JP2001060610A - Substrate transfer device, treating unit, treating system of substrate, transfer method, housing device and housing box - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce as little as possible the space needed for cleaning of the transfer area of a glass substrate in a substrate transfer device. SOLUTION: With a glass substrate, which is provided as a treatment object and supported in the interior of a housing box 50 formed into a box type, air flow to flow from the sides of the surfaces, which is opposed to the formed surface of a substrate gateway 51 of the gateway 51 to the outside through the gateway 51 is formed by blast fans 49. Because of this, even though the gateway 51 is always open, particles floating outside of the box 50 will not infiltrate into the box 50. Accordingly, the need for keeping the transfer area of the glass substrate in a clean environment is eliminated, and the forming cost of the clean environment can be reduced. Moreover, since the gateway 51 is always open and an opening and shutting mechanism for opening and shutting the gateway 51 is not provided, delivery of the substrate can be performed rapidly.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing apparatus such as a coating / developing apparatus for performing coating / developing processing on a substrate to be processed such as a glass substrate used for a liquid crystal display (LCD). The present invention relates to a substrate transfer apparatus and a substrate transfer method used for loading and unloading a substrate to be processed. Further, the present invention relates to a processing apparatus provided with a mechanism suitable for transferring a substrate to and from the substrate transfer apparatus. Further, the present invention relates to a substrate processing system including such a substrate transfer device and a processing device.

[0002]

2. Description of the Related Art In an LCD manufacturing process, a photolithography technique similar to that used in the manufacture of semiconductor devices is used to form an ITO (Indium Tin Oxide) thin film and an electrode pattern on an LCD glass substrate. Used. In the photolithography technique, a photoresist is applied to a washed substrate, which is exposed and further developed.

A glass substrate, which is a substrate to be processed, is held on a substrate transfer device, moves on a transfer path, is loaded into various processing devices, is processed by each processing device, is unloaded, and is again processed by the substrate transfer device. Conveyed to the process.

[0004]

In the above-described manufacturing process, it is necessary to perform the process in an environment in which dust (particles) does not adhere to the substrate. To be installed inside
A HEPA filter is provided in the substrate transfer area inside and outside the device,
It forms a low particle environment.

However, in the above-described means, there is a problem that the cost is high because a wide area such as the entire clean room or the entire substrate transfer area needs to be made a clean environment. In particular, in order to increase production efficiency, not only the coating / developing apparatus but also other processing apparatuses such as a CVD apparatus, an etcher, an asher, etc.
Although a line-forming system has been considered, the range in which a clean environment is formed is further widened, and the cost for that may be further increased.

SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate transfer apparatus, a processing apparatus, a substrate processing system, and a substrate transfer method that can minimize the space that needs to be cleaned.

[0007]

Means for Solving the Problems In order to achieve the above object, as a result of diligent studies by the present inventors, first, attention has been focused on accommodating a substrate to be processed in a box which can be isolated from an external space. However, in such a case, it is necessary to open the substrate loading / unloading port when loading / unloading the substrate. At this time, it is necessary to provide an opening / closing mechanism having a complicated structure so that external particles do not adhere to the substrate. Further, the opening / closing operation of the opening / closing mechanism is required every time the substrate is taken in and out, which complicates the control. For this reason, while the substrate is accommodated in the box, a means for preventing external particles from entering the box even when the substrate entrance is always opened has been studied, and the present invention has been completed.

That is, the substrate transfer apparatus of the present invention is supported by a transfer-direction moving body movable along a transfer path, and a rotation shaft rotatable in the horizontal direction with respect to the transfer-direction movement body. It is movable in the direction facing the loading / unloading port in a position facing the loading / unloading port of the processing apparatus, and has a substrate supporting portion for supporting a substrate to be processed therein, and is always open for loading / unloading the substrate. And a pressure control mechanism for maintaining the inside at a positive pressure.

According to the first aspect of the present invention, a substrate to be processed is supported inside a box-shaped accommodation box, and the inside of the accommodation box is subjected to a positive pressure by a pressure control mechanism. It is kept in. Therefore, even if the substrate entrance is always open, particles floating outside the storage box do not enter the storage box. Therefore, it is not necessary to set the substrate transfer area in a clean environment, and the cost for forming the clean environment can be significantly reduced. Further, since the substrate entrance is always open and no opening / closing mechanism for opening / closing the substrate entrance is provided, the substrate can be transferred quickly.

[0010]

Embodiments of the present invention will be described below with reference to the drawings. First, an overall structure of a coating / developing processing system as an example of a substrate processing system of the present invention will be described with reference to FIG.

As shown in FIG. 1, a storage box 50 (see FIG. 2) containing a glass substrate G is carried in and out of the coating and developing system 1 in front of the coating and developing system 1. A loader / unloader unit is provided. The loader / unloader section includes a storage box 50.
A cassette mounting table 3 on which a plurality of cassettes C each containing a plurality of glass substrates are aligned and mounted, and a storage box 50 storing a glass substrate G to be processed are taken out of each cassette C, and processed in the coating / developing processing system 1. A loader / unloader 4 is provided for returning the storage box 50 storing the glass substrate G to the cassettes C.
The loader / unloader 4 moves in the direction in which the cassettes C are arranged by traveling of the main body 5, and the plate-like body 6 mounted on the main body 5 is moved.
The accommodation box 50 is placed on the upper surface, and the
The storage box 50 is handed over to the storage box 50.

More specifically, as shown in FIG. 2, a substrate transfer apparatus 40 according to the present embodiment, which will be described later, transports not the glass substrate G itself, but the storage box 50 storing the glass substrate G. The pair of arms 47 and 4 of the moving unit 45 provided in the separating / contacting direction provided in the substrate transfer device 40.
8 is a structure that supports the vicinity of both side edges of the bottom surface of the storage box 50. Therefore, the substrate transfer device 40 is
When receiving the storage box 50 from the unloader 4,
It is necessary to make it easier to support the vicinity of both side edges of the bottom surface of the storage box 50 by the pair of arms 47 and 48. For this reason, the loader / unloader 4 used in the present embodiment is a plate-like body
And has a structure in which the storage box 50 is placed on the plate-like body 6. Reference numeral 5a denotes a support plate for supporting the plate-like body 6 so as to be able to move back and forth, and 5b denotes the support plate 5
a rotatable shaft 5c rotatably supports a rotatable shaft 5b so as to be able to access an arbitrary cassette C, and supports the rotatable shaft 5b vertically. The main body 5 is constituted by the moving body 5c.

At the center of the coating and developing system 1,
Corridor-like transport paths 10, 11 arranged in the longitudinal direction are provided on a straight line via a transfer section 12, and on both sides of the transport paths 10, 11 each process is performed on the glass substrate G. Various processing devices are arranged.

In the illustrated coating / developing processing system 1, for example, two cleaning devices 16 for cleaning the glass substrate G by brush and high-pressure jet water are provided on one side of the transport path 10. Has been established. In addition, transport path 1
Two developing devices 17 are arranged side by side on the opposite side with respect to 0,
Two heating devices 18 are stacked next to each other.

Further, on one side of the transport path 11, an adhesion device 20 for hydrophobically treating the glass substrate G before applying a resist solution to the glass substrate G is provided. Below the adhesion device 20, a cooling device for cooling is provided. Cooling device 21
Is arranged. In addition, these adhesion devices 2
Next to the cooling device 21 and 0, two heating devices 22 are stacked in two rows. Also, the transport path 11
A resist coating device 23 that forms a resist film on the surface of the glass substrate G by applying a resist liquid to the surface of the glass substrate G is disposed on the opposite side of the substrate. Although not shown, an exposure device or the like for exposing a predetermined fine pattern to a resist film formed on the glass substrate G is provided on a side portion of the coating device 23.

The above processing units 16 to 18 and 20 to
23 is disposed on both sides of the transport paths 10 and 11 with the loading / unloading port of the glass substrate G facing inward. The first transfer device 25 is a glass substrate G between the loader / unloader unit, each of the processing devices 16 to 18 and the transfer unit 12.
Is transported on the transport path 10 in order to transport the glass substrate G in the storage box 50, and the second transport device 26 similarly accommodates the glass substrate G between the transfer unit 12 and each of the processing devices 20 to 23. It moves on the transport path 11 in order to transport in a state where it is accommodated in the box 50.

Next, a specific structure of the substrate transfer device 40 according to the present embodiment, which is employed as the first transfer device 25 and the second transfer device 26, will be described. FIG. 3 is a perspective view showing the configuration of the substrate transfer device 40, and FIG. 4 is a side view thereof.

The substrate transfer device 40 has a transfer direction moving body 41 which is movable along a Y direction (transfer direction) on a rail 35 provided along the transfer paths 10 and 11. In the present embodiment, the transporting direction moving body 41 is a rail 35.
And is moved by the drive of a drive motor (not shown) provided therein. This transport direction moving body 4
1, a motor 42 is provided.
A rotation shaft 43 is provided which is rotatable in the θ direction (horizontal direction). The rotating shaft 43 is further provided so as to move in the vertical direction (Z direction) by an elevating unit (not shown) disposed in the transporting direction moving body 41.

A support plate 44 is mounted on the upper portion of the rotating shaft 43. The support plate 44 is mounted on the support plate 44 in the X direction (as shown in FIG. 4, when the processing device 60 faces the processing device 60). (In the direction of contact and separation), and two detachment-direction moving bodies 45 and 45 are provided at different heights. Each of the two moving members 45 has a base portion 46 and a pair of arms 47 and 48 provided in front of the base portion 46. A drive member (not shown) for moving the base portion 46 back and forth is disposed in the base portion 46, and thereby, X is moved along a guide portion 44 a provided on the support plate 44. Move in the direction (separation direction).

Each of the base portions 46 is connected to a blower fan 49 as a blower mechanism.
An outlet 49a is provided on the front surface of 6. By activating the blower fan 49, air can be blown in from the rear of the storage box 50, which will be described later, and an airflow can be formed to escape to the outside through the substrate inlet 51 formed in the front surface of the storage box 50. Therefore, the substrate entrance 5
1 prevents external particles from entering the storage box 50. The storage box 50
Always sending the wind into the interior means that the storage box 50
This means that the inside is maintained at a positive pressure, and the blower fan 49 of the present embodiment also functions as a pressure control mechanism for controlling the pressure inside the storage box 50.

Each of the arms 47 and 48 has a cross section substantially L
It is formed of a character-like member, and is provided symmetrically so that the side plates 47a and 48a are located outside at a predetermined interval from each other. Each arm 47, 48
Are set to such an extent that an accommodation box 50 described later can be held on the bottom plate portions 47b and 48b.

The storage box 50 is formed in a box shape. In the present embodiment, as shown in FIG. 5, it is formed in a substantially rectangular parallelepiped shape. However, the structure is not limited to this as long as it has a size that can accommodate the glass substrate G and has a wall part that separates from the external space. Not something. When the substrate to be accommodated is a glass substrate G for LCD as in the present embodiment,
Since the glass substrate G is rectangular, the glass substrate G is formed in a rectangular shape in accordance with the rectangular shape. However, it is of course possible to adopt another shape in consideration of the shape of the substrate to be accommodated.

As shown in FIGS. 5 and 6, the storage box 50 has a board insertion / removal port 5 which is always open at the front.
The substrate support portions 54, 54, which are formed by ridges projecting inward from the side walls 53, 53, are provided at predetermined intervals from the bottom wall 52 in the inside. (See FIGS. 6 and 9). Of course, this substrate support 5
It is sufficient that the upper surface of each of the side walls 53 and 53 can support the vicinity of each side end of the glass substrate G, and it is not always necessary to provide the side walls 53 and 53 all over the depth direction. Further, instead of protruding from the side walls 53, 53, a ridge may be provided near both sides of the bottom wall 52 so as to protrude upward.

On the back side of the storage box 50, there is provided a ventilation inlet 55 for introducing the air blown by the blower fan 49 into the storage box 50. The position of the blow-in port 55 is not limited as long as it can communicate with the blower fan 49. However, if the blow-in port 55 is formed at a position facing the substrate inlet / outlet 51, the air flow can be smoothly discharged without much disturbance. Therefore, in the present embodiment, it is formed on the back surface of the storage box 50.

The ventilation inlet 55 is provided with a replaceable cartridge type filter (for example, ULPA filter) 56. That is, the moving body 4
When the storage box 50 is supported by the filter 5, the filter 56 is provided in front of the base 46 as shown in FIG. 7. By driving the blower fan 49, particles entering the storage box 50 through the blower intake 55 are thereby captured.

Next, a description will be given of a processing apparatus capable of carrying in and out the glass substrate G using the above-described substrate transfer apparatus 40. That is, in the above-described substrate transfer device 40, even if the moving member 45 in the contact / separation direction moves in the X direction,
The glass substrate G accommodated therein moves together with the accommodation box 50, and only the glass substrate G cannot move in the X direction. Therefore, like a normal processing device,
If only a processing unit such as a hot plate in a heat treatment apparatus is provided in a shutter for opening and closing the loading / unloading port of the glass substrate G, the glass substrate G is directly placed on the processing unit using the substrate transfer device 40 described above. Can't deliver.
Therefore, it is necessary to use the following processing device.

The processing apparatus 60 shown in FIG. 9 is provided between the loading / unloading port 60a of the processing apparatus 60 and the processing section 62.
And a transfer mechanism 70 for relay. The mounting table 65 is installed immediately after the loading / unloading port 60a in the processing apparatus 60, and has a size such that the storage box 50 can be mounted as it is. When the glass substrate G is directly transferred to and from the storage box 50 near the loading / unloading port 60a, the storage box 50 is connected to the loading / unloading port 6a.
If the glass substrate G is out of the storage box 50, particles may adhere to the glass substrate G if the bonding is not performed with as little gap as possible. By transferring the particles into the processing device 60, adhesion of particles to the glass substrate G during the transfer is easily prevented. However, in order to be able to carry the storage box 50 into the processing device 60, the carry-in / out port 60 a needs to be sized according to the storage box 50.

The mounting table 65 may have one stage, but may have a plurality of stages, for example, two stages. Even if a device that can hold two storage boxes 50 like the above-described substrate transfer device 40 is adopted, if the mounting table 65 is a single stage, the storage box 5
0 must be passed alternately, but in the case of two stages, 2
One storage box 50 can be delivered at a time.
In this case, the glass substrate G can be transferred to the two storage boxes 50 together, and on the other hand, for example, the glass substrate G
Can be delivered without containing. In the latter case, the processing unit 6 is controlled by the relay transport mechanism 70 described later.
It is possible to adopt a processing procedure such as storing the processed glass substrate G in the upper storage box 50 in step 2, receiving the glass substrate G to be processed next from the lower storage box 50, and transferring it to the processing unit 62. Become.

The mounting table 65 is similar to that shown in FIGS.
As shown in FIG. 7, the glass substrate G is rotatably provided on the rotating shaft 66, and the glass substrate G is transferred between the direction in which the storage box 50 is transferred to and from the substrate transfer device 40 and the transfer device 70 for relay. Can be adjusted in the direction of the delivery. Reference numeral 67 shown in FIG. 8 is a connection frame that holds and connects the space between the two mounting tables 65.

The relay transport mechanism 70 is provided on a moving body 71 movable on a rail 75 laid between the mounting table 65 and the processing section 62 in the processing apparatus 60, and provided on the moving body 71. A rotary shaft 72 rotatable in the horizontal direction and movable up and down, a support plate 73 provided on the rotary shaft 72, and a tweezers shape provided along the support plate 73 so as to be movable in the front-rear direction. And a delivery member 74 of the above.

That is, the storage box 5 is placed on the mounting table 65.
0, the relay transport mechanism 70 is moved closer to the mounting table 65 in the processing apparatus 60, or is set in standby at this position in advance, and then the transfer member 74 is moved along the support plate 73. To be inserted into the housing box 50 through the board insertion / removal port 51. Then, after the rotating shaft 72 is lifted and the glass substrate G is scooped from the substrate support portions 54 and 54 of the storage box 50, the transfer member 74 is retracted, and the front end of the transfer member 74 is processed in the storage device 60 by the processing unit. The rotating shaft 72 is rotated so as to face the processing unit, and the moving body 71 approaches the processing unit.
Is transferred to a spin chuck or the like that constitutes the processing unit 62 by advancing.

The relay transport mechanism 70 includes:
A transfer member 74 having two stages at different heights can be used. In this case, one transfer member 74 is used as a dedicated member for placing an unprocessed glass substrate G to be transferred from the storage box 50 to the processing unit, and the other transfer member 74 is reversely stored from the processing unit. It can be used as a dedicated member for placing the processed glass substrate G on the box 50. Thereby, for example, in the heating device, since the unprocessed low-temperature substrate and the processed high-temperature substrate can be held by the dedicated transfer members, respectively, compared with the case where any transfer is performed by one transfer member, An adverse effect on the glass substrate G due to heat or the like stored in the transfer member can be reduced.

Next, the operation of the substrate transfer device 40 and the processing device 60 according to the present embodiment will be described. First, the substrate transfer device 40 moves along the transfer path 10 by driving the transfer direction moving body 41, approaches the loader / unloader 4, and
The storage box 50 held by the loader / unloader 4 is received on the arms 47 and 48 of the moving body 45 in a direction in which the substrate loading / unloading port 51 is forward. At this time, the moving unit 45 is moved back and forth as necessary and received from the loader / unloader 4. However, only the loader / unloader 4 is operated to place the moving unit 45 on the moving unit 45. Good. The storage box 50 delivered here is, as described above, the substrate support portion 54,
It is assumed that the glass substrate G is held and accommodated on 54.

The storage box 50 is provided with a moving body 45
When placed on the upper side, the filter 56 arranged on the back communicates with the outlet 49 a of the base 46. Then, the air is blown into the storage box 50 via the filter 56 by the driving of the blower fan 49. At this time, the filter 5
Due to 6, the particles are trapped by the blower fan 49 even if the particles try to enter. The wind sent into the storage box 50 forms an airflow flowing from the substrate inlet / outlet 51 provided on the front surface to the outside, and keeps the inside of the storage box 50 at a positive pressure. Therefore, during the transportation of the glass substrate G, particles do not enter from the substrate entrance 51.

When receiving the storage box 50, the substrate transfer device 40 moves in the Y direction by driving the transfer direction moving body 41 to a position near the target processing device 60. Next, the rotating shaft 43 is rotated in the direction of the predetermined angle θ by the motor 42 so that the substrate loading / unloading port 51 located on the front on the arms 47 and 48 faces the processing apparatus 60, and the rotating shaft 43 is moved up and down. It is operated in the direction (Z direction) to face the shutter of the storage device 60.

In this state, the shutter is opened,
The moving body 45 in the separation / contact direction of the substrate transfer device 40 is transferred to the loading / unloading
The storage box 50 is placed on the mounting table 65 by moving forward through the processing device 60 to the inside of the processing apparatus 60 (see FIGS. 8 and 9). When the storage box 50 is placed on the mounting table 65, the moving body 45 moves away from the loading / unloading port 60a to the outside of the processing device 60. And the processing device 60
Shutter is closed. In this case, as described above, in the case where there are two moving members 45 in the direction of contact and separation, and the storage box 50 is placed on each of them, as shown in FIG. The moving bodies 45 can be operated together so that the moving bodies 45 can be transferred to the mounting table 65 provided in two stages in one operation.

When the storage box 50 is mounted on the mounting table 65, the transfer mechanism 70 for relay provided in the processing device 60 is moved to the vicinity of the mounting table 65, or is set in a standby state at this position in advance. In advance, the operation of the rotating shaft 66 of the mounting table 65 causes the substrate loading / unloading port 51 of the storage box 50 to face the transfer mechanism 70 for relay. Then, the transfer member 74 of the relay transport mechanism 70 is advanced along the support plate 73, and is inserted into the lower side of the glass substrate G held in the storage box 50 through the substrate inlet 51 (see FIG. 9). ). Next, the rotating shaft 72 is raised to scoop up the glass substrate G, and the transfer member 74 is retracted. As shown by the imaginary line in FIG. The rotating shaft 72 is rotated so as to face the processing unit 62, and further the moving body 71 approaches the processing unit 62, and then the transfer member 74 is advanced and transferred to the processing unit.

When the predetermined processing is completed in the processing section 62, the transfer mechanism 70 for relay
, And moves toward the mounting table 65. The transfer member 74 of the relay transport mechanism 70 is inserted into the storage box 50 waiting on the mounting table 65, and the processed glass substrate G is mounted on the substrate supporting portions 54, 54.

Next, the shutter of the processing device 60 is opened,
Again, the moving body 45 in the separation / contact direction of the substrate transfer device 40 is inserted through the loading / unloading port 60a, and the mounting table 65 holds the storage box 50 that stores the processed glass substrate G and retreats. When the moving unit 45 moves backward, the filter 56 of the storage box 50 approaches the outlet 49a formed in the base 46 and communicates again.
As a result, air is blown from the rear of the storage box 50 toward the substrate loading / unloading port 51, the inside of the storage box 50 becomes a positive pressure atmosphere, and the substrate loading / unloading port 5 which is always open is provided.
The substrate transport device 40 transports the glass substrate G toward the next processing device while preventing intrusion of particles from the first substrate.

In the above description, the mounting table 65 is arranged in the processing device 60 and the entire storage box 50 is transported into the processing device 60. The movement may be such that the substrate loading / unloading port 51 of the storage box 50 extends to the loading / unloading port 60 a of the storage device 60, while the mounting table 65 is not provided in the storage device 60. However, in this case, the storage box 50
Substrate loading / unloading port 51 and processing apparatus 60 loading / unloading port 60a
The size of the carry-in / out port 60a is formed so as to prevent the intrusion of particles when they are connected to each other so that they are as close as possible to each other.

Further, the glass substrate G
A monitor for detecting the static electricity can be installed, and a static eliminator can be provided (not shown). Since the glass substrate G is housed in the space defined as the housing box 50, the static electricity can be efficiently removed. Further, the substrate transfer device 40 and the storage device 6
During the transfer of the storage box 50 to 0, control is performed such that the drive of the blower fan 49 is weakened so that particles around the substrate transfer device 40 are not sent into the storage device 60 by the blower fan 49. You can also.

Next, another embodiment of the present invention will be described.

In this embodiment, the present invention is applied to a stocker (storage device) for storing substrates.

As shown in FIG. 10, a large number of storage boxes 50 shown in FIG. 5 are stored in the stocker 100 vertically and horizontally. In the vicinity of the stocker 100, for example, a processing system 101 for applying and developing a resist is disposed, and a transfer robot 102 transfers the storage box 50 between the stocker 100 and the processing system 101.

The stocker 100 has a storage box 50
Are provided vertically and horizontally. At the lower part of each shelf 103, at least three or more holding pins 104 for holding and holding the storage box 50 are provided. On the back of each shelf 103, an exhaust port 105 to which the substrate loading / unloading port 51 of the storage box 50 is connected is provided. Each exhaust port 105 is connected to an exhaust passage 106 provided behind it. Therefore, when the storage box 50 is placed on the shelf 103 of the stocker 100, the substrate loading / unloading port 51 of the storage box 50 is connected to the exhaust port 105, and the atmosphere in the storage box 50 passes through the exhaust port 105 and the exhaust path 106. And the storage box 50
Inside, clean air is introduced from a ventilation inlet 55 via a filter 56. Thereby, the storage box 50
The inside is kept in a clean atmosphere without particles.

The processing system 101 is provided with a mounting table 111 on which the storage box 50 is mounted, for example.
The glass substrate G in the storage box 50 mounted on the mounting table 111 is carried out by a transfer device (not shown) provided in the processing system 101 and is loaded into the processing device 101. And the processing apparatus 101
The storage box 50 in which the glass substrate G whose processing has been completed is mounted on the mounting table 111 by a transfer device (not shown).
It is to be carried inside.

The transfer robot 102 is, for example, the transfer vehicle 12
1, a box transport mechanism 122 having substantially the same configuration as the substrate transport device 40 shown in FIG. The box transport mechanism 122 rotates, for example, the storage box 50 in the θ direction, and moves back and forth.

According to the present embodiment, the transfer of the glass substrate G between the stocker 100 and the processing system 101 can be performed in a clean state without depending on the cleanness of a clean room, for example. Further, the glass substrate G can be stocked in the stocker 100 in the same state.

Next, still another embodiment of the present invention will be described.

In the embodiment shown in FIG. 10, in the processing system 101, the processing is performed while the substrate G is directly transported without storing the substrate G in the storage box 50. In the first embodiment, not only the stocking of the substrate by the stocker but also the transport of the substrate in the processing system is performed using the storage box 50.

That is, as shown in FIG. 11, a large number of storage boxes 50 shown in FIG. In the vicinity of the stocker 200, for example, a processing system 20 for applying and developing a resist
1 is disposed, and the transfer robot 202 is
The storage box 50 is transferred between the storage box 50 and the processing system 201.

The storage box 50 is provided in the stocker 200.
Are provided vertically and horizontally. At the lower part of each shelf 203, at least three or more holding pins 204 for holding and holding the storage box 50 are provided. On the back of each shelf 203, an air outlet 205 to which the air inlet 55 of the storage box 50 is connected is provided. Each blow port 205 is provided with a blow path 2
06. Therefore, when the storage box 50 is placed on the shelf 203 of the stocker 200, the air intake 55 of the storage box 50 is connected to the air outlet 205, and the air blown from the air outlet 205 is, for example, purified air or nitrogen gas. Is introduced into the storage box 50 from the air inlet 55 and discharged from the substrate inlet 51. Thereby, the inside of the storage box 50 is maintained in a clean atmosphere without particles.

The processing system 201 is provided with a mounting table 211 on which the storage box 50 is mounted, for example.
The storage box 50 mounted on the mounting table 211 is carried out by a transfer device (not shown) provided in the processing system 201 and is loaded into the processing system 201. The accommodation box 50 accommodating the glass substrate G that has been processed in the inside 201 is placed on the placement table 211 by a transfer device (not shown).

The transfer robot 202 is, for example, the transfer vehicle 22
1, a box transport mechanism 222 is provided.
The box transport mechanism 222 includes, for example, a transport table 223 having a mechanism for rotating the storage box 50 in the θ direction and moving it forward and backward. Behind the carriage 223,
A plate-like lid 224 is provided. The cover 224 is for closing the substrate entrance 55 of the storage box 50 placed on the transfer table 223. By providing the cover 224, the transfer robot 202 transfers the storage box 50 inside the storage box 50. Particles can be prevented from entering.

Also in this embodiment, the stocker 200
The transfer of the glass substrate G between the substrate and the processing system 201 can be performed in a clean state without depending on, for example, the cleanness of a clean room. Further, the glass substrate G can be stocked in the stocker 100 in the same state, and the glass substrate G can be transported in the processing system 201 in the same state.

In this embodiment, the storage box can be modified as follows.

For example, as shown in FIG. 12, a first air outlet 232 is provided on the back surface of the housing box 231, and a second air outlet 233 is provided on the lower part behind the housing box 231. Further, the first and second door portions 23 each having an opening / closing inward and an elastic force applied in a direction to close each of the blowing ports 232 and 233 are respectively provided to the blowing ports 232 and 233.
4, 235 are provided.

At a predetermined position on the mounting table 211 of the processing system 201, as shown in FIG.
Push-up pin 2 that pushes up second door portion 235
36, and a fan 237 for supplying clean air to the second air outlet 233 opened by the push-up pin 236.

The transfer device 21 of the processing system 201
2, as shown in FIG.
Push-up pin 2 for pushing up first door portion 234
38, and a fan 239 for supplying clean air to the first air outlet 232 opened by the push-up pin 238.

According to such a configuration, the storage box 2
31 is mounted on the mounting table 211, the second
Clean air is supplied into the storage box 231 through the blower port 233, and when the storage box 231 is being conveyed by the transfer device, the clean air is supplied into the storage box 231 through the first blower port 232. You. Therefore, in the processing system 201, the glass substrate G can be transported and processed in a clean state without depending on, for example, the cleanness of the clean room. It should be noted that the same effect can be obtained by adopting the same configuration in the processing unit that processes the glass substrate G and the interface unit that transfers the glass substrate G to and from the exposure apparatus.

Next, another example of the storage box according to the present invention will be described.

In this example, as shown in FIG. 15, an exhaust fan 240 for exhausting the atmosphere in the storage box 50 is provided at a lower portion of the storage box 50 near the substrate loading / unloading port 51.
Is provided. As a result, the substrate entrance 51
Air is less likely to be blown out of the glass substrate G
Does not blow out the contaminated air from the storage box 50 side when transferring to a predetermined device.

Note that, as shown in FIG.
When 1 has two upper and lower hands 252 and 253, the upper hand 252 conveys the storage box 50 provided with the exhaust fan 240 that discharges air upward, and the lower hand 253 moves downward. If the storage box 50 provided with the exhaust fan 240 that discharges the air is transported, the exhaust of the upper and lower storage boxes 50 on the transfer device 251 does not interfere with each other.

FIG. 17 is a view showing still another example of the storage box.

As shown in FIG. 17, this storage box 2
61 is provided with a substrate loading / unloading port 263 on the front surface of a main body 262 for housing a substrate. On the back side of the main body 262, a fan unit 265 is provided via a filter unit 264. The filter unit 264 includes, for example, HEPA (ULP
A) A filter is installed.

The fan unit 265 has a fan 2 for blowing air into the main body 262 through the filter unit 264.
66, a battery 267 for supplying power to the fan 266, and a control unit 268 for controlling driving of the fan 266.
Are provided. Battery 267 has an external terminal 2
The battery is charged through 70.

Then, the control unit 268, for example,
For example, based on the detection result of the wind speed by the wind speed sensor 269 provided near the board entrance 263 in the main body 2,
The drive of the fan 266 is controlled so that the wind speed in 62 becomes a desired value. The control unit 268 also compares the detection result of the wind speed with the rotation speed of the fan 266,
Is determined, and an alarm is output, for example.

For example, a communication port 271 is provided at a predetermined position of the fan unit 266, and the control unit 26
Reference numeral 8 indicates that data is exchanged with an external computer or the like via the communication port 271. Such data includes, for example, the output of the alarm data and the setting of the wind speed from the outside.

The substrate to be transferred by the substrate transfer apparatus of the present invention is not limited to the glass substrate G for LCD described above, but the present invention can naturally be applied to substrates such as semiconductor wafers. Furthermore, the combination of the processing apparatuses of the coating / developing processing system described above is merely an example, and the present invention is naturally effective in a line in which CVD, asher, etcher, and the like are arranged.

[0070]

As described above, the substrate transfer apparatus of the present invention supports a substrate to be processed in a box-shaped storage box, and uses a pressure control mechanism to control the inside of the storage box. Are maintained at positive pressure. Therefore, even if the substrate entrance is always open, particles floating outside the storage box do not enter the storage box. Therefore, it is not necessary to set the substrate transfer area in a clean environment, and the cost for forming the clean environment can be significantly reduced. Further, since the substrate entrance is always open and no opening / closing mechanism for opening / closing the substrate entrance is provided, the substrate can be transferred quickly.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an embodiment of a processing system of the present invention.

FIG. 2 is a diagram for explaining a configuration of a loader / unloader used in the embodiment.

FIG. 3 is a perspective view showing an embodiment of the substrate transfer device of the present invention.

FIG. 4 is a side view showing the substrate transfer device according to the embodiment.

FIG. 5 is a perspective view showing a storage box used in the embodiment.

FIG. 6 is a sectional view taken along line AA of FIG. 5;

FIG. 7 is a diagram schematically illustrating a positional relationship when a storage box is placed on the substrate transfer device.

FIG. 8 is a schematic diagram for explaining a process of transferring a storage box from the substrate transfer device to the mounting table.

FIG. 9 is a diagram schematically showing an embodiment of the processing apparatus of the present invention.

FIG. 10 is a side view of a stocker according to another embodiment of the present invention.

FIG. 11 is a side view of a stocker according to still another embodiment of the present invention.

FIG. 12 is a view showing another example of the storage box according to the present invention.

FIG. 13 is an explanatory view (1) of the storage box shown in FIG. 12;

FIG. 14 is an explanatory view (part 2) of the storage box shown in FIG. 12;

FIG. 15 is a view showing still another example of the storage box according to the present invention.

FIG. 16 is a view showing a modified use example of the storage box shown in FIG. 15;

FIG. 17 is a view showing another example of the storage box according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 1st conveyance path 11 2nd conveyance path 40 Substrate transfer apparatus 41 Transfer direction moving body 43 Rotating axis 45 Separation direction moving body 49 Blower fan 50 Storage box 51 Substrate entrance 54 Substrate support part 60 Processing device 60a Loading / unloading port 62 processing unit 65 mounting table 70 relay transport mechanism 74 delivery member G glass substrate

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Shinichiro Araki Otsu-cho, Kikuchi-gun, Kumamoto Pref. Tokyo Electron Kyushu Co., Ltd., Otsu Office, Heisei 272, Tokyo Electron Kyushu Co., Ltd. Haruo Kumamoto Prefecture Kikuchi-gun Otsu-cho Oaza Takaono character Heisei 272-4 Tokyo Electron Kyushu Co., Ltd. Otsu office

Claims (19)

[Claims] A transfer direction movable body that can move along a transfer path; and a transfer direction movable body that is supported via a rotation shaft that is rotatable in a horizontal direction and faces a loading / unloading port of each processing apparatus. A substrate support portion that is movable in a direction in which the substrate approaches and leaves the loading / unloading port, and that supports a substrate to be processed therein; a substrate loading / unloading port that is always open for loading / unloading the substrate; And a pressure control mechanism for maintaining a positive pressure in the box-shaped housing box. 2. A moving body in a conveying direction movable along a conveying path, and supported by a rotating shaft rotatable in a horizontal direction with respect to the moving body in the conveying direction, facing a loading / unloading port of each processing apparatus. In a posture, it is movable in a direction of coming and going to the loading / unloading port, and a substrate supporting portion for supporting a substrate to be processed therein, and a substrate loading / unloading port which is always open for loading / unloading the substrate; A separating / moving member capable of supporting a box-shaped housing box having a blower mechanism for forming an airflow flowing from the side opposite to the substrate inlet / outlet through the substrate inlet / outlet. A substrate transfer device characterized by the above-mentioned. 3. The substrate transfer apparatus according to claim 1, wherein a plurality of said moving members in the contact / separation direction are provided at intervals vertically, and each of them can support said storage box. Substrate transfer device. 4. A size capable of carrying in and out a box-shaped storage box having a substrate supporting portion for supporting a substrate to be processed therein and a substrate opening / closing opening which is always open for taking the substrate in and out. A loading / unloading port formed between the loading / unloading port and the processing unit; and a mounting table of the storage box disposed between the loading / unloading port and the processing unit; and a mounting table disposed between the mounting table and the processing unit, and mounted on the mounting table. A transfer member for transferring the substrate received from the storage box to the processing unit, and transferring the substrate received from the processing unit to the storage box. A processing device comprising a mechanism. 5. The processing apparatus according to claim 4, wherein a plurality of the mounting tables are provided at different heights in the vertical direction, and a transfer member of the relay transport mechanism is different in the vertical direction corresponding to the mounting tables. A processing device, wherein a plurality of processing devices are provided at different heights. 6. A substrate to be processed is supported inside,
A substrate transfer member provided so as to be detachable from a storage box of a substrate transfer device in which a substrate opening and closing opening which is always open is positioned so as to be in close contact with a loading / unloading opening, and received from the storage box. Transfer the substrate to the processing unit,
A processing apparatus, wherein a relay transport mechanism for transferring a substrate received from a processing unit to the storage box is provided therein. 7. The processing apparatus according to claim 6, wherein the relay transfer mechanism receives an unprocessed substrate from a storage box of the substrate transfer apparatus and transfers the unprocessed substrate to a processing unit. And a transfer member for a processed substrate which receives a processed substrate in a processing unit and transfers the processed substrate to a storage box of a substrate transfer device. 8. A substrate that performs a predetermined process on a substrate while transferring the substrate to and from a plurality of processing devices disposed near the transport path by a substrate transport device that travels along the transport path. A processing system, which can be placed on the substrate transfer device, and a substrate support portion for supporting a substrate to be processed therein, and a substrate opening and closing port that is always open for loading and unloading the substrate, A substrate processing system comprising a box-shaped storage box provided with a pressure control mechanism for keeping the inside at a positive pressure. 9. A substrate that performs a predetermined process on a substrate while transferring the substrate to and from a plurality of processing apparatuses disposed near the transport path by a substrate transport device that travels along the transport path. A processing system, which can be placed on the substrate transfer device, and a substrate support portion for supporting a substrate to be processed therein, and a substrate opening and closing port that is always open for loading and unloading the substrate, A substrate processing system, comprising: a box-shaped storage box provided with a blower mechanism for forming an airflow flowing from the surface opposite to the substrate inlet / outlet through the substrate inlet / outlet. . 10. A substrate transfer method for transferring a substrate to and from a processing device disposed near the transfer path by a substrate transfer apparatus traveling along a transfer path, the method comprising: A substrate transfer characterized in that it is accommodated and transported in a box-shaped accommodation box provided with a substrate inlet / outlet which is always open and a pressure control mechanism for keeping the inside at a positive pressure for carrying in / out. Method. 11. A substrate transfer method for transferring a substrate to and from a processing device disposed near the transfer path by a substrate transfer apparatus traveling along the transfer path, the method comprising: A box-shaped housing including a substrate opening and closing port that is always open for loading and unloading, and a blowing mechanism that forms an airflow that flows to the outside through the substrate opening and closing from a surface opposite to the surface on which the substrate opening and closing is formed. A method of transporting a substrate, wherein the substrate is transported in a box. 12. A storage device which is provided with a substrate loading / unloading port for loading and unloading a substrate and an outside air introduction port for introducing outside air through a filter, and stores a storage box for storing a substrate therein. A shelf in which the storage box is stored so as to be in contact with the back surface, and a gas in the storage box is provided through the substrate inlet / outlet of the storage box provided in the back surface of the storage box provided in the shelf portion. A storage device, comprising: a discharge unit that discharges. 13. A substrate loading / unloading port for loading and unloading a substrate is provided on a front surface, an outside air introduction port for introducing outside air through a filter is provided on a back surface, and a housing box for housing a substrate is housed therein. In the storage device, a shelf in which the storage box is stored such that the outside air introduction port is in contact with the back surface, and provided on the back surface of the shelf portion, through the outside air introduction port of the storage box housed in the shelf portion. And a supply unit for supplying the gas in the storage box. 14. An accommodation box for accommodating substrates, wherein a substrate entrance for taking in / out the substrates is provided on a front surface, and an outside air introduction port for introducing outside air through a filter is provided on a rear surface. And containing box. 15. The storage box according to claim 14, further comprising another outside air introduction port for introducing outside air through a filter at a lower portion or an upper portion on the back side, and opening and closing the two outside air introduction ports. A storage box having a free door portion. 16. The storage box according to claim 14, wherein an exhaust fan is provided at a lower portion near the substrate loading / unloading port to exhaust an atmosphere in the storage box. 17. The storage box according to claim 14, wherein a fan for blowing air into the storage box through the filter is provided at the outside air inlet. . 18. The storage box according to claim 17, wherein a wind speed sensor is disposed near the substrate entrance, and the driving of the fan is controlled based on the wind speed detected by the wind speed sensor. Storage box. 19. The storage box according to claim 17, wherein a wind speed sensor is arranged near the substrate entrance, and deterioration of the fan is determined based on a wind speed detected by the wind speed sensor. Storage box.