CN1966636B - 清洗液组合物 - Google Patents

清洗液组合物 Download PDF

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Publication number
CN1966636B
CN1966636B CN2005101103608A CN200510110360A CN1966636B CN 1966636 B CN1966636 B CN 1966636B CN 2005101103608 A CN2005101103608 A CN 2005101103608A CN 200510110360 A CN200510110360 A CN 200510110360A CN 1966636 B CN1966636 B CN 1966636B
Authority
CN
China
Prior art keywords
concentration
cleaning liquid
liquid composition
ammonium
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2005101103608A
Other languages
English (en)
Chinese (zh)
Other versions
CN1966636A (zh
Inventor
张忠心
尹建营
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Anji Microelectronics Shanghai Co Ltd
Anji Microelectronics Co Ltd
Original Assignee
Anji Microelectronics Shanghai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anji Microelectronics Shanghai Co Ltd filed Critical Anji Microelectronics Shanghai Co Ltd
Priority to CN2005101103608A priority Critical patent/CN1966636B/zh
Priority to PCT/CN2006/002621 priority patent/WO2007056919A1/fr
Publication of CN1966636A publication Critical patent/CN1966636A/zh
Application granted granted Critical
Publication of CN1966636B publication Critical patent/CN1966636B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/20—Industrial or commercial equipment, e.g. reactors, tubes or engines

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CN2005101103608A 2005-11-15 2005-11-15 清洗液组合物 Expired - Fee Related CN1966636B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2005101103608A CN1966636B (zh) 2005-11-15 2005-11-15 清洗液组合物
PCT/CN2006/002621 WO2007056919A1 (fr) 2005-11-15 2006-10-08 Composition detergente aqueuse

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2005101103608A CN1966636B (zh) 2005-11-15 2005-11-15 清洗液组合物

Publications (2)

Publication Number Publication Date
CN1966636A CN1966636A (zh) 2007-05-23
CN1966636B true CN1966636B (zh) 2011-08-03

Family

ID=38048280

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005101103608A Expired - Fee Related CN1966636B (zh) 2005-11-15 2005-11-15 清洗液组合物

Country Status (2)

Country Link
CN (1) CN1966636B (fr)
WO (1) WO2007056919A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109294152A (zh) * 2018-09-05 2019-02-01 浙江畅通科技有限公司 一种高强度耐热铅酸电池塑壳及其制备方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101412948B (zh) * 2007-10-19 2012-05-16 安集微电子（上海）有限公司 一种等离子刻蚀残留物清洗剂
CN101412950A (zh) * 2007-10-19 2009-04-22 安集微电子（上海）有限公司 一种等离子刻蚀残留物清洗液
CN101597548A (zh) * 2008-06-06 2009-12-09 安集微电子科技(上海)有限公司 一种等离子刻蚀残留物清洗液
CN101463295B (zh) * 2008-11-28 2011-08-17 江苏海迅实业集团股份有限公司 半导体工业用清洗剂
CN101955852A (zh) * 2009-07-13 2011-01-26 安集微电子（上海）有限公司 一种等离子刻蚀残留物清洗液
CN104419563A (zh) * 2013-08-23 2015-03-18 南通恒鼎重型机床有限公司 一种专用于擦拭传送带的清洁剂
CN104213144A (zh) * 2014-09-20 2014-12-17 常熟市天河机械设备制造有限公司 轴承清洗剂
CN109976110A (zh) * 2017-12-27 2019-07-05 安集微电子（上海）有限公司 一种清洗液

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1302327A (zh) * 1999-01-27 2001-07-04 阿什兰公司 用于去除抗光蚀剂和蚀刻残留物的含有氟化物的酸性组合物
CN1479780A (zh) * 2000-12-07 2004-03-03 ��ʲ 蚀刻设备组件的清洗方法
US6821352B2 (en) * 2002-07-10 2004-11-23 Air Products And Chemicals, Inc. Compositions for removing etching residue and use thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1302327A (zh) * 1999-01-27 2001-07-04 阿什兰公司 用于去除抗光蚀剂和蚀刻残留物的含有氟化物的酸性组合物
CN1479780A (zh) * 2000-12-07 2004-03-03 ��ʲ 蚀刻设备组件的清洗方法
US6821352B2 (en) * 2002-07-10 2004-11-23 Air Products And Chemicals, Inc. Compositions for removing etching residue and use thereof
CN1665755A (zh) * 2002-07-10 2005-09-07 空气产品及化学制品股份有限公司 清除蚀刻残留物的组合物及其应用

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109294152A (zh) * 2018-09-05 2019-02-01 浙江畅通科技有限公司 一种高强度耐热铅酸电池塑壳及其制备方法

Also Published As

Publication number Publication date
CN1966636A (zh) 2007-05-23
WO2007056919A1 (fr) 2007-05-24

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