CN202003138U - Exposure machine capable of cleaning maskplate - Google Patents
Exposure machine capable of cleaning maskplate Download PDFInfo
- Publication number
- CN202003138U CN202003138U CN 201120081548 CN201120081548U CN202003138U CN 202003138 U CN202003138 U CN 202003138U CN 201120081548 CN201120081548 CN 201120081548 CN 201120081548 U CN201120081548 U CN 201120081548U CN 202003138 U CN202003138 U CN 202003138U
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- Prior art keywords
- mask
- exposure machine
- cutter
- transfer passage
- cleaning
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Abstract
The utility model relates to technical field of cleaning of a maskplate in an exposure machine, in particular to an exposure machine capable of cleaning a maskplate. The exposure machine capable of cleaning the maskplate comprises a transmission channel for transmitting the maskplate and cleaning devices arranged above and/or below the transmission channel. The exposure machine capable of cleaning the maskplate provided by the utility model can effectively remove foreign bodies adhered on the front surface and/or the back surface of the maskplate through the installing of the cleaning devices at different positions inside the exposure machine, so as to increase the cleanness of the maskplate and not to affect the air flow distribution inside a cavity of the exposure machine.
Description
Technical field
The utility model relates to the technical field of cleaning mask in the exposure machine, particularly a kind of exposure machine with mask cleaning function.
Background technology
At TFT-LCD (Thin Film Transistor-Liquid Crystal Display, thin film transistor (TFT)-LCD) in the manufacturing, photomask is the critical component of photoetching process, in photoetching process, photomask and ultraviolet light that utilization has layout expose to the substrate that scribbles photoresist, can be with the pattern transfer on the photomask to substrate.In the actual TFT-LCD production technology, need repeatedly several times photoetching just can finish the making of thin film transistor (TFT) array and color membrane substrates.
Since the pattern of photomask be according to 1: 1 ratio transcription to substrate, the defective on the photomask is easy to cause the defective of product pattern after the exposure transcription, thereby influences reliability of products or cause the acceptance rate of product to descend.Because on the photomask micron-sized pattern is arranged, the foreign particles that exists in production environment or the production run is easy to directly cause the defective of exposure figure attached to the surface of mask and the back side.
General manufacturing plant commercial city is regularly the surface of photomask and the back side to be carried out after the foreign matter situation confirms, or finds that just can mask simply be cleaned under the situation of image deflects appears in product after the exposure.The general employing of the method for existing cleaning mask stops the technology progress, cleans separately after separately mask being taken out in the exposure machine.The mode of this cleaning mask, operating wastes time and energy, and cause the breakage of mask easily, and cleaning efficiency is low.The mask that is arranged in exposure machine can not obtain real time cleaning, can not guarantee the cleanliness factor of photomask upper and lower surface from root, cause the mask upper and lower surface to adhere to foreign matter easily, and then cause product the graphic defects of repeatability in enormous quantities to occur, waste processing cost.
The utility model content
(1) technical matters that will solve
The technical problems to be solved in the utility model is to overcome to have only in the prior art just to clean mask after defective appears in product pattern, and cleaning complicated operation during mask, wastes time and energy, and causes shortcomings such as mask breakage easily.
(2) technical scheme
In order to address the above problem, the utility model provides a kind of exposure machine with mask cleaning function, comprising: carry the top and/or the below of the transfer passage of mask that cleaning device is installed in the exposure machine.
Further, described cleaning device is blowing cutter and/or air draught cutter.
Further, the starting point of described transfer passage is mask porch in the exposure machine, the blowing cutter is installed in the top and/or the below of mask porch in the exposure machine; The airflow direction that described blowing cutter produces is opposite with the direction that mask enters exposure machine.
Further, the terminal point of described transfer passage is a base station of placing mask in the exposure machine, with the relative top and/or the below of placing the mask base station in the exposure machine that be installed in the air draught cutter of blowing cutter, the airflow direction that described blowing cutter produces is opposite in the direction of the enterprising line scanning of base station with mask.
Further, also comprise the transfer passage that forms between the induction pick-up that is arranged in the film particles pick-up unit in the described transfer passage, blowing cutter and air draught cutter are installed in the top and/or the below of the transfer passage that forms between the induction pick-up relatively, and the airflow direction that described blowing cutter produces is consistent with the direction that mask scans in the film particles pick-up unit.
Further, described cleaning device is self-priming dust suction parts, and described self-priming dust suction parts have suction end.
Described self-priming dust suction parts are installed in the top and/or the below of mask porch in the exposure machine;
Perhaps be installed in the top and/or the below of placing the mask base station;
Perhaps be installed in the top and/or the below of the transfer passage that forms between the induction pick-up in the film particles pick-up unit.
(3) beneficial effect
The exposure machine that the utility model provides with mask cleaning function, by the method for cleaning device being installed at the inner diverse location of exposure machine, can effectively remove the foreign matter that the mask surface and/or the back side are adhered to, improve the cleanliness of mask, the air-flow that does not influence the exposure machine chamber interior simultaneously distributes.
Description of drawings
Fig. 1 the utlity model has porch positional structure synoptic diagram in the exposure machine of mask cleaning function;
Fig. 2 the utlity model has base station positional structure synoptic diagram in the exposure machine of mask cleaning function;
Fig. 3 the utlity model has film particles pick-up unit positional structure synoptic diagram in the exposure machine of mask cleaning function.
Embodiment
Below in conjunction with drawings and Examples, embodiment of the present utility model is described in further detail.Following examples are used to illustrate the utility model, but are not used for limiting scope of the present utility model.
Embodiment 1
As shown in Figure 1, this has the exposure machine of mask cleaning function, above the transfer passage of carrying mask and/or below cleaning device is installed.Wherein, the starting point of transfer passage is the porch 1 of mask 5 in the exposure machine, and the terminal point of transfer passage is a base station 2 (referring to Fig. 2) of placing mask 5 in the exposure machine.Mask 5 in the present embodiment is that the silica based flaggy and the back side are that the diaphragm of superpolyester is formed by the surface.
In the present embodiment, the mask cleaning device adopts blowing cutter 41 and/or air draught cutter 42.In the starting point of the transfer passage of carrying mask, promptly blowing cutter 41 is installed in the porch 1 of the mask 5 of exposure machine, the airflow direction that these blowing cutter 41 generations are set is opposite with the direction that mask enters exposure machine.Direction indication as arrow among Fig. 1 is blowing direction, the blowing direction of blowing cutter 41 can blow to the outside of exposure machine, the foreign particles that adheres on the surface and/or the back side in the time of can effectively removing mask 5 like this and enter exposure machine, guarantee to have higher cleanliness before mask 5 enters exposure machine, prevent owing to defective appears in the mask 5 unclean product images that cause.Because the air-flow of blowing cutter 41 does not enter into the exposure machine chamber, therefore, the internal gas flow that can not have influence on the exposure machine chamber distributes.
As shown in Figure 2, carry the terminal point of the transfer passage of mask, it is the base station 2 of placing mask in the exposure machine, the top of base station 2 and/or below are installed blowing cutter 41 and air draught cutter 42 respectively relatively, the airflow direction that the cutter 41 of guaranteeing to dry produces is opposite with the direction of scanning of mask 5 on base station 2, as the arrow points direction among Fig. 2.Relative blowing cutter 41 and the air draught cutter of installing 42, the air-flow that the cutter 41 of can guaranteeing to dry blows out can be reclaimed by air draught cutter 42, and then the air-flow that can not have influence on the exposure machine chamber interior distributes.When mask 5 when scanning, the surface and/or the back side of blowing cutter 41 and 42 pairs of masks 5 of air draught cutter are cleaned in real time, guarantee mask 5 on base station 2, to move and do not have foreign particles to drop, and then prevent owing to defective appears in the mask 5 unclean product images that cause at the surface and/or the back side of mask 5.
As shown in Figure 3, the film particles pick-up unit is can select mounted component in the exposure machine, if the inner film particles pick-up unit of installing of exposure machine, then before mask 5 carries out exposure operation, can adopt the film particles pick-up unit that the detection of foreign particles is carried out at the surface and/or the back side of mask 5.Form transfer passage between the induction pick-up 3 that in the film particles pick-up unit, is equipped with.Above this transfer passage and/or below blowing cutter 41 and air draught cutter 42 relatively are installed, the airflow direction of 42 formation of blowing cutter 41 and air draught cutter is consistent with the direction that mask 5 scans in the film particles pick-up unit, as the arrow points direction among Fig. 3.Relative blowing cutter 41 and the air draught cutter of installing 42, the air-flow that the cutter 41 of can guaranteeing to dry blows out can be reclaimed by air draught cutter 42, and then the air-flow that can not have influence on the exposure machine chamber interior distributes.In the process that mask scans, the surface and/or the back side of mask 5 can be handled by blowing cutter 41 and air draught cutter 42, remove foreign particles, guarantee that the mask 5 that enters in the exposure technology has higher cleanliness.
Embodiment 2
Mask cleaning device in the present embodiment adopts self-priming dedusting parts, these self-priming dedusting parts have unidirectional suction end, these self-priming dedusting parts have blade, by motor drives blade high speed rotating, in the housing of sealing, produce air negative pressure, draw the foreign matter at the mask surface and/or the back side.
Self-priming dust suction parts in the present embodiment can be installed in the mask plate porch, can be installed in the base station place of placing mask, also can be installed in the transfer passage place that forms between the induction pick-up in the film particles pick-up unit.And, can install simultaneously in any place, the installation of two places or three places among above-mentioned three places, the particular location of installation is identical with embodiment 1.
Certainly, except the foregoing description, also can adopt other modes well known in the art to replace aforesaid air knife and self-priming dedusting parts, realize removing the dust or the foreign matter at the mask surface and/or the back side.
The exposure machine that the utility model provides with mask cleaning function, by the method for cleaning device being installed at the inner diverse location of exposure machine, can effectively remove the foreign matter that the mask surface and/or the back side are adhered to, improve the cleanliness of mask, reduce because the portrait defective that dust causes on the mask does not influence the air-flow distribution of exposure machine chamber interior simultaneously.
Above embodiment only is used to illustrate the utility model; and be not to restriction of the present utility model; the those of ordinary skill in relevant technologies field; under the situation that does not break away from spirit and scope of the present utility model; can also make various variations and modification; therefore all technical schemes that are equal to also belong to category of the present utility model, and scope of patent protection of the present utility model should be defined by the claims.
Claims (7)
1. the exposure machine with mask cleaning function is characterized in that, comprising: carry the top and/or the below of the transfer passage of mask that the mask cleaning device is installed in the exposure machine.
2. the exposure machine with mask cleaning function as claimed in claim 1 is characterized in that, described cleaning device is blowing cutter and/or air draught cutter.
3. the exposure machine with mask cleaning function as claimed in claim 2 is characterized in that, the starting point of described transfer passage is mask porch in the exposure machine, the blowing cutter is installed in the top and/or the below of mask porch in the exposure machine; The airflow direction that described blowing cutter produces is opposite with the direction that mask enters exposure machine.
4. the exposure machine with mask cleaning function as claimed in claim 2, it is characterized in that, the terminal point of described transfer passage is a base station of placing mask in the exposure machine, with the relative top and/or the below of placing the mask base station in the exposure machine that be installed in the air draught cutter of blowing cutter, the airflow direction that described blowing cutter produces is opposite in the direction of the enterprising line scanning of base station with mask.
5. the exposure machine with mask cleaning function as claimed in claim 1, it is characterized in that, also comprise the transfer passage that forms between the induction pick-up that is arranged in the film particles pick-up unit in the described transfer passage, blowing cutter and air draught cutter are installed in the top and/or the below of the transfer passage that forms between the induction pick-up relatively, and the airflow direction that described blowing cutter produces is consistent with the direction that mask scans in the film particles pick-up unit.
6. the exposure machine with mask cleaning function as claimed in claim 1 is characterized in that, described cleaning device is self-priming dust suction parts, and described self-priming dust suction parts have suction end.
7. the exposure machine with mask cleaning function as claimed in claim 6 is characterized in that, described self-priming dust suction parts are installed in the top and/or the below of mask porch in the exposure machine;
Perhaps be installed in the top and/or the below of placing the mask base station;
Perhaps be installed in the top and/or the below of the transfer passage that forms between the induction pick-up in the film particles pick-up unit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120081548 CN202003138U (en) | 2011-03-24 | 2011-03-24 | Exposure machine capable of cleaning maskplate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120081548 CN202003138U (en) | 2011-03-24 | 2011-03-24 | Exposure machine capable of cleaning maskplate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202003138U true CN202003138U (en) | 2011-10-05 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201120081548 Expired - Lifetime CN202003138U (en) | 2011-03-24 | 2011-03-24 | Exposure machine capable of cleaning maskplate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202003138U (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105467777A (en) * | 2015-12-14 | 2016-04-06 | 深圳市华星光电技术有限公司 | Exposure machine and photomask cleaning device |
| CN106094443A (en) * | 2016-05-31 | 2016-11-09 | 深圳市华星光电技术有限公司 | Exposure machine and the method carrying out optical enclosure cleaning in exposure machine |
| CN107797392A (en) * | 2017-11-13 | 2018-03-13 | 上海华力微电子有限公司 | A kind of device and method for reducing mask plate particle contamination in extreme ultraviolet carving technology |
| CN108246722A (en) * | 2018-01-02 | 2018-07-06 | 京东方科技集团股份有限公司 | A kind of cleaning device and clean method of exposure machine cover blade |
| WO2019000256A1 (en) * | 2017-06-28 | 2019-01-03 | 深圳市柔宇科技有限公司 | Dust removal system within exposure machine and control method |
| CN109420623A (en) * | 2017-08-31 | 2019-03-05 | 无锡日联科技股份有限公司 | It is a kind of applied to the full-automatic X-ray detection of shell, sorting system |
| CN112051273A (en) * | 2020-07-31 | 2020-12-08 | 中国科学院微电子研究所 | Device and method for detecting and cleaning micro-dust on glass surface and film surface of photomask |
| CN114563924A (en) * | 2020-11-27 | 2022-05-31 | 中国科学院微电子研究所 | Photomask defect processing equipment, exposure machine and photomask defect processing method |
| WO2022160570A1 (en) * | 2021-01-28 | 2022-08-04 | 长鑫存储技术有限公司 | Semiconductor lithography equipment |
-
2011
- 2011-03-24 CN CN 201120081548 patent/CN202003138U/en not_active Expired - Lifetime
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105467777A (en) * | 2015-12-14 | 2016-04-06 | 深圳市华星光电技术有限公司 | Exposure machine and photomask cleaning device |
| CN106094443A (en) * | 2016-05-31 | 2016-11-09 | 深圳市华星光电技术有限公司 | Exposure machine and the method carrying out optical enclosure cleaning in exposure machine |
| CN106094443B (en) * | 2016-05-31 | 2017-12-29 | 深圳市华星光电技术有限公司 | Exposure machine and the method that optical enclosure cleaning is carried out in exposure machine |
| WO2019000256A1 (en) * | 2017-06-28 | 2019-01-03 | 深圳市柔宇科技有限公司 | Dust removal system within exposure machine and control method |
| CN109420623A (en) * | 2017-08-31 | 2019-03-05 | 无锡日联科技股份有限公司 | It is a kind of applied to the full-automatic X-ray detection of shell, sorting system |
| CN107797392A (en) * | 2017-11-13 | 2018-03-13 | 上海华力微电子有限公司 | A kind of device and method for reducing mask plate particle contamination in extreme ultraviolet carving technology |
| CN107797392B (en) * | 2017-11-13 | 2020-08-04 | 上海华力微电子有限公司 | Device and method for reducing particle pollution of mask in extreme ultraviolet lithography process |
| CN108246722A (en) * | 2018-01-02 | 2018-07-06 | 京东方科技集团股份有限公司 | A kind of cleaning device and clean method of exposure machine cover blade |
| CN112051273A (en) * | 2020-07-31 | 2020-12-08 | 中国科学院微电子研究所 | Device and method for detecting and cleaning micro-dust on glass surface and film surface of photomask |
| CN114563924A (en) * | 2020-11-27 | 2022-05-31 | 中国科学院微电子研究所 | Photomask defect processing equipment, exposure machine and photomask defect processing method |
| WO2022160570A1 (en) * | 2021-01-28 | 2022-08-04 | 长鑫存储技术有限公司 | Semiconductor lithography equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20111005 |
|
| CX01 | Expiry of patent term |