CN1324613C - 光学单元及有关方法 - Google Patents

光学单元及有关方法 Download PDF

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Publication number
CN1324613C
CN1324613C CNB038195275A CN03819527A CN1324613C CN 1324613 C CN1324613 C CN 1324613C CN B038195275 A CNB038195275 A CN B038195275A CN 03819527 A CN03819527 A CN 03819527A CN 1324613 C CN1324613 C CN 1324613C
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CN
China
Prior art keywords
optical module
optical
curvature
sample
incident
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Expired - Lifetime
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CNB038195275A
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English (en)
Chinese (zh)
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CN1675720A (zh
Inventor
P·霍格霍伊
A·达里埃尔
S·罗德里格斯
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XENOCS
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XENOCS
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Priority claimed from FR0207546A external-priority patent/FR2841371B1/fr
Priority claimed from FR0300623A external-priority patent/FR2850171B1/fr
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Publication of CN1675720A publication Critical patent/CN1675720A/zh
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Publication of CN1324613C publication Critical patent/CN1324613C/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Glass Compositions (AREA)
  • Prostheses (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Light Guides In General And Applications Therefor (AREA)
CNB038195275A 2002-06-19 2003-06-19 光学单元及有关方法 Expired - Lifetime CN1324613C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
FR0207546A FR2841371B1 (fr) 2002-06-19 2002-06-19 Ensemble optique et procede associe
FR02/07546 2002-06-19
FR0300623A FR2850171B1 (fr) 2003-01-21 2003-01-21 Dispositif optique pour applications rayons x
FR03/00623 2003-01-21

Publications (2)

Publication Number Publication Date
CN1675720A CN1675720A (zh) 2005-09-28
CN1324613C true CN1324613C (zh) 2007-07-04

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
CNB038195275A Expired - Lifetime CN1324613C (zh) 2002-06-19 2003-06-19 光学单元及有关方法
CNB038145081A Expired - Fee Related CN1332399C (zh) 2002-06-19 2003-06-19 用于x射线应用的光学装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
CNB038145081A Expired - Fee Related CN1332399C (zh) 2002-06-19 2003-06-19 用于x射线应用的光学装置

Country Status (8)

Country Link
US (2) US7430277B2 (enExample)
EP (3) EP1514279B1 (enExample)
JP (2) JP2005530170A (enExample)
CN (2) CN1324613C (enExample)
AT (2) ATE421152T1 (enExample)
AU (2) AU2003264670A1 (enExample)
DE (3) DE60308645T2 (enExample)
WO (2) WO2004001770A1 (enExample)

Cited By (2)

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Publication number Priority date Publication date Assignee Title
CN100588396C (zh) * 2001-05-02 2010-02-10 阿布拉科斯生物科学有限公司 治疗增生的组合物和方法
CN104777179A (zh) * 2014-01-15 2015-07-15 帕纳科有限公司 X射线装置

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DE102005057700A1 (de) * 2005-11-25 2007-06-06 Axo Dresden Gmbh Röntgen-Optisches-Element
JP4278108B2 (ja) * 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
FR2918501B1 (fr) 2007-07-02 2009-11-06 Xenocs Soc Par Actions Simplif Dispositif de delivrance d'un faisceau de rayons x a haute energie
US7706503B2 (en) * 2007-11-20 2010-04-27 Rigaku Innovative Technologies, Inc. X-ray optic with varying focal points
EP2075569B1 (en) * 2007-12-31 2012-02-15 Xenocs S.A. X-ray beam device
JP2010014418A (ja) * 2008-07-01 2010-01-21 Japan Atomic Energy Agency 多層膜回折格子分光装置
US7741626B2 (en) * 2008-09-12 2010-06-22 Cymer, Inc. Spectral purity filters and methods therefor
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
US8249220B2 (en) * 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8311184B2 (en) 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
US8488740B2 (en) * 2010-11-18 2013-07-16 Panalytical B.V. Diffractometer
FR2967887B1 (fr) 2010-11-26 2018-01-19 General Electric Company Mammographe compact, et procede de mammographie associe
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
KR101332502B1 (ko) * 2011-06-14 2013-11-26 전남대학교산학협력단 국부적 방사선 치료용 ｘ―선 바늘 모듈
US8761346B2 (en) 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
CN102903413B (zh) * 2012-10-30 2015-06-03 同济大学 一种在小尺寸背光下工作的四通道kb显微成像系统
US20140161233A1 (en) 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
EP2762862B1 (en) * 2013-01-30 2017-03-08 Bruker AXS GmbH XRF measurement apparatus for detecting contaminations on the bevel of a wafer
EP3066727A4 (en) * 2013-11-07 2017-05-17 MACOM Technology Solutions Holdings, Inc. Lasers with beam shape and beam direction modification
JP6202684B2 (ja) * 2014-06-05 2017-09-27 株式会社リガク Ｘ線回折装置
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
CN105092618A (zh) * 2015-09-18 2015-11-25 北京师范大学 一种微束能量色散的x射线衍射仪及其使用方法
CN105873344A (zh) * 2016-03-22 2016-08-17 中国工程物理研究院流体物理研究所 一种基于横向梯度多层膜反射元件的x射线单能成像方法
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
FR3059434B1 (fr) * 2016-11-29 2019-05-17 Centre National De La Recherche Scientifique - Cnrs Composant de selection spectrale pour radiations xuv
CN106706157B (zh) * 2017-01-11 2023-06-13 中国工程物理研究院激光聚变研究中心 一种基于准同视轴的icf热斑电子温度探测设备
WO2020260336A1 (de) * 2019-06-24 2020-12-30 Sms Group Gmbh Regelung der prozessparameter mittels röntgenografischer online-bestimmung von werkstoffeigenschaften bei der erzeugung metallischer bänder und bleche
JP7637879B2 (ja) * 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7637878B2 (ja) * 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7564522B2 (ja) 2021-01-12 2024-10-09 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
CN115389537A (zh) * 2022-08-26 2022-11-25 同济大学 一种具有高通量的小焦斑中子聚焦系统
CN119688594B (zh) * 2025-02-24 2025-06-20 泸州市镀膜科技有限公司 一种用于电容器金属化薄膜加工的缺陷检测系统

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US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes

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US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100588396C (zh) * 2001-05-02 2010-02-10 阿布拉科斯生物科学有限公司 治疗增生的组合物和方法
CN104777179A (zh) * 2014-01-15 2015-07-15 帕纳科有限公司 X射线装置
CN104777179B (zh) * 2014-01-15 2019-01-08 马尔文帕纳科公司 X射线装置

Also Published As

Publication number Publication date
EP1732087A3 (fr) 2007-03-28
DE60308645D1 (de) 2006-11-09
AU2003264670A1 (en) 2004-01-06
WO2004001769A1 (fr) 2003-12-31
CN1675720A (zh) 2005-09-28
CN1662999A (zh) 2005-08-31
ATE341083T1 (de) 2006-10-15
US20050117239A1 (en) 2005-06-02
CN1332399C (zh) 2007-08-15
EP1468428B1 (fr) 2006-09-27
JP2005530170A (ja) 2005-10-06
WO2004001770A1 (fr) 2003-12-31
US7430277B2 (en) 2008-09-30
AU2003260613A1 (en) 2004-01-06
ATE421152T1 (de) 2009-01-15
DE60325853D1 (de) 2009-03-05
US20060018429A1 (en) 2006-01-26
DE20320792U1 (de) 2005-05-04
DE60308645T2 (de) 2007-10-18
EP1468428A1 (fr) 2004-10-20
EP1732087A2 (fr) 2006-12-13
EP1514279A1 (fr) 2005-03-16
US7248670B2 (en) 2007-07-24
JP2005530168A (ja) 2005-10-06
WO2004001769A8 (fr) 2005-01-06
EP1514279B1 (fr) 2009-01-14

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