KR101900518B1 - Method for producing color filter, display element, and color filter - Google Patents

Abstract

The present invention provides a method of manufacturing a color filter useful for increasing brightness, a display device having excellent display characteristics, and a color filter useful for increasing brightness. The method of manufacturing the color filter 10 includes a step of forming a coloring pattern 6 on a substrate 5 using a coloring composition and a step of forming irregularities on the surface of the coloring pattern 6. [ It is preferable that the irregularities are formed by an etching method, a nanoimprint method, or a polishing method. It is preferable to further include the step of forming the protective film 8 on the colored pattern 6 in which the unevenness is formed.

Description

TECHNICAL FIELD [0001] The present invention relates to a method of manufacturing a color filter, a display device, and a color filter,

The present invention relates to a method of manufacturing a color filter, a display element and a color filter.

The color filter transmits light in a specific wavelength region out of visible light to generate colored transmitted light. A liquid crystal display element using a liquid crystal can not develop color by itself, but can function as a color liquid crystal display element by using a color filter. The color filter is also used for color display of an organic EL (Electro Luminescence) element using a white light emitting layer or an electronic paper. In addition, when the color filter is used, color imaging of solid-state image pickup devices such as CCD image sensors and CMOS image sensors becomes possible.

Generally, a color filter is composed of a transparent substrate such as glass and a minute coloring pattern including red, green and blue pigments or dyes. The coloring pattern is formed on a transparent substrate and arranged in a regular shape such as a lattice shape.

As a method for manufacturing a color filter, the following is known. For example, the coloring and radiation-sensitive composition is applied as a coloring composition sensitive to a suitable irradiation line on a transparent substrate or on a transparent substrate having a light-shielding layer of a desired pattern formed thereon. Subsequently, after drying the coated film, the dried coating film is irradiated with radiation (hereinafter referred to as " exposure ") via a mask, and development processing is performed. Thereby, a method of obtaining a colored pattern (see, for example, Patent Document 1 or 2). A method of obtaining a pattern of each color by an inkjet method using a colored thermosetting resin composition is also known (see, for example, Patent Document 3).

In recent years, demands for higher image quality and higher luminance for a display element are increasing. As a result, a characteristic that enables such performance improvement for a color filter is also required. Specifically, a color filter having a high stimulus value (Y) of brightness in the CIE colorimetric system is required.

As to this demand, for example, there have been proposed to use a new pigment such as polyhalogenated zinc phthalocyanine as a coloring agent (see Patent Document 4), and to use a dye (see Patent Document 5).

Japanese Patent Application Laid-Open No. 2-144502 Japanese Patent Laid-Open Publication No. 3-53201 Japanese Patent Application Laid-Open No. 2000-310706 Japanese Patent Application Laid-Open No. 2007-284589 Japanese Patent Application Laid-Open No. 2010-32999

However, in the case of the pigment-dispersed coloring composition, there is a technical limitation in the method of improving the Y value of the color filter and improving the brightness by improving the pigment and the composition.

On the other hand, there is a problem in that the coloring pattern formed by using the coloring composition containing a dye is remarkably deteriorated in heat resistance and solvent resistance as compared with a coloring pattern formed by using a coloring composition containing a pigment. Therefore, in mass production of a color filter using a coloring composition containing a dye, it is necessary to improve a new performance such as improvement in heat resistance and solvent resistance in addition to improvement in luminance.

The present invention has been made in view of the above problems. That is, an object of the present invention is to provide a method of manufacturing a color filter useful for high luminance, a display element having excellent display characteristics, and a color filter useful for high luminance.

According to a first aspect of the present invention, there is provided a method of manufacturing a light-

And a step of forming irregularities on the surface of the colored pattern.

In the first aspect of the present invention, it is preferable that the irregularities are formed by an etching method, a nanoimprint method, or a polishing method.

In the first aspect of the present invention, the step of forming the irregularities on the surface of the colored pattern may be a step of forming a resist pattern on the colored pattern and etching the colored pattern exposed from the resist pattern to form irregularities .

In the first aspect of the present invention, it is preferable that the height of the convex portion is 10 nm or more and the width of the bottom portion of the convex portion is 10 nm or more.

In the first aspect of the present invention, the coloring pattern may include at least one of a red coloring pattern and a green coloring pattern, and may form a concavo-convex pattern on at least one of a red coloring pattern and a green coloring pattern have.

In a first aspect of the present invention, it is preferable to further include a step of forming a protective film on the colored pattern on which the unevenness is formed.

A second aspect of the present invention relates to a display element having a color filter manufactured by the first aspect of the present invention.

A third aspect of the present invention is a color filter having a plurality of colored patterns on a substrate,

Characterized in that irregularities are formed on the surface of the colored pattern of at least one of the plurality of colored patterns, the height of the convex portion of the irregularities is 10 nm or more, and the width of the base of the convex portion is 10 nm or more.

According to the first aspect of the present invention, there is provided a method of manufacturing a color filter useful for increasing brightness.

According to the second aspect of the present invention, a display element having excellent display characteristics is provided.

According to the third aspect of the present invention, there is provided a color filter useful for high luminance.

1 is a schematic cross-sectional view of a color liquid crystal display element having a color filter according to the present embodiment.
2 is a SEM photograph of the surface of the red cured film obtained by Examples 1 to 3 and Comparative Example 1. Fig.
3 is a cross-sectional SEM photograph of the red cured film obtained by Examples 1 to 3 and Comparative Example 1. Fig.
4 is a SEM photograph of the surface of the green cured film obtained by Examples 4 to 6 and Comparative Example 2. Fig.
5 is a cross-sectional SEM photograph of the green cured film obtained by Examples 4 to 6 and Comparative Example 2. Fig.
6 is a SEM photograph of the surface of the blue cured film obtained in Example 7, Example 8 and Comparative Example 3. Fig.
7 is a cross-sectional SEM photograph of the blue cured film obtained by Example 7, Example 8 and Comparative Example 3. Fig.

As a result of intensive studies, the inventors of the present invention have found that the aforementioned problems can be solved by forming irregularities on the surface of the colored patterns of the respective colors constituting the color filter, and have completed the present invention.

Hereinafter, the present embodiment will be described in detail.

<Manufacturing Method of Color Filter>

The inventors of the present invention have found that the efficiency of taking out the light passing through the colored pattern is increased by forming the unevenness on the surface of the colored pattern. Therefore, the manufacturing method of the color filter of this embodiment includes at least the following processes (1) and (2).

(1) a step of forming a colored pattern on a substrate

(2) Step of forming irregularities on the surface of the colored pattern

Hereinafter, each step of (1) and (2) will be described in detail with specific examples.

(1) a step of forming a colored pattern on a substrate

First, a substrate is prepared. As the substrate, for example, a transparent glass substrate such as borosilicate glass, aluminoborosilicate glass, alkali-free glass, quartz glass, synthetic quartz glass, soda lime glass, white sapphire or the like can be used. In addition, it is also possible to use a polymer such as acrylic, polyamide, polyacetal, polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, triacetyl cellulose, syndiotactic polystyrene, polyphenylene sulfide, polyether ketone, Polyether ether ketone, fluorine resin, polyether nitrile, polycarbonate, modified polyphenylene ether, polycyclohexene, polynorbornene resin, polysulfone, polyethersulfone, polyarylate, polyamideimide, A transparent resin film such as a polyimide or a thermoplastic polyimide may be used. In particular, alkali-free glass is preferably used because it is a material having a small thermal expansion rate and is excellent in dimensional stability and high temperature heating treatment.

If necessary, these substrates may be subjected to appropriate pretreatment such as film formation of a silicon dioxide film by ion plating, sputtering, vapor phase reaction, vacuum deposition or the like in addition to chemical treatment or plasma treatment with a silane coupling agent or the like .

Subsequently, a light-shielding layer (black matrix) is formed on the substrate so as to partition the portion forming the pixel. For example, a metal thin film such as chromium film formed by sputtering or vapor deposition is processed into a desired pattern by photolithography. Alternatively, a coloring composition containing a black colorant may be coated on a substrate and processed into a desired pattern by photolithography. The thickness of the light-shielding layer including the metal thin film is preferably set to 0.1 to 0.2 mu m. On the other hand, it is preferable that the thickness of the light-shielding film formed using the black coloring composition is about 1 탆.

In addition, the light shielding layer may be unnecessary. In this case, the step of forming the light shielding layer may be omitted.

Next, a negative radiation-sensitive coloring and radiation-sensitive composition containing, for example, a red coloring agent is applied on the substrate. Subsequently, prebaking is performed to evaporate the solvent to form a coating film. Thereafter, the coated film is exposed through a photomask and developed with an alkaline developer to dissolve and remove the unexposed portion of the coated film. Thereafter, preferably, post baking is performed to form a pixel array in which red coloring patterns are arranged in a predetermined arrangement.

Next, a negative-type radiation-sensitive coloring and radiation-sensitive composition containing a green coloring agent is applied on a substrate having a red coloring pattern formed thereon, and a green coloring pattern is arranged in a predetermined arrangement Thereby forming a pixel array.

Further, a negative-type radiation-sensitive coloring and radiation-sensitive composition containing a blue coloring agent is applied on a substrate on which respective coloring patterns of red and green are formed, and a blue coloring pattern is formed in a predetermined arrangement Thereby forming a pixel array.

As described above, a color filter in which pixel arrays of three primary colors of red, green, and blue are arranged on a substrate is obtained. In the present embodiment, however, the order of forming the coloring patterns of the respective colors on the substrate is not limited to the above example. The order of formation of each color can be appropriately changed.

When the coloring and radiation-sensitive composition is applied to a substrate, a spray method, a roll coating method, a spin coating method (spin coating method), a slit die coating method or a bar coating method can be appropriately selected. From the viewpoint of obtaining a coating film having a uniform film thickness, it is preferable to adopt a spin coating method or a slit die coating method.

Prebaking is usually carried out in combination with reduced pressure drying and heat drying. The reduced-pressure drying is usually carried out until the pressure reaches 50 Pa to 200 Pa. The conditions for heating and drying are usually about 1 minute to about 10 minutes at a temperature of from 70 캜 to 110 캜 using a hot plate. The thickness of the coating film to be applied is usually 0.6 to 8.0 탆, preferably 1.2 to 5.0 탆, as a film thickness after drying.

Examples of the light source of radiation used for exposure include a lamp light source such as a xenon lamp, a halogen lamp, a tungsten lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp or a low pressure mercury lamp or a lamp light source such as argon ion laser, YAG laser, XeCl And a laser light source such as an excimer laser or a nitrogen laser. Generally, it is preferable that the wavelength to be emitted is in the range of 190 nm to 450 nm. The exposure dose of the radiation is generally preferably 10 J / m 2 to 10,000 J / m 2.

Examples of the alkali developing solution include sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo- [5.4.0] -7- undecene, 1,5-diazabicyclo - [4.3.0] -5-nonene and the like are preferably used. To the alkali developing solution, a water-soluble organic solvent such as methanol or ethanol or a surfactant may be added in an appropriate amount. After the alkali developing treatment, washing with water is usually carried out.

As the development processing method, for example, a shower development method, a spray development method, a dip (immersion) development method, or a puddle (liquid immersion) development method can be applied. The development conditions can be, for example, from room temperature to 5 seconds to 300 seconds.

The post-baking conditions can be, for example, from 180 to 280 DEG C for about 20 minutes to 40 minutes in the case of using a hot air furnace.

The film thickness of the colored pattern formed as described above is usually 0.5 탆 to 5.0 탆, preferably 1.0 탆 to 3.0 탆.

As another example of forming a coloring pattern on a substrate, there are a method of obtaining pixels of each color by the inkjet method disclosed in JP-A-7-318723 and JP-A-2000-310706 Method.

In this method, first, a partition wall serving also as a light shielding function is formed on the surface of the substrate. Subsequently, the colored thermosetting composition containing, for example, a red coloring agent is discharged into the partition wall by an ink jet apparatus. Thereafter, prebaking is performed to evaporate the solvent. Subsequently, this coating film is exposed as necessary, and then post-baked to form a red pixel pattern.

Subsequently, a colored thermosetting composition containing a green coloring agent is discharged onto a substrate having a red colored pattern formed thereon by an inkjet apparatus, and a green pixel pattern is formed in the same manner as described above.

Further, a colored thermosetting composition containing a blue coloring agent is discharged onto a substrate on which respective coloring patterns of red and green are formed by an inkjet apparatus, and a blue pixel pattern is formed in the same manner as described above.

As described above, a color filter in which the three primary colors of red, green, and blue are arranged on the substrate is obtained. However, in this embodiment, the order of forming the coloring patterns of the respective colors is not limited to the above example. The order of formation of each color can be appropriately changed.

In addition, the above-mentioned barrier ribs have a function of preventing not only the light shielding function but also the coloring composition of each color discharged in the compartment from being mixed. As a result, the film thickness is thicker than the light-shielding layer (black matrix) used in the first example. The barrier ribs are usually formed using a black composition.

The substrate and the light source of radiation used for forming the color filter, and the method and conditions of prebaking and postbaking are the same as those of the first example described above. The film thickness of the colored pattern formed by the inkjet method is about the same as the height of the partition wall.

In the present embodiment, the coloring pattern constituting the color filter is not limited to red, green, and blue, and may be a coloring pattern having three primary colors of yellow, magenta, and cyan. In addition to the coloring pattern corresponding to the pixels of the three primary colors, the fourth or fifth coloring pattern may be formed. For example, as disclosed in Japanese Patent Application Laid-Open No. 2005-523465 and the like, in addition to a coloring pattern corresponding to three primary colors of red, green and blue, a fourth pixel (yellow pixel) for widening the coloring range, Five pixels (cyan pixels) can be arranged.

The coloring pattern is usually formed using a radiation-sensitive or thermosetting coloring composition. The coloring composition used in the step of forming the coloring pattern contains at least a coloring agent, a binder resin and a crosslinking agent. If necessary, a photopolymerization initiator may be contained for the purpose of imparting radiation-sensitive properties to the coloring composition. The coloring composition is usually used as a liquid composition by blending a solvent. Hereinafter, each component will be described.

The coloring agent is not particularly limited as long as it has coloring property, and the color and the material can be appropriately selected depending on the use of the color filter. Specifically, any of pigments, dyes and natural pigments can be used as a coloring agent. A pigment, a dye, or a mixture thereof is preferably used for the color filter in that high color purity, brightness, contrast, and the like are required.

The pigment can be either an organic pigment or an inorganic pigment.

As the organic pigment, for example, a compound classified by pigment in the color index (CI .; published by The Society of Dyers and Colourists) can be mentioned. Preferably, the color index (C.I.) name is given as follows.

CI Pigment Yellow 83, CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Pigment Yellow 180, CI Pigment Yellow 211;

C.I. Pigment Orange 38;

CI Pigment Red 166, CI Pigment Red 177, CI Pigment Red 224, CI Pigment Red 242, CI Pigment Red 254;

C.I. Pigment Violet 23;

CI Pigment Blue 1, CI Pigment Blue 15: 6, CI Pigment Blue 80;

C.I. Pigment Green 7, C.I. Pigment Green 36, C.I. Pigment Green 58;

CI Pigment Brown 23, CI Pigment Brown 25;

C.I. Pigment Black 1, C.I. Pigment Black 7.

Examples of the inorganic pigments include inorganic pigments such as titanium oxide, barium sulfate, calcium carbonate, zinc oxide, lead sulfate, yellow lead, zinc sulfur, spinach (red iron oxide (III)), cadmium, , Amber, titanium black, synthetic iron black or carbon black.

In the present embodiment, it is preferable that the organic pigment is used by finely grinding primary particles by so-called salt milling. As a method of the salt milling, for example, a method disclosed in Japanese Unexamined Patent Application Publication No. 8-179111 can be adopted.

The dyes can be appropriately selected from among various kinds of oil-soluble dyes, direct dyes, acid dyes and metal complex dyes. For example, the following color index (C.I.) name is given.

CI Solvent Yellow 4, CI Solvent Yellow 14, CI Solvent Yellow 15, CI Solvent Yellow 24, CI Solvent Yellow 82, CI Solvent Yellow 88, CI Solvent Yellow 94, CI Solvent Yellow 98, CI Solvent Yellow 162, CI Solvent Yellow 179;

C.I. Solvent Red 45, C.I. Solvent Red 49;

C.I. Solvent Orange 2, C.I. Solvent Orange 7, C.I. Solvent Orange 11, C.I. Solvent Orange 15, C.I. Solvent Orange 26, C.I. Solvent Orange 56;

C.I. Solvent Blue 35, C.I. Solvent Blue 37, C.I. Solvent Blue 59, C.I. Solvent Blue 67;

C.I. Acid Yellow 17, C.I. Acid Yellow 29, C.I. Acid Yellow 40, C.I. Acid Yellow 76;

C. I. Acid Red 91, C. I. Acid Red 92, C. I. Acid Red 97, C. I. Acid Red 114, C. I. Acid Red 138, C. I. Acid Red 151;

C.I. Acid Orange 51, C.I. Acid Orange 63;

C. I. Acid Blue 80, C. I. Acid Blue 83, C. I. Acid Blue 90;

C. I. Acid Green 9, C. I. Acid Green 16, C. I. Acid Green 25, C. I. Acid Green 27.

In the present embodiment, the coloring agents may be used alone or in combination of two or more.

The binder resin used in the coloring composition is not particularly limited, but preferably contains a polymer having an acidic functional group. Examples of the acidic functional group include a carboxyl group, a phenolic hydroxyl group, an imidic acid group, a sulfo group, a sulfino group or a sulfo group. Of these, a carboxyl group is preferably used.

Examples of the polymer having a carboxyl group include those described in JP-A-5-19467, JP-A-6-230212, JP-A-7-140654, JP-A-7-207211, JP-A-8-259876, JP-A-9-325494, JP-A-10-31308, JP- Japanese Patent Laid-Open Publication No. 11-241523, Japanese Laid-Open Patent Publication No. 11-241523, Japanese Laid-Open Patent Publication No. 11-258415 Polymers disclosed in JP-A-2000-56118, JP-A-2002-296778, JP-A-2004-101728, and JP-A-2008-181095 have.

In the present embodiment, the binder resins may be used alone or in combination of two or more.

The crosslinking agent used in the coloring composition is not particularly limited as long as it is a compound having two or more polymerizable groups. Examples of the polymerizable group include an ethylenic unsaturated group, an oxiranyl group, an oxetanyl group, and an N-alkoxymethylamino group.

In the present embodiment, as the crosslinking agent, a compound having two or more (meth) acryloyl groups or a compound having two or more N-alkoxymethylamino groups is preferably used.

Particularly preferred crosslinking agents include, for example, trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol triacrylate and succinic anhydride The obtained compound, a compound obtained by reacting dipentaerythritol pentaacrylate with succinic anhydride, a compound obtained by reacting caprolactone denatured polyfunctional compound described in paragraphs [0015] to [0018] of Japanese Patent Application Laid-Open No. 11-44955 (Meth) acrylate, N, N, N ', N', N '', N '' - hexa (alkoxymethyl) .

In the present embodiment, the crosslinking agents may be used alone or in combination of two or more.

The photopolymerization initiator used in the coloring composition is a compound capable of generating an active species capable of initiating the curing reaction of the crosslinking agent by exposure to radiation such as visible light, ultraviolet light, deep ultraviolet light, electron beam or X-ray.

Preferred examples of the photopolymerization initiator include a thioxanone compound, an acetophenone compound, a nonimidazole compound, a triazine compound, an O-acyloxime compound, an onium salt compound, a benzoin compound, a benzophenone compound, -Diketone compounds, polynuclear quinone compounds, diazo compounds or imidosulfonate compounds.

In the present embodiment, the photopolymerization initiator may be used in combination with a known sensitizer or a hydrogen donor. The photopolymerization initiator may be used singly or in combination of two or more.

The solvent used in the coloring composition preferably disperses or dissolves each component constituting the coloring composition, does not react with these components, and has appropriate volatility.

In the present embodiment, preferred examples of the solvent include propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxybutyl acetate, diethylene glycol Diethylene glycol methyl ethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, 1,3-butylene glycol diacetate, 1,6-hexanediol diacetate, ethyl lactate, 3-methoxy Propyl methacrylate, ethyl propionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutyl propionate, n-butyl acetate, Ethyl propionate, n-butyl propionate, ethyl butyrate, i-propyl butyrate, n-butyl butyrate or ethyl pyruvate.

In the present embodiment, the solvents may be used alone or in combination of two or more.

The coloring composition of the present embodiment may further contain other components as necessary. For example, as other components, a pigment dispersant such as an acrylic copolymer, a polyurethane, a polyester, a polyethyleneimine and a polyarylamine; Surfactants such as fluorine-based surfactants and silicone-based surfactants; Vinyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3- Butyloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, and the like, and the like.

(2) Step of forming irregularities on the surface of the colored pattern

The method of forming the irregularities on the surface of the colored pattern formed by the above process is not particularly limited, and examples thereof include an etching method, a nanoimprint method, a polishing method using cerium oxide particles, and the like.

As the etching method, any of dry etching and wet etching can be applied. Dry etching is a method of etching a material by a reactive gas (etching gas), ions, or radicals. On the other hand, wet etching is a method of performing etching of a material by a liquid.

In consideration of the manufacturing cost, wet etching by acid or alkali is preferable. On the other hand, in consideration of the reproducibility of the unevenness formation, dry etching suitable for microfabrication is preferable.

Dry etching includes a method of exposing a material in a reactive gas (reactive gas etching), reactive ion etching in which a gas is ionized and radicalized by etching, and the like.

As the dry etching apparatus by reactive ion etching, various types of dry etching apparatuses may be mentioned. Either way, the device configuration is substantially the same. That is, an electromagnetic wave or the like is applied to the etching gas in the chamber maintained at the required vacuum pressure to convert the gas into plasma. At the same time, a high-frequency voltage is applied to the cathode on which the sample substrate is placed in the chamber. Thereby, the ion species and the radical species in the plasma are accelerated in the direction of the sample to collide, and the sputtering by the ions and the chemical reaction of the etching gas are simultaneously caused to perform the fine processing of the sample.

In the present embodiment, it is possible to perform a direct etching treatment on a colored pattern as it is after forming a colored pattern by the above-described process. In addition, a resist pattern to be a mask may be formed on a colored pattern by using a photolithography technique, and then an etching process may be performed on the colored pattern portion exposed therefrom. According to this method, irregularities can be formed by selecting a coloring pattern of a desired color from a plurality of coloring patterns, and it is possible to form a desired degree of irregularity at a desired position.

Further, in the nanoimprint method, a master on which a concave-convex pattern of several tens to several hundreds of nm is formed by electron beam lithography or the like in advance is pressed against a substrate on which a colored pattern is formed, and the concavities and convexities of the master are transferred to a coloring pattern. More specifically, US Pat. No. 5,772,905, S. Y. Chou et al., Appl. Phys. Lett. 76, 3141 (1995)). Also by the nanoimprint method, irregularities can be formed by selecting a coloring pattern of a desired color from among a plurality of coloring patterns, and it is possible to form a desired degree of irregularity at a desired position.

As described above, by forming the unevenness on the surface of the colored pattern formed by using the colored composition, it is possible to increase the extraction efficiency of light transmitted through the colored pattern. This effect is remarkable especially in the red coloring pattern and the green coloring pattern. Accordingly, it is also possible to select at least one of the red and green coloring patterns, and to impart unevenness to the surface thereof.

The size of the irregularities formed on the surface of the colored pattern can be adjusted to a desired value, but preferably the height of the convex portion is 10 nm or more and the width of the convex portion is 10 nm or more. In the present embodiment, the height of the convex portion is more preferably 50 nm or more, more preferably 50 nm to 200 nm, and particularly preferably 80 nm to 200 nm. On the other hand, the width of the convex portion is preferably 20 nm or more, more preferably 20 nm to 200 nm. The size of the irregularities formed on the surface of the colored pattern was measured by image analysis of an SEM photograph. In addition, when it is intended to improve the Y value of the color filter, it is preferable that irregularities are formed on the surface of 30% or more of the total pixel area of the coloring pattern to be formed with irregularities. In this case, it is preferable that the regions where the irregularities are formed are uniformly dispersed throughout the entire color filter, and even within one arbitrary pixel, without being deviated to a part.

By further forming a protective film on the colored pattern in which the unevenness is formed in this manner, the display characteristics of the display element can be enhanced. As the protective film, an organic film or an organic-inorganic hybrid film formed of a curable composition, or an inorganic film such as a SiNx film and a SiOx film can be given. In the present embodiment, it is preferable to form a protective film by using a curable composition.

As a method for forming a protective film using a curable resin composition, for example, a method disclosed in Japanese Patent Application Laid-Open No. 4-53879 or Japanese Patent Application Laid-Open No. 6-192389 can be adopted . According to this method, first, the curable resin composition is coated on the surface of a substrate having a colored pattern formed thereon, and the solvent is removed by pre-baking to form a coated film. This coating film is exposed and developed as necessary to obtain a desired pattern, and then the protective film is formed by post-baking.

The light source of the radiation used for forming the protective film, and the method and conditions of prebaking or postbaking are the same as the above-described (1) method of forming the coloring pattern in the step of forming the coloring pattern on the substrate using the coloring composition . The film thickness of the protective film thus formed is usually 0.1 to 8.0 탆, preferably 0.1 to 6.0 탆.

Examples of the curable resin composition used for forming the protective film include thermosetting resin compositions disclosed in JP-A-3-188153 and JP-A-4-53879, ) 6-192389 or Japanese Patent Application Laid-open No. 8-183819, Japanese Patent Laid-Open Publication No. 2006-195420 or Japanese Patent Laid-Open Publication No. 2008-208342 And a curing composition containing a polyorganosiloxane.

According to the method for producing a color filter of the present embodiment, a color filter having a high stimulus value Y of brightness in a CIE colorimetric system is obtained. Therefore, by using the color filter of this embodiment, it is possible to provide a display element with high luminance. The color filter of the present embodiment is suitable as various color filters including, for example, a color filter for a color liquid crystal display element, a color filter for color separation of a solid-state image pickup element, a color filter for an organic EL display element, .

<Color filter>

The color filter of this embodiment is a color filter manufactured by the above-described method of manufacturing a color filter of this embodiment.

Specifically, in the color filter of the present embodiment, the coloring patterns of the three primary colors of red, green, and blue, including the above-mentioned pigment and dye, are arranged in a predetermined arrangement to have a pixel array, Respectively. The coloring pattern constituting the color filter may be a coloring pattern having three primary colors of yellow, magenta, and cyan. As described above, in addition to the coloring pattern corresponding to the pixels of the three primary colors of red, green, and blue, a fourth pixel (yellow pixel) or a fifth pixel (cyan pixel) 5 coloring patterns may be formed.

Further, in the color filter of the present embodiment, it is preferable that the substrate has a light-shielding layer (black matrix) so as to partition a portion for forming a pixel on the substrate. It is also possible to have no light shielding layer.

In the color filter of this embodiment, fine irregularities formed by the above-mentioned etching method, nanoimprint method, softening or the like are formed on the surface of the colored pattern. Although it is possible to adjust the size of the irregularities to a desired value, it is preferable that the height of the convex portion is 10 nm or more and the width of the bottom portion of the convex portion is 10 nm or more. The height of the convex portion is preferably 50 nm or more, more preferably 50 nm to 200 nm, and particularly preferably 80 nm to 200 nm. On the other hand, the width of the convex portion is preferably 20 nm or more, more preferably 20 nm to 200 nm.

In addition, when it is intended to improve the Y value of the color filter, it is preferable that irregularities are formed on the surface of 30% or more of the total pixel area of the coloring pattern to be formed with irregularities. In this case, as described above, it is preferable that the regions where the irregularities are formed on the surface of the color pattern are uniformly dispersed throughout the entire color filter and in any one pixel without being shifted to some regions.

It is preferable that the color filter of the present embodiment has a protective film on a colored pattern in which unevenness is formed. By providing a protective film, the process resistance of the color filter in the manufacturing process of the display element can be enhanced. As the protective film, an organic film or an organic-inorganic hybrid film formed of a curable composition, or an inorganic film such as a SiNx film and a SiOx film can be mentioned as described above. In the present embodiment, it is preferable to form a protective film by using a curable composition.

The color filter of the present embodiment has the above configuration, so that the stimulus value Y of the brightness in the CIE colorimetric system is high. Therefore, this color filter is useful as various color filters, including color filters for color liquid crystal display elements, color filters for color separation of solid-state image pickup devices, color filters for organic EL display devices, and color filters for electronic papers.

<Display element>

The display element of the present embodiment has the color filter of the present embodiment described above. Specific examples of the display element include a color liquid crystal display element, an organic EL display element, and an electronic paper.

The color liquid crystal display element of the present embodiment can have the following structure.

The color liquid crystal display element may have a structure in which, for example, a driving substrate on which a thin film transistor (TFT) is disposed and another substrate on which the color filter of this embodiment is mounted face each other with a liquid crystal layer interposed therebetween . Alternatively, the color liquid crystal display element may be formed by forming a substrate on which a color filter of the present embodiment is formed on a surface of a driving substrate on which a thin film transistor (TFT) is disposed and a substrate on which a color filter of ITO (Indium Tin Oxide The substrate may have a structure in which the substrate faces the liquid crystal layer. The latter structure can remarkably improve the aperture ratio and has an advantage that a bright and high-definition liquid crystal display element can be obtained.

1 is a schematic sectional view of a color liquid crystal display element having a color filter according to the present embodiment.

The liquid crystal display element 1 shown in Fig. 1 is an example of a color liquid crystal display element of the present embodiment, and is a display element of TN (Twisted Nematic) liquid crystal mode driven by a TFT. This color liquid crystal display element has a structure in which the above-described substrate for driving and the substrate on which the color filter is formed face each other with a TN liquid crystal layer interposed therebetween. 1, a TFT (not shown) and a transparent pixel electrode 3 are arranged in a lattice form on the side of the transparent substrate 2 which is in contact with the liquid crystal 13, and constitutes a driving substrate have. A coloring pattern 6 of red, green, and blue, a black matrix 7, and a coloring pattern 7 are formed on a side of the transparent substrate 5, which is in contact with the liquid crystal 13, The color filter 10 having the protective film 8 formed thereon is disposed. Here, the aforementioned fine irregularities are formed on the surface of the colored pattern 6. On the color filter 10, a transparent common electrode 11 is provided.

An alignment film 12 is formed on the substrate 2 and the substrate 5, respectively. By uniformly rubbing the alignment film 12, it is possible to achieve uniform alignment of the pinching liquid crystal 13 between both the substrates 2 and 5. [

In the substrate 2 and the substrate 5, polarizers 14 are disposed on the side opposite to the side in contact with the liquid crystal 13, respectively. The distance between the substrate 2 and the substrate 5 is usually 2 to 10 占 퐉, and these are fixed to each other by the sealing member 16 provided at the peripheral portion.

1, reference numeral 17 is a backlight irradiated from a backlight unit (not shown) toward the liquid crystal 13. As the backlight unit, for example, a structure having a combination of a fluorescent tube such as a cold cathode fluorescent lamp (CCFL) and a scattering plate can be used. Further, a backlight unit using a white LED as a light source may also be used. Examples of white LEDs include white LEDs that combine red LEDs, green LEDs, and blue LEDs to obtain white light by mixing colors, white LEDs that combine blue LEDs, red LEDs, and green phosphors to obtain white light by mixing colors, A white LED for obtaining a white light by mixing a red light emitting phosphor and a green light emitting phosphor and a white LED for obtaining a white light by mixing a blue LED and a YAG based phosphor, a blue LED, an orange light emitting phosphor and a green light emitting phosphor, A white LED for obtaining white light by mixing white light, an ultraviolet LED and a red LED, a white LED for obtaining a white light by mixing a green light emitting fluorescent substance and a blue light emitting fluorescent substance, and the like.

The color liquid crystal display device of this embodiment may be applied to liquid crystal display devices such as STN (Super Twisted Nematic) type, IPS (In-Planes Switching) type, VA (Vertical Alignment) type, OCB (Optically Compensated Birefringence) Mode.

The organic EL display device having the color filter of this embodiment can adopt a suitable structure, and includes a structure disclosed in, for example, Japanese Patent Application Laid-Open No. 11-307242.

The electronic paper having the color filter of this embodiment can adopt a suitable structure, and for example, a structure disclosed in Japanese Patent Application Laid-Open No. 2007-41169 can be cited.

Although the present embodiment has been described above, the present invention is not limited to the above-described embodiment, and various modifications may be made without departing from the scope of the present invention.

[Example]

Hereinafter, the present invention will be described in more detail by way of examples. However, the present invention is not limited to the following examples.

[Preparation of colorant dispersion]

Production Example 1

2.3 parts by mass of CI Pigment Red 254, 11.4 parts by mass of CI Pigment Red 177, 1.3 parts by mass of CI Pigment Yellow 150 and BYK (registered trademark) -21324 (manufactured by BYK) as a dispersing agent, (Solid content concentration = 40 mass%) as a solvent and a mixed solvent of propylene glycol monomethyl ether acetate / propylene glycol monoethyl ether = 90/10 (mass ratio) as a solvent so that the solid content concentration became 20% And the mixture was mixed and dispersed for 12 hours to prepare a pigment dispersion (M-1).

Production Example 2

9.7 parts by mass of CI Pigment Green 58, 5.3 parts by mass of CI Pigment Yellow 150, and 8 parts by mass of BYK (registered trademark) -21324 (manufactured by BYK) as a dispersant (solids concentration = 40 mass %) As a solvent and a mixed solvent of propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether at a ratio of 90/10 (by mass) were mixed and dispersed for 12 hours using a bead mill so that the solid content became 20% (M-2).

Production Example 3

9.3 parts by mass of CI Pigment Blue 15: 6, 5.7 parts by mass of CI Pigment Violet, and 8 parts by mass of BYK (registered trademark) -21324 (manufactured by BYK) as a dispersant (solids concentration = 40 And a mixed solvent of propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether = 90/10 (mass ratio) as a solvent were mixed and dispersed for 12 hours using a bead mill so that the solid content became 20% To thereby prepare a dispersion (M-3).

[Synthesis of binder resin]

Synthesis Example 1

2 parts by mass of 2,2'-azobisisobutyronitrile and 200 parts by mass of propylene glycol monomethyl ether acetate were fed into a flask equipped with a thermometer, a cooling tube and a stirrer. Subsequently, 15 parts by mass of methacrylic acid, 20 parts by mass of benzyl methacrylate, 55 parts by mass of benzyl methacrylate, 10 parts by mass of styrene and 2,4-diphenyl-4-methyl-1-pentene (trade name: Nopmer (registered trademark) MSD), and the mixture was purged with nitrogen. Thereafter, the mixture was gently stirred, the temperature of the reaction solution was raised to 80 DEG C, and the temperature was maintained for 5 hours to polymerize to obtain a resin solution (solid content concentration = 33 mass%). The obtained resin had Mw = 16,000 and Mn = 7,000. This resin solution is referred to as &quot; binder resin solution (P1) &quot;.

[Preparation of coloring and radiation-sensitive composition]

Production Example 4

, 30 parts by mass (solid content concentration = 33% by mass) of a binder resin solution (P1) as a binder resin, 15 parts by mass of dipentaerythritol hexaacrylate as a cross-linking agent, and 100 parts by mass of a pigment dispersion (M- 4 parts by mass of benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one and 1 part by mass of 4,4'-bis (diethylamino) benzophenone as a fluorine- 0.1 part by mass of Megaface (registered trademark) F-554 available from Kao Corporation and propylene glycol monomethyl ether acetate as a solvent were mixed to prepare a red radiation radiation-curable composition (CR-1) having a solid content concentration of 22%.

Production Example 5

A green radiation-sensitive composition (CR-2) was prepared in the same manner as in Production Example 4, except that the pigment dispersion (M-2) was used instead of the pigment dispersion (M-1) in Production Example 4.

Production Example 6

A blue radiation-sensitive composition (CR-3) was prepared in the same manner as in Production Example 4, except that the pigment dispersion (M-3) was used instead of the pigment dispersion (M-1) in Production Example 4.

Hereinafter, the formation of a coloring pattern using the red radiation-emitting composition (CR-1), the green radiation-emitting composition (CR-2) and the blue radiation- An embodiment of the unevenness formation will be described. In the following, the colored pattern is referred to as a colored cured film.

Example 1

<Formation of Red Cured Film and Formation of Unevenness>

The red radiation-sensitive composition (CR-1) was coated on a soda glass substrate using a spin coater and prebaked in a clean oven at 80 캜 for 10 minutes to form a coating film.

Subsequently, the substrate on which the coated film was formed was cooled to room temperature, and then the coated film was exposed to radiation containing wavelengths of 365 nm, 405 nm, and 436 nm at an exposure dose of 400 J / m 2 through a photomask using a high pressure mercury lamp. Subsequently, a developer containing 0.04 mass% potassium hydroxide aqueous solution at 23 占 폚 was ejected onto these substrates at a developing pressure of 1 kgf / cm2 (nozzle diameter: 1 mm) for 1 minute of showering. Thereafter, these substrates were washed with ultrapure water, air-dried, and post-baked again in a clean oven at 230 캜 for 30 minutes to form a red cured film on the substrate.

The obtained cured film was subjected to dry etching treatment using a plasma etching apparatus EXAM manufactured by Shinko Seiki to form irregularities on the entire surface of the cured film. At this time, the RF power was 400 W. Table 1 shows dry etching treatment conditions.

Examples 2 and 3

<Formation of Red Cured Film and Formation of Unevenness>

Unevenness was formed in the same manner as in Example 1 except that a red cured film was formed in the same manner as in Example 1 and the dry etching treatment time was set to the time shown in Table 1. [

Comparative Example 1

&Lt; Formation of red cured film &

A red cured film was formed in the same manner as in Example 1. However, the formation of irregularities by the dry etching treatment performed in Example 1 was not carried out.

Example 4

&Lt; Formation of Green Cured Film and Formation of Unevenness >

The green radiation-sensitive composition (CR-2) was coated on a soda glass substrate using a spin coater and then pre-baked in a clean oven at 80 캜 for 10 minutes to form a coating film.

Subsequently, the substrate on which the coated film was formed was cooled to room temperature, and then the coated film was exposed to radiation containing wavelengths of 365 nm, 405 nm, and 436 nm at an exposure dose of 400 J / m 2 through a photomask using a high pressure mercury lamp. Subsequently, a developer containing 0.04 mass% potassium hydroxide aqueous solution at 23 占 폚 was ejected onto these substrates at a developing pressure of 1 kgf / cm2 (nozzle diameter: 1 mm) for 1 minute of showering. Thereafter, these substrates were washed with ultrapure water, air-dried, and post-baked again in a clean oven at 230 캜 for 30 minutes to form a green cured film on the substrate.

The obtained cured film was subjected to dry etching treatment using a plasma etching apparatus EXAM manufactured by Shinko Seiki to form irregularities on the entire surface of the cured film. At this time, the RF power was 400 W. Table 1 shows dry etching treatment conditions.

Examples 5 and 6

&Lt; Formation of Green Cured Film and Formation of Unevenness >

Unevenness was formed in the same manner as in Example 4 except that a green cured film was formed in the same manner as in Example 4 and the dry etching treatment time was set to the time shown in Table 1. [

Comparative Example 2

&Lt; Formation of green cured film &

A green cured film was formed in the same manner as in Example 4. However, the formation of irregularities by the dry etching treatment performed in Example 4 was not carried out.

Example 7

&Lt; Formation of blue cured film and formation of unevenness &

The blue radiation-sensitive composition (CR-3) was coated on a soda glass substrate using a spin coater and then pre-baked in a clean oven at 80 캜 for 10 minutes to form a coating film.

Subsequently, the substrate on which the coated film was formed was cooled to room temperature, and then the coated film was exposed to radiation containing wavelengths of 365 nm, 405 nm, and 436 nm at an exposure dose of 400 J / m 2 through a photomask using a high pressure mercury lamp. Subsequently, a developer containing 0.04 mass% potassium hydroxide aqueous solution at 23 占 폚 was ejected onto these substrates at a developing pressure of 1 kgf / cm2 (nozzle diameter: 1 mm) to perform showering for 1 minute. Thereafter, these substrates were washed with ultrapure water, air-dried, and post-baked again in a clean oven at 230 캜 for 30 minutes to form a blue cured film on the substrate.

The obtained cured film was subjected to dry etching treatment using a plasma etching apparatus EXAM manufactured by Shinko Seiki to form irregularities on the entire surface of the cured film. At this time, the RF power was 400 W. Table 1 shows dry etching treatment conditions.

Example 8

&Lt; Formation of blue cured film and formation of unevenness &

Unevenness was formed in the same manner as in Example 7 except that a blue cured film was formed in the same manner as in Example 7 and the dry etching treatment time was set to the time shown in Table 1. [

Comparative Example 3

&Lt; Formation of blue cured film &

A blue cured film was formed in the same manner as in Example 7. However, the formation of the unevenness by the dry etching treatment performed in Example 7 was not carried out.

Table 1 shows dry etching treatment conditions in each of the above Examples and Comparative Examples.

Example 9

<SEM evaluation>

SEM photographs were taken at the magnifications of 40000 times for each of the concavo-convex color-cured films obtained in Examples 1 to 8 and Comparative Examples 1 to 3, and the state of concavity and convexity formed on the surface of each cured film .

2 is a SEM photograph of the surface of the red cured film obtained by Examples 1 to 3 and Comparative Example 1. Fig.

3 is a cross-sectional SEM photograph of the red cured film obtained by Examples 1 to 3 and Comparative Example 1. Fig.

4 is a SEM photograph of the surface of the green cured film obtained by Examples 4 to 6 and Comparative Example 2. Fig.

5 is a cross-sectional SEM photograph of the green cured film obtained by Examples 4 to 6 and Comparative Example 2. Fig.

6 is a SEM photograph of the surface of the blue cured film obtained in Example 7, Example 8 and Comparative Example 3. Fig.

7 is a cross-sectional SEM photograph of the blue cured film obtained by Example 7, Example 8 and Comparative Example 3. Fig.

From the results of the SEM photograph evaluation of the respective color cured films shown in Figs. 2 to 7, the size of the unevenness formed on the surface of each color cured film was found to be in the range of 80 nm to 200 nm in height and 20 nm to 200 nm in width okay. It was also found that the longer the dry etching treatment time, the greater the size of the irregularities formed in each color cured film.

Example 10

&Lt; Evaluation of chromaticity characteristics &

(MCPD (registered trademark) 2000 manufactured by Otsuka Denshi Co., Ltd.) was used for each of the color cured films formed in the unevenness obtained in Examples 1 to 8 and Comparative Examples 1 to 3, (X, y) and a magnetic pole value (Y) in a CIE colorimetric system were measured with a light source and a 2-degree field of view. The evaluation results are shown in Table 2.

The respective color cured films obtained in Examples 1 to 8 with irregularities exhibited a high Y value for the cured films obtained in the corresponding Comparative Examples. Particularly, the effects of the red cured film and the green cured film, which were obtained in Examples 1 to 6, were large.

Example 11

&Lt; Preparation and evaluation of color filter &

The red radiation-sensitive composition (CR-1) was applied to a glass substrate on which a black matrix was formed by using a slit-and-spin coater, and then pre-baked on a hot plate at 90 ° C for 3 minutes to form a coating film.

Subsequently, the substrate on which the coated film was formed was cooled to room temperature, and then a high-pressure mercury lamp was used and the coated film was irradiated with radiation having wavelengths of 365 nm, 405 nm, and 436 nm at an exposure amount of 1,000 J / Exposed. Thereafter, a developing solution containing 0.04 mass% potassium hydroxide aqueous solution at 23 占 폚 was ejected at a developing pressure of 1 kgf / cm2 (nozzle diameter: 1 mm) on the obtained substrate to perform shower phenomenon, followed by cleaning with ultrapure water, Post-baking for 20 minutes in a clean oven. Thus, a red stripe-like coloring pattern showing the chromaticity coordinate value (x, y) equivalent to that of Example 1 was formed on the substrate.

Subsequently, by using the green radiation-emitting composition (CR-2), a green color having a chromaticity coordinate value (x, y) equivalent to the chromaticity coordinate value (x, y) Thereby forming a stripe-like colored pattern.

Subsequently, the blue radiation-sensitive composition (CR-3) was used in the same manner as in Example 7, and a blue color indicating the chromaticity coordinate value (x, y) By forming a stripe-like colored pattern, a color filter including red, green and blue stripe-colored patterns was produced.

After each coloring pattern formation, dry etching treatment was performed for 40 seconds using a plasma etching apparatus EXAM (RF power: 400 W / gas species (flow rate): oxygen (20 ml / min) + argon .

For the obtained color filter, the stimulus value (Y) in the white display when the cold-cathode fluorescent tube was used as the backlight source was measured. As a result, the stimulus value Y in the white display was improved by 0.6 points as compared with Comparative Example 4 described later.

Comparative Example 4

&Lt; Preparation and evaluation of color filter &

In the same manner as in Example 10, a color filter including red, green, and blue stripe-based coloring patterns was produced. However, formation of irregularities by the dry etching treatment performed in Example 10 was not carried out. For the obtained color filter, the stimulus value (Y) in the white display when the cold-cathode fluorescent tube was used as the backlight source was measured and compared with the Y value of the color filter obtained in Example 10.

Example 12

&Lt; Application of color filter to liquid crystal display element >

A thermosetting resin composition containing a composition described below was applied on a coloring pattern using a slit-and-spin coater using a color filter including a stripe-based coloring pattern of red, green, and blue obtained in Example 11. Baked on a hot plate at 80 DEG C for 2 minutes to form a coating film and post-baked again in a clean oven at 230 DEG C for 60 minutes to form a protective film having a thickness of 1.5 mu m.

Subsequently, a liquid crystal display element was manufactured using this color filter. The liquid crystal display element has a structure similar to that of the color liquid crystal display element shown in Fig. The obtained color liquid crystal display element exhibited excellent electric characteristics and display characteristics.

Next, the thermosetting resin composition used as a protective film of the color filter will be described.

The thermosetting resin composition was a copolymer of glycidyl methacrylate / styrene / t-butyl methacrylate / dicyclopentanyl methacrylate = 40/10/30/20 (weight ratio) (number average molecular weight Mn = 6,000, molecular weight distribution 40 parts by mass of a novolak type epoxy resin (trade name: "Epikote 152", manufactured by Japan Epoxy Resin Co., Ltd.), 20 parts by mass of γ-glycidoxypropyltrimethoxysilane And 0.2 parts by mass of a surfactant FTX-218 (manufactured by NEOS). As the solvent, diethylene glycol methyl ethyl ether was used. The solid content concentration of the thermosetting resin composition was 15 mass%.

1: liquid crystal display element
2, 5: substrate
3: pixel electrode
6: Coloring pattern
7: Black Matrix
8: Shield
10: Color filter
11: common electrode
12: Orientation film
13: liquid crystal
14: polarizer
16: Seal material
17: backlight light

Claims (9)

A step of forming a colored pattern on a substrate,
A step of forming irregularities on the surface of the colored pattern,
Wherein a width of a bottom side of the convex portion of the concavities and convexities is in the range of 20 nm to 200 nm. The method of manufacturing a color filter according to claim 1, wherein the concavities and convexities are formed by an etching method, a nanoimprint method, or a polishing method. The method according to claim 1, wherein the step of forming irregularities on the surface of the colored pattern comprises the steps of forming a resist pattern on the colored pattern and etching the colored pattern exposed from the resist pattern to form the irregularities And the color filter is formed on the substrate. The method of manufacturing a color filter according to claim 1, wherein a height of the convex portion of the concavities and convexities is in a range of 50 nm to 200 nm. The image forming apparatus according to any one of claims 1 to 3, wherein the coloring pattern includes at least one of a red coloring pattern and a green coloring pattern, and at least one of the red coloring pattern and the green coloring pattern Is formed on the surface of the substrate. The method of manufacturing a color filter according to any one of claims 1 to 3, further comprising a step of forming a protective film on the colored pattern on which the unevenness is formed. A display element having a color filter manufactured by the method according to any one of claims 1 to 3. 1. A color filter having a plurality of colored patterns on a substrate,
Characterized in that concavities and convexities are formed on the surface of the coloring pattern of at least one of the plurality of coloring patterns of the plurality of colors, the height of the convexity of the concavities and convexities is 10 nm or more and the width of the base of the convexity is 20 nm to 200 nm Color filter. The method of manufacturing a color filter according to claim 1, wherein a height of the convex portion of the concavities and convexities is in a range of 80 nm to 200 nm.

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