CN1877455A - 在至少投射光学部件和晶片上具有相等压力的浸入式光刻装置和方法 - Google Patents
在至少投射光学部件和晶片上具有相等压力的浸入式光刻装置和方法 Download PDFInfo
- Publication number
- CN1877455A CN1877455A CNA2006100827518A CN200610082751A CN1877455A CN 1877455 A CN1877455 A CN 1877455A CN A2006100827518 A CNA2006100827518 A CN A2006100827518A CN 200610082751 A CN200610082751 A CN 200610082751A CN 1877455 A CN1877455 A CN 1877455A
- Authority
- CN
- China
- Prior art keywords
- room
- fluid
- optical system
- pressure
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Abstract
Description
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/160,156 | 2005-06-10 | ||
US11/160,156 US7385673B2 (en) | 2005-06-10 | 2005-06-10 | Immersion lithography with equalized pressure on at least projection optics component and wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1877455A true CN1877455A (zh) | 2006-12-13 |
CN1877455B CN1877455B (zh) | 2010-12-15 |
Family
ID=37509924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006100827518A Expired - Fee Related CN1877455B (zh) | 2005-06-10 | 2006-05-25 | 浸入式光刻装置和方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7385673B2 (zh) |
JP (1) | JP5340526B2 (zh) |
CN (1) | CN1877455B (zh) |
TW (1) | TW200707076A (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104281012A (zh) * | 2014-09-18 | 2015-01-14 | 合肥芯硕半导体有限公司 | 一种气体保护镜头 |
CN105954978A (zh) * | 2016-07-13 | 2016-09-21 | 无锡宏纳科技有限公司 | 透镜可移动的浸入式光刻机 |
CN105974749A (zh) * | 2016-07-13 | 2016-09-28 | 无锡宏纳科技有限公司 | 通过浸入式光刻机进行光刻的方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7528387B2 (en) * | 2005-12-29 | 2009-05-05 | Interuniversitair Microelektronica Centrum (Imec) | Methods and systems for characterising and optimising immersion lithographic processing |
KR20080108341A (ko) * | 2006-04-03 | 2008-12-12 | 가부시키가이샤 니콘 | 액침 액체에 대해 소용매성인 입사면 및 광학 윈도우 |
US8027023B2 (en) * | 2006-05-19 | 2011-09-27 | Carl Zeiss Smt Gmbh | Optical imaging device and method for reducing dynamic fluctuations in pressure difference |
DE102006023876A1 (de) * | 2006-05-19 | 2007-11-22 | Carl Zeiss Smt Ag | Optische Abbildungseinrichtung |
KR100752855B1 (ko) * | 2006-07-18 | 2007-08-29 | 엘지전자 주식회사 | 초임계 유체를 이용한 카메라 렌즈 |
NL1036596A1 (nl) * | 2008-02-21 | 2009-08-24 | Asml Holding Nv | Re-flow and buffer system for immersion lithography. |
CN106569394B (zh) * | 2015-10-08 | 2018-06-26 | 上海微电子装备(集团)股份有限公司 | 掩模整形装置 |
CN109991819B (zh) * | 2018-01-03 | 2021-08-03 | 群创光电股份有限公司 | 曝光系统及其用于制造显示面板的方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3610757A (en) * | 1968-09-05 | 1971-10-05 | High Pressure Diamond Optics I | High pressure optical cell for raman spectrography |
JPS61160934A (ja) * | 1985-01-10 | 1986-07-21 | Canon Inc | 投影光学装置 |
US4793953A (en) * | 1987-10-16 | 1988-12-27 | Galic/Maus Ventures | Mold for optical thermoplastic high-pressure molding |
JPH09218519A (ja) * | 1996-02-09 | 1997-08-19 | Nikon Corp | 露光装置の環境制御方法及び装置 |
US5949536A (en) * | 1997-03-03 | 1999-09-07 | Mark; Howard L. | High pressure optical cell for spectrometry |
US5900354A (en) * | 1997-07-03 | 1999-05-04 | Batchelder; John Samuel | Method for optical inspection and lithography |
US6212989B1 (en) * | 1999-05-04 | 2001-04-10 | The United States Of America As Represented By The Secretary Of The Army | High pressure, high temperature window assembly and method of making the same |
US6791661B2 (en) * | 1999-12-09 | 2004-09-14 | Nikon Corporation | Gas replacement method and apparatus, and exposure method and apparatus |
JP2001274054A (ja) * | 2000-03-24 | 2001-10-05 | Canon Inc | 露光装置、半導体デバイス製造方法および半導体デバイス製造工場 |
JP4689064B2 (ja) * | 2000-03-30 | 2011-05-25 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JP2001345248A (ja) * | 2000-05-31 | 2001-12-14 | Canon Inc | 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法 |
US7508487B2 (en) * | 2000-06-01 | 2009-03-24 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2002134389A (ja) * | 2000-10-23 | 2002-05-10 | Canon Inc | 露光装置 |
US6576912B2 (en) * | 2001-01-03 | 2003-06-10 | Hugo M. Visser | Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window |
US20020159042A1 (en) * | 2001-04-25 | 2002-10-31 | Poon Alex Ka Tim | Chamber assembly for an exposure apparatus |
JP2003115451A (ja) | 2001-07-30 | 2003-04-18 | Canon Inc | 露光装置及びそれを用いたデバイスの製造方法 |
JP2003249432A (ja) | 2002-02-25 | 2003-09-05 | Seiko Epson Corp | 露光装置 |
DE10210899A1 (de) * | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
US7029832B2 (en) * | 2003-03-11 | 2006-04-18 | Samsung Electronics Co., Ltd. | Immersion lithography methods using carbon dioxide |
SG141426A1 (en) * | 2003-04-10 | 2008-04-28 | Nikon Corp | Environmental system including vacuum scavange for an immersion lithography apparatus |
US6954256B2 (en) * | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
JP4517367B2 (ja) * | 2003-09-03 | 2010-08-04 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
EP1768169B9 (en) * | 2004-06-04 | 2013-03-06 | Nikon Corporation | Exposure apparatus, exposure method, and device producing method |
JP2006220847A (ja) * | 2005-02-09 | 2006-08-24 | Toshiba Corp | レジストパターン形成方法 |
JP2006261606A (ja) * | 2005-03-18 | 2006-09-28 | Canon Inc | 露光装置、露光方法及びデバイス製造方法 |
US7411654B2 (en) * | 2005-04-05 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2005
- 2005-06-10 US US11/160,156 patent/US7385673B2/en not_active Expired - Fee Related
-
2006
- 2006-05-25 CN CN2006100827518A patent/CN1877455B/zh not_active Expired - Fee Related
- 2006-06-05 JP JP2006156597A patent/JP5340526B2/ja not_active Expired - Fee Related
- 2006-06-08 TW TW095120409A patent/TW200707076A/zh unknown
-
2008
- 2008-03-19 US US12/051,572 patent/US7889317B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104281012A (zh) * | 2014-09-18 | 2015-01-14 | 合肥芯硕半导体有限公司 | 一种气体保护镜头 |
CN104281012B (zh) * | 2014-09-18 | 2016-08-24 | 合肥芯硕半导体有限公司 | 一种气体保护镜头 |
CN105954978A (zh) * | 2016-07-13 | 2016-09-21 | 无锡宏纳科技有限公司 | 透镜可移动的浸入式光刻机 |
CN105974749A (zh) * | 2016-07-13 | 2016-09-28 | 无锡宏纳科技有限公司 | 通过浸入式光刻机进行光刻的方法 |
Also Published As
Publication number | Publication date |
---|---|
TW200707076A (en) | 2007-02-16 |
CN1877455B (zh) | 2010-12-15 |
JP2006344960A (ja) | 2006-12-21 |
US7385673B2 (en) | 2008-06-10 |
US20060289794A1 (en) | 2006-12-28 |
US7889317B2 (en) | 2011-02-15 |
JP5340526B2 (ja) | 2013-11-13 |
US20080165335A1 (en) | 2008-07-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1877455B (zh) | 浸入式光刻装置和方法 | |
JP4945539B2 (ja) | リソグラフィ装置及びデバイス製造方法 | |
Bruning | Optical lithography: 40 years and holding | |
US8553207B2 (en) | Optically compensated unidirectional reticle bender | |
JP4976483B2 (ja) | リソグラフィ装置及び基板ステージ補償を利用したデバイス製造方法 | |
JP4700941B2 (ja) | リソグラフィック装置及びリソグラフィック装置における熱変形を補償する方法 | |
TW201117261A (en) | Exposure apparatus, and device manufacturing method | |
US8786828B2 (en) | Lithographic apparatus and device manufacturing method | |
US20070285638A1 (en) | Mirror array for lithography | |
CN101681008A (zh) | 光学元件驱动装置、镜筒、曝光装置及器件的制造方法 | |
Lee | Optical System with 4㎛ Resolution for Maskless Lithography Using Digital Micromirror Device | |
JP2007142190A (ja) | 露光装置及びデバイス製造方法 | |
KR101129946B1 (ko) | 액침 리소그래피용 굴절 투영 대물렌즈 | |
US9684249B2 (en) | Lithographic apparatus with a metrology system for measuring a position of a substrate table | |
JP2005175490A (ja) | リソグラフィ装置及びデバイス製造方法 | |
JP5472101B2 (ja) | 露光装置及びデバイス製造方法 | |
US8130359B2 (en) | Lithographic apparatus and a vacuum chamber | |
JPWO2007114024A1 (ja) | 投影光学系、露光装置、およびデバイス製造方法 | |
WO2005078773A1 (ja) | 結像光学系、露光装置、および露光方法 | |
Vollrath | Ultra-high-resolution DUV microscope optics for semiconductor applications | |
JP4393226B2 (ja) | 光学系及びそれを用いた露光装置、デバイスの製造方法 | |
JP2005244013A (ja) | 光学系及びそれを用いた露光装置、デバイスの製造方法、複数の露光装置の製造方法 | |
NL2016688A (en) | Movable support and lithographic apparatus | |
JP2005228875A (ja) | 露光装置、デバイスの製造方法 | |
JP2005191573A (ja) | リソグラフィ装置およびデバイス製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20171106 Address after: Grand Cayman, Cayman Islands Patentee after: GLOBALFOUNDRIES INC. Address before: American New York Patentee before: Core USA second LLC Effective date of registration: 20171106 Address after: American New York Patentee after: Core USA second LLC Address before: American New York Patentee before: International Business Machines Corp. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101215 Termination date: 20190525 |