KR20230141345A - Exhaust system with improved assembly) and substrate cleaning apparatus with the system - Google Patents

Abstract

The present invention relates to an exhaust device, comprising a pipe for discharging gas containing particles generated during substrate cleaning to the outside, wherein the pipe is inclined so that the inner diameter becomes narrower from one end to the other end. 1st pipe of; and a second pipe that is inclined so that the inner diameter becomes narrower from the top to the bottom, wherein the first pipe and the second pipe are connected in series so that the gas moves along the first pipe and the second pipe. When this happens, particles contained in the gas can be removed.

Description

Exhaust device and substrate cleaning apparatus having the same {Exhaust system with improved assembly) and substrate cleaning apparatus with the system}

The present invention relates to an exhaust device for discharging contaminated substances, and more specifically, to an exhaust device for discharging contaminated gas during substrate cleaning and a substrate cleaning device having the same.

Information processing devices are rapidly developing to have various types of functions and faster information processing speeds. This information processing device has a display device to display activated information. Recently, with the rapid development of semiconductor technology, the use of display devices that are lightweight and occupy a small space is rapidly increasing. There are various types of displays.

To manufacture such displays, various processes are carried out in chambers or devices, and each of these chambers or devices is equipped with substrate transport means such as transfer rollers, conveyors, and elevators, so that the substrates are processed during or after transport. .

Meanwhile, among these various substrate processing chambers or devices, one that must be essentially equipped is a substrate cleaning device for cleaning the substrate. Defective products occur due to foreign substances (dust, particles, sticky foreign substances, etc.) on the surface of the substrate. While the substrate is being transferred to the next process or waiting, not only surface particles but also sticky foreign matter sticks to it, and there is a problem in that sticky foreign matter cannot be easily removed with general cleaning methods.

In order to effectively remove foreign substances on the surface of the substrate, the foreign substances on the surface of the substrate are removed through various chemical treatments in a cleaning device. When cleaning a substrate, a large amount of mist or fume generated by the cleaning tool is discharged through an exhaust pipe connected to an external utility. At this time, a small amount of distilled water (DI) contained in the mist and fume is also discharged to the external exhaust pipe, causing malfunction of the exhaust device.

To solve this problem, a mesh-shaped mist capture structure was formed. However, as the process progresses, a small amount of distilled water (DI) blocks the mesh-shaped structure, causing a loss of exhaust pressure, resulting in a problem in which the exhaust within the cleaning device does not operate smoothly.

The present invention is intended to solve various problems including the problems described above, and can effectively remove foreign substances on the surface of a substrate and remove particles contained in a large amount of mist and fume generated during substrate cleaning. The purpose is to provide an exhaust device capable of removing and a substrate cleaning device having the same. However, these tasks are illustrative and do not limit the scope of the present invention.

An exhaust device according to the spirit of the present invention for solving the above problem includes a pipe for discharging gas containing particles generated during substrate cleaning to the outside, wherein the pipe moves from one end to the other end. A first pipe that is inclined to have a narrow inner diameter; and a second pipe that is inclined so that the inner diameter becomes narrower from the top to the bottom, wherein the first pipe and the second pipe are connected in series so that the gas moves along the first pipe and the second pipe. When this happens, particles contained in the gas can be removed.

Additionally, according to the present invention, a clean air exhaust port may be formed at the upper part of the second pipe so that the gas from which the particles have been removed is discharged to the outside.

Additionally, according to the present invention, a particle discharge prevention portion may be formed in the clean air exhaust port to prevent some of the particles from being discharged to the outside.

Additionally, according to the present invention, the particle discharge prevention portion may be formed to be inclined at a predetermined angle based on the discharge direction.

Additionally, according to the present invention, the particle discharge prevention portion may be formed to be inclined upward from one end connected to the inner peripheral surface of the clean air exhaust port to the other end, based on the discharge direction.

Additionally, according to the present invention, a plurality of particle discharge prevention units may be arranged in a zigzag shape at the clean air exhaust port.

In addition, according to the present invention, when the gas containing the particles moves along the inner wall of the second pipe, a swirling flow is generated within the second pipe, so that the particles contained in the gas are in the second pipe. It is discharged through a particle outlet formed at the bottom, and the gas from which the particles have been removed can be discharged through the clean air outlet.

In addition, according to the present invention, the speed of the gas passing through the first pipe is controlled to be relatively faster than the speed of the gas before passing through the first pipe, thereby separating and discharging the particles contained in the gas. , the air from which the particles have been removed may be discharged through the clean air exhaust port.

In addition, according to the present invention, the pressure of the gas passing through the first pipe is controlled to be relatively lower than the pressure of the gas before passing through the first pipe, thereby separating the particles contained in the gas from air. You can.

Additionally, according to the present invention, the diameter of the second pipe may be relatively larger than the diameter of the first pipe.

A substrate cleaning device according to the spirit of the present invention for solving the above problems includes a conveyor unit for horizontally moving the substrate; a cleaning unit installed on the transfer path of the substrate conveyed by the conveyor unit and removing foreign substances from the surface of the substrate; and an exhaust device for discharging to the outside a gas containing particles generated when cleaning the substrate with the cleaning unit, wherein the exhaust device is configured to discharge the gas containing the particles to the outside. It includes a pipe for; wherein the pipe includes: a first pipe that is inclined so that its inner diameter becomes narrower from one end to the other end; and a second pipe that is inclined so that the inner diameter becomes narrower from the top to the bottom, wherein the first pipe and the second pipe are connected in series so that the gas moves along the first pipe and the second pipe. When the particles are removed, the particles contained in the gas are removed, and a clean air exhaust port is formed at the upper part of the second pipe so that the gas from which the particles have been removed is discharged to the outside, and some of the particles are disposed in the clean air exhaust port. A particle discharge prevention portion is formed to prevent particles from being discharged to the outside, and the particle discharge prevention portion may be formed to be inclined at a predetermined angle based on the discharge direction.

According to various embodiments of the present invention as described above, the diameter of the pipe of the exhaust device provided in the substrate cleaning device is controlled differently, thereby facilitating the removal and discharge of particles generated during substrate cleaning. . Of course, the scope of the present invention is not limited by this effect.

1 is a schematic plan view showing a substrate cleaning device according to an embodiment of the present invention.
FIG. 2 is a cross-sectional view of a portion of the substrate cleaning device shown in FIG. 1 cut along the AA cross section.
3 and 4 are schematic diagrams showing a particle removal process according to the structure of an exhaust device according to an embodiment of the present invention.
FIG. 5 is a cross-sectional view schematically illustrating the structure of a substrate cleaning device according to a comparative example of the present invention, as shown in FIG. 2.

Hereinafter, various preferred embodiments of the present invention will be described in detail with reference to the attached drawings.

The embodiments of the present invention are provided to more completely explain the present invention to those skilled in the art, and the following examples may be modified into various other forms, and the scope of the present invention is as follows. It is not limited to examples. Rather, these embodiments are provided to make the present disclosure more faithful and complete and to fully convey the spirit of the present invention to those skilled in the art. Additionally, the thickness and size of each layer in the drawings are exaggerated for convenience and clarity of explanation.

The terms used herein are used to describe specific embodiments and are not intended to limit the invention. As used herein, the singular forms include the plural forms unless the context clearly indicates otherwise. Additionally, when used herein, “comprise” and/or “comprising” means specifying the presence of stated features, numbers, steps, operations, parts, elements and/or groups thereof. and does not exclude the presence or addition of one or more other shapes, numbers, operations, parts, elements and/or groups.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will now be described with reference to drawings that schematically show ideal embodiments of the present invention. In the drawings, variations of the depicted shape may be expected, for example, depending on manufacturing technology and/or tolerances. Accordingly, embodiments of the present invention should not be construed as being limited to the specific shape of the area shown in this specification, but should include, for example, changes in shape resulting from manufacturing.

1 is a schematic plan view showing a substrate cleaning device according to an embodiment of the present invention.

Referring to FIG. 1 , the glass substrate cleaning device 1 according to an embodiment of the present invention includes a pretreatment cleaning unit 10, a main cleaning unit 20, a cleaning unit 30, and a drying unit 40. ) and includes a cleaning liquid supply unit 50.

The substrate cleaning device 1 of the present invention includes a pretreatment cleaning unit 10, a main cleaning unit 20, a cleaning unit 30, and a drying unit 40, and the glass substrate 2 is provided with a cleaning unit ( 10), while passing through the main cleaning unit 20, the washing unit 30, and the drying unit 40, pretreatment cleaning, main cleaning, washing, and drying processes may be performed sequentially.

In the pre-treatment cleaning unit 10, a pre-treatment cleaning process is performed to remove foreign substances (especially large-sized foreign substances) on the surface of the glass substrate 2 before it is introduced into the main cleaning unit 20. The pre-treatment cleaning unit 10 includes a conveyor unit 12 that transports the glass substrate 2, spray nozzles 14 that spray cleaning liquid onto the transported glass substrate, and the upper and bottom surfaces of the transported glass substrate 2. It includes roll brush units 16 that remove large-sized foreign substances while rotating.

In the main cleaning unit 20, a cleaning process is performed to remove sticky foreign substances using scrubbing members that rotate in a circular trajectory on the surface of the glass substrate that has undergone primary cleaning in the pre-treatment cleaning unit 10. The main cleaning unit 20 includes a conveyor unit including a pair of upper and lower conveying rollers, cleaning units 200 having a scrubbing member, and nozzles.

The substrate cleaning device 1 can adjust the cleaning width of the cleaning units 200 according to the size of the glass substrate 2. A scrubbing member (not shown) removes foreign substances from the glass substrate 2 by applying a rotating scrubbing force that draws a circular trajectory on the surface of the glass substrate 2. The scrubbing member (not shown) includes a drive motor (not shown), a shaft (not shown), a holder (not shown), and a cleaning head (not shown). The main cleaning unit will be described in more detail below.

The cleaning units (200 shown in FIG. 1) are cleaning units (first cleaning units) for cleaning the top surface of the glass substrate 2 moved by the conveyor unit (100 shown in FIG. 1) and a conveyor unit. It can be divided into cleaning units (second cleaning units) for bottom cleaning that clean the bottom of the glass substrate 2 moved by (100 shown in FIG. 1). The first cleaning units and the second cleaning units may be installed to face each other with the glass substrate 2 interposed therebetween. Alternatively, the first cleaning units and the second cleaning units may be disposed at different locations.

In the cleaning unit 30, a cleaning process is performed in which the glass substrate that has been cleaned in the main cleaning unit 20 is washed with ultrapure water. The cleaning unit 30 includes a conveyor unit 32 that transports the glass substrate and ultrapure water spray nozzles 34 that spray ultrapure water onto the top and bottom surfaces of the glass substrate.

In the drying unit 40, a drying process is performed to remove moisture from the glass substrate cleaned in the cleaning unit 30. The drying unit 40 includes a conveyor unit 42 that transports the glass substrate and air knife nozzles 44 that spray air to remove moisture from the glass substrate.

The cleaning liquid supply unit 50 includes a tank 52 in which the cleaning liquid is stored, the nozzles 14 of the pre-processing cleaning unit 10 and the nozzles of the main cleaning unit 20, and the cleaning liquid stored in the tank 52. It includes a supply line 54 for supplying to the units, a pump 56 installed on the supply line 54, and a filter 58. The cleaning liquid used in the pre-treatment cleaning section and the main cleaning section is returned to the tank 52 through the recovery line 59.

The glass substrate cleaning device 1 of the present invention provides an automated system that automatically performs everything from the pretreatment cleaning process to the drying process. Equipment for attaching a polarizer may be connected in-line to the substrate cleaning device.

For reference, since no physical force is applied to the glass substrate in the washing unit 30 and drying unit 40, general conveyor units 32 and 42 consisting of rotating rollers that convey while supporting only the bottom surface of the substrate can be applied. there is. However, in the pretreatment cleaning unit 10 and the main cleaning unit 20, physical force is applied to the glass substrate in a vertical direction. Therefore, it is desirable that the conveyor unit that transports the glass substrate in the pre-treatment cleaning unit 10 and the main cleaning unit 20 uses a group of rotating rollers that rotate while supporting both the upper and lower surfaces of the glass substrate.

FIG. 2 is a cross-sectional view of a portion of the substrate cleaning device shown in FIG. 1 cut along the AA cross section.

Referring to FIG. 2, the main cleaning unit 20 includes a conveyor unit (100 shown in FIG. 1), cleaning units (200 shown in FIG. 1), and cleaning liquid spray nozzles 500.

The conveyor unit 100 may include a driving unit 130 for rotating a group of first rotating rollers 110. The first rotating rollers 110 are arranged parallel to each other in one direction, for example, along the transport direction of the glass substrate 2. And the first rotating roller 110 is rotated while supporting the bottom surface of the glass substrate 2. In addition, although not shown in the drawing, the conveyor unit 100 may include a second rotating roller (not shown) that rotates while supporting the upper surface of the glass substrate 2 opposite the first rotating roller 110. You can. The second rotating roller (not shown) rotates in the opposite direction to the first rotating roller 110 while supporting the upper surface of the glass substrate 2, and the first rotating roller 110 and the second rotating roller (not shown) ) The glass substrate 2 between can be transferred in one direction by the rotation of these rotating rollers.

The driving unit 130 may include a power source (not shown) that generates rotational force and a power transmission unit (not shown) that transmits the rotational force of the power source to the first rotating roller 110 and the second rotating roller (not shown). there is. The power source (not shown) is a part that generates rotational force and may include a motor that operates by electric force or an engine that converts chemical energy into mechanical motion.

The power transmission unit (not shown) may be configured in various ways to transmit the rotational force generated by the power source (not shown) to the first rotating roller 110 and the second rotating roller (not shown). For example, the power transmission unit (not shown) can be implemented by a combination of gears, a timing belt, and multiple pulleys, but it is most desirable for power transmission to be implemented by a combination of accurate gears. The cleaning unit (200 shown in FIG. 1) is installed on the transport path of the glass substrate 2 conveyed by the conveyor unit (100 shown in FIG. 1), and includes a scrubbing member (not shown) and a cylinder as an elevating member. not shown) and a pneumatic supply unit (not shown).

In addition, the main cleaning unit 20 is an exhaust system that can exhaust a large amount of mist and fume generated by the cleaning unit (200 shown in FIG. 1) when cleaning the glass substrate 2 to the outside. Includes device. The exhaust device may be formed on one side of the main cleaning unit 20, and may be formed on the side or top of the main cleaning unit 20 depending on the configuration of other units. In addition, the exhaust device is not only formed in the main cleaning unit 20, but also includes a pretreatment cleaning unit (10 shown in FIG. 1), a washing unit (30 shown in FIG. 1), and a drying unit (40 shown in FIG. 1). ) can also be formed in each.

The exhaust device includes a pipe 600 connected to exhaust gas containing particles generated during substrate cleaning to an external utility. A portion of the pipe 600 includes a particle separation discharge pipe 610. A detailed description of the particle separation discharge pipe 610 will be described later with reference to FIGS. 3 and 4.

In general, referring to FIG. 5 illustrating an exhaust device provided in the main cleaning unit 20B of the substrate cleaning device according to the comparative example of the present invention, when cleaning the glass substrate 2, the glass substrate 200 is discharged through the nozzle 500. (2) As the surface of the glass substrate 2 is cleaned by the cleaning liquid sprayed on it, a large amount of mist and fume are generated. At this time, a vortex of air current is generated between the nozzles 500, and the air flow flows in the direction of the arrow through the pipe 600 of the exhaust device. In this way, a large amount of mist, fume, etc. generated within the main cleaning unit 20 is discharged to the external exhaust pipe along the pipe 600, and a small amount contained in the mist, fume, etc. Distilled water (DI) is also discharged through the external exhaust pipe.

Here, in order to prevent a large amount of distilled water (DI) and particles from being discharged to an external utility (not shown), a DI discharge prevention member 620 is formed in a certain part of the pipe 600.

The discharge prevention member 620 may be formed, for example, as a scrubber-shaped mesh network. When a large amount of mist and fume are exhausted during the cleaning process, a small amount of distilled water (DI) and particles clog a part of the DI discharge prevention member 620, resulting in a loss of exhaust pressure in the pipe 600 (about 100 to 150 KPa). This happens. In this case, it becomes insufficient to exhaust a large amount of mist and fume within the main cleaning unit 20, which may increase the possibility of re-contamination of the glass substrate 2.

Additionally, when exhausting gas, the shape of the exhaust pipe can be formed to be inclined at a predetermined angle in order to smoothly exhaust only the gas. Even if the pipe is formed with the above structure, a small amount of distilled water (DI) that has passed through the DI discharge prevention member 620 is continuously discharged to the external utility, contaminating the inside of the pipe or causing a failure of the external exhaust device.

In order to solve this problem, the piping 600 provided in the exhaust device according to an embodiment of the present invention does not use the conventional DI discharge prevention member 620, but is a pipe formed at the entrance of the exhaust device. Distilled water (DI) and particles were removed by controlling the diameter differently.

3 and 4 are schematic diagrams showing a particle removal process according to the structure of an exhaust device according to an embodiment of the present invention.

Referring to FIGS. 3 and 4, the particle separation discharge pipe 610 has a first pipe 612 (see FIG. 3) that is inclined so that the inner diameter becomes narrower from one end to the other end, and the inner diameter increases from the top to the bottom. It includes a second pipe 614 (see FIG. 3) that is inclined to be narrow.

For example, the first pipe 612 and the second pipe 614 are connected in series so that when the gas containing particles moves along the first pipe 612 and the second pipe 614, the gas contained in the gas Particles can be removed. Here, the particles may include not only foreign substances physically attached to the surface of the glass substrate 2, but also cleaning liquid or distilled water (DI) supplied to wipe off the cleaning liquid. The first pipe 612 and the second pipe 614 may be connected at right angles to each other.

In order to remove particles from a gas containing particles, the flow rate of the gas flowing in the pipe is important. The flow rate of gas passing through the particle separation discharge pipe 610 must be controlled to be relatively faster than the flow rate of gas passing through the pipe 600 formed at the entrance of the exhaust device within the main cleaning unit 20. For this purpose, the particle separation discharge pipe 610 used a first pipe 612 in the form of an orifice to more quickly control the flow rate of gas.

In order to quickly control the flow rate of the gas, the first pipe 612 is designed so that the diameter of the end through which the gas flows is larger than the diameter of the end through which the gas flows out. As the gas passes through pipes with increasingly narrow diameters, the speed of the gas increases. At this time, the pressure of the gas can be lowered (pressure reduction) to separate the particles contained in the gas.

Gas that has passed through the first pipe 612 may pass through a second pipe 614 that has a similar structure to the first pipe 612. The first pipe 612 is formed in the x-axis direction, and the second pipe 614 is connected in the z-axis direction perpendicular to the first pipe 612.

The diameter of the second pipe 614 is relatively larger than the diameter of the first pipe 612, and a swirling flow may be generated as gas is transported within the second pipe 614. A portion (lower part of the second pipe 614) opposite to the portion where the second pipe 614 and the first pipe 612 are connected to each other is connected to a particle discharge port (not shown). The particle outlet (not shown) is connected to one end of the second pipe 614, and the diameter of the part where the second pipe 614 is connected to the particle outlet (not shown) is relatively larger than the diameter of the clean air exhaust port 616. It can be formed to a large extent. Particles discharged through the particle outlet may be transferred to a drain tank (not shown).

A clean air exhaust port 616 is formed at the top of the second pipe 614 so that the gas from which particles have been removed is discharged to the outside. When the gas moves along the inner wall of the second pipe 614, a swirling flow is generated within the second pipe 614, thereby separating particles present in the gas and sending clean air through the clean air exhaust port. It can be discharged through (616). Here, a particle discharge prevention portion 618 is formed in the clean air exhaust port 616 to prevent some of the particles from being discharged to the outside.

The particle discharge prevention unit 618 may be formed to be inclined at a predetermined angle based on the discharge direction in which gas is discharged, and the particle discharge prevention unit 618 may be formed on the inner peripheral surface of the clean air exhaust port 616 based on the discharge direction. It may be formed to slope upward from one end connected to the other end. Additionally, a plurality of particle discharge prevention units 618 may be arranged in a zigzag shape on the inner wall of the clean air exhaust port 616.

As described above, the gases containing particles are separated from each other by first lowering the pressure of the gas through the first pipe 612 in the form of an orifice, and then secondarily through the second pipe 614, which is an inclined pipe. Particles that generate a swirling flow and have a relatively large specific gravity are discharged to the outside through a particle outlet (not shown) formed at the bottom of the second pipe 614, and clean gas is collected in the center of the swirling flow. Afterwards, the collected gas can be discharged to the outside by applying back pressure to a vent hole (not shown) provided in the clean air exhaust port 616. In order to apply back pressure as described above, the diameter of the particle outlet (not shown) of the second pipe 378 must be controlled to be relatively larger than the diameter of the vent hole (not shown).

As described above, the exhaust device provided in the substrate cleaning device according to an embodiment of the present invention uses inclined pipes of different diameters, thereby discharging a large amount of mist and fume in a cyclone manner. You can capture the back. Using the cyclone method, distilled water (DI) and particle particles can be separated from the gas using centrifugal force generated by rotating the gas containing distilled water (DI) and particles within the pipe. These separated by-products are discharged along the inner wall of the pipe's cylinder and into the drain pipe connected below the pipe, eliminating the difference in exhaust pressure loss caused by distilled water (DI) and maintaining sufficient exhaust pressure within the pipe for cleaning. The inside of the bath can always be kept clean, maximizing the cleaning power of the glass substrate.

The present invention has been described with reference to the embodiments shown in the drawings, but these are merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. Therefore, the true scope of technical protection of the present invention should be determined by the technical spirit of the attached patent claims.

10: Pre-treatment cleaning unit
20: Main cleaning unit
30: Washing unit
40: drying section
100: conveyor unit
200: cleaning unit
500: nozzle
600: Piping
610: Particle separation discharge pipe
612: 1st pipe
614: Second pipe
616: Clean air exhaust port
618: Particle emission prevention unit
620: DI emission prevention member

Claims (11)

It includes a pipe for discharging gas containing particles generated during substrate cleaning to the outside,
The pipe is,
A first pipe that is inclined so that its inner diameter becomes narrower from one end to the other end; and
It includes a second pipe that is inclined so that the inner diameter becomes narrower from the top to the bottom,
The first pipe and the second pipe are connected in series to remove particles contained in the gas when the gas moves along the first pipe and the second pipe.
exhaust. According to claim 1,
A clean air exhaust port is formed at the top of the second pipe so that the gas from which the particles have been removed is discharged to the outside.
exhaust. According to claim 2,
A particle discharge prevention portion is formed in the clean air exhaust port to prevent some of the particles from being discharged to the outside.
exhaust. According to claim 3,
The particle discharge prevention unit is formed to be inclined at a predetermined angle based on the discharge direction,
exhaust. According to claim 4,
The particle emission prevention unit,
Based on the discharge direction, it is formed to slope upward from one end connected to the inner peripheral surface of the clean air exhaust port to the other end,
exhaust. According to claim 3,
The particle emission prevention unit,
A plurality of clean air exhaust ports are arranged in a zigzag shape.
exhaust. According to claim 2,
When the gas containing the particles moves along the inner wall of the second pipe, a swirling flow is generated within the second pipe, so that the particles contained in the gas are discharged through the particle outlet formed at the lower part of the second pipe. And the gas from which the particles have been removed is discharged through the clean air exhaust port,
exhaust. According to claim 2,
By controlling the speed of the gas passing through the first pipe to be relatively faster than the speed of the gas before passing through the first pipe, particles contained in the gas are separated and discharged, and air from which the particles have been removed is separated and discharged. is discharged through the clean air exhaust port,
exhaust. According to claim 1,
By controlling the pressure of the gas passing through the first pipe to be relatively lower than the pressure of the gas before passing through the first pipe, particles contained in the gas are separated from air,
exhaust. According to claim 1,
The diameter of the second pipe is relatively larger than the diameter of the first pipe,
exhaust. A conveyor unit that moves the substrate horizontally;
a cleaning unit installed on the transfer path of the substrate conveyed by the conveyor unit and removing foreign substances from the surface of the substrate; and
It includes an exhaust device for discharging gas containing particles generated when cleaning the substrate with the cleaning unit to the outside,
The exhaust device,
It includes a pipe for discharging the gas containing the particles to the outside,
The pipe is,
A first pipe that is inclined so that its inner diameter becomes narrower from one end to the other end; and
It includes a second pipe that is inclined so that the inner diameter becomes narrower from the top to the bottom,
The first pipe and the second pipe are connected in series to remove particles contained in the gas when the gas moves along the first pipe and the second pipe,
A clean air exhaust port is formed at the top of the second pipe so that the gas from which the particles have been removed is discharged to the outside,
A particle discharge prevention portion is formed in the clean air exhaust port to prevent some of the particles from being discharged to the outside,
The particle discharge prevention unit is formed to be inclined at a predetermined angle based on the discharge direction,
Substrate cleaning device.