CN1959538A - Around exposure device and method thereof - Google Patents
Around exposure device and method thereof Download PDFInfo
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- CN1959538A CN1959538A CNA2006101437374A CN200610143737A CN1959538A CN 1959538 A CN1959538 A CN 1959538A CN A2006101437374 A CNA2006101437374 A CN A2006101437374A CN 200610143737 A CN200610143737 A CN 200610143737A CN 1959538 A CN1959538 A CN 1959538A
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Abstract
The invention provides a peripheral exposure device and a method thereof which can enhance the production and minimize the substrate surface staining factor. The device irradiates the light containing ultraviolet on the peripheral region of the substrate W to exposure the photo-resistant ink and includes an UV-ray irradiation unit 9 arranged above the substrate and for irradiating the light containing ultraviolet on the peripheral region of the substrate through an irradiation opening 9m formed on the frame and an irradiation lens 9e; an luminance measuring section 11 for measuring the UV-ray luminance and is arranged at the UV-ray irradiating unit; and a moving mechanism for the luminance measuring section, which can move the luminance measuring section to the position facing to the irradiating opening of the UV-ray irradiating unit or the retreat position leaving the irradiating opening.
Description
Technical field
The present invention relates to a kind of peripheral exposure device and method thereof, this periphery exposure device and method thereof comprise ultraviolet light to the irradiation of the neighboring area around the area of the pattern that is formed at substrate and carry out all edge exposures.
Background technology
Generally speaking, about pattern in exposure device with the substrate that is exposed, for example in crystal liquid substrate, be that the substrate of the size of about 500mm * 500mm is handled at that time, be the substrate that is amplified to the so big molded dimension of 2160mm * 2460mm is handled now.Cut off, be separated into each default substrate film, from this large-scale substrate to produce the substrate that is equipped on the general pattern receiving equipment.Substrate cut off from large-scale state, when separating, for the management of its management with manufacturing process, utilize laser beam etc. to expose on the substrate before separation in advance, thereby on each substrate film, form literal, mark, figure or the identification sign that forms by its combination, judge (hereinafter referred to as identification markings) such as off-position identification code that the separation point position is used or alignment marks.
In addition, on substrate, around area of the pattern, promptly the neighboring area exists unwanted photoresist China ink liquid (photoresist ink), because this photoresist China ink liquid can become the obstacle of subsequent handling, so must make its exposure in advance.In the neighboring area that comprises unwanted photoresist China ink liquid, need show identification marking as mentioned above, this neighboring area is configured to preset width.Then, the position that forms identification marking in this neighboring area not only is disposed at the central portion of neighboring area, also can be near area of the pattern somewhere, or in certain part of the etched side of substrate, or near the area of the pattern of opposition side.
Substrate is after its area of the pattern is exposed, expose by means of peripheral exposure device, so that remove unwanted photoresist China ink liquid by being exposed in the neighboring area, thereby cutting off, be easy to when being separated into each substrate film handle (for example with reference to patent documentation 1,2).
And, in the manufacturing process of substrate, the peripheral exposure device that has exposure device that area of the pattern is exposed on the manufacturing line, the photoresist China ink liquid of neighboring area is exposed, to the expose various exposure devices such as exposure device of (demonstration) of identification marking, generally, carry out following operation: at first, area of the pattern is exposed by exposure device; Then, utilize the laser radiation exposure device, thereby mark (exposure) identification marking at the neighboring area of substrate irradiating laser; Then, utilize peripheral exposure device that the ultraviolet light that comprises predetermined wavelength is shone in the neighboring area of substrate, to expose.
Mark the exposure device of identification marking by the irradiation of laser,, carry out following action as an example.That is, at the place of the identification marking that will mark the neighboring area that is formed at substrate, from the exposing unit outgoing laser beam of the top of the pedestal that is disposed at the mounting substrate.Then, so that the mode that the pedestal of mounting substrate and exposing unit relatively move, rectilinear direction and with the orthogonal directions of this rectilinear direction quadrature on scan successively according to time sequencing, simultaneously, irradiation position is staggered on the direction that relatively moves, thereby the point of irradiation on the substrate is arranged to mark identification marking (for example, with reference to patent documentation 3) becoming on the plane of rectangular coordinate to form.
The formation method (display packing) of this identification marking, since utilize the some exposure of laser beam always be formed on laser beam be positioned at relative position coating on the substrate of photoresist China ink liquid, described identification marking is marked in the predetermined width, so with the orthogonal directions of pedestal straight line moving direction quadrature on, while often use small laser beam to scan the exposure and identification mark.
In addition, also have a kind of such exposure device to be disclosed: light source is used to make the unwanted photoresist China ink liquid exposure of the neighboring area of substrate, and this light source has the structure (for example with reference to patent documentation 4) that changes the shape that changes the light that exposes by the multiplying power of the ejecting end that makes photoconduction.In this exposure device, in the process of regulating, the mode that employing changes the size of projection laser beam imaging, enlarge or dwindle the width of controlling the light that penetrates from photoconduction by the light path that makes partial projection, therefore the exposing light beam that is shone has the width that amplifies symmetrically or dwindle about the light path center.
In addition, also propose a kind of such exposure device, wherein peripheral exposing unit is set at least one side's the guide rail of the fixed guide that is located at substrate top or moving guide rail (for example with reference to patent documentation 5).
Patent documentation 1: No. 2910867 communique of Japan's special permission;
Patent documentation 2: No. 3418656 communique of Japan's special permission;
Patent documentation 3: No. 3547418 communique of Japan's special permission;
Patent documentation 4: No. 3175059 communique of Japan's special permission;
Patent documentation 5: No. 3091460 communique of Japan's special permission.
Yet, in peripheral exposure device in the past, have problem shown below.
(1) in the manufacturing process that substrate is exposed, follow the maximization of substrate size, it is big that pedestal becomes.When carrying out all edge exposures, be arranged on the pedestal if measure the illuminometer of the illumination of illumination light, then the displacement of pedestal can be elongated, and it is very difficult to improve turnout.
(2) and, in the exposure device of patent documentation 5, the width of substrate must correspond to for example from 500mm to 2460mm, in this case, if moving track etc. is set above substrate, light source cells etc. can move longer distance, might become the reason that foreign matter is fallen on the substrate, substrate surface pollutes.
Summary of the invention
The present invention puts in view of the above problems and finishes, and its problem is to provide a kind of peripheral exposure device and method thereof, and this periphery exposure device and method thereof can improve turnout, and can make the reason of polluting substrate surface reach Min..
In order to solve above-mentioned problem, the peripheral exposure device of first aspect comprises ultraviolet light to the neighboring area irradiation of substrate, come photoresist China ink liquid is exposed, this periphery exposure device constitutes to have: ultraviolet irradiation unit, it is located at the position that becomes the substrate top, will comprise ultraviolet rayed neighboring area to substrate via irradiation with lens from the irradiation mouth that is formed at framework; Illumination photometry portion, it is located at ultraviolet irradiation unit, measures ultraviolet illumination; And travel mechanism of illumination photometry portion, its make illumination photometry portion move in the face of the irradiation mouth of ultraviolet irradiation unit in the face of a position and the retreating position that leaves from the irradiation mouth.
For the peripheral exposure device (hereinafter referred to as this device) of such formation, its illumination photometry portion is arranged at ultraviolet irradiation unit.Therefore, do not need the pedestal etc. of mounting ultraviolet irradiation unit or substrate to do significantly and move, just can measure illumination.And, can improve turnout.
This device is when the needs illumination photometry or when not needing illumination photometry, make illumination photometry portion in the face of the irradiation mouth of ultraviolet irradiation unit in the face of mobile between position and the retreating position that leaves from the irradiation mouth.Therefore, when carrying out all edge exposures of next substrate at the peripheral end exposure of a certain substrate, can make illumination photometry portion move in the face of the irradiation mouth of ultraviolet irradiation unit in the face of the position, carry out the measurement of illumination.
And, in this device, the ultraviolet irradiation unit of second aspect be configured to can with the direction of the moving direction quadrature of substrate on move freely.
This device of Gou Chenging can be adjusted to the irradiation position of ultraviolet irradiation unit on the position of neighboring area of substrate like this.
In addition, the peripheral exposure device of the third aspect faces the position between irradiation is with lens and substrate.
For this device,,, then can measure the identical illumination of illumination with actual substrate surface if face the position between irradiation is with lens and substrate owing to shine parallel illumination light with lens to substrate from irradiation.
In addition, peripheral exposure method of the present invention comprises the following steps: that first moves step, make the illumination photometry portion of the measurement ultraviolet ray illumination of being located at ultraviolet irradiation unit, move to the position of facing of the irradiation mouth of facing ultraviolet irradiation unit from the retreating position that leaves the irradiation mouth; Determination step is measured ultraviolet illumination with illumination photometry portion; Regulating step is regulated ultraviolet irradiation light; Calibration steps, the calibrating operation of this substrate is carried out in the substrate position by substrate and the reference position of pedestal; Second moves step, makes illumination photometry portion from moving to retreating position in the face of the position; And ultraviolet irradiating step, the neighboring area irradiation is comprised ultraviolet light expose.
According to this order, in the method, after measuring ultraviolet illumination and regulate illumination light with illumination photometry portion, substrate is carried out ultraviolet ray shine, therefore, can suitably expose to the black liquid of photoresist.At this moment, only, from moving to retreating position, just illumination can be measured then, therefore turnout can be improved in the face of the position by the illumination photometry portion that is located at ultraviolet irradiation unit is moved to facing the position from retreating position.
In peripheral exposure device of the present invention and method thereof, can obtain excellent results shown below.
For this device,, therefore can improve turnout owing to making ultraviolet irradiation unit move the illumination of measuring illumination light significantly.
And, for this device, owing in predetermined timing, measure the illumination of the irradiates light of ultraviolet irradiation unit by measuring appliance, so can carry out stable exposure operation all the time.
Description of drawings
Fig. 1 be omit laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation a part and from the side direction schematically show sectional view in the device.
Fig. 2 omits the part of laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation and schematically shows sectional view in the device from back side direction.
Fig. 3 (a) and (b) are the vertical views that are illustrated in an example of the substrate that uses in laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation.
Fig. 4 is the stereographic map that the pedestal of laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation is shown.
Fig. 5 is the synoptic diagram of structure that schematically shows the laser beam unit of laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation.
Fig. 6 is the sectional view that the structure of the ultraviolet irradiation unit of having excised a part of laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation is shown.
Fig. 7 is that the laser beam of the present invention that schematically shows a part of having excised framework, the irradiation area of the peripheral exposure device of ultraviolet ray irradiation are regulated the stereographic map of the integral body of shield mechanism.
Fig. 8 is the three-dimensional exploded view that the irradiation area that schematically shows laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation is regulated the structure division that moves in the X rectilinear direction of shield mechanism.
Fig. 9 is that the laser beam of the present invention that schematically shows a part of having excised framework, the irradiated area of the peripheral exposure device of ultraviolet ray irradiation are regulated the sectional view of shield mechanism.
Figure 10 is the calcspar of the control gear of expression laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation.
Figure 11 is the process flow diagram of flow process of the action of expression laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation.
Figure 12 (a)～(d) is the stereographic map of state that schematically shows the peripheral exposure operation of laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation.
Figure 13 (a)～(d) is the stereographic map of state that schematically shows the peripheral exposure operation of laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation.
Figure 14 is the side view of other structure that schematically shows the laser beam unit of laser beam of the present invention, the peripheral exposure device of ultraviolet ray irradiation.
Label declaration
1～laser beam, ultraviolet ray irradiation peripheral exposure device (this device)
2～pedestal; 2a～base station;
2b～support column; 2c～absorption peristome;
2d～telltale mark; 3～mobile carrying mechanism;
3A～first mobile guide the mechanism;
3B～second mobile guide the mechanism; 3C～the 3rd mobile guide mechanism;
3a～linear motor; 3b～moving track;
4～camera; 5～laser beam unit;
5A～laser beam head; 5a～laser beam source;
5b～light path accommodation reflex mirror; 6～optical path length regulon;
6a～light-dividing device; 6b～CCD photographic element;
6c～power meter; 7～laser radiation unit;
7a～sound equipment optical element; 7b～catoptron;
7c～Electronic Speculum unit; 7d～f θ lens;
8～measuring laser beam is seted the tone and is saved mechanism; 8a～power meter;
8b～CCD photographic element; 8c～beam expander (beam expander);
9～ultraviolet irradiation unit; 9c1～shadow shield;
9c2～drive division; 9a～discharge lamp;
9b～elliptical reflector; 9c～light path shield mechanism;
9d～fly's-eye lens; 9e～irradiation lens;
9k～framework; 9m～irradiation mouth;
10～irradiation area is regulated shield mechanism
10A～shield mobile device (the 3rd mobile device);
10A1～first framework; 10A2～first driving motor
10A3～screw; 10A4～mobile seat;
10A5～slide mechanism; 10A6～guide rail;
10A7～moving part; 10B～shield mobile device (first mobile device)
10B1～second framework; 10B2～second driving motor;
10B3～screw; 10B4～mobile seat;
10B5～slide mechanism; 10b1～framework;
10B6～guide rail; 10B7～moving part;
10C～shield mobile device (the 4th mobile device);
10C2～the 3rd driving motor;
10D～Y direction drive unit (second mobile device);
10a～sheet frame; 10b～sheet frame;
10d～sheet frame; 10e～sheet frame;
10D2～4 wheel driven moves motor; 10D3～feeding screws;
10D4～moving part; 11～measuring appliance;
11a～illumination photometry portion; 11b～travel mechanism of illumination photometry portion;
12～travel mechanism; 12a～linear motor;
12b～guide rail; 13～irradiated area is regulated shield mechanism;
13a～width adjusting shadow shield; 13b～width adjusting shadow shield moving part;
15～laser beam unit; 15a～optical fiber;
17～laser radiation unit; 17b1～minute surface;
17b2～twist pin; 17b3～yoke;
17a～catoptron 17b～digital micro-mirror device;
17c～laser radiation lens;
20～control gear; 21～input media;
22～camera driving control device; 23～view data input media;
24～position detecting device; 25～calibrating installation;
26～substrate position arithmetic unit; 27～mobile carrying mechanism driving control device;
28～laser beam irradiation driving control device;
29～ultraviolet ray irradiation driving control device;
30～measurement mechanism;
31～memory storage; A1～carriage;
B1～second framework; M～identification marking;
M1～identification marking; M2～identification marking;
T1～shield (area of the pattern shield);
T2～shield (the first identification marking shield);
T3～shield (the second identification marking shield);
W～substrate; Wp～area of the pattern;
Wc～neighboring area; B1, c1～seat body;
B2, c2～brace; T2b, t3b～peristome;
T2c, t3c～Support Level portion; T2a, t3a～shielding portion.
Embodiment
Below, be used to implement laser beam of the present invention, ultraviolet preferred forms of shining peripheral exposure device and method thereof with reference to description of drawings.
Fig. 1 be omit laser beam, the peripheral exposure device of ultraviolet ray irradiation a part and from the side direction schematically show sectional view in the device; Fig. 2 omits the part of laser beam, the peripheral exposure device of ultraviolet ray irradiation and schematically shows sectional view in the device from back side direction; Fig. 3 (a) and (b) are the vertical views that are illustrated in an example of the substrate that uses in laser beam, the peripheral exposure device of ultraviolet ray irradiation; Fig. 4 is the side view that the pedestal of laser beam, the peripheral exposure device of ultraviolet ray irradiation is shown.
As shown in Figure 1, laser beam, the ultraviolet ray peripheral exposure device of irradiation (to call this device in the following text) 1 mainly comprise: the pedestal 2 of the substrate W that maintenance is moved into; The camera 4 that the precalculated position that remains in substrate W on this pedestal 2 and pedestal 2 is taken; The mobile carrying mechanism 3 that the substrate W that remains on the pedestal 2 is carried or makes it to move; Around the area of the pattern Wp of the substrate W that moves carrying mechanism 3 carrying by this, i.e. the laser beam unit 5 that among the Wc of neighboring area identification marking M is exposed; Cover the identification marking M that is exposed at the neighboring area of substrate W Wc and the ultraviolet irradiation unit 9 of other neighboring areas Wc being shone the ultraviolet light (to call ultraviolet in the following text) that comprises predetermined wavelength; And the control gear 20 that mobile carrying mechanism 3, laser beam unit 5, ultraviolet irradiation unit 9 are controlled.
Shown in Fig. 3 (a) and (b), substrate W forms square, and for example forms the area of the pattern Wp of 2 row, 3 row, and forms neighboring area Wc around each area of the pattern Wp.Then, the neighboring area Wc of substrate W cuts off cut-out area when separating to each area of the pattern Wp, still is formed with the zone of mark, literal, figure or their (hereinafter referred to as identification markings) such as combinations simultaneously.And at this, the neighboring area Wc of substrate W is formed with identification marking M (M1, M2) respectively at portraitlandscape, and forms in the equal mode of the irradiated area of each identification marking M.
As Fig. 1 and shown in Figure 4, pedestal 2 is the structures that are used for keeping substrate W, and this pedestal 2 comprises: the base station 2a that is supported by mobile carrying mechanism 3; The upright support column 2b that is located on this base station 2a; Be formed at the locational absorption peristome 2c that this support column 2b and substrate W face mutually; And the telltale mark 2d that is used to detect the position of this pedestal 2.
Herein, base station 2a forms flat rectangular parallelepiped, and have with identical or its above area of the area of substrate W to be processed, this base station 2a with a plurality of support column 2b of direction (vertical direction) upper support of the planar quadrature of this base station 2a.As long as this base station 2a can support a plurality of support column 2b in vertical direction, there is no particular limitation to its shape, for example is disc-shape etc.And that base station 2a sets in advance is tessellated, the position that can freely install and remove support column 2b, thereby can regulate quantity and the position of support column 2b according to the size of substrate W, therefore easily.
Support column 2b is the structure that is used for level (with the vertical direction plane orthogonal) the maintenance substrate with substrate W butt, and this support column 2b is from the position of base station 2a predetermined altitude, and base station 2a is provided with a plurality of.Herein, because hypothesis is moved into substrate W by mechanical arm (not icon), so when under the state that keeps the substrate W back side with two forks (not icon) of mechanical arm, substrate being moved into, this support column 2b opens the state that can utilize the straight line space that this fork joins with sky, and with substrate W can the maintenance level to be spaced configuration a plurality of.
In addition, the shape with front position substrate W butt support column 2b is formed plane here, at this planar section, has the absorption peristome 2c that is used for keeping by vacuum suction this substrate W.This absorption is configured to the state of never illustrated vacuum suction mechanism connection with peristome 2c.And this absorption can be formed on all support column 2b with peristome 2c, in addition, as long as can keep substrate W, also can be formed on the support column 2b in precalculated position.
Telltale mark 2d with the corresponding mode in the reference position of camera 4, the upright planar side of being located at the base station 2a of pedestal 2 perhaps is formed at along the upright front end of establishing the pillar of (with reference to Fig. 2) in the side of base station 2a.This telltale mark 2d for example forms cross mark etc. on the substrate-side that becomes the pillar front end, and is formed on three places at least, also can be provided with corresponding to the quantity (being 4 herein) of camera 4.And, for specifically labelled shape, be provided with and highly there is no special qualification.In addition, herein, because substrate W is transparent, so telltale mark 2d is disposed at the inboard of real estate, but if at substrate W because lining is covered with photoresist China ink liquid under the opaque situation, telltale mark 2d is arranged on the pedestal 2 in the position of the periphery of substrate W certainly.
Pedestal 2 is a structure discussed above, and can substrate W be kept with the state on the maintenance plane, position that separates predetermined space from base station 2a by support column 2b and base station 2a.Therefore, need not dispose the new device of moving into, the mechanism of carrying substrate W between device that just can solve illustrated mechanical arm never etc. directly receives the problem of substrate.
Camera 4 is used for from the top of substrate W being photographed in the precalculated position of substrate W and the telltale mark of pedestal 2.This camera 4 is set on the support frame A1, and this camera 4 can move freely on directions X and Y direction by means of (not shown) such as guide rails, and this camera 4 for example uses CCD camera etc.This camera 4 is photographed to telltale mark 2d in default reference position, then as the directions X of a straight line direction and with the Y direction of this directions X quadrature on move freely, and move, being photographed in any one the default precalculated position in the bight (edge) of the alignment mark of substrate W or substrate W, thereby obtain each view data and export control gear 20 described later to.
Then, the view data that is obtained by camera 4 is resolved with the acquisition substrate position, and, relatively carry out calibrating operation via mobile carrying mechanism 3 based on instruction from control gear 20 according to resulting substrate position and pedestal position.
Mobile carrying mechanism 3 along mobile route L carrying substrate W, and moves substrate W in when exposure when ultraviolet light irradiation (during laser beam irradiation and) in the calibrating operation that carries out substrate W at a predetermined velocity.This mobile carrying mechanism 3 comprises: make pedestal 2 a rectilinear direction, i.e. first 3A of mobile guide mechanism that moves on the X rectilinear direction; Make pedestal 2 be orthogonal to second 3B of mobile guide mechanism that moves on the Y rectilinear direction of this X rectilinear direction; And make pedestal 2 go up the 3rd 3C of mobile guide mechanism that moves in the sense of rotation (θ direction) that the vertical line around the real estate that is kept perpendicular to pedestal 2 rotates.And, first to the 3rd 3A～3C of mobile guide mechanism as used herein makes pedestal 2 in the mechanism that moves or move on sense of rotation on the rectilinear direction, though the length of their set positions, guide etc. are different, but has shared structure, therefore main explanation first 3A of mobile guide mechanism.
As shown in Figure 2, first 3A of mobile guide mechanism comprises linear motor 3a and the moving track 3b, the 3b that are provided with along this linear motor 3a, and described linear motor 3a has the magnetic force guide of alternately arranging along the S utmost point, the N utmost point (primary side guide) and the reaction plate that moves.And, though this first mobile guide 3A of mechanism is the structure that is provided with moving track 3b, 3b in the both sides of linear motor 3a,, one side moving track 3b be located at any all can, use the fluid bearing of air etc. to replace this moving track 3b also can.In addition, though first 3A of mobile guide mechanism preferably uses the structure of linear motor 3a,, also can be travel mechanism of constituting of servomotor and feeding screws etc. as long as can move control with certain precision, there is no special qualification.
Herein, mobile carrying mechanism 3 is provided with the 3rd 3C of mobile guide mechanism that pedestal 2 is moved along the sense of rotation rotation between first 3A of mobile guide mechanism that pedestal 2 is moved along the X rectilinear direction and second 3B of mobile guide mechanism that pedestal is moved along the Y rectilinear direction, but, the upper-lower position of second 3B of mobile guide mechanism and the 3rd 3C of mobile guide mechanism exchanged and be provided with and also can.Moving the situation that carrying mechanism 3 relatively carries out the calibrating operation of substrate W by this is described as follows.
At first, mobile carrying mechanism 3 makes the pedestal 2 of the substrate W that maintenance moved into move to default reference position by second 3B of mobile guide mechanism that moves in the Y rectilinear direction.Then, utilize telltale mark 2d, 2d, the 2d of 4 pairs of pedestals 2 of camera to photograph, and view data is delivered to control gear 20 described later.And then, utilize the edge (or alignment mark (not shown)) of 4 couples of substrate W of camera to photograph, and view data is delivered to control gear 20.20 pairs of view data of sending here of control gear described later are resolved, and when comparing substrate position and pedestal position, calculate the calibrating position of substrate W, relatively carry out calibrating operation by mobile carrying mechanism 3 being moved control then.And, also can be when carrying out calibrating operation, according to the kind data of this substrate W of input in advance, i.e. shape and the position of identification marking M (with reference to Fig. 3), with the position adjustments of pedestal 2 to the position that can be transported to carrying destination (exposure position of laser beam (beginning irradiation position)).
Mobile carrying mechanism 3 mainly is to use the 3rd 3C of mobile guide mechanism and second 3B of mobile guide mechanism to carry out the calibrating operation of substrate W here according to the signal from control gear 20.Certainly, it is also passable to use the 3rd 3C of mobile guide mechanism, second 3B of mobile guide mechanism or first 3A of mobile guide mechanism to carry out the calibrating operation of substrate W.In addition, also can be such structure, that is: after carrying out calibrating operation, be carried to the precalculated position of laser beam unit 5 along the X rectilinear direction, utilize second 3B of mobile guide mechanism to move to exposure position then, thereby carry out position adjustments along the Y rectilinear direction.
Next laser beam unit 5 is described.As shown in Figures 1 and 2, laser beam unit 5 is to be used for by laser beam in unit that the neighboring area of substrate W Wc exposes to identification marking M.Then, as shown in Figure 5, this laser beam unit 5, and comprises the optical path length regulon 6 that the optical path length of laser beam is regulated and will regulate the laser radiation unit 7 of the laser beam irradiation of optical path length at the neighboring area of substrate W Wc by this optical path length regulon 6 by support frame A1 support fixation at this.And Fig. 5 is the synoptic diagram of structure that schematically shows the laser beam unit of this device.As shown in Figure 5, laser beam unit 5 has three laser radiation unit 7 at this, and constitute carrying out beam split from the laser beam of laser beam source 5a irradiation so that from each laser radiation unit 7 to three position illuminating laser beams of the neighboring area of substrate W Wc.
As shown in Figure 5, optical path length regulon 6 comprise laser beam source 5a, light path accommodation reflex mirror 5b, across the light-dividing device 6a of laser beam and the CCD photographic element 6b and the power meter 6c that are provided with.
Among the laser beam source 5a, select and be coated on the corresponding wavelength in exposure area of the photoresist China ink liquid on the neighboring area Wc of substrate W, for example using is pulse output and laser beam source luminous and that light goes out and replaces at a high speed repeatedly.Therefore, by making changeable frequency repeatedly, can make the integrated intensity of the laser beam of (sec) in the schedule time variable.
Light path accommodation reflex mirror 5b to be incident in laser radiation unit 7,7,7 and to be set at the precalculated position in order to be adjusted to from the optical path length of the laser beam of laser beam source 5a irradiation.This light path accommodation reflex mirror 5b will carry out the completely reflecting mirror of total reflection and the dichroic reflector (light beam splitter) of this laser beam beam split reflection will be arranged at preposition respectively laser beam.Then, dichroic reflector in light path accommodation reflex mirror 5b, be arranged at from laser beam source 5a with the light path beam split to the position of first and second laser radiation unit 7,7; Completely reflecting mirror is configured on the position and other position that reflexes to the 3rd laser radiation unit 7.This light path accommodation reflex mirror 5b is arranged on from laser beam source 5a and is incident to respectively on the positions that the optical path length of the laser beam of laser radiation unit 7 all equates, and is arranged on from laser beam source 5a and is reflexed on the position of each laser radiation unit 7 by secondary reflection then by first secondary reflection.
And, in the light path in optical path length regulon 6, across the light-dividing device 6a of the laser beam splitter that makes the laser beam beam split etc., be provided with the CCD photographic element 6b of the irradiation diameter that is used to measure laser beam and irradiation position and measure the power meter 6c of the power of laser beam.The measurement result that this place is measured is sent to control gear 20 described later.Then, this measurement result of delivering to control gear 20 reflects when carrying out the adjusting of laser beam source 5a.
As shown in Figure 5, laser radiation unit 7 comprises: make from the sound equipment optical element 7a of light path accommodation reflex mirror 5b laser light reflected bundle inflection; To reflex to catoptron 7b, the 7b of predetermined direction by the laser beam of this sound equipment optical element 7a inflection; Make the Electronic Speculum unit 7c of this catoptron 7b, 7b laser light reflected Shu Jinhang deflection scanning; Will be from the laser beam irradiation of this Electronic Speculum unit 7c f θ lens 7d to the neighboring area of substrate W.And, from the sound equipment optical element 7a of laser radiation unit 7 to the light path of f θ lens 7d, be provided with and measure laser beam with the measuring laser beam of the regulating joint mechanism 8 of setting the tone.
Sound equipment optical element 7a makes the laser beam inflection, and regulates intensity of laser beam (briliancy) by Modulation and Amplitude Modulation or frequency modulation (PFM).This sound equipment optical element 7a is arranged at by catoptron 7b, 7b to have changed the locational structure after the light path.
The f θ lens 7d line scanning of laser beam condensation to the flat image planes of the Electronic Speculum institute deflection of Electronic Speculum unit 7c can being gone forward side by side.For these f θ lens 7d, as long as make its entrance pupil footpath, scan angle, the structure of sweep limit, disposition far away etc. and corresponding the getting final product such as wavelength of Electronic Speculum and laser beam are not particularly limited.
As shown in Figure 5, the measuring laser beam joint mechanism 8 of setting the tone comprises: will be from the laser beam of catoptron 7b with the light-dividing device beam split of laser beam splitter etc. and measure the power meter 8a of power; Make the beam expander 8c of the operation that the spot diameter of laser beam or the scope of collimation broaden etc.; And the CCD photographic element 8b that the laser beam beam split is measured lasing beam diameter and irradiation position by light-dividing device.Then, be sent to control gear 20 described later by this measuring laser beam result that joint mechanism 8 measures that sets the tone, and regulating, reflect when becoming the state of suitable laser beam via sound equipment optical element 7a or beam expander 8c.
Laser beam unit 5 following such actions with above structure.Promptly, when substrate W moves to laser beam and begins irradiation position, laser beam source 5a lights, thereby laser beam is led to sound equipment optical element 7a, 7a, the 7a of each laser radiation unit 7,7,7 via each light path accommodation reflex mirror 5b of optical path length regulon 6, then from this sound equipment optical element 7a, 7a, 7a via Electronic Speculum unit 7c, 7c, 7c and f θ lens 7d, 7d, 7d, by a laser beam 5A, 5A, 5A with the neighboring area of laser beam irradiation, so that identification marking M1 (with reference to Fig. 3) is exposed at substrate W.At this moment, the laser beam of being shone with the direction of the moving direction quadrature of substrate W on scan, and substrate W is moved at a predetermined velocity, simultaneously, M1 exposes to identification marking.And, laser beam unit 5 since its laser beam 5A, being provided with at interval of 5A, 5A fix, so in the amplitude range of Electronic Speculum unit 7c, 7c, the formed laser beam of 7c, corresponding with the formation position of the size of substrate W or identification marking.
As Fig. 1, Fig. 2 and shown in Figure 6, ultraviolet irradiation unit 9 be arranged on above the mobile route of substrate W with laser beam unit 5 position adjacent on, this ultraviolet irradiation unit 9 is used for the neighboring area Wc irradiation ultraviolet radiation light to substrate W.Herein, this ultraviolet irradiation unit 9 is provided with two across travel mechanism 12, and be configured to the direction of the X rectilinear direction quadrature of substrate W on move.And Fig. 6 is the sectional view that the structure of the ultraviolet irradiation unit of having excised this a part of device is shown.
And as shown in Figure 6, travel mechanism 12 is identical with first 3A of mobile guide mechanism that has illustrated, has linear motor 12a and LM guide (moving track) 12b, 12b, thereby can be rapidly and critically move control.
As shown in Figure 6, ultraviolet irradiation unit 9 has: the discharge lamp 9a of irradiation ultraviolet radiation light; Being located at this discharge lamp 9a goes up and reflects so that the elliptical reflector 9b that light converges; Be arranged at by the light path shield 9c of mechanism in the light path of this elliptical reflector 9b optically focused; Than this light path shield 9c of mechanism near the fly's-eye lens 9d that is arranged in the light path of substrate W side from the spot position of the light of elliptical reflector 9b; Be used to make light through this fly's-eye lens 9d to become directional light and be radiated at irradiation lens 9e on the neighboring area Wc of substrate W; Has irradiation area adjusting shield mechanism 10 to the structure of carrying out shading (covering) from this irradiation with at least a portion of the light of lens 9e; And the irradiated area that changes irradiated area is regulated shield mechanism 13.
And in the ultraviolet irradiation unit 9, each structure of above-mentioned discharge lamp 9a etc. is arranged in the framework 9k, and on the position as the substrate W of framework 9k lower surface, forms an irradiation mouthful 9m on the position of the light path of the irradiates light of lens 9e forming from irradiation.And, in the ultraviolet irradiation unit 9, the measuring appliance 11 that the irradiates light that is shone is measured is located on the framework 9k, or measuring appliance 11 is arranged on when ultraviolet irradiation unit 9 moves to the precalculated position via travel mechanism 12 and stops, thereby with the irradiation mouthful corresponding position that can measure of 9m on.
The light path shield 9c of mechanism the light from light source (discharge lamp 9a and elliptical reflector 9b) side is interdicted or make it by, thereby the performance analog light source effect.This light path shield 9c of mechanism has: object light path with the shadow shield 9c1 that carries out shading (covering), make this shadow shield 9c1 move to light path or leave the drive division 9c2 of the retreating position of light path.When the neighboring area Wc to substrate W exposed, this light path shield 9c of mechanism made shadow shield 9c1 move to retreating position from light path when measuring irradiates light.
Fly's-eye lens 9d is used to regulate the Illumination Distribution of light.This fly's-eye lens 9d is the lens combination that a plurality of lens arrangement become the formation shape, or a plurality of these lens combination of configuration form on optical axis direction.This fly's-eye lens 9d for example is configured in the spot position from the irradiates light of light source.
Thereby irradiation is used to make the ultraviolet of having put Illumination Distribution in order through fly's-eye lens 9d to become directional light with lens 9e and is radiated at the neighboring area Wc of substrate W.This irradiation is used convex lens herein with lens 9e, as long as and can make the light that conducts with disperse state from fly's-eye lens 9d become directional light, simple lens or compound lens all can.
Then, illustrate that with reference to Fig. 7 and Fig. 8 irradiation area regulates the structure of shield mechanism 10.Fig. 7 is that the irradiation area that schematically shows this device of a part of having excised framework is regulated the stereographic map of the integral body of shield mechanism, and Fig. 8 is the irradiation area that schematically shows this device is regulated the structure division that shield mechanism moves on the X rectilinear direction a three-dimensional exploded view.
Irradiation area is regulated the A/F of the 10 contrast loophole 9m of shield mechanism and is regulated, so that the position of the area of the pattern Wp of substrate W and identification marking M is not mapped to by ultraviolet illumination.Herein, this irradiation area adjusting shield mechanism 10 comprises: three shield T1 (area of the pattern shield), T2 (the first identification marking shield), T3 (the second identification marking shield); With shield mobile device 10A (the 3rd mobile device), the 10B (first mobile device), 10C (the 4th mobile device) and the Y direction mobile device 10D (second mobile device) that are configured to this shield T1, T2, T3 are moved at predetermined direction.And at this, irradiation area is regulated shield mechanism 10 and on the Y rectilinear direction a slice shield T1 is moved control, and on X rectilinear direction and Y rectilinear direction two shield T2, T3 is moved control.
Shield mobile device 10A is located on the first framework 10A1, and comprises: the first driving motor 10A2 that is located at the first framework 10A1; Transmission is from the feeding screws 10A3 of the rotation of this first driving motor 10A2; The mobile seat 10A4 that moves along this feeding screws 10A3; Be used to make and be fixed in this and move the slide mechanism 10A5 that the second framework 10B1 described later on the 10A4 slides.
The first framework 10A1 so that the state that its part is fixed be arranged in the framework 9k of ultraviolet irradiation unit 9.This first framework 10A1 can move in the scope of this opening thereby move seat 10A4 along the opening that is formed with predetermined area on the sheet frame 10a of feeding screws 10A3 configuration.Then, the first framework 10A1 has sheet frame 10b, 10c on relative position, so that fix the first driving motor 10A2 and support feeding screws 10A3.In addition, the first framework 10A1 is so long as be oppositely arranged on the locational structure of separating with predetermined space with sheet frame 10b, 10c and get final product, sheet frame 10a is not set also can (for example be provided with the structure of sheet frame (not shown), or sheet frame 10b, 10c be fixed on the structure of framework 9k side) on the position of sheet frame 10a.
The first driving motor 10A2 can be rotated control, its structure and indefinite to servomotor etc.
As long as feeding screws 10A3 can transmit the rotation of the first driving motor 10A2, its structure and indefinite.
Move seat 10A4 being formed on the pairing position of internal thread along the mode that this feeding screws 10A3 moves, and support the second framework 10B1 described later by the rotation of feeding screws 10A3.
The moving part 10A7 that slide mechanism 10A5 has guide rail 10A6 and moves along guide rail 10A6 in the first framework 10A1 (sheet frame 10a), moving part 10A7 are fixed in the second framework 10B1 side described later.This slide mechanism 10A5 also can be disposed at the structure about feeding screws 10A3.
The shield mobile device 10A of above structure drives the first driving motor 10A2, and when making feeding screws 10A3 rotation predetermined number of revolutions, move seat 10A4 and move, thereby the second framework 10B1 described later is moved on the Y rectilinear direction along the guide rail of slide mechanism 10A5 along feeding bolt 10A3.And,, the second framework 10B1 is carried out suspension herein, and this second framework 10B1 is slided to move to the precalculated position on the Y rectilinear direction by the first framework 10A1.
Shield mobile device 10B and shield mobile device 10C are located on the second framework 10B1, have respectively: the second driving motor 10B2; The 3rd driving motor 10C2; Feeding screws 10B3,10C3; The mobile seat 10B4, the 10C4 that move along this feeding screws 10B3,10C3; Along slide mechanism 10B5, the 10C5 of the moving direction configuration that should move seat 10B4,10C4, and shield T2, T3 are configured to move along slide mechanism 10B5,10C5.
The second framework 10B1 is the mode suspension being free to slide in the first framework 10A1 upper edge Y rectilinear direction as previously mentioned.This framework 10b1 comprises: be arranged at the first framework 10A1 side sheet frame 10d, be arranged to towards sheet frame 10e, the 10f of the both end sides of this sheet frame 10d.And, shield T1 is set on the precalculated position of sheet frame 10d at the Y direction mobile device 10D that moves on the Y rectilinear direction.
The second driving motor 10B2 and the 3rd driving motor 10C2 can be rotated control, its structure and indefinite to servomotor etc.
Feeding screws 10B3,10C3 with the direction of feeding screws 10A3 quadrature on dispose side by side with predetermined space, as long as and the rotation that can transmit the second driving motor 10B2 and the 3rd driving motor 10C2, its structure and indefinite.
Moving seat 10B4,10C4 comprises: the seat body b1, the c1 that move along this feeding screws 10B3,10C3 by the rotation of feeding screws 10B3,10C3; And be located at brace b2, c2 on this seat body b1, the c1.Then, move seat 10B4,10C4 and on the precalculated position of the seat body b1, the c1 that move along feeding screws 10B3,10C3, form internal thread, herein, brace b2, c2 are disposed at the top and bottom of this seat body b1, c1 respectively, and when along feeding screws 10B3, when 10C3 moves, brace b2, c2 can intersect mobile mutually.
Slide mechanism 10B5,10C5 have guide rail 10B6,10C6 that be arranged in parallel with feeding screws 10B3,10C3 and moving part 10B7, the 10C7 that moves along this guide rail 10B6,10C6.It is different that this slide mechanism 10B5,10C5 are configured to height with guide rail 10B6,10C6, and moving part 10B7, the 10C7 that slides on guide rail 10B6,10C6 is connected in the front end of brace b2, c2.And mounting or dismounting are equipped with shield T2, T3 freely on moving part 10B7,10C7.
In addition, on the position that disposes shield T2, T3 side of the second framework 10B1 (sheet frame 10d), 10D is provided with shield T1 by Y direction mobile device.This Y direction mobile device 10D mainly comprises and can be rotated the moving motor 10D2 of 4 wheel driven of control, the feeding screws 10D3 of rotation that transmits the moving motor 10D2 of this 4 wheel driven and the moving part 10D4 that moves along this feeding screws 10D3 to servomotor etc., and this Y direction mobile device 10D is constituted as shield T1 is moved abreast with respect to irradiation mouthful 9m.And shield T1 loading and unloading are installed on the moving part 10D4 freely.
Here, even shield T1 is formed by the sheet metal that ultraviolet light irradiation also is difficult to softening or deterioration, and form the big area of opening of contrasting loophole 9m.And shield T2, T3 are formed with shielding portion t2a, t3a in front, and, be formed with peristome t2b, t3b continuously with this shielding portion t2a, t3a.This shield T2, T3 are formed to have according to the narrow width of the A/F of loophole 9m and be formed has identical size, and this shield T2, T3 form default size corresponding to the size of the identification marking M that will expose with shielding portion t2a, t3b.And, under the different respectively situation of the size of identification marking M, shield T2, T3 needn't form identical size, also can cooperate identification marking M and suitably change, in addition, as shown in Figure 7, shield T2, T3 are the mechanisms that is provided with the thin-line-shaped t2c of Support Level portion (t3c) that passes through peristome t2b, t3b, thereby when supporting shielding portion t2a, t3a via peristome t2b, t3b, shield lights not beyond the position of shielding portion t2a, t3a, and can tolerate high-speed mobile.As long as shielding portion t2a, t3a can keep horizontality when mobile, only the structure that supports with a plurality of these thin-line-shaped Support Level portions t2c (t3c) is also passable.And at this, shield T1, T2, T3 lay respectively on the position of differing heights, and formation can intersect mobile structure.
The irradiation area that below constitutes is like that regulated shield mobile device 10B, shield mobile device 10C and the Y direction mobile device 10D action as described below of shield mechanism 10.
Promptly, driving by the second driving motor 10B2 and the 3rd driving motor 10C2 makes feeding screws 10B3,10C3 rotation, thereby mobile seat 10B4, a 10C4 are moved, and then shield T2, T3 are moved in the mode of crossing irradiation mouthful 9m along slide mechanism 10B5,10C5.Shield T2, T3 move with substrate W with speed and equidirectional moving, and when passing across irradiation mouthful 9m, in predetermined timing, high-speed mobile on the direction opposite and pass across an irradiation mouthful 9m with present moving direction.And shield T2, the T3 location on the Y rectilinear direction is undertaken by utilizing shield mobile device 10A that the second framework B1 is moved.In addition, for shield T1, when in the Wc of the neighboring area of substrate W, not having identification marking to form, or carry out position adjustments by the end avris that moving of travel mechanism 12 contrasts loophole 9m, and have when not wishing irradiation ultraviolet radiation light regional in that another of irradiation mouthful 9m is distolateral, just use this shield T1.
Then, with reference to Fig. 9 irradiated area adjusting shield mechanism 13 is described.Fig. 9 is that the irradiated area that schematically shows this device of a part of having excised framework is regulated the sectional view of shield mechanism.As shown in Figure 9, irradiated area is regulated the irradiated area that shield mechanism 13 is used to change irradiates light.This irradiated area is regulated shield mechanism 13 and is provided with and supports the 13A of shield mechanism, the 13A with same structure that shines with the relative configuration of the supporter 9f side of lens 9e.Then, the 13A of shield mechanism comprises: to the width adjusting shadow shield 13a that regulates with the width of the irradiates light of lens 9e irradiation from irradiation; The width adjusting shadow shield moving part 13b that this width adjusting shadow shield 13a straight line is moved; Transmit the feeding screws 13c of the driving force of this width adjusting shadow shield moving part 13b; Support this feeding screws 13c and width adjusting shadow shield moving part 13b and they are fixed in the framework 13d of supporter 9f.
This irradiated area is regulated shield mechanism 13 moves width adjusting shadow shield 13a, 13a according to the control from control gear 20 in advance, thereby makes irradiated area become suitable state corresponding to the translational speed of substrate W.That is, regulate the space width of the width adjusting shadow shield 13a of the width adjusting shadow shield 13a of an avris and another avris.For example, slow with the translational speed that by the suitable translational speed of the irradiation time of laser beam lithography identification marking M than by ultraviolet exposure neighboring area Wc the time is benchmark, when overexposure, make irradiated area littler than benchmark.Promptly, irradiated area is regulated shield mechanism 13 and is configured to and can controls, the area that the avris of feasible irradiation mouthful 9m or width adjusting shadow shield 13a, the 13a of an avris and another avris are covered becomes big, thereby the irradiated area of the neighboring area Wc that is radiated at substrate W is diminished, and make under the translational speed of substrate, in all time, the irradiation energy summation of irradiation ultraviolet radiation light on the per unit area of neighboring area Wc is equated with the value of setting in benchmark.
And the reference position of regulating shadow shield 13a, 13a for example is to cover the position of a part from the avris of irradiation mouthful 9m or from an avris and another avris, irradiated area is become greatly or diminishes thereby can regulate.
In addition, irradiated area adjusting shield mechanism 13 can be the structure with any one 13A of shield mechanism.Irradiated area is regulated shield mechanism 13 when the translational speed by control gear 20 setting substrate W described later, according to determining irradiated area from the signal of this control gear 20.The concrete action of determining of carrying out this irradiated area as described later.
The measuring appliance 11 of ultraviolet then, is described.As shown in Figure 1, measuring appliance 11 is measurement devices from the illumination of the ultraviolet of ultraviolet irradiation unit irradiation.This measuring appliance 11 comprises the 11a of illumination photometry portion and makes the 11a of this illumination photometry portion move to the measuring position on the illumination path and the 11b of travel mechanism of illumination photometry portion of retreating position.Then, the measurement result after measuring appliance 11 will be measured is delivered to control gear 20 described later.Thereby the measurement result of being measured by this measuring appliance 11 reflects when the voltage of the discharge lamp 9a that puts on ultraviolet irradiation unit or electric current are regulated irradiates light being used for.Herein, measuring appliance 11 is constituted as following action: for example when the exposure operation of the neighboring area Wc of substrate W is finished, according to measuring operation, thereby carry out the measurement of irradiates light and discharge lamp 9a is regulated based on its result from the signal of control gear 20.
With reference to Figure 10, the structure of control gear 20 is described.Figure 10 is the calcspar that the control gear of this device is shown.As shown in figure 10, control gear 20 comprises input media 21, camera driving control device 22, view data input media 23, position detecting device 24, calibrating installation 25, substrate position arithmetic unit 26, mobile carrying mechanism driving control device 27, laser beam irradiation driving control device 28, ultraviolet ray irradiation driving control device 29, measurement mechanism 30 and memory storage 31.
Input media 21 is used for the kind data of input substrate W etc.This input media 21 is not particularly limited its structure so long as the device that can import data of keyboard, scanner, mouse etc. gets final product.
And, the kind data of this place input are the size of the size of size, area of the pattern Wp of substrate W and position, neighboring area Wc and position, kind, size, exposure position, exposure illumination and the film speed of identification marking (literal, mark, figure etc.), the exposure illumination (laser beam and ultraviolet) of neighboring area Wc (rectilinear direction and another rectilinear direction) etc., and this kind data in advance is from input media 21 inputs and be stored in the memory storage 31.In addition, in this device 1, the needed data of exposure illumination isoperimetric edge exposure operation of the per unit area of the film speed of laser beam unit 5, exposure illumination or ultraviolet irradiation unit 9 are imported and are stored in the memory storage 31 from input media 21 in advance.
Camera driving control device 22 is used for camera 4 is carried out drive controlling, this camera driving control device 22 according to since substrate W moved into pedestal 2 and be held and the initiating signal that produced by (not shown) such as sensors and the signal of position detecting device 24 move control to camera 4.
View data input media 23 is used to import by the captured view data of camera 4, and exports the view data of being imported to position detecting device 24.
24 pairs of view data of sending here from view data input media 23 of position detecting device are resolved with the generation position data, thereby detect substrate position and pedestal position.Position data by these position detecting device 24 detected substrate positions and pedestal position is output to calibrating installation 25, simultaneously, expression is detected the signal that finishes export camera driving control device 22 to.
Calibrating installation 25 is according to substrate position data and the pedestal position data sent here from position detecting device 24, make mobile carrying mechanism 3 calibrations what move as long as calculate, therefore, export the calibrating position data that calculate to mobile carrying mechanism driving control device 27.
Translational speed, laser beam that substrate position arithmetic unit 26 comes the laser beam of computing substrate W to begin after irradiation position, ultraviolet ray beginning irradiation position, translational speed, 90 degree rotation shift positions of substrate, 90 degree rotations move according to the calibrating position data of the substrate W that sends here from calibrating installation 25 and the kind data that are stored in the substrate W of memory storage 31 begin irradiation position, ultraviolet ray beginning irradiation position etc.
For example, substrate position arithmetic unit 26 is according to the kind data of substrate W, promptly represents the calibrating position data of each data of substrate size, area of the pattern size, neighboring area size, identification marking size, identification marking position and substrate W and calculates that the laser beam to substrate W begins irradiation position in laser beam unit 5.In addition, substrate position arithmetic unit 26 calculates the translational speed of substrate W according to the exposure illumination of identification marking size and identification marking.Result by 26 computings of this substrate position arithmetic unit is output to mobile carrying mechanism driving control device 27.
In addition, substrate position arithmetic unit 26 reflects the substrate position data of sending here from mobile carrying mechanism driving control device 27, to calculate each above-mentioned position and translational speed etc.
Mobile carrying mechanism driving control device 27 carries out drive controlling according to each data of sending here from calibrating installation 25 or substrate position arithmetic unit 26 to mobile carrying mechanism 3.The drive controlling of will representing this mobile carrying mechanism driving control device 27 moves the mobile designation data of the timing of the timing of the result of carrying mechanism 3, illuminating laser beam and irradiation ultraviolet radiation, the timing of control shield mechanism 10 etc. and delivers to laser beam irradiation driving control device 28 and ultraviolet ray irradiation driving control device 29.
The position data of the substrate W that laser beam irradiation driving control device 28 is sent here according to the kind data that are stored in the substrate W in the memory storage 31 in advance with from mobile carrying mechanism driving control device 27 is carried out drive controlling to laser beam unit 5.This laser beam irradiation driving control device 28 will represent that the irradiation stop signal that laser beam irradiation finishes exports laser radiation unit 7 to, simultaneously, regulate laser radiation unit 7 according to the measurement result data of sending here from measurement mechanism 30.And, laser beam irradiation driving control device 28 is according to the measurement result data, particularly, the state (illumination, irradiated area etc.) that laser beam source 5a, sound equipment optical element 7a or the beam expander 8c of laser radiation unit 7 suitably is adjusted to default laser beam respectively.
Ultraviolet ray irradiation driving control device 29 carries out drive controlling according to the position data that the species number that is stored in the substrate W in the memory storage in advance reaches the substrate W that sends here from mobile carrying mechanism driving control device 27 according to this to ultraviolet irradiation unit 9 (comprising that irradiation area is regulated shield mechanism 10 and irradiated area is regulated shield mechanism 13).The irradiation stop signal that this ultraviolet ray irradiation driving control device 29 will make ultraviolet light irradiation stop (being interdicted by the light path that light path shield mechanism carries out) exports ultraviolet irradiation unit 9 to, simultaneously, regulate ultraviolet irradiation unit 9 according to the measurement result data of sending here from measurement mechanism 30.And ultraviolet ray irradiation driving control device 29 is regulated the state that is adjusted to default illuminance according to the measurement result data by input voltage or input current to discharge lamp 9a.
Measurement mechanism 30 will export laser beam irradiation driving control device 28 and ultraviolet ray irradiation driving control device 29 to from the set the tone measurement data of joint mechanism 8 and measuring appliance 11 of optical path length regulon 6, measuring laser beam.
In addition, memory storage 31 is used for the kind data of memory substrate W, and it is so long as hard disk etc. can be stored the device of data gets final product, to its structure and indefinite.
Then, based on Figure 11, Figure 12, Figure 13, suitably the action of this device 1 is described referring to figs. 1 through Figure 10.And Figure 11 is the process flow diagram of the action of expression laser beam, the peripheral exposure device of ultraviolet ray irradiation; Figure 12 schematically shows that neighboring area irradiation to the end side of substrate comprises the ultraviolet light of predetermined wavelength and the stereographic map of the state that exposes; Figure 13 schematically shows that neighboring area irradiation to the center side of substrate comprises the ultraviolet light of predetermined wavelength and the stereographic map of the state that exposes.Among Figure 13 herein, for easy understanding, by with shield T1 the location tables on the above-below direction be shown as than shield T2, T3 by under describe, but practical structure is as shown in Figures 7 and 8, shield T1 dispose than shield T2, T3 by last.
As shown in figure 11, this device 1 at first keeps in absorption under the state of bottom surface of substrate substrate W being moved into (S1) on the pedestal 2 by not shown processor etc.Then, when substrate W is moved into pedestal 2, utilize the absorption be formed at support column 2b front end with peristome 2c absorption substrate W, (move into step S2) thereby substrate W remained on the pedestal 2.And at this, when carrying out the moving into of substrate W, mobile carrying mechanism 3 moves pedestal 2 by its second mobile guide 3B of mechanism on the Y rectilinear direction, to carry out the reception of substrate W.
When substrate W is maintained on the pedestal 2, initiating signal is sent to the camera driving control device 22 of control gear 20 so that camera 4 moves to default reference position, simultaneously, make mobile carrying mechanism 3 move to the reference position, and utilize the telltale mark 2d of 4 pairs of pedestals 2 of camera to photograph, and make camera 4 move to the predeterminated position of substrate W, for example substrate edge part (or alignment mark (not shown)) is photographed, and view data is imported control gear 20 by view data input media 23, simultaneously, utilize position detecting device 24 to resolve the view data of being imported, thereby detect substrate position and pedestal position (detecting step S3).
When detecting the position of substrate W and pedestal 2, it is mobile according to separately position pedestal 2 to be calibrated, thereby makes mobile carrying mechanism 3 actions to carry out calibrating operation (calibration steps S4) by calibrating installation 25, mobile carrying mechanism driving control device 27 etc.In this calibrating operation, carry out substrate W and move in the calibration of θ direction, afterwards, when substrate W when X rectilinear direction and Y rectilinear direction move, make substrate W move to the relative position that can carry out laser beam irradiation and ultraviolet light irradiation.
Then, the calibrating position of the substrate W after the calibrating installation 25 of control gear 20 will be calibrated exports substrate position arithmetic unit 26 to, simultaneously, exports mobile carrying mechanism driving control device 27 to.In substrate position arithmetic unit 26, calculate shift position (laser begin irradiation position) and the translational speed (calculation step S5) of substrate W in laser beam irradiation according to the calibrating position data of the substrate W that sends here and the kind data that are stored in the substrate W in the memory storage 31.At this moment, also make substrate W rotation move 90 shift position and translational speeds when spending to carry out computing to described later.
When shift position that calculates substrate W and translational speed, by mobile carrying mechanism driving control device 27, first 3A of mobile guide mechanism (or second 3B of mobile guide mechanism) via mobile carrying mechanism, the pedestal 2 that keeps substrate W is gone up in X rectilinear direction (or Y rectilinear direction) is moved, thus be carried under the laser beam unit 5 precalculated position (for example reference position of the identification marking among the neighboring area Wc of substrate W) (S6).When substrate W is carried to the precalculated position, when substrate W is moved at a predetermined velocity, make 5 actions of laser beam unit, from each laser beam 5A, 5A, 5A illuminating laser beam, so that identification marking is exposed successively (laser beam irradiation step S7).
When illuminating laser beam, the translational speed of the mobile carrying mechanism 3 that substrate W moves and the exposure rate that laser beam is exposed are synchronously carried out.That is, make sound equipment optical element 7a (AOM) and Electronic Speculum unit 7c (Electronic Speculum) synchronous, thereby AOM make from the once light inflection of high speed shield and guarantee mark light, therefore can high-speed exposure.Therefore, when carrying out the irradiation of laser beam, substrate W does not stop, and can move with predetermined speed.
At this moment, this device 1 is in ultraviolet irradiation unit 9 sides, utilize control gear 20, the position data of the substrate W that sends here according to the kind data that are stored in the substrate W in the memory storage 31 with from mobile carrying mechanism driving control device 27, via travel mechanism 12 framework 9k is moved in the Y rectilinear direction, thereby the end avris of irradiation mouthful 9m is adjusted to and is positioned to cover the area of the pattern Wp of substrate W with the position (S8) (with reference to Figure 12 (a)) to neighboring area Wc side irradiates light.Meanwhile, exposure and identification mark M1 in the irradiation by laser beam and in the Wc of the neighboring area of substrate W, and when delivering to ultraviolet irradiation unit 9 sides, if the irradiation place of ultraviolet is the neighboring area Wc of substrate W both sides, then 20 pairs of irradiation areas adjustings of control gear shield mechanism 10 controls, make and do not use irradiation area to regulate the shield T1 of shield mechanism 10, and use shield T2, T3, thereby prepare to carry out all edge exposures.Then, when the beginning irradiation position of the ultraviolet of the actual arrival of substrate W ultraviolet irradiation unit 9, make the light path shield 9c of mechanism action, thereby use among shield T1, T2, the T3 any, with neighboring area Wc irradiation ultraviolet radiation light (ultraviolet irradiating step S10) substrate W
When the identification marking M1 on the X of the substrate W rectilinear direction and neighboring area Wc thereof are exposed, judge the neighboring area Wc of substrate W on X rectilinear direction (rectilinear direction) and this two direction of Y rectilinear direction (another rectilinear direction) finish (S11) (for example according to the operating state of the 3rd 3C of mobile guide mechanism) that whether expose to a plate base W, when being "No", in case be back to the mobile end on the X rectilinear direction or carry out mobile beginning of calibrating operation, move arbitrary place in terminal or mobile beginning at this and utilize the 3rd 3C of mobile guide mechanism of mobile carrying mechanism 3 that pedestal 2 is revolved to turn 90 degrees, thereby make substrate W rotation move 90 degree (S12).Then, by similarly carrying out the operation of step 6 (S6) as mentioned above, at the neighboring area of substrate W Wc exposure and identification mark M2, simultaneously to step 10 (S10), by remaining neighboring area Wc that exposes, and finish all edge exposures to all neighboring area Wc of substrate W.
When all edge exposures of substrate W finished, substrate W was by mechanical arm (not shown) taking out of oral-lateral (not shown) or taking out of (S13) from the oral-lateral of moving into of moving into substrate W from the mobile end side that is formed at substrate W.Then, move into new substrate W,, carry out the peripheral exposure operation of suitable substrate W by repeating each above-mentioned step S1～S13.
At this, the translational speed of pedestal 2 is described.
The mobile carrying mechanism driving control device 27 of control gear 20 is determined the translational speed of substrate W according to default irradiation energy.But sometimes if the zone of identification marking M is big, or the required exposure of photoresist China ink liquid is big, and then forming mark by laser beam unit 5 needs the time.In the case, mobile carrying mechanism driving control device 27 calculates laser beam unit 5 and forms the needed time of mark, to determine the translational speed Sa of substrate W.On the other hand, with the translational speed Sa of substrate W, all edge exposures of ultraviolet irradiation unit 9 have the situation of overexposure.Therefore, ultraviolet ray irradiation driving control device 29 receives the translational speed Sa of substrate W from mobile carrying mechanism driving control device 27.Then, irradiation area is regulated the position that shield mechanism 10 regulates width adjusting shadow shield 13a.
On the contrary, in photoresist China ink needed exposure of liquid and ultraviolet relation, the translational speed Sb of the substrate W when mobile carrying mechanism driving control device 27 is also determined ultraviolet irradiation unit 9 exposures.In the case, laser beam irradiation driving control device 28 receives the translational speed Sb of substrate W from mobile carrying mechanism driving control device 27.Intensity of laser beam is determined corresponding to translational speed Sb in laser beam unit 5 then.
For example, when the signal of sending here from mobile carrying mechanism driving control device 27 is translational speed Sa, regulate the irradiated area of shield mechanism 13 by ultraviolet ray irradiation driving control device 29 control irradiated areas corresponding to this translational speed Sa.Promptly, ultraviolet ray irradiation driving control device 29 for example preestablishes the arithmetic expression that just can become suitable exposure status corresponding to the great irradiated area of translational speed Sa, translational speed Sa substitution is somebody's turn to do in the default arithmetic expression to calculate irradiated area, and try to achieve the amount of movement (shift position) of width adjusting shadow shield 13a, thereby control width adjusting shadow shield moving part 13a from this operation result.
In addition, when the signal of sending here from mobile carrying mechanism driving control device 27 is translational speed Sb, laser beam irradiation driving control device 28 changes laser beam intensity by the light quantity that excites that changes laser beam source 5a, or change the integrated intensity of laser beam by the toggle frequency that changes laser beam, again or the modulation by sound equipment optical element 7a changes laser beam intensity, so that corresponding to translational speed Sb.And, corresponding to this translational speed Sb, by the reflection direction of the laser beam among the laser beam irradiation driving control device 28 control Electronic Speculum unit 7c, so that corresponding to translational speed Sb.
So, laser beam irradiation driving control device 28 is constituted as corresponding to the translational speed of substrate W with ultraviolet ray irradiation driving control device 29 and moves.And, under the translational speed Sa situation identical, in each unit 5,9, control, to carry out exposure operation by the action that is set to benchmark with translational speed Sb.
Then, with reference to Figure 12 and Figure 13, specifically the situation at the neighboring area Wc of substrate W exposure describes.Promptly, shown in Figure 12 (a) and (b), irradiation area is regulated shield mechanism 10 and is utilized shield mobile device 10A via slide mechanism 10A5 shield T2 to be positioned on the Y rectilinear direction, and to make the position of the shielding portion t2a of shield T2 be to be overlapped on the position of identification marking M1 to carry out the position of shading.And at this, shielding portion t2a is mounted in advance with identification marking M1, M2 has area identical.If the neighboring area Wc of substrate W approaches irradiation mouthful 9m, then ultraviolet irradiation unit 9 makes the light path shield 9c of mechanism action, makes shadow shield 9c1 move in the mode of keeping out of the way from light path, thereby the ultraviolet illumination of the lamp of self discharge in the future 9a side is incident upon neighboring area Wc.
Then, after the position of identification marking M1 is sent here along with moving of substrate W, the shielding portion t2a of locational shield T2 that is overlapped in this identification marking is with the synchronous speed of the translational speed of substrate W, move in the mode of crossing irradiation mouthful 9m, thereby under the state that covers identification marking M1, by carrying out all edge exposures at remaining neighboring area Wc irradiation ultraviolet radiation light.
In addition, shown in Figure 12 (c), in the Wc of the neighboring area of substrate W, because follow-up identification marking M1 is continuous with irradiation mouthful 9m, so shield T3 and shield T2 similarly be positioned at identification marking M1 position overlapped on, and by synchronously moving with the translational speed of substrate W under the state that covers follow-up identification marking M1, to remaining neighboring area Wc irradiation ultraviolet radiation light to carry out all edge exposures.
And, shown in Figure 12 (d), cross irradiation mouthful 9m and the shield T2 that covers identification marking M1 moves on the direction opposite with substrate W moving direction at high speed with predetermined timing, thereby crossed an irradiation mouthful 9m once again.And, though carry out the exposure operation of the neighboring area Wc of substrate W this moment, be high-speed mobile, so do not hinder for the exposure operation of neighboring area Wc owing to cross when shining mouth 9m.Then, shield T2 is with previous described roughly the same, be positioned with the 3rd position that identification marking M1 overlaps on, and cross an irradiation mouthful 9m, thereby identification marking M1 covered and other neighboring area Wc is exposed by moving with the translational speed identical with substrate W.
So, irradiation area is regulated shield mechanism 10 when utilizing shield T2, T3 to cover (shading) identification marking, moving and crossing irradiation mouthful 9m with the translational speed identical with substrate W, and during corresponding to follow-up identification marking, high-speed mobile on the direction opposite repeatedly with substrate W moving direction, crossing an irradiation mouthful 9m, thereby even the quantity increase of identification marking M1 (M2) also can tackle.
In addition, shown in Figure 13 (a)～(d), when there is area of the pattern in the both sides at the neighboring area of substrate W Wc, shield T1 and shield T2, T3 are used, to tackle.
Shown in Figure 13 (a), at first, via travel mechanism 12 framework 9k is moved on the Y rectilinear direction, thereby an end that will shine mouthful 9m is adjusted on the position of the area of the pattern Wp that can cover substrate W.Then, when using shield T1, make the second framework 10B1 move to the precalculated position, and carry out shield T2, the T3 location on the Y rectilinear direction along slide mechanism 10A5.And, via Y direction mobile device 10D, shield T1 is moved on the Y rectilinear direction, and send to the position that can cover area of the pattern Wp, cover with the preset width on the Y rectilinear direction of contrast loophole 9m, make light can't expose on the area of the pattern Wp of opposition side of neighboring area Wc.
Then, under the state of the irradiated area that reduces irradiation mouthful 9m by shield T1, use shield T2, T3, and as illustrated among Figure 12 (b)～(d), when covering identification marking M1 to neighboring area Wc exposure, thereby carry out disposing all edge exposures under the state of area of the pattern Wp in the both sides of neighboring area Wc.And the control of irradiation area adjusting shield mechanism 10 is suitably carried out according to the kind data of substrate W and the position data of substrate W by the ultraviolet ray irradiation driving control device 29 of control gear 20.
When the identification marking M1 on the X of the substrate W rectilinear direction and neighboring area Wc thereof are exposed, judge the neighboring area Wc of substrate W on X rectilinear direction (rectilinear direction) and this two direction of Y rectilinear direction (another rectilinear direction) finish (S11) (for example according to the operating state of the 3rd 3C of mobile guide mechanism) that whether expose to a plate base W, when being "No", in case be back to the mobile end on the X rectilinear direction or carry out mobile beginning of calibrating operation, move arbitrary place in terminal or mobile beginning at this and utilize the 3rd 3C of mobile guide mechanism of mobile carrying mechanism 3 that pedestal 2 is revolved to turn 90 degrees, thereby make substrate W rotation move 90 degree.Then, by similarly carrying out the operation of step 6 (S6) as mentioned above, at the neighboring area of substrate W Wc exposure and identification mark M2, simultaneously to step 10 (S10), by remaining neighboring area Wc that exposes, and finish all edge exposures to all neighboring area Wc of substrate W.
When all edge exposures of substrate W finished, substrate W was by mechanical arm (not shown) taking out of oral-lateral (not shown) or take out of from the oral-lateral of moving into of moving into substrate W from the mobile end side that is formed at substrate W.
And, according to the kind of substrate W, the substrate that does not form identification marking at the Centromedian neighboring area Wc of substrate W shown in Figure 3 is also arranged, in the case, in Figure 13, only utilize shield T1 to cover the light of the irradiation mouth 9m on the Y rectilinear direction and finish all edge exposures.
And, according to the kind of substrate W,, as shown in Figure 3, be the state of no identification marking M2 when revolving when turning 90 degrees.In the substrate W of so no identification marking M2, do not use laser beam and only use the ultraviolet irradiation of ultraviolet irradiation unit 9 sides, therefore pass through location by the framework 9k of travel mechanism's 12 realizations, and irradiation area regulates the location of the shield 1 of shield mechanism 10, can carry out the exposure operation of ultraviolet.Therefore, control gear 20 utilizes the kind data of substrate W to control, and makes the translational speed of substrate W become the initial conditions of substrate W.So, owing to be the state that does not have identification marking M2, so revolving the translational speed of the substrate W when turning 90 degrees is to be set under state as described below, that is: in irradiation mouthful 9m, the irradiated area of being regulated 13 realizations of shield mechanism by irradiated area becomes maximum state, from being configured to improve the efficient of exposure operation.
In addition, in this device 1, ultraviolet irradiation unit 9 is finished at all edge exposures of the neighboring area of substrate W Wc, before the follow-up substrate W of carrying, measures illumination by measuring appliance 11.
This device 1 utilizes the 11b of travel mechanism of illumination photometry portion of measuring appliance 11 that the 11a of illumination photometry portion is moved to from retreating position and locates, and is located under the irradiation mouthful 9m.Then, this device 1 makes the shadow shield 9c1 action of the light path shield 9c of mechanism, and from irradiation mouthful 9m illumination measurement section 11a is carried out rayed to measure the illumination of light.Then, the result after the mensuration delivers to ultraviolet ray irradiation driving control device 29 from the measurement mechanism 30 of control gear 20, so that discharge lamp 9a is carried out the adjusting of curtage, thereby regulates illumination.
Even this device 1 is in laser beam unit 5, substrate W is not on the position of illuminating laser beam the time, utilize CCD photographic element 6b and power meter 6c or power meter 8a and CCD photographic element 8b to carry out the status adjustment of laser beam, for example carry out the adjusting of laser beam source 5a, the adjusting of sound equipment optical element 7a, or more than in the adjusting of beam expander 8c any one, thereby make laser beam be always maintained at proper state.
And as shown in figure 14, the structure of the also available laser beam of this device 1 unit 15 replaces laser beam unit 5.Figure 14 is the side view of other structure of laser beam unit.And, in the structure of optical path length regulon 6,, therefore omit its explanation with not variation of structure shown in Figure 5.
The laser radiation unit 17 of laser beam unit 15 (herein being three) forms with identical structure respectively, thereby forms from the structure of optical path length regulon 6 via optical fiber 15a transmission laser bundle.
And, digital micro-mirror device 17b comprises: the small minute surface 17b1 of reflection lasering beam, at one end side supports twist pin (torsion pin) 17b2 of this minute surface 17b1 and is located at another distolateral yoke 17b3 of this twist pin 17b2 etc., because being constituted as by twist pin 17b2 fulcrum can predetermined oblique angle (for example positive 12 degree and negative 12 degree), so flow at electric current under the state of yoke 17b3, twist pin 17b2 makes minute surface 17b1 predetermined oblique angle, to control catoptrical direction.
By using this digital micro-mirror device 17b, laser radiation unit 17 utilizes laser beam at the neighboring area of substrate W Wc desirable identification marking M to be shone so that its exposure.
As described above, this device 1 be so long as can bring into play the state of identical function in each structure, position etc. is set also has no relations even change it.For example, it also can be the outside that is arranged at the irradiation mouth 9m of framework 9k that irradiated area is regulated shield mechanism 13, the structure of carrying out shading from the downside of this irradiation mouth 9.In addition, the quantity of ultraviolet irradiation unit 9 also can be one or three, four.And the laser radiation unit 7 of laser beam unit 5 also can be more than three, and laser beam source 5a also can be a plurality of, and laser radiation unit 7 also can be more than three.
Claims (4)
1. peripheral exposure device, this periphery exposure device comprises ultraviolet light to the neighboring area irradiation of substrate, comes photoresist China ink liquid is exposed, and it is characterized in that this periphery exposure device has:
Ultraviolet irradiation unit, it is located at the position that is in the aforesaid substrate top, will comprise ultraviolet rayed neighboring area to above-mentioned substrate via irradiation with lens from the irradiation mouth that is formed on framework;
Illumination photometry portion, it is located at above-mentioned ultraviolet irradiation unit, measures ultraviolet illumination; And
Travel mechanism of illumination photometry portion, its make above-mentioned illumination photometry portion move to above-mentioned ultraviolet irradiation unit the irradiation mouth in the face of position and the retreating position that leaves from above-mentioned irradiation mouth.
2. peripheral exposure device as claimed in claim 1 is characterized in that, above-mentioned ultraviolet irradiation unit be configured to can with the direction of the moving direction quadrature of aforesaid substrate on move freely.
3. peripheral exposure device as claimed in claim 1 or 2 is characterized in that, and is above-mentioned in the face of using between lens and the aforesaid substrate in above-mentioned irradiation the position.
4. peripheral exposure method, this periphery exposure method use the ultraviolet irradiation unit of the neighboring area irradiation ultraviolet radiation of substrate are come photoresist China ink liquid is exposed, and it is characterized in that this method comprises the following steps:
First moves step, makes the illumination photometry portion of the measurement ultraviolet ray illumination of being located at above-mentioned ultraviolet irradiation unit, moves to the position of facing of the irradiation mouth of above-mentioned ultraviolet irradiation unit from the retreating position that leaves the irradiation mouth;
Determination step is measured ultraviolet illumination with above-mentioned illumination photometry portion;
Regulating step is regulated ultraviolet irradiation light;
Calibration steps, the calibrating operation of this substrate is carried out in the substrate position by aforesaid substrate and the reference position of above-mentioned pedestal;
Second moves step, make above-mentioned illumination photometry portion from above-mentioned in the face of moving to above-mentioned retreating position the position; And
The ultraviolet ray irradiating step comprises ultraviolet light to the irradiation of above-mentioned neighboring area and exposes.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005321256 | 2005-11-04 | ||
| JP2005321256 | 2005-11-04 | ||
| JP2006246267 | 2006-09-12 |
Publications (2)
| Publication Number | Publication Date |
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| CN1959538A true CN1959538A (en) | 2007-05-09 |
| CN100570492C CN100570492C (en) | 2009-12-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006101437321A Expired - Fee Related CN100561352C (en) | 2005-11-04 | 2006-11-03 | Laser beam, the ultraviolet ray peripheral exposure device of irradiation and method thereof |
| CNB2006101437374A Expired - Fee Related CN100570492C (en) | 2005-11-04 | 2006-11-03 | Periphery exposure device and method thereof |
| CNB2006101437340A Expired - Fee Related CN100561353C (en) | 2005-11-04 | 2006-11-03 | Laser beam exposure device and method thereof |
| CNB2006101437317A Expired - Fee Related CN100501575C (en) | 2005-11-04 | 2006-11-03 | Around exposure device and method thereof |
| CNB2006101437355A Expired - Fee Related CN100561354C (en) | 2005-11-04 | 2006-11-03 | Laser beam, the ultraviolet ray peripheral exposure device of irradiation and method thereof |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
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| CNB2006101437321A Expired - Fee Related CN100561352C (en) | 2005-11-04 | 2006-11-03 | Laser beam, the ultraviolet ray peripheral exposure device of irradiation and method thereof |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
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| CNB2006101437340A Expired - Fee Related CN100561353C (en) | 2005-11-04 | 2006-11-03 | Laser beam exposure device and method thereof |
| CNB2006101437317A Expired - Fee Related CN100501575C (en) | 2005-11-04 | 2006-11-03 | Around exposure device and method thereof |
| CNB2006101437355A Expired - Fee Related CN100561354C (en) | 2005-11-04 | 2006-11-03 | Laser beam, the ultraviolet ray peripheral exposure device of irradiation and method thereof |
Country Status (2)
| Country | Link |
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| JP (1) | JP2010224544A (en) |
| CN (5) | CN100561352C (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101713926B (en) * | 2008-09-29 | 2012-10-31 | 株式会社Orc制作所 | Peripheral exposure device and method thereof |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI391603B (en) * | 2008-08-22 | 2013-04-01 | Hon Hai Prec Ind Co Ltd | Ultraviolet irradiating apparatus |
| JP5685756B2 (en) * | 2010-11-10 | 2015-03-18 | 株式会社ブイ・テクノロジー | Film exposure method |
| JP5325907B2 (en) * | 2011-02-22 | 2013-10-23 | 東京エレクトロン株式会社 | Local exposure equipment |
| CN102650831B (en) * | 2011-04-01 | 2014-02-26 | 京东方科技集团股份有限公司 | Exposure machine stand and method for freely setting shades in exposure machine stand |
| CN102514385B (en) * | 2011-11-29 | 2015-04-15 | 深圳市华星光电技术有限公司 | Identification code printing method and identification code printing device |
| CN102608875A (en) * | 2012-03-27 | 2012-07-25 | 深圳市华星光电技术有限公司 | Glass substrate carved number repairing method and glass substrate carved number repairing device based on repairing cabinet |
| JP5344105B1 (en) * | 2013-03-08 | 2013-11-20 | ウシオ電機株式会社 | Polarizing light irradiation apparatus for photo-alignment and polarized light irradiation method for photo-alignment |
| JP6227347B2 (en) * | 2013-09-25 | 2017-11-08 | 株式会社Ｓｃｒｅｅｎホールディングス | Exposure apparatus and optical apparatus |
| JP6444909B2 (en) * | 2016-02-22 | 2018-12-26 | 東京エレクトロン株式会社 | Substrate processing method, substrate processing apparatus, and computer-readable recording medium |
| CN107505815A (en) * | 2017-09-05 | 2017-12-22 | 深圳市华星光电技术有限公司 | A kind of edge exposure device and edge exposure method |
| JP6916718B2 (en) * | 2017-11-15 | 2021-08-11 | 東レエンジニアリング株式会社 | Laser processing equipment |
| CN111856822B (en) * | 2020-06-29 | 2022-09-27 | 南京京东方显示技术有限公司 | Double-layer mask plate, use method thereof and method for improving light leakage of double-layer mask plate |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2910867B2 (en) * | 1990-11-29 | 1999-06-23 | 三菱電機株式会社 | Resist exposure equipment |
| JP3175059B2 (en) * | 1992-03-23 | 2001-06-11 | 株式会社ニコン | Peripheral exposure apparatus and method |
| JPH0793827A (en) * | 1993-09-21 | 1995-04-07 | Seiko Epson Corp | Exposure system for optical disk master disk |
| JP3377320B2 (en) * | 1995-01-13 | 2003-02-17 | 大日本スクリーン製造株式会社 | Substrate peripheral exposure equipment |
| JP3328630B2 (en) * | 2000-03-06 | 2002-09-30 | イビデン株式会社 | Printed wiring board and method of manufacturing printed wiring board |
| JP2001330966A (en) * | 2000-05-19 | 2001-11-30 | Dainippon Screen Mfg Co Ltd | Laser plotter |
| KR100964772B1 (en) * | 2002-03-29 | 2010-06-23 | 호야 가부시키가이샤 | Method and apparatus for producing a photo mask blank, and apparatus for removing an unnecessary portion of a film |
| JP2004302090A (en) * | 2003-03-31 | 2004-10-28 | Konica Minolta Holdings Inc | Method for manufacturing mother die, mother die, method for manufacturing mold, mold, optical element and electron beam drawing apparatus |
| JP4169264B2 (en) * | 2003-04-18 | 2008-10-22 | 大日本スクリーン製造株式会社 | Light beam generator |
| JP4083100B2 (en) * | 2003-09-22 | 2008-04-30 | 株式会社Ｓｏｋｕｄｏ | Edge exposure equipment |
| JP2005121916A (en) * | 2003-10-16 | 2005-05-12 | Seiko Epson Corp | Method for manufacturing base plate with recessed part for lenticular lens, base plate with recessed part for lenticular lens, lenticular lens base plate, transmission type screen and rear type projector |
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2006
- 2006-11-03 CN CNB2006101437321A patent/CN100561352C/en not_active Expired - Fee Related
- 2006-11-03 CN CNB2006101437374A patent/CN100570492C/en not_active Expired - Fee Related
- 2006-11-03 CN CNB2006101437340A patent/CN100561353C/en not_active Expired - Fee Related
- 2006-11-03 CN CNB2006101437317A patent/CN100501575C/en not_active Expired - Fee Related
- 2006-11-03 CN CNB2006101437355A patent/CN100561354C/en not_active Expired - Fee Related
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2010
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101713926B (en) * | 2008-09-29 | 2012-10-31 | 株式会社Orc制作所 | Peripheral exposure device and method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1959535A (en) | 2007-05-09 |
| CN100561353C (en) | 2009-11-18 |
| CN1959536A (en) | 2007-05-09 |
| CN100561352C (en) | 2009-11-18 |
| CN100561354C (en) | 2009-11-18 |
| CN100570492C (en) | 2009-12-16 |
| JP2010224544A (en) | 2010-10-07 |
| CN1959534A (en) | 2007-05-09 |
| CN100501575C (en) | 2009-06-17 |
| CN1959537A (en) | 2007-05-09 |
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