CN1521566A - 图案模拟方法及其程序和存储其程序的媒体及其装置 - Google Patents
图案模拟方法及其程序和存储其程序的媒体及其装置 Download PDFInfo
- Publication number
- CN1521566A CN1521566A CNA2004100053062A CN200410005306A CN1521566A CN 1521566 A CN1521566 A CN 1521566A CN A2004100053062 A CNA2004100053062 A CN A2004100053062A CN 200410005306 A CN200410005306 A CN 200410005306A CN 1521566 A CN1521566 A CN 1521566A
- Authority
- CN
- China
- Prior art keywords
- pattern
- data
- substrate
- exposure
- reticule
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
- G01F15/10—Preventing damage by freezing or excess pressure or insufficient pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D11/00—Component parts of measuring arrangements not specially adapted for a specific variable
- G01D11/24—Housings ; Casings for instruments
- G01D11/26—Windows; Cover glasses; Sealings therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/06—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects using rotating vanes with tangential admission
- G01F1/07—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects using rotating vanes with tangential admission with mechanical coupling to the indicating device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13625—Patterning using multi-mask exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
Claims (18)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003032602 | 2003-02-10 | ||
JP2003032602 | 2003-02-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1521566A true CN1521566A (zh) | 2004-08-18 |
CN1316316C CN1316316C (zh) | 2007-05-16 |
Family
ID=32820935
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100053062A Expired - Fee Related CN1316316C (zh) | 2003-02-10 | 2004-02-10 | 图案模拟方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7073163B2 (zh) |
KR (1) | KR100607014B1 (zh) |
CN (1) | CN1316316C (zh) |
TW (1) | TWI290641B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107807497A (zh) * | 2017-11-27 | 2018-03-16 | 北京华大九天软件有限公司 | 一种面板版图设计中的曝光模拟方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7191113B2 (en) * | 2002-12-17 | 2007-03-13 | International Business Machines Corporation | Method and system for short-circuit current modeling in CMOS integrated circuits |
US7269804B2 (en) * | 2004-04-02 | 2007-09-11 | Advanced Micro Devices, Inc. | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
KR100817065B1 (ko) | 2006-10-02 | 2008-03-27 | 삼성전자주식회사 | 미세패턴의 설계방법 및 그 장치 |
KR100818999B1 (ko) * | 2006-10-09 | 2008-04-02 | 삼성전자주식회사 | 마스크 제작 방법 |
NL2007477A (en) * | 2010-10-22 | 2012-04-24 | Asml Netherlands Bv | Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus. |
US9547743B2 (en) * | 2015-02-25 | 2017-01-17 | Kabushiki Kaisha Toshiba | Manufacturing method for a semiconductor device, pattern generating method and nontransitory computer readable medium storing a pattern generating program |
US10176284B2 (en) * | 2016-09-30 | 2019-01-08 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor circuit design and manufacture method |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5495417A (en) * | 1990-08-14 | 1996-02-27 | Kabushiki Kaisha Toshiba | System for automatically producing different semiconductor products in different quantities through a plurality of processes along a production line |
US6453452B1 (en) * | 1997-12-12 | 2002-09-17 | Numerical Technologies, Inc. | Method and apparatus for data hierarchy maintenance in a system for mask description |
US6578188B1 (en) * | 1997-09-17 | 2003-06-10 | Numerical Technologies, Inc. | Method and apparatus for a network-based mask defect printability analysis system |
JP2000232057A (ja) * | 1999-02-10 | 2000-08-22 | Hitachi Ltd | レジストパターンのシミュレーション方法およびパターン形成方法 |
JP4057733B2 (ja) * | 1999-02-22 | 2008-03-05 | 株式会社東芝 | 転写パターンのシミュレーション方法 |
JP2002244273A (ja) * | 2001-02-13 | 2002-08-30 | Ricoh Opt Ind Co Ltd | 濃度分布マスクとその製造方法 |
JP4748343B2 (ja) * | 2001-04-26 | 2011-08-17 | 大日本印刷株式会社 | ウエーハ転写検証方法 |
JP2002367890A (ja) | 2001-06-06 | 2002-12-20 | Toshiba Corp | パターンレイアウト方法、その装置およびパターンレイアウトプログラムを記憶した媒体 |
JP2003022952A (ja) * | 2001-07-06 | 2003-01-24 | Toshiba Corp | 描画データ作成システム、描画データ作成方法、描画データ作成プログラム、レチクルの製造方法及び半導体装置の製造方法 |
US6966047B1 (en) * | 2002-04-09 | 2005-11-15 | Kla-Tencor Technologies Corporation | Capturing designer intent in reticle inspection |
US6775818B2 (en) * | 2002-08-20 | 2004-08-10 | Lsi Logic Corporation | Device parameter and gate performance simulation based on wafer image prediction |
-
2004
- 2004-02-02 US US10/768,102 patent/US7073163B2/en active Active
- 2004-02-03 TW TW093102409A patent/TWI290641B/zh not_active IP Right Cessation
- 2004-02-09 KR KR1020040008234A patent/KR100607014B1/ko not_active IP Right Cessation
- 2004-02-10 CN CNB2004100053062A patent/CN1316316C/zh not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107807497A (zh) * | 2017-11-27 | 2018-03-16 | 北京华大九天软件有限公司 | 一种面板版图设计中的曝光模拟方法 |
CN107807497B (zh) * | 2017-11-27 | 2020-11-17 | 北京华大九天软件有限公司 | 一种面板版图设计中的曝光模拟方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20040073312A (ko) | 2004-08-19 |
KR100607014B1 (ko) | 2006-08-01 |
TW200422692A (en) | 2004-11-01 |
CN1316316C (zh) | 2007-05-16 |
US20040158809A1 (en) | 2004-08-12 |
TWI290641B (en) | 2007-12-01 |
US7073163B2 (en) | 2006-07-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10429742B2 (en) | Stitchless direct imaging for high resolution electronic patterning | |
US7434196B2 (en) | Renesting interaction map into design for efficient long range calculations | |
CN1101970C (zh) | 用于产生动画数据的方法和装置 | |
US7745069B2 (en) | Structure and methodology for fabrication and inspection of photomasks | |
CN1991539A (zh) | 液晶显示器件及其制造方法 | |
CN1521566A (zh) | 图案模拟方法及其程序和存储其程序的媒体及其装置 | |
CN106950795A (zh) | 辅助图形的形成方法 | |
CN1199273C (zh) | 半导体装置及其设计方法和设计装置 | |
CN1577731A (zh) | 半导体制造系统 | |
US10791661B2 (en) | Board inspecting apparatus and method of compensating board distortion using the same | |
JPH021107A (ja) | マスク又はレチクル用パターン自動検証装置 | |
CN1495533A (zh) | 设计曝光装置孔径的模拟方法和系统和记录模拟法的介质 | |
US8990755B2 (en) | Defective artifact removal in photolithography masks corrected for optical proximity | |
TWI297507B (en) | Method for repairing a phase shift mask | |
JP4816924B2 (ja) | 濃度分布マスクの製造方法 | |
JP2007103711A (ja) | パターンシミュレーション方法、そのプログラム、そのプログラムを記憶した媒体、およびその装置 | |
JP2004265386A (ja) | パターンシミュレーション方法、そのプログラム、そのプログラムを記憶した媒体、およびその装置 | |
CN1641648A (zh) | 图形处理装置、图形处理方法和计算机可读程序 | |
CN1828857A (zh) | 检测光掩膜缺陷方法 | |
CN1448783A (zh) | 灰调掩模中灰调部的缺陷修正方法 | |
KR101041263B1 (ko) | 레티클 검증 시스템 및 프로그램이 기록된 기록매체 | |
CN1618084A (zh) | 图像处理装置、图像处理方法、图像处理程序、记录媒体 | |
JP2002367890A (ja) | パターンレイアウト方法、その装置およびパターンレイアウトプログラムを記憶した媒体 | |
CN102890432B (zh) | 一种通过加曝图形制作掩模板的方法 | |
JP3125883B2 (ja) | 印刷配線板のクローニング法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: JAPAN DISPLAY MIDDLE INC. Free format text: FORMER NAME: TOSHIBA MOBILE DISPLAY CO., LTD. Owner name: TOSHIBA MOBILE DISPLAY CO., LTD. Free format text: FORMER NAME: TOSHIBA MATSUSHITA DISPLAY TECHNOLOGY LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: Toshiba Mobile Display Co.,Ltd. Address before: Tokyo, Japan Patentee before: TOSHIBA MATSUSHITA DISPLAY TECHNOLOGY Co.,Ltd. |
|
CP03 | Change of name, title or address |
Address after: Saitama Prefecture, Japan Patentee after: JAPAN DISPLAY Inc. Address before: Tokyo, Japan Patentee before: Toshiba Mobile Display Co.,Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070516 Termination date: 20200210 |
|
CF01 | Termination of patent right due to non-payment of annual fee |