CN1322565C - 包括有薄氧化物内衬的半导体装置及其制法 - Google Patents
包括有薄氧化物内衬的半导体装置及其制法 Download PDFInfo
- Publication number
- CN1322565C CN1322565C CNB028257502A CN02825750A CN1322565C CN 1322565 C CN1322565 C CN 1322565C CN B028257502 A CNB028257502 A CN B028257502A CN 02825750 A CN02825750 A CN 02825750A CN 1322565 C CN1322565 C CN 1322565C
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- China
- Prior art keywords
- substrate
- oxide liner
- source
- etching
- grid
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title description 3
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 30
- 238000005530 etching Methods 0.000 claims abstract description 22
- 150000004767 nitrides Chemical class 0.000 claims abstract description 16
- 229910045601 alloy Inorganic materials 0.000 claims description 23
- 239000000956 alloy Substances 0.000 claims description 23
- 125000006850 spacer group Chemical group 0.000 claims description 17
- 238000002347 injection Methods 0.000 claims description 9
- 239000007924 injection Substances 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000001312 dry etching Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- DOTMOQHOJINYBL-UHFFFAOYSA-N molecular nitrogen;molecular oxygen Chemical compound N#N.O=O DOTMOQHOJINYBL-UHFFFAOYSA-N 0.000 claims description 3
- 239000002019 doping agent Substances 0.000 abstract 2
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 5
- 229920005591 polysilicon Polymers 0.000 description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- 238000000137 annealing Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 230000000717 retained effect Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000032696 parturition Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 150000003376 silicon Chemical class 0.000 description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 101100400452 Caenorhabditis elegans map-2 gene Proteins 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
- H01L21/2652—Through-implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66575—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate
- H01L29/6659—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate with both lightly doped source and drain extensions and source and drain self-aligned to the sides of the gate, e.g. lightly doped drain [LDD] MOSFET, double diffused drain [DDD] MOSFET
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Ceramic Engineering (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Electrodes Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US2103701A | 2001-12-19 | 2001-12-19 | |
US10/021,037 | 2001-12-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1606801A CN1606801A (zh) | 2005-04-13 |
CN1322565C true CN1322565C (zh) | 2007-06-20 |
Family
ID=21801954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028257502A Expired - Fee Related CN1322565C (zh) | 2001-12-19 | 2002-12-19 | 包括有薄氧化物内衬的半导体装置及其制法 |
Country Status (7)
Country | Link |
---|---|
JP (1) | JP2005517285A (ja) |
KR (1) | KR20040068269A (ja) |
CN (1) | CN1322565C (ja) |
AU (1) | AU2002358269A1 (ja) |
DE (1) | DE10297582T5 (ja) |
GB (1) | GB2399222B (ja) |
WO (1) | WO2003054951A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6583016B1 (en) * | 2002-03-26 | 2003-06-24 | Advanced Micro Devices, Inc. | Doped spacer liner for improved transistor performance |
JP2008124441A (ja) * | 2006-10-19 | 2008-05-29 | Tokyo Electron Ltd | 半導体装置の製造方法 |
DE102011005641B4 (de) * | 2011-03-16 | 2018-01-04 | GLOBALFOUNDRIES Dresden Module One Ltd. Liability Company & Co. KG | Verfahren zur Leistungssteigerung in Transistoren durch Reduzierung der Absenkung aktiver Gebiete und durch Entfernen von Abstandshaltern |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5714413A (en) * | 1995-12-11 | 1998-02-03 | Intel Corporation | Method of making a transistor having a deposited dual-layer spacer structure |
US6156598A (en) * | 1999-12-13 | 2000-12-05 | Chartered Semiconductor Manufacturing Ltd. | Method for forming a lightly doped source and drain structure using an L-shaped spacer |
US6277700B1 (en) * | 2000-01-11 | 2001-08-21 | Chartered Semiconductor Manufacturing Ltd. | High selective nitride spacer etch with high ratio of spacer width to deposited nitride thickness |
US6294480B1 (en) * | 1999-11-19 | 2001-09-25 | Chartered Semiconductor Manufacturing Ltd. | Method for forming an L-shaped spacer with a disposable organic top coating |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4868617A (en) * | 1988-04-25 | 1989-09-19 | Elite Semiconductor & Sytems International, Inc. | Gate controllable lightly doped drain mosfet devices |
US6472281B2 (en) * | 1998-02-03 | 2002-10-29 | Matsushita Electronics Corporation | Method for fabricating semiconductor device using a CVD insulator film |
US6162692A (en) * | 1998-06-26 | 2000-12-19 | Advanced Micro Devices, Inc. | Integration of a diffusion barrier layer and a counter dopant region to maintain the dopant level within the junctions of a transistor |
US6251764B1 (en) * | 1999-11-15 | 2001-06-26 | Chartered Semiconductor Manufacturing Ltd. | Method to form an L-shaped silicon nitride sidewall spacer |
-
2002
- 2002-12-19 KR KR10-2004-7009490A patent/KR20040068269A/ko not_active Application Discontinuation
- 2002-12-19 DE DE10297582T patent/DE10297582T5/de not_active Ceased
- 2002-12-19 GB GB0412884A patent/GB2399222B/en not_active Expired - Lifetime
- 2002-12-19 AU AU2002358269A patent/AU2002358269A1/en not_active Abandoned
- 2002-12-19 JP JP2003555574A patent/JP2005517285A/ja active Pending
- 2002-12-19 WO PCT/US2002/041103 patent/WO2003054951A1/en active Application Filing
- 2002-12-19 CN CNB028257502A patent/CN1322565C/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5714413A (en) * | 1995-12-11 | 1998-02-03 | Intel Corporation | Method of making a transistor having a deposited dual-layer spacer structure |
US6294480B1 (en) * | 1999-11-19 | 2001-09-25 | Chartered Semiconductor Manufacturing Ltd. | Method for forming an L-shaped spacer with a disposable organic top coating |
US6156598A (en) * | 1999-12-13 | 2000-12-05 | Chartered Semiconductor Manufacturing Ltd. | Method for forming a lightly doped source and drain structure using an L-shaped spacer |
US6277700B1 (en) * | 2000-01-11 | 2001-08-21 | Chartered Semiconductor Manufacturing Ltd. | High selective nitride spacer etch with high ratio of spacer width to deposited nitride thickness |
Also Published As
Publication number | Publication date |
---|---|
WO2003054951A1 (en) | 2003-07-03 |
GB2399222A (en) | 2004-09-08 |
CN1606801A (zh) | 2005-04-13 |
DE10297582T5 (de) | 2004-11-11 |
JP2005517285A (ja) | 2005-06-09 |
AU2002358269A1 (en) | 2003-07-09 |
GB2399222B (en) | 2005-07-20 |
KR20040068269A (ko) | 2004-07-30 |
GB0412884D0 (en) | 2004-07-14 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |