CN110262185A - It is etched by light the control method and photoetch equipment of equipment - Google Patents
It is etched by light the control method and photoetch equipment of equipment Download PDFInfo
- Publication number
- CN110262185A CN110262185A CN201910508211.9A CN201910508211A CN110262185A CN 110262185 A CN110262185 A CN 110262185A CN 201910508211 A CN201910508211 A CN 201910508211A CN 110262185 A CN110262185 A CN 110262185A
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- light shield
- equipment
- photoetch
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- processing
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- 238000000034 method Methods 0.000 title claims abstract description 59
- 239000000463 material Substances 0.000 claims abstract description 282
- 239000011521 glass Substances 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 8
- 238000003860 storage Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 238000001514 detection method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 238000003913 materials processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
Abstract
The invention discloses a kind of control methods for being etched by light equipment, the following steps are included: obtaining the first light shield number of the processing light shield on the material information and photoetch equipment of material to be processed, the material information includes the second light shield number and machined parameters of the corresponding processing light shield of the material to be processed；In first light shield number and not identical second light shield number, the processing light shield in the photoetch equipment is changed to the corresponding processing light shield of the material to be processed；It controls the photoetch equipment and processes the material to be processed according to the machined parameters.The invention also discloses a kind of photoetch equipment, the effect for improving the production efficiency of photoetch equipment is reached.
Description
Technical field
The present invention relates to the control methods and photoetch equipment in display panel field, more particularly to photoetch equipment.
Background technique
The procedure for producing of Thin Film Transistor-LCD includes yellow light process, and yellow light process is needed in glass film and light
Light shield is placed between source, to etch special pattern on glass film by the interception of light shield.Therefore, when light shield selects
When mistake, the scrap of the product currently made will lead to.
At present to avoid leading to scrap of the product because light shield selects mistake, detection dress is generally provided on yellow light board
It sets, can detecte the model for the light shield being currently installed on, whether the model that then contrasting detection arrives is identical as predetermined model, in difference
When, yellow light board can stop working, and give a warning.During production, more by yellow light board production switch to be treated
Frequently, cause yellow light board often out of service, give a warning, and continuous production can not be carried out, exist under production efficiency in this way
The shortcomings that drop.
Summary of the invention
The main purpose of the present invention is to provide a kind of control method for being etched by light equipment and photoetch equipment, it is intended to reach
Improve the effect of the production efficiency of photoetch equipment.
Obtain the first light shield number of the processing light shield on the material information and photoetch equipment of material to be processed, the object
Material information includes the second light shield number and machined parameters of the corresponding processing light shield of the material to be processed；
In first light shield number and not identical second light shield number, by the processing in the photoetch equipment
Light shield is changed to the corresponding processing light shield of the material to be processed；
It controls the photoetch equipment and processes the material to be processed according to the machined parameters.
Optionally, the first light shield of the material information for obtaining material to be processed and the processing light shield in photoetch equipment
Before the step of number, further includes:
When keeping in the position in storehouse addition material to be processed to the material of the photoetch equipment, material pair to be processed is obtained
The material information number answered, wherein the material information and material information number correspond；
It does not include the corresponding material letter of the material to be processed in the corresponding material information number of the photoetch equipment
When ceasing number, the prompt information of outputting material addition mistake；
It include the corresponding material information of the material to be processed in the corresponding material information number of the photoetch equipment
When number, the material to be processed is added to the position in storehouse of the photoetch equipment.
Optionally, the processing light shield by the photoetch equipment is changed to the corresponding processing of the material to be processed
The step of light shield includes:
Control light shield more changing device dismantles the processing light shield in the photoetch equipment, and is numbered according to second light shield
The corresponding processing light shield of the material to be processed is searched in light shield working area；
It controls light shield more changing device and the corresponding processing light shield of the material to be processed is installed.
Optionally, the step of control photoetch equipment processes the material to be processed according to the machined parameters
Before, further includes:
Transmitting device is controlled by the material transmission to be processed to Working position.
Optionally, the first light shield of the material information for obtaining material to be processed and the processing light shield in photoetch equipment
The step of number includes:
Control scanning means scans the identification label of the material to be processed and the processing light shield in the photoetch equipment；
The processing light shield on the material information and the photoetch equipment of the material to be processed is obtained according to scanning result
The first light shield number.
Optionally, the first light shield of the material information for obtaining material to be processed and the processing light shield in photoetch equipment
Number, the material information include the second light shield number and machined parameters of the corresponding processing light shield of the material to be processed
After step, further includes:
When first light shield number is identical as the second light shield number, the control photoetch equipment is executed
The step of processing the material to be processed according to the machined parameters.
Optionally, the machined parameters include processing temperature and processing pressure.
In addition, to achieve the above object, the present invention also provides a kind of photoetch equipment, the photoetch equipment includes: to deposit
Reservoir, processor and it is stored in the control program that can be run on the memory and on the processor, the control program
The step of control method of photoetch equipment as described above is realized when being executed by the processor.
Optionally, the photoetch equipment is yellow light board, and the yellow light board includes light shield working area, for storing light
Cover；The yellow light board further includes glass flake working area to be processed, for storing glass flake to be processed.
In addition, to achieve the above object, the present invention also provides be etched by light to set described in a kind of control method for being etched by light equipment
Standby control method the following steps are included:
When keeping in position in storehouse addition material to be processed to the material of photoetch equipment, it is corresponding to obtain the material to be processed
Material information number, wherein the material information and material information number correspond；
It include the corresponding material information of the material to be processed in the corresponding material information number of the photoetch equipment
When number, the material that the material to be processed is added to the photoetch equipment is kept in into position in storehouse；
Obtain the first light shield number of the processing light shield on the material information and photoetch equipment of material to be processed, the object
Material information includes the second light shield number and machined parameters of the corresponding processing light shield of the material to be processed；
In first light shield number and not identical second light shield number, by the processing in the photoetch equipment
Light shield is changed to the corresponding processing light shield of the material to be processed；
Transmitting device is controlled by the material transferring to be processed in the position in storehouse to Working position；
Control the material to be processed that the photoetch equipment is processed according to the machined parameters on the Working position.
The control method and photoetch equipment for a kind of photoetch equipment that the embodiment of the present invention proposes, first obtain the first light shield
Then number, the second light shield number and machined parameters judge whether the first light shield number and the second light shield number are identical, and the
When one light shield number and not identical the second light shield number, it is corresponding that the processing light shield being etched by light in equipment is changed to material to be processed
Processing light shield (i.e. the second light shield number corresponding processing light shield) control the photoetch equipment after the completion of light shield replacement
The material to be processed is processed according to the machined parameters, due to described to be added in current installed processing light shield and processing
When needing processing light shield to be used not identical when work material, current mounted processing light shield can be changed to target processing light
Cover, so that photoetch equipment will not stop when current mounted light shield light shield corresponding with material to be processed is not identical
The effect for improving the production efficiency of photoetch equipment has been reached in work in this way.
Detailed description of the invention
Fig. 1 is the terminal structure schematic diagram for the hardware running environment that the embodiment of the present invention is related to；
Fig. 2 is the flow diagram of an embodiment of the control method of present invention photoetch equipment；
Fig. 3 is the refinement flow diagram of step S20 in an embodiment of the control method of present invention photoetch equipment；
Fig. 4 is the flow diagram of another embodiment of the present invention；
Fig. 5 is the flow diagram of further embodiment of this invention.
The embodiments will be further described with reference to the accompanying drawings for the realization, the function and the advantages of the object of the present invention.
Specific embodiment
It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not intended to limit the present invention.
The primary solutions of the embodiment of the present invention are:
Obtain the first light shield number of the processing light shield on the material information and photoetch equipment of material to be processed, the object
Material information includes the second light shield number and machined parameters of the corresponding processing light shield of the material to be processed；
In first light shield number and not identical second light shield number, by the processing in the photoetch equipment
Light shield is changed to the corresponding processing light shield of the material to be processed；
It controls the photoetch equipment and processes the material to be processed according to the machined parameters.
The control method and photoetch equipment for a kind of photoetch equipment that the embodiment of the present invention proposes, first obtain the first light shield
Then number, the second light shield number and machined parameters judge whether the first light shield number and the second light shield number are identical, and the
When one light shield number and not identical the second light shield number, it is corresponding that the processing light shield being etched by light in equipment is changed to material to be processed
Processing light shield (i.e. the second light shield number corresponding processing light shield) control the photoetch equipment after the completion of light shield replacement
The material to be processed is processed according to the machined parameters, due to described to be added in current installed processing light shield and processing
When needing processing light shield to be used not identical when work material, current mounted processing light shield can be changed to target processing light
Cover, so that photoetch equipment will not stop when current mounted light shield light shield corresponding with material to be processed is not identical
The effect for improving the production efficiency of photoetch equipment has been reached in work in this way.
As shown in Figure 1, Fig. 1 is the terminal structure schematic diagram for the hardware running environment that the embodiment of the present invention is related to.
The terminal of that embodiment of the invention can be the terminal devices such as yellow light board.
As shown in Figure 1, the terminal may include: processor 1001, such as CPU, light shield more changing device 1004, scanning means
1003, memory 1005, communication bus 1002.Wherein, communication bus 1002 is for realizing the connection communication between these components.
Scanning means 1003 may include video camera, two-dimensional code scanning instrument, barcode scanner and/or radiofrequency signal identification instrument etc.,
Light shield replacement 1004 may include optionally mechanical arm.Memory 1005 can be high speed RAM memory, be also possible to stablize
Memory (non-volatile memory), such as magnetic disk storage.Memory 1005 optionally can also be independently of preceding
State the storage device of processor 1001.
It will be understood by those skilled in the art that the restriction of the not structure paired terminal of terminal structure shown in Fig. 1, can wrap
It includes than illustrating more or fewer components, perhaps combines certain components or different component layouts.
As shown in Figure 1, as may include that operating system, network are logical in a kind of memory 1005 of computer storage medium
Believe module, Subscriber Interface Module SIM and control program.
In terminal shown in Fig. 1, light shield more changing device 1004 is mainly used for according to processing light shield；Scanning means 1003 is main
It is used to scan material to be processed and processes the identification label of light shield, to identify material to be processed and processing light shield；And processor
1001 can be used for calling the control program stored in memory 1005, and execute following operation:
Obtain the first light shield number of the processing light shield on the material information and photoetch equipment of material to be processed, the object
Material information includes the second light shield and machined parameters of the corresponding processing light shield of the material to be processed；
In first light shield number and not identical second light shield number, by the processing in the photoetch equipment
Light shield is changed to the corresponding processing light shield of the material to be processed；
It controls the photoetch equipment and processes the material to be processed according to the machined parameters.
Further, processor 1001 can call the control program stored in memory 1005, also execute following operation:
When keeping in the position in storehouse addition material to be processed to the material of the photoetch equipment, material pair to be processed is obtained
The material information number answered, wherein the material information and material information number correspond；
It does not include the corresponding material letter of the material to be processed in the corresponding material information number of the photoetch equipment
When ceasing number, the prompt information of outputting material addition mistake；
It include the corresponding material information of the material to be processed in the corresponding material information number of the photoetch equipment
When number, the material that the material to be processed is added to the photoetch equipment is kept in into position in storehouse further, processor 1001
The control program stored in memory 1005 can be called, following operation is also executed:
Control light shield more changing device dismantles the processing light shield in the photoetch equipment, and is numbered according to second light shield
The corresponding processing light shield of the material to be processed is searched in light shield working area；
It controls light shield more changing device and the corresponding processing light shield of the material to be processed is installed.
Further, processor 1001 can call the control program stored in memory 1005, also execute following operation:
Transmitting device is controlled by the material transmission to be processed to Working position.
Further, processor 1001 can call the control program stored in memory 1005, also execute following operation:
Control scanning means scans the identification label of the material to be processed and the processing light shield in the photoetch equipment；
The processing light shield on the material information and the photoetch equipment of the material to be processed is obtained according to scanning result
The first light shield number.
Further, processor 1001 can call the control program stored in memory 1005, also execute following operation:
When first light shield number is identical as the second light shield number, the control photoetch equipment is executed
The step of processing the material to be processed according to the machined parameters.
Referring to Fig. 2, in an embodiment of the control method of present invention photoetch equipment, the control of the photoetch equipment
Method the following steps are included:
Step S10, the first light shield for obtaining the processing light shield on the material information and photoetch equipment of material to be processed is compiled
Number, the material information includes the second light shield number and machined parameters of the corresponding processing light shield of the material to be processed；
In the present invention, first obtain the material information of material to be processed, wherein the material information include processing it is described to
The identification information of processing light shield to be used is needed when processing materials, the id signal can be number, i.e., the described object to be processed
Expect the second light shield number of corresponding processing light shield.The second light shield number can be the character being made of character and digit
String.The light shield number is corresponded with the processing light shield, thus can be numbered according to the light shield and be distinguished different processing
Light shield.There is different transparent figures on different processing light shields.The photoetch equipment, can be with by different processing light shields
Different figures is etched on material to be processed.
The machined parameters may include the processing temperature being etched by light when equipment processes the material to be processed and add
Work pressure.When the material to be processed is in different processing temperatures and/or processing pressure, different etching effects can be generated
Fruit.
For example, the photoetch equipment can be yellow light board, the material to be processed can be glass thin to be etched
Film.Transparent area and alternatively non-transparent district are provided on the light shield, the transparent area is to the unobstructed effect of light, and the alternatively non-transparent district can
To block the light of light source sending, so that being upwardly formed shadow region relative to the negative side of light source in alternatively non-transparent district.Therefore, work as Huang
When ray machine platform is etched by light glass film according to the pattern that the transparent area of light shield forms, the light that light source issues penetrates light transmission
Area is radiated on glass film, so that the photosensitive material transmission photochemistry in region corresponding with transparent area is anti-on glass film
It answers, to achieve the effect that photoetch.When glass flake be in different temperature and or pressure under when, photosensitive material sends photochemical
Severe degree when learning reaction is not also identical.
Specifically, it when obtaining the first light shield number and the second light shield number, can first control described in scanning means scanning
The identification label of material to be processed and the processing light shield in the photoetch equipment, wherein the identification label can be character
String, two dimensional code, bar code and/or RF tag, the scanning means can be video camera, two-dimensional code scanning instrument, bar code and sweep
Retouch instrument and/or radiofrequency signal identification instrument etc..According to the material information of the available material to be processed of scanning result and institute
The the first light shield number for stating the processing light shield in photoetch equipment obtains the second light shield number for including in material information.
It should be noted that the first light shield number is current time mounted processing light in the photoetch equipment
The number of cover, it is described second processing light shield when, it is described photoetch equipment processing current time need process material to be processed when,
The number of the required processing light shield used.
Step S20, in first light shield number and not identical second light shield number, by the photoetch equipment
On processing light shield be changed to the corresponding processing light shield of the material to be processed；
In the present invention, when getting first light shield number and the second light shield number, first judge described the
Whether one light shield number numbers identical with second light shield.Judge the photoetch equipment currently installed processing light
Whether cover is the light shield for needing to use when processing presently described material to be processed.
If the light shield used when the current installed processing light shield of photoetch equipment and the processing material to be processed
It is not identical, then current mounted processing light shield is changed to the corresponding light shield of material to be processed.To pass through the object to be processed
Expect corresponding processing light shield, processes the material to be processed.
It should be noted that the processing light shield can be mounted on by the movable connection method of grafting or clamping it is described
It is etched by light in equipment, the photoetch equipment further includes light source, and the light shield is mounted on the light source and the material to be processed
Between, so that can just expose to the material to be processed after the light that light source issues needs to pass through light shield from the transmission region of light shield
On.
Specifically, referring to Fig. 3, it is corresponding that the processing light shield in the photoetch equipment is changed to the material to be processed
Process light shield the step of include:
Step S21, control light shield more changing device dismantles the processing light shield in the photoetch equipment, and according to described second
Light shield number searches the corresponding processing light shield of the material to be processed in light shield working area；
Step S22, control light shield more changing device installs the corresponding processing light shield of the material to be processed.
In the present invention, the light shield more changing device can be mechanical arm, due to processing light shield and photoetch equipment it
Between be to be detachably connected, therefore can will be etched by light by mechanical arm under the current installed processing light shield of equipment dismantles
Come, then the processing light shield disassembled is placed in the light shield working area of photoetch equipment.Wherein, the light shield working area is used
In processing light shield of the storage photoetch equipment for the material to be processed of various different models.
After will be etched by light equipment installed processing light shield disassembly, it can be cleared off by scanning means in cover working area
The identification marking of the processing light shield of storage, to search the corresponding processing light shield of the material to be processed.When finding object to be processed
When expecting corresponding processing light shield, the corresponding processing light shield of material to be processed is taken out from light shield working area, and installs to photoetch
The light shield installation site of equipment.
If the first light shield number is identical as the second light shield number, that is, it is etched by light equipment currently installed processing light shield
It is identical as the light shield used when processing the material to be processed, then execute the step S30.
Step S30, it controls the photoetch equipment and processes the material to be processed according to the machined parameters.
In the present invention, when being etched by light equipment and being mounted with the corresponding processing light shield of material to be processed, illustrate photetching
The material to be processed can be processed according to current mounted processing light shield by carving equipment.Therefore it can control photoetch
Equipment processes material to be processed according to machined parameters.
Specifically, the photoetch equipment may include processing storehouse, and processing object to be processed is provided in the processing storehouse
The Working position of material, the processing storehouse can be with sealed set.Therefore, photoetch equipment, which can control, is adjusted in the processing storehouse
Air pressure and/or temperature.
Since machined parameters include process air pressure and processing temperature, photoetch equipment can will process the gas in storehouse
Pressure and temperature are adjusted to numerical value identical with the process air pressure and processing temperature.
It should be noted that the machined parameters can also include processing humidity, so that photoetch equipment can also basis
Process humidity regulation processing storehouse in humidity value and/or the machined parameters can also include except processing temperature, processing humidity and
Other parameters that can influence to be etched by light effect except processing pressure.
In the present embodiment, the first light shield number, the second light shield number and machined parameters are first obtained, then judge the first light
Whether cover number and the second light shield number are identical, and in the first light shield number and not identical the second light shield number, will be etched by light
Processing light shield in equipment is changed to the corresponding processing light shield of material to be processed (i.e. the second light shield numbers corresponding processing light shield),
After the completion of light shield replacement, control the photoetch equipment according to the machined parameters processing material to be processed, due to
It, can be by when current installed processing light shield and while processing the material to be processed need processing light shield to be used not identical
Current mounted processing light shield is changed to target processing light shield, so that corresponding with material to be processed in current mounted light shield
Light shield it is not identical when, photoetch equipment will not stop working, and in this way reach the production efficiency for improving photoetch equipment
Effect.
Referring to Fig. 4, based on the above embodiment, in another embodiment, before the step S10 further include:
Step S40, it when keeping in the position in storehouse addition material to be processed to the material of the photoetch equipment, obtains to be added
The corresponding material information number of work material；
Step S50, whether judge in the corresponding material information number of the photoetch equipment comprising the material to be processed
Corresponding material information number；
Step S60, corresponding not comprising the material to be processed in the corresponding material information number of the photoetch equipment
Material information number when, outputting material addition mistake prompt information；
Step S70, corresponding comprising the material to be processed in the corresponding material information number of the photoetch equipment
When material information number, the material that the material to be processed is added to the photoetch equipment is kept in into position in storehouse.
In the present invention, the photoetch equipment is provided with the material for storing material to be processed and keeps in position in storehouse, described
The material to be processed that material keeps in the storage in position in storehouse can be transmitted to adding for photoetch equipment by transmitting devices such as transmission belts
In work storehouse, to process the material to be processed by photoetch equipment.
Before adding the material to be processed into the temporary position in storehouse of the material, can first obtain will be added to institute
The material information number A that material keeps in the material to be processed of position in storehouse is stated, then the corresponding material information of retrieval photoetch equipment is compiled
Number whether include the material information number A.If being etched by light the corresponding material information number of equipment includes the material information
Number A then illustrates the light of the machined parameters that the material to be processed is stored in the photoetch equipment and the photoetch equipment
There is the processing light shield for processing the material to be processed in Lacquer finish cover working area, to allow to add the material to be processed
Material to the photoetch equipment is kept in position in storehouse.
If being etched by light the corresponding material information number of equipment does not include the material information number A, illustrate to be etched by light
The machined parameters of the material to be processed are not preserved in equipment, there is no use in the light shield working area of Mingguang City's etching machines in other words
In the processing light shield for processing the material to be processed.To cause the photoetch equipment to process the material to be processed, from
And it can control the prompt information of photoetch equipment outputting material addition mistake.Wherein, the prompt letter of the material addition mistake
Breath can be output by voice, and when being output by voice the prompt information of material addition mistake, the photoetch equipment is also wrapped
Loudspeaker is included, for exporting speech prompt information；And/or the prompt information of the material addition mistake can also pass through control pair
Indicator light flashing output is answered, when flashing the prompt information of outputting material addition mistake by control instructions lamp, the photoetch
Equipment further includes the indicator light for exporting prompt information；And/or the prompt information of the material addition mistake can also pass through
To intelligent terminal and or control panel send prompt information, with by intelligent terminal and or control panel export material addition
The prompt information of mistake.
In the present embodiment, it when keeping in the position in storehouse addition material to be processed to the material of the photoetch equipment, obtains
The corresponding material information number of material to be processed is taken, does not then include in the corresponding material information number of the photoetch equipment
When the corresponding material information number of the material to be processed, the prompt information of outputting material addition mistake in this way can be to avoid object
Material addition is wrong and causes photoetch equipment out of service, to reach the mesh for further increasing photoetch production efficiency of equipment
's.
Referring to Fig. 5, it is based on any of the above embodiment, in another embodiment, before the step S30, further includes:
Step S80, transmitting device is controlled by the material transferring to be processed to Working position.
In the present invention, when keeping in position in storehouse to the material of photoetch equipment and adding material to be processed, first obtain it is described to
Processing materials corresponding material information number, then include in the corresponding material information number of the photoetch equipment described in
When the corresponding material information number of processing materials, the material to be processed is added to the material temporary storing bin of the photoetch equipment
Position, or do not include the corresponding material information of the material to be processed in the corresponding material information of the photoetch equipment is numbered
When number, the prompt information of outputting material addition mistake.
The material to be processed can be kept in the processing storehouse that photoetch equipment is transmitted in position in storehouse by transmitting device from material,
The photoetch available material of equipment keeps in the object that the current waiting in position in storehouse is transferred to the material to be processed in processing storehouse
Expect the first light shield number of information and the processing light shield in the photoetch equipment, the material information includes the object to be processed
Expect the second light shield and machined parameters of corresponding processing light shield, is then compiled in first light shield number with second light shield
When number not identical, the processing light shield in the photoetch equipment is changed to the corresponding processing light shield of the material to be processed,
When the Working position that material to be processed arrives, controls the photoetch equipment and processed on the Working position according to the machined parameters
The material to be processed.
In the present embodiment, the photoetch equipment is provided with the material for storing material to be processed and keeps in position in storehouse, passes
Material can be kept in the material to be processed stored in position in storehouse and passed on the Working position in photoetch equipment processing storehouse by defeated device, this
Sample has ensured processing matter when photoetch equipment treats processing materials processing while promoting the processing efficiency of photoetch equipment
Amount.
In addition, the embodiment of the present invention also proposes that a kind of photoetch equipment, the photoetch equipment include: memory, processing
Device and it is stored in the control program that can be run on the memory and on the processor, the control program is by the processing
The step of control method of photoetch equipment described in as above each embodiment is realized when device executes.
In one embodiment, the photoetch equipment is yellow light board, and the yellow light board includes light shield working area, is used for
Store light shield；The yellow light board further includes glass flake working area to be processed, for storing glass flake to be processed.
It should be noted that, in this document, the terms "include", "comprise" or its any other variant are intended to non-row
His property includes, so that the process, method, article or the system that include a series of elements not only include those elements, and
And further include other elements that are not explicitly listed, or further include for this process, method, article or system institute it is intrinsic
Element.In the absence of more restrictions, the element limited by sentence "including a ...", it is not excluded that including being somebody's turn to do
There is also other identical elements in the process, method of element, article or system.
The serial number of the above embodiments of the invention is only for description, does not represent the advantages or disadvantages of the embodiments.
Through the above description of the embodiments, those skilled in the art can be understood that above-described embodiment side
Method can be realized by means of software and necessary general hardware platform, naturally it is also possible to by hardware, but in many cases
The former is more preferably embodiment.Based on this understanding, technical solution of the present invention substantially in other words does the prior art
The part contributed out can be embodied in the form of software products, which is stored in one as described above
In storage medium (such as ROM/RAM, magnetic disk, CD), including some instructions are used so that a terminal device (can be with yellow light machine
Platform) execute method described in each embodiment of the present invention.
The above is only a preferred embodiment of the present invention, is not intended to limit the scope of the invention, all to utilize this hair
Equivalent structure or equivalent flow shift made by bright specification and accompanying drawing content is applied directly or indirectly in other relevant skills
Art field, is included within the scope of the present invention.
Claims (10)
1. a kind of control method for being etched by light equipment, which is characterized in that the control method of the photoetch equipment includes following step
It is rapid:
Obtain the first light shield number of the processing light shield on the material information and photoetch equipment of material to be processed, the material letter
Breath includes the second light shield number and machined parameters of the corresponding processing light shield of the material to be processed；
In first light shield number and not identical second light shield number, by the processing light shield in the photoetch equipment
It is changed to the corresponding processing light shield of the material to be processed；
It controls the photoetch equipment and processes the material to be processed according to the machined parameters.
2. the control method of photoetch equipment as described in claim 1, which is characterized in that the object for obtaining material to be processed
Before the step of expecting the first light shield number of the processing light shield in information and photoetch equipment, further includes:
When keeping in the position in storehouse addition material to be processed to the material of the photoetch equipment, it is corresponding to obtain material to be processed
Material information number, wherein the material information and material information number correspond；
It does not include that the corresponding material information of the material to be processed is compiled in the corresponding material information number of the photoetch equipment
Number when, outputting material addition mistake prompt information；
It include the corresponding material information number of the material to be processed in the corresponding material information number of the photoetch equipment
When, the material that the material to be processed is added to the photoetch equipment is kept in into position in storehouse.
3. as described in claim 1 photoetch equipment control method, which is characterized in that it is described will be in the photoetch equipment
Processing light shield the step of being changed to the material to be processed corresponding processing light shield include:
Control light shield more changing device dismantles the processing light shield in the photoetch equipment, and is numbered according to second light shield in light
It covers working area and searches the corresponding processing light shield of the material to be processed；
It controls light shield more changing device and the corresponding processing light shield of the material to be processed is installed.
4. the control method of photoetch equipment as described in claim 1, which is characterized in that the control photoetch equipment
Before the step of processing the material to be processed according to the machined parameters, further includes:
Transmitting device is controlled by the material transmission to be processed to Working position.
5. the control method of photoetch equipment as described in claim 1, which is characterized in that the object for obtaining material to be processed
Material information and be etched by light equipment on processing light shield the first light shield number the step of include:
Control scanning means scans the identification label of the material to be processed and the processing light shield in the photoetch equipment；
The of the processing light shield on the material information and the photoetch equipment of the material to be processed is obtained according to scanning result
One light shield number.
6. the control method of photoetch equipment as described in claim 1, which is characterized in that the object for obtaining material to be processed
First light shield of the processing light shield expecting information and being etched by light in equipment is numbered, and the material information includes the material pair to be processed
After the step of the second light shield number and machined parameters of the processing light shield answered, further includes:
When first light shield number is identical with the second light shield number, execution is described control the photoetch equipment according to
The machined parameters process the step of material to be processed.
7. the control method of photoetch equipment as described in claim 1, which is characterized in that the machined parameters include processing temperature
Degree and processing pressure.
8. a kind of photoetch equipment, which is characterized in that the photoetch equipment includes: memory, processor and is stored in described
On memory and the control program that can run on the processor, realized such as when the control program is executed by the processor
Described in any one of claims 1 to 7 the step of the control method of photoetch equipment.
9. photoetch equipment as claimed in claim 8, which is characterized in that the photoetch equipment is yellow light board, the Huang
Ray machine platform includes light shield working area, for storing light shield；The yellow light board further includes glass flake working area to be processed, is used for
Store glass flake to be processed.
10. a kind of control method for being etched by light equipment, which is characterized in that the control method of the photoetch equipment includes following step
It is rapid:
When keeping in position in storehouse addition material to be processed to the material of photoetch equipment, the corresponding material of the material to be processed is obtained
Information encoding, wherein the material information and material information number correspond；
It include the corresponding material information number of the material to be processed in the corresponding material information number of the photoetch equipment
When, the material that the material to be processed is added to the photoetch equipment is kept in into position in storehouse；
Obtain the first light shield number of the processing light shield on the material information and photoetch equipment of material to be processed, the material letter
Breath includes the second light shield number and machined parameters of the corresponding processing light shield of the material to be processed；
In first light shield number and not identical second light shield number, by the processing light shield in the photoetch equipment
It is changed to the corresponding processing light shield of the material to be processed；
Transmitting device is controlled by the material transferring to be processed in the position in storehouse to Working position；
Control the material to be processed that the photoetch equipment is processed according to the machined parameters on the Working position.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910508211.9A CN110262185A (en) | 2019-06-12 | 2019-06-12 | It is etched by light the control method and photoetch equipment of equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910508211.9A CN110262185A (en) | 2019-06-12 | 2019-06-12 | It is etched by light the control method and photoetch equipment of equipment |
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| Publication Number | Publication Date |
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| CN110262185A true CN110262185A (en) | 2019-09-20 |
Family
ID=67917865
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| Application Number | Title | Priority Date | Filing Date |
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| CN201910508211.9A Pending CN110262185A (en) | 2019-06-12 | 2019-06-12 | It is etched by light the control method and photoetch equipment of equipment |
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Application publication date: 20190920 |