CN1958664A - 液状环氧树脂组合物 - Google Patents
液状环氧树脂组合物 Download PDFInfo
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- CN1958664A CN1958664A CNA2006101379788A CN200610137978A CN1958664A CN 1958664 A CN1958664 A CN 1958664A CN A2006101379788 A CNA2006101379788 A CN A2006101379788A CN 200610137978 A CN200610137978 A CN 200610137978A CN 1958664 A CN1958664 A CN 1958664A
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- Prior art keywords
- epoxy resin
- liquid epoxy
- resin composition
- integer
- composition
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 171
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 title claims abstract description 120
- 150000001412 amines Chemical class 0.000 claims abstract description 55
- 239000004065 semiconductor Substances 0.000 claims abstract description 46
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 37
- 239000007787 solid Substances 0.000 claims abstract description 23
- 239000011256 inorganic filler Substances 0.000 claims abstract description 13
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 13
- 239000003351 stiffener Substances 0.000 claims description 61
- 229920005989 resin Polymers 0.000 claims description 47
- 239000011347 resin Substances 0.000 claims description 47
- 239000004593 Epoxy Substances 0.000 claims description 39
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 30
- 229920001296 polysiloxane Polymers 0.000 claims description 23
- 238000007789 sealing Methods 0.000 claims description 22
- 229910052799 carbon Inorganic materials 0.000 claims description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 12
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 9
- 150000004982 aromatic amines Chemical class 0.000 claims description 9
- 238000009835 boiling Methods 0.000 claims description 8
- 229940044174 4-phenylenediamine Drugs 0.000 claims description 7
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 claims description 7
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 5
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 claims description 3
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- 239000003795 chemical substances by application Substances 0.000 abstract description 15
- 238000000034 method Methods 0.000 abstract description 15
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- 239000003822 epoxy resin Substances 0.000 abstract description 13
- 230000008569 process Effects 0.000 abstract description 3
- 125000003277 amino group Chemical group 0.000 abstract 1
- 238000005476 soldering Methods 0.000 description 25
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- -1 phenolic aldehyde Chemical class 0.000 description 17
- 238000002360 preparation method Methods 0.000 description 17
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- 238000012360 testing method Methods 0.000 description 15
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 7
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- 238000002156 mixing Methods 0.000 description 6
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- PISLZQACAJMAIO-UHFFFAOYSA-N 2,4-diethyl-6-methylbenzene-1,3-diamine Chemical compound CCC1=CC(C)=C(N)C(CC)=C1N PISLZQACAJMAIO-UHFFFAOYSA-N 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 5
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- 230000000694 effects Effects 0.000 description 5
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- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 125000002769 thiazolinyl group Chemical group 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
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- 150000008065 acid anhydrides Chemical class 0.000 description 4
- OTBHHUPVCYLGQO-UHFFFAOYSA-N bis(3-aminopropyl)amine Chemical compound NCCCNCCCN OTBHHUPVCYLGQO-UHFFFAOYSA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- MNAHQWDCXOHBHK-UHFFFAOYSA-N 1-phenylpropane-1,1-diol Chemical compound CCC(O)(O)C1=CC=CC=C1 MNAHQWDCXOHBHK-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 3
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- 239000000654 additive Substances 0.000 description 3
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- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
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- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229920003656 Daiamid® Polymers 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 208000037656 Respiratory Sounds Diseases 0.000 description 2
- 208000034189 Sclerosis Diseases 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 230000000254 damaging effect Effects 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 239000000391 magnesium silicate Substances 0.000 description 2
- 229910052919 magnesium silicate Inorganic materials 0.000 description 2
- 235000019792 magnesium silicate Nutrition 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- OWJJRQSAIMYXQJ-UHFFFAOYSA-N pyrene-1,6-diamine Chemical compound C1=C2C(N)=CC=C(C=C3)C2=C2C3=C(N)C=CC2=C1 OWJJRQSAIMYXQJ-UHFFFAOYSA-N 0.000 description 2
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GRHFIPKABQYICC-UHFFFAOYSA-N 1,1'-biphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1.C1=CC=CC=C1C1=CC=CC=C1 GRHFIPKABQYICC-UHFFFAOYSA-N 0.000 description 1
- YFOOEYJGMMJJLS-UHFFFAOYSA-N 1,8-diaminonaphthalene Chemical compound C1=CC(N)=C2C(N)=CC=CC2=C1 YFOOEYJGMMJJLS-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- CDULGHZNHURECF-UHFFFAOYSA-N 2,3-dimethylaniline 2,4-dimethylaniline 2,5-dimethylaniline 2,6-dimethylaniline 3,4-dimethylaniline 3,5-dimethylaniline Chemical group CC1=CC=C(N)C(C)=C1.CC1=CC=C(C)C(N)=C1.CC1=CC(C)=CC(N)=C1.CC1=CC=C(N)C=C1C.CC1=CC=CC(N)=C1C.CC1=CC=CC(C)=C1N CDULGHZNHURECF-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
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- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- ZDBWYUOUYNQZBM-UHFFFAOYSA-N 3-(aminomethyl)aniline Chemical compound NCC1=CC=CC(N)=C1 ZDBWYUOUYNQZBM-UHFFFAOYSA-N 0.000 description 1
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- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
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- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
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- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- 238000004458 analytical method Methods 0.000 description 1
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- 125000001246 bromo group Chemical class Br* 0.000 description 1
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- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
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- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
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- 239000000539 dimer Substances 0.000 description 1
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- RNFGQNITEHYJQP-UHFFFAOYSA-N guanidine;toluene Chemical group NC(N)=N.CC1=CC=CC=C1 RNFGQNITEHYJQP-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
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- 239000001257 hydrogen Substances 0.000 description 1
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- 238000011835 investigation Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- NCBZRJODKRCREW-UHFFFAOYSA-N m-anisidine Chemical compound COC1=CC=CC(N)=C1 NCBZRJODKRCREW-UHFFFAOYSA-N 0.000 description 1
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Abstract
一种焊料连接性优异且适用于倒装芯片型半导体装置的无流动制法的胺硬化系环氧树脂组合物、以及使用该环氧树脂组合物制造的倒装芯片型半导体装置。本发明之液状环氧树脂组合物含有:(A)液状环氧树脂,(B)胺系硬化剂,以及相对于100重量份(A)成分的环氧树脂,50~900重量份(C)无机填充剂,其中以[(A)液状环氧树脂的环氧基摩尔量/(B)成分的氨基摩尔量]为0.6以上不足1.0的量,含有(B)胺系硬化剂,其中当(B)成分含有在室温~150℃下以固体状存在于组合物中的胺系硬化剂时,该固体状胺系硬化剂的量在合计100mol%的(B)成分中为30mol%以下。
Description
技术领域
本发明是关于一种可靠性及操作性优异且可使半导体装置的制造步骤简化的半导体密封用液状环氧树脂组合物、以及一种用该环氧树脂组合物进行密封的半导体装置。
背景技术
近年来,随着半导体封装(package)的小型化、薄型化及轻量化,半导体芯片的高密度化较为显着。作为高密度半导体芯片的代表性封装法,广泛进行有倒装芯片(flip chip)封装。作为倒装芯片封装的代表性方法,可列举将半导体芯片的焊料电极与封装基板电路上的焊料凸点(solder bump)或焊盘(solder land)直接进行焊料接合的C4工艺(Controlled Collapsed ChipConnect)。接合后,为了保护连接部,用环氧树脂密封半导体芯片与封装基板的缝隙。
在利用C4工艺的倒装芯片封装中,先前利用毛细流动(capillary flow)法来进行树脂密封,但因为1)利用助焊剂(flux)进行焊料润湿性改善处理、2)焊料连接、3)助焊剂清洗、4)利用液状密封树脂的毛细管现象进行注入、5)树脂硬化等步骤较多,树脂的注入也很费时间,所以存在生产性低的问题。特别是随着焊垫(pad)的微细化、精细间距(fine-pitch)化,助焊剂的清洗除去性会恶化,存在助焊剂残渣造成的密封树脂润湿性不良,或助焊剂残渣中的离子(ion)性杂质造成的半导体封装可靠性降低的问题,涉及助焊剂的技术性课题较多。
作为这些问题的对策,提出有如下无流动(noflow)法:在直接封装基板上涂布添加有助焊剂成分的密封树脂,将具备焊料电极的半导体芯片搭载在其上,通过回流焊(reflow)来同时进行焊料连接和树脂密封(专利文献1)。
对应于无流动(noflow)法,提出有兼具助焊剂性能的各种组合物,例如有使用具有助焊剂性能的硬化剂者、将酚树脂(phenol resin)作为硬化剂者(专利文献2)、将酚系羧酸(carboxylic acid)作为硬化剂者(专利文献3)、将酸酐(acid anhydride)作为硬化剂者(专利文献4、专利文献5)、将羧酸作为硬化剂者(专利文献6)、将芳香族羧酸酰肼(carboxylic acid hydrazide)作为硬化剂者(专利文献7)。
另外,作为其他添加助焊剂成分者,已知有在酚系或者酸酐系硬化剂中添加羧酸(包含嵌段羧酸(block carboxylic acid))作为助焊剂成分者(专利文献8、专利文献9、专利文献10)。
专利文献1:美国专利5128746号公报
专利文献2:日本专利特开2002-232123号公报
专利文献3:日本专利特开2003-128874号公报
专利文献4:日本专利特开2001-329048号公报
专利文献5:日本专利特开2003-160639号公报
专利文献6:日本专利特开2002-293883号公报
专利文献7:日本专利特开2004-303874号公报
专利文献8:日本专利特开2002-190497号公报
专利文献9:日本专利特开2003-82064号公报
专利文献10:日本专利特开2001-223227号公报
发明内容
上述组合物的硬化剂大多是酚系或者酸酐系。但是,一般而言,使用胺系硬化剂的粘合剂对各种基材的粘着性高,几乎不会产生从基板或芯片的界面剥离,且提供可靠性高的封装。在上述专利文献6中研讨有胺加成物系硬化剂,但却得出无助焊剂性能的结果。因此,本发明的目的在于提供一种含有可在无流动法中使用的胺系硬化剂的粘合剂组合物。
本发明者们对上述课题进行积极研究,结果发现,通过以特定量将胺系硬化剂添加到环氧树脂组合物中,可以获得可在无流动法中使用的半导体密封用环氧树脂组合物。
即,本发明是下述者:一种液状环氧树脂组合物,其含有
(A)液状环氧树脂,
(B)胺系硬化剂,以及
相对于100重量份(A)成分的环氧树脂,50~900重量份(C)无机填充剂,
其特征在于:
以(A)液状环氧树脂的环氧基摩尔量相对于(B)成分的氨基摩尔量之比,即[(A)液状环氧树脂的环氧基摩尔量/(B)成分的氨基摩尔量]为0.6以上不足1.0的量,含有(B)胺系硬化剂,其中当(B)成分含有在室温~150℃下以固体状存在于组合物中的胺系硬化剂时,该固体状胺系硬化剂的量在合计100mol%(B)成分中为30mol%以下。
另外,本发明是下述者:一种液状环氧树脂组合物,其含有
(A)液状环氧树脂,
(B)胺系硬化剂,
相对于100重量份(A)成分的环氧树脂,50~900重量份(C)无机填充剂,
其特征在于:
以(A)液状环氧树脂的环氧基摩尔量相对于(B)成分的氨基摩尔量之比,即[(A)液状环氧树脂的环氧基摩尔量/(B)成分的氨基摩尔量]为0.8~1.1的量,含有(B)胺系硬化剂,
以相对于(A)液状环氧树脂与(B)胺系硬化剂合计100重量份为0.1~20重量份的量,进一步含有(D)具有200℃以下的熔点及200℃以上的沸点的一元胺(monoamine)化合物。
进而,本发明是一种用于密封倒装芯片型半导体的上述液状环氧树脂组合物。另外,本发明提供一种含有上述液状环氧树脂组合物的硬化物的倒装芯片型半导体装置。
上述本发明的液状环氧树脂组合物不仅具有胺系硬化剂系的优异粘着性,而且利用该胺系硬化剂或特定一元胺化合物的助焊剂性能,可在利用无流动法的倒装芯片型半导体装置制造中适当使用。
附图说明
图1是表示倒装芯片型半导体装置的一例的剖面图。
1:电子电路基板
2:底部填充剂
3:焊垫
4:半导体芯片
5:焊料凸点
具体实施方式
以下,对各成分加以说明。
[(A)液状环氧树脂]
作为环氧树脂,每一分子具有2个以上环氧基且在常温下为液状者即可,可使用先前众所周知者。例如,可列举双酚A(bisphenol A)型环氧树脂、双酚AD型环氧树脂、双酚F型环氧树脂、萘(naphthalene)型环氧树脂、酚醛(phenol novolac)型环氧树脂、联苯(biphenyl)型环氧树脂、缩水甘油胺(glycidyl amine)型环氧树脂、脂环式环氧树脂(cycloaliphatic epoxyresin)、二环戊二烯型环氧树脂等作为环氧树脂。尤其优选使用耐热性或耐湿性优异的双酚A型环氧树脂、双酚F型环氧树脂、双酚AD型环氧树脂、萘型环氧树脂作为环氧树脂。
该环氧树脂,来源于其合成过程中所使用的表氯醇(epichlorohydrin)的氯所形成的总氯含量优选为1500ppm以下,特别优选为1000ppm以下。另外,在环氧树脂中添加等重量的离子交换水,在100℃、20小时的条件下进行萃取处理后水中氯浓度优选为10ppm以下。
[(B)胺系硬化剂]
在本发明中,胺系硬化剂广泛包含可与环氧树脂反应生成硬化物者,具有至少2个以上的含有活性氢之氨基。作为胺系硬化剂,可列举芳香族胺(aromatic amine)、脂肪族胺(aliphatic amine)、聚酰胺胺(polyamidoamine)、咪唑(imidazole)系硬化剂,胍(guanidine)系硬化剂,也可以是这些的混合物。
作为芳香族胺系硬化剂,例如可列举3,3′-二乙基-4,4′-二氨基二苯基甲烷(3,3′-diethyl-4,4′-diaminodiphenylmethane)、3,3′,5,5′-四甲基-4,4′-二氨基二苯基甲烷、3,3′,5,5′-四乙基-4,4′-二氨基二苯基甲烷、2,4-二氨基甲苯、1,4-苯二胺(1,4-phenylenediamine)、1,3-苯二胺、二乙基甲苯二胺、3,4-二氨基二苯醚、3,3-二氨基二苯基甲烷、3,4-二氨基二苯基甲烷、4,4-二氨基二苯基甲烷、3,3′-二氨基联苯胺(3,3′-diaminobenzidine)、邻联甲苯胺(o-tolidine)、3,3′-二甲基-4,4′-二氨基二苯基甲烷、3,3′-二乙基-4,4′-二氨基二苯基甲烷、2,4-二氨基甲苯、2,6-二氨基甲苯、1,4-苯二胺、1,3-苯二胺、1,8-二氨基萘等,也可以混合使用这些的2种以上。
作为脂肪族胺,可例示N,N′-双(3-氨基丙基)乙二胺(N,N′-bis(3-aminopropyl)ethylenediamine)、3,3-二氨基二丙胺、1,8-二氨基辛烷、1,10-二氨基癸烷、3,3-二氨基二丙胺、二亚乙基三胺(diethylenetriamine)、三亚乙基四胺、四亚乙基戊胺等链状脂肪族聚胺(polyamine),1,4-双(3-氨基丙基)哌嗪、N-(2-氨基乙基)哌嗪、N-(2-氨基乙基)吗啉、N-氨基乙基哌嗪、异氟尔酮二胺(isophorone diamine)等环状脂肪族聚胺;聚酰胺胺是通过二聚酸(dimer acid)与聚胺缩合而生成者,例如可例示己二酸二酰肼(adipic acid dihydrazide)、7,11-十八碳二烯-1,18-二碳酰肼;作为咪唑系硬化剂,可例示2-甲基咪唑(2-methylimidazole)、2-乙基-4-甲基咪唑、1,3-双(肼基羰乙基)-5-异丙基乙内酰脲(1,3-bis(hydrazinocarbonoethyl)-5-isopropylhydantoin);作为胍系硬化剂,可例示1,3-二苯胍、1,3-邻甲苯胍(1,3-o-tolylguanidine)。
这些胺化合物中,优选为1,2-苯二胺、1,3-苯二胺、或1,4-苯二胺、1,3-双(肼基羰乙基)-5-异丙基乙内酰脲及7,11-十八碳二烯-1,18-二碳酰肼。
(B)胺系硬化剂的含量为,(A)液状环氧树脂的环氧基摩尔量相对于(B)成分的氨基摩尔量之比,即[(A)液状环氧树脂的环氧基摩尔量/(B)成分的氨基摩尔量]不足1.0,优选为不足0.9,更加优选为不足0.8,且为0.6以上,更加优选为0.7以上。如果在上述范围内,则可在胺系硬化剂中,除了作为硬化剂的作用以外,还可以发挥作为助焊剂的效果。该比不足上述下限值时,有时会在硬化物中残留较多未反应的氨基,导致硬化物的玻璃转移温度(glasstransition temperature)降低,另外粘着强度降低。相反如果超过上述上限值,则有时会助焊剂性能降低,或硬化物变得硬而脆,在回流焊时产生裂纹(crack)。
其中,当(B)成分含有在室温~150℃下以固体状存在于组合物中的胺系硬化剂时,该固体状胺系硬化剂在合计100mol%(B)成分中为30mol%以下,优选为20mol%以下。该以固体状存在的胺系硬化剂是即使加热至150℃,也不会于(A)液状环氧树脂中溶解或膨润,或者在含有其他液状胺系硬化剂的情况下,也不会于该液状胺系硬化剂中者溶解或膨润。例如,上面所列举的硬化剂中,符合的是己二酸二酰肼。如果这些物质的含量多于上述量,则有时硬化物表面的平滑性会恶化。
即使在常温下为固体,也可以预先与环氧树脂或者液状芳香族胺熔融混合的情况下,在室温~150℃、优选为70~150℃下混合1小时~2小时。如果温度超过150℃,则可能与环氧树脂反应而使粘度上升。另外,混合时间如果不足1小时,则可能不能充分相溶且导致组合物之粘度上升,另外,如果超过2小时,则有时会与环氧树脂反应而使粘度上升。此外,对于在常温下为液状的硬化剂,希望在70~150℃的温度范围内混合1小时~2小时。
优选的是胺系硬化剂的沸点为200℃以上,优选为240℃以上。另外,优选的是胺当量为20~100,更加优选为25~50。如果胺当量超过上述上限值,则助焊剂性能会变得容易降低,所以并不优选,另外,如果胺当量为上述下限值以下,则有时硬化树脂会变得过硬,硬化树脂的与基材之粘着特性或耐裂纹性会恶化,所以并不优选。
此外,在含有后述(E)硅酮改性环氧树脂的情况下,代替[(A)成分的环氧基摩尔量],使[(A)成分的环氧基摩尔量+(E)成分的环氧基摩尔量]达到上述范围的量。另外,在(E)成分中含有酚性羟基的情况下,代替[(B)成分的氨基摩尔量],使[(B)成分的氨基摩尔量+(E)成分的酚性羟基摩尔量]达到上述范围的量。
[(D)一元胺]
可使用一元胺作为具有助焊剂性能的成分。该一元胺化合物的熔点为200℃以下且沸点为200℃以上,优选熔点为150℃以下且沸点为240℃以上。熔点超过200℃者在组合物中的相熔性恶化,且焊料的连接性恶化。另外,如果沸点不足200℃,则易于挥发,无法充分获得助焊剂效果,在硬化物中容易产生孔隙(void)。
作为一元胺,可例示邻甲氧基苯胺、间甲氧基苯胺、对甲氧基苯胺(anisidine)及二甲基苯胺等苯胺衍生物,2,4-二甲基苄胺(2,4-dimethylbenzylamine)、3-氨基苄胺、4-氨基苄胺等苄胺衍生物,优选使用对甲氧基苯胺及2,6-二乙基苯胺。
优选的是一元胺的氨基的活性氢当量(以下称作「胺当量」)为20~100,更加优选为25~50。如果胺当量超过上述上限值,则有时助焊剂性能会不充分。
在含有(D)一元胺化合物的情况下,以[(A)液状环氧树脂的环氧基摩尔量/(B)成分的氨基摩尔量]为0.8~1.1、优选为0.9~1.0的量含有(B)胺系硬化剂。
(D)成分的添加量相对于(A)成分以及(B)成分的合计量100重量份,为0.1~20重量份,优选为1~10重量份。添加量如果不足0.1重量份,则有时会无法获得充分的助焊剂性能,如果超过20重量份,则有时会导致硬化物的玻璃转移温度降低或粘着性降低。
在该一元胺化合物在常温下为固体的情况下,希望预先与液状环氧树脂或者液状芳香族胺一起在70~150℃的温度范围内混合1小时~2小时。
[(C)无机填充剂]
缩小硬化物的膨胀系数。作为该硬化剂,可以使用先前众所周知的各种无机填充剂。例如可列举熔融二氧化硅(silica)、结晶二氧化硅、氧化铝(alumina)、氧化钛(titanium oxide)、二氧化硅二氧化钛(silica titania)、氮化硼、氮化铝、氮化硅、氧化镁(magnesia)、硅酸镁(magnesium silicate)、铝等,也可以组合使用这些的2种以上。其中,球形的熔融二氧化硅因为低粘度化,所以较为理想。
无机填充剂因为可以强化树脂与无机填充剂的结合强度,所以优选添加以硅烷偶合剂(silane coupling agent)、钛酸酯偶合剂(titanate agent)等偶合剂预先进行了表面处理者。作为此种偶合剂,优选使用:γ-缩水甘油氧基丙基三甲氧基硅烷(γ-glycidoxy propyl trimethoxysilane)、γ-缩水甘油氧基丙基甲基二乙氧基硅烷、β-(3,4-环氧基环己基)乙基三甲氧基硅烷等环氧基硅烷,N-β(氨基乙基)-γ-氨基丙基三甲氧基硅烷、γ-氨基丙基三乙氧基硅烷、N-苯基-γ-氨基丙基三甲氧基硅烷等氨基硅烷,γ-巯基硅烷等巯基硅烷等硅烷偶合剂。此处用于表面处理的偶合剂的添加量以及表面处理方法为众所周知的量及方法即可。
作为该情况下的无机填充剂的添加量,优选相对于100重量份环氧树脂添加50~900重量份,更优选在100~500重量份的范围内进行添加。不足50重量份时,可能膨胀系数较大,在冷热试验中导致产生裂纹。如果超过900重量份,则可能粘度变高且易于产生孔隙、或者利用无机填充剂的焊料连接性降低。
本发明的环氧树脂组合物除上述各成分以外,可在不损害本发明效果的范围内,视情况添加下述成分。
[(E)硅酮改性环氧树脂]
在本发明的液状环氧树脂组合物中,可以添加使硬化物的应力降低的硅酮改性环氧树脂作为低应力化剂。作为低应力化剂,可列举:粉末状、橡胶状、油状等的硅酮树脂;热可塑性树脂,例如液状的聚丁二烯橡胶(polybutadienegum)、丙烯酸核壳树脂(acrylic core/shell resin)等,但优选硅酮改性环氧树脂。特别优选添加如下获得的硅酮改性环氧树脂:将以下述通式(1)~(4)所表示的含有烯基之环氧树脂或者含有烯基之酚树脂与以下述平均组成式(5)所表示的1分子中的硅原子数为10~400、每分子的SiH基数为1~5的有机聚硅氧烷,进行众所周知的加成反应。
[化2]
[化3]
[化4]
[化5]
(其中,R1为氢原子、或者
[化6]
另外,R2为氢原子或甲基,X为氢原子或碳数1~6的一价烃基,n为0~50的整数,优选为1~20的整数,m为1~5的整数,特别优选为1)
HaR3 bSiO(4-a-b)/2 (5)
(其中,式中R3为取代或者非取代的一价烃基。a为0.01~0.1的正数,b为1.8~2.2的正数,1.81 a+b 2.3。)
此外,作为R3的一价烃基,优选碳数为1~10者,特别优选为1~8者,可列举:甲基、乙基、丙基、异丙基、丁基、异丁基、叔丁基、己基、辛基、癸基等烷基,乙烯基、烯丙基、丙烯基、丁烯基、己烯基等烯基,苯基、二甲苯基、甲苯基等芳基,苯甲基、苯乙基、苯丙基等芳烷基等,或者这些烃基的氢原子的一部分或全部以氯、氟、溴等卤素原子取代的氯甲基、溴乙基、三氟丙基等卤代一价烃基。可采用众所周知的方法,作为获得通过使上述含有烯基之树脂与有机聚硅氧烷(organopolysiloxane)进行反应而获得的共聚物的方法。
作为上述硅酮改性环氧树脂,优选下述结构(6)者。
[化7]
(上述式中,R4为氢原子或碳数1~6的一价烃基,R5为-CH2CH2CH2-、-OCH2-CH(OH)-CH2-O-CH2CH2CH2-或-O-CH2CH2CH2-。L为8~398,优选为18~198的整数,p为1~10的整数,q为1~10的整数。)
作为上述R4的碳数为1~6、优选为1~3的一价烃基,例如可列举:甲基、乙基、丙基、异丙基、丁基、叔丁基、戊基、己基等烷基;环戊基、环己基等环烷基;苯基等芳基;乙烯基、烯丙基等烯基等,这些之中优选为甲基。上述R4分别既可相同,也可以不同。
上述p及q分别为1~10,优选p及q分别为1~5的整数。如果p及或q超过10,则可能硬化树脂过硬、耐裂纹性或粘着性恶化、树脂的可靠性大为受损,所以并不优选。
上述L为8~398,优选为18~198的整数,如果L不足8,则缓和应力的聚硅氧烷部分的比例变小,无法充分获得低应力化的效果,所以并不优选,如果超过398,则分散性降低而易于分离,不仅树脂的质量不稳定,而且不能充分获得低应力化的效果,所以并不优选。
(E)成分的添加量通过以相对于100重量份(A)成分的液状环氧树脂,含有20重量份以下特别是2~15重量份的方式进行添加,可进一步降低应力。
作为上述共聚物的硅酮改性树脂的添加量,通过以相对于100重量份(A)成分的液状环氧树脂,含有0~20重量份二有机聚硅氧烷单位、特别是2~15重量份的方式进行添加,可进一步降低应力。此处二有机聚硅氧烷量以下述式表示。
聚硅氧烷量=(聚硅氧烷部分的分子量/(E)成分的分子量)×添加量
[其他添加剂]
在本发明的液状环氧树脂组合物中,可在不损害本发明目的的范围内视需要添加硬化促进剂(hardening accelerator)、界面活性剂(interfacial activeagent)、消泡剂(antifoam)、均化剂(leveling agent)、离子捕捉剂(iontrapping agent)、碳黑(carbon black)等颜料、染料及其他添加剂。
本发明的液状环氧树脂组合物,可通过将(A)液状环氧树脂、(B)胺系硬化剂、(C)含氮化合物、(D)无机填充剂、以及任意成分,同时或分别,视情况一边进行加热处理一边进行混合而得到。作为混合装置,并无特别限制,可使用具备搅拌、加热装置的擂溃(ライカイ)机、三辊研磨机(three roll mill)、球磨机(ball mill)、行星式混合机(planetary mixer)等。另外也可以将这些装置加以适当组合后使用。
此外,本发明的液状环氧树脂组合物的粘度在25℃下优选为1,000Pa·s以下,特别优选为500Pa·s以下。另外,该组合物的成形方法、成形条件优选为最初在100~120℃下加热约0.5小时,然后在150~175℃下进行0.5小时~4小时左右的热风处理(hot cure)。通过最初的加热,可以确实防止硬化后产生孔隙。另外如果在150~175℃下的加热不足0.5小时,则存在无法获得充分的硬化物特性的情况。
本发明中所使用的倒装芯片型半导体装置,例如如图1所示,通常是在有机基板1的布线图案面上经多个凸点5而搭载有半导体芯片4者,在上述有机基板1与半导体芯片4的缝隙以及凸点5间的缝隙中填充有底部填充剂2。本发明的组合物在用作底部填充材的情况下特别有效。
在使用本发明的液状环氧树脂组合物作为底部填充剂的情况下,优选其硬化物的玻璃转移温度以下的膨胀系数为20~40ppm/℃。
[实施例]
以下,根据实施例、比较例,具体说明本发明,但本发明并不限定于这些。另外,只要没有预先说明,则%、份就分别表示重量%、重量份。
使用下列物质。
(A)液状环氧树脂
环氧树脂(a)双酚F型环氧树脂:RE303S-L(日本化药股份有限公司制造,环氧当量:170)
环氧树脂(b)以下述式(7)所表示的3官能型环氧树脂:Epikote 630H(日本环氧树脂股份有限公司制造,环氧当量:101)
[化8]
(B)胺系硬化剂
1)3,3′-二乙基-4,4′-二氨基二苯基甲烷(日本化药股份有限公司制造,Kayahard A-A,胺当量:63.5)
2)二乙基甲苯二胺(Albemarle Corporation公司制造,Etacure 100,胺当量:44.6)
3)7,11-十八碳二烯-1,18-二碳酰肼(Amicure UDH,味之素精细化学股份有限公司制造)
4)1,3-双(肼基羰乙基)-5-异丙基乙内酰脲(Amicure VDH,味之素精细化学股份有限公司制造)
5)4,4-二氨基二苯基甲烷
6)1,4-苯二胺
7)3,3-二氨基二丙胺
(C)无机填充剂
球状二氧化硅:平均粒径2μm,最大粒径10μm的球状二氧化硅(龙森股份有限公司制造)
(D)一元胺化合物
1)对甲氧基苯胺
2)2,6-二乙基苯胺
(E)硅酮改性环氧树脂
下述式(8)的化合物与下述式(9)的化合物的加成聚合物(重量平均分子量3800,环氧当量291)
[化9]
[化10]
其他添加剂
碳黑:Denka Black(电气化学工业股份有限公司制造)
硅烷偶合剂:γ-缩水甘油氧基丙基三甲氧基硅烷(信越化学工业股份有限公司制造,KBM403)
参考例中使用的化合物
1)十八胺(octadecylamine)
2)苯胺
3)1,6-二氨基芘(1,6-diaminopyrene)
4)2-氨基乙醇(2-aminoethanol)
实施例1
将31.8重量份的环氧树脂(a)、31.8重量份的(b)、45.5重量份的硬化剂3,3′-二乙基-4,4′-二氨基二苯基甲烷、100重量份的球状二氧化硅、4重量份的硅酮改性环氧树脂、1重量份的硅烷偶合剂、以及1重量的份碳黑,以行星式混合机进行均匀混炼,然后以三辊混炼机将固形原料充分进行混合分散,将所得的混合物进行真空脱泡处理而获得液状环氧树脂组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.70。
实施例2
除将3,3′-二乙基-4,4′-二氨基二苯基甲烷的量设为35.4重量份以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.90。
实施例3
除将3,3′-二乙基-4,4′-二氨基二苯基甲烷的量设为39.8重量份以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.80。
实施例4
除使用26.3重量份的二乙基甲苯二胺代替3,3′-二乙基-4,4′-二氨基二苯基甲烷以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.85。
实施例5
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的7,11-十八碳二烯-1,18-二碳酰肼以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.87。
实施例6
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的1,3-双(肼基羰乙基)-5-异丙基乙内酰脲以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.86。
实施例7
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的4,4-二氨基二苯基甲烷以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.81。
实施例8
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的1,4-苯二胺以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.71。
实施例9
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的3,3-二氨基二丙胺以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.75。
实施例10
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的对甲氧基苯胺以外,与实施例1同样进行操作,制备组合物。
实施例11
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的2,6-二乙基苯胺以外,与实施例1同样进行操作,制备组合物。
参考例1
除使用63.8重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以外,与实施例1同样进行操作,制备组合物。在本实施例中,[环氧基摩尔量/氨基摩尔量]为0.5。
参者例2
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的十八胺以外,与实施例1同样进行操作,制备组合物。
参考例3
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的苯胺以外,与实施例1同样进行操作,制备组合物。
参考例4
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的1,6-二氨基芘以外,与实施例1同样进行操作,制备组合物。此外,1,6-二氨基芘以固体状进行分散。
参考例5
除使用33重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以及5重量份的2-氨基乙醇以外,与实施例1同样进行操作,制备组合物。
比较例1
除使用31.9重量份的3,3′-二乙基-4,4′-二氨基二苯基甲烷以外,与实施例1同样进行操作,制备组合物。[环氧基摩尔量/氨基摩尔量]为1.0。
比较例2
除使用22.4重量份的二乙基甲苯二胺以外,与实施例4同样进行操作,制备组合物。[环氧基摩尔量/氨基摩尔量]为1.0。
在表1中,表示所使用的胺系硬化剂以及胺化合物的特性。
[表1]
胺化合物 | 25℃下的状态 | 氨基的活性氢当量 | 熔点(℃) | 沸点(℃) |
3,3′-二乙基-4,4′-二氨基二苯基甲烷 | 固体 | 63.5 | - | 230/5mmHg |
二乙基甲苯二胺 | 固体 | 44.6 | - | 308 |
7,11-十八碳二烯-1,18-二碳酰肼 | 固体 | 91.5 | 160 | 200< |
1,3-双(肼基羰乙基)-5-异丙基乙内酰脲 | 固体 | 78.5 | 120 | 200< |
4,4-二氨基二苯基甲烷 | 固体 | 49.6 | 91 | 398 |
1,4-苯二胺 | 固体 | 27.0 | 142 | 267 |
3,3-二氨基二丙胺 | 液体 | 32.8 | - | 235 |
对甲氧基苯胺 | 固体 | 61.6 | 56 | 240 |
2,6-二乙基苯胺 | 固体 | 74.6 | - | 243 |
十八胺 | 固体 | 134.8 | 50 | 232 |
苯胺 | 液体 | 46.6 | - | 184 |
1,6-二氨基芘 | 固体 | 58.1 | 230 | - |
2-氨基乙醇 | 液体 | 30.6 | - | 170 |
根据下述方法评价各实施例的液状环氧树脂组合物。将结果示于表2及3。
(1)粘度
使用BH型旋转粘度计,以4rpm的旋转数来测定25℃时的粘度。
(2)保存性
在25℃/60%RH下保存树脂组合物,根据相对于初始粘度的放置48小时后的粘度变化率,对适用期(可使用时间)进行如下评价。此外,粘度测定以上述条件实施。
A:相对于初始粘度的变化率不足30%,适用期良好。
B:相对于初始粘度的变化率为30~50%,适用期稍微存在问题。
C:相对于初始粘度的变化率超过100%,适用期短而不充分。
(3)粘着强度
在涂布有感光性聚酰亚胺的硅芯片上,使用模板形成上面直径为2mm、下面直径为5mm、高为3mm的圆锥体状树脂硬化物,制成试验片。此外,试验片的成形条件为,在120℃下硬化0.5小时,然后在165℃下硬化3小时。硬化后,一边以0.2mm/sec的速度挤压获得的树脂硬化物的侧面一边进行测定,作为初始值。然后,将硬化的试验片放入PCT(高压蒸煮试验(pressure cooker test):121℃/2.1atm)中336小时后,测定粘着力。在任一情况下,试验片的片数都以5片进行,将其平均值记作粘着力。
(4)焊料连接性
使用倒装芯片型半导体芯片以及基板(4区域(area)/1chip,凸点数576个/1区域(area),具备Sn-3.0Ag-0.5Cu焊料),以分配器装置在基板上涂布树脂组合物后,以倒装芯片接合机(flip chip bonder)装置搭载半导体芯片(焊料接合条件:260℃/3sec,荷重10N),在120℃下硬化0.5小时,接着在165℃下硬化3小时,制成倒装芯片型半导体试验片。对各树脂组合物,制成10片试验片(合计40area),确认各area有无导通,评价焊料连接性。
(5)孔隙性
对用于评价上述焊料连接性而制成的倒装芯片型半导体试验片,使用超声波探伤装置(ultrasonic test equipment),确认在树脂中产生孔隙的芯片数。
(6)回流焊试验
对上述倒装芯片型半导体试验片中没有产生孔隙的10个,在30℃/65%RH/192小时放置后,以超声波探伤装置确认使其通过设定为最高温度265℃的IR回流焊炉5次后产生裂纹、剥离的芯片数;接着,放置在PCT(121℃/2.1atm)的环境下,确认336小时后产生裂纹、剥离的芯片数。
(7)温度循环试验
对上述倒装芯片型半导体试验片中没有产生孔隙的10个,在30℃/65%RH/192小时放置后,将-65℃/30分钟、150℃/30分钟作为1个周期,确认在250、500、750、1000周期后产生裂纹、剥离的芯片数。
[表2]
试验结果 | 实施例 | |||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | ||
粘度(Pa s/25℃) | 38 | 45 | 41 | 32 | 69 | 68 | 66 | 65 | 41 | 65 | 38 | |
保存性 | A | A | A | A | A | A | A | A | A | A | A | |
粘着强度(MPa) | 初始 | 1170 | 1350 | 1240 | 1170 | 1400 | 1280 | 1360 | 1370 | 1340 | 1380 | 1270 |
PCT336hr后 | 1040 | 1240 | 1150 | 1050 | 1280 | 1180 | 1250 | 1230 | 1250 | 1240 | 1180 | |
焊料连接性 | 40/40 | 36/40 | 39/40 | 38/40 | 39/40 | 40/40 | 36/40 | 37/40 | 38/40 | 36/40 | 35/40 | |
孔隙 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | |
剥离 | IR炉5次后 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 |
PCT336hr后 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | |
温度循环 | 250周期 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 |
500周期 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | |
750周期 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | |
1000周期 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 | 0/10 |
[表3]
试验结果 | 参考例 | 比较例 | |||||||
1 | 2 | 3 | 4 | 5 | 1 | 2 | |||
粘度(Pa s/25℃) | 28 | 68 | 42 | 67 | 38 | 50 | 39 | ||
保存性 | A | A | B | A | C | A | A | ||
粘着强度(MPa) | 初始 | 690 | 890 | 1120 | 1230 | 1280 | 1450 | 1210 | |
PCT336hr后 | 150 | 450 | 680 | 1050 | 1120 | 1300 | 1060 | ||
焊料连接性 | 38/40 | 0/40 | 0/40 | 0/40 | 0/40 | 20/40 | 26/40 | ||
孔隙 | 0/10 | 0/10 | 10/10 | 0/10 | 10/10 | 0/10 | 0/10 | ||
剥离 | IR炉5次后 | 8/10 | 8/10 | 3/10 | 0/10 | 0/10 | |||
PCT336hr后 | 10/10 | 10/10 | 6/10 | 0/10 | 0/10 | ||||
温度循环 | 250周期 | 10/10 | 10/10 | 0/10 | 0/10 | 0/10 | |||
500周期 | 3/10 | 0/10 | 0/10 | ||||||
750周期 | 10/10 | 0/10 | 0/10 | ||||||
1000周期 | 0/10 | 0/10 |
从表2及3可知,各实施例的环氧树脂组合物的保存性、粘着性、焊料连接性优异,也不会产生孔隙。
在比较例1及2中,虽然硬化剂的量与环氧基为相同摩尔量,但助焊剂性能不充分。
参考例1中,硬化剂大量过剩,硬化物的粘着强度较低。
通常认为在参考例2中所使用的胺化合物是胺当量较大、所添加的量中氨基不足者。参考例3及5中使用的胺化合物的沸点较低在硬化物中产生孔隙。参考例4中使用的一元胺化合物的熔点高,对树脂系的相熔性差,在回流焊试验中产生剥离。
Claims (39)
1.一种液状环氧树脂组合物,其含有(A)液状环氧树脂,(B)胺系硬化剂,以及相对于100重量份(A)成分的环氧树脂,50~900重量份(C)无机填充剂,其特征在于:
以(A)液状环氧树脂的环氧基摩尔量相对于(B)成分的氨基摩尔量之比,即[(A)液状环氧树脂的环氧基摩尔量/(B)成分的氨基摩尔量]为0.6以上不足1.0的量,含有(B)胺系硬化剂,其中当(B)成分含有在室温~150℃下以固体状存在于组合物中的胺系硬化剂时,该固体状胺系硬化剂的量在合计100mol%(B)成分中为30mol%以下。
2.如权利要求1所述的液状环氧树脂组合物,其特征在于:上述摩尔比为0.6以上不足0.8的量。
3.如权利要求1所述的液状环氧树脂组合物,其特征在于:上述固体状胺系硬化剂的量在合计100mol%(B)成分中为20mol%以下。
4.如权利要求2所述的液状环氧树脂组合物,其特征在于:上述固体状胺系硬化剂的量在合计100mol%(B)成分中为20mol%以下。
5.如权利要求1至4中任一项所述的液状环氧树脂组合物,其特征在于:(B)胺系硬化剂含有芳香族胺。
6.如权利要求5所述的液状环氧树脂组合物,其特征在于:上述芳香族胺是选自1,2-苯二胺、1,3-苯二胺或1,4-苯二胺中的至少1种。
7.如权利要求1至4中任一项所述的液状环氧树脂组合物,其特征在于:(B)胺系硬化剂是选自1,3-双(肼基羰乙基)-5-异丙基乙内酰脲及7,11-十八碳二烯-1,18-二碳酰肼的至少1种。
9.如权利要求5所述的液状环氧树脂组合物,其特征在于:进一步含有相对于100重量份(A)液状环氧树脂为20重量份以下的(E)以式(6)表示的硅酮改性环氧树脂
[化1]
(式中,R4为氢原子或碳数1~6的一价烃基,R5为-CH2CH2CH2-、-OCH2-CH(OH)-CH2-O-CH2CH2CH2-或-O-CH2CH2CH2-,L为8~398,优选为18~198的整数,p为1~10的整数,q为1~10的整数)。
10.如权利要求6所述的液状环氧树脂组合物,其特征在于:进一步含有相对于100重量份(A)液状环氧树脂为20重量份以下的(E)以式(6)表示的硅酮改性环氧树脂
[化1]
(式中,R4为氢原子或碳数1~6的一价烃基,R5为-CH2CH2CH2-、-OCH2-CH(OH)-CH2-O-CH2CH2CH2-或-O-CH2CH2CH2-,L为8~398,优选为18~198的整数,p为1~10的整数,q为1~10的整数)。
11.如权利要求7所述的液状环氧树脂组合物,其特征在于:进一步含有相对于100重量份(A)液状环氧树脂为20重量份以下的(E)以式(6)表示的硅酮改性环氧树脂
[化1]
(式中,R4为氢原子或碳数1~6的一价烃基,R5为-CH2CH2CH2-、-OCH2-CH(OH)-CH2-O-CH2CH2CH2-或-O-CH2CH2CH2-,L为8~398,优选为18~198的整数,p为1~10的整数,q为1~10的整数)。
12.如权利要求1至4中任一项所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
13.如权利要求5所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
14.如权利要求6所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
15.如权利要求7所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
16.如权利要求8所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
17.如权利要求9所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
18.如权利要求10所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
19.如权利要求11所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
20.一种倒装芯片型半导体装置,其特征在于:含有如权利要求12至19中任一项所述的倒装芯片型半导体密封用液状环氧树脂组合物的硬化物。
21.一种液状环氧树脂组合物,其含有(A)液状环氧树脂,(B)胺系硬化剂,及相对于100重量份(A)成分的环氧树脂,50~900重量份(C)无机填充剂,其特征在于:
以(A)液状环氧树脂的环氧基摩尔量相对于(B)成分的氨基摩尔量之比,即[(A)液状环氧树脂的环氧基摩尔量/(B)成分的氨基摩尔量]为0.8~1.1的量,含有(B)胺系硬化剂,
以相对于(A)液状环氧树脂与(B)胺系硬化剂合计100重量份为0.1~20重量份的量,进一步含有(D)具有200℃以下的熔点及200℃以上的沸点的一元胺化合物。
22.如权利要求21所述的液状环氧树脂组合物,其特征在于:(D)一元胺化合物为苯胺衍生物。
23.如权利要求22所述的液状环氧树脂组合物,其特征在于:上述苯胺衍生物是选自对甲氧基苯胺及2,6-二乙基苯胺的至少1种。
24.如权利要求21至23中任一项所述的液状环氧树脂组合物,其特征在于:(B)胺系硬化剂含有芳香族胺。
25.如权利要求24所述的液状环氧树脂组合物,其特征在于:上述芳香族胺是选自1,2-苯二胺、1,3-苯二胺或1,4-苯二胺中的至少1种。
26.如权利要求21至23中任一项所述的液状环氧树脂组合物,其特征在于:(B)胺系硬化剂是选自1,3-双(肼基羰乙基)-5-异丙基乙内酰脲及7,11-十八碳二烯-1,18-二碳酰肼的至少1种。
29.如权利要求25所述的液状环氧树脂组合物,其特征在于:进一步含有相对于100重量份(A)液状环氧树脂为20重量份以下的(E)以式(6)表示的硅酮改性环氧树脂
[化1]
(式中,R4为氢原子或碳数1~6的一价烃基,R5为-CH2CH2CH2-、-OCH2-CH(OH)-CH2-O-CH2CH2CH2-或-O-CH2CH2CH2-,L为8~398,优选为18~198的整数,p为1~10的整数,q为1~10的整数)。
30.如权利要求26所述的液状环氧树脂组合物,其特征在于:进一步含有相对于100重量份(A)液状环氧树脂为20重量份以下的(E)以式(6)表示的硅酮改性环氧树脂
[化1]
(式中,R4为氢原子或碳数1~6的一价烃基,R5为-CH2CH2CH2-、-OCH2-CH(OH)-CH2-O-CH2CH2CH2-或-O-CH2CH2CH2-,L为8~398,优选为18~198的整数,p为1~10的整数,q为1~10的整数)。
31.如权利要求21至23中任一项所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
32.如权利要求24所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
33.如权利要求25所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
34.如权利要求26所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
35.如权利要求27所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
36.如权利要求28所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
37.如权利要求29所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
38.如权利要求30所述的液状环氧树脂组合物,其特征在于:液状环氧树脂组合物是倒装芯片型半导体密封用液状环氧树脂组合物。
39.一种倒装芯片型半导体装置,其特征在于:含有如权利要求31至38中任一项所述的倒装芯片型半导体密封用液状环氧树脂组合物的硬化物。
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US20070104960A1 (en) | 2007-05-10 |
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