CN100433284C - Substrate disposing device and method - Google Patents
Substrate disposing device and method Download PDFInfo
- Publication number
- CN100433284C CN100433284C CNB2005101278852A CN200510127885A CN100433284C CN 100433284 C CN100433284 C CN 100433284C CN B2005101278852 A CNB2005101278852 A CN B2005101278852A CN 200510127885 A CN200510127885 A CN 200510127885A CN 100433284 C CN100433284 C CN 100433284C
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- Prior art keywords
- substrate
- mentioned
- conveyer
- unloading
- treatment
- Prior art date
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
Abstract
Description
Technical field
The present invention relates to substrate board treatment and processing method thereof, especially device and the processing method thereof that object being treated surfaces such as semiconductor wafer peace panel display substrate are handled.
Background technology
Generally, the substrate board treatment to handle on object being treated surfaces such as semiconductor wafer peace panel display is divided into Etaching device, cleaning device, demoulding device (Stripper), developing apparatus (Developer) etc.
Above-mentioned processing unit structure proximate, and be located in the clean room of removing through fine dust.
Fig. 1 is the structure chart of an embodiment of existing substrate board treatment.
As shown in the figure, existing substrate board treatment comprises, is provided with first buffer part 10 of the substrate collecting box that can accommodate multi-piece substrate; The substrate collecting box on being located at above-mentioned first buffer part 10, the loading attachment portion 20 of mounting substrate accepts the loading part 30 of substrate from above-mentioned loading attachment portion 20; The conveyer 40 that the substrate that is loaded in the above-mentioned loading part 30 is carried; The surface treating part 50 that the substrate surface that transports by above-mentioned conveyer 40 is handled; To the unloading portion 60 that unloads at above-mentioned surface treating part 50 surface treated substrates; Substrate in the above-mentioned unloading of the conveyance portion 60, and be contained in the discharge mechanism portion 70 of the substrate collecting box on second buffer part 80.
Above-mentioned surface treating part 50 when its surface treatment when etched film carried out etching, comprise, the etched film by above-mentioned conveyer 40 substrate conveying is carried out etched etched part 51; The cleaning part 52 that etched substrate surface in above-mentioned etched part 51 is cleaned; The drying section 53 of dry above-mentioned substrate through cleaning.
Running to existing substrate board treatment with said structure is described as follows.
At first, on first buffer part 120, be mounted with most substrates, the substrate that is contained on first buffer part 10 arrives loading part 30 by 20 conveyances of loading attachment portion, and above-mentioned loading part 30 will be carried the substrate that comes and be loaded on the conveyer 40, loading be transplanted on surface treating part 50 by conveyer 40 substantially.
The above-mentioned substrate that passes through conveyer 40 handovers carries out etching, cleaning and dry supervisor through surface treating part 50 time.
It is an embodiment that 50 pairs of etch target films of aftermentioned surface treating part carry out etching, and above-mentioned surface treating part 50 also has functions such as cleaning, demoulding, development.
At above-mentioned surface treating part 50 surface treated substrates, be transported to unloading portion 60 by conveyer 40.
At last, the substrate that is delivered to unloading portion 60 is transferred to second buffer part 80 by unloading portion 70.Wherein loading part 20 and discharge mechanism portion 70 can be, the robotic arm (Robot arm) that substrate is fixed and transferred with electrostatic force, vacuum or mechanical pressure.
Fig. 2 is the structure chart of above-mentioned conveyer 40.
As shown in the figure, existing conveyer 40 comprises, is provided with the brace table 41 of the face of being bent upwards in the both sides of substrate transferring direction; Be inserted and secured on the most bearings 43 in the hole that above-mentioned brace table 41 is bent upwards face; Bearing 43 by above-mentioned majority rotatably is combined in the most axles 42 on the above-mentioned flexure plane; Be combined in the most conveying cylinders 44 on above-mentioned axle 42 outer peripheral faces.
Above-mentioned axle 42 adopts stainless-steel pipe, or is inserted with PVC (Polyvinylchloride) pipe of aluminium-alloy pipe.Like this,, substrate is being carried out in the surface-treated process, be used in the surface-treated chemical substance and can flow into axle 42 inside, thereby cause corrosion because of adopting tubular shafts 42.
In addition, along with the maximization of substrate size, the length of above-mentioned axle 42 is also elongated, and weight also increases, and quickens the wearing and tearing of the bearing 43 between axle 42 and the brace table 41, causes axle 42 to sink, and is unfavorable for the conveying of substrate.
Aforesaid substrate by conveyer 40 is carried carries out surface treatment in surface treating part 50.One of above-mentioned surface treating part 50 example is the clean portion on cleaning base plate surface.
Fig. 3 is the block diagram as the clean portion of one of existing surface treating part 50 example.
As shown in the figure, the clean portion of surface treating part 50 comprises that removal is present in the organic organic matter removal of substrate surface unit 54; To the roll brush unit of removing through the particulate of removing on the organic substrate 55; Utilize the fluid elastic force on the substrate, remove the foam jet unit 56 of surface irregularities; By the nozzle shower, finally remove the final rinse unit 57 of substrate surface foreign material.
Like this, existing 50 pairs of substrates that transport by above-mentioned conveyer 40 of surface treating part, the 54 irradiation Excimer UV lines (Excimer Ultra Violet) in the organic matter removal unit, there is organic substance on the substrate surface with removal, utilize rotating brush in roll brush unit 55 then, by applying physical force, remove particulate to substrate surface.
Fig. 4 is the detailed structure view of above-mentioned roll brush unit 55.
As shown in the figure, roll brush of the prior art unit 55 comprises, at most axle SH1～SH2n of both sides conveying substrate 90 up and down; Be contacted with the upper and lower sides part of aforesaid substrate 90, remove the roll brush RB1～RB4 of substrate 90 top and the bottom particulates; Most nozzle NZ1～NZ2n to substrate 90 top and the bottom jet cleaning liquid; The exhaust portion 59 that the particulate of removing is discharged.
In the said structure, when substrate 90 sizes that are transferred are big, in order to prevent its substrate 90 bendings, be provided with a SH1～SH2n in substrate 90 top and the bottom, and part is provided with roll brush RB1～RB4 between the axle SH1～SH2n of top and the bottom, is used to remove the big particulate and the organic substance that are attached on substrate 90 top and bottom.
Above-mentioned most nozzle NZ1～NZ2n is to substrate 90 top and the bottom direct injection cleaning fluids, perhaps to above-mentioned roll brush RB1～RB4 jet cleaning liquid reducing the mantle friction between roll brush RB1～RB4 and the substrate 90, and rinsing particulate.
But in said process, roll brush RB1～RB4 can cause the cleaning fluid splash phenomena, and drop 58 occurs through hydrogenesis.This drop 58 can be fallen above the substrate 90, forms watermark (Water mark) at substrate 90.
Spacing between above-mentioned roll brush RB1～RB4 and the substrate 90 is with the naked eye confirmed to regulate by operating personnel, or uses the mechanical measurement instrument to measure.Spacing between substrate 90 and the roll brush RB1～RB4 brings direct influence for the friction between substrate 90 and roll brush RB1～RB4, is not easy to remove particulate when its spacing is too big, and hour bring damage can for substrate 90 very much at interval when it.
The above-mentioned surface treating part 50 on treatment substrate 90 surfaces is carried out cleaning base plate, or during etching substrates, its surface treating part 50 also has drying section 53, the air knife that this drying section 53 can be the inject high pressure air (air knife).
Fig. 5 is the structure chart of existing drying section 53.
As shown in the figure,, be transferred device 40 conveyings, and be provided with air knife AN1, AN2 to the opposite direction inject high pressure gas of this substrate 90 throughput directions through the substrate 90 that cleans after cleaning or the etching.
The air injection direction of above-mentioned air knife AN1, AN2 is in contrast to the throughput direction of substrate 90, and forms the following jet angle of 90 degree with these substrate 90 top and bottom, and the injection by pressure-air comes the cleaning fluid on dry substrate 90 top and bottom.
At this moment, the inclination angle of above-mentioned air knife AN1, AN2 influences the rate of drying of substrate 90.When the jet angle between the injection direction of air knife AN1, AN2 and the substrate 90 is relatively large, cleaning fluid might flow to dried base plate part, and its angle relatively hour, and the air that air knife AN1, AN2 spray can't be removed the cleaning fluid on substrate 90 surfaces clean.
And, spray through pressure-air, the cleaning fluid on substrate 90 surfaces can become mist (Mist), if this mist attached to finishing dried base plate 90 surfaces, substrate 90 surfaces then can be contaminated.
When regulating the inclination angle of air knife AN1, AN2, consider above-mentioned factor.But along with the variation of matting condition, the optimum incline angle of air knife AN1, AN2 can change, and when being in non-best angle, drying efficiency can reduce.
As mentioned above, the structure of existing substrate board treatment, be provided with loading part 30 and unloading portion 60 at surface treating part 50 two ends, and have respectively loading attachment portion 20 and a discharge mechanism portion 70 to this loading part 30 and unloading portion 60 loading or unloading substrates, also have first buffer part 10 and second buffer part 20 in addition, cause whole device volume big like this, the clean room occupied area is also along with becoming big.
In addition, be used for the preceding substrate of conveyance surface treatment and the automatic transport device of the substrate after the surface treatment, the setting of its conveying is very complicated, and causes the clean room cost of equipment, the increase of maintenance cost.
In addition, existing conveyer 40 is carrying out in the surface treatment process substrate because of using tubular shafts 42, and the chemical substance that surface treatment is used can flow into axle 42 inside, corrosion takes place and shorten equipment life.
In addition, along with the maximization of substrate size, the length of above-mentioned axle 42 is elongated, and weight increases, and has quickened the wearing and tearing of the bearing 43 between axle 42 and the brace table 41, sinks thereby axle 42 takes place, and is unfavorable for the conveying of substrate.
In addition, in existing surface treating part 50, use roll brush RB1～RB4 to remove in the process of substrate surface particulate, drop 58 occurs in surface treating part 50 upper ends, and this drop 58 forms watermark on substrate.
In addition, between this roll brush RB1～RB4 and the substrate 90 at interval by operating personnel with the naked eye or the mechanical measurement means measure, inaccurate and be not easy to carry out the adjusting of the frictional force between substrate 90 and the roll brush like this, bad problem takes place to clean.
In addition, the air knife AN1 of drying section 53, AN2 angle adjustment difficulty in the surface treating part 50, thus mist takes place again attached to dried substrate, cause problems such as substrate contamination.
Summary of the invention
The present invention is intended to address the above problem, and its purpose is to provide a kind of volume little, and can improve the substrate surface treating apparatus and the processing method thereof of clean room service efficiency.
Another object of the present invention is, provides that a kind of to prevent that chemical substance from flowing into the axle of conveyer inner, can prevent a substrate surface treating apparatus and a processing method thereof that axle sinks simultaneously.
Another object of the present invention is, when providing a kind of surface treating part to use roll brush, substrate can residual drop, and can adjust easily between roll brush and the substrate every substrate surface treating apparatus and processing method thereof.
Another object of the present invention is to provide a kind of and prevent in dry run, contaminated again substrate surface treating apparatus of substrate surface and processing method thereof.
In order to achieve the above object, the present invention's substrate board treatment comprises: load and unloading portion, loading need carry out the surface-treated substrate, or the surface-treated substrate has been finished in unloading; First conveyer is carried the substrate that loads in above-mentioned loading and the unloading portion; Lifting unit will be by the above-mentioned first conveyer substrate conveying conveyance to the below; Second conveyer will be delivered to above-mentioned loading and unloading portion by the substrate that above-mentioned lifting unit loads; Surface treating part is to carrying out surface treatment by the above-mentioned second conveyer substrate conveying.
In order to achieve the above object, substrate processing method using same among the present invention, promptly, carry out etching by the substrate surface that the outside is transported, clean, behind the surface treatment process of demoulding or development treatment, with treated aforesaid substrate to outside substrate conveying processing method, comprise: first path that the substrate before the surface treatment is delivered to surface treatment process, and be arranged to up and down horizontal structure by second path that the surface treated substrate of processing substrate process is carried, its throughput direction is opposite, makes the unloading position of the " loaded " position of surface treated substrate not and surface treated substrate identical.
The present invention's substrate board treatment and processing method thereof, the " loaded " position and the unloading position of substrate are concentrated on a place, and use single device to carry out the substrate loading and unloading, simplify substrate and shifted to the transport path of board device, improve the service efficiency of clean room, can reduce the cost of equipment and the maintenance cost of clean room.
In addition, the axle of first conveyer among the present invention and second conveyer has adopted can keep enough rigidity, and lightweight fibre reinforced plastics, has prevented the axle sinkage, thereby has prevented to break down when substrate is carried.
Simultaneously, the axle outside of making at above-mentioned fibre reinforced plastics is suitable for anticorrosive coat, and possesses sealing device in both sides, thereby can prevent that axle from being corroded by surface treatment liquid, can prolong the life-span of axle.
In addition, the present invention's substrate board treatment and processing method thereof in the processing substrate process, are carried out pre-wet process to the substrate surface before cleaning, and can prevent that watermark from occurring.And, prevented to enter pre-wet zone, thereby can prevent that pre-wet zone generation drop and this drop from causing occurring on the substrate phenomenon of watermark at the water smoke that the spray zone takes place by separating pre-wet zone and spraying the zone.
In addition, the present invention's substrate board treatment and processing method thereof, using the roll brush removal to remain in the particulate process of substrate upper and lower surface, detect the motor current that drives this roll brush, mensuration and control roll brush and substrate keep best exposure level, thereby can prevent that cleaning performance from reducing or substrate is impaired.
In addition, the present invention's substrate board treatment and processing method thereof are used partition wall and air-flow barrier film, can prevent in the dry substrate process, and air sprays the mist that causes and is attached to once more on the dried base plate.
Description of drawings
Fig. 1 is the structure chart of an embodiment of existing substrate board treatment;
Fig. 2 is the structure chart of above-mentioned conveyer 40;
Fig. 3 is the block diagram as one of existing surface treating part 50 example;
Fig. 4 is the detailed structure schematic diagram of existing roll brush unit 55;
Fig. 5 is the structural representation of existing drying section 53;
Fig. 6 is an embodiment block diagram of the substrate board treatment among the present invention;
Fig. 7 is the simple stereogram of this substrate board treatment one embodiment;
Fig. 8 is the stereogram of one of second conveyer 600 among the present invention embodiment;
Fig. 9 is the cutaway view of one of the axle 620 among the present invention embodiment;
Figure 10 is the cutaway view of another embodiment of the axle 620 among the present invention:
Figure 11 is another embodiment cutaway view of the axle 620 among the present invention;
Figure 12 is another embodiment cutaway view of the axle 620 among the present invention;
Figure 13 is an example structure schematic diagram of the surface treating part 700 among the present invention;
Figure 14 is another example structure schematic diagram of the surface treating part 700 among the present invention;
Figure 15 is a roll brush among the present invention 753 and an example structure schematic diagram that drives and control the control device of this roll brush 753;
Figure 16 is an example structure schematic diagram of the drying unit 730 in the present invention's the substrate board treatment;
Figure 17 and Figure 18 soft air-flow barrier film 734 shape schematic diagrames for changing along with puff prot 733 angles among the present invention.
The reference numeral explanation:
100: buffer part 200: Handling device
300: load and 400: the first conveyers of unloading portion
500: 600: the second conveyers of lifting unit
700: surface treating part 800: substrate
Embodiment
Below, the embodiment to the present invention is elaborated with reference to accompanying drawing.
＜embodiment 1 〉
Fig. 6 is an embodiment block diagram of the substrate board treatment among the present invention; Fig. 7 is the simple stereogram of this substrate board treatment one embodiment.
As shown in the figure, an embodiment of substrate board treatment of the present invention comprises: buffer part 100 is used for temporarily depositing substrate; Load and unloading portion 300, will load (Loading) from buffer part 100 substrate conveying, or unloading (Unloading) finishes the surface-treated substrate, and the board carrying that will handle by Handling device 200 is to buffer part 100 by Handling device 200; First conveyer 400 is carried the substrate that loads in above-mentioned loading and unloading portion 300; Lifting unit 500 will move down by above-mentioned first conveyer, 400 substrate conveying, and be loaded into second conveyer 600, make substrate be transported to above-mentioned loading and unloading portion 300 again; Surface treating part 700 is to handling by above-mentioned second conveyer 600 substrate conveying surfaces.
Above-mentioned surface treating part 700 specifically can be, and etching unit 710, cleaning unit 720, drying unit 730 are arranged in order, and substrate surface are carried out operations such as etching, cleaning and drying.
Below, the structure and the action of substrate board treatment of the present invention with said structure is elaborated.
At first, buffer part 100 is being deposited the most substrate collecting boxes that contain multi-piece substrate.The most substrate collecting boxes that leave buffer part 100 in are used for accommodating respectively not surface treated substrate or surface treated substrate.
Use a buffer part 100, can simplify guide rail equipment, this guide rail is used in clean room the substrate automatic transport more treated substrate being delivered to next process to surface processing device.
Be loaded in the not surface treated substrate of above-mentioned buffer part 100 and be transported to loading and unloading portion 300, and surface treated substrate moves to buffer part 100 from loading and unloading portion 300 by single Handling device 200.Handling device 200 can be the robotic arm that utilizes vacuum power, electrostatic force or other physical force.
Be transported to by above-mentioned Handling device 200 and load and the substrate of unloading portion 300, be loaded on first conveyer 400 that is positioned at whole device upper end by this loading and unloading portion 300.Above-mentioned loading and unloading portion 300 are provided with according to the loading or unloading state when prebasal plate, substrate mobile device moving up and down.
Like this, be loaded in the substrate on first conveyer 400, carry by first conveyer 400.First conveyer 400 is positioned at substrate board treatment top, to can not carrying out any processing by first conveyer, 400 substrate conveying.
After aforesaid substrate is transported to first conveyer, 400 ends, move to the below by lifting unit 500.Identical with above-mentioned loading and unloading portion 300, lifting unit 500 is provided with the mobile device that substrate can be moved up and down.
Substrate by above-mentioned lifting unit 500 moves downwards is loaded into its throughput direction once more on second conveyer 600 of above-mentioned first conveyer, 400 throughput directions.
That is, above-mentioned first conveyer 400 and second conveyer 600 be configuration up and down in the horizontal direction, and the axle direction of rotation that is installed on each conveyer is opposite.
By second conveyer, 600 substrate conveying, through surface treating part 700 time, carry out surface treatment.Fig. 6 and Fig. 7 are the schematic diagram of etching, cleaning and the dried of substrate, according to other operations of processing substrate, can be easily the concrete formation of this surface treating part 700 be changed.
Promptly, in the above-mentioned surface treating part 700,, be provided with etching unit 710, cleaning unit 720, drying unit 730 successively with respect to the throughput direction of second conveyer 600, like this, can carry out etching, cleaning and dried successively to second conveyer, 600 substrate conveying
For employed etching solution adverse current in the etching unit 710 that prevents above-mentioned surface treating part 700 to first conveyer, 400 directions, can between etching unit 710 and lifting unit 500, increase the neutralisation treatment unit, with in and etching solution.
Then,, be transported to once more and load and unloading portion 300, load and the substrate of unloading portion 300 is transported in the substrate collecting box of buffer part 100 by Handling device 200 and be delivered to through the substrate that above-mentioned surface treating part 700 is handled.
In the said structure, the substrate throughput direction is opposite by first conveyer 400 with second conveyer 600, make the " loaded " position of substrate consistent, thereby can use single buffer part 100 and Handling device 200 to carry out the loading and unloading operation of substrate with unloading position.
Like this, use single buffer part 100 and Handling device 200 to finish the processing that belongs to difference in functionality, thereby can significantly reduce the area that is provided with of whole base plate processing unit.
＜embodiment 2 〉
In the foregoing description 1, the direct surface treating part 700 that substrate surface is handled, be arranged to handling by second conveyer, 600 substrate conveying, also can be arranged to, separate the part of functions of this surface treating part 700 and it is arranged on first conveyer 400, to carry out relevant treatment at first conveyer 400.
Promptly, as the foregoing description 1, surface treating part 700 comprises when substrate carried out etching, cleaning, dry run, etching unit 710 can be arranged on first conveyer 400, and the substrate that moves by first conveyer 400 carried out etch processes, then by lifting unit 500, to move down and be loaded into second conveyer 600 through the substrate of etch processes, at last, when the substrate that moves by second conveyer 600 passes through cleaning unit 720 and drying unit 730 successively, clean and dried.
By the part of functions of release surface handling part 700, can further reduce the area that is provided with of substrate board treatment.
In addition, before 700 pairs of substrates of surface treating part carry out surface treatment, can carry out pre-treatment to the substrate that moves on first conveyer 400 by carrying out the pre-treatment portion of substrate pre-treatment.
Pre-treatment portion can be to be used for the preliminary organic atmospheric plasma cleaning machines of staying on the substrate such as photoresist (Photoresist) residue of removing.
Substrate by pre-treatment portions such as above-mentioned atmospheric plasma cleaning machine carry out pre-treatment is loaded into second conveyer 600 and mobile by lifting unit 500, formally handles in surface treating part 700 then.
＜embodiment 3 〉
Fig. 8 is the stereogram of one of above-mentioned second conveyer 600 embodiment.
As shown in the figure, second conveyer 600 among the present invention comprises: the brace table 610 that is provided with the face of being bent upwards in the both sides of substrate moving direction; Be inserted and secured on the most bearings 630 in the hole of the face that is bent upwards of above-mentioned brace table 610; Bearing 630 by above-mentioned majority rotatably is combined in the most light weight axles 620 on the face of being bent upwards of above-mentioned brace table 610; Be combined in the most conveying cylinders 640 on above-mentioned axle 620 outer peripheral faces.
Fig. 9 is the cutaway view of one of above-mentioned axle 620 embodiment.
As shown in the figure, the axle 620 of second conveyer 600 among the present invention comprises: tubular body 621; Be attached to the intermediate metal layer 622 of above-mentioned body 621 outer peripheral faces; Be coated in the anticorrosive coat 623 on above-mentioned intermediate metal layer 622 outer peripheral faces; The one end is inserted into above-mentioned body 621 both sides, and the other end forms two ends 624 that combine with the bearing 630 that is bent upwards in the portion of above-mentioned brace table 610.
Structure and function to axle 620 are elaborated as follows.
Axle 620 bodies can use fibre reinforced plastics (FRB, Fiber Reinforced Plastic).Fibre reinforced plastics are often referred to and add fiber material in the synthetic resin, to improve the resin of mechanical strength.Characteristics such as fibre reinforced plastics have in light weight, and the life-span is long, intensity is high, and is not perishable.
The kind of fibre reinforced plastics has, fiberglass reinforced plastics (GFRB, Glass FiberReinforced Plastic), charcoal fibre reinforced plastics (the CFRB that adds the charcoal fiber, Carbon FiberReinforced Plastic), adds the fibre reinforced plastics of Kevlar (Kevlar) fiber etc., all can make tubular body 621 with these materials, best working strength is than other fibre reinforced plastics height, and lightweight charcoal fibre reinforced plastics.
By the lightweight of body 621, alleviate the weight of axle 620, can reduce the wear rate of bearing 630.And along with the maximization of substrate, the length of axle 620 is elongated, by enough rigidity and lightweight, can prevent that axle 620 central parts from sinking.
If only use above-mentioned charcoal fibre reinforced plastics body 621 to constitute axle 620, body 621 might be by surface treating part 700 employed surface processing solution corrosion, so in order to prevent corrosion, coating anticorrosive coat 623.
At this moment, because of can't directly being coated with, so after covering body 621 outer peripheral faces with intermediate metal layer 622 earlier, at intermediate metal layer 622 outer peripheral faces coating anticorrosive coat 623 at body 621 outer peripheral faces.Above-mentioned intermediate metal layer 622 adopts copper alloy or fine copper, between body 621 and the intermediate metal layer 622 by heating the deposited combination that comes.
In addition, above-mentioned anticorrosive coat 623 is by coating nichrome above-mentioned intermediate metal layer 622 outer forming.The anticorrosive coat 623 of nichrome material can prevent surface processing solution corrosion bodies 621 such as employed deionized water in the surface treating part 700 (DI water), etching solution.
In addition, insertion end 624, above-mentioned tubular body 621 both sides.End 624 is arranged with the club of giving prominence to flange for the intermediate portion, and the one end is inserted into body 621 inboards, and the other end is inserted in the above-mentioned bearing 630.By using end 624, can prevent that surface processing solution from entering body 621 inside of axle 620 and corroding body 621.
In embodiment 3, be example with the axle 620 that is applicable to second conveyer 600, be illustrated, and the also applicable same structure of first conveyer, 400 used axles.
＜embodiment 4 〉
Figure 10 is the cutaway view of another embodiment of above-mentioned axle 620.
As shown, another embodiment of the axle 620 among the present invention comprises: tubular body 621; Be coated on the anticorrosive coat 625 of above-mentioned body 621 outer peripheral faces; Above-mentioned body 621 both sides are inserted in two ends 624, one end, and the other end combines with the bearing 630 that above-mentioned brace table 610 is bent upwards in the portion.
This execution mode is compared with the anticorrosive coat 623 formation methods among the embodiment 3, and its manufacturing process is more simple.
For the body 621 of protecting fibre reinforced plastics to make is not subjected to the corrosion of surface processing solution, anticorrosive coat 625 directly can be sticked on body 621 outer peripheral faces and deposited by heating, body 621 and anticorrosive coat 625 are combined into one.Thisly heat depositedly, can prevent that also body 621 from being had by anticorrosive coat 625 materials that surface processing solution corroded, stainless steel or polyvinyl chloride (Polyvinyl chloride).
Use the anticorrosive coat 625 of stainless steel or pvc material,,, and can prevent body 621 from being corroded and produce particulate by surface processing solution so its manufacturing process is simple because of only needing just can to prevent that with single layer body 621 from corroding.
In embodiment 4, be example with the axle 620 that is applicable to second conveyer 600, be illustrated, and the also applicable same structure of first conveyer, 400 used axles.
＜embodiment 5 〉
Figure 11 is another embodiment cutaway view of the axle 620 among the present invention.
As shown in the figure, the axle 620 among the present invention comprises: tubular body 621; Above-mentioned body 621 both sides are inserted in two ends 624, one end, and the other end combines with the bearing 630 that above-mentioned brace table 610 is bent upwards in the portion; Anticorrosive coat 626 covers the part of all and end 624 of above-mentioned body 621 outer peripheral faces; End cap (End Cap) 627 is combined in above-mentioned anticorrosive coat 626 two ends.
Above-mentioned body 621 uses fibre reinforced plastics, enough rigidity had both been kept, alleviated weight again, and anticorrosive coat 626 is formed on the part of all and end 624 outer peripheral faces of body 621 outer peripheral faces, in its side end cap 627 is set, thereby can prevents that body 621 from exposing in surface processing solution.
The material of above-mentioned anticorrosive coat 626 can adopt, and polytetrafluoroethylene (Polytetrafluoroethylene, PTFE), stainless steel or polyvinyl chloride.Above-mentioned body 621 and anticorrosive coat 626 can be by heating deposited the joint.
In embodiment 5, be example with the axle 620 that is applicable to second conveyer 600, be illustrated, and the also applicable same structure of first conveyer, 400 used axles.
＜embodiment 6 〉
Figure 12 is another embodiment cutaway view of the axle 620 among the present invention.
As shown in the figure, axle 620 end caps 627 that do not use among the embodiment 5 among the present invention, and between anticorrosive coat 626 and end 624, use O type ring (O-ring), prevent that the surface treatment liquid that uses in the surface treating part 700 from entering into body 621.
Anticorrosive coat 626 materials can adopt, polytetrafluoroethylene, stainless steel or polyvinyl chloride.Above-mentioned body 621 and anticorrosive coat 626 can be by heating deposited the joint.
In embodiment 6, be example with the axle 620 that is applicable to second conveyer 600, be illustrated, and the also applicable same structure of first conveyer, 400 used axles.
＜embodiment 7 〉
Figure 13 is an embodiment schematic diagram of the surface treating part 700 among the present invention.
As shown in the figure, the surface treating part 700 among the present invention can adopt wet type washing device, and this wet type washing device is separated into unit of prewetting (Pre-wetting) 740 and spray unit 750 by partition wall 760.
The above-mentioned unit 740 of prewetting is confined space with spray unit 750, passes through this space by second conveyer, 600 substrate conveying 800.The above-mentioned unit 740 of prewetting comprises: air curtain nozzle 741 forms air curtain, to prevent that deionized water is from porch adverse current that substrate 800 enters; Deionized water nozzle 742 evenly sprays deionized water to substrate 800 surfaces of moving; Drop prevents to cover 743, prevents to produce drop in above-mentioned air curtain nozzle 741 and the deionized water nozzle 742; Exhaust apparatus 744 prevents to cover the condensed water on 743 surfaces and the air-flow of generation is discharged to drop.
In addition, above-mentioned spray unit 750 comprises: most nozzles 751, to the upper surface and the lower surface of the even substrate 800 that sprays of process deionized water in the above-mentioned unit 740 of prewetting, jet cleaning liquid; Exhaust portion 752 is carried out exhaust to the air-flow that contains the particulate that breaks away from from substrate 800.
Below, the 26S Proteasome Structure and Function of one of the above-mentioned surface treating part 700 among the present invention embodiment is elaborated.
At first, be loaded into substrate 800 on second conveyer 600, enter the above-mentioned unit 740 of prewetting by above-mentioned lifting unit 500.Evenly spray deionized water by the 742 pairs of substrate that enters 800 upper surfaces of deionized water nozzle.
At this moment, aforesaid substrate 800 ingress of the unit 740 of prewetting are provided with air curtain nozzle 741, and pass through the air curtain that produced, prevent that deionized water adverse current that deionized water nozzle 74 sprayed is to lifting unit 500 places.
In implementing the process of prewetting, produce water smoke (Fume) through sprinkling of deionized water, this water smoke condenses into drop at deionized water nozzle 742 and air curtain nozzle 741 places, and this drop can drop on substrate 800 surfaces in conveying, generates watermark.
In order to prevent that above-mentioned phenomenon from taking place, use drop to prevent to cover 743 and cover deionized water nozzle 742 and air curtain nozzle 741, simultaneously, prevent to cover the drop that produces in 743 at drop and be expelled to the outside by exhaust apparatus 744.
In order to improve exhaust efficiency, on above-mentioned exhaust apparatus 744, can be provided with and connect drop and prevent to cover the flexible pipe of 743 part positions, it is used to discharge and condenses in that drop prevents to cover the drop on 743 and the air of 740 inside, unit of prewetting.Said nozzle air curtain 741 formed air curtains might prevent to cover 743 surfaces at drop and generate condensate, also condensate can be discharged by above-mentioned flexible pipe.
Above-mentioned partition wall 760 of prewetting between unit 740 and the spray unit 750 plays the effect that formed water smoke enters the unit 740 of prewetting in the spray unit 750 that stops.And, when a small amount of water smoke enters when prewetting unit 740, can discharge by the exhaust apparatus 744 of 740 inside, unit of prewetting.
Like this, move to spray unit 750 through the substrate of prewetting 800 in the unit 740 of prewetting, the cleaning fluids such as deionized water that sprayed by the nozzle 751 in the spray unit 750 are removed particulate then.
Said nozzle 751 is positioned at from substrate 800 upper surfaces and lower surface a distance, sprays by the brute force of cleaning fluid and removes particulate.That is, the particulate on substrate 800 surfaces is along with air blast breaks away from substrate 800 surfaces, and is expelled to the outside by exhaust portion 752 together with air-flow.
The water smoke that is taken place in the above-mentioned spray unit 750 might cause spraying 750 inside upper part places, unit and generate drop, and this drop can drop on substrate 800 surfaces.
Even drop drops on substrate 800 surfaces, because of evenly prewetting with deionized water on substrate 800 surfaces, so can not produce watermark.
Substrate 800 through cleaning in above-mentioned spray unit 750 is transported to and loads and unloading portion 300, and is transported to buffer part 100 by Handling device 200.
＜embodiment 8 〉
Figure 14 is another example structure schematic diagram of the surface treating part 700 among the present invention.
As shown in the figure, another example structure of surface treating part 700 among the present invention, by being increased in the foregoing description 7 structures in the spray unit 750 substrate 800 upper and lower surfaces are carried out most roll brushs 753 that physics cleans, and when carrying prevent the axle 754 of substrate 800 bendings and constitute.
Use above-mentioned roll brush 753 can cause the drop growing amount to increase, but substrate 800 even dropping, drop can not cause watermark yet under the state that the unit 740 process deionized waters of prewetting are evenly prewetted on substrate 800.
＜embodiment 9 〉
Figure 15 is a used roll brush 753 and an example structure schematic diagram that drives and control the control device of this roll brush 753 in the foregoing description 8.
As shown in the figure, roll brush and control device among the present invention comprise: two roll brushs 753 are contacted with substrate 800 upper and lower surfaces, and by rotation substrate 800 are cleaned; Fixed part 931,932,933,934 is rotatably fixed the rotating shaft 941,942 of above-mentioned roll brush 753; Rotate the motor 921,922 of above-mentioned rotating shaft 941,942; Measure and show the amperometric determination portion 910 of the electric current of said motor 921,922; Height Adjustment portion 950 by being connected to the support of said fixing portion 931,932,933,934 and adjustable length, can adjust the spacing between roll brush 753 and the substrate 800.
Below, structure and the function of the embodiment of the present invention with above-mentioned formation is elaborated.
At first, contact is separately fixed on the rotating shaft 941,942 at two roll brushs 753 of substrate 800 upper and lower surfaces, and motor 921,922 provides revolving force to drive this rotating shaft 941,942.
Above-mentioned rotating shaft 941,942 rotatably is fixed on respectively on the fixed part 931,932,933,934, and fixed part 931,932,933,934 is connected to highly adjusting with on the support, makes its adjustable-height.
In this state, above-mentioned amperometric determination portion 910 measures the electric current of two motors 921,922, and institute survey current value is presented at respectively on two display parts 911,912
Measuring electric current in the motor 921,922 changes along with the size of motor 921,922 rotary loads.And rotary load is decided by the contact condition of roll brush 753 and substrate 800, that is, when roll brush 753 and substrate 800 were adjacent to, motor 921,922 rotary loads increased, and the interval of roll brush 753 and substrate 800 is when big, and load then reduces.
When the rotary load of said motor 921,922 increased, amperometric determination portion 910 current value of surveying was also along with increase, and the current value of surveying also and then reduced when load reduced.
Utilize above-mentioned principle, at first the decision roll brush 753 that is suitable for cleaning most and the exposure level of substrate 800.Promptly, regulate the contact condition that Height Adjustment portion 950 changes between roll brush 753 and the substrate 800, wait to set out the fully exposure level of the particulate of cleaning base plate 800, then the current value of the motor of being measured in the portion of amperometric determination at this moment 910 921,922 is set at fiducial value.
In substrate 800 cleaning processes afterwards, current reference value and the current amperometric determination value of having set compared, such as amperometric determination portion 910 the current current value of survey be higher than fiducial value, be judged as roll brush 753 and substrate 800 excessively is adjacent to.On the contrary, such as amperometric determination portion 910 the current current value of survey be lower than fiducial value, the spacing that then is judged as roll brush 753 and substrate 800 is excessive.
Operating personnel are according to above-mentioned judged result, operate above-mentioned Height Adjustment portion 950, regulate the height of the roll brush 753 that is positioned at substrate 800 tops or bottom.At this moment, be adjusted to above-mentioned amperometric determination portion 910 electric currents and confirm the result, its institute's current value of surveying is with till fiducial value is consistent.
The display part 911,912 of above-mentioned amperometric determination portion 910 can show the current value of being measured with analog form or digital mode, and wherein digital mode is carried out between measured value and the reference current value relatively easily, so the digital mode of preferred use.
In addition, also can comprise, be arranged on amperometric determination portion 910 and to reference current value with currently survey the comparison means that current value compares, and when in the comparison of comparison means, the difference of reference current value and the current value of surveying is during above predefined error range, the warning tones generating means of generation warning tones.
By said process, can keep certain roll brush 753 and substrate 800 exposure levels, so that obtain optimal cleaning effect.
＜embodiment 10 〉
Figure 16 is an example structure schematic diagram of the drying unit 730 in the present invention's the substrate board treatment.
As shown in the figure, the drying unit 730 among the present invention comprises: outer wall 731, be provided with entrance and exit, and the substrate 800 on second conveyer 699 is passed through; Partition wall 732, it is inboard and perpendicular to the moving direction of substrate 800 to be located at above-mentioned outer wall 731, is used to separate the space of implementing dry space and carrying the drying substrate; Puff prot 733 is positioned at and is separated wall 732 and is divided into and implements dry space, and to substrate 800 upper and lower surface injection airs; Soft air-flow barrier film 734 is arranged between above-mentioned puff prot 733 and the partition wall 732; Be arranged on a plurality of exhaust outlets 735 of the bottom surface and the side of above-mentioned outer wall 731.
Below, the 26S Proteasome Structure and Function of the drying unit among the present invention with said structure 730 is elaborated.
At first, outer wall 731 is provided with entrance and exit, enters and passes in and out for second conveyer, 600 substrate conveying 800, and be provided with a plurality of exhaust outlets 735, and air-flow and the mist (Mist) that produces discharged.
In addition, outer wall 731 inboard central portions are provided with the partition wall 732 perpendicular to substrate 800 moving directions.Partition wall 732 is used to separate space, outer wall entrance and exit both sides, and the mist that takes place when stoping drying flows into outlet side.
Be provided with a pair of puff prot 733 in the entrance side space of being separated by above-mentioned partition wall 732, by substrate 800 upper and lower surface injection airs are come dry substrate 800, and be provided with soft air-flow barrier film 734 between puff prot 733 and the partition wall 732.
Enter the mouth when substrate 800 is transported to outer wall 731 by second conveyer 600, puff prot 733 injection airs begin dry substrate 800.
At this moment, along with the variation of the spray angle of puff prot 733, the shape of soft air-flow barrier film 734 also changes, to prevent the space occurring between puff prot 733 and the partition wall 732.Like this, can prevent the substrate treatment solutions such as cleaning fluid of the mistization that puff prot 733 injection airs cause, be attached to again on dried base plate 800 surfaces.
Figure 17 and Figure 18 soft air-flow barrier film 734 shape schematic diagrames for changing along with puff prot 733 angles.
As shown in the figure, along with puff prot 733 angles change, the shape of air-flow barrier film 734 also changes, to prevent the slit occurring between puff prot 733 and the partition wall 732.
Like this, the puff prot 733 jet mists that cause are separated wall 732 gentle stream barrier films 734 to be stopped, prevents it once more on the substrate 800 attached to dried, and discharges by a plurality of exhaust outlets 735.
Said flow barrier film 734 preferably adopts soft polyvinyl chloride.
In specification preferred embodiment of the present invention is illustrated, but the present invention not merely is defined in described embodiment, this area professional can carry out various changes and improvement to the present invention within the technology of the present invention scope.
Claims (14)
Priority Applications (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020040101837 | 2004-12-06 | ||
| KR10-2004-0101837 | 2004-12-06 | ||
| KR20040101837 | 2004-12-06 | ||
| KR1020040108247 | 2004-12-17 | ||
| KR10-2004-0108247 | 2004-12-17 | ||
| KR10-2004-0109047 | 2004-12-20 | ||
| KR1020040109047 | 2004-12-20 | ||
| KR10-2004-0111931 | 2004-12-24 | ||
| KR1020040111931 | 2004-12-24 | ||
| KR1020040116185 | 2004-12-30 | ||
| KR10-2004-0116185 | 2004-12-30 | ||
| KR1020050087557 | 2005-09-21 | ||
| KR10-2005-0087557 | 2005-09-21 |
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| CN1808704A CN1808704A (en) | 2006-07-26 |
| CN100433284C true CN100433284C (en) | 2008-11-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2005101278852A CN100433284C (en) | 2004-12-06 | 2005-12-06 | Substrate disposing device and method |
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| KR (1) | KR101177561B1 (en) |
| CN (1) | CN100433284C (en) |
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| JP2008047696A (en) * | 2006-08-16 | 2008-02-28 | Disco Abrasive Syst Ltd | Method for carrying wafer and grinding device |
| JP4976188B2 (en) * | 2007-04-16 | 2012-07-18 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
| TWI451521B (en) * | 2010-06-21 | 2014-09-01 | Semes Co Ltd | Substrate treating apparatus and substrate treating method |
| CN102064126B (en) * | 2010-11-04 | 2013-04-17 | 友达光电股份有限公司 | Method for processing base plate conveyance |
| US8336757B2 (en) * | 2011-01-04 | 2012-12-25 | Asm Assembly Automation Ltd | Apparatus for transporting substrates for bonding |
| US9153464B2 (en) * | 2011-05-31 | 2015-10-06 | Semes Co., Ltd. | Substrate processing apparatus and substrate processing method |
| CN104716072B (en) * | 2013-12-16 | 2018-02-13 | 昆山国显光电有限公司 | A kind of array base palte stripping system and its stripping means |
| CN103887211B (en) * | 2014-03-06 | 2016-05-25 | 京东方科技集团股份有限公司 | Equipment between the control method of exhaust valve and device and dry section between a kind of dry section |
| CN105319219B (en) * | 2014-07-23 | 2019-05-14 | 塞米西斯科株式会社 | Bad inspection system and method |
| KR101672915B1 (en) | 2015-01-07 | 2016-11-08 | 주식회사 광성텍 | Composite roll manufactured by drawing process and manufacturing method of the same |
| CN106186712A (en) * | 2016-07-14 | 2016-12-07 | 成都工投电子设备有限公司 | Top-jet-type spray etching machine |
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| JPH1147866A (en) * | 1997-07-31 | 1999-02-23 | Toray Ind Inc | Production of roll and shaft to be used for the roll |
| JP3629491B2 (en) * | 2004-03-26 | 2005-03-16 | 三菱レイヨン株式会社 | Metal coat roll |
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- 2005-09-21 KR KR1020050087557A patent/KR101177561B1/en active IP Right Grant
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| JP2000114224A (en) * | 1992-03-18 | 2000-04-21 | Tokyo Electron Ltd | Substrate-cleaning apparatus |
| CN2173767Y (en) * | 1992-07-14 | 1994-08-10 | 峰峰煤矿技工学校实习工厂 | Belt conveyer pulley for transporting material |
| CN2505454Y (en) * | 2000-05-15 | 2002-08-14 | 黄九万 | Multi-purpose idler roller |
| CN1455951A (en) * | 2001-02-27 | 2003-11-12 | 住友精密工业株式会社 | Lift type substrate treatment device, and substrate treatment system with the substrate treatment device |
| CN1470337A (en) * | 2002-06-28 | 2004-01-28 | 大日本屏影象制造株式会社 | Substrate treating apparatus and substrate cleaning method |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101177561B1 (en) | 2012-08-28 |
| KR20060063634A (en) | 2006-06-12 |
| CN1808704A (en) | 2006-07-26 |
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