CN204557048U - There is exposure, detection, cleaning and the all-in-one of functions/drying - Google Patents
There is exposure, detection, cleaning and the all-in-one of functions/drying Download PDFInfo
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- CN204557048U CN204557048U CN201520253380.XU CN201520253380U CN204557048U CN 204557048 U CN204557048 U CN 204557048U CN 201520253380 U CN201520253380 U CN 201520253380U CN 204557048 U CN204557048 U CN 204557048U
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- light shield
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- drying
- reticle plate
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- 238000001035 drying Methods 0.000 title claims abstract description 54
- 238000004140 cleaning Methods 0.000 title claims abstract description 32
- 238000001514 detection method Methods 0.000 title claims abstract description 22
- 230000006870 function Effects 0.000 title claims abstract description 17
- 230000005540 biological transmission Effects 0.000 claims abstract description 14
- 238000000151 deposition Methods 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 5
- 238000004064 recycling Methods 0.000 claims description 3
- 238000003860 storage Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 238000001459 lithography Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000007812 deficiency Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000012940 design transfer Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model relates to the field of lithography of semiconductor subassembly, propose and a kind of there is exposure, detection, cleaning and the all-in-one of functions/drying, it comprises light shield memory block, exposure-detecting unit, light shield working area and cleaning-drying unit, wherein, described exposure-detecting unit comprises exposure machine and detects the pick-up unit of reticle plate outward appearance, and described pick-up unit is positioned at the light shield microscope carrier side of the described reticle plate of carrying of exposure machine; Described light shield memory block, exposure machine, light shield working area, cleaning-drying unit are connected by Transmission Part successively, for transmitting reticle plate.The utility model adopts that the all-in-one of robotization carries out the exposure use of reticle plate, outward appearance detects, the operation of cleaning and drying, improve production efficiency, by improving the region that reticle plate outward appearance detects, reducing the quantity that reticle plate is scrapped due to damage of edges.
Description
Technical field
The utility model relates to production equipment technical field, particularly relates to a kind ofly to have exposure, detection, cleaning and the all-in-one of functions/drying.
Background technology
In the processing procedure of semiconductor element or solar element, repeatedly need use photoetching technique by the design transfer in reticle plate on machine component.At present, in LED chip exposure, reticle plate in use, easily be subject to the pollution of various contaminated ion to it, especially contact exposure machine, because the spacing between reticle plate during exposure and the wafer being coated with photoresist is less, causes reticle plate to contact with photoresist and contaminated.
And after exposure, reticle plate is manually changed in usual employing, operating personnel from the light shield microscope carrier of exposure machine, manually take off reticle plate and transfer in cleaning device and drying device carry out cleaning, dry.Operating personnel's manual manipulation and transfer reticle plate, easily pollute and scratch it.Further, manual operation, waste of manpower, production efficiency is low, can not realize robotization.
In addition, in order to reduce the use cost of reticle plate, usual Reusability.When reticle plate uses next time, in order to ensure the accuracy of photoengraving pattern, automatic optical detection device (English is Automatic Optic Inspection, is called for short AOI) usually need be adopted to detect its outward appearance.Reticle plate comprises the fringe region carrying out central area and the non-exposed exposed.Usual AOI detects the outward appearance of whole reticle plate, when detecting that the fringe region of reticle plate has defect, namely scrap this reticle plate, but the defect of reticle plate fringe region not affecting the accuracy of photoengraving pattern, so result in the waste of part reticle plate.
For in above-mentioned existing exposure process, the deficiency of reticle plate man-handling of materials and AOI testing process, be necessary to propose a kind of transhipment reticle plate automatically and to reticle plate exposure center region aimed detection, and there is the all-in-one of cleaning and dry reticle plate function, improve production operation efficiency, reduce human cost.
Summary of the invention
The utility model is for solving above-mentioned deficiency, and the technical scheme provided is as follows:
There is exposure, detection, cleaning and the all-in-one of functions/drying, comprise light shield memory block, exposure-detecting unit, light shield working area, cleaning-drying unit, it is characterized in that: described exposure-detecting unit comprises exposure machine and detects the pick-up unit of reticle plate outward appearance, and described pick-up unit is positioned at the light shield microscope carrier side of the described reticle plate of carrying of exposure machine; Described light shield memory block, exposure machine, light shield working area, cleaning-drying unit are connected by Transmission Part successively, realize the auto recycling of reticle plate.
Further, described light shield memory block and light shield working area comprise multiple compartment depositing reticle plate, and described light shield storage area is relative with at least one lateral opening of the compartment in light shield working area.
Further, described pick-up unit is automatic optical detection device, the control system that described automatic optical detection device comprises moveable charge coupled cell (English is Charge Coupled Device, is called for short CCD) and is connected with described charge coupled cell.
Further, the wafer carrying bench of the bearing wafer of described exposure machine is lift wafer carrying bench.
Further, described all-in-one also comprises the barcode scanning machine for recording light cover plate positional information.
Further, described light shield working area comprises the first light shield working area of depositing reticle plate to be cleaned.
Further, described light shield working area comprises the first light shield working area of depositing reticle plate to be cleaned and the second light shield working area of depositing dry rear reticle plate.
Further, described cleaning-drying unit comprises cleaning device and drying device.
Further, described Transmission Part is mechanical arm.
The utility model at least has following beneficial effect:
(1) exposure machine, AOI, cleaning device and drying device are combined to form all-in-one, decrease the floor area of board;
(2) use Transmission Part in exposure machine, AOI, cleaning device and drying device intermediate transition reticle plate, reduce manpower consumption, achieve the robotization of all-in-one;
(3) AOI only detects the central area of reticle plate exposure, reduces only at the scrappage of the defective reticle plate of outer edge area tool;
(4) use the position of reticle plate in barcode scanning machine record light shield memory block, improve the automaticity of all-in-one.
Accompanying drawing explanation
Accompanying drawing is used to provide further understanding of the present utility model, and forms a part for instructions, is used from explanation the utility model, does not form restriction of the present utility model with embodiment one of the present utility model.In addition, accompanying drawing data describe summary, is not draw in proportion.
Fig. 1 is the side-looking structural representation of the embodiment 1 of the utility model.
Fig. 2 is the plan structure schematic diagram of the embodiment 1 of the utility model.
Fig. 3 is exposure-detecting unit part-structure side view in the embodiment 1 of the utility model.
Fig. 4 is the plan structure schematic diagram of the embodiment 2 of the utility model.
Fig. 5 is the plan structure schematic diagram of the embodiment 3 of the utility model.
Accompanying drawing marks: 1: light shield memory block; 11: compartment; 12: reticle plate; 2: exposure-detecting unit; 21: light shield microscope carrier; 22: wafer; 23: wafer carrying bench; 24:AOI pick-up unit; 241:CCD; 242: control system; 3: light shield working area; 31: the first light shield working areas; 32: the second light shield working areas; 4: cleaning-drying unit; 41: cleaning device; 42: drying device; 5(51,52,53,54): Transmission Part/mechanical arm; 6: barcode scanning machine.
Embodiment
embodiment 1
Referring to accompanying drawing 1, exposure machine, AOI, cleaning device and drying device are combined to form all-in-one by the utility model, realize the robotization of the use of reticle plate, detection, cleaning and drying.This all-in-one comprises light shield memory block 1, exposure-detecting unit 2, light shield working area 3 and cleaning-drying unit 4, and light shield memory block 1, exposure-detecting unit 2, light shield working area 3, cleaning-drying unit 4 is connected by Transmission Part 5 successively, to realize the auto recycling of reticle plate 12, wherein Transmission Part 5 comprises Transmission Part 51, 52, 53, lay respectively between light shield memory block 1 and exposure-detecting unit 2, between exposure-detecting unit 2 and light shield working area 3, and between light shield working area 3 and cleaning-drying unit 4, the preferred Transmission Part 5 of the present embodiment is mechanical arm.
Continue referring to accompanying drawing 1, light shield memory block 1 and light shield working area 3 form by the compartment 11 of multiple placement reticle plate 12, and light shield memory block 1 is relative with at least one lateral opening of the compartment 11 in light shield working area 3, namely all towards the direction of exposure-detecting unit 2, be convenient to Transmission Part 51 take out reticle plate 12 from light shield memory block 1 and be transferred to exposure-detecting unit 2, and be convenient to Transmission Part 53 and reticle plate 12 taken out from exposure-detecting unit 2 and is transferred to light shield working area 3.Light shield working area 3 comprises the first light shield working area 31 of depositing reticle plate 12 to be cleaned and the second light shield working area 32 of reticle plate 12 after depositing cleaning-drying, and for the ease of the use in actual production process and the floor area reducing board, and avoid dirty reticle plate to be cleaned to the pollution of the clean reticle plate after cleaning-drying, the second light shield working area 32 is arranged on the top in the first light shield working area 31.Cleaning-drying unit 4 comprises cleaning device 41 and drying device 42, and cleaning device 41, drying device 42 are corresponding with the first light shield working area 32, light shield working area 31, second respectively to be arranged, be arranged on the top of cleaning device 41 by drying device 42, but its placement location is not limited thereto.The drying device 42 dry reticle plate 12 of mode by drying, but its drying mode is not limited to dry, other are any can the mode of dry reticle plate 12 all be included.
Please refer to accompanying drawing 2, in the present embodiment, light shield memory block 1, exposure-detecting unit 2, light shield working area 3, cleaning-drying unit 4 linearly arrange successively, and be provided with Transmission Part 54 between light shield memory block 1 and light shield working area 3, for dried clear light cover plate 12 is transferred to light shield memory block 1 by light shield working area 3.
Referring to accompanying drawing 3, exposure-detecting unit 2 comprises exposure machine and detects the pick-up unit 25 of reticle plate 12 outward appearance, exposure machine at least comprises the wafer carrying bench 23 of reticle plate 12, the light shield microscope carrier 21 carrying reticle plate 12, wafer 22 and bearing wafer 22, and pick-up unit 24 is positioned at light shield microscope carrier 21 side.Particularly, pick-up unit 24 is AOI pick-up unit, it comprises CCD 241 and connected control system 242, CCD 241 is removable CCD, Scanning Detction is carried out to the outward appearance of reticle plate 12 in its below moving to light shield microscope carrier 21 before exposure machine exposure, CCD 241 only carries out Scanning Detction to reticle plate 12 center exposure region, and control system 242 only calculates the outward appearance yield in reticle plate 12 center exposure region, thus avoids the deficiency causing it to scrap due to the damage of reticle plate 12 outer rim.The below that need move to light shield microscope carrier 21 due to CCD 241 is scanned, and spacing between traditional light shield microscope carrier 21 and wafer carrying bench 23 is less, and in order to realize the function of CCD 241, wafer carrying bench 23 can be designed to relative to the liftable structure of light shield microscope carrier 21.
When the all-in-one utilizing the utility model to provide carries out actual production operation, reticle plate 12 to be taken out from the compartment 11 photomask storage district 1 and is transferred on light shield microscope carrier 21 by mechanical arm 51; CCD 241 moves to below light shield microscope carrier 21 and carries out Scanning Detction to reticle plate 12, control system 242 calculates the outward appearance yield of exposure area, center in reticle plate 12, the standard outward appearance yield value set in this outward appearance yield value and control system 242 is contrasted, determine that reticle plate 12 outward appearance is good also can use, CCD 241 moves to the side of light shield microscope carrier 21 subsequently, wafer carrying bench 23 drives on wafer 22 and moves on to desired location, and exposure machine is exposed wafer 22; It is to be cleaned that reticle plate 12 after exposure uses transfers to the first light shield working area 31 etc. by mechanical arm 52; Reticle plate 12 to be cleaned in first light shield working area 31 is transferred in cleaning device 41 and is cleaned by mechanical arm 53; After cleaning terminates, the reticle plate 12 after having cleaned can directly enter in drying device 42 carries out drying and processing; After drying terminates, dried reticle plate 12 is transferred in the second light shield working area 32 and is deposited by mechanical arm 53; Reticle plate 12 is transferred in any compartment 11 of light shield memory block 1 by mechanical arm 54, for next time.
The utility model, by exposure machine, AOI 24, cleaning device 41 and drying device 42 are combined to form all-in-one, decreases the floor area of board; By using mechanical arm 5 in exposure machine, AOI 24, cleaning-dry 4 intermediate transition reticle plate 12, reducing manpower consumption, achieving the robotization of all-in-one; AOI 24 only detects the center exposure region of reticle plate 12, reduces only at the scrappage of the defective reticle plate 12 of outer edge area tool.
embodiment 2
Referring to accompanying drawing 4, in order to improve the automaticity of above-mentioned all-in-one, be with the difference of embodiment 1: in the present embodiment in light shield memory block 1 with expose-detecting unit 2 centre sets up barcode scanning machine 6, by the identification code on scan light cover plate 12, record and the accurate location of identification reticle plate 12 in light shield memory block 1.Compartment 11 in light shield memory block 1 is numbered with digital or alphabetical or other forms, reticle plate 12 has the identification code distinguishing it.Reticle plate 12, before exposure uses, first scans the identification code on it, records its position through barcode scanning machine 6; Reticle plate 12 after cleaning-drying scans the identification code on it again through barcode scanning machine 6, to transfer the positional information recorded in system, thus this reticle plate 12 is put back to its original position again.
embodiment 3
Referring to accompanying drawing 5, the difference of the present embodiment and embodiment 1,2 is: by light shield memory block 1, expose-detecting unit 2, first light shield working area 31 and cleaning-drying unit 4 with or square arrangement, and carry out the transhipment of reticle plate 12 between any two respectively by mechanical arm 51,53,53,54; Meanwhile, barcode scanning machine 6 is set in centre, thus improves the automaticity of board.Clear light cover plate 12 after cleaning-drying is directly transferred in light shield memory block 1 from drying device 42 by mechanical arm 54, thus without the second light shield working area 32, shortens treatment scheme, improves the automaticity of board further.Should be understood that, above-mentioned specific embodiments is preferred embodiment of the present utility model, and scope of the present utility model is not limited to this embodiment, and all any changes done according to the utility model, all belong within protection domain of the present utility model.
Claims (10)
1. there is exposure, detection, cleaning and the all-in-one of functions/drying, comprise light shield memory block, exposure-detecting unit, light shield working area and cleaning-drying unit, it is characterized in that: described exposure-detecting unit comprises exposure machine and detects the pick-up unit of reticle plate outward appearance, and described pick-up unit is positioned at the light shield microscope carrier side of the described reticle plate of carrying of exposure machine; Described light shield memory block, exposure machine, light shield working area, cleaning-drying unit are connected by Transmission Part successively, realize the auto recycling of reticle plate.
2. according to claim 1 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: described light shield memory block and light shield working area comprise multiple compartment depositing reticle plate, and described light shield storage area is relative with at least one lateral opening of the compartment in light shield working area.
3. according to claim 1 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: described pick-up unit is automatic optical detection device.
4. according to claim 3 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: the control system that described automatic optical detection device comprises moveable charge coupled cell and is connected with described charge coupled cell.
5. according to claim 1 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: the wafer carrying bench of the bearing wafer of described exposure machine is lift wafer carrying bench.
6. according to claim 1 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: described all-in-one comprises the barcode scanning machine for recording light cover plate positional information.
7. according to claim 1 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: described light shield working area comprises the first light shield working area of depositing reticle plate to be cleaned.
8. according to claim 1 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: described light shield working area comprise the first light shield working area of depositing reticle plate to be cleaned and deposit dry after the second light shield working area of reticle plate.
9. according to claim 1 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: described cleaning-drying unit comprises cleaning device and drying device.
10. according to claim 1 have exposure, detection, cleaning and the all-in-one of functions/drying, it is characterized in that: described Transmission Part is mechanical arm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520253380.XU CN204557048U (en) | 2015-04-24 | 2015-04-24 | There is exposure, detection, cleaning and the all-in-one of functions/drying |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520253380.XU CN204557048U (en) | 2015-04-24 | 2015-04-24 | There is exposure, detection, cleaning and the all-in-one of functions/drying |
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| Publication Number | Publication Date |
|---|---|
| CN204557048U true CN204557048U (en) | 2015-08-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201520253380.XU Active CN204557048U (en) | 2015-04-24 | 2015-04-24 | There is exposure, detection, cleaning and the all-in-one of functions/drying |
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| CN (1) | CN204557048U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105225988A (en) * | 2015-09-25 | 2016-01-06 | 江苏中科晶元信息材料有限公司 | Wafer cleaning checks all-in-one |
| CN107976863A (en) * | 2017-12-30 | 2018-05-01 | 苏州慧桥自动化设备有限公司 | A kind of liquid crystal panel box for photomask stabilization cleaning device |
| CN108051983A (en) * | 2017-12-30 | 2018-05-18 | 苏州慧桥自动化设备有限公司 | A kind of more nozzle multi-angle formula liquid crystal panel box for photomask cleaning devices |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN110262185A (en) * | 2019-06-12 | 2019-09-20 | 北海惠科光电技术有限公司 | It is etched by light the control method and photoetch equipment of equipment |
| WO2020037947A1 (en) * | 2018-08-21 | 2020-02-27 | 惠科股份有限公司 | Apparatus and method for cleaning mask |
-
2015
- 2015-04-24 CN CN201520253380.XU patent/CN204557048U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105225988A (en) * | 2015-09-25 | 2016-01-06 | 江苏中科晶元信息材料有限公司 | Wafer cleaning checks all-in-one |
| CN107976863A (en) * | 2017-12-30 | 2018-05-01 | 苏州慧桥自动化设备有限公司 | A kind of liquid crystal panel box for photomask stabilization cleaning device |
| CN108051983A (en) * | 2017-12-30 | 2018-05-18 | 苏州慧桥自动化设备有限公司 | A kind of more nozzle multi-angle formula liquid crystal panel box for photomask cleaning devices |
| WO2020037947A1 (en) * | 2018-08-21 | 2020-02-27 | 惠科股份有限公司 | Apparatus and method for cleaning mask |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN110262185A (en) * | 2019-06-12 | 2019-09-20 | 北海惠科光电技术有限公司 | It is etched by light the control method and photoetch equipment of equipment |
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