TW459274B - Substrate carrying device, processing device, processing system for substrate, conveying method, accommodating device and accommodating container - Google Patents

Substrate carrying device, processing device, processing system for substrate, conveying method, accommodating device and accommodating container Download PDF

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Publication number
TW459274B
TW459274B TW089111878A TW89111878A TW459274B TW 459274 B TW459274 B TW 459274B TW 089111878 A TW089111878 A TW 089111878A TW 89111878 A TW89111878 A TW 89111878A TW 459274 B TW459274 B TW 459274B
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TW
Taiwan
Prior art keywords
substrate
storage box
processing
transfer
outlet
Prior art date
Application number
TW089111878A
Other languages
Chinese (zh)
Inventor
Yoshiharu Ota
Kiyohisa Tateyama
Shinichiro Araki
Tatsuya Iwasaki
Noriyuki Anai
Original Assignee
Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
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Publication of TW459274B publication Critical patent/TW459274B/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

Abstract

The present invention is to support the glass substrate to be processed in the interior of box-type accommodating container; and, using the fan to form the air flow from the surface opposing to the forming face of the entry of the substrate to the outside through the substrate entry. Therefore the dust particle floating outside the accommodating container will not fall into the container even the substrate entry is open frequently. So, the conveying zone of the glass substrate will not need to be the dustless environment that can greatly reduce the cost for establishing the dustless environment. Because the substrate entry is open frequently, there will be no open/close mechanism for opening/closing the substrate entry so as to exchange the substrate more rapidly further.

Description

A7 4-EL9_2_7 4. B7 五、發明說明（1 ) 〔發明背景〕 本發明係關於例如針對在液晶顯示（Liquid Crystal Display : L C D )所使用之玻璃基板等的被處理基板上施 予塗敷/顯像處理之塗敷/顯像裝置等的處理裝置，用來 搬入搬出被處理基板所使用之基板搬送裝置及基板的搬送 方法。另外，本發明係關於備有在與基板搬送裝置之間進 行基板的交接所適用的機構之處理裝置。此外，本發明係 關於備有基板搬送裝置及處理裝置之基板的處理系統。 在於L CD的製造過程中，爲了在L CD用的玻璃基 板上形成I T 0 ( Indium Tin Oxide )的薄膜或電極圖案 ，而利用與製造半導體裝置所使用同樣的光蝕刻技術。光 蝕刻技術則是將光蝕劑塗在洗淨的基板，曝光此基板進而 進行顯像。 作爲被處理基板之玻璃基板，保持在基板搬送裝置後 移動在搬送路上，搬入到各種的處理裝置，經各處理裝置 處理過後搬出，再度經由基板搬送裝置搬送到下個製程。 〔發明槪要〕 在於上述過多製造過程，必須在麈粒不附著在基板上 的環境下進行，通常是將上述的各種處理裝置設置在無塵 室內，在裝置內外的基板搬送區設置HE PA濾麈器，形 成低粒塵環境。 不過，上述過的手段，由於必須將無塵室全體或是基 板搬送區的寬廣範圍形成爲無塵環境，因而會有成本提高 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -4 - <請先閲讀背面之注意事項再填寫本頁) 裝--------訂---------.A7 4-EL9_2_7 4. B7 V. Description of the Invention (1) [Background of the Invention] The present invention relates to, for example, applying coating on a substrate to be processed, such as a glass substrate used in a liquid crystal display (Liquid Crystal Display: LCD). A processing device such as a coating / developing device for development processing is used to carry in and out a substrate transfer device and a method for transferring a substrate to be processed. The present invention also relates to a processing apparatus provided with a mechanism suitable for transferring a substrate to and from a substrate transfer apparatus. The present invention relates to a substrate processing system including a substrate transfer device and a processing device. In the manufacturing process of the L CD, in order to form a thin film or electrode pattern of I T 0 (Indium Tin Oxide) on a glass substrate for the L CD, the same photo-etching technology as used for manufacturing a semiconductor device is used. In the photo-etching technology, a photoresist is applied to a cleaned substrate, and the substrate is exposed for development. The glass substrate, which is the substrate to be processed, is held on the substrate transfer device, moved on the transfer path, transferred to various processing devices, and processed after being processed by each processing device, and then transferred to the next process through the substrate transfer device. [Summary of the invention] The above-mentioned excessive manufacturing process must be performed in an environment where the particles are not attached to the substrate. Generally, the above-mentioned various processing devices are installed in a clean room, and HE PA filters are installed in the substrate transfer area inside and outside the device. Utensils, forming a low-grain dust environment. However, the above-mentioned methods, because the entire clean room or the wide area of the substrate transfer area must be formed into a dust-free environment, there will be a cost increase. This paper size applies the Chinese National Standard (CNS) A4 (210 X 297) (%) -4-< Please read the notes on the back before filling in this page) Install -------- Order ---------.

Je 經濟部智慧財產局員工消費合作社印製 經濟部智慧財產局員工消費合作社印製 ^ 4592 7 4 A7 ____B7__ 五、發明說明（2 ) 的問題。特別是爲了提升生產效率，不只是包含塗敷/顯 像裝置，也包含其他處理裝置，例如CVD裝置、蝕刻、 灰塵化等都考慮/生產線化的系統，不過形成無塵環境的 範圍變爲更寬廣，因而恐會造成更加提高成本。 本發明的目的係提供能夠儘可能減小無塵化所必要的 空間之基板搬送裝置、處理裝置、基板的處理系統以及搬 送方法。 爲了達成前述目的，經本發明者仔細檢討的結果，首 先針對將作爲處理對象的基板收容在能夠與外部空間隔絕 之盒內。不過此情況，當基板出入時必須將基板出入口開 口，因而必須設置當開口時粒塵不會附著在基板之複雜構 造的開閉機構。另外，當基板出入時必須操作這個開閉機 構的開閉所以控制變爲複雜化。因而，檢討當基板收容在 盒內時就是在基板出入口常時開口著的狀態下外部粒麈也 不會入侵到盒內之手段，而完成本發明。 即是本發明的基板搬送裝置，其特徵爲具備有：沿著 搬送路能移動之搬送方向移動體；及對前述搬送方向移動 體，介由能朝水平方向旋轉之旋轉軸支撐，在於對峙於各 處理裝置的搬入出口的姿勢能朝離合該搬入搬出口的方向 移動，且將作爲處理對象的基板支撐在內部之基板支撐部 ;及備有爲了進行基板的出入而常時開口著的基板出入口 和內部維持正壓的壓力控制機構之箱形收容盒，能支撐前 述箱形收容盒之離合方向移動體。 本發明申請專利範圍第1項之基板搬送裝置，則是將 (請先閱讀背面之注意事項再填寫本頁)Je Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. ^ 4592 7 4 A7 ____B7__ V. The problem of the invention description (2). In particular, in order to improve production efficiency, not only coating / developing devices, but also other processing devices, such as CVD devices, etching, dusting, etc. are considered / production line systems, but the scope of forming a dust-free environment has become more Broad, which could lead to even higher costs. An object of the present invention is to provide a substrate transfer device, a processing device, a substrate processing system, and a transfer method capable of reducing a space necessary for dust-free as much as possible. In order to achieve the foregoing object, as a result of careful review by the present inventors, it was first aimed at accommodating a substrate to be processed in a box that can be isolated from an external space. However, in this case, it is necessary to open the entrance and exit of the substrate when the substrate enters and exits, so it is necessary to provide an opening and closing mechanism of a complicated structure in which particulate dust does not adhere to the substrate during the opening. In addition, since the opening and closing of the opening and closing mechanism must be operated when the substrate is moved in and out, the control becomes complicated. Therefore, when the substrate is housed in the case, the method for preventing the external particles from entering the case even when the substrate inlet and outlet are always open is reviewed, and the present invention has been completed. That is, the substrate transfer device of the present invention is characterized by comprising: a moving body that can move along the conveying path; and a support for the moving body in the conveying direction via a rotating shaft that can rotate in the horizontal direction, which is opposed to The posture of the carrying-in exit of each processing device can be moved toward the direction of clutching the carrying-in and carrying-out port, and a substrate supporting portion that supports the substrate to be processed is provided inside; and a substrate inlet and outlet that are constantly open for substrate access and The box-shaped storage box of a pressure control mechanism that maintains a positive pressure inside can support the moving body in the clutch direction of the box-shaped storage box. The substrate transfer device of the scope of patent application of the present invention is No. 1 (please read the precautions on the back before filling this page)

* -------訂---I I ο 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -5- 459274 A7 B7__ 五、發明說明（3 ) {請先閲讀背面之注意事項再填寫本頁) 作爲處理對象的基板支撐在被形成爲箱形之收容盒的內部 ，並且利用壓力控制機構而使該收容盒內部維持著正壓。 因而就是基板出入口常時開口著，浮游在收容盒外的塵粒 也不致入侵到收容盒內。因此，不必要將基板的搬送區形 成爲無塵環境，就能夠大幅削減無塵環境的形成成本。另 外，由於基板出入口常時開口著，沒有設置開閉該基板出 入口之開閉機構，而能夠迅速地進行基板的交接》 〔實施形態〕 以下，參照圖面說明本發明的實施形態。首先，參照 第1圖說明作爲本發明基板的處理系統例之塗敷/顯像處 理系統的全體構造β 經濟部智慧財產局員工消費合作社印製 如第1圖所示，在這個塗敷/顯像處理系統1的前方 ，設置對塗敷/顯像處理系統/搬入搬出的收容玻璃基板 G的收容盒5 0 (參照第2圖）之裝載/卸載部。在此裝 載/卸載部設有：將複數收容收容盒5 0之卡匣C使其整 列載置在預定位置之卡匣載置台3、及從各卡匣C取出收 容應處理的玻璃基板G之收容盒5 0，將收容在於塗敷/ 顯像處理系統/經處理完異的玻璃基板G之收容盒5 0送 回各卡匣C之裝載/卸載機4。裝載/卸載機4藉由本體 5 的移行而朝卡匣C的配列方向移動，將收容盒5 0載 置到搭載在本體5之板狀體6上後將收容盒5 0移交到後 述的基板搬送裝置4 0。 更具體上，如第2圖所示，後述的本實施形態之基板 -6- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 經濟部智慧財產局員工消費合作社印製 45927 4 五、發明說明（4) 搬送裝置4 0，不是直接搬送玻璃基板G而是搬送收容玻 璃基板G的收容卡匣5 0之構造，且是利用被設在該基板 搬送裝置4 0之離合方向移動體4 5的一對機械臂4 7、 4 8，支撐收容盒5 0底面的兩側緣附近之構造。因此， 基板搬送裝置4 0從裝載卸載機4承接收容盒5 0時，必 須利用一對的機械臂47、 48使其容易支撐收容盒50 底面的兩側緣附近。因而，本實施形態所使用之裝載/卸 載機4採用具有寬度比收容盒5 0還窄且前後動作可能之 板狀體6，將收容盒5 0載置在這個板狀體6上之構造。 然而，圖號5 a爲能前後作動地支撐該板狀體6之支撐板 ，圖號5 b爲能旋轉地支撐該支撐板5 a之旋轉軸，圖號 5 c爲能移動地存取於任意的卡匣C並且能上下作動地支 撐旋轉軸5 b之移動體；利用此支撐板5 a、旋轉軸5 b 以及移動體5 c構成本體5。 .塗敷/顯像處理系統1的中央部，朝長邊方向所配置 之走廊狀的搬送路10、 11介由交接部12設置在一直 線上；在這個搬送路1 0、1 1的兩側配置用來對玻璃基 板G進行各種處理之各種處理裝置。 圖示的塗敷/顯像處理系統1，在搬送路的一側方， 例如並排設置2台刷洗玻璃基板G並且以高壓噴水進行洗 淨之洗淨裝置1 6。另外，隔著搬送路1 0而在相反側並 排設置二座顯像裝置1 7，在其隔鄰積疊設置二座加熱裝 置1 8。 另外，在搬送路1 1的一側方設置將抗飩液塗敷到玻 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閲讀背面之生§項再填寫本頁) 裝·！-----訂---------線 1 45927 4 Α7 ____________ Β7 五、發明說明（5 ) (請先閲讀背面之注意事項再填寫本頁) 璃基板G之前疏水處理玻璃基板G之粘著裝置2 0，在這 個粘著裝置2 0的下方配置冷卻用的冷卻裝置2 1。另外 ，在此吸著裝置2 0與冷卻裝置21的鄰近以二列各二個 積疊配置加熱裝置2 2。另外在隔著搬送路1 1而在相反 側配置抗蝕劑塗敷裝置2 3。抗蝕劑塗敷裝置2 3經由將 抗蝕劑液塗敷在玻璃基板G的表面而在玻璃基板G的表面 形成抗蝕劑膜。在這些塗敷裝置2 3的側部設置曝光裝置 等（未圖示），此曝光裝置用來將預定的微細圖案曝光到 被形成在玻璃基板G上之抗蝕劑膜。 以上的各處理裝置16〜18及20〜23，在於任 何搬送路1 0、1 1的兩側，朝向內側配置玻璃基板G的 搬入搬出口。第1搬送裝置25在與裝載/卸載部、各處 理部1 6〜1 8以及交接部1 2之間由於以玻璃基板G收 容在收容盒5 0的狀態進行搬送而移動在搬送路1 0上， 第2搬送裝置2 6在與交接部1 2及各處理裝置2 0〜 2 3之間，同樣地以玻璃基板G收容在收容盒5 0的狀態 進行搬送而移動在搬送路11上。 經濟部智慧財產局員工消費合作社印製 其次，說明本實施形態所採用作爲上述過第1搬送裝 置2 5及第2搬送裝置2 6之基板搬送裝置4 0的具體構 造。第3圖爲表示此種基板搬送裝置4 0的構成之斜視圖 ，第4圖爲其側面圖。 基板搬送裝置具有能順著Υ方向（搬送方向）移動在 沿著搬送路10、 10所設置的軌道35上之搬送方向移 動體4 1。本實施形態則是使其跨越軌道3 5設置這個搬 -8- 本紙張尺度適用ΐ國國家標準（CNS)A4規格（210 X 297公釐） 4· 5 9 2 7 4 Λ7 _____ B7 五、發明說明（6) (請先閱讀背面之注意事項再填寫本頁) 送方向移動體4 1 ，利用被配置在內部之驅動馬達（未圖 示）的驅動而移動。在這個搬送方向移動體4 1的上部設 有馬達4 2且設有利用這個馬達4 2能朝0方向（水平方 向）旋轉之旋轉軸4 3。設置這個旋轉軸4 3使其藉由被 配置在搬送方向移動體4 1內之昇降部（未圖示）朝上下 方向（Z方向）動作。 在旋轉軸4 3的上部安裝支撐板4 4，且在這個支撐 4 4上配置能往X方向（如第4圖所示，當對峙於處理裝 置6 〇時離合該處理裝置6 0的方向）移動並且高度不同 之2個離合方向移動體4 5、4 5。此2個離合方向移動 體45、 45都具有基台部46及設在此基台部46前方 之一對機械臂4 7、4 8。在基台部4 6內配置用來使該 基台部4 6前後作動之驅動構件（未圖示）；由於此因順 著被設在支撐板4 4之導引部4 4 a往X方向（離合方向 )移動。 經濟部智慧財產局員工消費合作社印製 另外，各基台部4 6都連接到作爲送風機構之送風扇 49，在該基台部46的前面設有吹出口 49a。經由起 動送風扇4 9，就能夠形成風從後述收容盒5 0的後方送 入，通過形成在收容盒5 0前面之基板出入口 5 1流到外 部之氣流。因此，外部的粒塵無法通過基板出入口 5 1進 入到收容盒5 0內。另外風隨時送入到收容盒5 0內則收 容盒5 0內保持正壓；本實施形態的1送風扇4 9也有當作 擯制收容盒5 0內的壓力之壓力控制機構的功能° 各機械臂47、 48分別由斷路略呈L狀的構件所構 -9 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 459274 五、發明說明（7 ) 成；對稱地設置使其相互隔有間隔且都是側板部4 7 a、 (請先閱讀背面之注意事項再填寫本頁) 4 8 a爲外側。然而以後述的收容盒5 0能夠保持在底板 部47b、 48b的程度設定各機械臂47、 48的對向 間隔。 呈箱形形成收容盒5 0。本實施形態則是如第5圖所 示形成爲略直方體狀，不過若爲能夠收容玻璃基板G的大 小具有與外部空間隔開的壁部之構造，則不受限於此構造 。當作收容對象的基板如本實施形態爲L C D用的玻璃基 板G時，由於該玻璃基板G爲四角形，所以配合該形狀而 形成爲角形，但衡量當作收容對象的基板形狀而採用其他 形狀亦可。 收容盒5 0如第5及6圖所示前面具有常時開放著之 基板出入口 5 1 ;在其內部設有在從底壁部5 2隔著預定 間隔的位置從各側壁部5 3、5 3突出到內方的突條部所 形成之基板支撐部54、 54(參照第6圖及第9圖）。 當然，此基板支撐部54、 54利用其上面若能夠支撐玻 璃基板G的各側端附近即可；並不一定必須經過側壁部 53、 53的往深處方向的全體設置這個基板支撐部54 經濟部智慧財產局員工消費合作社印製 、5 4。另外設置突條部使其不是從側壁部5 3、5 3突 出而是朝向上方突出到底壁部5 2的兩側部附近亦可。 另外，在收容盒5 0的背面設置用來將上述過送風扇 4 9的送風吸到該收容盒5 0的內部2送風吹入口 5 5。 此送風吹入口，只要能與送風扇4 9連通，其形狀位置並 未限定，不過形成在與基板出入口 5 1對向的位置則氣流 -10- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） '4 5 9 2 7 4 a7 ____B7__ 五、發明說明（8 ) 不致亂流而順暢排出，所以本實施形態則是形成在收容盒 5 0的背面。 另外，在此送風吹入口 5 5設置能更換的袋口式之濾 塵器（例如，ULPA濾塵器）56。即是當收容盒50 使其支撐在離合方向移動體4 5時，如第7圖所示，設置 該濾塵器5 6使其位於基台部4 6的前方因此，經驅動 送風扇4 9，通過送風吹入口 5 5入侵到收容盒5 0內之 粒塵被捕集。 其次，說明利用上述過的基板搬送裝置4 0能夠搬入 搬出玻璃基板之處理裝置。即是上述過的基板搬送裝置 4 0，就是離合方向移動體4 5往X方向移動，被收容在 收容盒5 0內之玻璃基板G，也不能夠與該收容盒5 0 — 起移動而只有玻璃基板G朝X方向移動。因此，如一般的 處理裝置，在開閉玻璃基板的搬入搬出口之閘門內，例如 設有熱處理裝置的熱板等之處理部，則無法使用上述過的 基板搬送裝置4 0直接將玻璃基板G交接到該處理部上。 因此必須使用如下的處理裝置。 第9圖所示之處理裝置係在該處理裝置6 0的搬入搬 出口 6 0 a與處理部6 2之間設置載置台6 5及中繼用搬 送機構7 0而構成。載置台6 5被設置在該處理裝置6 0 內搬入搬出口 6 0 a的立即後段，具有能夠原狀載置收容 盒的大小，在於搬入搬出6 0 a附近與收容盒5 0之間直 接進行玻璃基板G的交接時’儘可能無間隙地使收容盒 5 0接合到搬入搬出口 6 0 a的狀態下進接交接’則在玻 (請先閲讀背面之注意事項再填寫本頁) 裝* ------- Order --- II ο The paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) -5- 459274 A7 B7__ 5. Description of the invention (3) {Please read first Note on the back, please fill out this page again.) The substrate to be processed is supported inside the box-shaped storage box, and the pressure inside the storage box is maintained at a positive pressure by a pressure control mechanism. Therefore, the entrance and exit of the substrate are always open, and the dust particles floating outside the storage box will not intrude into the storage box. Therefore, it is not necessary to form the substrate transfer area into a dust-free environment, and the formation cost of the dust-free environment can be significantly reduced. In addition, since the substrate inlet and outlet are always open, there is no opening and closing mechanism for opening and closing the substrate inlet and outlet, and the substrate can be quickly transferred. [Embodiment] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. First, the overall structure of a coating / developing processing system as an example of a substrate processing system of the present invention will be described with reference to FIG. 1. As shown in FIG. In front of the image processing system 1, a loading / unloading unit for a coating / development processing system / receiving box 50 (see FIG. 2) for storing the glass substrate G is provided. Here, the loading / unloading section is provided with: a plurality of cassettes C for accommodating a plurality of storage boxes 50 and a whole set of cassette mounting tables 3 placed at predetermined positions; The storage box 50 returns the storage box 50 stored in the coating / development processing system / processed glass substrate G to the loading / unloading machine 4 of each cassette C. The loader / unloader 4 moves toward the arrangement direction of the cassettes C by the movement of the main body 5, places the storage box 50 on the plate-shaped body 6 mounted on the main body 5, and transfers the storage box 50 to a substrate to be described later. Carrying device 40. More specifically, as shown in Figure 2, the substrate of this embodiment described below-6- This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 45927 4 V. Description of the invention (4) The conveying device 40 does not directly transfer the glass substrate G but the structure of the storage cassette 50 that holds the glass substrate G, and uses a clutch provided in the substrate transfer device 40. A pair of mechanical arms 4 7 and 4 8 of the directional moving body 45 support structures near the edges of both sides of the bottom surface of the storage box 50. Therefore, when the substrate transfer device 40 receives the container 50 from the loader-unloader 4, it is necessary to use a pair of robot arms 47 and 48 to easily support the vicinity of both side edges of the bottom surface of the storage box 50. Therefore, the loading / unloading machine 4 used in this embodiment has a plate-shaped body 6 having a width narrower than that of the storage box 50 and capable of moving back and forth. The storage box 50 is placed on this plate-shaped body 6. However, Fig. 5a is a support plate that can support the plate-like body 6 forward and backward, Fig. 5b is a rotation axis that supports the support plate 5a rotatably, and Fig. 5c is movably accessed in An arbitrary cassette C can support a moving body of the rotating shaft 5 b up and down; the support plate 5 a, the rotating shaft 5 b, and the moving body 5 c constitute the body 5. The center part of the coating / development processing system 1 is a corridor-shaped conveying path 10 and 11 arranged in a long side direction through a transfer part 12 on a straight line; on both sides of this conveying path 10 and 11 Various processing devices are provided to perform various processes on the glass substrate G. In the coating / developing processing system 1 shown in the figure, for example, two cleaning devices 16 for brushing the glass substrate G and cleaning them with high-pressure water spray are arranged side by side on the conveying path. In addition, two developing devices 17 are arranged side by side on the opposite side across the transport path 10, and two heating devices 18 are stacked adjacent to each other. In addition, one side of the conveying path 1 1 is set to apply anti-corrosive liquid to the glass paper. The standard is China National Standard (CNS) A4 (210 X 297 mm). (This page) ----- Order --------- Line 1 45927 4 Α7 ____________ Β7 V. Description of the invention (5) (Please read the precautions on the back before filling this page) Glass substrate G Hydrophobic treatment of glass substrate before An adhesive device 20 of G is provided with a cooling device 21 for cooling below the adhesive device 20. In addition, the heating device 22 is arranged in two rows and two adjacent to each other in the vicinity of the suction device 20 and the cooling device 21 here. A resist coating device 23 is arranged on the opposite side across the transport path 11. The resist application device 23 forms a resist film on the surface of the glass substrate G by applying a resist solution to the surface of the glass substrate G. An exposure device or the like (not shown) is provided on the side of these coating devices 23 to expose a predetermined fine pattern to a resist film formed on the glass substrate G. Each of the processing apparatuses 16 to 18 and 20 to 23 described above is arranged on either side of any of the conveyance paths 10 and 11 and the loading / unloading port of the glass substrate G is disposed toward the inside. The first conveying device 25 is moved on the conveying path 10 between the loading / unloading section, each of the processing sections 16 to 18, and the transfer section 12 because the glass substrate G is accommodated in the storage box 50. The second transfer device 26 is transferred between the transfer unit 12 and each of the processing devices 20 to 23 in a state in which the glass substrate G is stored in the storage box 50 and is moved on the transfer path 11. Printed by the Consumers' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Next, the specific structure of the substrate transfer device 40 used as the first transfer device 25 and the second transfer device 26 described above in this embodiment will be described. Fig. 3 is a perspective view showing the structure of such a substrate transfer device 40, and Fig. 4 is a side view thereof. The substrate transfer apparatus includes a moving body 41 capable of moving in a direction (transfer direction) on a rail 35 provided along the transfer paths 10, 10. In this embodiment, it is set to cross the track 3 5 to set this moving -8- This paper size applies the national standard (CNS) A4 specification (210 X 297 mm) 4 · 5 9 2 7 4 Λ7 _____ B7 V. Invention Explanation (6) (Please read the precautions on the back before filling in this page) The moving body 4 1 in the feed direction is moved by the drive of an internal drive motor (not shown). A motor 4 2 is provided on the upper portion of the moving body 41 in the conveying direction, and a rotating shaft 43 is provided which can rotate in the 0 direction (horizontal direction) by the motor 4 2. This rotary shaft 43 is provided so as to be moved in the vertical direction (Z direction) by an elevating portion (not shown) arranged in the conveying direction moving body 41. A support plate 4 4 is installed on the upper part of the rotating shaft 4 3, and the support 4 4 is arranged so as to be able to face the X direction (as shown in FIG. 4, when facing the processing device 60, the direction of the processing device 60 is disengaged) The two moving bodies 4 5 and 4 5 which move and have different heights in the clutch direction. Each of the two clutch-direction moving bodies 45 and 45 has a base portion 46 and a pair of robot arms 4 7 and 4 8 provided in front of the base portion 46. A driving member (not shown) configured to move the base portion 46 back and forth is arranged in the base portion 46. Because of this, the guide portion 4 4a provided on the support plate 4 4 moves in the X direction. (Clutch direction) Move. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Each base section 46 is connected to a blower 49 as a blower, and a blowout port 49a is provided in front of the base section 46. By activating the blower fan 49, wind can be sent from the rear of the storage box 50 described later, and the airflow to the outside through the substrate inlet and outlet 51 formed in front of the storage box 50. Therefore, external particles cannot enter the storage box 50 through the substrate inlet and outlet 51. In addition, when the wind is sent into the storage box 50 at any time, the positive pressure is maintained in the storage box 50. The 1 fan 4 in this embodiment also functions as a pressure control mechanism for controlling the pressure in the storage box 50. The robot arms 47 and 48 are constructed by components that are slightly L-shaped when the circuit is broken. -9-This paper size applies to the Chinese National Standard (CNS) A4 (210 X 297 mm) A7 B7 459274. 5. Description of the invention (7); Set symmetrically so that they are spaced apart from each other and are all side plate parts 4 7 a, (Please read the precautions on the back before filling this page) 4 8 a is the outside. However, the interval between the respective robot arms 47, 48 is set to such an extent that the storage box 50 described later can be held on the bottom plate portions 47b, 48b. The storage box 50 is formed in a box shape. This embodiment is formed into a substantially rectangular parallelepiped shape as shown in Fig. 5, but it is not limited to this structure as long as it has a structure having a wall portion that is spaced from the external space in which the glass substrate G can be accommodated. When the substrate to be accommodated is a glass substrate G for LCD in this embodiment, since the glass substrate G is a quadrangle, it is formed into an angle in accordance with the shape. However, the shape of the substrate to be accommodated and other shapes are also used can. As shown in FIGS. 5 and 6, the storage box 50 has a substrate opening 5 1 that is constantly open on the front side; and inside the storage box 50 is provided at a predetermined interval from the bottom wall portion 5 2 from each side wall portion 5 3, 5 3 The substrate supporting portions 54 and 54 formed by the protruding portions protruding inward (see FIGS. 6 and 9). Of course, the substrate support portions 54 and 54 may use the upper surface of the substrate support portion 54 if they can support the vicinity of each side end of the glass substrate G; it is not necessary to provide the substrate support portion 54 through the entire depth direction of the side wall portions 53 and 53. Printed by the Consumer Cooperatives of the Ministry of Intellectual Property Bureau, 5 4. Alternatively, the protruding portions may be provided so as not to protrude from the side wall portions 5 3, 5 3 but protrude upward near the both side portions of the bottom wall portion 52. In addition, a blower inlet 55 is provided on the back surface of the storage box 50 for sucking the air from the over-feed fan 49 to the inside 2 of the storage box 50. As long as the air inlet can communicate with the air blower 49, its shape and position are not limited, but the airflow is formed at a position opposite to the substrate inlet and outlet 51. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) '4 5 9 2 7 4 a7 ____B7__ 5. Explanation of the invention (8) It is smoothly discharged without disorderly flow, so this embodiment is formed on the back of the storage box 50. In addition, a replaceable bag mouth type dust filter (for example, a ULPA dust filter) 56 is provided at the air blowing inlet 5 5. That is, when the storage box 50 supports the moving body 45 in the clutch direction, as shown in FIG. 7, the dust filter 56 is provided so that it is located in front of the base portion 4 6. Particulate dust intruded into the containing box 50 through the blower inlet 5 5 was captured. Next, a processing apparatus capable of carrying in and out glass substrates using the substrate transfer apparatus 40 described above will be described. That is, the substrate transfer device 40 described above, that is, the clutch-direction moving body 45 moves in the X direction, and the glass substrate G stored in the storage box 50 cannot move with the storage box 50, and only The glass substrate G moves in the X direction. Therefore, like a general processing device, in a gate that opens and closes a glass substrate carrying in / out port, for example, a processing unit provided with a hot plate of a heat treatment device, the glass substrate G cannot be directly transferred using the substrate transfer device 40 described above. To the processing department. Therefore, the following processing equipment must be used. The processing apparatus shown in FIG. 9 is configured by placing a mounting table 65 and a relay transfer mechanism 70 between the loading / unloading port 60a of the processing apparatus 60 and the processing section 62. The mounting table 65 is installed in the processing device 60 immediately after the loading and unloading port 60a, and has a size capable of loading the storage box as it is. The glass is directly placed between the loading and unloading 60a and the storage box 50. When the board G is handed over, "the storage box 50 is connected to the carry-in / outlet 6 0 a without any gap as much as possible, and the hand-in hand-over is carried out" (Please read the precautions on the back before filling this page).

1111 i II 線； 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -11 - A7 B7 459274 五、發明說明（9 ) 璃基板G搬出到收容盒5 0外的時間點，有可能附著粒塵 ，不過本實施形態則由於是整個收容盒5 0交接到處理裝 置6 0內，因而交接時容易地防止粒塵附著到玻璃基板G 上。但是爲了使收容盒5 0能夠搬入到處理裝置6 0，搬 入搬出口 6 0 a必須配合這個收容盒5 0的大小。 載置台6 5爲1段亦可但若爲複數段例如2段亦可。 如前述過的基板搬送裝置4 0，就是採用能夠保持2個收 容盒5 0的裝置，當載置台6 5爲1段時，也必須交互地 交接該收容盒5 0，若爲2段時則一次就能夠交接2個收 容盒5 0。此情況，也能夠對2個收容盒5 0同時收容玻 璃基板G後進行交接，此外例如也能夠在上段的收容盒 5 0內未收容玻璃基板G的情況下進行交接。後者的情況 ，利用後述的中繼用搬送機構7 0，將經處理部6 2處理 過的玻璃基板G收容到上段的收容盒5 0 ’從下段的收容 盒5 0承接次個處理之玻璃基板G後交接到處理部6 2等 的處理程序，採納前述的處理程序爲可能。 另外，如第8圖及第9圖所示’設置這個載置台6 5 能夠利用旋轉軸6 6旋轉’且能夠調整與基板搬送裝置 4 0之間進行收容盒5 0交接時的方向及與中繼用搬送裝 置7 0之間進行玻璃基板G交接時的方向。然而，第8圖 所示的圖號6 7爲保持2個載置6 5間的間隔進行連接之 連接框架= 中繼用搬送機構7 0係具有處理裝置6 0內能移行在 舖設於上述過載置台6 5與處理部6 2之間的軌道7 5上 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝---I -----訂 -------線- 經濟部智慧財產局員Η消費合作社印製 -12- 459274 A7 B7______ 五、發明說明（10 ) (請先閱讀背面之注意事項再填寫本頁) 之移動體7 1，及被設置這個移體7 1上朝水平方向能旋 轉並且能上下作動之旋轉軸7 2、及被設在這個旋轉軸 7 2上之支持板7 3、及沿著支持板7 3能往其前後方向 移動所設置的夾鉗狀之交接構件7 4等而被構成。 即是若載置台6 5上載置有收容盒5 0，則令中繼用 搬送機構7 0在於處理裝置內接近載置台6 5或者是預先 在這個位置待機，接著令交接構件7 4沿著支持板7 3前 進，從收容盒50的基板出入口51插入。然後令旋轉軸 7 2上昇，從收容盒5 0的基板支撐部5 4，5 4拉起玻 璃基板G後，令交接構件7 4後退，而在收容裝置6 0內 ，旋轉回轉軸7 2使交接構件7 4的前端與處理部對峙， 利用移動體7 1移動接近到處理部，再度令交接構件7 4 前進而交接到構成處理部之旋轉夾頭等。 經濟部智慧財產局員工消費合作社印製 然而，可以採用交接構7 4爲不同高度且設有二段的 機構作爲這個中繼搬送機構7 0。此情況，能夠將一者的 交接構件作爲載置從收容盒5 0交接到處理部的未處理玻 璃基板G之專用構件使用，且能夠將他者的交接構件7 4 作爲載置相反地從處理部交接到收容盒5 0的處理過玻璃 基板G之專用構件使用。因此，例如在於加熱裝置，由於 能夠各別以專用的交接構件保持未處理的低溫基板及處理 過的高溫基板，所以與利用1個交接構件進行全部的交接 之情況作比較，能夠減少因儲存在交接構件的熱造成對玻 璃基板G的不良影響。 其次，說明本實施形態其基板搬送裝置4 0及處理裝 -13- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 45927 4 A7 _____B7 _ 五、發明說明（11) (請先閱讀背面之注意事項再填寫本頁) 置6 0的作用。首先，利用搬送方向移動體4 1的驅動， 基板搬送裝置4 0沿著搬送路1 〇移動，接近到裝載/卸 載機4，以基板出入口 5 1成爲前方的方向將保持在該裝 載/卸載機4之收容盒承接到離合方向移動體4 5的機械 臂47、 48上。此時，因應所須令離合方向移動體45 前後作動而從裝載/卸載機4承接，不過只令裝載/卸載 機4作動，而使其載置到該離合方向移動體4 5上亦可。 另外，此處所被交接之收容盒5 0，如上述過爲玻璃基板 G保持收容在該基板支撐部54、 54之收容盒。 收容盒5 0載置到離合方向移動體4 5上則配置在背 面之濾塵器5 6與基台部4 6的吹出口 4 9 a連接。然後 ，利用送風扇4 9的驅動，介由濾塵器5 6風送入到收容 盒50的內部。此時，經由濾塵器56，就是從送風扇 4 9入侵粒塵也被補集。送入到收容盒5 0內的風，形成 從被設在前面之基板出入口 5 1流到外部之氣流，將收容 盒5 0內維持正壓。因此玻璃基板G搬送中，不致從該基 板出入口 5 1入侵粒塵。 經濟部智慧財產局員工消費合作社印製 基板搬送裝置4 0，若已承接收容盒5 0，則利用搬 送方向移動體41的驅動往X方向移動到配置有作爲目的 的處理裝置6 .0附近。其次經由馬達4 2令回轉軸4 3朝 所定角度0方向旋轉，在機械臂47、 48上將位於前方 之基板出入口 5 1使其與該處理裝置6 0方向一致’進而 令回轉軸4 3朝上下方向（Z方向）動作，而與該收容裝 置6 0的閘門對向。 -14- 本紙張尺度適用中國國家標準<CNS)A4規格（210 X 297公釐） A7 B7 459274 五、發明說明（12 ) 在此狀態下，令閘門開放動作，基扳搬送裝置4 0的 離合方向移動體4 5通過搬入搬出口 6 0 a而前進到處理 裝置6 0的內部，將收容盒5 0載置在載置台6 5上（參 照第8及9圖）。離合方向移動體45若在載置台65上 載置了收容盒5 0則從搬入搬出口 6 0 a後退到處理裝置 6 0的外部。然後處理裝置6 0的閘門關閉動作。然而， 此時如同本實施形態具有2個離合方向移動體4 5，其各 別載置著收容盒5 0時，如上述，同時動作2個離合方向 移動體4 5，也能夠經一次的動作就可以交接到2段設置 之載置台6 5上。 ' 若在載置台6 5上載置收容盒5 0，則被配置在處理 裝置6 0內之中繼用搬送機構7 0移動到載置台6 5附近 ，或者是預先令其在這個位置待機，經由載置台6 5其旋 轉軸6 6的動作，而使收容盒5 0的基板出入口 5 1與中 繼用搬送機構7 0方向一致。然後令該中繼用搬送機構1111 i II line; Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, the paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) -11-A7 B7 459274 V. Description of the invention (9) Glass substrate G At the time when it is moved out of the storage box 50, it is possible to attach particulate dust. However, in this embodiment, the entire storage box 50 is transferred to the processing device 60, so that it is easy to prevent the particulate dust from adhering to the glass substrate G during the transfer. on. However, in order to allow the storage box 50 to be carried into the processing device 60, the carrying-in port 60a must match the size of the storage box 50. The stage 65 may be one stage, but it may be a plurality of stages, for example, two stages. As mentioned above, the substrate transfer device 40 is a device capable of holding two storage boxes 50. When the mounting table 65 is in one stage, the storage box 50 must also be handed over interactively. You can transfer 2 storage boxes 50 at one time. In this case, it is also possible to transfer the two storage boxes 50 to the glass substrate G at the same time. Alternatively, the glass substrate G can be transferred to the upper storage box 50, for example. In the latter case, the glass substrate G processed by the processing unit 62 is stored in the upper storage box 50 0 by the relay transfer mechanism 70 described later, and the next processing glass substrate is received from the lower storage box 50. After the G is delivered to a processing program such as the processing unit 62, it is possible to adopt the aforementioned processing program. In addition, as shown in FIG. 8 and FIG. 9, “the mounting table 6 5 can be rotated by the rotating shaft 66” and the direction and the center of the storage box 50 when it is transferred to and from the substrate transfer device 40 can be adjusted. The direction when the glass substrate G is transferred between the relay conveyance devices 70. However, the drawing number 6 7 shown in Fig. 8 is a connection frame that maintains a space between two mountings 65 and 5 = a relay transfer mechanism 7 0 has a processing device 60 and can be moved in the above-mentioned overload. On the track 7 5 between the table 6 5 and the processing section 6 2, the paper size on this paper applies the Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page). -I ----- Order ------- line-Printed by the Member of the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperatives-12- 459274 A7 B7______ V. Description of Invention (10) (Please read the notes on the back before filling (This page) a moving body 7 1 and a rotating shaft 7 2 on which the moving body 7 1 can be rotated horizontally and can be moved up and down, and a support plate 7 3 on the rotating shaft 7 2 and The clamp-like transfer member 74 provided in the back-and-forth direction along the support plate 7 3 can be configured. That is, if the storage box 50 is placed on the mounting table 65, the relay transfer mechanism 70 is brought close to the mounting table 65 in the processing device or waits in advance at this position, and then the transfer member 74 is moved along the support. The plate 73 is advanced, and is inserted from the substrate entrance 51 of the storage box 50. Then, the rotary shaft 72 is raised, and the glass substrate G is pulled up from the substrate support portions 54, 54 of the storage box 50, and the transfer member 74 is retracted, and in the storage device 60, the rotary shaft 72 is rotated. The front end of the transfer member 74 is opposed to the processing unit, and the moving body 71 is moved to approach the processing unit, and the transfer member 7 4 is moved forward and then transferred to the rotary chuck constituting the processing unit. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. However, the transfer structure 7 4 can be adopted as a relay transfer mechanism 70 with different heights and two sections. In this case, one of the transfer members can be used as a dedicated member for placing the unprocessed glass substrate G transferred from the storage box 50 to the processing section, and the other transfer member 7 4 can be used as the opposite for processing. The glass substrate G is used as a dedicated member of the processing box 50, which is transferred to the storage box 50. Therefore, for example, in the heating device, since the unprocessed low-temperature substrate and the processed high-temperature substrate can be held by a dedicated transfer member, respectively, compared with the case where all transfers are performed by one transfer member, it is possible to reduce The heat of the transfer member causes an adverse effect on the glass substrate G. Next, the substrate conveying device 40 and processing equipment of this embodiment will be described. 13- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 45927 4 A7 _____B7 _ V. Description of the invention (11) ( (Please read the precautions on the back before filling out this page) Setting the effect of 60. First, by the driving of the moving body 41 in the conveying direction, the substrate conveying device 40 moves along the conveying path 10 and approaches the loader / unloader 4 and is held in the loader / unloader with the substrate inlet / outlet 51 in the forward direction. The storage box 4 is received on the robot arms 47, 48 of the moving body 45 in the clutch direction. At this time, the clutch-direction moving body 45 is moved forward and backward to receive the load from the loader / unloader 4 as required, but only the loader / unloader 4 is operated to mount the loader-unloader 4 on the clutch-direction moving body 45. In addition, the storage box 50 to be transferred here, as described above, remains the storage box stored in the substrate supporting portions 54 and 54 for the glass substrate G. The storage box 50 is placed on the moving body 45 in the clutch direction, and the dust filter 56 arranged on the back surface is connected to the outlet 4 9a of the base portion 46. Then, by the driving of the blower fan 49, air is sent to the inside of the storage box 50 through the dust filter 56. At this time, the dust particles invaded from the blower fan 49 through the dust filter 56 are also collected. The wind sent into the storage box 50 forms an air flow from the substrate inlet and outlet 51 provided in the front to the outside, and maintains a positive pressure in the storage box 50. Therefore, during the transportation of the glass substrate G, no particulate dust can be intruded from the substrate inlet and outlet 51. The substrate transfer device 40 is printed by the employee's cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. If the container 50 has been received, it is driven in the X direction by the drive of the moving body 41 to the vicinity of the processing device 6.0, which is provided for the purpose. Next, the rotary shaft 4 3 is rotated in a predetermined angle 0 direction by the motor 4 2, and the substrate inlet and outlet 5 1 located in front of the robot arms 47 and 48 are aligned with the processing device 60. It moves in the up and down direction (Z direction) and opposes the gate of the containment device 60. -14- This paper size applies the Chinese National Standard < CNS) A4 specification (210 X 297 mm) A7 B7 459274 V. Description of the invention (12) In this state, the gate is opened, and the transport device 40 The moving body 45 in the clutch direction advances to the inside of the processing device 60 by carrying in the carrying-out port 60 a, and places the storage box 50 on the mounting table 65 (see FIGS. 8 and 9). When the moving unit 45 in the clutch direction places the storage box 50 on the mounting table 65, it moves back from the loading / unloading port 60a to the outside of the processing device 60. Then, the shutter of the processing device 60 is closed. However, at this time, as in the present embodiment, there are two clutch-direction moving bodies 45, and when the storage boxes 50 are respectively placed, as described above, the two clutch-direction moving bodies 45 can be operated at the same time, and the movement can be performed once. It can be transferred to the mounting table 6 5 set in two stages. '' When the storage box 50 is placed on the mounting table 65, the relay transfer mechanism 70 arranged in the processing device 60 is moved to the vicinity of the mounting table 65, or it is made to stand at this position in advance, The operation of the rotation axis 66 of the mounting table 65 causes the substrate inlet / outlet 51 of the storage box 50 to be aligned with the relay transport mechanism 70. Then make the relay transfer mechanism

7 0的交接構件7 4沿著支撐板7 3前進’通過基板出入 口 5 1插入到保持在收容盒5 0內之玻璃基板G的下側（ 參照第9圖）。接著令旋轉軸72上昇，拉起玻璃基板G ，令交接構件7 4後退，而在收容裝置6 0內，如同第9 圖的推測線所示，令旋轉軸7 2旋轉而使交接構件7 4的 前端與處理部6 2對峙1進而利用移動體7 1接近到處理 部6 2後，令交接構件7 4前進而交接到處理部。 若在於處理部6 2完成預定的處理，則與前述相反地 ，中繼用搬送機構7 0從處理部6 2承接處理過的玻璃基 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閲讀背面之注意事項再填寫本頁) 裝-----I I訂·!------線 經濟部智慧財產局員工消費合作社印製 -15- 459274 五、發明說明（13) 板G，朝向載置台6 5方向移動。中繼用搬送機構7 0的 交接構件7 4插入到載置台6 5上正在待機的收容盒5 0 內，將處理過的玻璃基板G載置在基板支撐部54、 54 上。 其次，開放處理裝置6 0的閘門，再度通過搬入出口 6 〇 a插入基板搬送裝置4 0的離合方向移動體4 5，保 持收容裝置過的玻璃基板G載置在載置台之收容盒5 0且 經後退。離合方向移動體4 5後退，則收'容盒5 0的濾塵 器5 6接近到形成在基台部46之吹出口 49a，且再度 連通。因此風從收容盒5 0的後方朝向基板出入口 5 1送 入，收容盒5 0內變爲正壓氣相，防止從常時開口著的基 板出入口 5 1入侵粒塵’並且這個基板搬送裝置4 0朝向 下個處理裝置搬送玻璃基板G » 然而，上述過的說明，則是載置台6 5載置在處理裝 置6 0內，每個收容盒5 0搬送到該處理裝置6 0內’不 過離合方向移動體4 5往離合方向的移動促使收容盒5 0 的基板出入口 5 1移動到收容裝置6 0的搬入搬出口 6 0 a爲止，此外也可以是不在收容裝置6 〇內設置載置 台6 5之構造。但是此情況’連接收容盒5 0的基板出入 口 5 1與處理裝置6 〇的搬入搬出口 6 0 a之際’爲了防 止粒塵的入侵，而形成該搬入搬出口 6 0 a的大小使其兩 者間儘可能地無間隙地密接。 另外，也能夠在收容盒5 0內設置偵測玻璃基板G上 的靜電之監視器，並且設置靜電除去裝置（未圖示）°由 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） (請先閱讀背面之注意事項再填寫本頁) 裝--------訂---------線， 經濟部智慧財產局員工消費合作社印製 -16- 459274 a7 __B7__ 五、發明說明（14) (請先閱讀背面之注意事項再填寫本頁> 於玻璃基板G收容在稱爲收容盒5 0之所被隔成的空間， 因此可以有效地除去靜電。另外在基板搬送裝置4 0與收 容裝置6 0之間進行收容盒5 0的交接期間，進行衰減送 風扇4 9驅動之控制，使其不致因送風扇4 9而將基板搬 送裝置4 0周邊的粒塵送入到收容裝置6 0內。 其次，說明本發明的其他實施形態。 本實施形態係使本發明適用於收容基板之收容裝置。 如第1 0圖所示，收容裝置1 0 0內縱橫收容多數個 第5圖所示的收容盒。在收容裝置1 0 0的附近例如配置 有施行抗蝕劑塗敷顯像之處理系統101;搬送自動裝置 1 0 2在於收容裝置1 0 0與處理系統1 Ο 1之間交接收 容盒5 0。 經濟部智慧財產局員工消費合作社印製 收容裝置1 0 0縱橫設置有用來收容收容盒5 0之棚 架1 0 3。各棚架1 0 3的下部至少設置3個以上架空保 持收容盒5 0之保持銷1 0 4。在各棚架1 0 3的背面設 有連接收容盒5 0的基板出入口 5 1之排氣口 1 0 5。各 .排氣口 1 0 5連接到設在其背後之排氣通路。因此，收容 盒5 0載置在收容裝置1 〇 〇的棚架1 〇 3上，則收容盒 5 0的基板出入口 5 1被連接到排氣口 1 0 5 ’收容盒 5 0內的氣相介由排氣口 1 〇 5及排氣通路1 0 6排氣； 另外對收容盒5 0內從送風吹入口 5 5介由濾麈器5 6導 入淸淨空氣。由於此因收容盒5 0內維持沒有粒塵的被淸 淨過之氣相。 在處理系統1 0 1中例如設有載置收容盒5 0之載置 -17- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 4 5 9 2 7 4 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明（15) 台，被載置在載置台1 1 1之收容盒5 0內的玻璃基板G 經由被設在處理系統1 0 1內之搬送裝置（未圖示）搬出 後投入到該處理裝置1 0 1內，另外該處理裝置1 0 1內 所處理完畢之玻璃基板G經由搬送裝置（未圖示）搬入到 被載置在載置台1 1 1之收容盒5 0內。 搬送自動裝置1 0 2例如在搬送車1 2 1上具備有與 第3圖所示的基板搬送裝置4 0幾乎相同構成之基板盒搬 送機構1 2 2。基板盒搬送機構1 2 2例如朝0方向旋轉 並且往前後進退收容盒5 0。 依據本實施形態，例如能夠在不依存於無麈室的淸淨 度之已淸淨過的狀態下，於收容裝置1 0 0與處理系統 1 0 1之間搬送玻璃基板G。另外在收容裝置1 0 0內也 能夠在同樣的狀態下收容玻璃基板G。 其次，說明本發明的另外實施形態。 第1 0圖所示的實施形態，其處理系統1 0 1內則是 不將基板G收容到收容盒5 0內’就直接搬送基板G同時 進行處理，不過本實施形態，不只是收容裝置中基板的收 容，處理系統內基板的搬送也都是使用收容盒5 0才進行 處理。 即是如第1 1圖所示，收容盒2 0 0內縱橫收容多數 個第5圖所示的收容盒5 0。在收容裝置2 0 0的附近例 如配置施予抗蝕劑塗敷顯像之處理系統2 0 1，搬送自動 裝置2 0在收容裝置2 0 0與處理系統2 0 1之間交接收 容盒5 0。 (請先閲讀背面之注意事項再填寫本頁) 裝·！ —訂----!|!線 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -18 - 經濟部智慧財產局員工消費合作社印製 45927 4 a7 _____B7 _五、發明說明（16) 在收容裝置2 0 0中縱橫設有用來收容收容盒之棚架 2 0 3。在各棚架2 0 3的下部至少設置3根以上懸空保 持收容盒50之保持銷204。在各棚架203的背面設 有連接收容盒5 0的送風吹入口 5 5之逆風口 4 0 5。各 送風口 2 0 5連接到設於其背後之送風路。因此，收容盒 5 0載置在收容裝置2 0 0的棚架2 0 3，則收容盒5 0 的送風吹入口 55被連接送風口 205，從送風口 205 所送風之例如淸淨過之空氣或是氮氣等從送風吹入口 5 5 導入到收容盒5 0內而從基板出入口 5 1排出。由於此因 ，收容盒5 0內維持沒有粒塵經淸淨過之氣相。 在處理系統2 0 1內例如設有載置收容盒5 0之載置 台2 1 1，被載置在載置台2 1 1之收容盒5 0經由被設 在處理系統2 0 1內之搬送裝置（未圖示）搬出而投入到 該處理系統2 0 1內；另外該處理裝置2 0 1內處理完畢 之收容玻璃基板G之收容盒5 0經由搬送裝置（未圖示） 載置到載置台2 1 1。 搬送自動裝置2 0 2例如在搬送車2 2 1上具備有基 板盒搬送機構2 2 2。基板盒搬送機構2 2 2例如具備： 具有往0方向旋轉並且往前後進退收容盒5 0的機構之搬 送台2 2 3。在搬送台2 2 3的背後設有板狀的蓋體 2 2 4。蓋體2 2 4係阻塞被載置在搬送台2 2 3之收容 盒5 0的基板出入口 5 5，因設置此蓋體2 2 4當利用搬 送自動裝置2 0 2搬送收容盒5 0之際就能夠防止粒麈進 入到該收容盒5 0內。 -----------厂_裝--------訂---------竣，，V <請先間讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -19- 45927 4 A7 一 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明（17) 在於本實施形態，例如也能夠在不依存於無塵室的淸 淨度之經淸淨過的狀態下，於收容裝置2 0 0與處理系統 2 0 1之間搬送玻璃基板G。另外在收容裝置1 0 0內也 能夠在同樣的狀態下收容玻璃基板G =進而在於處理系統 內也能夠在同樣的狀態下搬送玻璃基板G « 在於本實施形態，能如以下所述變形收容盒。 例如如第1 2圖所示，在收容盒2 3 1的背面設置第 1送風口 2 3 2，在收容盒2 3 1背後側的下部設置第2 送風口。另外在各送風口 2 3 2、2 3 3，分別設有往內 側開閉並且朝關閉各送風口 2 3 2、2 3 3的方向附有彈 力之第1及第2門戶部234、235。 在處理系統2 0 1的載置台2 1 1上之預定位置，如 第1 3圖所示設置頂開收容盒2 3 1的第2門戶部2 3 5 之頂開銷2 3 6、及用來朝向利用頂開銷2 3 6所開啓之 第2送風口 2 3 3供給淸淨空氣之風扇2 3 7。 另外，在處理系統2 0 1的搬送裝置2 1 2背面，如 第1 4圖所示設置頂開收容盒2 3 1的第1門戶部2 3 4 之開銷2 3 8、及用來朝向利用頂開銷2 3 8所開啓之第 1送風口 2 3 2烘給淸淨空氣之風扇2 3 9。 依據此種的構成，當收容盒2 3 1載置到載置台 231上時，介由第2送風口 233，淸淨空氣供給到收 容盒2 3 1內；當利用搬送裝置搬送收容盒2 3 1時，介 由1第送風口 2 3 2，淸淨空氣供給到收容盒2 3 1內。 因此，在於處理系統2 0 1內，例如能夠在不依存於無塵 <請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公楚） -20- 459274 ：； 五、發明說明（18) 室的淸淨度之經清淨過的狀態下搬送處理玻璃基板G。然 而在與進行玻璃基板G的處理之處理部或曝光裝置之間進 行玻璃基板G的交接之介面部也是與上述同樣的構成，能 夠得到同樣的效果·> 其次，說明本發明收容盒的其他例。 此例中，如第1 5圖所示，在收容盒50的基板出入 口 5 1近旁下部，設置用來排出收容盒5 0內的氣相之排 氣扇240。由於此因，從基板出入口 5 1吹出空氣變少 ，當玻璃基板G交接到預定的裝置之際不致從收容盒5 0 側吹出污染該裝置的空氣。 然而，如第1 6圖所示，搬送裝置2 5 1在上下具有 2個托臂252、 253時，若構成爲上托臂252搬送 設有朝向上部排出空氣的排氣扇2 4 0之收容盒5 0 ’下 托臂5 3搬送設有朝向下部排出空氣的排氣扇2 4 0之收 容盒5 0，則搬送裝置2 5 1上其上下收容盒5 0的排氣 不致相互干涉。 第1 7圖係表示另外的收容盒之例圖。 如第1 7圖所示，此收容盒2 6 1在收容基板的本體 262前面設置基板出入口 263。本體262的背面側 隔著濾塵器部2 6 4設置風扇部2 6 5 °在濾塵器部 264例如安裝著HEPA (ULPA)濾塵器。 風扇部2 6 5設有介由濾塵器部2 6 4將空氣送到本 體2 6 2內之風扇2 6 6、及將電力供給到風扇2 6 6之 蓄電池2 6 7、及控制風扇2 6 6的驅動之控制部2 6 8 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (諝先閱讀背面之生意事項再填寫本頁) 裝 --- ---— I 訂------線， 舞 經濟部智慧財產局員工消費合作社印製 -21 - 經濟部智慧財產局員工消費合作社印製 4592 74 A7 B7 五、發明說明（19) 。蓄電池2 6 7透過外部端子2 7 0進行充電。 然後，控制部2 6 8例如根據被設置在本體2 6 2內 的基板出入口 2 6 3附近之風速感測器2 6 9其風速的偵 測結果，控制風扇2 6 6的驅動，例如使本體2 6 2內的 風速成爲所期望之値。另外控制部2 6 8由風扇的偵測結 果與風扇2 6 6的旋轉數之比較，判斷濾塵器部2 6 4其 濾塵器的劣化，例如發出警報聲。 另外，例如在風扇部2 6 6的預定位置設置通訊連結 埠2 7 1，控制部2 6 8介由這個通訊連接埠2 7 1與外 部的電腦等進行資料的交換。此樣的資料例如由上述警報 資料的輸出或是外部設定風速。 然而，本發明作爲基板搬送裝置的搬送對象之基板’ 不只是上述過L C D用的玻璃基板，就是半導體晶圓等的 基板也能夠適用本發明。進而，上述過塗敷/顯像處理系 統其處理裝置的組合只是其中一例，對於配置有CVD、 灰化、蝕刻等之作業線當然也是有效的。 〔圖面之簡單說明〕 第1圖係爲表示本發明處理系統的實施形態之斜視圖 第2圖係爲用來說明上述實施形態的採用裝載/卸載 機之構成圖。 第3圖係爲表示本發明基板搬送裝置的實施形態之斜 視圖。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -22- ! 裝--------訂---------Λν (諝先閲讀背面之注<18^項再填窝本頁) 45927 ^ 五、發明說明（20) 第4圖係爲表示上述實施形態其基板搬送裝置之斜視 圖。 第5圖係爲表示上述實施形態所使用的收容盒之斜視 圖。 第6圖係爲第5圖中A—A線之斷面圖。 第7圖係爲模式地表示當收容盒載置在基板搬送裝置 時的位置關係之圖。 第8圖係爲用來說明從基板搬送裝置將收容盒交接到 載置台的過程之模式圖。 第9圖係爲模式地表示本發明處理裝置的實施形態之 圖。 第1 0圖係爲本發明其他實施形態的收容裝置之側面 圖。 第1 1圖係爲本發明另外實施形態的收容裝置之側面 圖。 第1 2圖係爲表示本發明收容盒的其他例之圖° 第1 3圖係爲第1 2圖所示的收容盒之說明圖（其1 ) 第1 4圖係爲第1 2圖所示的收容盒之說明圖（其2 ) 第1 5圖係爲表示本發明的收容盒另外例之圖。 第1 6圖係爲表示第1 5圖所示收容盒的變形使用例 之圖。 第1 7圖係爲表示本發明的收容盒他例之圖° 本紙張尺度適用中國國家標準（CNS)A4規格（210 >c 297公釐） (請先閱讀背面之注意事項再填寫本頁) ^^1 I I!訂---， 經漆部智慧財產局員工消費合作社印製 45927 4 π _B7五、發明說明（21 ) 〔圖號說明〕 構 置 機 路裝 口 送 送送 入置 搬板 搬搬軸扇出裝部用基 1 板轉風板理理繼璃 第基旋送基處處中玻 • « ·»»*♦ 4 « __ _ * 10391020G 4 4 4 5 6 6 7The transfer member 7 4 of 70 advances along the support plate 7 3 ′ and is inserted into the lower side of the glass substrate G held in the storage box 50 through the substrate inlet / outlet 51 (see FIG. 9). Next, the rotary shaft 72 is raised, the glass substrate G is pulled up, and the transfer member 74 is retracted, and in the storage device 60, as shown by the inferred line in FIG. 9, the rotary shaft 72 is rotated to make the transfer member 7 4 The front end of the head is opposed to the processing section 62, and the moving body 71 is used to approach the processing section 62, and then the transfer member 74 is advanced to be transferred to the processing section. If the predetermined processing is completed in the processing section 62, contrary to the above, the relay basic conveyance mechanism 70 receives the processed glass basic paper size from the processing section 62 and applies the Chinese National Standard (CNS) A4 standard (210 X 297). (Mm) (Please read the notes on the back before filling out this page.) -------- Order II !! ---- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs -15- 459274 V. Invention Explanation (13) The plate G moves toward the mounting table 65. The transfer member 74 of the relay conveyance mechanism 70 is inserted into the standby storage box 50 on the mounting table 65, and the processed glass substrate G is placed on the substrate support portions 54, 54. Next, the shutter of the processing device 60 is opened, and the moving body 45 in the clutch direction of the substrate transfer device 40 is inserted again through the inlet 60a, and the glass substrate G that has been contained in the storage device is placed on the storage box 50 of the mounting table and After retreating. When the moving body 45 in the clutch direction moves backward, the dust filter 56 of the container 50 is brought close to the blowout port 49a formed in the base portion 46, and communicates again. Therefore, the wind is fed from the rear of the storage box 50 toward the substrate inlet and outlet 51, and the inside of the storage box 50 becomes a positive pressure gas phase to prevent invasion of particulate dust from the substrate inlet and outlet 51 that are always open, and the substrate transfer device 40 faces The next processing device transfers the glass substrate G »However, as described above, the mounting table 65 is placed in the processing device 60, and each storage box 50 is transferred to the processing device 60. However, it does not move in the clutch direction The movement of the body 45 in the clutch direction causes the substrate inlet and outlet 5 1 of the storage box 50 to move to the loading and unloading port 6 0 a of the storage device 60, and a configuration in which the mounting table 6 5 is not provided in the storage device 60 may be used. . However, in this case, when the board entrance / exit 51 of the storage box 50 is connected to the loading / unloading port 60a of the processing device 60, the size of the loading / unloading port 60a is formed in order to prevent the invasion of particulate dust. As close as possible, there should be no gap between the people. In addition, a monitor capable of detecting static electricity on the glass substrate G can also be installed in the storage box 50, and a static electricity removing device (not shown) can be provided. According to this paper standard, the Chinese National Standard (CNS) A4 specification (210 X 297) is applicable. Gongai) (Please read the precautions on the back before filling out this page) Packing -------- Order --------- line, printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-16- 459274 a7 __B7__ V. Description of the invention (14) (Please read the precautions on the back before filling in this page> The glass substrate G is stored in a partitioned space called a storage box 50, so it can effectively remove static electricity In addition, during the transfer of the storage box 50 between the substrate transfer device 40 and the storage device 60, the drive of the attenuation fan 49 is controlled to prevent the substrate transfer device 40 from being driven by the fan 49. The granulated dust is sent to the storage device 60. Next, other embodiments of the present invention will be described. This embodiment makes the present invention applicable to a storage device for storing substrates. As shown in FIG. 10, the storage device 100 Inside and outside contain many storage boxes shown in Figure 5 A processing system 101 for performing resist coating development is arranged near the storage device 100, for example; a transfer robot 102 is provided with a receiving container 50 between the storage device 100 and the processing system 101. The Intellectual Property Bureau employee ministry of the Ministry of Economic Affairs has printed a storage device for the consumer co-operatives 1 0 0. Shelves 1 0 3 are used to store the storage boxes 50. The lower part of each scaffold 10 3 is provided with at least 3 overhead holding storage boxes 5 0 The retaining pin 1 0. The exhaust port 1 0 5 of the substrate inlet and outlet 5 1 of the storage box 50 is provided on the back of each shelf 103. Each exhaust port 1 0 5 is connected to the back Therefore, when the storage box 50 is placed on the shelf 10 of the storage device 100, the substrate inlet and outlet 51 of the storage box 50 is connected to the exhaust port 105. The storage box 5 The gas phase in 0 is exhausted through the exhaust port 105 and the exhaust passage 106. In addition, clean air is introduced into the storage box 50 from the air blowing inlet 55 through the filter 56. Because of this, The cleaned gas phase without particle dust is maintained in the storage box 50. The processing system 101 is provided with, for example, a storage box 50 Set-17- This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 4 5 9 2 7 4 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy The glass substrate G placed in the storage box 50 of the mounting table 1 1 1 is carried out through a transfer device (not shown) provided in the processing system 1 0 1 and put into the processing device 1 0 1. The glass substrate G processed in the processing device 101 is carried into a storage box 50 placed on the mounting table 1 1 1 through a transfer device (not shown). The transport robot 1 0 2 includes, for example, a transporter 1 2 1 with a substrate box transport mechanism 1 2 2 having a configuration substantially the same as that of the substrate transport device 40 shown in FIG. 3. The substrate box conveying mechanism 1 2 2 rotates, for example, in the 0 direction, and advances and retracts the storage box 50 back and forth. According to this embodiment, for example, the glass substrate G can be transported between the storage device 100 and the processing system 101 without being cleaned by the cleanliness of the chamber-free room. In addition, the glass substrate G can be stored in the same state in the storage device 100. Next, another embodiment of the present invention will be described. In the embodiment shown in FIG. 10, in the processing system 101, the substrate G is directly transferred and processed without storing the substrate G in the storage box 50. However, this embodiment is not limited to the storage device. The storage of substrates and the transportation of substrates in the processing system are also processed using a storage box 50. That is, as shown in FIG. 11, a plurality of storage boxes 50 shown in FIG. 5 are accommodated in the storage box 200 horizontally and vertically. For example, a processing system 2 1 for applying resist coating and development is arranged near the storage device 2 0 0, and a transfer robot 2 0 transfers a receiving container 5 0 between the storage device 2 0 0 and the processing system 2 0 1. . (Please read the precautions on the back before filling out this page) —Order ----! |! The paper size of the paper is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) -18-Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 45927 4 a7 _____B7 _V. Invention Explanation (16) Shelves 203 for accommodating storage boxes are arranged vertically and horizontally in the storage device 2000. At least three holding pins 204 for holding and holding the storage box 50 are provided at the lower part of each of the scaffolds 203. On the back of each scaffold 203, an upwind port 4 0 5 is provided, which is connected to the air blowing inlet 5 5 of the storage box 50. Each air outlet 2 05 is connected to an air supply path provided behind it. Therefore, when the storage box 50 is placed on the shelf 2 0 3 of the storage device 200, the air inlet 55 of the storage box 50 is connected to the air outlet 205, and the air sent from the air outlet 205 is, for example, cleaned air. Or nitrogen or the like is introduced into the storage box 50 from the air blowing inlet 5 5 and discharged from the substrate inlet and outlet 51. For this reason, a gas phase in which no particles have been cleaned has been maintained in the storage box 50. For example, a processing table 2 1 1 on which the storage box 50 is placed in the processing system 2 0 1, and a storage box 50 which is placed on the mounting table 2 1 1 is passed through a transfer device provided in the processing system 2 0 1. (Not shown) is carried out and put into the processing system 201; in addition, the storage box 50 containing the glass substrate G processed in the processing device 201 is placed on a mounting table via a transfer device (not shown) 2 1 1. The transport robot 2 0 2 includes, for example, a substrate box transport mechanism 2 2 2 on a transport vehicle 2 2 1. The substrate box transfer mechanism 2 2 2 includes, for example, a transfer table 2 2 3 having a mechanism that rotates in the 0 direction and advances and retracts the storage box 50 back and forth. A plate-shaped cover 2 2 4 is provided behind the transfer table 2 2 3. The cover 2 2 4 blocks the substrate inlet and outlet 5 5 of the storage box 5 0 placed on the transfer table 2 2 3, so this cover 2 2 4 is provided when the storage box 50 is transported by the transfer robot 2 0 2 This can prevent the pupae from entering the storage box 50. ----------- Factory_installation -------- Order --------- End, V < Please read the precautions on the back before filling this page ) This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -19- 45927 4 A7-B7 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. The invention description (17) lies in this implementation form, For example, the glass substrate G can be transferred between the storage device 2000 and the processing system 201 without being cleaned by the cleanliness of the clean room. In addition, the glass substrate G can be stored in the same state in the storage device 100. Furthermore, the glass substrate G can be transported in the same state in the processing system. «In this embodiment, the storage box can be deformed as described below. . For example, as shown in FIG. 12, a first air outlet 2 3 2 is provided on the back of the storage box 2 3 1, and a second air outlet is provided on a lower portion on the rear side of the storage box 2 3 1. In addition, each of the air outlets 2 3 2, 2 3 3 is provided with first and second portal portions 234, 235 which are opened and closed inwardly and are elastically closed toward the air outlets 2 3 2, 2 3 3. At a predetermined position on the mounting table 2 1 1 of the processing system 2 0 1, an overhead opening 2 3 6 of the second portal portion 2 3 5 of the top opening storage box 2 3 1 is provided as shown in FIG. 13, and is used for The fan 2 3 7 that supplies clean air toward the second air outlet 2 3 3 opened by the overhead 2 3 6. In addition, the overhead of the first portal portion 2 3 4 of the top opening storage box 2 3 1 as shown in FIG. 14 is provided on the back of the conveying device 2 1 2 of the processing system 2 1 2 and is used for use. The first air outlet 2 3 2 opened by the top overhead 2 3 8 is a fan 2 3 9 for blowing clean air. According to this configuration, when the storage box 2 3 1 is placed on the mounting table 231, clean air is supplied into the storage box 2 3 1 through the second air outlet 233; when the storage box 2 3 is transported by the transfer device At 1 o'clock, clean air is supplied into the storage box 2 3 1 through the first air outlet 2 3 2. Therefore, within the processing system 201, for example, you can not rely on dust-free < please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 cm) ) -20-459274 ：; 5. Description of the invention (18) The glass substrate G is transported and processed in the cleaned state of the chamber. However, the mesial portion for transferring the glass substrate G to the processing unit or the exposure device that performs the processing of the glass substrate G also has the same structure as above, and can obtain the same effect. ≫ example. In this example, as shown in FIG. 15, an exhaust fan 240 for exhausting the gaseous phase in the storage box 50 is provided near the substrate inlet / outlet 51 of the storage box 50. Because of this, less air is blown out from the substrate inlet and outlet 51, and when the glass substrate G is handed over to a predetermined device, air contaminated from the device is not blown from the storage box 50 side. However, as shown in FIG. 16, when the conveying device 2 51 has two supporting arms 252 and 253 on the upper and lower sides, if the upper supporting arm 252 is configured to convey a housing provided with an exhaust fan 2 4 0 that discharges air upwards. The box 50 'lower supporting arm 53 conveys the storage box 50 provided with an exhaust fan 2400 that discharges air toward the lower part, so that the exhaust of the upper and lower storage boxes 50 on the conveying device 2 51 does not interfere with each other. Fig. 17 is a view showing an example of another storage box. As shown in FIG. 17, the storage box 261 is provided with a substrate inlet and outlet 263 in front of the main body 262 for storing the substrate. On the back side of the main body 262, a fan section 2 6 5 is provided across the dust filter section 2 6 4. A dust filter section 264 is, for example, a HEPA (ULPA) dust filter. The fan section 2 6 5 is provided with a fan 2 6 6 that sends air to the body 2 6 2 through a dust filter section 2 6 4 and a battery 2 6 7 that supplies power to the fan 2 6 6 and a control fan 2 6 6 of the drive control section 2 6 8 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (谞 Read the business matters on the back before filling in this page) Installation --- ----- I Order ------ line, printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-21-printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 4592 74 A7 B7 V. Description of Invention (19). Battery 2 6 7 is charged via external terminal 2 70. Then, the control unit 2 6 8 controls the driving of the fan 2 6 6 based on the wind speed detection result of the wind speed sensor 2 6 9 located near the board entrance 2 6 3 inside the main body 2 6 2, for example, makes the main body The wind speed in 2 6 2 is expected. In addition, the control unit 2 6 judges the deterioration of the dust filter of the dust filter unit 2 6 4 by comparing the detection result of the fan with the number of rotations of the fan 2 6 6, for example, an alarm sound is issued. In addition, for example, a communication link port 2 71 is provided at a predetermined position of the fan section 2 6 6, and the control section 2 6 8 exchanges data with an external computer or the like via this communication port 2 7 1. Such data can be output by the above-mentioned alarm data or externally set wind speed, for example. However, the substrate to be transferred by the substrate transfer device according to the present invention is applicable not only to the above-mentioned glass substrate for LC, but also to a substrate such as a semiconductor wafer. Furthermore, the combination of processing equipment of the overcoating / developing processing system described above is just one example, and it is of course effective for a work line where CVD, ashing, etching, etc. are arranged. [Brief Description of the Drawings] Fig. 1 is a perspective view showing an embodiment of the processing system of the present invention. Fig. 2 is a structural diagram using a loader / unloader for explaining the above embodiment. Fig. 3 is a perspective view showing an embodiment of the substrate transfer apparatus of the present invention. This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) -22-! Loading -------- Order --------- Λν (谞 Read the note on the back first < 18 ^ Refill this page) 45927 ^ V. Description of the invention (20) Figure 4 is a perspective view showing the substrate transfer device of the above embodiment. Fig. 5 is a perspective view showing a storage box used in the above embodiment. Fig. 6 is a sectional view taken along the line A-A in Fig. 5. Fig. 7 is a diagram schematically showing the positional relationship when the storage box is placed on the substrate transfer apparatus. Fig. 8 is a schematic diagram for explaining a process of transferring the storage box from the substrate transfer apparatus to the mounting table. Fig. 9 is a diagram schematically showing an embodiment of the processing apparatus of the present invention. Fig. 10 is a side view of a storage device according to another embodiment of the present invention. Figure 11 is a side view of a storage device according to another embodiment of the present invention. Fig. 12 is a diagram showing another example of the storage box of the present invention. Fig. 13 is an explanatory diagram of the storage box shown in Fig. 12 (No. 1). Fig. 14 is shown in Fig. 12 (2) of the storage box shown in Fig. 15 is a view showing another example of the storage box of the present invention. Fig. 16 is a diagram showing a modified usage example of the storage box shown in Fig. 15; Figure 17 is a diagram showing another example of the storage box of the present invention. ° This paper size applies the Chinese National Standard (CNS) A4 specification (210 > c 297 mm) (Please read the precautions on the back before filling this page. ) ^^ 1 II! Order ---, Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Painting 45927 4 π _B7 V. Description of Invention (21) [Illustration of Drawing Number] Base for board moving shaft fan-out installation part 1 Board turning wind board Ricoh Ryder base rotation base at China Glass • «·» »* ♦ 4« __ _ * 10391020G 4 4 4 5 6 6 7

IX 15 0 4 4 4 5 5 _a 5 4 0 6 7 6 疆 _ -φ·」> ΙΜΙ· ► 動動 路移移 送向向 搬方方盒 2 送合容 第搬離收 部口 撐出 件 支搬台構 板入置接 基搬載交 (請先閲讀背面之注意事項再填寫本頁) ;裝 訂---------. 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國囤家標準（CNS)A4規格（210 X 297公釐） -24-IX 15 0 4 4 4 5 5 _a 5 4 0 6 7 6 Xinjiang_ -φ · "> ΙΙΙ Loading and delivery of the supporting structure of the platform (please read the precautions on the back before filling out this page); Binding ---------. The paper is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Applicable to China Store Standard (CNS) A4 (210 X 297 mm) -24-

Claims (1)

A8 B8 4592 7 4_dS__ 六、申請專利範圍 pi . —種基板搬送裝置，其特徵爲具備有： 能沿著搬送路移動之搬送方向移動體；及 備有介由能朝水平方向旋轉之旋轉軸支撐前述搬送方 向移動體，呈與各處理裝置的搬入搬出口對峙的姿勢能朝 離合於該搬入搬出口的方向移動前述搬送方向移動體’且 在內部支撐作爲處理對象的基板之基板支撐部和爲了進行 基板的出入而常時開口著之基板出入口和爲使內部維持正 壓之壓力控制機構等所形成之箱形收容盒而能支撐此收容 盒之離合方向移動體。 . —種基板搬送裝置，其特徵爲具備有： 能沿著搬送路移動之搬送方向移動體；及 .備有介由能朝水平方向旋轉之旋轉軸支撐前述搬送方 向移動體，呈與各處理裝置的搬入搬出口對峙的姿勢能朝 離合於該搬入搬出口的方向移動前述搬送方向移動體，且 在內部支撐作爲處理對象的基板之基板支撐部和爲了進行 基板的出入而常時開口著之基板出入口和形成從對向於該 基板出入口的形成面之面側通過該基板出入口流到外部的 氣流之送風機構等所形成之箱形收容盒而能支撐此收容盒 之離合方向移動體。 i 3 ·如申請專利範圍第1或2項之基板搬送裝置，其 中上下隔有間隔設置複數個前述離合方向移動體，其各別 能支撐前述收容盒。 4 . 一種處理裝置，其特徵爲具備有： 備有內部支撐作爲處理對象的基板之基板支撐部和爲 本紙張尺度適用t國國家標準（CNS > Μ规格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) ¥ 、tr· 經濟部智慧財產局員工消費合作社印製 -25- ^59274_______ 六、申請專利範圍 (請先閲讀背面之注意事項再填寫本育) 了進行基板的出入而常時開口著之基板出入口等所形成之 箱形收容盒而以能夠搬入搬出的大小形成前述的收容盒之 搬入搬出口；及 配置在該搬入搬出口與處理部之間的前述收容盒之載 置台；及 配置在該載置台與處理部之間，具有能對被載置在該 載置台上的收容盒離合所設置之基板的交接構件，將從該 收容盒所承接的基板交接到處理部，或是將從處理部所承 接的基板交接到該收容盒之中繼用搬送機構等。 5 ·如申請專利範圍第4項之處理裝置，其中上下不 同高度設置複數個前述載置台，並且對應於該載置台而上 下不同的高度設置複數個前述中繼用搬送機構的交接構件 〇 6. —種處理裝置，其特徵爲： 經濟部智慧財產局員工消費合作社印製 具有在內部支撐作爲處理對象之基板，設置常時開口 著之基板出入口使其密接於搬入搬出口而對所在位置之基 板搬送裝置上的收容盒能接合之基板的交接構件，從該收 容盒所承接之基板交接到處理部或是從處理部所承接之基 板交接到該收容盒之中繼用搬送機構設置在內部。 7 .如申請專利範圍第6項之處理裝置，其中前述中 繼用搬送機構分別設有：從基板搬送裝置上的收容盒承接 未處理的基板而交接到處理部之未處理基板用的交接構件 ，及承接在於處理部處理過的基板交接到基板搬送裝置上 的收容盒之處理過基板用的交接構件。 本紙張尺度適用中囷囤家揉準（CNS ) A4規格（210X297公釐） -26- ABCD 45927 4 六、申請專利範圍 y8 .—種基板的處理系統，係爲利用沿著搬送路行進 之基板搬送裝置，在與被配置在該搬送路附近之複數個處 理裝置之間進行基板的交接同時對該基板進行預定的處理 之基板的處理裝置；其特徵爲： 具有箱形的收容盒，這個箱形的收容盒備有：能載置 在基板搬送裝置並且在內部支撐作爲處理對象的基板之基 板支撐部，及爲了進行基板的出入而常時開口著之基板出 入口，及爲使內部維持正壓之壓力控制機構。 Θ —種基板的處理系統，係爲利用沿著搬送路行進 之基板搬送裝置，在與被配置在該搬送路附近之複數個處 理裝置之間進行基板的交接同時對該基板進行預定的處理 之基板的處理系統；其特徵爲： 具有箱形的收容盒，這個箱形的收容盒備有：能載置 在基板搬送裝置並且在內部支撐作爲處理對象的基板之支 板支撐部，及爲了進行基板的出入而常時開口著之基板出 入口，及形成從對向於該基板出入口的形成面之面側通過 該基板出入口流到外部的氣流之送風機構。 .v1 0 . —種基板的搬送方法|係爲利用沿著搬送路行 進之基板搬送裝置，在與被配置在該搬送路附近之間進行 基板的交接之基板的搬送方法；其特徵爲： 將前述基板收容在備有：爲了進行基板的出入而常時 開口著之基板出入口，及爲使內部維持正壓之壓力控制機 構所形成之箱形收容盒內後進行搬送。 1 . 一種基板之搬送方法，係爲利用沿著搬送路行 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 訂- 經濟部智慧財產局員工消費合作社印製 -27 A8 459274 | 々、申請專利範圍 進之基板搬送裝置，在與被配置在該搬送路附近之處理裝 置之間進行基板的交接之基板的搬送方法；其特徵爲： 將前述基板收容在備有：爲了進行基板的出入而常時 開口著之基板出入口，及形成從對向於該基板出入口的形 成面之面側通過.該基板出入口流到外部的氣流之送風機等 所形成之箱形收容盒內後進行搬送。 /1 2 · —種收容裝置，係爲針對設有進行基板的出入 之基板出入口及介由濾塵器導入外氣之外氣導入口，收容 內部收容基板的收容盒之收容裝置：其特徵爲具備有： 使前述基板出入口銜接到背面而收容前述收容盒之棚 架部；及 .被設在前述棚架部的背面，介由被收容在前述棚架部 之收容盒的前述基板出入口而排出前述收容盒內的氣體之 排出部β 4 3 . —種收容裝置，係爲針對進行基板的出入之基 板出入口被設在前面，介由濾麈器導入外氣之外氣導入口 被設在背面，且收容內部收容基板的收容盒之收容裝置； 其特徵爲具備： 前述外氣導入口銜接到背面而收容前述收容盒之棚架 部；及 被設在前述棚架部的背面，介由被收容在前述棚架部 之收容盒的前述外氣導入口，供給前述收容盒內的氣體之 供給部。 ν 1 4 _ —種收容盒，係爲針對收容基板之收容盒：其 (請先閲讀背面之注項再填寫本X) 、笨- 、*! 經 部、 智 慧 財 產 局 員 工 消 合 作 社 印 製 本紙張尺度適用中固國家襟準（CNS ) Α4規格ί 210X297公釐） -28- 經濟部智慧財產局員工消費合作社印製· ^ 4592 V 4 ll D8 _ 六、申請專利範圍 特徵爲： 進行基板的出入之基板出入口被設在前面，介由濾麈 器導入外氣之外氣導入口被設在背面。 4 5 .如申請專利範圍第1 4項之收容盒，其中由於 介由濾塵器將外.氣導入到背面側下部或是上部而設有另外 的外氣導入口，且在前述兩者的外氣導入口設置自由開閉 的閘門部。 vl 6 .如申請專利範圍第1 4項之收容盒，其中在前 述基板出入口的附近下部.，設置用來排出收容盒內的氣相 之排氣風扇。 vl 7 .如申請專利範圍第1 4項之收容盒，其中在前 述外氣導入口，設置介由前述濾塵器將空氣送到收容盒內 之風扇。 α 8 ·如申請專利範圍第1 7項之收容盒，其中前述 基板出入口的附近配置風速感測器，.並且根據風速感測器 所偵測出的風速控制前述風扇的驅動。_ <L 9 .如申請專利範圍第1 7項之收容盒’其中在前 述基板出入口的附近配置風速感測器，並且根據風速感測 器所偵測出的風速判定前述風扇的劣化。 (請先閣讀背面之注意事項再填寫本頁) 訂 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -29-A8 B8 4592 7 4_dS__ VI. Patent application scope pi. — A kind of substrate conveying device, which is characterized by having: a moving body capable of moving along the conveying path in a conveying direction; and being supported by a rotating shaft capable of rotating in a horizontal direction The moving body in the conveying direction is capable of moving the moving body in the conveying direction in a direction facing the loading and unloading port of each processing device, and a substrate supporting portion for supporting the substrate to be processed therein, and A substrate-shaped storage box formed by a pressure-controlling mechanism for maintaining a positive pressure inside the substrate through the substrate inlet / outlet that is constantly opened and closed to support the substrate is capable of supporting a moving body in the clutch direction. A substrate conveying device, comprising: a moving body capable of moving along a conveying path; and a support for the moving body in the conveying direction provided through a rotating shaft capable of rotating in a horizontal direction, and processing The posture of the device's loading / unloading port facing each other can move the moving body in the transfer direction in a direction clutching the loading / unloading port, and supports a substrate support portion of the substrate to be processed inside and a substrate that is constantly open for substrate loading and unloading. The entrance and exit and a box-shaped storage box formed by a blower mechanism, etc., forming an air flow flowing from the substrate inlet and outlet to the outside from the side of the formation surface facing the substrate inlet and outlet can support the moving body in the clutch direction of the storage box. i 3 · If the substrate transfer device according to item 1 or 2 of the patent application scope, a plurality of moving bodies in the clutch direction are arranged at intervals above and below, each of which can support the storage box. 4. A processing device, comprising: a substrate supporting portion provided with an internal substrate as a processing target; and a national paper standard (CNS > M specification (210X297 mm)) applicable to the paper size (read first Note on the back page, please fill in this page) ¥ 、 tr · Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperatives -25- ^ 59274 _______ VI. Scope of patent application (please read the precautions on the back before filling out this education) A box-shaped storage box formed by a substrate entrance and the like which are constantly opened and opened, and form a carrying-in / outlet of the aforementioned storage box in a size capable of being carried in and out; and the aforementioned storage box disposed between the carrying-in / outlet and the processing unit A mounting table; and a transfer member arranged between the mounting table and the processing unit and capable of clutching the substrate set on the storage box mounted on the mounting table, and transferring the substrate received from the storage box to the processing unit Or a relay transfer mechanism that transfers the substrates received from the processing department to the storage box. 5 · As described in item 4 of the scope of patent application A processing device in which a plurality of the aforementioned mounting platforms are provided at different heights from above and below, and a plurality of transfer members of the aforementioned relay transport mechanism are provided at different heights corresponding to the mounting platform. A processing device characterized by: economical The Intellectual Property Bureau employee consumer cooperative prints substrates with substrates that are internally supported as processing objects, and substrate openings that are open at all times are provided so that they are in close contact with the loading and unloading outlets and can be bonded to the storage box on the substrate transfer device at the location The transfer member is provided with a relay transfer mechanism that transfers the substrate received by the storage box to the processing unit or the substrate received by the processing unit to the storage box. 7. Processing as described in item 6 of the scope of patent application An apparatus in which the above-mentioned relay transfer mechanism is respectively provided with a transfer member for receiving unprocessed substrates from a storage box on the substrate transfer device and transferring the unprocessed substrates to the processing section, and transferring substrates processed in the processing section. The transfer member for processing the substrate to the storage box on the substrate transfer device. The scale is applicable to the standard of CNS A4 (210X297mm) -26- ABCD 45927 4 6. The scope of patent application y8.-A substrate processing system is used to transfer substrates along the transport path The device is a substrate processing device for transferring substrates to and from a plurality of processing devices arranged near the conveying path while performing predetermined processing on the substrates; the device is characterized by having a box-shaped storage box. The storage box includes: a substrate support portion that can be placed on a substrate transfer device and supports a substrate as a processing target, a substrate inlet and outlet that are constantly open for substrate access, and a pressure to maintain a positive pressure inside Control mechanism Θ — A substrate processing system is a substrate transfer device that travels along a transfer path, and transfers the substrate to a plurality of processing devices arranged near the transfer path, and schedules the substrate. A processing system for processing a substrate; characterized in that: it has a box-shaped storage box, and this box-shaped storage box is equipped with: The substrate transfer device supports a substrate support portion that supports the substrate to be processed therein, a substrate inlet and outlet that are constantly open for the substrate in and out, and a surface side passing through the substrate formed from a formation surface that faces the substrate inlet and outlet. Air supply mechanism for airflow flowing from the entrance to the outside. .v1 0. — A substrate transfer method | is a substrate transfer method that uses a substrate transfer device that travels along a transfer path to transfer the substrate to and from the vicinity of the transfer path; it is characterized by: The substrate is stored in a box-shaped storage box formed by a pressure-controlling mechanism for maintaining a positive pressure inside the substrate, and the substrate is opened and closed for transportation. 1. A substrate transfer method is to use the paper size along the transfer path to apply Chinese National Standard (CNS) A4 specifications (210X297 mm) (Please read the precautions on the back before filling this page) Order-Ministry of Economy Printed by the Intellectual Property Bureau's Consumer Cooperative Cooperative -27 A8 459274 | 々, a method of transferring substrates that transfers substrates to and from a processing device that is located near the transfer path within the scope of the patent application; its characteristics The substrate is housed in a blower provided with: a substrate inlet and outlet that is constantly open for the substrate in and out, and a side that forms a surface that faces the formation surface that faces the substrate inlet and outlet. Wait for the inside of the formed box-shaped storage box to carry it. / 1 2 · — A storage device is a storage device for a substrate box with a substrate inlet and outlet for carrying in and out of the substrate and an outside air introduction opening through a dust filter, and a storage box for storing the internal storage substrate: There are: a shelf portion that connects the substrate inlet and outlet to the back to accommodate the storage box; and is provided on the back of the shelf portion and is discharged through the substrate inlet and outlet of the storage box that is stored in the shelf portion The gas discharge part β 4 3 in the storage box. — A storage device is provided for the substrate inlet and outlet for the substrate in and out, and the outside air introduction port for introducing outside air through the filter is provided on the back. And a storage device for storing a storage box containing an internal storage substrate; the storage device is characterized in that: the outside air introduction port is connected to the back side to receive the storage box portion; and the rear portion of the shed portion is accommodated through the storage A supply unit for supplying gas in the storage box to the outside air introduction port of the storage box of the shelf unit. ν 1 4 _ —A kind of storage box, which is a storage box for the storage substrate: it (please read the note on the back before filling in this X), stupid-, *! Department of Economics, Intellectual Property Bureau employee consumer cooperative printed Paper standards are applicable to the China National Standards (CNS) Α4 specification ί 210X297 mm. -28- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. ^ 4592 V 4 ll D8 _ VI. The scope of patent application is: The entrance and exit of the substrate is provided at the front, and the outside air introduction port through which the outside air is introduced through the filter is provided at the back. 4 5. The storage box according to item 14 of the scope of patent application, wherein an external air introduction port is provided because the external air is introduced to the lower part or the upper part of the back side through a dust filter, and is outside the two above. The air inlet is provided with a gate portion that can be opened and closed freely. vl 6. The storage box according to item 14 of the scope of patent application, wherein an exhaust fan for exhausting the gas phase in the storage box is provided near the lower part of the substrate inlet and outlet. vl 7. The storage box according to item 14 of the scope of patent application, wherein a fan for sending air to the storage box through the dust filter is provided at the external air introduction port. α 8 · The storage box according to item 17 of the patent application scope, wherein a wind speed sensor is arranged near the entrance and exit of the substrate, and the driving of the fan is controlled according to the wind speed detected by the wind speed sensor. < L 9. The storage box according to item 17 of the scope of patent application ', wherein a wind speed sensor is arranged near the entrance and exit of the substrate, and the deterioration of the fan is determined based on the wind speed detected by the wind speed sensor. (Please read the precautions on the back before filling out this page.) The paper size is applicable to China National Standard (CNS) A4 (210X297 mm) -29-
TW089111878A 1999-06-17 2000-06-16 Substrate carrying device, processing device, processing system for substrate, conveying method, accommodating device and accommodating container TW459274B (en)

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