CN1322528C - 具有负电子亲和性的注入冷发射极 - Google Patents
具有负电子亲和性的注入冷发射极 Download PDFInfo
- Publication number
- CN1322528C CN1322528C CNB021443998A CN02144399A CN1322528C CN 1322528 C CN1322528 C CN 1322528C CN B021443998 A CNB021443998 A CN B021443998A CN 02144399 A CN02144399 A CN 02144399A CN 1322528 C CN1322528 C CN 1322528C
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- 229910001573 adamantine Inorganic materials 0.000 description 2
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
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- 229910052697 platinum Inorganic materials 0.000 description 2
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- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- 229910017083 AlN Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910016697 EuO Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
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- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
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- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910021426 porous silicon Inorganic materials 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/308—Semiconductor cathodes, e.g. cathodes with PN junction layers
Landscapes
- Cold Cathode And The Manufacture (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/974818 | 2001-10-12 | ||
| US09/974,818 US6577058B2 (en) | 2001-10-12 | 2001-10-12 | Injection cold emitter with negative electron affinity based on wide-gap semiconductor structure with controlling base |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1412805A CN1412805A (zh) | 2003-04-23 |
| CN1322528C true CN1322528C (zh) | 2007-06-20 |
Family
ID=25522456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021443998A Expired - Fee Related CN1322528C (zh) | 2001-10-12 | 2002-10-14 | 具有负电子亲和性的注入冷发射极 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6577058B2 (enExample) |
| EP (1) | EP1302961A2 (enExample) |
| JP (1) | JP2003123626A (enExample) |
| CN (1) | CN1322528C (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7446474B2 (en) * | 2002-10-10 | 2008-11-04 | Applied Materials, Inc. | Hetero-junction electron emitter with Group III nitride and activated alkali halide |
| US7151338B2 (en) * | 2003-10-02 | 2006-12-19 | Hewlett-Packard Development Company, L.P. | Inorganic electroluminescent device with controlled hole and electron injection |
| US6937698B2 (en) * | 2003-12-04 | 2005-08-30 | Hewlett-Packard Development Company, L.P. | X-ray generating apparatus having an emitter formed on a semiconductor structure |
| WO2006061686A2 (en) * | 2004-12-10 | 2006-06-15 | Johan Frans Prins | A cathodic device |
| JP4176760B2 (ja) * | 2005-11-04 | 2008-11-05 | 株式会社東芝 | 放電発光デバイス |
| US8492744B2 (en) * | 2009-10-29 | 2013-07-23 | The Board Of Trustees Of The University Of Illinois | Semiconducting microcavity and microchannel plasma devices |
| US8547004B2 (en) | 2010-07-27 | 2013-10-01 | The Board Of Trustees Of The University Of Illinois | Encapsulated metal microtip microplasma devices, arrays and fabrication methods |
| CN102360999A (zh) * | 2011-11-08 | 2012-02-22 | 福州大学 | 柔性可控有机pn结场发射电子源 |
| KR101523984B1 (ko) * | 2013-12-31 | 2015-05-29 | (재)한국나노기술원 | 공핍영역을 구비한 화합물반도체 소자 |
| JP7407690B2 (ja) | 2020-11-02 | 2024-01-04 | 株式会社東芝 | 電子放出素子及び発電素子 |
| JP7653867B2 (ja) * | 2021-08-25 | 2025-03-31 | 株式会社東芝 | 熱電子発電素子及び熱電子発電モジュール |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5202571A (en) * | 1990-07-06 | 1993-04-13 | Canon Kabushiki Kaisha | Electron emitting device with diamond |
| US5285079A (en) * | 1990-03-16 | 1994-02-08 | Canon Kabushiki Kaisha | Electron emitting device, electron emitting apparatus and electron beam drawing apparatus |
| US5550435A (en) * | 1993-10-28 | 1996-08-27 | Nec Corporation | Field emission cathode apparatus |
| US5838019A (en) * | 1986-05-08 | 1998-11-17 | Canon Kabushiki Kaisha | Electron emitting element |
| US5932962A (en) * | 1995-10-09 | 1999-08-03 | Fujitsu Limited | Electron emitter elements, their use and fabrication processes therefor |
| US5945777A (en) * | 1998-04-30 | 1999-08-31 | St. Clair Intellectual Property Consultants, Inc. | Surface conduction emitters for use in field emission display devices |
| US6187603B1 (en) * | 1996-06-07 | 2001-02-13 | Candescent Technologies Corporation | Fabrication of gated electron-emitting devices utilizing distributed particles to define gate openings, typically in combination with lift-off of excess emitter material |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3699404A (en) * | 1971-02-24 | 1972-10-17 | Rca Corp | Negative effective electron affinity emitters with drift fields using deep acceptor doping |
| AU7731575A (en) * | 1974-01-18 | 1976-07-15 | Nat Patent Dev Corp | Heterojunction devices |
| US4683399A (en) * | 1981-06-29 | 1987-07-28 | Rockwell International Corporation | Silicon vacuum electron devices |
| EP0257460B1 (en) * | 1986-08-12 | 1996-04-24 | Canon Kabushiki Kaisha | Solid-state electron beam generator |
| US5619092A (en) | 1993-02-01 | 1997-04-08 | Motorola | Enhanced electron emitter |
| US5599749A (en) | 1994-10-21 | 1997-02-04 | Yamaha Corporation | Manufacture of micro electron emitter |
| US5557596A (en) | 1995-03-20 | 1996-09-17 | Gibson; Gary | Ultra-high density storage device |
| US6204595B1 (en) | 1995-07-10 | 2001-03-20 | The Regents Of The University Of California | Amorphous-diamond electron emitter |
| US5908699A (en) | 1996-10-11 | 1999-06-01 | Skion Corporation | Cold cathode electron emitter and display structure |
-
2001
- 2001-10-12 US US09/974,818 patent/US6577058B2/en not_active Expired - Fee Related
-
2002
- 2002-09-19 EP EP02256514A patent/EP1302961A2/en not_active Withdrawn
- 2002-10-09 JP JP2002295743A patent/JP2003123626A/ja not_active Withdrawn
- 2002-10-14 CN CNB021443998A patent/CN1322528C/zh not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5838019A (en) * | 1986-05-08 | 1998-11-17 | Canon Kabushiki Kaisha | Electron emitting element |
| US5285079A (en) * | 1990-03-16 | 1994-02-08 | Canon Kabushiki Kaisha | Electron emitting device, electron emitting apparatus and electron beam drawing apparatus |
| US5202571A (en) * | 1990-07-06 | 1993-04-13 | Canon Kabushiki Kaisha | Electron emitting device with diamond |
| US5550435A (en) * | 1993-10-28 | 1996-08-27 | Nec Corporation | Field emission cathode apparatus |
| US5932962A (en) * | 1995-10-09 | 1999-08-03 | Fujitsu Limited | Electron emitter elements, their use and fabrication processes therefor |
| US6187603B1 (en) * | 1996-06-07 | 2001-02-13 | Candescent Technologies Corporation | Fabrication of gated electron-emitting devices utilizing distributed particles to define gate openings, typically in combination with lift-off of excess emitter material |
| US5945777A (en) * | 1998-04-30 | 1999-08-31 | St. Clair Intellectual Property Consultants, Inc. | Surface conduction emitters for use in field emission display devices |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1302961A2 (en) | 2003-04-16 |
| US6577058B2 (en) | 2003-06-10 |
| CN1412805A (zh) | 2003-04-23 |
| JP2003123626A (ja) | 2003-04-25 |
| US20030071554A1 (en) | 2003-04-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070620 Termination date: 20101014 |