CN1816553A - 呋喃并吡咯的制备方法 - Google Patents
呋喃并吡咯的制备方法 Download PDFInfo
- Publication number
- CN1816553A CN1816553A CNA2004800191554A CN200480019155A CN1816553A CN 1816553 A CN1816553 A CN 1816553A CN A2004800191554 A CNA2004800191554 A CN A2004800191554A CN 200480019155 A CN200480019155 A CN 200480019155A CN 1816553 A CN1816553 A CN 1816553A
- Authority
- CN
- China
- Prior art keywords
- alkyl
- formula
- hydrogen
- aryl
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
- C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
- C07D491/04—Ortho-condensed systems
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Pyrrole Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP03405507.9 | 2003-07-07 | ||
| EP03405507 | 2003-07-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1816553A true CN1816553A (zh) | 2006-08-09 |
Family
ID=34043021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2004800191554A Pending CN1816553A (zh) | 2003-07-07 | 2004-06-28 | 呋喃并吡咯的制备方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7442804B2 (https=) |
| EP (1) | EP1641802A2 (https=) |
| JP (1) | JP4745226B2 (https=) |
| KR (1) | KR20060033780A (https=) |
| CN (1) | CN1816553A (https=) |
| AU (1) | AU2004255863A1 (https=) |
| TW (1) | TW200504077A (https=) |
| WO (1) | WO2005005430A2 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106279188A (zh) * | 2016-07-21 | 2017-01-04 | 青岛科技大学 | 一种多取代呋喃并[2,3‑b]吡咯衍生物的制备方法 |
| CN107338459A (zh) * | 2017-07-25 | 2017-11-10 | 上海新阳半导体材料股份有限公司 | 整平剂、含其的金属电镀组合物、制备方法及应用 |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2002310099A1 (en) * | 2001-05-22 | 2002-12-03 | President And Fellows Of Harvard College | Identification of anti-protozoal agents |
| JP2007517056A (ja) * | 2003-12-29 | 2007-06-28 | セプラコア インコーポレーテッド | ピロール及びピラゾールdaao阻害剤 |
| EP2455075B1 (en) | 2005-07-06 | 2018-06-20 | Sunovion Pharmaceuticals Inc. | Process for Preparation of trans 4-(3,4-Dichlorophenyl)-1,2,3,4-tetrahydro-1-naphthalenamine |
| NZ569608A (en) * | 2006-01-06 | 2011-09-30 | Sepracor Inc | Tetralone-based monoamine reuptake inhibitors |
| US20070203111A1 (en) | 2006-01-06 | 2007-08-30 | Sepracor Inc. | Cycloalkylamines as monoamine reuptake inhibitors |
| CN101421228B (zh) | 2006-03-31 | 2014-05-21 | 塞普拉柯公司 | 手性酰胺和胺的制备 |
| US7884124B2 (en) * | 2006-06-30 | 2011-02-08 | Sepracor Inc. | Fluoro-substituted inhibitors of D-amino acid oxidase |
| US7579370B2 (en) * | 2006-06-30 | 2009-08-25 | Sepracor Inc. | Fused heterocycles |
| US20080058395A1 (en) * | 2006-06-30 | 2008-03-06 | Sepracor Inc. | Fused heterocyclic inhibitors of D-amino acid oxidase |
| US7902252B2 (en) * | 2007-01-18 | 2011-03-08 | Sepracor, Inc. | Inhibitors of D-amino acid oxidase |
| CA2676432A1 (en) * | 2007-01-18 | 2008-07-24 | Sepracor, Inc. | Inhibitors of d-amino acid oxidase |
| CA2688493C (en) | 2007-05-31 | 2016-04-19 | Sepracor Inc. | Phenyl substituted cycloalkylamines as monoamine reuptake inhibitors |
| US20100120740A1 (en) * | 2008-08-07 | 2010-05-13 | Sepracor Inc. | Prodrugs of fused heterocyclic inhibitors of d-amino acid oxidase |
| US20110034434A1 (en) * | 2009-08-07 | 2011-02-10 | Sepracor Inc. | Prodrugs of fused heterocyclic inhibitors of d-amino acid oxidase |
| JP6162984B2 (ja) * | 2013-03-14 | 2017-07-12 | 山本化成株式会社 | 感熱発色性組成物及び該組成物を用いてなる感熱記録材料 |
| CN105038767B (zh) * | 2015-06-29 | 2017-04-26 | 北京理工大学 | 一种检测空气中三氯甲烷的荧光试剂、制备方法及其应用 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4931566A (en) * | 1987-07-31 | 1990-06-05 | Ciba-Geigy Corporation | Process for the preparation of pyrrolo[3,4-c]pyrroles |
| KR0143777B1 (ko) * | 1989-11-28 | 1998-07-01 | 월터 클리웨인, 한스-피터 위트린 | 디케토피롤로피롤을 기재로 하는 물질의 조성물 |
| DE59206887D1 (de) * | 1991-04-26 | 1996-09-19 | Ciba Geigy Ag | Neue Diketopyrrolopyrrolverbindungen |
| JP3641310B2 (ja) * | 1994-12-22 | 2005-04-20 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 電子写真感光体 |
| TW341572B (en) * | 1995-09-20 | 1998-10-01 | Ciba Sc Holding Ag | Preparation of mixed crystals and solid solutions of 1,4-diketopyrrolopyrroles |
| DE59707889D1 (de) * | 1996-01-30 | 2002-09-12 | Ciba Sc Holding Ag | Polymerisierbare Diketopyrrolopyrrole und damit hergestellte Polymere |
| US5919944A (en) * | 1997-07-30 | 1999-07-06 | Ciba Specialty Chemicals Corporation | Polymerisable diketopyrrolopyrroles |
| TW503255B (en) * | 1999-09-27 | 2002-09-21 | Ciba Sc Holding Ag | Electroluminescent devices comprising diketopyrrolopyrroles |
| JP2002201401A (ja) * | 2001-01-09 | 2002-07-19 | Konica Corp | 顔料分散体及びインクジェット用インク |
| KR20030097863A (ko) * | 2001-05-14 | 2003-12-31 | 시바 스페셜티 케미칼스 홀딩 인크. | 디케토피롤피롤 고용체 안료의 신규한 결정 개질화 |
| AU2002342633A1 (en) * | 2001-09-11 | 2003-03-24 | Ciba Specialty Chemicals Holding Inc. | Process for the preparation of diketopyrrolopyrroles |
-
2004
- 2004-06-28 EP EP04766084A patent/EP1641802A2/en not_active Withdrawn
- 2004-06-28 CN CNA2004800191554A patent/CN1816553A/zh active Pending
- 2004-06-28 AU AU2004255863A patent/AU2004255863A1/en not_active Abandoned
- 2004-06-28 JP JP2006518202A patent/JP4745226B2/ja not_active Expired - Fee Related
- 2004-06-28 KR KR1020067000418A patent/KR20060033780A/ko not_active Withdrawn
- 2004-06-28 WO PCT/EP2004/051259 patent/WO2005005430A2/en not_active Ceased
- 2004-06-28 US US10/561,393 patent/US7442804B2/en not_active Expired - Fee Related
- 2004-07-06 TW TW093120221A patent/TW200504077A/zh unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106279188A (zh) * | 2016-07-21 | 2017-01-04 | 青岛科技大学 | 一种多取代呋喃并[2,3‑b]吡咯衍生物的制备方法 |
| CN107338459A (zh) * | 2017-07-25 | 2017-11-10 | 上海新阳半导体材料股份有限公司 | 整平剂、含其的金属电镀组合物、制备方法及应用 |
| CN107338459B (zh) * | 2017-07-25 | 2018-11-16 | 上海新阳半导体材料股份有限公司 | 整平剂、含其的金属电镀组合物、制备方法及应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| AU2004255863A1 (en) | 2005-01-20 |
| JP2009513534A (ja) | 2009-04-02 |
| KR20060033780A (ko) | 2006-04-19 |
| JP4745226B2 (ja) | 2011-08-10 |
| EP1641802A2 (en) | 2006-04-05 |
| WO2005005430A3 (en) | 2005-06-16 |
| TW200504077A (en) | 2005-02-01 |
| US7442804B2 (en) | 2008-10-28 |
| WO2005005430A2 (en) | 2005-01-20 |
| US20070100135A1 (en) | 2007-05-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |