CN101463295B - 半导体工业用清洗剂 - Google Patents
半导体工业用清洗剂 Download PDFInfo
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- CN101463295B CN101463295B CN2008102355440A CN200810235544A CN101463295B CN 101463295 B CN101463295 B CN 101463295B CN 2008102355440 A CN2008102355440 A CN 2008102355440A CN 200810235544 A CN200810235544 A CN 200810235544A CN 101463295 B CN101463295 B CN 101463295B
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- agent
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- cleansing
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Abstract
Description
组分 | 重量百分比% |
乙二胺四醋酸钠 | 0.5 |
氟化钠 | 0.5 |
脂肪醇聚氧乙烯醚 | 5 |
烷基酚聚氧乙烯醚 | 5 |
十八烷基苄基二甲基氯化铵 | 3 |
油酸三乙醇胺皂 | 3 |
N,N-二(2-羟乙基)十二烷基酰胺 | 2 |
聚乙二醇-400 | 5 |
去离子水 | 76 |
组分 | 重量百分比% |
乙二胺四醋酸钠 | 0.2 |
脂肪醇聚氧乙烯醚 | 5 |
十八烷基苄基二甲基氯化铵 | 3 |
N,N-二(2-羟乙基)十二烷基酰胺 | 3 |
聚乙二醇-400 | 3 |
去离子水 | 85.8 |
组分 | 重量百分比% |
氟化钠 | 1 |
烷基酚聚氧乙烯醚 | 15 |
十八烷基苄基二甲基氯化铵 | 8 |
油酸三乙醇胺皂 | 5 |
聚乙二醇-400 | 8 |
去离子水 | 63 |
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008102355440A CN101463295B (zh) | 2008-11-28 | 2008-11-28 | 半导体工业用清洗剂 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN2008102355440A CN101463295B (zh) | 2008-11-28 | 2008-11-28 | 半导体工业用清洗剂 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101463295A CN101463295A (zh) | 2009-06-24 |
CN101463295B true CN101463295B (zh) | 2011-08-17 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN2008102355440A Active CN101463295B (zh) | 2008-11-28 | 2008-11-28 | 半导体工业用清洗剂 |
Country Status (1)
Country | Link |
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CN (1) | CN101463295B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102311861A (zh) * | 2011-04-26 | 2012-01-11 | 东莞市安美润滑科技有限公司 | 水性研磨清洗液 |
CN102766539A (zh) * | 2012-03-07 | 2012-11-07 | 北京京东方光电科技有限公司 | 一种清洁剂及其配制方法 |
CN103881837A (zh) * | 2012-12-19 | 2014-06-25 | 上海工程技术大学 | 半导体工业清洗剂及其应用 |
CN108085162B (zh) * | 2017-12-05 | 2020-07-17 | 杭州新画面生物科技有限公司 | 绿色环保洗涤剂 |
CN112680288A (zh) * | 2020-12-24 | 2021-04-20 | 昆山晶科微电子材料有限公司 | 一种用于清洁半导体芯片洗涤剂及其制备方法 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0351561A1 (en) * | 1988-06-28 | 1990-01-24 | Kabi Pharmacia AB | Novel esters of estramustine |
CN1051756A (zh) * | 1989-11-11 | 1991-05-29 | 孙启基 | 一种水基电子清洗制剂 |
CN1069694A (zh) * | 1992-05-23 | 1993-03-10 | 秦剑平 | 丝印模版的制作方法 |
EP0647619A1 (fr) * | 1993-10-08 | 1995-04-12 | RHONE-POULENC FIBER & RESIN INTERMEDIATES | Procédé d'isomérisation du méthyl-2 butène-3 nitrile |
CN1139091A (zh) * | 1995-06-26 | 1997-01-01 | 邢良坤 | 多彩网釉陶瓷工艺品及其制法 |
CN1188795A (zh) * | 1998-01-20 | 1998-07-29 | 山东大学 | 一种水剂清洗剂组合物 |
WO2005085408A1 (en) * | 2004-02-12 | 2005-09-15 | L'air Liquide-Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Improved alkaline chemistry for post-cmp cleaning |
WO2007056919A1 (fr) * | 2005-11-15 | 2007-05-24 | Anji Microelectronics (Shanghai) Co., Ltd | Composition detergente aqueuse |
-
2008
- 2008-11-28 CN CN2008102355440A patent/CN101463295B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0351561A1 (en) * | 1988-06-28 | 1990-01-24 | Kabi Pharmacia AB | Novel esters of estramustine |
CN1051756A (zh) * | 1989-11-11 | 1991-05-29 | 孙启基 | 一种水基电子清洗制剂 |
CN1069694A (zh) * | 1992-05-23 | 1993-03-10 | 秦剑平 | 丝印模版的制作方法 |
EP0647619A1 (fr) * | 1993-10-08 | 1995-04-12 | RHONE-POULENC FIBER & RESIN INTERMEDIATES | Procédé d'isomérisation du méthyl-2 butène-3 nitrile |
CN1139091A (zh) * | 1995-06-26 | 1997-01-01 | 邢良坤 | 多彩网釉陶瓷工艺品及其制法 |
CN1188795A (zh) * | 1998-01-20 | 1998-07-29 | 山东大学 | 一种水剂清洗剂组合物 |
WO2005085408A1 (en) * | 2004-02-12 | 2005-09-15 | L'air Liquide-Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Improved alkaline chemistry for post-cmp cleaning |
WO2007056919A1 (fr) * | 2005-11-15 | 2007-05-24 | Anji Microelectronics (Shanghai) Co., Ltd | Composition detergente aqueuse |
Also Published As
Publication number | Publication date |
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CN101463295A (zh) | 2009-06-24 |
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Owner name: JIANGSU TIANHENG NANOMETER TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: JIANGSU HAIXUN INDUSTRY GROUP SHARE CO., LTD. Effective date: 20131112 |
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Effective date of registration: 20131112 Address after: 226600 Haian, Jiangsu Province, Haian Development Zone, East China Sea Road, No. 18 Patentee after: Jiangsu Tianheng Nanometer Technology Co., Ltd. Address before: 226600 No. 18 Donghai Avenue, Haian Development Zone, Haian County, Jiangsu Patentee before: Jiangsu Haixun Industry Group Share Co., Ltd. |
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Effective date of registration: 20161010 Address after: 226600 Nantong, Haian, east of the town of East China Sea Road (East), No. 18, No. Patentee after: Jiangsu Haixun Industry Group Share Co., Ltd. Address before: 226600 Haian, Jiangsu Province, Haian Development Zone, East China Sea Road, No. 18 Patentee before: Jiangsu Tianheng Nanometer Technology Co., Ltd. |