CN1330615C - 氢氟烃的制造方法,其制品及其用途 - Google Patents
氢氟烃的制造方法,其制品及其用途 Download PDFInfo
- Publication number
- CN1330615C CN1330615C CNB2004800012200A CN200480001220A CN1330615C CN 1330615 C CN1330615 C CN 1330615C CN B2004800012200 A CNB2004800012200 A CN B2004800012200A CN 200480001220 A CN200480001220 A CN 200480001220A CN 1330615 C CN1330615 C CN 1330615C
- Authority
- CN
- China
- Prior art keywords
- manufacture method
- hydrogen fluorohydrocarbon
- distillation tower
- gas
- fluorohydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 87
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 58
- 230000008569 process Effects 0.000 title abstract description 5
- 239000007789 gas Substances 0.000 claims abstract description 59
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 claims abstract description 52
- 238000006243 chemical reaction Methods 0.000 claims abstract description 40
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims abstract description 39
- 239000000203 mixture Substances 0.000 claims abstract description 33
- 239000003054 catalyst Substances 0.000 claims abstract description 15
- 238000003682 fluorination reaction Methods 0.000 claims abstract description 12
- 238000000746 purification Methods 0.000 claims abstract description 9
- 238000000926 separation method Methods 0.000 claims abstract description 9
- 239000001257 hydrogen Substances 0.000 claims description 68
- 229910052739 hydrogen Inorganic materials 0.000 claims description 68
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 68
- 238000004821 distillation Methods 0.000 claims description 44
- -1 methyl halide Chemical class 0.000 claims description 32
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 claims description 25
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 22
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 21
- 241000282326 Felis catus Species 0.000 claims description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 14
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 14
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 14
- 229940050176 methyl chloride Drugs 0.000 claims description 11
- 230000008676 import Effects 0.000 claims description 10
- 239000002994 raw material Substances 0.000 claims description 9
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 abstract description 11
- 239000004065 semiconductor Substances 0.000 abstract description 6
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 abstract description 3
- 238000004140 cleaning Methods 0.000 abstract 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract 1
- 239000012808 vapor phase Substances 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 27
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 239000002808 molecular sieve Substances 0.000 description 14
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 14
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 12
- 238000007670 refining Methods 0.000 description 11
- 229910021536 Zeolite Inorganic materials 0.000 description 10
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 10
- 239000012071 phase Substances 0.000 description 10
- 239000010457 zeolite Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000010926 purge Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 6
- XWCDCDSDNJVCLO-UHFFFAOYSA-N Chlorofluoromethane Chemical compound FCCl XWCDCDSDNJVCLO-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 5
- 238000004949 mass spectrometry Methods 0.000 description 5
- 238000003822 preparative gas chromatography Methods 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 4
- 238000010790 dilution Methods 0.000 description 4
- 239000012895 dilution Substances 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 238000004334 fluoridation Methods 0.000 description 4
- 229960003132 halothane Drugs 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 125000004773 chlorofluoromethyl group Chemical group [H]C(F)(Cl)* 0.000 description 3
- 229910021563 chromium fluoride Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- KLZDCUBZWUSEGO-UHFFFAOYSA-N CC.F.F.F.F.F Chemical compound CC.F.F.F.F.F KLZDCUBZWUSEGO-UHFFFAOYSA-N 0.000 description 2
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000012018 catalyst precursor Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical group [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 2
- 229960001701 chloroform Drugs 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- UMNKXPULIDJLSU-UHFFFAOYSA-N dichlorofluoromethane Chemical compound FC(Cl)Cl UMNKXPULIDJLSU-UHFFFAOYSA-N 0.000 description 2
- 229940099364 dichlorofluoromethane Drugs 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- LVGUZGTVOIAKKC-UHFFFAOYSA-N 1,1,1,2-tetrafluoroethane Chemical compound FCC(F)(F)F LVGUZGTVOIAKKC-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000368 destabilizing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000002594 sorbent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/093—Preparation of halogenated hydrocarbons by replacement by halogens
- C07C17/20—Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms
- C07C17/202—Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms two or more compounds being involved in the reaction
- C07C17/206—Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms two or more compounds being involved in the reaction the other compound being HX
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/38—Separation; Purification; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Detergent Compositions (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP318556/2003 | 2003-09-10 | ||
| JP2003318556 | 2003-09-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1701056A CN1701056A (zh) | 2005-11-23 |
| CN1330615C true CN1330615C (zh) | 2007-08-08 |
Family
ID=34308524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004800012200A Expired - Lifetime CN1330615C (zh) | 2003-09-10 | 2004-09-09 | 氢氟烃的制造方法,其制品及其用途 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP4785532B2 (enrdf_load_stackoverflow) |
| KR (1) | KR100643674B1 (enrdf_load_stackoverflow) |
| CN (1) | CN1330615C (enrdf_load_stackoverflow) |
| TW (1) | TW200516068A (enrdf_load_stackoverflow) |
| WO (1) | WO2005026090A1 (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2901790A1 (fr) * | 2006-05-30 | 2007-12-07 | Arkema France | Procede de fabrication des hydrofluorocarbures |
| CN102762525B (zh) * | 2010-02-17 | 2016-05-04 | 中央硝子株式会社 | 半导体气体的制造方法 |
| JP5652179B2 (ja) * | 2010-12-09 | 2015-01-14 | セントラル硝子株式会社 | 半導体ガスの製造方法 |
| CN103910600A (zh) * | 2013-01-06 | 2014-07-09 | 中化蓝天集团有限公司 | 超高纯一氟甲烷的制备方法 |
| JP2014221727A (ja) * | 2013-05-13 | 2014-11-27 | 昭和電工株式会社 | ジクロロメタンの精製方法およびそれを用いるジフルオロメタンの製造方法 |
| JP6261531B2 (ja) * | 2015-02-05 | 2018-01-17 | ダイキン工業株式会社 | フッ化メチルの製造方法 |
| CN109748775B (zh) * | 2017-11-08 | 2021-08-17 | 浙江蓝天环保高科技股份有限公司 | 一种hcfc-22生产中副产三氟甲烷的资源化利用方法 |
| WO2025150175A1 (ja) * | 2024-01-12 | 2025-07-17 | 三菱電機株式会社 | フロン冷媒の製造方法、フロン冷媒の貯蔵方法、ヒートポンプ装置の製造方法、および二酸化炭素貯蔵システム |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1076686A (zh) * | 1992-03-23 | 1993-09-29 | 浙江省化工研究院 | 气相氟化制备二氟甲烷的改进方法 |
| CN1098332A (zh) * | 1993-06-18 | 1995-02-08 | 昭和电工株式会社 | 氟化催化剂和氟化方法 |
| CN1119432A (zh) * | 1993-03-24 | 1996-03-27 | 帝国化学工业公司 | 二氟甲烷的生产 |
| CN1151724A (zh) * | 1994-07-01 | 1997-06-11 | 大金工业株式会社 | 二氟甲烷的制造方法 |
| CN1181057A (zh) * | 1995-02-10 | 1998-05-06 | 大金工业株式会社 | 二氟甲烷及二氟氯甲烷的制造方法 |
| CN1201446A (zh) * | 1995-09-20 | 1998-12-09 | 联合讯号公司 | 生产二氟甲烷的方法 |
| US6235265B1 (en) * | 1998-10-28 | 2001-05-22 | Alliedsignal Inc. | Evaporative coolant for topical anesthesia comprising hydrofluorocarbons and/or hydrochlorofluorocarbons |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1989010341A1 (en) * | 1988-04-28 | 1989-11-02 | Showa Denko Kabushiki Kaisha | Process for producing organofluorine compound |
| US5446218A (en) * | 1993-04-26 | 1995-08-29 | E. I. Du Pont De Nemours And Company | Preparation of fluorinated methanes |
| JP3582798B2 (ja) * | 1993-06-18 | 2004-10-27 | 昭和電工株式会社 | フッ素化触媒およびフッ素化方法 |
| JPH0717882A (ja) * | 1993-07-05 | 1995-01-20 | Daikin Ind Ltd | ジフルオロメタンの製造方法 |
| ES2146740T3 (es) * | 1993-12-09 | 2000-08-16 | Daikin Ind Ltd | Procedimiento de produccion del difluorometano y del 1,1,1,2-tetrafluoroetano. |
| KR0125120B1 (ko) * | 1994-07-04 | 1997-12-01 | 김은영 | 불화탄화수소 화합물들의 병산 제조방법 |
| KR0152580B1 (ko) * | 1995-08-23 | 1998-10-15 | 김은영 | 1,1,1,2-테트라플루오로에탄, 펜타플루오로에탄 및 1,1,1-트리플루오로에탄의 병산 방법 |
| EP1003699B9 (en) * | 1997-08-12 | 2004-01-07 | E.I. Du Pont De Nemours And Company | Purification of difluoromethane by extractive distillation |
| JP2001524459A (ja) * | 1997-11-21 | 2001-12-04 | アライドシグナル・インコーポレイテッド | ハイドロフルオロカーボンの製造方法 |
| JP4574259B2 (ja) * | 2003-07-24 | 2010-11-04 | 昭和電工株式会社 | フルオロメタンの精製方法 |
-
2004
- 2004-09-08 TW TW093127173A patent/TW200516068A/zh not_active IP Right Cessation
- 2004-09-09 WO PCT/JP2004/013482 patent/WO2005026090A1/ja active Application Filing
- 2004-09-09 CN CNB2004800012200A patent/CN1330615C/zh not_active Expired - Lifetime
- 2004-09-09 KR KR1020057008285A patent/KR100643674B1/ko not_active Expired - Lifetime
- 2004-09-09 JP JP2005513956A patent/JP4785532B2/ja not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1076686A (zh) * | 1992-03-23 | 1993-09-29 | 浙江省化工研究院 | 气相氟化制备二氟甲烷的改进方法 |
| CN1119432A (zh) * | 1993-03-24 | 1996-03-27 | 帝国化学工业公司 | 二氟甲烷的生产 |
| CN1098332A (zh) * | 1993-06-18 | 1995-02-08 | 昭和电工株式会社 | 氟化催化剂和氟化方法 |
| CN1151724A (zh) * | 1994-07-01 | 1997-06-11 | 大金工业株式会社 | 二氟甲烷的制造方法 |
| CN1181057A (zh) * | 1995-02-10 | 1998-05-06 | 大金工业株式会社 | 二氟甲烷及二氟氯甲烷的制造方法 |
| CN1201446A (zh) * | 1995-09-20 | 1998-12-09 | 联合讯号公司 | 生产二氟甲烷的方法 |
| US6235265B1 (en) * | 1998-10-28 | 2001-05-22 | Alliedsignal Inc. | Evaporative coolant for topical anesthesia comprising hydrofluorocarbons and/or hydrochlorofluorocarbons |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100643674B1 (ko) | 2006-11-10 |
| JPWO2005026090A1 (ja) | 2006-11-16 |
| JP4785532B2 (ja) | 2011-10-05 |
| TWI325412B (enrdf_load_stackoverflow) | 2010-06-01 |
| WO2005026090A1 (ja) | 2005-03-24 |
| TW200516068A (en) | 2005-05-16 |
| KR20050086475A (ko) | 2005-08-30 |
| CN1701056A (zh) | 2005-11-23 |
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