CN1974459A - 溶剂回收系统 - Google Patents
溶剂回收系统 Download PDFInfo
- Publication number
- CN1974459A CN1974459A CNA2006101459778A CN200610145977A CN1974459A CN 1974459 A CN1974459 A CN 1974459A CN A2006101459778 A CNA2006101459778 A CN A2006101459778A CN 200610145977 A CN200610145977 A CN 200610145977A CN 1974459 A CN1974459 A CN 1974459A
- Authority
- CN
- China
- Prior art keywords
- solvent
- liquid
- collection device
- liquefaction
- mentioned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (3)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005-346376 | 2005-11-30 | ||
JP2005346376 | 2005-11-30 | ||
JP2005346376A JP4901200B2 (ja) | 2005-11-30 | 2005-11-30 | 溶剤回収システム |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1974459A true CN1974459A (zh) | 2007-06-06 |
CN1974459B CN1974459B (zh) | 2011-01-19 |
Family
ID=38124854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006101459778A Active CN1974459B (zh) | 2005-11-30 | 2006-11-28 | 溶剂回收系统 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4901200B2 (zh) |
KR (1) | KR100826772B1 (zh) |
CN (1) | CN1974459B (zh) |
TW (1) | TW200723357A (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103406233A (zh) * | 2013-08-26 | 2013-11-27 | 深圳市华星光电技术有限公司 | 一种面板涂胶装置 |
CN108692526A (zh) * | 2018-05-22 | 2018-10-23 | 深圳市华星光电半导体显示技术有限公司 | 真空干燥及溶剂回收装置 |
CN116392830A (zh) * | 2023-04-11 | 2023-07-07 | 常州市范群干燥设备有限公司 | 一种干燥设备 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4982306B2 (ja) * | 2007-09-05 | 2012-07-25 | 大日本スクリーン製造株式会社 | 塗布装置および塗布方法 |
CN102181070B (zh) * | 2011-03-25 | 2012-10-10 | 泰安赛露纤维素醚科技有限公司 | 纤维素醚生产溶剂循环蒸发工艺 |
JP5293790B2 (ja) * | 2011-09-22 | 2013-09-18 | 東京エレクトロン株式会社 | 液処理装置、液処理方法及び記憶媒体 |
JP5871646B2 (ja) * | 2012-02-13 | 2016-03-01 | 東レエンジニアリング株式会社 | 減圧乾燥装置および減圧乾燥方法 |
CN110843354A (zh) * | 2019-10-21 | 2020-02-28 | 深圳市华星光电技术有限公司 | 真空干燥装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3408895B2 (ja) * | 1995-06-16 | 2003-05-19 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP2002038272A (ja) * | 2000-07-25 | 2002-02-06 | Hitachi Kokusai Electric Inc | 基板処理装置 |
EP1293589A3 (en) * | 2001-09-17 | 2004-10-13 | Nissan Motor Company, Limited | Apparatus for pretreatment prior to painting |
KR20030062143A (ko) * | 2002-01-16 | 2003-07-23 | 삼성전자주식회사 | 피처리물의 처리 방법 및 장치 |
JP3859211B2 (ja) * | 2002-05-28 | 2006-12-20 | 東京エレクトロン株式会社 | 捕集装置、捕集方法及び減圧処理装置 |
JP3877719B2 (ja) * | 2002-11-07 | 2007-02-07 | 東京応化工業株式会社 | スリットコータの予備吐出装置 |
-
2005
- 2005-11-30 JP JP2005346376A patent/JP4901200B2/ja active Active
-
2006
- 2006-10-24 TW TW095139220A patent/TW200723357A/zh unknown
- 2006-11-02 KR KR1020060107691A patent/KR100826772B1/ko active IP Right Grant
- 2006-11-28 CN CN2006101459778A patent/CN1974459B/zh active Active
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103406233A (zh) * | 2013-08-26 | 2013-11-27 | 深圳市华星光电技术有限公司 | 一种面板涂胶装置 |
CN103406233B (zh) * | 2013-08-26 | 2015-11-25 | 深圳市华星光电技术有限公司 | 一种面板涂胶装置 |
CN108692526A (zh) * | 2018-05-22 | 2018-10-23 | 深圳市华星光电半导体显示技术有限公司 | 真空干燥及溶剂回收装置 |
WO2019223197A1 (zh) * | 2018-05-22 | 2019-11-28 | 深圳市华星光电半导体显示技术有限公司 | 真空干燥及溶剂回收装置 |
US11033850B2 (en) | 2018-05-22 | 2021-06-15 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Vacuum drying and solvent recovery device |
CN116392830A (zh) * | 2023-04-11 | 2023-07-07 | 常州市范群干燥设备有限公司 | 一种干燥设备 |
CN116392830B (zh) * | 2023-04-11 | 2024-01-05 | 常州市范群干燥设备有限公司 | 一种干燥设备 |
Also Published As
Publication number | Publication date |
---|---|
JP4901200B2 (ja) | 2012-03-21 |
JP2007152146A (ja) | 2007-06-21 |
TWI328830B (zh) | 2010-08-11 |
KR20070056939A (ko) | 2007-06-04 |
KR100826772B1 (ko) | 2008-04-30 |
TW200723357A (en) | 2007-06-16 |
CN1974459B (zh) | 2011-01-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230531 Address after: Kanagawa, Japan Patentee after: Process Equipment Business Division Preparation Co.,Ltd. Address before: Kanagawa Patentee before: TOKYO OHKA KOGYO Co.,Ltd. Effective date of registration: 20230531 Address after: Ibaraki Patentee after: Ameco Technology Co.,Ltd. Address before: Kanagawa, Japan Patentee before: Process Equipment Business Division Preparation Co.,Ltd. |