JP4169264B2 - Light beam generator - Google Patents

Light beam generator Download PDF

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Publication number
JP4169264B2
JP4169264B2 JP2003113643A JP2003113643A JP4169264B2 JP 4169264 B2 JP4169264 B2 JP 4169264B2 JP 2003113643 A JP2003113643 A JP 2003113643A JP 2003113643 A JP2003113643 A JP 2003113643A JP 4169264 B2 JP4169264 B2 JP 4169264B2
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Japan
Prior art keywords
light
mirror
reflected light
reflected
mirrors
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Expired - Fee Related
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JP2003113643A
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JP2004317904A (en
Inventor
学 矢部
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大日本スクリーン製造株式会社
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Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a light beam generating apparatus that generates a light beam.
[0002]
[Prior art]
Conventionally, laser annealing for irradiating a semiconductor substrate (hereinafter referred to as “substrate”) to anneal the substrate, laser cleaning for removing foreign matters on the substrate, laser ablation for processing the substrate surface, etc. Various processes have been implemented. In these processes, a light irradiation apparatus having a head unit that generates laser light (for example, laser light having a uniform intensity distribution) is used.
[0003]
In Patent Document 1, in a printing apparatus using a digital micromirror device (DMD), a light control filter or a color filter is provided on the optical path between the light source and the DMD, and the intensity of light irradiated on the photosensitive material A technique for finely adjusting the wavelength is disclosed. Further, Patent Document 2 discloses a technique for controlling the cumulative amount of light applied to a light irradiation region on a photosensitive material corresponding to each micromirror by individually changing the duty of a DMD micromirror group. Yes.
[0004]
[Patent Document 1]
JP 2001-13601 A
[Patent Document 2]
Japanese Patent Laid-Open No. 2000-241911
[0005]
[Problems to be solved by the invention]
By the way, in order to efficiently perform the processing using the laser beam on the substrate, it is necessary to irradiate the substrate with a high-power laser beam. However, depending on the state of the substrate to be processed, the substrate may be affected by variations in the intensity of the laser beam and its distribution.
[0006]
On the other hand, in the technique described in Patent Document 1 or Patent Document 2, the intensity of light irradiated to the light irradiation area group on the photosensitive material is changed as a whole, or each light irradiation area is irradiated for a certain time. Although it is possible to control the cumulative amount of light, it is not possible to change the intensity of light irradiated for each light irradiation region (that is, change the light intensity distribution).
[0007]
The present invention has been made in view of the above problems, and an object of the present invention is to provide a technique for changing the intensity distribution of a light beam using a mirror device.
[0008]
[Means for Solving the Problems]
The invention according to claim 1 is a light beam generating device, comprising a light source and a plurality of first mirrors whose postures can be individually changed, and reflecting an input light beam from the light source to produce a first light beam. A first mirror device that generates a first reflected light beam directed in a direction and a second reflected light beam directed in a second direction, and the first reflected light beam and the second reflected light beam to a predetermined position An optical system for guiding and a plurality of second mirrors whose postures can be individually changed, and disposed at the predetermined position to reflect the first reflected light beam and the second reflected light beam in a predetermined direction. A second mirror device that generates an output light beam, and the optical system includes an optical element that changes an intensity of the light beam on an optical path of the second reflected light beam, and the plurality of first mirrors, One-to-one correspondence with the plurality of second mirrors The reflected light beam element is led out from each of the plurality of first mirrors in the first direction or the second direction, and the reflected light beam element is emitted by the optical system. The reflected light beam element is guided to a second mirror corresponding to the mirror, and the reflected light beam element is reflected by the second mirror in the predetermined direction.
[0009]
The invention according to claim 2 is the light beam generating apparatus according to claim 1, wherein the first mirror device reflects the input light beam and travels in a third direction. The optical system guides the third reflected light beam to the predetermined position, and the second mirror device reflects the first to third reflected light beams in the predetermined direction to An output light beam is generated, and the optical system includes another optical element that changes an intensity of the light beam on an optical path of the third reflected light beam, and the reflected light beam element includes the plurality of first light beams. Derived from each of the mirrors in the first direction, the second direction or the third direction.
[0010]
A third aspect of the present invention is the light beam generating apparatus according to the first or second aspect, further comprising a controller that controls the postures of the plurality of first mirrors and the plurality of second mirrors.
[0011]
A fourth aspect of the present invention is the light beam generating apparatus according to the third aspect, further comprising means for measuring an intensity distribution of the input light beam, and the plurality of first mirrors based on the intensity distribution. And the attitude of the plurality of second mirrors is controlled.
[0012]
The invention according to claim 5 is the light beam generating device according to claim 3 or 4, wherein the output light beam is irradiated onto an object, and the irradiation position of the output light beam on the object is The postures of the plurality of first mirrors and the plurality of second mirrors are controlled according to the relative movement direction with respect to the object.
[0013]
A sixth aspect of the present invention is the light beam generating apparatus according to any one of the first to fourth aspects, wherein the output light beam from the second mirror device is an input light beam. Further comprising another combination of a device, the optical system and the second mirror device.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 is a diagram showing a configuration of a light irradiation apparatus 1 according to the first embodiment of the present invention.
[0015]
In the light irradiation apparatus 1, for example, annealing or the like is performed on the substrate by irradiating the surface of the substrate with light. The light irradiation apparatus 1 includes a stage 2 that supports a substrate 9, a stage moving mechanism 21 that moves the stage 2 in the X direction or the Y direction in FIG. 1, a head unit 3 that generates a light beam, and a head unit 3 and The control unit 4 is connected to the stage moving mechanism 21, and the substrate 9 is irradiated with the light beam from the head unit 3. The stage 2 is provided with a cover provided with an intake port, an exhaust port, and a transparent window that transmits the light beam, if necessary, so that the substrate 9 is irradiated with the light beam in a predetermined gas atmosphere. May be.
[0016]
The head unit 3 includes a light source 31 that is a laser (or a point light source lamp) that emits light, and two DMDs 32 and 33 in which a plurality of micromirrors whose postures can be individually changed are arranged, and an optical system is provided. Then, the light beam from the light source 31 is spatially modulated by the two DMDs 32 and 33 and irradiated onto the substrate 9. The DMDs 32 and 33 are, for example, 1280 × 1024 micromirrors arranged on a 18 mm square chip, and the postures of the micromirrors are inclined at a plurality of angles about the diagonal line of the reflecting surface.
[0017]
In the head unit 3, the light emitted from the light source 31 is guided to the collimator lens 341 while spreading by the lens 340, and a light beam parallel to the optical axis J1 is derived. The light beam from the collimator lens 341 is guided to the beam splitter 343 via the shutter 342, and a part of the light beam is guided to the intensity distribution measuring unit 35 having a plurality of illuminance sensors. The intensity distribution measurement unit 35 constantly measures the intensity distribution of the light beam from the light source 31 and outputs the measurement result to the control unit 4. Note that the intensity distribution of the light beam does not necessarily need to be constantly measured, and the provision of the light beam to the intensity distribution measuring unit 35 or the provision of a prism or the like that can advance or retreat (or rotate) with respect to the optical path. Switching of interruption may be performed.
[0018]
Further, in the beam splitter 343, the remaining light beam is incident on the DMD (hereinafter referred to as “first DMD”) 32 and is applied to the micromirror group. The light beam incident on the first DMD 32 is hereinafter referred to as an “input light beam”.
[0019]
In the first DMD 32, each micromirror is set to one of two postures (first posture or second posture) having different orientations in accordance with an input from the control unit 4, and the first posture of the group of micromirrors. The light beam formed by only the reflected light of the input light beam from the minute mirror (hereinafter referred to as “first reflected light beam”) and the reflected light of the input light beam from the minute mirror in the second posture A light beam formed only by this (hereinafter referred to as “second reflected light beam”) is generated. The first reflected light beam and the second reflected light beam pass through different paths by the optical system 36 to the next DMD (hereinafter referred to as “second DMD”) 33 arranged at a conjugate position with respect to the first DMD 32. It is guided.
[0020]
In the second DMD 33, the first reflected light beam and the second reflected light beam are respectively reflected in the same direction toward the condenser lens 344, and are formed by the reflected light of the first reflected light beam and the reflected light of the second reflected light beam. A light beam (hereinafter referred to as “output light beam”) is collected by the condenser lens 344 and guided to the galvanometer mirror 37. The galvanometer mirror 37 vibrates within a predetermined rotation angle about a central axis parallel to the X axis. The output light beam reflected by the galvanometer mirror 37 is guided to the lens 38 while moving in the Y direction.
[0021]
When the focal length is f and the angle between the incident light and the optical axis is θ, the lens 38 has a distance y in the Y direction between the light irradiation position on the surface of the substrate 9 and the optical axis. (Y = f × θ) is a lens (so-called fθ lens), and the output light beam incident on the lens 38 is guided to a corresponding position on the substrate 9 according to an angle θ formed with the optical axis. .
[0022]
The stage moving mechanism 21 includes a Y direction moving mechanism 22 that moves the stage 2 in the Y direction in FIG. 1 and an X direction moving mechanism 23 that moves in the X direction. In the Y-direction moving mechanism 22, a ball screw (not shown) is connected to the motor 221, and when the motor 221 rotates, the X-direction moving mechanism 23 moves along the guide rail 222 in the Y direction in FIG. The X-direction moving mechanism 23 has the same configuration as the Y-direction moving mechanism 22. When the motor 231 rotates, the stage 2 moves in the X direction along the guide rail 232 by a ball screw (not shown).
[0023]
FIG. 2 is a diagram illustrating a state when the first DMD 32 is viewed from the (−Z) side in the (+ Z) direction. As described above, the first DMD 32 generates the first reflected light beam or the second reflected light beam from the incident light beam (that is, the input light beam), and the first reflected light beam is the lens 361 as shown in FIG. To the mirror 365. In addition, the second reflected light beam is guided to an optical filter 364 (for example, an ND filter (neutral density filter) having a transmittance of 80%), the intensity of the light beam is changed, and the mirror 366 is passed through the lens 362. Led. Then, the first reflected light beam is reflected by the mirror 365 and guided to the second DMD 33 through the lens 367 indicated by a broken line in FIG. 1, and the second reflected light beam is reflected by the mirror 366 and passes through the lens 368. To the second DMD 33. The mirrors 365 and 366 are arranged symmetrically with respect to each other about a symmetry plane that is parallel to the YZ plane and passes through the centers of the DMDs 32 and 33, and the distance from the first DMD 32 or the distance from the second DMD 33 is equal to each other. .
[0024]
Here, the plurality of micromirrors of the first DMD 32 (hereinafter referred to as “first mirror”) and the plurality of micromirrors of the second DMD 33 (hereinafter referred to as “second mirror”) are associated one-to-one. The elements of the first reflected light beam or the second reflected light beam (hereinafter referred to as “reflected light beam elements”) derived from each of the plurality of first mirrors are correspondingly reflected by the optical system 36. Guided to the mirror. Each second mirror is changed to a posture corresponding to the posture of the first mirror from which the incident reflected light beam element is emitted.
[0025]
For example, when one first mirror is in the first posture, the corresponding second mirror is a reflected light beam element incident from the lens 367 (that is, the element of the first reflected light beam whose intensity is not changed). Is reflected to the condenser lens 344, and the first mirror is in the second position, the reflected light beam element incident from the lens 368 (that is, the light beam incident on the first mirror). The second reflected light beam element, which has an intensity of 80% compared to the second reflected light beam, is reflected by the second mirror to the condenser lens 344. As a result, all of the reflected light beam elements incident on each of the plurality of second mirrors are reflected toward the condensing lens 344 to form a set of reflected light beam elements (that is, an output light beam). The light irradiation area on the substrate 9 corresponding to each of the mirrors is irradiated with a light beam having one of two types of intensity (100% or 80% intensity).
[0026]
When the annealing process is performed on the substrate 9 in the light irradiation apparatus 1 (that is, light is irradiated), the stage 2 starts moving by the control unit 4 controlling the stage moving mechanism 21 first. Then, the substrate 9 continuously moves in the X direction. The substrate 9 is irradiated with light by controlling the head unit 3 in synchronization with the stage moving mechanism 21.
[0027]
Specifically, as long as the rotation direction of the galvanometer mirror 37 is the direction in which the irradiation position of the light beam on the substrate 9 moves in the (+ Y) direction, the shutter 342 is opened and the light beam is guided onto the substrate 9. The intensity of the light beam applied to the light irradiation region 61 included in the (+ Y) side portion of the light irradiation region group on the substrate 9 illustrated in FIG. The intensity of the light beam irradiating 61 is set to 80%.
[0028]
At this time, in the head unit 3, the intensity distribution of the light beam incident on the first DMD 32 is acquired by the intensity distribution measurement unit 35, and the plurality of first mirrors and the plurality of second mirrors are acquired by the control unit 4 based on the measurement result of the intensity distribution. Is controlled as necessary. For example, the intensity of the light beam element incident on the first mirror corresponding to the light irradiation area 61 (that is, the light irradiation area 61 located on the (+ Y) side) to be irradiated with light at 80% of the maximum intensity. Is relatively strong (for example, the intensity near the maximum intensity of the input light beam), the attitude of the first mirror is the second attitude, and the intensity of the light beam element incident on the first mirror is 80%. The size is changed and guided to the second mirror. In addition, when the intensity of the incident light beam element is relatively weak (for example, about 80% of the maximum intensity of the input light beam), the attitude of the first mirror is the first attitude. The intensity of light incident on one mirror is guided to the second mirror without being changed. Thereby, it is realized that the intensity distribution is made uniform in a region where light should be irradiated with an intensity of at least 80%.
[0029]
On the other hand, while the rotation direction of the galvano mirror 37 is a direction in which the irradiation position of the light beam on the substrate 9 is moved in the (−Y) direction, the shutter 342 is closed and the light beam is not guided onto the substrate 9. Put into a state. As described above, in the light irradiation apparatus 1, the opening and closing of the shutter 342 is controlled according to the rotation direction of the galvanometer mirror 37, and the light beam whose intensity distribution is changed is intermittently irradiated onto the substrate 9.
[0030]
As described above, in the head unit 3 of the light irradiation device 1, the light beam incident from the light source 31 is reflected by the first DMD 32 and travels in the first direction (that is, travels to the mirror 365). , And a second reflected light beam that is directed in the second direction (ie, toward the mirror 366). Then, the intensity of the second reflected light beam is changed by the optical filter 364 provided on the optical path of the second reflected light beam, and the first reflected light beam and the second reflected light beam are guided to the second DMD 33. Reflected in a predetermined direction. As a result, the head unit 3 can easily generate a light beam whose intensity distribution can be changed. Further, since the light irradiation apparatus 1 can irradiate the substrate 9 with a light beam having a relatively weak intensity on the head side in the relative movement direction of the irradiation position on the substrate 9 during the annealing process, the substrate 9 rapidly Thus, the substrate 9 can be appropriately treated.
[0031]
In the head unit 3 of FIG. 1, lenses 361 and 362 are provided to remove the influence of diffraction by the first DMD 32. Specifically, the first DMD 32 is located at the focal position of the lenses 361 and 362 on the light source 31 side. The focal positions of the lenses 361 and 362 on the second DMD 33 side coincide with the focal positions of the lenses 367 and 368 on the first DMD 32 side, and the second DMD 33 is disposed at the focal positions of the lenses 367 and 368 on the substrate 9 side. However, the lenses 361 and 362 may be omitted. In this case, the optical path length between the DMDs 32 and 33 is preferably shortened. For example, when the irradiation region of the light beam on the DMDs 32 and 33 is a circular region having a diameter of 20 mm and the reflected light is guided to a circular region having a diameter of 100 μm on the substrate 9, the focal depth is set to 10 μm. The optical path length between the DMDs 32 and 33 is 400 mm (= (2 × 10 4 / 100) 2 × 10) is preferably within.
[0032]
Further, in the light irradiation apparatus 1, the galvano mirror 37 is omitted, and the irradiation position of the light beam on the substrate 9 can be arbitrarily moved in the X and Y directions relative to the substrate 9 only by the stage moving mechanism 21. Good. In this case, in the light irradiation apparatus 1, the intensity distribution of the light beam to each light irradiation region is freely changed by the control unit 4 according to the relative movement direction of the irradiation position of the light beam on the substrate 9 with respect to the substrate 9.
[0033]
For example, when the irradiation position of the light beam on the substrate 9 moves relative to the substrate 9 in the (+ Y) direction by the movement of the stage 2, as shown in FIG. The intensity of the light beam irradiated to the light irradiation region 61 included in the part on the side) is 80% of the intensity of the light beam irradiated to the remaining light irradiation region 61. Further, when the irradiation position of the light beam relatively moves in the (−Y) direction, the light irradiation area included in the (−Y) side portion to which the parallel oblique lines are added in the light irradiation area group shown in FIG. 4. The intensity of the light beam irradiated to 61 is 80% of the intensity of the light beam irradiated to the remaining light irradiation region 61.
[0034]
As described above, in the head unit 3 of the light irradiation device 1, the postures of the plurality of first mirrors and the plurality of second mirrors are controlled by the control unit 4 in synchronization with the stage moving mechanism 21. The intensity distribution of the light beam can be changed quickly and flexibly according to the relative movement direction of the irradiation position of the beam with respect to the substrate 9.
[0035]
FIG. 5 is a diagram showing the head unit 3a of the light irradiation apparatus according to the second embodiment, and shows only a part of the head unit 3a. In addition to the first DMD 32, the optical system 36, and the second DMD 33 in the head unit 3 of FIG. 1, the head unit 3a of FIG. 5 includes a third DMD 32a, a second optical system 36a, and a fourth DMD 33a that have the same configuration as these. The output light beam from the second DMD 33 is guided to the third DMD 32a via the mirrors 345 and 346. Other configurations are the same as those in FIG.
[0036]
In the third DMD 32a, similarly to the first DMD 32, a third reflected light beam toward the lens 361a and a fourth reflected light beam toward the lens 362a are generated, and the third DMD 32a and the lens are on the optical path of the fourth reflected light beam. Between the 362a, an optical filter 364a having a transmittance of 90% is provided. The third reflected light beam is guided to the fourth DMD 33a via the mirror 365a and the lens 367a, and the fourth reflected light beam is guided to the fourth DMD 33a via the mirror 366a and the lens 368a. Then, the fourth reflected light beam and the third reflected light beam are reflected in the same direction toward the condenser lens 344 by the fourth DMD 33a.
[0037]
In the head unit 3a in FIG. 5, each micromirror of the DMDs 32, 33, 32a, 33a is associated with one to one. That is, the reflected light (that is, the reflected light beam element) of the light beam element incident on one first mirror is guided to the corresponding second mirror by the optical system 36, and the reflected light beam element is reflected from the second mirror. The light is guided through the mirrors 345 and 346 to the corresponding minute mirror of the third DMD 32a (hereinafter referred to as “third mirror”). Then, the reflected light from the third mirror is guided by the optical system 36a to the corresponding minute mirror of the fourth DMD 33a (hereinafter referred to as “fourth mirror”).
[0038]
Thereby, in the head part 3a of FIG. 5, it becomes possible to change the intensity | strength of the light beam element irradiated to the light irradiation area | region group on the board | substrate 9 separately to 4 gradations. That is, in order to irradiate one light irradiation region 61 with the light beam element having the maximum intensity (that is, 100% intensity), the reflected light beam element from the corresponding first mirror is included in the first reflected light beam. The light is guided to the second mirror, and the reflected light of the reflected light beam element is included in the third reflected light beam by the third mirror and guided to the fourth mirror. Similarly, in order to irradiate a light beam element having an intensity of 90% of the maximum intensity, the reflected light beam element is included in the first reflected light beam by the first mirror and then the fourth reflected light beam by the third mirror. It is included and guided to the fourth mirror. In order to irradiate a light beam element having an intensity of 80%, it is included in the second reflected light beam by the first mirror, and is then included in the third reflected light beam by the third mirror and guided to the fourth mirror. In order to irradiate a light beam element having an intensity of 72%, it is included in the second reflected light beam by the first mirror, and is then included in the fourth reflected light beam by the third mirror and guided to the fourth mirror.
[0039]
As described above, in the head unit 3a of FIG. 5, the third DMD 32a, the optical system 36a, and the fourth DMD 33a, which are another combination of the first DMD 32, the optical system 36, and the second DMD 33, are further provided, and the output light beam of the second DMD 33 is provided. This is the input light beam of the third DMD 32a. Thereby, in the head part 3a, the intensity distribution of the light beam can be changed to multiple gradations, and fine processing can be performed on the substrate 9.
[0040]
FIG. 6 is a diagram illustrating the head unit 3b of the light irradiation apparatus according to the third embodiment, and corresponds to FIG. The head unit 3b in FIG. 6 further includes a lens 363, an optical filter 364b, and a mirror 369, as compared with the head unit 3 in FIG.
[0041]
In the head unit 3b of FIG. 6, the orientation of each first mirror can be set to the third posture in which the incident light beam element is reflected toward the mirror 369 in addition to the first posture and the second posture. Then, a reflected light beam element directed to one of the mirrors 365, 366, and 369 is derived from each first mirror. At this time, the third reflected light beam formed by the set of reflected light beam elements derived from the first mirror in the third posture is the same as the second reflected light beam in the optical path provided on the optical path. The light intensity is reduced by the filter 364 b (however, the transmittance is different from that of the optical filter 364), and is guided to the mirror 369 by the lens 363. Then, the reflected light is guided to the second DMD 33 through a lens (not shown) (see FIG. 1). Similarly to the first mirror, the second mirror can have three different postures, and the third reflected light beam is directed toward the condenser lens 344 in the same manner as the first reflected light beam and the second reflected light beam. Are reflected in the same direction. Thereby, in the head part 3b of FIG. 6, the intensity | strength of the light beam element irradiated to each light irradiation area | region can be changed into 3 gradations separately.
[0042]
As described above, in the head portion 3b of FIG. 6, the first DMD 32 also generates the third reflected light beam that reflects the input light beam and travels in the third direction, and adds another light beam on the optical path of the third reflected light beam. An optical filter 364b is provided. Then, the second DMD 33 reflects the first to third reflected light beams in a predetermined direction, so that the head unit 3b can generate a light beam whose light intensity distribution is changed to multiple gradations.
[0043]
Note that a plurality of head portions 3b may be connected in series as in the head portion 3a of FIG. 5 to generate a light beam whose intensity distribution can be changed in more gradations.
[0044]
Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications can be made.
[0045]
The head portion in the above-described embodiment is particularly suitable for an application of processing the substrate 9 using light beam energy such as laser ablation, laser cleaning, and laser annealing, but other applications such as pattern drawing, for example. May be used.
[0046]
The intensity distribution of the output light beam is, for example, a comparison of the intensity of the light beam irradiated to the light irradiation region located near the center in the light irradiation region group when the substrate 9 is subjected to laser cleaning. A light beam having an annular intensity distribution may be generated. This prevents the temperature on the center line of the linear region irradiated with the light beam from being excessively increased when the light beam is scanned.
[0047]
Furthermore, the head unit can be used to make the intensity distribution of the light beam irradiated to the object uniform (acts as a so-called homogenizer). For example, even when the intensity distribution varies due to a change over time of a lamp or the like used for a light source (for example, due to deterioration), the head unit corrects the intensity distribution to generate a substantially uniform light beam. be able to.
[0048]
The mirror device provided in the head unit is not limited to the DMD used in the above-described embodiment, and for example, a mirror in which a posture is controlled using a piezoelectric element may be arranged. In other words, various mirror devices can be used as long as they have a plurality of mirrors whose postures can be individually changed.
[0049]
An optical element that changes the intensity of the light beam provided on the optical path of the second reflected light beam (or the fourth reflected light beam of the second embodiment or the third reflected light beam of the third embodiment) is provided. The optical filter is not necessarily required. For example, the intensity of the light beam may be changed by providing mirrors 366, 366a, and 369 having different reflectivities. In the optical system, an optical element that changes the intensity of light may also be provided on the optical path of the first reflected light beam (or the third reflected light beam in the second embodiment).
[0050]
Further, the irradiation position of the output light beam on the substrate 9 may be moved, for example, by providing a rotating polygon mirror in the head unit or by providing a moving mechanism in the head unit.
[0051]
The substrate 9 irradiated with the light beam from the head portion can be used not only for a semiconductor substrate but also for heat treatment for a glass substrate for a flat panel display device such as a liquid crystal display device or a plasma display device. Moreover, the target object to which light is irradiated does not necessarily need to be what is called a board | substrate, for example, ultraviolet curable resin etc. may be used as a target object.
[0052]
【The invention's effect】
According to the first to sixth aspects of the present invention, it is possible to easily generate a light beam whose intensity distribution can be changed using a mirror device.
[0053]
In the inventions of claims 2 and 6, the intensity distribution of the light beam can be changed to multiple gradations.
[0054]
In the invention of claim 4, the intensity distribution of the light beam can be appropriately changed. In the invention of claim 5, the object can be irradiated with the light beam and appropriately processed.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating a configuration of a light irradiation apparatus.
FIG. 2 is a diagram for explaining how a first reflected light beam and a second reflected light beam are generated.
FIG. 3 is a diagram showing a light irradiation region on a substrate.
FIG. 4 is a diagram showing a light irradiation region on a substrate.
FIG. 5 is a diagram illustrating a head unit according to a second embodiment.
FIG. 6 is a diagram illustrating a head unit according to a third embodiment.
[Explanation of symbols]
3, 3a, 3b Head
4 Control unit
9 Board
21 Stage moving mechanism
31 Light source
32, 33, 32a, 33a DMD
35 Strength distribution measurement unit
36, 36a optical system
37 Galvano mirror
364, 364a, 364b Optical filter

Claims (6)

  1. A light beam generator comprising:
    A light source;
    A plurality of first mirrors whose postures can be individually changed, a first reflected light beam that reflects an input light beam from the light source and travels in a first direction, and a second reflection that travels in a second direction A first mirror device for generating a light beam;
    An optical system for guiding the first reflected light beam and the second reflected light beam to a predetermined position;
    A plurality of second mirrors whose postures can be individually changed, arranged at the predetermined position, and reflecting the first reflected light beam and the second reflected light beam in a predetermined direction to generate an output light beam; A second mirror device to be generated;
    With
    The optical system includes an optical element that changes an intensity of the light beam on an optical path of the second reflected light beam;
    The plurality of first mirrors and the plurality of second mirrors are associated with each other in a one-to-one correspondence, and reflected light beams from each of the plurality of first mirrors in the first direction or the second direction. Elements are derived,
    The reflected light beam element is guided by the optical system to a second mirror corresponding to the first mirror that emits the reflected light beam element, and the reflected light beam element is moved in the predetermined direction by the second mirror. A light beam generation apparatus characterized by being reflected.
  2. The light beam generator according to claim 1,
    The first mirror device also generates a third reflected light beam that reflects the input light beam and travels in a third direction;
    The optical system guides the third reflected light beam to the predetermined position;
    The second mirror device reflects the first to third reflected light beams in the predetermined direction to generate the output light beam;
    The optical system includes another optical element that changes an intensity of the light beam on an optical path of the third reflected light beam;
    The reflected light beam element is guided from each of the plurality of first mirrors in the first direction, the second direction, or the third direction.
  3. The light beam generator according to claim 1 or 2,
    The light beam generating apparatus further comprising a control unit that controls the postures of the plurality of first mirrors and the plurality of second mirrors.
  4. The light beam generating apparatus according to claim 3,
    Means for measuring an intensity distribution of the input light beam;
    The light beam generating device, wherein the postures of the plurality of first mirrors and the plurality of second mirrors are controlled based on the intensity distribution.
  5. The light beam generating device according to claim 3 or 4,
    The output light beam is irradiated onto an object;
    An attitude of the plurality of first mirrors and the plurality of second mirrors is controlled according to a relative movement direction of the irradiation position of the output light beam on the object with respect to the object. .
  6. The light beam generating apparatus according to any one of claims 1 to 4,
    A light beam generation apparatus further comprising another combination of the first mirror device, the optical system, and the second mirror device, wherein the output light beam from the second mirror device is an input light beam. .
JP2003113643A 2003-04-18 2003-04-18 Light beam generator Expired - Fee Related JP4169264B2 (en)

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