101364041 A CN101364041 A CN 101364041A
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Abstract
The invention relates to a method for cleaning a mask and a device thereof, particularly a cleaning method for effectively removing particles and atomized dirt from the surface of a mask and a cleaning device thereof. The device at least comprises a delivery mechanism, a side edge wiping mechanism and a top surface wiping mechanism. The delivery mechanism loads the mask to pass through the side edge wiping mechanism and then the top surface wiping mechanism, and a wiping piece impregnated with a disinfectant is in the direct contact with the upper and the lower edge surfaces and the top surface of the mask, so that the particles and atomized dirt on the surface of the mask are cleared effectively and rapidly. The cleaning method and the cleaning device shortens the period of cleaning and reapplying the mask, prevents the mask protective coating from being contaminated or stained with washing marks, and greatly improves the cleanliness of the mask after cleaning.
Description
Technical field
The present invention relates to a kind of technical field that is used for cleaning light shield, particularly relate to a kind of fast and good light shield cleaning method and equipment of cleanliness factor of validity that cleans, in detail is a kind of technology of utilizing moistening wiping to come the photomask cleaning surface.
Background technology
Press, micro-photographing process in the existing manufacture of semiconductor, be that the integrated circuit that will be pre-formed on light shield utilizes little shadow technology to be exposed to crystal column surface, therefore in order to improve the resolution of wafer micro-photographing process, can utilize the micro-photographing process of phase-shift type, it is that addition portion is divided phase shift layer (Shifter Layer) on light shield, the a phase shift layer positive and negative interference of the time being derived whereby in exposure, the image pattern that exposure machine is incident upon on the wafer has preferable resolution, and as shown in Figure 1, general light shield 10 can be provided with a light shield cuticula 20 (Pellicle) in corresponding image pattern district, attaches in the pattern area of light shield 10 to prevent particulate, causes the defective of micro-photographing process.Because in the processing procedure, or come off etc. because of transfer or because of friction or because of material, can in processing environment, produce dust, and the particulate in these dust (Particle) can be built-up in light shield 10 surfaces, even produce the phenomenons of atomizing in light shield 10 surfaces because of the aqueous vapor in the processing procedure and hot gas, therefore light shield 10 needs to clean after using a period of time or number of times at present, to remove the dirt powder on light shield 10 surfaces;
And present cleaning method mainly is to cooperate with the cleaning fluid of flow-like to drive light shield 10 rotations and form, it is to utilize in the cleaning process tractive force of fluid to cause the particulate rotation, be the Main physical mechanism that particulate is removed, but its waste water after meeting produces cleaning in a large number, more need increase the equipment and the cost of wastewater treatment, moreover the action of cleaning with a large amount of cleaning fluids, they are many because of moisture content, and humidity height, so it is water stain that it is difficult for removing fast, oven dry, and stay washmarking easily on light shield 10 surfaces, what is more for fear of the cleaning fluid hydro-peening to aforesaid light shield cuticula 20, and have influence on the resolution of micro-photographing process, therefore various protection measure need be set in addition, further increase the cost of equipment, and can increase the scavenging period of light shield 10.
Cleaning about light shield, more develop in recent years a kind of utilize seismic wave that gas or fluid produce with particle from the light shield surface removal, the equipment cost of this cleaning technique is high, be to make particulate kicked up by the seismic wave effect because of it simultaneously, but its vacuum equipment may not be certain and can effectively particulate be siphoned away, and causes particulate further to pollute other equipment and material.
In other words, aforesaid cleaning method and can't effectively remove the particulate on light shield 10 surfaces has waste cleaning fluid and the problem that needs to handle in addition waste water simultaneously, and causes situations such as its cleaning efficiency is not good.
Moreover, utilize the cleaning fluid rotation to clean or the seismic wave cleaning no matter be, existing cleaning technique is being avoided injuring under the considering of light shield cuticula 20, usually light shield 10 cleans and only can clean top surface 15 and upper edge surface 11,12 on lower limb surface as for non-light shield cuticula 20 scopes can not cleaned usually, causes the accumulation of particulate.Further, aqueous vapor and the hot gas of light shield 10 in long-term use and cleaning process can be in the phenomenons of light shield 10 surface formation atomizings, and the vestige of these atomizings equally can have influence on the resolution of micro-photographing process.No matter and aforementioned be to account for the vestige that invests light shield 10 lower limbs surface 12 or atomizing all can't to detect by existing detection of particulates equipment, therefore when cleaning the light shield of finishing fully, these are not used for micro-photographing process, make wafer produce defective products easily, result in greater loss.
And the present invention promptly is to eliminate rapidly and effectively particulate that accounts for the lower limb surface, both sides that invests light shield and the plane formula spots such as atomizing that are formed at the light shield surface.With the scavenging period of saving light shield, and the cleaning efficiency and the cleanliness factor of lifting light shield.
Because the above-mentioned existing defective that exists with the method and apparatus of wiping cleaning light shield, the inventor is based on being engaged in this type of product design manufacturing abundant for many years practical experience and professional knowledge, and the utilization of cooperation scientific principle, actively studied innovation, in the hope of founding a kind of novel method and apparatus with the wiping cleaning light shield, can improve general existing method and apparatus, make it have more practicality with the wiping cleaning light shield.Through constantly research, design, and, create the present invention who has practical value finally through after studying sample and improvement repeatedly.
Summary of the invention
Therefore, the present invention mainly is, a kind of method and apparatus with the wiping cleaning light shield is provided, and it utilizes the cleaning head upper and lower edge surface of direct wiping light shield and the top surface of impregnation cleaning fluid, and can effectively particulate be removed, and the unlikely cleaning washmarking that stays.
The object of the invention to solve the technical problems realizes by the following technical solutions.A kind of equipment according to the present invention's proposition with the wiping cleaning light shield, especially refer to remove the particulate of light shield top surface and the upper and lower edge surface in both sides or the equipment of atomizing spot with the wiping means, it comprises: one or most side wiping arrangements, it is located at corresponding light shield one side, the side wiping arrangement has a cleaning wiping cloth towards the light shield side, but cleaning wiping cloth impregnation cleaning fluid and be the moistening shape that does not drip, this side wiping arrangement can utilize the upper and lower edge surface of the synchronous wiping cleaning light shield of cleaning wiping cloth side; One or most end face wiping arrangements, it is located at the light shield top, the end face wiping arrangement has a cleaning wiping cloth towards the light shield top surface, but the cleaning wiping cloth impregnation cleaning fluid and the moistening shape cleaning wiping cloth of not dripping, and this end face wiping arrangement can utilize cleaning wiping cloth wiping cleaning light shield top surface.
The object of the invention to solve the technical problems also can be applied to the following technical measures to achieve further.
Aforesaid equipment with the wiping cleaning light shield, it further includes; One body, side wiping arrangement can be set for it and the end face wiping arrangement is located in the body; One conveying device, it has a load bearing unit that can carry light shield, light shield can be moved in the body, and the side wiping arrangement is located at conveying device both sides or either side, and aforementioned again end face wiping arrangement is located at the conveying device top; One transfer device, it has a box for photomask and opens and closes a unit and a mechanical arm unit, and box for photomask opens and closes the unit and can be used for opening and closing the box for photomask that is installed with light shield, and the mechanical arm unit can make light shield open and close transfer between unit and load bearing unit in box for photomask.
Aforesaid equipment with the wiping cleaning light shield, wherein said side wiping arrangement has a fixed frame, fixed frame is provided with the batching unit of first and second draw off mechanism of tool, and cleaning wiping cloth is to be wound between first and second draw off mechanism, further be provided with a water controller that cleaning fluid can be provided cleaning wiping cloth on the batching unit, moreover the side wiping arrangement is provided with a cleaning unit in the fixed frame that cleaning wiping cloth differs from light shield one side, this cleaning unit has a cleaning head that can corresponding light shield stretches out or withdraw, and the upper and lower edge surface of cleaning head wiping synchronously light shield side.
Aforesaid equipment with the wiping cleaning light shield, wherein said cleaning unit further are provided with one in corresponding light shield charging one side of cleaning head and remove the unit, can remove the particulate on the light shield before the wiping light shield in advance.
It is single that aforesaid equipment with the wiping cleaning light shield, wherein said cleaning unit further are provided with an oven dry in corresponding light shield discharging one side of cleaning head, be used for when light shield after wiping, can utilize the light shield after compression drying air or nitrogen are dried cleaning immediately.
Aforesaid equipment with the wiping cleaning light shield, wherein said side wiping arrangement also is provided with one or most pinch roller in the fixed frame of corresponding light shield one side of cleaning wiping cloth, allow the cleaning head of cleaning unit when corresponding light shield stretches out, can utilize pinch roller to be pre-formed and press from both sides the space of pulling, spur cleaning wiping cloth unusually to prevent the light shield edge.
Aforesaid equipment with the wiping cleaning light shield, wherein said end face wiping arrangement has a fixed frame, fixed frame is provided with a tool first, the batching unit of two draw off mechanisms, and cleaning wiping cloth is to be wound in first, between two draw off mechanisms, further be provided with a water controller that cleaning fluid can be provided cleaning wiping cloth on the batching unit, moreover the side wiping arrangement is provided with a cleaning unit in the fixed frame that cleaning wiping cloth differs from light shield one side, this cleaning unit has a cleaning head that can corresponding light shield stretches out or withdraw, and cleaning head can be pressed against cleaning wiping cloth the top surface of light shield, cleans for carrying out wiping.
Aforesaid equipment with the wiping cleaning light shield, wherein said cleaning unit further are provided with one in corresponding light shield charging one side of cleaning head and remove the unit, can remove the particulate on the light shield before the wiping light shield in advance.
It is single that aforesaid equipment with the wiping cleaning light shield, wherein said cleaning unit further are provided with an oven dry in corresponding light shield discharging one side of cleaning head, be used for when light shield after wiping, can utilize the light shield after compression drying air or nitrogen are dried cleaning immediately.
Aforesaid equipment with the wiping cleaning light shield, it further is provided with a pick-up unit in the light shield import and export, and this pick-up unit has a corresponding light shield end face place and is provided with one and detects element, to detect the particulate situation of light shield end face, as cleaning the forward and backward comparison of wiping, to confirm its cleaning performance.
The object of the invention to solve the technical problems also realizes by the following technical solutions.A kind of method according to the present invention's proposition with the wiping cleaning light shield, its can utilize wiping means cleaning light shield differ from the light shield cuticula on, the top surface of lower limb surface and corresponding light shield cuticula, it is characterized in that this method comprises: the side wiping arrangement that an impregnation cleaning fluid is provided, its can contact synchronously wiping light shield side on, the lower limb surface, and provide the end face wiping arrangement of an impregnation cleaning fluid, it can compress the top surface of contact wiping light shield, to form a kind of impregnation cleaning fluid, and the moistening wiping of not dripping, and be enough to remove the particulate on light shield surface and the spot etc. that atomizes.
The object of the invention to solve the technical problems also can be applied to the following technical measures to achieve further.
Aforesaid method with the wiping cleaning light shield, the side wiping arrangement of wherein said impregnation cleaning fluid and end face wiping arrangement further have removal means in light shield charging one side, for remove particulate in advance before moistening wiping.
Aforesaid method with the wiping cleaning light shield, the side wiping arrangement of wherein said impregnation cleaning fluid and end face device further have oven dry means in light shield discharging one side, for dry light shield after moistening wiping, prevent to produce the wiping washmarking.
The present invention compared with prior art has tangible advantage and beneficial effect.As known from the above, in order to achieve the above object, the invention provides a kind of equipment and include with the wiping cleaning light shield:
One or most side wiping arrangement, it is located at corresponding light shield one side, the side wiping arrangement has a cleaning wiping cloth towards the light shield side, but cleaning wiping cloth impregnation cleaning fluid and be the moistening shape that does not drip, this side wiping arrangement can utilize the upper and lower edge surface of the synchronous wiping cleaning light shield of cleaning wiping cloth side;
One or most end face wiping arrangement, it is located at the light shield top, the end face wiping arrangement has a cleaning wiping cloth towards the light shield top surface, but the cleaning wiping cloth impregnation cleaning fluid and the moistening shape cleaning wiping cloth of not dripping, and this end face wiping arrangement can utilize cleaning wiping cloth wiping cleaning light shield top surface;
Via above-mentioned explanation, the present invention represents by the aforementioned techniques means, can allow the present invention effectively and remove the light shield cuticula rapidly with the particulate of outside surface and atomizing spot etc., to shorten the light shield scavenging period, and unlikely pollution light shield cuticula or stay the cleaning washmarking, effectively promote the light shield cleaning efficiency, and significantly promote the cleanliness factor after light shield cleans.
By technique scheme, the present invention has following advantage at least with the method and apparatus of wiping cleaning light shield:
According to design of the present invention, be to utilize the wiping means directly to remove the particulate and atomizing spot on light shield surface, same surface only needs a wiping action, need not repetition and washes with cleaning fluid, so the existing person of cleaning speed is fast.
According to design of the present invention, the present invention can be directly cleans particulate and the direct wiping of atomizing spot, and the upper and lower edge surface of cleaning light shield side more synchronously, so its cleaning efficiency is good.
According to design of the present invention, the present invention is the moistening shape wiping with impregnation, need not to use a large amount of cleaning fluids, so can significantly reduce the use of clean-out system, avoid increasing the puzzlement of wastewater treatment, and can reduce and clean the phenomenon that the back produces washmarking, further can reduce the cost of cleaning treatment.
Above-mentioned explanation only is the general introduction of technical solution of the present invention, for can clearer understanding technological means of the present invention, and can be implemented according to the content of instructions, and for above-mentioned and other purposes, feature and advantage of the present invention can be become apparent, below especially exemplified by preferred embodiment, and conjunction with figs., be described in detail as follows.
Description of drawings
What Fig. 1 illustrated is the schematic appearance of light shield.
Fig. 2 is the schematic appearance of light shield cleaning equipment of the present invention.
Fig. 3 is the internal state synoptic diagram of light shield cleaning equipment of the present invention, and it shows formation of the present invention and relativeness.
Fig. 4 is the cleaning action synoptic diagram of light shield cleaning equipment of the present invention, in order to the position of rotation of explanation light shield and cleaning.
Fig. 5 is a side wiping arrangement end view of the present invention, is used to disclose the state that it does not press from both sides the upper and lower edge surface of light shield of pulling.
Fig. 6 is a side wiping arrangement end view of the present invention, further discloses the pull state of the upper and lower edge surface wiping of light shield of its folder.
Fig. 7 is the side schematic view of side wiping arrangement of the present invention, is used to disclose the upper and lower edge surface state of its continuous wiping light shield.
Fig. 8 is the side schematic view of end face wiping arrangement of the present invention, is used to disclose the continuous wiping state of its top surface.
Fig. 9 is the schematic appearance of another embodiment of light shield cleaning equipment of the present invention, in order to its formation and relativeness to be described.
Figure 10 is the forward sight floor map of another embodiment of light shield cleaning equipment of the present invention, further specifies the state that it cleans action.
10: light shield 11: upper edge surface
12: lower limb surface 15: top surface
20: light shield cuticula 30: body
40: conveying device 45: load bearing unit
50: shifting apparatus 51: box for photomask opens and closes the unit
55: mechanical arm unit 60: box for photomask
65: turnover gas element 70: side wiping arrangement
71: fixed frame 72: the batching unit
711: 712: the second coiled strip devices of first volume glassware
73: guide wheel 74: cleaning wiping cloth
75: cleaning unit 76: cleaning head
77: remove unit 78: drying unit
79: pinch roller 80: the end face wiping arrangement
81: fixed frame 82: the batching unit
811: 812: the second coiled strip devices of first volume glassware
83: guide wheel 84: cleaning wiping cloth
85: cleaning unit 86: clean pinch roller
87: remove unit 88: drying unit
90: removal device 91: fixed frame
The unit was removed in the removal unit at 93: the second in 92: the first
95: drying unit 96: fixed frame
98: the second drying units of 97: the first drying units
100: pick-up unit 101: fixed frame
105: detect element
Embodiment
Reach technological means and the effect that predetermined goal of the invention is taked for further setting forth the present invention, below in conjunction with accompanying drawing and preferred embodiment, to its embodiment of method and apparatus, structure, feature and the effect thereof that foundation the present invention proposes with the wiping cleaning light shield, describe in detail as after.
With reference to appended graphic, at first with reference to shown in Figure 1, be general light shield 10 assemblies, these light shield 10 bottom surfaces are provided with the light shield cuticula 20 of a holding circuit image area, this light shield 10 have differ from light shield cuticula 20 on, lower limb surface 11,12 and the top surface 15 of corresponding light shield cuticula 20, the present invention comprises the side wiping arrangement 70 that an impregnation cleaning fluid is provided with the method for wiped clean light shield, its can contact synchronously wiping light shield 10 sides on, lower limb surface 11,12, and provide the end face wiping arrangement 80 of an impregnation cleaning fluid, it can compress the top surface 15 of contact wiping light shield 10, to form a kind of impregnation cleaning fluid, and the moistening wiping of not dripping, and be enough to remove the particulate on light shield 10 surfaces and the spot etc. that atomizes;
And cleaning equipment of the present invention is as Fig. 2,3 announcements, and it includes the conveying device 40, one or most side wiping arrangement 70 that is used for synchronous cleaning light shield 10 upper and lower edge surfaces 11,12 and one or the end face wiping arrangement 80 of most cleaning light shield 10 top surfaces 15 of a carrying, mobile light shield 10 at least;
In Fig. 2,3 embodiment, cleaning equipment of the present invention includes a closed body 30, to guarantee to clean action and to clean environment and be not subjected to external interference.Can press from both sides and pull and carry the load bearing unit 45 that light shield 10 moves and conveying device 40 is provided with one, this load bearing unit 45 also can original place rotation (as shown in Figure 4) on positions different on the conveying device 40, for the cleaning light shield 10 not upper and lower edge surface 11,12 and the top surface 15 of homonymy;
This cleaning equipment further includes a shifting apparatus 50, this shifting apparatus 50 has a box for photomask and opens and closes a unit 51 and a mechanical arm unit 55, wherein box for photomask opens and closes unit 51 and can supply to insert an alternative box for photomask 60 that opens and closes, and box for photomask 60 is provided with one or most turnover gas unit 65, when confession places storage shelf or box for photomask to open and close unit 51 to box for photomask 60 gas charge is carried out in inside, to avoid light shield 10 sulfurations, can utilize box for photomask to open and close unit 51 in these shifting apparatus 50 operations opens box for photomask 60, and take out the light shield 10 that places in the box for photomask 60, and this light shield 10 is transferred load on conveying device 40 load bearing units 45 of cleaning equipment with mechanical arm unit 55;
As for aforementioned one or most side wiping arrangement 70 can be located at the one or both sides of aforementioned conveying device 40 corresponding light shields 10; the present invention is a main embodiment with a side wiping arrangement 70 that is mounted on conveying device 40 1 sides; further cooperation is consulted shown in Figure 5; it is to be provided with a fixed frame 71 in conveying device 40 1 sides; fixed frame 71 is provided with bolt unit 72; this batching unit 72 includes one first draw off mechanism 721 and one second draw off mechanism 722; and fixed frame 71 is provided with plural guide wheel 73; and in first of batching unit 72; two draw off mechanisms 721; 722 and 73 on guide wheel be wound with a cleaning wiping cloth 74; light shield 10 lateral margins of one side surface of cleaning wiping cloth 74 on the conveying device 40; allow cleaning wiping cloth 74 be subjected to first; two draw off mechanisms 721; 722 effects furl; and utilize the tension force of guide wheel 73 maintenance cleaning wiping cloth 74, moreover cleaning wiping cloth 74 is to be selected from the tool absorbability; and do not produce the non-dust cloth that particulate or fiber peel off; dust-free paper etc.Moreover further be provided with water controller (not painting among the figure) on the batching unit 72, can provide cleaning fluid to cleaning wiping cloth 74, make cleaning wiping cloth 74 in the contact light shield 10 before in advance the impregnation cleaning fluid form the moistening shape that does not drip, and in order to promote the effect of removing particulate, the cleaning fluid that batching unit 72 provides further can be heated to proper temperature in advance, and aforementioned cleaning fluid can be aqueous solution (A.P.M), sulfuric acid and the superoxol (S.P.M) etc. of the ultrapure water (D.I.Water), ammonium hydroxide and the hydrogen peroxide that do not injure light shield 10 surfaces.Moreover side wiping arrangement 70 is provided with a cleaning unit 75 in the fixed frame 71 that cleaning wiping cloth 74 differs from light shield 10 1 sides, this cleaning unit 75 has a cleaning head 76 that can corresponding light shield 10 stretches out or withdraw, and cleaning head 76 upper and lower parts can recline synchronously or away from the upper and lower edge surface 11,12 (as shown in Figure 6) of light shield 10 sides, for the upper and lower edge surface 11,12 of cleaning head 76 synchronous wiping light shield 10 sides;
Other arranges in pairs or groups shown in Figure 7, and cleaning unit 75 further is arranged with one and removes a unit 77 and a drying unit 78 in cleaning head 76 both sides.Wherein removing unit 77 is sides of being located at cleaning head 76 corresponding light shield 10 chargings, it can be air blowing element or air suction element, be used to operate before light shield 10 enters cleaning head 76 wipings, to go ahead of the rest and remove big or the less particulate of the power that attaches, the present invention is main embodiment with the vacuum suction element, is built-up in light shield 10 other surfaces or the equipment to avoid particulate to kick up.And drying unit 78 is sides of being located at cleaning head 76 corresponding light shield 10 dischargings, be used for when light shield 10 after wiping, can utilize compression drying air (CDA) or nitrogen (N
2) light shield 10 after oven dry is cleaned immediately, avoiding staying the wiping washmarking in light shield 10 surfaces, moreover drying unit 78 further can be provided with well heater (not painting among the figure), makes drying unit 78 that hot compression dry air (CDA) or hot nitrogen (N can be provided
2), further promote its drying effect.Side wiping arrangement 70 and be provided with one or most pinch roller 79 in addition in the fixed frame 71 of cleaning wiping cloth 74 corresponding light shield 10 1 sides, allow the cleaning head 76 of cleaning unit 75 when corresponding light shield 10 stretches out, can utilize pinch roller 79 to be pre-formed and press from both sides the space of pulling, spur cleaning wiping cloth 74 unusually to prevent light shield 10 edges.
Aforementioned again one or most end face wiping arrangement 80 can be located at the top of aforementioned conveying device 40 corresponding light shield 10 top surfaces 15; the present invention is a main embodiment with an end face wiping arrangement 80 that is mounted on conveying device 40 tops; further consult Fig. 3; shown in 8; 80 of aforementioned end face wiping arrangements are provided with a fixed frame 81 in conveying device 40 1 sides; this fixed frame 81 is provided with bolt unit 82; this batching unit 82 includes one first draw off mechanism 821 and one second draw off mechanism 822; first; two draw off mechanisms 821; 822 and 83 on guide wheel be wound with a cleaning wiping cloth 84; light shield 10 end faces of one side surface of cleaning wiping cloth 84 on the conveying device 40; and fixed frame 81 is provided with the guide wheel 83 that plural number can be preserved cleaning wiping cloth 84 tension force, moreover cleaning wiping cloth 84 also is to be selected from the tool absorbability equally; and do not produce the non-dust cloth that particulate or fiber peel off; dust-free paper etc.Further be equipped with a cleaning fluid water controller (not painting among the figure) again on the batching unit 82, can provide cleaning fluid to cleaning wiping cloth 84, make cleaning wiping cloth 84 in the contact light shield 10 before in advance the impregnation cleaning fluid form the moistening shape that does not drip, and batching unit 82 is equipped with a well heater (not painting among the figure) in addition, so that the pre-heat effect of cleaning fluid to be provided, can promote the effect of removing particulate, aforementioned cleaning fluid can be aqueous solution (A.P.M), sulfuric acid and the superoxol (S.P.M) etc. of the ultrapure water (D.I.Water), ammonium hydroxide and the hydrogen peroxide that do not injure light shield 10 surfaces.Moreover end face wiping arrangement 80 is provided with a cleaning unit 85 in cleaning wiping cloth 74 corresponding light shields 10 tops of fixed frame 71, pastes and supports or away from the cleaning head 86 (as shown in Figure 8) of light shield 10 top surfaces 15 but this cleaning unit 85 has a start cleaning wiping cloth 84;
Moreover cleaning unit 85 further is arranged with one and removes a unit 87 and a drying unit 88 in cleaning head 86 both sides.Wherein removing unit 87 is sides of being located at cleaning head 86 corresponding light shield 10 chargings, it can be air blowing element or air suction element, in operation, can before light shield 10 enters cleaning head 86 wipings, go ahead of the rest and remove big or the less particulate of the power that attaches, the present invention is main embodiment with the vacuum suction element, can avoid particulate to kick up and be built-up in light shield 10 other surfaces or the equipment.In addition drying unit 88 is sides of being located at cleaning head 86 corresponding light shield 10 dischargings, be used for when light shield 10 after wiping, can utilize compression drying air (CDA) or nitrogen (N
2) light shield 10 after oven dry is cleaned immediately, avoiding staying the wiping washmarking in light shield 10 surfaces, moreover drying unit 88 further can be provided with well heater (not painting among the figure), makes drying unit 88 that hot compression dry air (CDA) or hot nitrogen (N can be provided
2), further promote its drying effect.
Whereby, the device structure person that group formation one can be cleaned rapidly and cleaning efficiency is good with the wiped clean light shield.
By aforementioned cleaning equipment structure of the present invention, the present invention is in practical operation, be shown in Fig. 2～4, place the box for photomask of shifting apparatus 50 to open and close in the unit 51 box for photomask 60, and after opening box for photomask 60, utilize mechanical arm unit 55 that light shield 10 is taken out and transposition on the load bearing unit 45 of conveying device 40, further and utilize conveying device 40 that load bearing unit 45 is moved in the bodies 30 together with light shield 10;
Then shown in Fig. 5～7, make load bearing unit 45 that light shield 10 is moved to respective side wiping arrangement 70 places, and side wiping arrangement 70 also makes cleaning head 76 relative light shield 10 sides of its cleaning unit 75 stretch out, to in advance by pinch roller 79, the moistening shape cleaning wiping cloth 74 of impregnation cleaning fluid is pressed against on the cleaning head 76, lower surface, and when light shield 10 is subjected to load bearing unit 45 to make trend cleaning head 76 to move, can utilize the vacuum suction effect of removing unit 77 that the particulate on light shield 10 surfaces is drawn (as shown in Figure 7) earlier, then make cleaning head 76 that cleaning wiping cloth 74 is overlayed on light shield 10, lower limb surface 11,12 (as Fig. 6, shown in 7), when its light shield 10 continuation are mobile, can utilize these these light shield 10 sides of cleaning wiping cloth that is moistening shape 74 wipings on, lower limb surface 11,12, simultaneously light shield 10 through further can utilize after the wiping drying unit 78 instant oven dry light shields 10 on, lower limb surface 11,12, to avoid in last, lower limb surface 11,12 form the washmarking of wipings, so finish light shield 10 1 sides on, lower limb surface 11,12.After then making the cleaning head 76 of cleaning unit 75 return, make light shield 10 oppositely move to the A point (as shown in Figure 4) in side wiping arrangement 70 the place aheads, and utilize load bearing unit 45 these light shields 10 of rotation, and with this light shield 10 cleaning wiping of the upper and lower edge surface 11,12 of side in addition of aforementioned manner wiping;
And in finish light shield 10 both sides on, lower limb surface 11, after 12 the cleaning wiping, then be as shown in Figure 8, utilize load bearing unit 45 that light shield 10 is moved to end face wiping arrangement 80, this end face wiping arrangement 80 also makes cleaning head 86 relative light shield 10 top surfaces 15 of its cleaning unit 85 stretch out, to in advance by cleaning head 86, the moistening shape cleaning wiping cloth 84 of impregnation cleaning fluid is pressed against light shield 10 top surfaces 15, and when light shield 10 is subjected to load bearing unit 45 to make trend cleaning head 86 to move, can utilize the vacuum suction effect of removing unit 87 that the particulate on light shield 10 surfaces is drawn (as shown in Figure 8) earlier, then make the top surface 15 of cleaning head 86 with this light shield 10 of cleaning wiping cloth 84 wipings, and light shield 10 further can utilize the top surface 15 of drying unit 88 instant oven dry light shields 10 after wiping, avoiding forming the washmarking of wipings, and then finish the wiping of light shield 10 top surfaces 15 1 sides in the top surface 15 of light shield 10.Then make cleaning head 86 withdrawals of cleaning unit 85, make light shield 10 oppositely move to the B point (as shown in Figure 4) in end face wiping arrangement 80 the place aheads, and utilize load bearing unit 45 to rotate these light shields 10, again with the in addition side of these light shield 10 top surfaces 15 of aforementioned manner wiping, at last light shield 10 is withdrawed from body 30, and the light shield 10 after will cleaning with the mechanical arm unit 55 of shifting apparatus 50 is inserted box for photomask and is opened and closed in the box for photomask 60 of unit 51, and take out this in the closed back of box for photomask 60 and be equipped with the box for photomask 60 of light shield 10, and with automatically, and continous way is finished the cleaning of whole light shield 10, significantly promote its washing speed, and owing to be that the wiping that belongs to directly contact is cleaned, so can remove less particulate, the particulate that the power that attaches is bigger, and the atomizing spot etc., promote light shield 10 cleaning efficiencies effectively.
Moreover the present invention further can utilize well heater to make to contain the cleaning fluid that is dipped on the cleaning wiping cloth 74,84 and heat in advance in practical operation in side wiping arrangement 70 and end face wiping arrangement 80, to increase the effect that it removes particulate and atomizing spot.Side wiping arrangement 70 further can utilize well heater that hot compression dry air (CDA) or hot nitrogen (N are provided with the drying unit 78,88 of end face wiping arrangement 80 again
2), and can promote its drying effect.In addition side wiping arrangement 70 can make cleaning wiping cloth 74 trace in cleaning wiping process move with the batching unit 72,82 of end face wiping arrangement 80, to take away the particulate after the wiping immediately, avoids particulate injury light shield 10, and can promote it and clean wiping effect.
The present invention has an embodiment in addition again, it is as Fig. 9,10 disclose, wherein at least one side of conveying device 40 down either side is provided with dual-side wiping arrangement 70A, 70B, present embodiment is equipped with dual-side wiping arrangement 70A with both sides, 70B is a main embodiment, this dual-side wiping arrangement 70A, 70B is provided with bolt unit 72 in a fixed frame 71, this batching unit 72 includes one first draw off mechanism 721 and one second draw off mechanism 722, and on the fixed frame 71 and be provided with that an alternative reclines or away from the cleaning head 76A on lower limb surface, light shield 10 both sides 12,76B, cleaning head 76A wherein, 76B is the pinch roller shape, and dual-side wiping arrangement 70A, the batching unit 72 first of 70B, two draw off mechanisms 721,722 with cleaning head 76A, be wound with a cleaning wiping cloth 74 between 76B respectively.Moreover wherein further can be provided with water controller (not painting among the figure) and well heater (not painting among the figure) on the side wiping arrangement 70A batching unit 72 in the place ahead, cleaning wiping cloth 74 is provided the cleaning fluid of cleaning fluid or the suitable heating-up temperature of tool.Allow the place ahead side wiping arrangement 70A carry out moistening wiping and clean, and the side wiping arrangement 70B at rear carries out the dryness wiping to light shield 10 lower limb surfaces 12 light shield 10 lower limb surfaces 12;
And conveying device 40 tops are provided with two end face wiping arrangement 80A, 80B, this two end faces wiping arrangement 80A, 80B are provided with bolt unit 82 in a fixed frame 81, this batching unit 82 includes one first draw off mechanism 821 and one second draw off mechanism 822, and on the fixed frame 81 and be provided with that an alternative reclines or away from cleaning pinch roller 86A, the 86B of light shield 10 end faces 15, and batching unit 82 first and second draw off mechanisms 821,822 of two end face wiping arrangement 80A, 80B and clean between pinch roller 86A, 86B and be wound with a cleaning wiping cloth 84 respectively.Moreover wherein further can be provided with water controller (not painting among the figure) and well heater (not painting among the figure) on the end face wiping arrangement 80A batching unit 82 in the place ahead, the cleaning fluid of cleaning fluid or the suitable heating-up temperature of tool can be provided cleaning wiping cloth 84.Allow the place ahead end face wiping arrangement 80A carry out moistening wiping to light shield 10 end faces 15 and clean, the end face wiping arrangement 80B at rear then carries out the dryness wiping to light shield 10 end faces 15;
Moreover conveying device 40 can be arranged with a removal device 90 and a drying unit 95 in front end and rear end.Wherein removal device 90 has the fixed frame 91 that a light shield 10 passes, and fixed frame 91 is provided with the first removal unit 92 and the second removal unit 93 in corresponding light shield 10 end faces 15 and 12 punishment of lower limb surface, and it can be vacuum suction element.In operation, allow light shield 10 enter the big or less particulate of the power that attaches of the preceding removal in advance of wiping.Drying unit 95 has the fixed frame 96 that a light shield 10 passes, and fixed frame 96 is provided with first drying unit 97 and second drying unit 98 in corresponding light shield 10 end faces 15 and 12 punishment of lower limb surface, it dries the light shield 10 after the cleaning immediately, to avoid staying the wiping washmarking in light shield 10 surfaces.And conveying device 40 light shields 10 feed inlet and outlets further are provided with a pick-up unit 100, this pick-up unit 100 has a fixed frame 101 that can supply light shield 10 to pass, and being provided with one in corresponding light shield 10 end faces 15 places, fixed frame 101 detects element 105, but this detects element 105 optics or laser detecting element, to detect the particulate situation of light shield 10 end faces 15, as cleaning the forward and backward comparison of wiping, to confirm its cleaning performance.The same aforesaid purpose and the effect of reaching of present embodiment.
The above, it only is preferred embodiment of the present invention, be not that the present invention is done any pro forma restriction, though the present invention discloses as above with preferred embodiment, yet be not in order to limit the present invention, any those skilled in the art, in not breaking away from the technical solution of the present invention scope, when the technology contents that can utilize above-mentioned announcement is made a little change or is modified to the equivalent embodiment of equivalent variations, in every case be the content that does not break away from technical solution of the present invention, according to technical spirit of the present invention to any simple modification that above embodiment did, equivalent variations and modification all still belong in the scope of technical solution of the present invention.
Claims (13)
1. the equipment with the wiping cleaning light shield refers to remove the particulate of light shield top surface and the upper and lower edge surface in both sides or the equipment of atomizing spot with the wiping means especially, it is characterized in that it comprises:
One or most side wiping arrangements, it is located at corresponding light shield one side, the side wiping arrangement has a cleaning wiping cloth towards the light shield side, but cleaning wiping cloth impregnation cleaning fluid and be the moistening shape that does not drip, this side wiping arrangement can utilize the upper and lower edge surface of the synchronous wiping cleaning light shield of cleaning wiping cloth side;
One or most end face wiping arrangements, it is located at the light shield top, the end face wiping arrangement has a cleaning wiping cloth towards the light shield top surface, but the cleaning wiping cloth impregnation cleaning fluid and the moistening shape cleaning wiping cloth of not dripping, and this end face wiping arrangement can utilize cleaning wiping cloth wiping cleaning light shield top surface.
2. the equipment with the wiping cleaning light shield according to claim 1 is characterized in that it further includes;
One body, side wiping arrangement can be set for it and the end face wiping arrangement is located in the body;
One conveying device, it has a load bearing unit that can carry light shield, light shield can be moved in the body, and the side wiping arrangement is located at conveying device both sides or either side, and aforementioned again end face wiping arrangement is located at the conveying device top;
One transfer device, it has a box for photomask and opens and closes a unit and a mechanical arm unit, and box for photomask opens and closes the unit and can be used for opening and closing the box for photomask that is installed with light shield, and the mechanical arm unit can make light shield open and close transfer between unit and load bearing unit in box for photomask.
3. the equipment with the wiping cleaning light shield according to claim 1 and 2, it is characterized in that described side wiping arrangement has a fixed frame, fixed frame is provided with a tool first, the batching unit of two draw off mechanisms, and cleaning wiping cloth is to be wound in first, between two draw off mechanisms, further be provided with a water controller that cleaning fluid can be provided cleaning wiping cloth on the batching unit, moreover the side wiping arrangement is provided with a cleaning unit in the fixed frame that cleaning wiping cloth differs from light shield one side, this cleaning unit has a cleaning head that can corresponding light shield stretches out or withdraw, and cleaning head wiping synchronously light shield side on, the lower limb surface.
4. the equipment with the wiping cleaning light shield according to claim 3 is characterized in that described cleaning unit further is provided with one in corresponding light shield charging one side of cleaning head and removes the unit, can remove the particulate on the light shield before the wiping light shield in advance.
5. the equipment with the wiping cleaning light shield according to claim 3, it is single to it is characterized in that described cleaning unit further is provided with an oven dry in corresponding light shield discharging one side of cleaning head, be used for when light shield after wiping, can utilize the light shield after compression drying air or nitrogen are dried cleaning immediately.
6. the equipment with the wiping cleaning light shield according to claim 3, it is characterized in that described side wiping arrangement and be provided with one or most pinch roller in the fixed frame of corresponding light shield one side of cleaning wiping cloth, allow the cleaning head of cleaning unit when corresponding light shield stretches out, can utilize pinch roller to be pre-formed and press from both sides the space of pulling, spur cleaning wiping cloth unusually to prevent the light shield edge.
7. the equipment with the wiping cleaning light shield according to claim 1 and 2, it is characterized in that described end face wiping arrangement has a fixed frame, fixed frame is provided with a tool first, the batching unit of two draw off mechanisms, and cleaning wiping cloth is to be wound in first, between two draw off mechanisms, further be provided with a water controller that cleaning fluid can be provided cleaning wiping cloth on the batching unit, moreover the side wiping arrangement is provided with a cleaning unit in the fixed frame that cleaning wiping cloth differs from light shield one side, this cleaning unit has a cleaning head that can corresponding light shield stretches out or withdraw, and cleaning head can be pressed against cleaning wiping cloth the top surface of light shield, cleans for carrying out wiping.
8. the equipment with the wiping cleaning light shield according to claim 7 is characterized in that described cleaning unit further is provided with one in corresponding light shield charging one side of cleaning head and removes the unit, can remove the particulate on the light shield before the wiping light shield in advance.
9. the equipment with the wiping cleaning light shield according to claim 7, it is single to it is characterized in that described cleaning unit further is provided with an oven dry in corresponding light shield discharging one side of cleaning head, be used for when light shield after wiping, can utilize the light shield after compression drying air or nitrogen are dried cleaning immediately.
10. the equipment with the wiping cleaning light shield according to claim 1 and 2, it is characterized in that it further is provided with a pick-up unit in the light shield import and export, this pick-up unit has a corresponding light shield end face place and is provided with one and detects element, to detect the particulate situation of light shield end face, as cleaning the forward and backward comparison of wiping, to confirm its cleaning performance.
11. the method with the wiping cleaning light shield, it can utilize wiping means cleaning light shield to differ from the upper and lower edge surface of light shield cuticula and the top surface of corresponding light shield cuticula, it is characterized in that this method comprises:
The side wiping arrangement of one impregnation cleaning fluid is provided, and it can contact the upper and lower edge surface of wiping light shield side synchronously,
And the end face wiping arrangement of an impregnation cleaning fluid is provided, it can compress the top surface of contact wiping light shield, with the moistening wiping that forms a kind of impregnation cleaning fluid and do not drip, and is enough to remove the particulate on light shield surface and atomizing spot etc.
12. the method with the wiping cleaning light shield according to claim 11, the side wiping arrangement and the end face wiping arrangement that it is characterized in that described impregnation cleaning fluid further have removal means in light shield charging one side, for remove particulate in advance before moistening wiping.
13. the method with the wiping cleaning light shield according to claim 11, the side wiping arrangement and the end face device that it is characterized in that described impregnation cleaning fluid further have oven dry means in light shield discharging one side, for after moistening wiping, drying light shield, prevent to produce the wiping washmarking.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101435547A CN101364041A (en) | 2007-08-09 | 2007-08-09 | Method and equipment for wiping and cleaning light shield |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101435547A CN101364041A (en) | 2007-08-09 | 2007-08-09 | Method and equipment for wiping and cleaning light shield |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101364041A true CN101364041A (en) | 2009-02-11 |
Family
ID=40390467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007101435547A Pending CN101364041A (en) | 2007-08-09 | 2007-08-09 | Method and equipment for wiping and cleaning light shield |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101364041A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106807654A (en) * | 2015-12-02 | 2017-06-09 | 特铨股份有限公司 | Optical enclosure cleaning device |
| CN108044249A (en) * | 2018-01-18 | 2018-05-18 | 安徽美诺福科技有限公司 | It is cut by laser complete machine |
| WO2020037947A1 (en) * | 2018-08-21 | 2020-02-27 | 惠科股份有限公司 | Apparatus and method for cleaning mask |
| TWI766423B (en) * | 2019-11-07 | 2022-06-01 | 荷蘭商Ａｓｍｌ控股公司 | Systems and methods for cleaning a portion of a lithography apparatus |
-
2007
- 2007-08-09 CN CNA2007101435547A patent/CN101364041A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106807654A (en) * | 2015-12-02 | 2017-06-09 | 特铨股份有限公司 | Optical enclosure cleaning device |
| CN108044249A (en) * | 2018-01-18 | 2018-05-18 | 安徽美诺福科技有限公司 | It is cut by laser complete machine |
| WO2020037947A1 (en) * | 2018-08-21 | 2020-02-27 | 惠科股份有限公司 | Apparatus and method for cleaning mask |
| TWI766423B (en) * | 2019-11-07 | 2022-06-01 | 荷蘭商Ａｓｍｌ控股公司 | Systems and methods for cleaning a portion of a lithography apparatus |
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Open date: 20090211 |