CN1518073A - 等离子体处理装置及聚焦环 - Google Patents

等离子体处理装置及聚焦环 Download PDF

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Publication number
CN1518073A
CN1518073A CNA2004100003167A CN200410000316A CN1518073A CN 1518073 A CN1518073 A CN 1518073A CN A2004100003167 A CNA2004100003167 A CN A2004100003167A CN 200410000316 A CN200410000316 A CN 200410000316A CN 1518073 A CN1518073 A CN 1518073A
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CN
China
Prior art keywords
processed substrate
plasma processing
ring component
processing apparatus
impedance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004100003167A
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English (en)
Chinese (zh)
Inventor
Զ����
远藤升佐
桧森慎司
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN1518073A publication Critical patent/CN1518073A/zh
Pending legal-status Critical Current

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    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J37/00—Baking; Roasting; Grilling; Frying
    • A47J37/06—Roasters; Grills; Sandwich grills
    • A47J37/0623—Small-size cooking ovens, i.e. defining an at least partially closed cooking cavity
    • A47J37/0664—Accessories
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32642—Focus rings
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J36/00—Parts, details or accessories of cooking-vessels
    • A47J36/24—Warming devices
    • A47J36/2483—Warming devices with electrical heating means
    • A47J36/2488—Warming devices with electrical heating means having infrared radiating elements
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J37/00—Baking; Roasting; Grilling; Frying
    • A47J37/06—Roasters; Grills; Sandwich grills
    • A47J37/0694—Broiling racks
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J37/00—Baking; Roasting; Grilling; Frying
    • A47J37/06—Roasters; Grills; Sandwich grills
    • A47J37/07—Roasting devices for outdoor use; Barbecues
    • A47J37/0786—Accessories
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/23—Chucks or sockets with magnetic or electrostatic means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
CNA2004100003167A 2003-01-07 2004-01-07 等离子体处理装置及聚焦环 Pending CN1518073A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003001547 2003-01-07
JP2003001547 2003-01-07

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN2010102998724A Division CN101996843B (zh) 2003-01-07 2004-01-07 等离子体处理装置及聚焦环

Publications (1)

Publication Number Publication Date
CN1518073A true CN1518073A (zh) 2004-08-04

Family

ID=32708821

Family Applications (2)

Application Number Title Priority Date Filing Date
CNA2004100003167A Pending CN1518073A (zh) 2003-01-07 2004-01-07 等离子体处理装置及聚焦环
CN2010102998724A Expired - Fee Related CN101996843B (zh) 2003-01-07 2004-01-07 等离子体处理装置及聚焦环

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2010102998724A Expired - Fee Related CN101996843B (zh) 2003-01-07 2004-01-07 等离子体处理装置及聚焦环

Country Status (5)

Country Link
US (2) US7850174B2 (enExample)
JP (2) JP4421305B2 (enExample)
KR (1) KR100657054B1 (enExample)
CN (2) CN1518073A (enExample)
TW (1) TW200416801A (enExample)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7767055B2 (en) 2004-12-03 2010-08-03 Tokyo Electron Limited Capacitive coupling plasma processing apparatus
CN1825556B (zh) * 2005-02-25 2010-10-13 佳能安内华股份有限公司 晶片支架
CN101901744A (zh) * 2009-05-27 2010-12-01 东京毅力科创株式会社 等离子处理用圆环状零件及等离子处理装置
CN101053066B (zh) * 2004-11-02 2012-02-01 松下电器产业株式会社 等离子体处理方法和等离子体处理设备
CN101609779B (zh) * 2008-06-19 2012-07-04 东京毅力科创株式会社 聚焦环以及等离子体处理装置
CN101989543B (zh) * 2009-08-07 2012-09-05 中微半导体设备(上海)有限公司 一种用于减少基片背面聚合物的装置
CN103165494A (zh) * 2011-12-08 2013-06-19 中微半导体设备(上海)有限公司 一种清洁晶片背面聚合物的装置和方法
CN103646841A (zh) * 2013-11-22 2014-03-19 上海华力微电子有限公司 一种等离子体刻蚀设备
CN101238553B (zh) * 2005-08-08 2014-07-02 朗姆研究公司 带有介电间隔环的边缘环组件
TWI574295B (zh) * 2014-02-25 2017-03-11 闊斯泰股份有限公司 聚焦環

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CN1518073A (zh) * 2003-01-07 2004-08-04 ���������ƴ���ʽ���� 等离子体处理装置及聚焦环
JP4991286B2 (ja) * 2003-03-21 2012-08-01 東京エレクトロン株式会社 処理中の基板裏面堆積を減らす方法および装置。
KR101028625B1 (ko) * 2005-03-31 2011-04-12 도쿄엘렉트론가부시키가이샤 기판의 질화 처리 방법 및 절연막의 형성 방법
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US8034409B2 (en) * 2006-12-20 2011-10-11 Lam Research Corporation Methods, apparatuses, and systems for fabricating three dimensional integrated circuits
JP5317424B2 (ja) * 2007-03-28 2013-10-16 東京エレクトロン株式会社 プラズマ処理装置
JP5248038B2 (ja) * 2007-05-22 2013-07-31 東京エレクトロン株式会社 載置台およびそれを用いたプラズマ処理装置
US9136105B2 (en) * 2008-06-30 2015-09-15 United Microelectronics Corp. Bevel etcher
US9543181B2 (en) * 2008-07-30 2017-01-10 Taiwan Semiconductor Manufacturing Company, Ltd. Replaceable electrostatic chuck sidewall shield
US8869741B2 (en) * 2008-12-19 2014-10-28 Lam Research Corporation Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
KR101359070B1 (ko) * 2009-03-03 2014-02-05 도쿄엘렉트론가부시키가이샤 탑재대 구조, 성막 장치 및 원료 회수 방법
JP5395633B2 (ja) * 2009-11-17 2014-01-22 東京エレクトロン株式会社 基板処理装置の基板載置台
JP5563347B2 (ja) 2010-03-30 2014-07-30 東京エレクトロン株式会社 プラズマ処理装置及び半導体装置の製造方法
JP5503503B2 (ja) 2010-11-09 2014-05-28 東京エレクトロン株式会社 プラズマ処理装置
JP5741124B2 (ja) * 2011-03-29 2015-07-01 東京エレクトロン株式会社 プラズマ処理装置
CN102522305B (zh) * 2011-12-27 2015-01-07 中微半导体设备(上海)有限公司 等离子体处理装置及聚焦环组件
CN103187232B (zh) * 2011-12-28 2015-09-16 中微半导体设备(上海)有限公司 一种减少晶片背面生成聚合物的聚焦环
KR20140101996A (ko) * 2013-02-13 2014-08-21 삼성전자주식회사 기판 지지유닛 및 이를 구비한 플라즈마 식각장치
CN105097630A (zh) * 2014-05-14 2015-11-25 北京北方微电子基地设备工艺研究中心有限责任公司 承载装置以及等离子刻蚀设备
CN105575863B (zh) * 2014-11-10 2019-02-22 中微半导体设备(上海)有限公司 等离子体处理装置、基片卸载装置及方法
JP6383647B2 (ja) * 2014-11-19 2018-08-29 東京エレクトロン株式会社 測定システムおよび測定方法
US20170002465A1 (en) * 2015-06-30 2017-01-05 Lam Research Corporation Separation of Plasma Suppression and Wafer Edge to Improve Edge Film Thickness Uniformity
US10340171B2 (en) 2016-05-18 2019-07-02 Lam Research Corporation Permanent secondary erosion containment for electrostatic chuck bonds
US11069553B2 (en) 2016-07-07 2021-07-20 Lam Research Corporation Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity
US10655224B2 (en) * 2016-12-20 2020-05-19 Lam Research Corporation Conical wafer centering and holding device for semiconductor processing
US10910195B2 (en) * 2017-01-05 2021-02-02 Lam Research Corporation Substrate support with improved process uniformity
US11251026B2 (en) * 2017-03-31 2022-02-15 Mattson Technology, Inc. Material deposition prevention on a workpiece in a process chamber
CN110402481B (zh) * 2017-10-17 2023-07-21 株式会社爱发科 被处理体的处理装置
JP7101055B2 (ja) * 2018-06-12 2022-07-14 東京エレクトロン株式会社 静電チャック、フォーカスリング、支持台、プラズマ処理装置、及びプラズマ処理方法
JP7105666B2 (ja) 2018-09-26 2022-07-25 東京エレクトロン株式会社 プラズマ処理装置
US11450545B2 (en) * 2019-04-17 2022-09-20 Samsung Electronics Co., Ltd. Capacitively-coupled plasma substrate processing apparatus including a focus ring and a substrate processing method using the same
KR102214333B1 (ko) 2019-06-27 2021-02-10 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
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CN120693972A (zh) * 2023-02-28 2025-09-23 东京毅力科创株式会社 等离子处理装置、基板支撑部和边缘环的消耗修正方法

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CN1518073A (zh) * 2003-01-07 2004-08-04 ���������ƴ���ʽ���� 等离子体处理装置及聚焦环
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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101053066B (zh) * 2004-11-02 2012-02-01 松下电器产业株式会社 等离子体处理方法和等离子体处理设备
US7767055B2 (en) 2004-12-03 2010-08-03 Tokyo Electron Limited Capacitive coupling plasma processing apparatus
CN1825556B (zh) * 2005-02-25 2010-10-13 佳能安内华股份有限公司 晶片支架
CN101238553B (zh) * 2005-08-08 2014-07-02 朗姆研究公司 带有介电间隔环的边缘环组件
CN101609779B (zh) * 2008-06-19 2012-07-04 东京毅力科创株式会社 聚焦环以及等离子体处理装置
CN101901744B (zh) * 2009-05-27 2013-01-30 东京毅力科创株式会社 等离子处理用圆环状零件及等离子处理装置
CN101901744A (zh) * 2009-05-27 2010-12-01 东京毅力科创株式会社 等离子处理用圆环状零件及等离子处理装置
CN101989543B (zh) * 2009-08-07 2012-09-05 中微半导体设备(上海)有限公司 一种用于减少基片背面聚合物的装置
CN103165494A (zh) * 2011-12-08 2013-06-19 中微半导体设备(上海)有限公司 一种清洁晶片背面聚合物的装置和方法
CN103165494B (zh) * 2011-12-08 2015-12-09 中微半导体设备(上海)有限公司 一种清洁晶片背面聚合物的装置和方法
CN103646841A (zh) * 2013-11-22 2014-03-19 上海华力微电子有限公司 一种等离子体刻蚀设备
CN103646841B (zh) * 2013-11-22 2016-01-27 上海华力微电子有限公司 一种等离子体刻蚀设备
TWI574295B (zh) * 2014-02-25 2017-03-11 闊斯泰股份有限公司 聚焦環

Also Published As

Publication number Publication date
CN101996843A (zh) 2011-03-30
KR100657054B1 (ko) 2006-12-13
US7850174B2 (en) 2010-12-14
JP2009177199A (ja) 2009-08-06
JP2004235623A (ja) 2004-08-19
TW200416801A (en) 2004-09-01
US8114247B2 (en) 2012-02-14
JP5079729B2 (ja) 2012-11-21
TWI357091B (enExample) 2012-01-21
US20040134618A1 (en) 2004-07-15
JP4421305B2 (ja) 2010-02-24
CN101996843B (zh) 2013-05-01
KR20040063825A (ko) 2004-07-14
US20110048643A1 (en) 2011-03-03

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