CN1780009B - 压电/电致伸缩设备 - Google Patents
压电/电致伸缩设备 Download PDFInfo
- Publication number
- CN1780009B CN1780009B CN2005101166452A CN200510116645A CN1780009B CN 1780009 B CN1780009 B CN 1780009B CN 2005101166452 A CN2005101166452 A CN 2005101166452A CN 200510116645 A CN200510116645 A CN 200510116645A CN 1780009 B CN1780009 B CN 1780009B
- Authority
- CN
- China
- Prior art keywords
- piezoelectric
- thin wall
- barrier portion
- wall barrier
- ceramic matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000919 ceramic Substances 0.000 claims abstract description 47
- 239000011159 matrix material Substances 0.000 claims abstract description 33
- 230000004888 barrier function Effects 0.000 claims description 92
- 239000000463 material Substances 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 22
- 230000015572 biosynthetic process Effects 0.000 claims description 20
- 239000000470 constituent Substances 0.000 claims description 20
- 238000004891 communication Methods 0.000 claims description 3
- 238000006073 displacement reaction Methods 0.000 abstract description 24
- 230000035945 sensitivity Effects 0.000 abstract description 6
- 230000004043 responsiveness Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 15
- 239000011230 binding agent Substances 0.000 description 12
- 239000012530 fluid Substances 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000002033 PVDF binder Substances 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000006071 cream Substances 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000004537 pulping Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 229910002076 stabilized zirconia Inorganic materials 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 206010013786 Dry skin Diseases 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- FKSZLDCMQZJMFN-UHFFFAOYSA-N [Mg].[Pb] Chemical compound [Mg].[Pb] FKSZLDCMQZJMFN-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- XBYNNYGGLWJASC-UHFFFAOYSA-N barium titanium Chemical class [Ti].[Ba] XBYNNYGGLWJASC-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- HEPLMSKRHVKCAQ-UHFFFAOYSA-N lead nickel Chemical compound [Ni].[Pb] HEPLMSKRHVKCAQ-UHFFFAOYSA-N 0.000 description 1
- -1 lead titanate-zirconate aluminium class Chemical class 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910002077 partially stabilized zirconia Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
- H10N30/2048—Membrane type having non-planar shape
Landscapes
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Measuring Fluid Pressure (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004335750 | 2004-11-19 | ||
| JP2004335750A JP2006147839A (ja) | 2004-11-19 | 2004-11-19 | 圧電／電歪デバイス |
| JP2004-335750 | 2004-11-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1780009A CN1780009A (zh) | 2006-05-31 |
| CN1780009B true CN1780009B (zh) | 2010-05-05 |
Family
ID=35529354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005101166452A Expired - Fee Related CN1780009B (zh) | 2004-11-19 | 2005-10-26 | 压电/电致伸缩设备 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7183694B2 (enExample) |
| EP (1) | EP1659643B1 (enExample) |
| JP (1) | JP2006147839A (enExample) |
| CN (1) | CN1780009B (enExample) |
| DE (1) | DE602005022032D1 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4149444B2 (ja) * | 2005-01-12 | 2008-09-10 | 富士通メディアデバイス株式会社 | 圧電薄膜共振子及びこれを用いたフィルタ |
| US7446542B2 (en) * | 2005-03-04 | 2008-11-04 | Omniprobe, Inc. | Apparatus and method for automated stress testing of flip-chip packages |
| JP5088916B2 (ja) * | 2005-10-28 | 2012-12-05 | 富士フイルム株式会社 | 無機膜基板の製造方法 |
| US7629865B2 (en) * | 2006-05-31 | 2009-12-08 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Piezoelectric resonator structures and electrical filters |
| JP4965973B2 (ja) * | 2006-11-08 | 2012-07-04 | キヤノン株式会社 | 振動型アクチュエータ |
| JP4924336B2 (ja) * | 2007-09-28 | 2012-04-25 | ブラザー工業株式会社 | 液体移送装置及び圧電アクチュエータ |
| JP4715836B2 (ja) * | 2007-11-15 | 2011-07-06 | ソニー株式会社 | 圧電素子、角速度センサ、及び圧電素子の製造方法 |
| JP4735639B2 (ja) * | 2007-11-15 | 2011-07-27 | ソニー株式会社 | 圧電素子、角速度センサ、及び圧電素子の製造方法 |
| US7915794B2 (en) | 2007-11-15 | 2011-03-29 | Sony Corporation | Piezoelectric device having a tension stress, and angular velocity sensor |
| JP5669452B2 (ja) * | 2009-07-28 | 2015-02-12 | キヤノン株式会社 | 振動体の製造方法 |
| US8261618B2 (en) * | 2010-11-22 | 2012-09-11 | General Electric Company | Device for measuring properties of working fluids |
| US20140184023A1 (en) * | 2012-12-31 | 2014-07-03 | Volcano Corporation | Layout and Method of Singulating Miniature Ultrasonic Transducers |
| CN104237461B (zh) * | 2014-07-31 | 2016-08-17 | 北京科技大学 | 一种充气预形变的电机械性能测试装置及测试方法 |
| CN106291562A (zh) * | 2015-05-30 | 2017-01-04 | 鸿富锦精密工业（深圳）有限公司 | 超声波感测器及其制造方法、超声波感测器阵列 |
| CN205847241U (zh) * | 2016-05-19 | 2016-12-28 | 瑞声科技(新加坡)有限公司 | 电子设备 |
| CN107830877B (zh) * | 2017-10-23 | 2019-06-28 | 大连理工大学 | 一种椭圆柔性基底的压电薄膜传感器 |
| CN110240112B (zh) * | 2018-03-09 | 2022-08-19 | 中国科学院苏州纳米技术与纳米仿生研究所 | 薄膜驱动结构、薄膜驱动结构的制造方法及喷墨装置 |
| CN120880377B (zh) * | 2025-09-28 | 2025-12-09 | 南京航空航天大学 | 机械谐振器、受迫谐振装置及制造方法与应用 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1127430A (zh) * | 1994-08-11 | 1996-07-24 | 日本碍子株式会社 | 压电/电致伸缩膜元件及其制作方法 |
| CN1129359A (zh) * | 1994-08-11 | 1996-08-21 | 日本碍子株式会社 | 带有凸面膜片部的压电/电致伸缩膜元件及其制作方法 |
| US5767612A (en) * | 1994-12-21 | 1998-06-16 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive film element with a diaphragm having at least one stress releasing end section |
| US5997671A (en) * | 1994-11-16 | 1999-12-07 | Ngk Insulators, Ltd. | Method for producing ceramic diaphragm structure |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6049158A (en) * | 1994-02-14 | 2000-04-11 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive film element having convex diaphragm portions and method of producing the same |
| JP3162584B2 (ja) * | 1994-02-14 | 2001-05-08 | 日本碍子株式会社 | 圧電／電歪膜型素子及びその製造方法 |
| US5545461A (en) * | 1994-02-14 | 1996-08-13 | Ngk Insulators, Ltd. | Ceramic diaphragm structure having convex diaphragm portion and method of producing the same |
| JP3313531B2 (ja) * | 1994-06-03 | 2002-08-12 | 日本碍子株式会社 | 圧電／電歪膜型素子及びその製造方法 |
| JP3388060B2 (ja) * | 1994-11-25 | 2003-03-17 | 日本碍子株式会社 | 流体の特性測定用素子及び流体の特性測定装置 |
| EP0810676B1 (en) * | 1996-05-27 | 2002-08-28 | Ngk Insulators, Ltd. | Piezoelectric film-type element |
| JP3462400B2 (ja) * | 1998-09-14 | 2003-11-05 | 日本碍子株式会社 | セラミックダイヤフラム構造体の製造方法 |
| US6407481B1 (en) * | 1999-03-05 | 2002-06-18 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive device having convexly curved diaphragm |
| JP2000351213A (ja) * | 1999-06-14 | 2000-12-19 | Minolta Co Ltd | インクジェットヘッド及びインクジェット記録装置 |
| JP3728623B2 (ja) * | 2001-03-02 | 2005-12-21 | 日本碍子株式会社 | 圧電／電歪膜型素子 |
| JP3701902B2 (ja) * | 2001-12-25 | 2005-10-05 | 株式会社Ｎｅｏｍａｘマテリアル | 低比抵抗低熱膨張合金 |
| JP2004119703A (ja) * | 2002-09-26 | 2004-04-15 | Matsushita Electric Ind Co Ltd | 圧電素子の製造方法及びインクジェットヘッドの製造方法 |
-
2004
- 2004-11-19 JP JP2004335750A patent/JP2006147839A/ja active Pending
-
2005
- 2005-10-26 CN CN2005101166452A patent/CN1780009B/zh not_active Expired - Fee Related
- 2005-11-17 US US11/282,013 patent/US7183694B2/en not_active Expired - Fee Related
- 2005-11-18 DE DE200560022032 patent/DE602005022032D1/de not_active Expired - Lifetime
- 2005-11-18 EP EP20050257120 patent/EP1659643B1/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1127430A (zh) * | 1994-08-11 | 1996-07-24 | 日本碍子株式会社 | 压电/电致伸缩膜元件及其制作方法 |
| CN1129359A (zh) * | 1994-08-11 | 1996-08-21 | 日本碍子株式会社 | 带有凸面膜片部的压电/电致伸缩膜元件及其制作方法 |
| US5997671A (en) * | 1994-11-16 | 1999-12-07 | Ngk Insulators, Ltd. | Method for producing ceramic diaphragm structure |
| US5767612A (en) * | 1994-12-21 | 1998-06-16 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive film element with a diaphragm having at least one stress releasing end section |
Also Published As
| Publication number | Publication date |
|---|---|
| DE602005022032D1 (de) | 2010-08-12 |
| US20060108897A1 (en) | 2006-05-25 |
| EP1659643B1 (en) | 2010-06-30 |
| US7183694B2 (en) | 2007-02-27 |
| CN1780009A (zh) | 2006-05-31 |
| EP1659643A3 (en) | 2007-01-24 |
| JP2006147839A (ja) | 2006-06-08 |
| EP1659643A2 (en) | 2006-05-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100505 Termination date: 20141026 |
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| EXPY | Termination of patent right or utility model |