CN1947254B - 光电子器件上的微光学元件 - Google Patents
光电子器件上的微光学元件 Download PDFInfo
- Publication number
- CN1947254B CN1947254B CN2005800133746A CN200580013374A CN1947254B CN 1947254 B CN1947254 B CN 1947254B CN 2005800133746 A CN2005800133746 A CN 2005800133746A CN 200580013374 A CN200580013374 A CN 200580013374A CN 1947254 B CN1947254 B CN 1947254B
- Authority
- CN
- China
- Prior art keywords
- optical
- layer
- wafer
- replication
- optoelectronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/16—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits
- H01L25/167—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/026—Wafer-level processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
- Optical Integrated Circuits (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Hybrid Cells (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Optical Measuring Cells (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04405110A EP1569276A1 (en) | 2004-02-27 | 2004-02-27 | Micro-optics on optoelectronics |
| EP04405110.0 | 2004-02-27 | ||
| PCT/CH2005/000109 WO2005083789A2 (en) | 2004-02-27 | 2005-02-25 | Micro-optics on optoelectronics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1947254A CN1947254A (zh) | 2007-04-11 |
| CN1947254B true CN1947254B (zh) | 2010-12-29 |
Family
ID=34746192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005800133746A Expired - Lifetime CN1947254B (zh) | 2004-02-27 | 2005-02-25 | 光电子器件上的微光学元件 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7457490B2 (enExample) |
| EP (2) | EP1569276A1 (enExample) |
| JP (1) | JP4903685B2 (enExample) |
| KR (1) | KR101194452B1 (enExample) |
| CN (1) | CN1947254B (enExample) |
| AT (1) | ATE498910T1 (enExample) |
| DE (1) | DE602005026367D1 (enExample) |
| TW (1) | TWI362058B (enExample) |
| WO (1) | WO2005083789A2 (enExample) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6297548B1 (en) | 1998-06-30 | 2001-10-02 | Micron Technology, Inc. | Stackable ceramic FBGA for high thermal applications |
| JP2009516913A (ja) * | 2005-11-22 | 2009-04-23 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 発光モジュール及びその製造方法 |
| JP2007258672A (ja) * | 2006-02-22 | 2007-10-04 | Sharp Corp | 発光ダイオード及びその製造方法 |
| JP4765663B2 (ja) * | 2006-02-23 | 2011-09-07 | パナソニック電工株式会社 | 赤外線通信用モジュールの製造方法 |
| US7785915B2 (en) * | 2006-10-30 | 2010-08-31 | Aptina Imaging Corporation | Wafer level method of locating focal plane of imager devices |
| US20080181558A1 (en) * | 2007-01-31 | 2008-07-31 | Hartwell Peter G | Electronic and optical circuit integration through wafer bonding |
| US7754600B2 (en) | 2007-03-01 | 2010-07-13 | Hewlett-Packard Development Company, L.P. | Methods of forming nanostructures on metal-silicide crystallites, and resulting structures and devices |
| US20090032925A1 (en) * | 2007-07-31 | 2009-02-05 | England Luke G | Packaging with a connection structure |
| US20100323105A1 (en) | 2007-08-31 | 2010-12-23 | Shigeru Hosoe | Molding method, optical element manufacturing method, and arrayed optical element |
| EP2060493B1 (en) * | 2007-11-13 | 2010-06-23 | Oy M. Haloila Ab | Film delivery device and use of same |
| TWI481496B (zh) | 2007-12-19 | 2015-04-21 | Heptagon Micro Optics Pte Ltd | 製造光學元件的方法 |
| TWI478808B (zh) | 2007-12-19 | 2015-04-01 | Heptagon Micro Optics Pte Ltd | 製造光學元件的方法 |
| SG142321A1 (en) | 2008-04-24 | 2009-11-26 | Micron Technology Inc | Pre-encapsulated cavity interposer |
| GB2460822A (en) * | 2008-06-03 | 2009-12-16 | Cambridge Display Tech Ltd | Organic electroluminescent device |
| US7920342B2 (en) * | 2008-07-01 | 2011-04-05 | Aptina Imaging Corporation | Over-molded glass lenses and method of forming the same |
| US8542310B2 (en) | 2008-07-04 | 2013-09-24 | Konica Minolta Opto, Inc. | Imaging lens, manufacturing method and imaging unit therefor |
| CN101364568B (zh) * | 2008-07-10 | 2011-11-30 | 旭丽电子(广州)有限公司 | 镜头模块的制造方法及以该方法所制成的镜头模块 |
| TWI419557B (zh) * | 2008-07-11 | 2013-12-11 | Lite On Electronics Guangzhou | 鏡頭模組、其製作方法及形成多個鏡頭模組的晶圓結構 |
| WO2010020062A1 (en) | 2008-08-20 | 2010-02-25 | Heptagon Oy | Method of manufacturing a pluralty of optical devices |
| JP5715747B2 (ja) * | 2008-09-30 | 2015-05-13 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 回路装置およびその製造方法 |
| US20110187878A1 (en) * | 2010-02-02 | 2011-08-04 | Primesense Ltd. | Synchronization of projected illumination with rolling shutter of image sensor |
| CN103201838A (zh) | 2010-06-14 | 2013-07-10 | 赫普塔冈微光学有限公司 | 制造多个光学设备的方法 |
| WO2013010285A1 (en) | 2011-07-19 | 2013-01-24 | Heptagon Micro Optics Pte. Ltd. | Method for manufacturing passive optical components, and devices comprising the same |
| SG193151A1 (en) | 2011-07-19 | 2013-09-30 | Heptagon Micro Optics Pte Ltd | Opto-electronic modules and methods of manufacturing the same and appliances and devices comprising the same |
| KR101890457B1 (ko) * | 2011-08-10 | 2018-08-21 | 헵타곤 마이크로 옵틱스 피티이. 리미티드 | 광전자 모듈 및 그것을 제조하기 위한 방법 |
| DE102011113483B4 (de) * | 2011-09-13 | 2023-10-19 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen einer Mehrzahl von optoelektronischen Bauelementen und optoelektronisches Bauelement |
| WO2013049948A1 (en) * | 2011-10-06 | 2013-04-11 | Heptagon Micro Optics Pte. Ltd. | Method for wafer-level manufacturing of objects and corresponding semi-finished products |
| US10431571B2 (en) | 2011-12-22 | 2019-10-01 | Ams Sensors Singapore Pte. Ltd. | Opto-electronic modules, in particular flash modules, and method for manufacturing the same |
| US9157790B2 (en) | 2012-02-15 | 2015-10-13 | Apple Inc. | Integrated optoelectronic modules with transmitter, receiver and beam-combining optics for aligning a beam axis with a collection axis |
| US9329080B2 (en) | 2012-02-15 | 2016-05-03 | Aplle Inc. | Modular optics for scanning engine having beam combining optics with a prism intercepted by both beam axis and collection axis |
| TWI707483B (zh) | 2012-07-17 | 2020-10-11 | 新加坡商新加坡恒立私人有限公司 | 發射可變強度分布的光線的光電模組 |
| WO2014012603A1 (en) | 2012-07-17 | 2014-01-23 | Heptagon Micro Optics Pte. Ltd. | Optical devices, in particular computational cameras, and methods for manufacturing the same |
| TW201417250A (zh) * | 2012-07-17 | 2014-05-01 | 海特根微光學公司 | 光學模組,特別是光電模組,及其製造方法 |
| TWM448798U (zh) * | 2012-08-10 | 2013-03-11 | 麥瑟半導體股份有限公司 | 光學元件封裝模組 |
| DE102012109183A1 (de) | 2012-09-27 | 2014-03-27 | Osram Opto Semiconductors Gmbh | Optoelektronische Vorrichtung |
| US8606057B1 (en) | 2012-11-02 | 2013-12-10 | Heptagon Micro Optics Pte. Ltd. | Opto-electronic modules including electrically conductive connections for integration with an electronic device |
| CN106133919B (zh) * | 2013-12-10 | 2019-07-05 | 新加坡恒立私人有限公司 | 晶元级光学组件及其制造方法 |
| US10018788B2 (en) | 2014-10-28 | 2018-07-10 | Hewlett Packard Enterprise Development Lp | Photonic interposer with wafer bonded microlenses |
| DE102014116134A1 (de) | 2014-11-05 | 2016-05-12 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines optoelektronischen Bauelements und optoelektronisches Bauelement |
| EP3243119A1 (de) * | 2015-01-06 | 2017-11-15 | Huf Hülsbeck & Fürst GmbH & Co. KG | Optische vorrichtung zur belichtung einer sensorvorrichtung für ein fahrzeug |
| CN108141011B (zh) | 2015-10-01 | 2020-09-01 | 通快光电器件有限公司 | 发光设备 |
| DE102016103123A1 (de) * | 2016-02-23 | 2017-08-24 | Vishay Semiconductor Gmbh | Optoelektronische Vorrichtung |
| WO2017176213A1 (en) * | 2016-04-08 | 2017-10-12 | Heptagon Micro Optics Pte. Ltd. | Thin optoelectronic modules with apertures and their manufacture |
| DE102017100997A1 (de) * | 2017-01-19 | 2018-07-19 | Osram Opto Semiconductors Gmbh | Halbleiterlaser und Verfahren zur Herstellung eines solchen Halbleiterlasers |
| KR102698883B1 (ko) * | 2019-02-22 | 2024-08-28 | 삼성디스플레이 주식회사 | 표시장치 및 그의 제조방법 |
| DE112020001297T5 (de) * | 2019-03-12 | 2021-12-16 | Ams Sensors Singapore Pte. Ltd. | Verfahren zur herstellung einer vielzahl von optischen elementen und produkt daraus |
| WO2020263871A1 (en) * | 2019-06-24 | 2020-12-30 | Magic Leap, Inc. | Polymer patterned disk stack manufacturing |
| US10777611B1 (en) * | 2019-09-27 | 2020-09-15 | Sony Semiconductor Solutions Corporation | Image sensor |
| US11747555B2 (en) | 2021-10-04 | 2023-09-05 | Eagle Technology, Llc | Optical assembly having commonly-shaped optical modules and associated methods |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1329357A (zh) * | 2000-06-08 | 2002-01-02 | 株式会社东芝 | 对准方法、套刻检查方法和光掩模 |
| EP1389804A2 (en) * | 2002-08-13 | 2004-02-18 | Agilent Technologies Inc. (a Delaware Corporation) | CMOS image sensor using gradient index chip scale lenses |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS56103483A (en) * | 1980-01-21 | 1981-08-18 | Fuji Photo Film Co Ltd | Manufacture of semiconductor device for photoelectric conversion |
| JPH07111343A (ja) * | 1993-10-13 | 1995-04-25 | Matsushita Electron Corp | 光電装置 |
| US20020053742A1 (en) * | 1995-09-01 | 2002-05-09 | Fumio Hata | IC package and its assembly method |
| US6235141B1 (en) * | 1996-09-27 | 2001-05-22 | Digital Optics Corporation | Method of mass producing and packaging integrated optical subsystems |
| JPH11340480A (ja) * | 1998-05-21 | 1999-12-10 | Tokai Rika Co Ltd | プラスティックパッケージ |
| JP2000275405A (ja) * | 1999-03-29 | 2000-10-06 | Canon Inc | マイクロ構造体アレイの作製方法、マイクロレンズアレイ用金型の作製方法、及びこれを用いたマイクロレンズアレイの作製方法 |
| US6436265B1 (en) | 1999-03-29 | 2002-08-20 | Canon Kabushiki Kaisha | Microstructure array, and apparatus and method for forming the microstructure array, and a mold for fabricating a microstructure array |
| US20040012698A1 (en) * | 2001-03-05 | 2004-01-22 | Yasuo Suda | Image pickup model and image pickup device |
| JP2002353763A (ja) * | 2001-05-29 | 2002-12-06 | Mitsubishi Electric Corp | 圧電素子デバイスの製造方法 |
| JP4167443B2 (ja) | 2002-01-30 | 2008-10-15 | 日本放送協会 | 固体撮像素子 |
| JP2004063751A (ja) | 2002-07-29 | 2004-02-26 | Fuji Photo Film Co Ltd | 固体撮像素子およびその製造方法 |
| GB0213722D0 (en) * | 2002-06-14 | 2002-07-24 | Suisse Electronique Microtech | Micro electrical mechanical systems |
| JP4241457B2 (ja) * | 2003-06-26 | 2009-03-18 | 富士ゼロックス株式会社 | レンズ付き発光素子の製造方法 |
-
2004
- 2004-02-27 EP EP04405110A patent/EP1569276A1/en not_active Withdrawn
-
2005
- 2005-02-24 TW TW094105676A patent/TWI362058B/zh not_active IP Right Cessation
- 2005-02-25 AT AT05706528T patent/ATE498910T1/de not_active IP Right Cessation
- 2005-02-25 WO PCT/CH2005/000109 patent/WO2005083789A2/en not_active Ceased
- 2005-02-25 JP JP2007500029A patent/JP4903685B2/ja not_active Expired - Lifetime
- 2005-02-25 KR KR1020067019870A patent/KR101194452B1/ko not_active Expired - Lifetime
- 2005-02-25 CN CN2005800133746A patent/CN1947254B/zh not_active Expired - Lifetime
- 2005-02-25 EP EP05706528A patent/EP1719178B1/en not_active Expired - Lifetime
- 2005-02-25 DE DE602005026367T patent/DE602005026367D1/de not_active Expired - Lifetime
-
2006
- 2006-08-23 US US11/466,640 patent/US7457490B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1329357A (zh) * | 2000-06-08 | 2002-01-02 | 株式会社东芝 | 对准方法、套刻检查方法和光掩模 |
| EP1389804A2 (en) * | 2002-08-13 | 2004-02-18 | Agilent Technologies Inc. (a Delaware Corporation) | CMOS image sensor using gradient index chip scale lenses |
Non-Patent Citations (5)
| Title |
|---|
| CN 1329357 A,全文. |
| Michael T Gale.Replication technology for micro-optics and opticalmicrosystems.Proceedings of SPIE 5177.2003,(5177),113-120. |
| Michael T Gale.Replication technology for micro-optics and opticalmicrosystems.Proceedings of SPIE 5177.2003,(5177),113-120. * |
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Also Published As
| Publication number | Publication date |
|---|---|
| TWI362058B (en) | 2012-04-11 |
| KR101194452B1 (ko) | 2012-10-24 |
| EP1719178A2 (en) | 2006-11-08 |
| ATE498910T1 (de) | 2011-03-15 |
| TW200532761A (en) | 2005-10-01 |
| EP1569276A1 (en) | 2005-08-31 |
| US7457490B2 (en) | 2008-11-25 |
| EP1719178B1 (en) | 2011-02-16 |
| CN1947254A (zh) | 2007-04-11 |
| JP2007524243A (ja) | 2007-08-23 |
| WO2005083789A2 (en) | 2005-09-09 |
| WO2005083789A3 (en) | 2006-05-11 |
| KR20070004774A (ko) | 2007-01-09 |
| US20070009223A1 (en) | 2007-01-11 |
| DE602005026367D1 (de) | 2011-03-31 |
| JP4903685B2 (ja) | 2012-03-28 |
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