US11599029B2 - Reticle transfer device and exposure system - Google Patents
Reticle transfer device and exposure system Download PDFInfo
- Publication number
- US11599029B2 US11599029B2 US17/542,831 US202117542831A US11599029B2 US 11599029 B2 US11599029 B2 US 11599029B2 US 202117542831 A US202117542831 A US 202117542831A US 11599029 B2 US11599029 B2 US 11599029B2
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- reticle
- light
- transfer device
- controller
- particulate matter
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Definitions
- the embodiment of the present disclosure relates to a reticle transfer device and an exposure system.
- Photoetching is a critical step in the manufacturing process of semiconductor apparatuses such as a Dynamic Random Access Memory (DRAM).
- DRAM Dynamic Random Access Memory
- the cleanliness of a reticle is an important factor for ensuring the quality of photoetching.
- the first aspect of the present disclosure provides a reticle transfer device configured to convey a reticle between different components.
- the reticle transfer device includes: a bearing member, a light source, a light detector and a controller.
- the bearing member is configured to bear the reticle.
- the light source is arranged on, a side for bearing the reticle, of the bearing member, to emit irradiation light to the reticle.
- the reflected light is formed when the irradiation light irradiates the reticle.
- the light detector is configured to obtain the reflected light and generate a light detection signal based on the reflected light.
- the controller is electrically connected to the light detector and configured to determine whether particulate matter exists on a surface of the reticle based on the light detection signal.
- the second aspect of the present disclosure provides an exposure system including a plurality of components and a plurality of reticle transfer devices as described above, and the reticle transfer devices are configured to convey at least one reticle between different components.
- FIG. 1 is schematic view of a reticle transfer device according to an embodiment of the present disclosure.
- FIG. 2 is a schematic view of a reticle transfer device according to another embodiment of the present disclosure.
- FIG. 3 is a schematic view of a reticle transfer device according to yet another embodiment of the present disclosure.
- FIG. 4 is schematic view of a reticle transfer device according to yet another embodiment of the present disclosure.
- FIG. 5 is schematic view of a reticle transfer device according to yet another embodiment of the present disclosure.
- FIG. 6 is schematic view of a reticle transfer device according to yet another embodiment of the present disclosure.
- FIG. 7 is schematic view of a reticle transfer device according to yet another embodiment of the present disclosure.
- FIG. 8 is a schematic view of an exposure system according to an embodiment of the present disclosure.
- FIG. 9 is a schematic view of an exposure system according to another embodiment of the present disclosure.
- an Integrated Reticle Inspection System is generally used to detect whether particulate matter exists on a surface of a reticle.
- IRIS Integrated Reticle Inspection System
- connection and “linkage” in the present disclosure, unless otherwise stated, include both direct and indirect connections (linkage).
- the first feature “above” or “below” the second feature may be direct contact between the first feature and the second feature, or indirect contact between the first feature and the second feature through an intermediate.
- a situation that the first feature is “on”, “above” and “on the upside of” the second feature may be that the first feature is right above or obliquely above the second feature, or only represents that the horizontal height of the first feature is greater than that of the second feature.
- a situation that the first feature is “under”, “below” and “underneath” the second feature may be that the first feature is right below and in the oblique below the second feature, or only represents that the horizontal height of the first feature is less than that of the second feature.
- a reticle In a photoetching process, a reticle is required to be conveyed between different components of an exposure system by a reticle transfer device.
- the disclosure provides a reticle transfer device and an exposure system.
- the exposure system includes the reticle transfer device.
- the reticle transfer device according to the present disclosure can determine whether particulate matter exists on the surface of the reticle.
- the particulate matter when particulate matter is generated on the surface of the reticle, the particulate matter can be detected in time and the source of the particulate matter on the surface of the reticle can be accurately determined, so that the time of excluding the source of the particulate matter is shortened, engineering personnel can conveniently clean related components in time, and the manufacturing capacity of a semiconductor apparatus is improved.
- connection manner between two elements includes a fixed connection or a movable connection.
- the fixed connection herein means that the two elements are connected by a mortise and tenon, by a buckle or by solid glue, so that the two connected elements are kept relatively fixed in position relation.
- the movable connection herein means that the two elements are connected by nesting or a hinge or the like, so that the two connected elements can displace relative to one another within a certain range.
- the elements are electrical elements, the two electrical elements can also be electrically connected.
- the electrical connection herein refers to that the connection between two electrical elements is achieved through a wire so as to realize the transmission of an electrical signal.
- the present disclosure provides a reticle transfer device 10 configured to convey a reticle 20 between different components.
- the reticle transfer device 10 includes a bearing member 110 , a light source 120 , a light detector 130 , and a controller 140 .
- the bearing member 110 refers to a device for bearing the reticle 20 when the reticle transfer device 10 conveys the reticle 20 between different components.
- the bearing member 110 may be a flat plate for bearing the reticle 20 .
- the bearing member 110 may have two surfaces opposite to each other. One of the two opposite surfaces is configured to bear the reticle 20 .
- the light source 120 is arranged on one side of the bearing member 110 , that is configured to bear the reticle 20 , and the light source is configured to emit irradiation light to the reticle 20 .
- a reflected light is formed when the irradiation light is irradiated on the reticle 20 .
- the light source 120 refers to a device capable of emitting light.
- the light source 120 may be arranged on, a side away from the bearing member 110 , of the reticle 20 . Therefore, the surface away from the bearing member 110 of the reticle 20 can be irradiated by the light emitted from the light source 120 .
- the light emitted from the light source 120 is irradiated onto the reticle 20
- the light is reflected by the reticle.
- the light emitted from the light source 120 and irradiated onto the surface of the reticle 20 is referred to as irradiation light.
- the reflection formed when the irradiation light is irradiated onto the reticle 20 is referred to as reflected light.
- the controller 140 is electrically connected to the light detector 130 to determine whether particulate matter exists on the surface of the reticle 20 based on the detection signal.
- the controller 140 here may be a Micro Controller Unit (MCU).
- MCU Micro Controller Unit
- the controller 140 is electrically connected to the light detector 130 . After the light detector 130 generates the light detection signal based on the reflected light, the light detection signal may be transmitted to the controller 140 . Then, the controller 140 may determine whether particulate matter exists on the surface of the reticle 20 based on the light detection signal.
- the work flow of the reticle transfer device 10 of the present disclosure is as follows.
- the light source 120 emits irradiation light to the reticle 20 when the reticle 20 is placed on the bearing member 110 .
- the irradiation light will form reflected light when it is irradiated onto the surface of the reticle 20 .
- the light detector 130 is configured to obtain the reflected light and generate the light detection signal. After the light detection signal generated by the light detector 130 is transmitted to the controller 140 , the controller 140 can determine whether particulate matter exists on the surface of the reticle 20 based on the light detection signal.
- the reticle transfer device 10 of the present disclosure is applied to an exposure system 30 , the reticle transfer device 10 may convey the reticle 20 between two components.
- the controller 140 determines whether particulate matter exists on the surface of the reticle 20 based on the light detection signal. In this embodiment, the controller 140 obtains the actual intensity of the reflected light based on the light detection signal, and determines whether particulate matter exists on the surface of the reticle 20 based on the actual intensity of the reflected light.
- the controller 140 determines whether particulate matter exists on the surface of the reticle 20 based on the light detection signal. In another example, the controller 140 obtains the propagation time of the irradiation light and the reflected light based on the light detection signal, and then determines whether particulate matter exists on the surface of the reticle 20 based on the propagation time.
- the particulate matter has an influence on a propagation path of the irradiation light and the reflected light and also has an influence on the propagation time of the irradiation light and the reflected light when the irradiation light is irradiated on the particulate matter.
- a standard time of light propagation may be stored beforehand in the controller 140 . After the light detector 130 obtains the reflected light and generates a light detection signal, the light detection signal is transmitted to the controller 140 . Then, the controller 140 may obtain the actual propagation time of light based on the light detection signal.
- the controller 140 of the reticle transfer device 10 of the present disclosure may also determine the existence of particulate matter on the surface of the reticle 20 in other ways based on the light detection signal.
- the concept of the present disclosure lies in that the reticle transfer device 10 can determine whether particulate matter exists on the surface of the reticle 20 in real time based on the light detection signal, and therefore it is possible to accurately determine the component from which the particulate matter comes.
- the embodiments which do not go beyond the concept of the present disclosure should be understood as being within the scope of the present disclosure.
- the reticle transfer device 10 of the present disclosure further includes a mechanical member 150 .
- the mechanical member 150 and the bearing member 110 may constitute a mechanical arm. An end part of one end of the mechanical member 150 may be fixed to a base 160 , and an end part of the other end of the mechanical member 150 may be connected to the bearing member 110 . After the reticle 20 is carried on the bearing member 110 , the mechanical member 150 telescopically extends and/or rotates along a preset path, so that the reticle 20 is conveyed between different components.
- the light source 120 may be connected to the mechanical member 150 of the reticle transfer device 10 in such a way that the light source 120 is located on, a side away from the bearing member 110 , of the reticle 20 .
- the boundary size of the first area 112 is the same as that of the reticle 20 .
- the orthographic projection of the light source 120 on the bearing member 110 adjoins an edge of the first area 112 .
- the boundary size of the first area 112 is the same as that of the reticle 20 , that is, when the reticle 20 is carried on the bearing member 110 , the reticle 20 is located inside the first area 112 .
- the orthographic projection of the light source 120 on the bearing member 110 adjoins the edge of the first area 112 , that is, the orthographic projection of the light source 120 on the bearing member 110 is adjacent to the orthographic projection of the reticle 20 on the bearing member 110 .
- the orthographic projection of the light source 120 on the bearing member 110 is adjacent to the orthographic projection of the reticle 20 on the bearing member 110 , so that the irradiation light can be irradiated to any area of the surface of the reticle 20 without being irradiated to an area apart from the reticle 20 . In this way, an adverse impact on the determination of whether particulate matter exists on the surface of the reticle 20 by the controller 140 based on the light detection signal can be avoided.
- the irradiation light may be a parallel light beam.
- the irradiation light may be a parallel light beam.
- the parallel light beam is also called directional light, referring to a light beam which does not diffuse as the light propagates.
- the light source 120 may be a searchlight or a laser transmitter or the like here.
- the reticle transfer device 10 may further include an actuator 122 .
- the actuator 122 may be connected to the light source 120 , and configured to actuate the light source 120 to move a light spot formed on the reticle 20 by the irradiation light along a preset path.
- the preset path covers the reticle 20 .
- the actuator 122 connected to the light source 120 for actuating the light source 120 may be provided.
- the actuator 122 may actuate the light source 120 to move and/or rotate, to move the light spot formed on the reticle 20 by the irradiation light along a certain preset path.
- the preset path covers the reticle 20 , so that the irradiation light in the form of the parallel light beam can also detect the whole reticle 20 , so as to detect whether particulate matter exists on the surface of the reticle 20 .
- the actuator 122 may be coupled to the controller 140 , so that the controller 140 may control the actuator 122 .
- a control program may be preset in the controller 140 .
- the controller 140 may control the actuator 122 based on the preset control program, to control the actuator 122 to actuate the light source 120 to move and/or rotate.
- the reticle transfer device 10 of the present disclosure may also include two or more light sources 120 .
- the spots of the irradiation light emitted by the two or more light sources 120 coincide with one another to form one coinciding light spot on the surface of reticle 20 .
- the reticle transfer device 10 may include a first optical assembly 172 and a second optical assembly 174 .
- the irradiation light emitted by the light source 120 is the parallel light beam and the reticle transfer device 10 includes two or more light sources 120 , if the two or more light sources 120 form two or more light spots on the reticle 20 , it has an influence on the controller 140 in terms of determining whether particulate matter exists on the surface of the reticle 20 based on the light detection signal.
- the two or more light sources 120 need to form one coinciding light spot on the surface of the reticle 20 , and the reflected light formed by the irradiation light of both of the two light sources 120 is obtained by the light detector 130 .
- the reticle transfer device 10 may be provided with the first optical assembly 172 and the second optical assembly 174 .
- the first optical assembly 172 is located in a light path of the irradiation light, and may include at least one of a reflecting mirror and a refractor.
- the first optical assembly 172 is configured to change the light path of the irradiation light in such a way that the two or more light sources 120 form one coinciding light spot on the surface of the reticle 20 .
- the second optical assembly 174 is located in the light path of the reflected light, and may include at least one of a reflecting mirror and a refractor.
- the second optical assembly 174 is configured to change the light path of the reflected light in such a way that the reflected light formed by the irradiation light of all of the light sources 120 is obtained by the light detector 130 .
- the irradiation light may be a focused light beam.
- the irradiation light may be the focused light beam.
- the focused light beam refers to a light beam which may diffuse as the light propagates.
- the light source 120 may be a bulb and the like.
- the reticle transfer device 10 of the present disclosure may further include a first optical assembly 172 and a second optical assembly 174 .
- the irradiation light may also be irradiated to an area in addition to the reticle 20 when covering the reticle 20 . If the irradiation light is irradiated to the area in addition to the reticle 20 , it has an influence on the controller 140 in term of determine whether particulate matter exists on the surface of the reticle 20 based on the light detection signal.
- the reticle transfer device 10 may be provided with the first optical assembly 172 and the second optical assembly 174 .
- the first optical assembly 172 is located in the light path of the irradiation light, and may include at least one of the reflecting mirror and the refractor.
- the first optical assembly 172 is configured to change the light path of the irradiation light in such a way that the irradiation light emitted by the light source 120 is completely irradiated onto the surface of the reticle 20 , and completely covers the surface of the reticle 20 .
- the second optical assembly 174 is located in the light path of the reflected light, and may include at least one of a reflecting mirror and a refractor.
- the second optical assembly 174 is configured to change the light path of the reflected light in such a way that the reflected light formed by the irradiation light of the light source 120 is obtained by the light detector 130 . That is, the second optical assembly 174 is configured to converge the reflected light at the light detector 130 .
- the reticle transfer device 10 of the present invention may further include a purging member 180 .
- the purging member 180 may be arranged on, a side for bearing the reticle 20 , of the bearing member 110 .
- the purging member 180 may be electrically connected to the controller 140 and controlled by the controller 140 .
- the purging member 180 is located on, a side away from the purging member 180 , of the reticle 20 , namely located on the side of the bearing member 110 for bearing the reticle 20 .
- the purging member 180 can remove particulate matter on a surface of the reticle 20 away from the bearing member 110 by gas blowing.
- the purging member 180 may also be connected to the mechanical member 150 of the reticle transfer device 10 .
- the purging member 180 may be electrically connected to the controller 140 .
- the controller 140 controls the purging member 180 to start work when the controller determines that particulate matter exists on the surface of the reticle 20 .
- electrical connection between any two electronic elements of the reticle transfer device 10 of the present invention is realized by a wire. That is, the two electronic elements can be connected through the wire to allow an electrical signal to be transmitted between the two electronic apparatuses.
- a diameter of the wire connected between the two electronic apparatuses may be smaller than or equal to 2 mm, to improve the integration degree of the reticle transfer device 10 .
- the present disclosure also provides an exposure system 30 including a plurality of components 310 and a plurality of reticle transfer devices 10 according to any one of the embodiments described above.
- the reticle transfer devices 10 are configured to shift at least one reticle 20 between different components 310 .
- the exposure system 30 may include at least two components 310 .
- the expression “at least two” herein may refer to two or more.
- the components 310 herein refer to devices of the exposure system 30 in addition to the reticle transfer device 10 , which may make contact with the reticle 20 or receive the reticle 20 .
- the component 310 may be a loading port component allowing the reticle 20 to enter the photoetching machine from outside, a temporary storage component for temporarily storing the reticle 20 , an Integrated Reticle Inspection System (IRIS) for detecting particulate matter, a reticle bearing plate component used in exposure of the reticle 20 , etc.
- IRIS Integrated Reticle Inspection System
- the exposure system 30 further includes at least one reticle transfer device 10 .
- the expression “at least one” herein may refer to one or more.
- the number of the reticle transfer device 10 and that of the component 310 may be the same or different.
- the reticle transfer device 10 is configured to convey the reticle 20 between different components 310 .
- the reticle transfer device 10 may include a bearing member 110 , a light source 120 , a light detector 130 and a controller 140 .
- the bearing member 110 is configured to bear the reticle 20 .
- the light source 120 is arranged on, a side for bearing the reticle 20 , of the bearing member 110 , to emit irradiation light to the reticle 20 .
- Reflected light is formed when the irradiation light is irradiated onto the reticle 20 .
- the light detector 130 is configured to obtain the reflected light and generate a light detection signal based on the reflected light.
- the controller 140 is electrically connected to the light detector 130 and configured to determine whether particulate matter exists on a surface of the reticle 20 based on the light detection signal.
- the exposure system 30 of the present disclosure further includes a cleaning device 320 and a master controller 330 .
- the cleaning device 320 is configured to clean a component 310 .
- the cleaning device 320 may be a gas cleaning device 320 for purging the component 310 by blowing gas thereto.
- the number of the cleaning device 320 may be the same as that of the component 310 , so that each component 310 has one cleaning device 320 configured to clean this component 310 .
- the master controller 330 is electrically connected to controller 140 of each of the plurality of reticle transfer devices 10 . When the controllers 140 determine that particulate matter exists on the surface of the reticle 20 , this result is transmitted to the master controller 330 .
- the master controller 330 is further connected to the cleaning device 320 to control the cleaning device 320 to start work.
- the master controller 330 is configured to control the cleaning device 320 to clean a component 310 to be cleaned responsive to determining, by the controller 140 , that particulate matter exists on a surface of the reticle 20 .
- the component 310 to be cleaned refers to a last component 310 along a shift path of the reticle 20 when it is determined that particulate matter exists on the surface of the reticle 20 .
- the reticle 20 needs to be conveyed from a component A to a component B and conveyed from the component B to a component C
- a controller 140 determines, in the process of conveying the reticle from the component B to the component C, that particulate matter exists on the surface of the reticle 20 , the component B is the component 310 to be cleaned.
- the master controller 330 may control the cleaning device 320 to start work according to the determination of the controllers 140 so as to clean the component B.
- the conveying process of the reticle 20 generally includes a loading process and an unloading process.
- the loading process refers to a process during which the reticle 20 is conveyed from the loading port component 310 to the reticle bearing plate component 310 .
- the unloading process is the inverse of the loading process.
- the exposure system 30 of the present disclosure may include a photoetching machine.
- the reticle transfer devices 10 are configured to convey the at least one reticle 20 in the photoetching machine.
- the exposure system 30 of the present disclosure may further include a display device 340 .
- the display device 340 may be electrically connected to the master controller 330 .
- the controller 140 determines that particulate matter exists on the surface of the reticle 20
- the controllers 140 may transmit this result to the master controller 330 .
- the master controller 330 can control the display device 340 to emit an alarm, and display a conveying path of the reticle 20 through the display device 340 .
- Engineering personnel can rapidly determine the source of the particulate matter through the conveying path, corresponding components are cleaned in time, and the manufacturing capacity of a semiconductor apparatus is improved.
- the above exposure system 30 includes a plurality of components 310 and reticle transfer devices 10 in the above embodiments.
- the component 310 can be accurately determined.
- the reticle transfer device 10 can accurately determine the component 310 from which the particulate matter on the surface of the reticle 20 comes, so that time for excluding the source of the particulate matter is shortened, engineering personnel can conveniently clean related components in time, and the manufacturing capacity of a semiconductor apparatus is improved.
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Plasma & Fusion (AREA)
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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Abstract
Description
Claims (16)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010815931.2A CN114077163B (en) | 2020-08-14 | 2020-08-14 | Mask conveying device and exposure system |
CN202010815931.2 | 2020-08-14 | ||
PCT/CN2021/101397 WO2022033180A1 (en) | 2020-08-14 | 2021-06-22 | Photomask conveying device and exposure system |
Related Parent Applications (1)
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PCT/CN2021/101397 Continuation WO2022033180A1 (en) | 2020-08-14 | 2021-06-22 | Photomask conveying device and exposure system |
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Also Published As
Publication number | Publication date |
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CN114077163B (en) | 2023-03-31 |
CN114077163A (en) | 2022-02-22 |
US20220091518A1 (en) | 2022-03-24 |
WO2022033180A1 (en) | 2022-02-17 |
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