CN1990917A - 一种清除直拉硅单晶炉内SiO的方法及装置 - Google Patents
一种清除直拉硅单晶炉内SiO的方法及装置 Download PDFInfo
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- CN1990917A CN1990917A CNA2005101325745A CN200510132574A CN1990917A CN 1990917 A CN1990917 A CN 1990917A CN A2005101325745 A CNA2005101325745 A CN A2005101325745A CN 200510132574 A CN200510132574 A CN 200510132574A CN 1990917 A CN1990917 A CN 1990917A
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- single crystal
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- pulling silicon
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CNB2005101325745A CN100415944C (zh) | 2005-12-26 | 2005-12-26 | 一种清除直拉硅单晶炉内SiO的方法及装置 |
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102251274A (zh) * | 2011-07-15 | 2011-11-23 | 浙江荣马电子科技有限公司 | 一种单晶炉抽气孔堵塞的处理方法 |
CN101717991B (zh) * | 2009-12-14 | 2012-02-29 | 晶龙实业集团有限公司 | 改进的直拉硅单晶炉 |
CN105879656A (zh) * | 2015-11-24 | 2016-08-24 | 上海超硅半导体有限公司 | 单晶硅生长尾气固相处理技术 |
CN106838540A (zh) * | 2017-03-29 | 2017-06-13 | 天通吉成机器技术有限公司 | 一种单晶炉真空管道清理装置 |
CN106914460A (zh) * | 2017-03-29 | 2017-07-04 | 天通吉成机器技术有限公司 | 一种单晶炉真空管道清理方法 |
CN107923068A (zh) * | 2015-07-02 | 2018-04-17 | 胜高股份有限公司 | 单晶硅提拉装置内的部件的再生方法 |
CN110714222A (zh) * | 2019-11-06 | 2020-01-21 | 西安奕斯伟硅片技术有限公司 | 流量可控的侧排气装置及具有该装置的拉晶炉 |
CN111172598A (zh) * | 2020-01-10 | 2020-05-19 | 郑州合晶硅材料有限公司 | 掺磷单晶硅生产中防尘爆的抽真空方法及应用其的掺磷单晶硅生产方法 |
CN111690984A (zh) * | 2019-03-15 | 2020-09-22 | 林顿晶体技术公司 | 主动清洁真空系统和方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1186974A (zh) * | 1996-09-09 | 1998-07-08 | Memc电子材料有限公司 | 直拉生长单晶硅期间实时监测和控制氧的一氧化硅探针 |
US6039801A (en) * | 1998-10-07 | 2000-03-21 | Memc Electronic Materials, Inc. | Continuous oxidation process for crystal pulling apparatus |
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2005
- 2005-12-26 CN CNB2005101325745A patent/CN100415944C/zh active Active
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101717991B (zh) * | 2009-12-14 | 2012-02-29 | 晶龙实业集团有限公司 | 改进的直拉硅单晶炉 |
CN102251274A (zh) * | 2011-07-15 | 2011-11-23 | 浙江荣马电子科技有限公司 | 一种单晶炉抽气孔堵塞的处理方法 |
CN107923068A (zh) * | 2015-07-02 | 2018-04-17 | 胜高股份有限公司 | 单晶硅提拉装置内的部件的再生方法 |
CN105879656A (zh) * | 2015-11-24 | 2016-08-24 | 上海超硅半导体有限公司 | 单晶硅生长尾气固相处理技术 |
CN105879656B (zh) * | 2015-11-24 | 2020-01-07 | 上海超硅半导体有限公司 | 单晶硅生长尾气固相处理技术 |
CN106838540A (zh) * | 2017-03-29 | 2017-06-13 | 天通吉成机器技术有限公司 | 一种单晶炉真空管道清理装置 |
CN106914460A (zh) * | 2017-03-29 | 2017-07-04 | 天通吉成机器技术有限公司 | 一种单晶炉真空管道清理方法 |
CN106838540B (zh) * | 2017-03-29 | 2019-09-24 | 天通吉成机器技术有限公司 | 一种单晶炉真空管道清理装置 |
CN111690984A (zh) * | 2019-03-15 | 2020-09-22 | 林顿晶体技术公司 | 主动清洁真空系统和方法 |
CN110714222A (zh) * | 2019-11-06 | 2020-01-21 | 西安奕斯伟硅片技术有限公司 | 流量可控的侧排气装置及具有该装置的拉晶炉 |
CN111172598A (zh) * | 2020-01-10 | 2020-05-19 | 郑州合晶硅材料有限公司 | 掺磷单晶硅生产中防尘爆的抽真空方法及应用其的掺磷单晶硅生产方法 |
WO2021139228A1 (zh) * | 2020-01-10 | 2021-07-15 | 郑州合晶硅材料有限公司 | 掺磷单晶硅生产中防尘爆的抽真空方法及应用其的掺磷单晶硅生产方法 |
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CN100415944C (zh) | 2008-09-03 |
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Assignee: Guotai Semiconductor Materials Co., Ltd. Assignor: General Research Institute for Nonferrous Metals|GRINM Semiconductor Materials Co., Ltd. Contract fulfillment period: 2009.8.13 to 2015.8.13 Contract record no.: 2009990000923 Denomination of invention: Method and apparatus of clearing SiO in straight pulling silicon single crystal furnace Granted publication date: 20080903 License type: Exclusive license Record date: 20090817 |
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Address after: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee after: Youyan semiconductor silicon materials Co.,Ltd. Address before: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee before: GRINM SEMICONDUCTOR MATERIALS Co.,Ltd. |
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