CN1455951A - Lift type substrate treatment device, and substrate treatment system with the substrate treatment device - Google Patents
Lift type substrate treatment device, and substrate treatment system with the substrate treatment device Download PDFInfo
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- CN1455951A CN1455951A CN02800031A CN02800031A CN1455951A CN 1455951 A CN1455951 A CN 1455951A CN 02800031 A CN02800031 A CN 02800031A CN 02800031 A CN02800031 A CN 02800031A CN 1455951 A CN1455951 A CN 1455951A
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- substrate
- board treatment
- conveyance
- substrate board
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
Abstract
A lift type substrate treatment device having a function to transfer a substrate from one to the other side of a treatment line and capable of treating the substrate during transfer, and a substrate treatment system having the lift type substrate treatment device; the lift type substrate treatment device, comprising a cabinet-like cover body (11) having a substrate inlet (11a) and a substrate outlet (11b) provided therein parallel with each other in vertical direction, a transfer supporting means forming a treatment mechanism (20) installed in the cover body (11), supportedly accepting the substrate carried in from the substrate inlet (11a), and discharging the substrate from the substrate outlet (11b), a support frame (21) for supporting the transfer/supporting means, the treatment mechanism (20) disposed above the transfer/supporting means and having a treatment fluid discharge means for discharging the treatment fluid onto the substrate, and a lifting mechanism (40) for supportedly lifting the treatment mechanism (20) in vertical direction to move the treatment mechanism (20) to the substrate inlet (11a) and the substrate outlet (11b).
Description
Technical field
The invention relates to semiconductor (silicon) wafer, liquid crystal glass base, light shield with glass substrate, CD various substrates with substrate etc. on, it is simultaneously moved the processing unit that (conveyance) one side is carried out set processing, and a plurality of processing unit are linked and the base plate processing system that constitutes.
Background technology
For example, in the manufacturing process of liquid crystal glass base, there is the wet type process to handle,, between each wet type process is handled, then has to clean and handle and dried as the coating of the coating of imaging liquid, etching solution, in order to peel off stripper coating that the photoresistance film does etc.
With regard to carrying out above-mentioned each processing unit of handling, have a kind of on the conveyance roller mounting substrate, utilize this conveyance roller limit that substrate is transferred the processing unit that handle on the limit in the horizontal direction, also have a kind of for carry out continuously above-mentioned each handle each processing unit linked the base plate processing system that constitutes as shown in figure 10.
Figure 10 is that the summary of existing base plate processing system constitutes vertical view, and is as shown in the drawing, this base plate processing system 200 be by substrate input/discharge portion 201, processing substrate portion 205, and substrate transferring portion 210 constituted.Aforesaid base plate input/discharge portion 201 is made of mounting table 202 and shifting apparatus 204 that mounting the card casket 203 of taking in a plurality of substrates, this shifting apparatus 204 is that the substrate the card casket 203 on 202 from mounting in mounting table is taken out and drop into processing substrate portion 205 one by one, and the substrate of finishing dealing with is taken out from processing substrate portion 205 put in the card casket 203 again.Again, shifting apparatus 204 normally is made of the automaton that can move at the length direction of mounting table 202.
Aforesaid base plate handling part 205 be by be parallel to each other side by side the 1st handling part 206 and 2 of the 2nd handling part 207 handle lines and constituted, the 1st handling part 206 and the 2nd handling part 207 are as shown in figure 11, possess a plurality of conveyance rollers 208 respectively, utilize this conveyance substrate limit, conveyance roller 208 limit to carry out set processing along direction of arrow conveyance substrate.For example, the 1st handling part 206 is etch processes portions of substrate, and etching solution is coated on the substrate in the conveyance.The 2nd handling part 207 is made of washing handling part 207a and the 207b of dried portion, supply with at washing handling part 207a and clean water substrate, and the 207b of dried portion to substrate on supply drying gas.
Aforesaid base plate conveying unit 210 is the mechanism of substrate transferring to the 2 handling parts 207 after being handled by the 1st handling part 206, and possesses: the substrate that the conveyance direction of the substrate that will be discharged from the 1st handling part 206 switched the direction switching device shifter 211 of back conveyance, will be discharged from direction switching device shifter 211 is along a plurality of conveyance rollers 212 of aforementioned discharge direction conveyance and will be switched and the direction switching device shifter 213 of conveyance to the 2 handling parts 207 by the conveyance direction of the substrate of 212 conveyances of conveyance roller.
Aforementioned direction switching device shifter 211 has as shown in figure 12: a plurality of on the horizontal plane identical with the conveyance face of the conveyance roller 208 that consists of the 1st handling part 206 and come with identical conveyance direction conveyance substrate K the 1st conveyance roller 214, be disposed between this 1st conveyance roller 214 and along above-below direction prominent in the lifter 215 of the conveyance face of the 1st conveyance roller 214 with not ing, reach plural groups and above the conveyance face of the 1st conveyance roller 214, be configured to toward each other and have and the central shaft of the 1st conveyance roller 214 orthogonality of center shaft and the 2nd conveyance roller 216 that substrate K conveyance to conveyance roller 212 sides are used. Also have, the 2nd conveyance roller 216 respect to one another can move in the closer to each other/direction of separating.Again, 217 among the figure is used for the block of preventing substrate K to move.
Through direction switching device shifter 211 thus, the substrate K that is discharged from the 1st handling part 206 by the 1st conveyance roller 214 by along the conveyance of aforementioned discharge direction till touch block 217.This moment, lifter 215 was the belows that are submerged in the conveyance face of the 1st conveyance roller 214.Then, lifter 215 is outstanding towards the top from the conveyance of the 1st conveyance roller 214, allows substrate K rise to locating shown in 2 chain lines among Figure 12 through mode thus.The 2nd conveyance roller 216 of this moment is to be positioned at the position of leaving mutually.After the 2nd conveyance roller 216 moved to approaching mutually position, lifter 215 was fallen then.Utilize this mode to allow substrate K present the state that is being supported by the 2nd conveyance roller 216, then, utilize this 2nd conveyance roller 216 to come conveyance perpendicular to the conveyance direction of the 1st conveyance roller 214, conveyance is just discharged to conveyance roller 212 rear flank.The conveyance direction of carrying out substrate K is in this way switched.
Though indicate especially among the figure, also be to possess the formation roughly the same in aforementioned direction switching device shifter 213 with above-mentioned direction switching device shifter 211, will switch via the substrate K of 212 conveyances of conveyance roller after its conveyance direction in conveyance to the 2 handling parts 207.
As shown in figure 10 in this base plate processing system 200, be that the 1st handling part 206, substrate transferring portion 210 and the 2nd handling part 207 are configured to seem to be the shape of contrary C on the plane, the substrate K that is taken out from card casket 203 via shifting apparatus 204 is devoted in the 1st handling part 206 earlier.After then substrate K is bestowed set processing (etch processes) along direction of arrow one side conveyance one side in the 1st handling part 206, in substrate transferring portion 210, the conveyance direction is devoted in the 2nd handling part 207 after changing.After substrate K is bestowed set processing (washing is handled and dried) along direction of arrow one side conveyance one side in the 2nd handling part 207 then, utilize shifting apparatus 204 that it is accommodated in the card casket 203 once more.
When substrate K in the 1st handling part 206 and 207 conveyances of the 2nd handling part, posture changes, and for example when the direction vertical with the conveyance direction tilts, just can't carry out high-precision processing.Therefore existing method is as shown in figure 11, forms the blade of a sword 208a of portion on the roller at the both ends of above-mentioned conveyance roller 208, utilizes the 208a of this blade of a sword portion, controls the substrate K posture in the conveyance.On the 1st above-mentioned conveyance roller 214 and the 2nd conveyance roller 216 also is the structure of equal state.But after being provided with this kind blade of a sword 208a of portion, can be because the obstruction of the 208a of this blade of a sword portion and can't be in the conveyance direction of the conveyance face inner conversion substrate K of conveyance roller 208.Therefore, utilize above-mentioned direction switching device shifter 211,213 that substrate K is promoted to the top of the 208a of blade of a sword portion upper end and then its conveyance direction of conversion.
Also have, if use for the substrate transferring portion 210 of improving substrate K for the foregoing reasons, owing to can't carry out the processing of substrate K in this substrate transferring portion 210, so only carry out the conveyance operation of substrate K.That is to say,, when substrate elevating, can produce, and cause the phenomenon of clean effect inequality by the part of the powerful hydro-peening of the detergent remover that sprays in nozzle institute and the part of non-powerful hydro-peening if substrate K is cleaned at this place.
Therefore, in existing base plate processing system 200, all in substrate transferring portion 210, can not handle as mentioned above substrate K, but still owing to this kind mode produces following problem.
That is to say, as shown in figure 10, after in the 1st handling part 206, substrate K being bestowed etch processes, under cleaning state during with its conveyance, etching progress degree difference to some extent can be made because of the deviation of conveyance to the 207 required conveyance times of 2 handling parts, and etch processes can't be controlled accurately.Because substrate transferring portion 210 has the actuating mechanism by the complexity that travel mechanism constituted of the elevating mechanism of substrate K and the 2nd conveyance roller 216, be very difficult so will control its conveyance time accurately.
Again, for example when cleaning operation as the final operation of the 1st handling part 206, under the moist state of substrate K during conveyance, the surface is can uneven drying even or produce stains and make substrate K become defective products.
In existing base plate processing system 200, be to handle lines with the 1st handling part 206 and the 2nd handling part 207 2 to give parallel being arranged side by side, so the inefficient problem of being provided with of device is also arranged again.
Summary of the invention
The objective of the invention is in view of above problem, a kind of substrate board treatment be provided and possess the base plate processing system of this device, its with substrate by a side processing line conveyance to the opposing party's processing line, and can handle the substrate in the conveyance.
In order to solve above-mentioned problem elevation type substrate board treatment of the present invention is to have: have up and down side by side the substrate input port and the housing shape lid of substrate outlet; Be loaded on the processing mechanism in the aforementioned lid, it possesses takes in and is supporting the substrate moved into from the aforesaid base plate input port and discharge the conveyance and the supporting mechanism of aforesaid base plate, the top of supporting the support pallet of this conveyance and supporting mechanism and being equipped on this conveyance and supporting mechanism from the aforesaid base plate outlet, is used for the processing fluid ejection mechanism that fluid is handled in ejection on by this conveyance and supporting mechanism substrate supported; And supporting aforementioned processing mechanism and making its oscilaltion, and make the elevating mechanism of this processing mechanism through aforesaid base plate input port and substrate outlet.
Elevation type substrate board treatment according to this, processing mechanism understand toward upper and lower to lifting by elevating mechanism, and passes through substrate input port and substrate outlet.Again, the substrate that processing mechanism is discharged in will the handling part by preceding operation through the substrate input port time is taken in and is supported from the aforesaid base plate input port, in the process that moves to the substrate outlet, handle fluid and from handle fluid ejection mechanism, be ejected on the substrate.Substrate is subjected to set processing thus, handles the back and discharges and the migration subsequent processing from the aforesaid base plate outlet.
Elevation type substrate board treatment according to this, have conveyance and supporting mechanism that is supporting substrate and all liftings of processing mechanism that the processing fluid that is subjected to the substrate supported ejection to handle fluid sprayed mechanism because of allowing, so the substrate mutual alignment relation inter-agency with handling the fluid ejection do not change when the conveyance substrate, therefore for example when cleaning substrate, can allow roughly each position on the supplying substrate equably of the detergent remover that from handle fluid ejection mechanism, sprays, be carried out cleaning uniformly operation.
Again, more or less freely on the speed control because can utilize elevating mechanism to come the conveyance substrate by the processing mechanism lifting with single action, so when carrying out etching etc. and handle, can carry out high-precision control to it.
Also have, aforementioned processing fluid of the present invention comprises imaging liquid, etching solution, the various fluids when being used for peeling off the stripper of photoresistance film and cleaning treatment substrate such as the clean water of usefulness, desiccant gas, various processing fluid supplying substrates can be applied processing.
Again, also aforementioned conveyance and supporting mechanism can be made after it takes in aforesaid base plate, allow the aforesaid base plate taken in move forward and backward repeatedly along the input/discharge direction of aforesaid base plate.
In above-mentioned elevation type substrate board treatment, though be that the aforesaid processing fluid that sprays from handle fluid ejection mechanism of allowing is roughly equably on each position of supplying substrate, for example handling fluid itself to have the higher and lower position of pressure sometimes but then and produce when inhomogeneous, is being to carry out the processing of homogeneous to substrate strictly speaking in such cases.
If therefore as mentioned above conveyance and supporting mechanism are made the substrate that allows it take in, to support, along its substrate move into/discharge repeatedly the formation that moves forward and backward of direction the time, the pressure uneven phenomenon that the processing fluid is acted on the substrate by moving forward and backward of substrate averages out, and can carry out the processing of homogeneous to substrate.
Again, in aforementioned elevation type substrate board treatment, its lid is to utilize to separate member the input/discharge direction of aforesaid base plate is divided into drive chamber and two chambers of process chamber, simultaneously on the aforementioned processing chamber that possesses aforesaid base plate input port and substrate outlet, set aforementioned processing mechanism, and set aforementioned elevating mechanism in aforementioned drive chamber on the other hand; On member, form the peristome that is communicated with aforementioned processing chamber and drive chamber in aforementioned zones along its above-below direction; Form tubular respectively being formed at the two edge portions along above-below direction of aforementioned zones, and on respect to one another of this a pair of cylindrical portion, form gap slot along above-below direction every the peristome of member; The aforementioned support pallet utilization of aforementioned processing mechanism be located at aforementioned zones in the peristome of member the binding tool and and aforementioned elevating mechanism link; Aforementioned binding tool connecting plate lamellar body (sheet), this plate body are to be equipped between aforementioned a pair of cylindrical portion, and are adapted to the band-like plate lamellar body that extends toward the top and the below of aforementioned binding tool, and its both side edges portion is injected in the aforementioned cylindrical portion by aforementioned gap slot respectively; Aforementioned drive chamber and process chamber are separated every member, binding tool and plate body by aforementioned zones.
The corrosivity of handling the aforementioned imaging liquid that contained in the fluid, etching solution, stripper etc. is strong, when this liquid is attached on the elevating mechanism, can worries to cause this elevating mechanism damage and undermines its function.Therefore, if will be equipped with the drive chamber of elevating mechanism and be equipped with the process chamber of processing mechanism, utilization separates the words that member, binding tool and plate body are separated, just can prevent that employed processing fluid is invaded in the drive chamber in the process chamber, and can prevent that elevating mechanism from damaging owing to handling fluid.The edge portion along above-below direction that especially will be located at the peristome that separates member makes tubular, to be adapted to toward the top that links tool simultaneously and the both side edges portion of the plate body of below extension, from the gap slot that is formed at aforementioned cylindrical portion, insert in this cylindrical portion, and constitute dioptric type (labyrinth) structure, drive chamber and process chamber can be made both sides and all have high-air-tightness.
Also have, aforementioned peristome, binding tool and the plate body of plural groups also can be set.Again,, can utilize aforementioned exhaust gear to be got rid of, invade in the drive chamber so can prevent to handle fluid more really by the processing fluid that the gap of aforementioned panels lamellar body and gap slot is invaded in the cylindrical portion if be provided with for the exhaust gear of discharging gas in the aforementioned cylindrical portion.
The aforementioned panels lamellar body can be formed endless loops in addition.Also coiling/the delivering mechanism of the aforementioned panels lamellar body of reeling/send can be located at the upper side and the lower side of aforementioned panels lamellar body respectively, the action of the aforementioned panels lamellar body of lifting along with utilizing aforementioned elevating mechanism, utilize this coiling/delivering mechanism to carry out the coiling of aforementioned panels lamellar body/send, coiling/delivering mechanism is the wireline reel by coiling aforementioned panels lamellar body, and the driving mechanism of this wireline reel of rotation constitutes, aforementioned driving mechanism also only allows braking force act on the wireline reel toward discharging when direction is rotated when aforementioned wireline reel, on the other hand when aforementioned wireline reel when coiling direction rotates then by friction clutch and with transmission of power extremely on the aforementioned wireline reel and constitute.Coiling/delivering mechanism according to this, the plate body can not relax, and can carry out its coiling, sends action.
Again, aforementioned driving mechanism has: the driven gear that is linked to aforementioned wireline reel, and be engaged in the driven wheel of driven gear, and link friction clutch on the driven wheel so far, and link the rotating shaft of friction clutch so far, and 2 respectively therewith the both ends of rotating shaft link and only allow that rotating shaft can be towards the folk prescription of direction rotation to clutch, and by aforementioned folk prescription in clutch a side and be linked to pulley on the aforementioned rotating shaft, and around the driving-belt of rolling up on this pulley, and supporting aforementioned folk prescription the opposing party's in clutch supporting member, aforementioned 2 folk prescriptions can make the rotation of allowing aforementioned rotating shaft to clutch allows aforementioned wireline reel rotate towards coiling direction, and limit the rotation of aforementioned rotating shaft on the other hand and do not allow aforementioned wireline reel towards discharging the direction rotation, aforementioned driving-belt is to make by aforementioned elevating mechanism to allow the formation of its turn simultaneously.
According to elevation type substrate board treatment with above-mentioned formation, with show greatly the 1st substrate board treatment that horizontal direction allows substrate move to handle and the 2nd substrate board treatment with upper and lower to being arranged side by side, allow the substrate discharge portion of the 1st substrate board treatment and the substrate input port of aforementioned elevation type substrate board treatment interconnect, allow the substrate throw-in part of the 2nd substrate board treatment and the substrate outlet of aforementioned elevation type substrate board treatment interconnect on the other hand, can construct and sell substrate in regular turn by the 1st substrate board treatment, the elevation type substrate board treatment, the 2nd substrate board treatment and the base plate processing system that constitutes, be compared to the 1st substrate board treatment and the 2nd substrate board treatment are arranged side by side above-mentioned existing treatment system in same horizontal plane, can make with the less base plate processing system that the space is enough usefulness that is provided with.
Description of drawings
Fig. 1 is the front view that the summary of the base plate processing system of the preferred embodiment for the present invention constitutes.
Fig. 2 is the vertical view of Fig. 1.
Fig. 3 is the front sectional elevation of Fig. 1.
Fig. 4 is the front sectional elevation of the decontaminating apparatus of present embodiment.
Fig. 5 is the top plan view of the II position of elevation type substrate board treatment shown in Fig. 3.
Fig. 6 is the top plan view of the III position of elevation type substrate board treatment shown in Fig. 3.
Fig. 7 is the profile of overlooking of the coiling/delivering mechanism of present embodiment.
Fig. 8 is the vertical view of the base plate processing system summary formation of another form of the present invention.
Fig. 9 is the end view of arrow IV direction among Fig. 8.
The vertical view that Figure 10 constitutes for existing base plate processing system summary.
Figure 11 is the front view of existing conveyance roller.
Figure 12 is that the summary of existing direction switching device shifter constitutes schematic diagram.
Fig. 3 also is the cross section view of arrow I-I direction among Fig. 5.
Wherein omit the hacures of Fig. 3 to Fig. 7 midship section part.
Embodiment
Below in order to do more detailed explanation at the present invention, formula is illustrated with reference to the accompanying drawings.
At first the formation at the base plate processing system 1 of present embodiment is illustrated.
As shown in Figures 1 and 2, the base plate processing system 1 of present embodiment be by substrate input/discharge portion 2, up and down and the 1st substrate board treatment of establishing 6 and the 2nd substrate board treatment 7, and elevation type base plate processing system 10 constituted.Substrate input/discharge portion 2 is a plurality of mounting tables 4 of taking in the card casket 5 that substrate uses, and substrate is piecemeal by taking out the card casket 5 of mounting on mounting table 4 in and devote in the 1st substrate board treatment 6 by mounting, and the substrate after will finishing dealing with is on the other hand constituted by taking out in the 2nd substrate board treatment 7 and take in to card casket 5 interior shifting apparatus 3.Also have, shifting apparatus 3 is by being constituted by (direction shown in the arrow) mobile automaton on the length direction of mounting table 4.Again, card casket 5 is to give conveyance by the carrying devices such as AGV that do not show among the figure.
Aforementioned the 1st substrate board treatment 6 and the 2nd substrate board treatment 7 are to come the conveyance substrate according to direction shown in the arrow respectively, and possess a plurality of conveyance rollers 208 as shown in figure 11, utilize these conveyance roller 208 one side conveyance substrates simultaneously to carry out set processing.In this example, the 1st substrate board treatment 6 constitutes and can carry out etch processes to substrate, the 2nd substrate board treatment 7 constitutes to clean substrate and handles and dried.
As Fig. 3, Fig. 5 and shown in Figure 6, aforementioned elevation type base plate processing system 10 is made of the lid 11 that makes basket body and processing mechanism 20 and elevating mechanisms 40 of being disposed in this lid 11.On lid 11, form and be communicated to the peristome 11a in the 1st substrate board treatment 6 and be communicated to peristome 11b in the 2nd substrate board treatment 7 again.Again, lid 11 is being supported by pillar 12, and its inside is separated again to disposing the process chamber A of processing mechanism 20, and is disposing the B of drive chamber of elevating mechanism 40.
Aforementioned each nozzle 29 is to set firmly in the drawings to show on the supply pipe 28 that is connected in the detergent remover supply source, the detergent remover ejection above substrate K that will be supplied with by this supply pipe 28.Identical, aforementioned each nozzle 30 is to be fixedly arranged on the supply pipe 31 that is connected in the aforementioned detergent remover supply source, the detergent remover ejection below substrate K that will be supplied with by this supply pipe 31.Again, shown in the figure 32 for being used for detecting the transducer whether substrate K is arranged.
In the lower end of enclosing cover 23 collecting tank 24 that is interconnected by peristome 23b is being set, is being reclaimed by aforementioned collecting tank 24 by the detergent remover that is sprayed in the aforementioned nozzle 29,30, and suitable being discharged by delivery pipe 25.
Vertical cancellate framework 17 is made and formed to upright establishing by square tube in the aforementioned B of drive chamber, and aforementioned elevating mechanism 40 is disposed on this framework 17.Framework 17 is assembled on the aforementioned pillar 12 by carriage 18 again.
Aforementioned elevating mechanism 40 is by by linking tool 55,56 and 57,58 and be connected to the lifting platform 44 that supports on the pallet 13, and to be arranged side by side the pair of guide rails 45 on the longeron that constitutes aforesaid frame 17 (vertical stack) towards aforementioned processing chamber A side, and can be respectively along each guide rail 45 and arbitrarily the move mode engaging is thereon, and be fixedly arranged on the sliding component 46 on the aforementioned lifting platform 44, and by aforesaid frame 17 supported and with the aforementioned guide rail 45 parallel ball screws that can rotate arbitrarily 41, and be fixed on the aforementioned lifting platform 44 and therewith ball screw 41 be the nut 42 of the state of screwing togather, and be fixed in the servo motor 43 that is used for driving aforementioned ball screw 41 rotations on the aforesaid frame 17 and constitute.
The words that allow ball screw 41 rotate via servo motor 43, the nut 42 that screws togather thereon just moves (lifting) along ball screw 41, be connected in this moment lifting platform 44 on the nut 42, by link tool 55,56 and 57,58 and therewith the support pallet 13 that connects of lifting platform 44, and by supporting decontaminating apparatus 22 that pallet 13 supported just and nut 42 1 liftings.
Be to utilize to separate member 11a, 14,16 and separated between aforementioned B of drive chamber and the process chamber A.Form peristome respectively separating member 11a, 14 and separate 14,16 of members, and aforementioned binding tool 55,56 and 57,58 is disposed at respectively in each peristome.Again, make cylindrical portion along this edge portion at both side edges portion 15 places that separate member 14 that form each peristome, and cylindrical portion therewith relatively to aforementioned zones each edge portion place on member 11a, 16 fixing cylindrical member 13 along this edge portion respectively.Also have being positioned at aforementioned zones and on the cylindrical portion 15 at member 14 both side edges portions place and each subtend face that is positioned at aforementioned cylindrical member 13, form slot cut respectively along above-below direction.
Again in aforementioned zones between cylindrical portion 15 and aforementioned cylindrical member 13 in the member 14 both side edges portions, banded plate body 65,66 is being set along its edge portion respectively.The both side edges of this plate body 65,66 is to insert in cylindrical portion 15, the cylindrical member 13 via aforementioned slot cut respectively, and utilizes binding tool 55,56 and 57,58 to be fixed in the state of seizing on both sides by the arms from front and back on this binding tool.Then with each upper end of plate body 65,66 and lower end again respectively around twisting on coiling/delivering mechanism 70 described later.Again, aforementioned cylindrical portion 15 and cylindrical member 13 are to utilize the suitable exhaust apparatus that does not show among the figure and its gas inside is discharged.Also have, though aforementioned panels lamellar body the 65, the 66th in the present embodiment adopts to have good rub resistance and corrosion proof special teflon (Teflon) panel.But be not limited to this material, also can use other for example material of stainless steel.
From the above mentioned, the aforementioned B of drive chamber and process chamber A come down to utilize and separate member 11a, 14,16, cylindrical member 13,15 links tool 55,56,57,58, plate body 65,66 and being separated out.
And for example shown in Figure 5ly on aforementioned lifting platform 44, assembling CD-ROM drive motor 60, above also balancer 50 being connected simultaneously.CD-ROM drive motor 60 is to be fixed on the aforementioned lifting platform 44 by carriage 62, drives conveyance roller 26 in the aforementioned decontaminating apparatus 22 by driving-belt 61.On the other hand, balancer 50 be by with opposing parallel in the state of aforementioned guide rail 45 and be fixed in guide rod 51 on the aforementioned framework 17, and be sticked on this guide rod 51 and also be sticked on the aforementioned lifting platform 44 simultaneously, can be along this guide rod 51 and the body 52 that moves constitutes.
Aforesaid roll around/delivering mechanism 70 is as shown in Figure 3, by top that is arranged at aforementioned framework 17 and two places, bottom, concrete going up as winding off spindle 72,76 that shows among Fig. 6 and the driving shaft 71 that is connecting this winding off spindle 72,76 both sides, and the gear 85 of these driving shaft 71 usefulness of driving constitutes.
Winding off spindle the 72, the 76th utilizes carriage 75,79 to be supported in the mode that can rotate arbitrarily respectively.Allow plate body 66 process in regular turn be supported in the mode that can rotate arbitrarily on the guide wheel 73,74 on the aforementioned bracket 75 again its end then, allow plate body 65 process in regular turn be supported in the mode of any rotation on the guide wheel 77,78 on the aforementioned bracket 79 again its end around rolling up on aforementioned winding off spindle 76 around rolling up on aforementioned winding off spindle 72.
Aforesaid gears 85 is to be fixed in as shown in Figure 7 on the torsion holding device 86.Torsion holding device 86 is to be interconnected with axial region with rotating shaft 81, and rotating shaft 81 is to utilize the bearing 90 and the one-way clutch 87 that are fixed on the carriage 84 to be supported.In the end of rotating shaft 81 pulley 80 is being set via one-way clutch 88 again.Therefore gear 85 is to be meshing with each other with the gear 89 that is fixed on the aforementioned driving shaft 71.Also have aforementioned one-way clutch 87,88 to have the function of restriction rotating shaft 81 direction of rotation.In the present embodiment when coiling/delivering mechanism 70 is arranged on top, can be in the rotation of arrow E direction at restriction rotating shaft 81, allow its rotation towards arrow F direction, and when coiling/delivering mechanism 70 is arranged on the bottom, can at restriction rotating shaft 81 in the rotation of arrow F direction, allow its rotation towards the arrow E direction.Also have the just so-called friction clutch of torsion holding device 86, can apply set braking force (brake weight) on rotating shaft 81.
And for example shown in Figure 3 on the aforementioned pulley 80,80 that is arranged at the upper-lower position place, around rolling up the driving-belt 82 that forms continuous shape, driving-belt 82 is to utilize the bracing frame (Holder) 83 that is fixed on the aforementioned nut 42 being kept.
Then the action at the base plate processing system 1 that possesses above-mentioned formation is illustrated.Also have aforementioned elevation type base plate processing system 10 as among Fig. 3 with as shown in the solid line state.
At first utilize shifting apparatus 3 with substrate K taking-up from card casket 5 in regular turn, drop in the 1st substrate board treatment 6.Substrate K after the input is after one side is bestowed set processing (etch processes) according to direction of arrow conveyance one side in the 1st substrate board treatment 6, more in regular turn by discharging in the 1st substrate board treatment 6.
Next allow the substrate K peristome 11a that passes through elevation type base plate processing system 10, the peristome 23a in regular turn that takes out enter in the decontaminating apparatus 22, and move into to its inside via the effect of conveyance roller 26, substrate K move in the process or moving into the back begins to carry out the clean operation of substrate K from nozzle 29,30 ejection detergent removers.The continuous conversion between both forward and reverse directions that is rotated in aforementioned conveyance roller 26 till cleaning the end of job allows aforesaid base plate K move forward and backward with set distance along moving into/discharge direction then.Change when moving even cutting down output from spray volume, the ejection of nozzle 29,30 ejection detergent removers in this way, utilize the mode that allows substrate K move forward and backward the uneven state above the substrate K can be given equalization, and be able to substrate K is cleaned uniformly.
Finish with substrate K in decontaminating apparatus 22 move into operation after, then the driving by servo motor 43 in the elevating mechanism 40 allows decontaminating apparatus 22 fall.That is to say and utilize servo motor 43 to allow ball screw 41 rotate towards the decline direction, make the nut 42 that is screwed together on this screw rod fall along ball screw 41, allow simultaneously be linked to lifting platform 44 on the nut 42, by link tool 55,56 and 57,58 and therewith the support pallet 13 that connects of lifting platform 44, and fall together by supporting decontaminating apparatus 22 and the nut 42 that pallet 13 supported.
When nut 42 was fallen, the driving-belt 82 that is connected on the nut 42 by bracing frame 83 just moved towards the rotation of the C direction shown in the arrow.When binding tool 55,56 and 57,58 is fallen, the plate body 65,66 that is fixed thereon face can move toward the below together, at the same time, plate body 65,66 can discharge from the coiling/delivering mechanism 70 that is arranged at top, and plate body 65,66 also can be around volume to the coiling/delivering mechanism 70 that is arranged at the bottom.
Utilize Fig. 7 with the coiling of this coiling/delivering mechanism 70/send detailed being described as follows of action.Fig. 7 is the flat sectional drawing that is arranged at the coiling/delivering mechanism 70 of top and bottom.Though in diagram, only be illustrated, also be identical situation linking on tool 55,56 and the plate body 65 at linking tool 57,58 and plate body 66.
At first be illustrated at the coiling/delivering mechanism 70 that is arranged at top.Can on plate body 66, produce tension force when linking when tool 57,58 is fallen, and wireline reel 72 is bestowed towards the rotary power shown in the arrow H direction.This rotary power can be in regular turn via the driving shaft 71 that is connected on the wireline reel 72, be fixed in the gear 88 on this driving shaft, with gear 88 meshed gears 85, the torsion holding device 86 that installs gear 85 is passed on the rotating shaft 81 then.But owing to so rotating shaft 81 is to utilize one-way clutch 87 to be limited toward the rotation of the direction of E shown in the arrow can't be towards equidirectional rotation.Therefore be created in the increase that the tension force of plate body 66 can be gradually and the torsion that is passed on the aforementioned torsion holding device 86 also increases thereupon.
In torsion holding device 86, after acting on torsion on the gear 85 and surpassing set sizes values, just allow the action direction rotation of gear 85 towards torsion.Gear 85 is towards the E direction shown in the arrow in this way, and gear 88, driving shaft 71 and wireline reel 72 divide other rotation towards the H direction shown in the rotation arrow, make plate body 66 discharge from wireline reel 72.Plate body 66 is to be discharged under the state that produces prescribed tension like this, so the phenomenon that can not relax in the process of discharging.
Falling via nut 42 on the other hand,, when as shown in Figure 3 arrow C direction turn of driving-belt 82, pulley 80 is the rotary powers that bear the arrow E direction, owing between pulley 80 and rotating shaft 81, disposing one-way clutch 88, pulley 80 is can at random rotate along the arrow E direction with respect to rotating shaft 81, so pulley 80 can at random rotate towards the arrow E direction by driving-belt 82 under clog-free situation.Though one-way clutch 88 is the rotations towards the arrow E direction of restriction rotating shaft 81, allows that it rotates towards arrow F direction.Therefore, one-way clutch 88 is can at random rotate along the arrow E direction with respect to rotating shaft 81.
Next be illustrated at the coiling/delivering mechanism 70 that is arranged at the bottom.In the coiling/delivering mechanism 70 that is arranged at the bottom, when nut 42 is fallen, during the turn of arrow C direction, pulley 82 is the rotary powers that bear the arrow E direction to driving-belt 82 as described above.As mentioned above when being arranged at the coiling of bottom/delivering mechanism 70, one-way clutch 87,88 can restriction rotating shafts 81 towards the rotation of arrow F direction, allow that but then it rotates towards the arrow E direction.Therefore, when pulley 82 bore the rotary power of the direction of E shown in the arrow, rotating shaft 81 just rotated towards equidirectional.When rotating shaft 81 when the arrow E direction is rotated, its rotary power can be passed on driving shaft 71 and the wireline reel 72 by torsion holding device 86, gear 85 and gear 88, allows these install towards the rotation of arrow H direction and with plate body 66 around rolling up on wireline reel 72.
Also have in the present embodiment in order to make the winding speed of wireline reel 72 fast, and set diameter, and the gear ratio of 88 of gear 85 and gears of the diameter of axle, the pulley 80 of wireline reel 72 than the translational speed of plate body 66 and driving-belt 82.When the winding speed of wireline reel 72 is fast than plate body 66 translational speeds, result from the plate body 66 tension force then gradually, increase the torsion be passed on the torsion holding device 86 and also increase thereupon.As mentioned above in torsion holding device 86, after acting on torsion on the gear 85 and surpassing set sizes values, just allow the action direction rotation of gear 85 towards torsion.Produce slippage (Slip) state through mode thus at gear 85 and 81 on rotating shaft, rotating shaft 81 can be followed belt 80 without barrier and rotated towards the arrow E direction.Allow plate body 66 under the state that produces set tension force, reel in this way, so the phenomenon that in the process of reeling, can not relax.
As the above mode that describes in detail, utilize the coiling/delivering mechanism 70 in the present embodiment, can not produce the coiling that carries out plate body 65,66 under the relaxed state and discharge operation along with falling of decontaminating apparatus 22.
After decontaminating apparatus 22 drops to the decline end position, next allow aforementioned conveyance roller 26 towards discharging the direction rotation substrate K be discharged from peristome 23a as mentioned above, the peristome 11b from lid 11 is transferred to it in the 2nd substrate board treatment 7 again.Utilize 2 chain lines among Fig. 3 to represent state after decontaminating apparatus 22 arrives the decline end positions again.
Behind the discharging operation of having finished substrate K, decontaminating apparatus 22 just stops to spray detergent remover from nozzle 29,30.Driving via servo motor 43 in the elevating mechanism 40 allows decontaminating apparatus 22 rise then.Then utilize and above-mentioned opposite manner of execution at this moment, plate body 65,66 is wound on the coiling/delivering mechanism 70 that is arranged at top, and plate body 65,66 is discharged from the coiling/delivering mechanism 70 that is arranged at the bottom.
After decontaminating apparatus 22 arrives the rising end position, just repeat aforesaid substrate K and move into later action then.When decontaminating apparatus 22 liftings, utilize balancer 50 to alleviate the load that acts on the servo motor 43 again.
On the other hand, the substrate K of one side after will moving into is toward direction of arrow conveyance in the 2nd substrate board treatment 7, one side is bestowed set processing (washing is handled and dried), utilizes shifting apparatus 3 to be accommodated in the card casket 5 again the substrate K that handles and discharge.In this way in the base plate processing system 1 of present embodiment, be accommodated in substrate K in the card casket 5 and be in regular turn via the 1st substrate board treatment 6, elevation type base plate processing system 10 and the 2nd substrate board treatment 7, after being bestowed set processing, be incorporated in once more in the card casket 5.
In the above base plate processing system 1 that is described in detail in present embodiment, be that the 1st substrate board treatment 6 and the 2nd substrate board treatment 7 above-below directions are arranged side by side, and utilize elevation type base plate processing system 10 that it is made the formation of mutual binding, so be compared to and existing the 1st substrate board treatment 6 and the 2nd substrate board treatment 7 be arranged side by side treatment system 200 in same horizontal plane, as long as less that the space is set is just enough, so can have the preferable efficient that is provided with.
Also have in the elevation type base plate processing system 10 of present embodiment, to carry out substrate K conveyance, support the conveyance roller 26 of usefulness and by the lifting that gives of nozzle 29,30 decontaminating apparatus that constituted 22 integral body of ejection detergent remover to the substrate K, so the position of 29,30 at substrate K and nozzle relation can't change when conveyance substrate K, therefore can be almost equably on each position of supplying substrate K from nozzle 29,30 detergent removers that sprayed, can carry out in this way cleaning uniformly handling.
Again owing to be to utilize elevating mechanism 40 that the single action that decontaminating apparatus 22 gives lifting is come conveyance substrate K, utilize servo motor 43, ball screw 41 and mechanism that nut 42 constitutes allow its lifting in addition, so can high-precisionly carry out its speed control with high control precision.
Employed etching solution has high corrosivity in the 1st substrate board treatment 6, and the clean water of this etching solution flows out from decontaminating apparatus 22 and when being attached on the elevating mechanism 40, cause the impaired misgivings of its function with regard to this mechanism of damage is arranged if contain.In the elevation type base plate processing system 10 of present embodiment, utilization separates member 11a, 14,16, cylindrical member 13,13, link tool 55,56,57,58, the process chamber A that plate body 65,66 will dispose the B of drive chamber of elevating mechanism 40 and dispose decontaminating apparatus 22 is separated and comes, so can prevent to invade in the B of drive chamber, and be prevented because etching solution causes the damage of elevating mechanism 40 from the etching solution that decontaminating apparatus 22 flows out.
Especially in the edge portion that separates the above-below direction of formation peristome between the member 11a, 14,16 cylindrical portion 15 and cylindrical member 13 are set respectively, to be fixed in the both side edges portion that links the plate body 65,66 on the tool 55,56 and 57,58 simultaneously inserts in the groove shape breach that is formed on cylindrical portion 15 and the cylindrical member 13, just form the seal construction on so-called labyrinth, utilize exhaust apparatus with cylindrical portion 15 and cylindrical member 13 exhaust gas inside simultaneously, invade in the B of drive chamber so can prevent etching solution really.
Though more than be illustrated at one embodiment of the present invention, the concrete form that the present invention taked is not limited to above-mentioned form.Though for example be to cooperate the lifting of decontaminating apparatus 22 and utilize coiling/delivering mechanism 70 to carry out the coiling or the discharge of plate body 65,66 in above-mentioned example, also can make and plate body 65,66 formed continuous annular for no reason and cooperating the lifting of decontaminating apparatus 22 and allow the formation of its turn.
Also having in the above example, is to make the formation of utilizing elevation type base plate processing system 10 and cleaning, and also can carry out etching or other processing but be not limited to this kind form.This also is useful on the 1st substrate board treatment 6 and the 2nd substrate board treatment 7 equally.
Also have, the elevation type substrate board treatment that uses the present invention to be correlated with has been done other form of base plate processing system, can similarly be for example the same shown in Fig. 8 and Fig. 9.This base plate processing system 100 is made of substrate input/discharge portion 101, dry process portion 110, decontaminating apparatus 120 as shown in Figure 8.
Substrate input/discharge portion 101 is a plurality of mounting tables 102 of taking in card casket 131 usefulness of substrate by mounting, and be used for the shifting apparatus 103 of conveyance substrate and constitute, shifting apparatus 103 is by being arranged on the track 104 and can be along its length direction and mobile transfer is constituted with automaton 105.Transfer possesses the arm that can move in three-dimensional optional position with automaton 105, utilization is with the state of substrate-placing on this arm, carry out in the card casket 131 on mounting table 102 substrate a slice a slice being taken out and being devoted the dry process portion 110, to drop in the decontaminating apparatus 120 from the substrate that dry process portion 110 is taken out, will be accommodated in the processing in the card casket 131 more once more from the substrate that decontaminating apparatus 120 is taken out.Also have, utilize automatic conveyance car 130 will block casket 131 and move on the mounting table 102, and with it by taking out of on this mounting table 102.
Dry process portion 110 is by being used for joining the mounting table 113 of substrate, and two be used for substrate is carried out that dry-etching is handled and the dry process device 111 of dry process flow processs such as film forming processing, and the transfer usefulness automaton 112 that is disposed between this mounting table 113 and the dry process device 111 constitutes.Transfer with automaton 112 be with aforementioned transfer with automaton 105 same possess the arm that can move in three-dimensional optional position, utilization is with the state of substrate-placing on this arm, carry out the substrate on the mounting table 113 is devoted in the dry process device 111, and substrate is taken out mounting handle from dry process device 111 in mounting table 113.
Fall at aforesaid base plate incorporating section 121, substrate that conveying unit 122, hairbrush are cleaned portion 123, tilt flushing handling part 124, substrate rising conveying unit 125, drying substrates portion 126 and substrate shift out possesses a plurality of conveyance rollers 208 as shown in figure 11 respectively in the portion 127, move into substrates in the substrate reception portion 121 utilize conveyance roller 208 with it towards direction of arrow conveyance, and in regular turn through plate fall conveying unit 122, hairbrush clean portion 123, tilt flushing handling part 124, substrate rising conveying unit 125, drying substrates portion 126 again conveyance to substrate shift out in the portion 127.
Again, clean portion 123 at hairbrush, in tilt flushing handling part 124, substrate rising conveying unit 125, the drying substrates portion 126, substrate be one side utilize conveyance roller 208 in addition conveyance simultaneously carry out set processing.
Substrate rising conveying unit 125 possesses and above-mentioned elevation type base plate processing system 10 structure much at one.Again, cleaning in the portion 123 at hairbrush is to utilize the rotation of hairbrush with substrate cleaning when water is cleaned in supply, be to supply with on the substrate of heeling condition and clean in the flushing handling part 124 that tilts with cleaning water, carrying out in substrate rising conveying unit 125 and above-mentioned elevation type base plate processing system 10 cleaning of mode much at one, is to utilize desiccant gas blown to allow this drying substrates to the substrate in drying substrates portion 126.
Also have, in the flushing handling part 124 that tilts, be formed inclined substrate, can in this inclination flushing handling part 124, allow it return back to level again, perhaps also can in substrate rises conveying unit 125, allow it return back to level again.
Utilize this base plate processing system 100 on mounting table 102, to be blocked substrate in the casket 131 like this by mounting, after taking out with automaton 105 a slice a slices and devote dry process portion 110 via transfer, drop into again in the decontaminating apparatus 120, or devote again in the dried portion 110 after dropping into decontaminating apparatus 120 earlier.
When devoting situations about dropping into again after the dry process portion 110 in the decontaminating apparatus 120 earlier and be illustrated as typical example, after substrate is dropped into dry process portion 110, in this dry process portion, utilize transfer it to be dropped in the dry process device 111 and carry out set dry process program with automaton 112.Substrate after process dry process device 111 is handled utilizes transfer to use automaton 112 with its taking-up, delivers to transfer again with on the automaton 105 by mounting table 113.
Then utilize transfer to drop in the decontaminating apparatus 120 with automaton 105, fall conveying unit 122, the clean portion 123 of hairbrush, inclination flushing handling part 124, substrate rising conveying unit 125, drying substrates portion 126 and substrate at process substrate reception portion 121, substrate in regular turn and shift out portion 127, and in the way of conveyance, bestow set cleaning, utilize then transfer with automaton 105 with its from substrate shift out the portion 127 take out after, be accommodated in once more in the card casket 131.
After will blocking substrates in the casket 131 in this way and taking out in regular turn and bestow set processing, put back to once more in the card casket 131.
Application feasibility on the industry
Lift substrate board treatment of the present invention and possess the base plate processing system of this device, with Existing Apparatus and system is compared, and can with its required space minimization that arranges, be applicable to the place The treating apparatus of reason large substrate.
Claims (10)
1. elevation type substrate board treatment wherein, possesses:
Have up and down side by side the substrate input port and the housing shape lid of substrate outlet;
Be loaded on the processing mechanism in the described lid, it possesses takes in and is supporting the substrate moved into from described substrate input port and discharge the conveyance and the supporting mechanism of described substrate, the top of supporting the support pallet of this conveyance and supporting mechanism and being equipped on this conveyance and supporting mechanism from described substrate outlet, is used for the processing fluid ejection mechanism that fluid is handled in ejection on by this conveyance and supporting mechanism substrate supported; And
Supporting described processing mechanism and making its oscilaltion, and making the elevating mechanism of this processing mechanism through described substrate input port and substrate outlet.
2. elevation type substrate board treatment as claimed in claim 1 is characterized in that, after described conveyance and supporting mechanism are taken in described substrate, the substrate of being taken in is moved forward and backward repeatedly in the direction of moving into/discharge of described substrate.
3. elevation type substrate board treatment as claimed in claim 1 or 2, it is characterized in that, described lid is separated member and is divided into drive chamber and two chambers of process chamber in the direction of moving into/discharge of described substrate, and in described process chamber, set described processing mechanism with described substrate input port and substrate outlet, then set described elevating mechanism in described drive chamber;
Separate in the member described, form the peristome that is communicated with described process chamber and drive chamber along above-below direction;
All form tubular along being formed at the described two edge portions that separate the peristome above-below direction of member, and on the opposite face of this each a pair of cylindrical portion, form gap slot along the vertical direction;
The support frame as described above platform of described processing mechanism describedly separates the binding tool in the member peristome and links with described elevating mechanism by being located at;
Connecting the plate body on the described binding tool, this plate body is to be equipped between the described a pair of cylindrical portion and to be adapted to the band-like plate lamellar body that extends to the top of described binding tool and below, and its both side edges portion inserts in the described cylindrical portion from described gap slot respectively;
Described drive chamber and process chamber describedly separated member, linked tool, and the plate body separate out.
4. elevation type substrate board treatment as claimed in claim 3 is characterized in that, described peristome, link tool, and the plate body be provided with many groups.
5. as claim 3 or 4 described elevation type substrate board treatments, it is characterized in that also possessing the exhaust gear of discharging gas in the described cylindrical portion.
6. as each described elevation type substrate board treatment in the claim 3～5, it is characterized in that the described plate bodily form becomes endless loops.
7. as each described elevation type substrate board treatment in the claim 3～5, it is characterized in that, coiling/coiling/the delivering mechanism of sending that will carry out described plate body is arranged at the upper side and the lower side of described plate body respectively, corresponding to the action of the described plate body that produces by described elevating mechanism, utilize this coiling/delivering mechanism described plate body of reeling/send.
8. elevation type substrate board treatment as claimed in claim 7 is characterized in that, described coiling/delivering mechanism is made of the wireline reel of the described plate body of reeling and the driving mechanism that this wireline reel is rotated;
Described driving mechanism only makes braking force act on the wireline reel at described wireline reel when transport direction rotates, and then passes on power by friction clutch to described wireline reel when described wireline reel rotates toward coiling direction.
9. elevation type substrate board treatment as claimed in claim 8, it is characterized in that described driving mechanism has: the driven gear that is linked to described wireline reel, be engaged in the driven wheel of this driven gear, be linked to the friction clutch of this driven wheel, be linked to the rotating shaft of this friction clutch, two one-way clutch that are linked to the both ends of rotating shaft respectively and only allow the unidirectional rotation of rotating shaft, by described one-way clutch of the side and be linked to the pulley of described rotating shaft, driving-belt on this pulley, and the supporting member that is supporting the opposing party's described one-way clutch;
Described two one-way clutch are allowed that described rotating shaft rotates on the direction of coiling direction rotation at described wireline reel, and are limited the rotation of described rotating shaft on the direction that described wireline reel rotates towards transport direction;
And described driving-belt rotates by described elevating mechanism.
10. base plate processing system is characterized in that:
Possess each described elevation type substrate board treatment in the claim 1～9,
And allow substrate move the 1st substrate board treatment handled on the limit and the 2nd substrate board treatment up and down side by side on the limit along approximate horizontal;
The substrate discharge portion of described the 1st substrate board treatment is connected with the substrate input port of described elevation type substrate board treatment,
The substrate throw-in part of described the 2nd substrate board treatment is connected with the substrate outlet of described elevation type substrate board treatment;
Allow substrate in regular turn through the 1st substrate board treatment, elevation type substrate board treatment, the 2nd substrate board treatment.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52572/01 | 2001-02-27 | ||
| JP2001052572A JP3587788B2 (en) | 2001-02-27 | 2001-02-27 | Elevating type substrate processing apparatus and substrate processing system provided with the same |
| JP52572/2001 | 2001-02-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1455951A true CN1455951A (en) | 2003-11-12 |
| CN1246895C CN1246895C (en) | 2006-03-22 |
Family
ID=18913183
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028000315A Expired - Fee Related CN1246895C (en) | 2001-02-27 | 2002-02-21 | Lift type substrate treatment device, and substrate treatment system with the substrate treatment device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP3587788B2 (en) |
| KR (1) | KR20020093837A (en) |
| CN (1) | CN1246895C (en) |
| TW (1) | TW529072B (en) |
| WO (1) | WO2002069392A1 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100433284C (en) * | 2004-12-06 | 2008-11-12 | K.C.科技株式会社 | Substrate disposing device and method |
| CN100454084C (en) * | 2003-12-20 | 2009-01-21 | 鸿富锦精密工业（深圳）有限公司 | Panel turnover mechanism |
| CN102064126A (en) * | 2010-11-04 | 2011-05-18 | 友达光电股份有限公司 | System for processing base plate conveyance and method |
| CN1978356B (en) * | 2005-12-05 | 2012-03-21 | 东京毅力科创株式会社 | Substrate conveying system, substrate conveying device and substrate treatment device |
| CN101506066B (en) * | 2006-08-22 | 2012-11-28 | 诺信公司 | Apparatus and method for handling workpieces in a processing system |
| CN104471697A (en) * | 2011-12-27 | 2015-03-25 | 因特瓦克公司 | System architecture for combined static and pass-by processing |
| CN107851594A (en) * | 2015-08-28 | 2018-03-27 | 株式会社日立国际电气 | The manufacture method of substrate board treatment and semiconductor device |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4515165B2 (en) * | 2004-06-21 | 2010-07-28 | 大日本スクリーン製造株式会社 | Substrate transfer apparatus and substrate processing apparatus |
| KR101298220B1 (en) * | 2012-01-20 | 2013-08-22 | 주식회사 엠엠테크 | Surface treating system for a substrate having a compact structure and surface treating method for the substrate |
| JP6297660B1 (en) | 2016-11-22 | 2018-03-20 | 株式会社荏原製作所 | Processing apparatus, plating apparatus provided with the same, conveying apparatus, and processing method |
| CN117457549B (en) * | 2023-12-25 | 2024-04-12 | 富芯微电子有限公司 | Surface corrosion equipment for thyristor tube core production |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01137453U (en) * | 1988-03-16 | 1989-09-20 | ||
| JP2000031239A (en) * | 1998-07-13 | 2000-01-28 | Dainippon Screen Mfg Co Ltd | Substrate processing device |
| JP2000183019A (en) * | 1998-12-21 | 2000-06-30 | Dainippon Screen Mfg Co Ltd | Multistage substrate-processing device |
-
2001
- 2001-02-27 JP JP2001052572A patent/JP3587788B2/en not_active Expired - Fee Related
-
2002
- 2002-02-20 TW TW091102877A patent/TW529072B/en not_active IP Right Cessation
- 2002-02-21 KR KR1020027011885A patent/KR20020093837A/en not_active Application Discontinuation
- 2002-02-21 CN CNB028000315A patent/CN1246895C/en not_active Expired - Fee Related
- 2002-02-21 WO PCT/JP2002/001583 patent/WO2002069392A1/en not_active Application Discontinuation
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100454084C (en) * | 2003-12-20 | 2009-01-21 | 鸿富锦精密工业（深圳）有限公司 | Panel turnover mechanism |
| CN100433284C (en) * | 2004-12-06 | 2008-11-12 | K.C.科技株式会社 | Substrate disposing device and method |
| CN1978356B (en) * | 2005-12-05 | 2012-03-21 | 东京毅力科创株式会社 | Substrate conveying system, substrate conveying device and substrate treatment device |
| CN101506066B (en) * | 2006-08-22 | 2012-11-28 | 诺信公司 | Apparatus and method for handling workpieces in a processing system |
| CN102064126A (en) * | 2010-11-04 | 2011-05-18 | 友达光电股份有限公司 | System for processing base plate conveyance and method |
| CN102064126B (en) * | 2010-11-04 | 2013-04-17 | 友达光电股份有限公司 | Method for processing base plate conveyance |
| CN104471697A (en) * | 2011-12-27 | 2015-03-25 | 因特瓦克公司 | System architecture for combined static and pass-by processing |
| US9914994B2 (en) | 2011-12-27 | 2018-03-13 | Intevac, Inc. | System architecture for combined static and pass-by processing |
| CN107851594A (en) * | 2015-08-28 | 2018-03-27 | 株式会社日立国际电气 | The manufacture method of substrate board treatment and semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002261143A (en) | 2002-09-13 |
| JP3587788B2 (en) | 2004-11-10 |
| TW529072B (en) | 2003-04-21 |
| WO2002069392A1 (en) | 2002-09-06 |
| KR20020093837A (en) | 2002-12-16 |
| CN1246895C (en) | 2006-03-22 |
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