CN1294747A - 铌粉、铌粉烧结体、使用了该烧结体的电容器及其制作方法 - Google Patents
铌粉、铌粉烧结体、使用了该烧结体的电容器及其制作方法 Download PDFInfo
- Publication number
- CN1294747A CN1294747A CN00800153A CN00800153A CN1294747A CN 1294747 A CN1294747 A CN 1294747A CN 00800153 A CN00800153 A CN 00800153A CN 00800153 A CN00800153 A CN 00800153A CN 1294747 A CN1294747 A CN 1294747A
- Authority
- CN
- China
- Prior art keywords
- niobium
- capacitor
- sintered body
- test example
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 title claims abstract description 173
- 239000003990 capacitor Substances 0.000 title claims abstract description 96
- 239000010955 niobium Substances 0.000 title claims abstract description 87
- 229910052758 niobium Inorganic materials 0.000 title claims abstract description 85
- 238000000034 method Methods 0.000 title claims description 35
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 38
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 29
- BFRGSJVXBIWTCF-UHFFFAOYSA-N niobium monoxide Chemical compound [Nb]=O BFRGSJVXBIWTCF-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 19
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 15
- 229910052742 iron Inorganic materials 0.000 claims abstract description 15
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 15
- 239000011734 sodium Substances 0.000 claims abstract description 15
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000011777 magnesium Substances 0.000 claims abstract description 14
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 14
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000010941 cobalt Substances 0.000 claims abstract description 12
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 12
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 12
- 239000011591 potassium Substances 0.000 claims abstract description 12
- 239000010703 silicon Substances 0.000 claims abstract description 12
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 238000002425 crystallisation Methods 0.000 claims description 50
- 230000008025 crystallization Effects 0.000 claims description 49
- 150000001875 compounds Chemical class 0.000 claims description 13
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 13
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 13
- 229920000642 polymer Polymers 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 7
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 6
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 claims description 5
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 claims description 5
- VDZMENNHPJNJPP-UHFFFAOYSA-N boranylidyneniobium Chemical compound [Nb]#B VDZMENNHPJNJPP-UHFFFAOYSA-N 0.000 claims description 4
- 239000003989 dielectric material Substances 0.000 claims description 2
- 239000013078 crystal Substances 0.000 abstract 2
- 238000012360 testing method Methods 0.000 description 88
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 239000007789 gas Substances 0.000 description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 16
- 229910052799 carbon Inorganic materials 0.000 description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 13
- 239000012535 impurity Substances 0.000 description 12
- 239000000843 powder Substances 0.000 description 11
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 11
- 238000005245 sintering Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 229910052715 tantalum Inorganic materials 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 7
- 229910052796 boron Inorganic materials 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- 238000005121 nitriding Methods 0.000 description 7
- 239000012299 nitrogen atmosphere Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910017604 nitric acid Inorganic materials 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 230000008676 import Effects 0.000 description 5
- 229910000464 lead oxide Inorganic materials 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 5
- 239000004411 aluminium Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000003763 carbonization Methods 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 238000005984 hydrogenation reaction Methods 0.000 description 4
- 238000005470 impregnation Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 238000006722 reduction reaction Methods 0.000 description 4
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- VEUKJXRCHYAIAW-UHFFFAOYSA-N [Nb].[K] Chemical compound [Nb].[K] VEUKJXRCHYAIAW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000011812 mixed powder Substances 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000128 polypyrrole Polymers 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 3
- 150000004655 tetrazenes Chemical class 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- ROSDCCJGGBNDNL-UHFFFAOYSA-N [Ta].[Pb] Chemical compound [Ta].[Pb] ROSDCCJGGBNDNL-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000006356 dehydrogenation reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 2
- 230000026030 halogenation Effects 0.000 description 2
- 238000005658 halogenation reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229940046892 lead acetate Drugs 0.000 description 2
- PIJPYDMVFNTHIP-UHFFFAOYSA-L lead sulfate Chemical compound [PbH4+2].[O-]S([O-])(=O)=O PIJPYDMVFNTHIP-UHFFFAOYSA-L 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 150000002822 niobium compounds Chemical class 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 150000003233 pyrroles Chemical class 0.000 description 2
- 238000005201 scrubbing Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 description 2
- 150000003481 tantalum Chemical class 0.000 description 2
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- OXHNLMTVIGZXSG-UHFFFAOYSA-N 1-Methylpyrrole Chemical compound CN1C=CC=C1 OXHNLMTVIGZXSG-UHFFFAOYSA-N 0.000 description 1
- RPXVPCHYVYRQNW-UHFFFAOYSA-N 1h-indole;quinoline Chemical compound C1=CC=C2NC=CC2=C1.N1=CC=CC2=CC=CC=C21 RPXVPCHYVYRQNW-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 229920006387 Vinylite Polymers 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- AGLSQWBSHDEAHB-UHFFFAOYSA-N azane;boric acid Chemical compound N.OB(O)O AGLSQWBSHDEAHB-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009770 conventional sintering Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 150000002240 furans Chemical class 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001883 metal evaporation Methods 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- AIDQCFHFXWPAFG-UHFFFAOYSA-N n-formylformamide Chemical compound O=CNC=O AIDQCFHFXWPAFG-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000002821 niobium Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920005644 polyethylene terephthalate glycol copolymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- -1 polyoxy benzene Polymers 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- FOWDZVNRQHPXDO-UHFFFAOYSA-N propyl hydrogen carbonate Chemical compound CCCOC(O)=O FOWDZVNRQHPXDO-UHFFFAOYSA-N 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/6261—Milling
- C04B35/6262—Milling of calcined, sintered clinker or ceramics
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/62625—Wet mixtures
- C04B35/6264—Mixing media, e.g. organic solvents
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/52—Constituents or additives characterised by their shapes
- C04B2235/5292—Flakes, platelets or plates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/76—Crystal structural characteristics, e.g. symmetry
- C04B2235/768—Perovskite structure ABO3
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
- C04B2235/787—Oriented grains
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
- C04B2235/788—Aspect ratio of the grains
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
- C04B2235/9607—Thermal properties, e.g. thermal expansion coefficient
- C04B2235/9623—Ceramic setters properties
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Structural Engineering (AREA)
- Powder Metallurgy (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
另一电极(第二电极) | 电极形成方法 | |
试验例7 | 二氧化铅和硫酸铅的混合物(二氧化铅为94质量%) | 在乙酸铅溶液中反复进行氧化反应 |
试验例8 | 四硫代四氮烯的氯醌配合物 | 在左边的化合物溶液中反复浸渍干燥 |
试验例9 | 聚吡咯的芳香族磺酸掺杂剂 | 在吡咯溶液中反复进行氧化反应 |
另一电极(第二电极) | 电极形成方法 | |
试验例25 | 二氧化铅和硫酸铅的混合物(二氧化铅为94质量%) | 在乙酸铅溶液中反复进行氧化反应 |
试验例26 | 四硫代四氮烯的氯醌配合物 | 在左边的化合物溶液中反复浸渍干燥 |
试验例27 | 聚吡咯的芳香族磺酸掺杂剂 | 在吡咯溶液中反复进行氧化反应 |
试验例28 | 二氧化锰 | 反复进行硝酸锰的热分解 |
初期容量C0[μF] | 高温特性评估优级品/试验数 | 粒径[μm] | 一氧化铌结晶含量[质量%] | 一氮化二铌结晶含量[质量%] | |
试验例25 | 230 | 50/50 | 4 | 2.6 | <0.1 |
试验例26 | 200 | 50/50 | 4 | 2.6 | <0.1 |
试验例27 | 200 | 50/50 | 4 | 2.6 | <0.1 |
试验例28 | 220 | 50/50 | 4 | 2.6 | <0.1 |
试验例29 | 230 | 50/50 | 4 | 0.5 | 0.7 |
试验例30 | 160 | 50/50 | 5.5 | <0.1 | 6.3 |
试验例31 | 225 | 50/50 | 4 | 8.3 | <0.1 |
试验例32 | 225 | 50/50 | 4 | 1.3 | 0.35 |
试验例33 | 190 | 50/50 | 4 | 20.5 | <0.1 |
试验例34 | 120 | 50/50 | 5.5 | <0.1 | 21.3 |
试验例35 | 160 | 45/50 | 5.5 | <0.1 | <0.1 |
Claims (14)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3704499 | 1999-02-16 | ||
JP5232099 | 1999-03-01 | ||
JP052320/1999 | 1999-03-01 | ||
JP037044/1999 | 2000-02-16 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2003101161267A Division CN100423143C (zh) | 1999-02-16 | 2000-02-16 | 铌粉烧结体、使用了该烧结体的电容器及其制作方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1294747A true CN1294747A (zh) | 2001-05-09 |
CN1180447C CN1180447C (zh) | 2004-12-15 |
Family
ID=26376145
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2003101161267A Expired - Fee Related CN100423143C (zh) | 1999-02-16 | 2000-02-16 | 铌粉烧结体、使用了该烧结体的电容器及其制作方法 |
CNB008001537A Expired - Fee Related CN1180447C (zh) | 1999-02-16 | 2000-02-16 | 铌粉、铌粉烧结体、使用了该烧结体的电容器及其制作方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2003101161267A Expired - Fee Related CN100423143C (zh) | 1999-02-16 | 2000-02-16 | 铌粉烧结体、使用了该烧结体的电容器及其制作方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20050109430A1 (zh) |
EP (1) | EP1918950B1 (zh) |
CN (2) | CN100423143C (zh) |
TW (1) | TW460883B (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1328409C (zh) * | 2000-05-22 | 2007-07-25 | 卡伯特公司 | 铌溅射靶及其制造方法 |
CN100383900C (zh) * | 2001-05-15 | 2008-04-23 | 昭和电工株式会社 | 一氧化铌粉、一氧化铌烧结体以及使用一氧化铌烧结体的电容器 |
US7713466B2 (en) | 2003-04-28 | 2010-05-11 | Showa Denko K.K. | Valve acting metal sintered body, production method therefor and solid electrolytic capacitor |
US9085468B2 (en) | 2005-06-03 | 2015-07-21 | H. C. Starck Gmbh | Inorganic compounds |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1454330B2 (en) * | 2001-12-10 | 2017-10-04 | Showa Denko K.K. | Niobium alloy, sintered body thereof, and capacitor using the same |
DE502006008478D1 (de) * | 2005-09-16 | 2011-01-20 | Starck H C Gmbh | Reduktionsverfahren |
US9725789B2 (en) * | 2011-06-10 | 2017-08-08 | Kmt Co., Ltd. | Apparatus for manufacturing compound powder, method of manufacturing iron-boron compound powder by using the apparatus, boron alloy powder mixture, method of manufacturing the boron alloy powder mixture, combined powder structure, method of manufacturing the combined powder structure, steel pipe, and method of manufacturing the steel pipe |
CN111009419B (zh) * | 2019-09-26 | 2022-05-10 | 宇启材料科技南通有限公司 | 一种涂层电极箔及制作方法和电解电容器 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1905882A (en) * | 1928-01-20 | 1933-04-25 | Fansteel Prod Co Inc | Metallic columbium and process for making the same |
DE2517180C3 (de) * | 1975-04-18 | 1979-04-19 | Fa. Hermann C. Starck Berlin, 1000 Berlin | Verfahren zur kontinuierlichen Herstellung von feinem hochkapazitiven Erdsäuremetallpulver für Elektrolytkondensatoren |
US4084965A (en) * | 1977-01-05 | 1978-04-18 | Fansteel Inc. | Columbium powder and method of making the same |
US4149876A (en) * | 1978-06-06 | 1979-04-17 | Fansteel Inc. | Process for producing tantalum and columbium powder |
DE3140248C2 (de) * | 1981-10-09 | 1986-06-19 | Hermann C. Starck Berlin, 1000 Berlin | Verwendung von dotiertem Ventilmetallpulver für die Herstellung von Elektrolytkondensatoranoden |
DE3820960A1 (de) * | 1988-06-22 | 1989-12-28 | Starck Hermann C Fa | Feinkoernige hochreine erdsaeuremetallpulver, verfahren zu ihrer herstellung sowie deren verwendung |
US4957541A (en) * | 1988-11-01 | 1990-09-18 | Nrc, Inc. | Capacitor grade tantalum powder |
JP2745875B2 (ja) * | 1991-06-29 | 1998-04-28 | 日本ケミコン株式会社 | 電解コンデンサ用陰極材料 |
US5478673A (en) * | 1992-10-29 | 1995-12-26 | Fuji Photo Film Co., Ltd. | Nonaqueous secondary battery |
US5448447A (en) * | 1993-04-26 | 1995-09-05 | Cabot Corporation | Process for making an improved tantalum powder and high capacitance low leakage electrode made therefrom |
JPH0763045A (ja) | 1993-08-25 | 1995-03-07 | Unisia Jecs Corp | 内燃機関の排気浄化触媒劣化診断装置 |
JP3651489B2 (ja) | 1993-09-12 | 2005-05-25 | 富士通株式会社 | 磁気記録媒体 |
JP3547484B2 (ja) * | 1994-06-21 | 2004-07-28 | ニチコン株式会社 | コンデンサ素子の製造方法 |
US6165623A (en) * | 1996-11-07 | 2000-12-26 | Cabot Corporation | Niobium powders and niobium electrolytic capacitors |
JP3254163B2 (ja) * | 1997-02-28 | 2002-02-04 | 昭和電工株式会社 | コンデンサ |
US6075691A (en) * | 1997-03-06 | 2000-06-13 | Lucent Technologies Inc. | Thin film capacitors and process for making them |
US6171363B1 (en) * | 1998-05-06 | 2001-01-09 | H. C. Starck, Inc. | Method for producing tantallum/niobium metal powders by the reduction of their oxides with gaseous magnesium |
JP3196832B2 (ja) * | 1998-05-15 | 2001-08-06 | 日本電気株式会社 | 固体電解コンデンサ及びその製造方法 |
WO2000049633A1 (fr) * | 1999-02-16 | 2000-08-24 | Showa Denko K.K. | Poudre de niobium, element fritte a base de niobium, condensateur renfermant cet element et procede de fabrication de ce condensateur |
US6605129B1 (en) * | 1999-02-25 | 2003-08-12 | Showa Denko Kabushiki Kaisha | Powdered niobium, sintered body thereof, capacitor using the sintered body and production method of the capacitor |
US6600646B1 (en) * | 1999-08-11 | 2003-07-29 | Showa Denko Kabushiki Kaisha | Niobium powder, sintered body thereof and capacitor using same |
-
2000
- 2000-02-15 TW TW089102529A patent/TW460883B/zh not_active IP Right Cessation
- 2000-02-16 CN CNB2003101161267A patent/CN100423143C/zh not_active Expired - Fee Related
- 2000-02-16 CN CNB008001537A patent/CN1180447C/zh not_active Expired - Fee Related
- 2000-02-16 EP EP08002860.8A patent/EP1918950B1/en not_active Expired - Lifetime
-
2004
- 2004-11-09 US US10/983,612 patent/US20050109430A1/en not_active Abandoned
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1328409C (zh) * | 2000-05-22 | 2007-07-25 | 卡伯特公司 | 铌溅射靶及其制造方法 |
CN100383900C (zh) * | 2001-05-15 | 2008-04-23 | 昭和电工株式会社 | 一氧化铌粉、一氧化铌烧结体以及使用一氧化铌烧结体的电容器 |
CN101866754A (zh) * | 2001-05-15 | 2010-10-20 | 昭和电工株式会社 | 电容器电极、电容器及其生产方法、电子电路及电子仪器 |
CN1526028B (zh) * | 2001-05-15 | 2011-10-12 | 昭和电工株式会社 | 铌粉、铌烧结体和使用该烧结体的电容器 |
CN103219156A (zh) * | 2001-05-15 | 2013-07-24 | 昭和电工株式会社 | 电容器电极、电容器及其生产方法、电子电路及电子仪器 |
CN101866754B (zh) * | 2001-05-15 | 2014-02-26 | 昭和电工株式会社 | 电容器电极、电容器及其生产方法、电子电路及电子仪器 |
CN103219156B (zh) * | 2001-05-15 | 2017-04-26 | 昭和电工株式会社 | 电容器电极、电容器及其生产方法、电子电路及电子仪器 |
US7713466B2 (en) | 2003-04-28 | 2010-05-11 | Showa Denko K.K. | Valve acting metal sintered body, production method therefor and solid electrolytic capacitor |
CN1813323B (zh) * | 2003-04-28 | 2011-09-14 | 昭和电工株式会社 | 起阀作用的金属的烧结体、其制造方法和固体电解电容器 |
US9085468B2 (en) | 2005-06-03 | 2015-07-21 | H. C. Starck Gmbh | Inorganic compounds |
Also Published As
Publication number | Publication date |
---|---|
EP1918950A3 (en) | 2009-11-25 |
TW460883B (en) | 2001-10-21 |
CN100423143C (zh) | 2008-10-01 |
US20050109430A1 (en) | 2005-05-26 |
CN1549284A (zh) | 2004-11-24 |
EP1918950B1 (en) | 2018-08-08 |
EP1918950A2 (en) | 2008-05-07 |
CN1180447C (zh) | 2004-12-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1046878C (zh) | 一种电容器级钽粉的制造方法 | |
CN1192404C (zh) | 部分氮化的铌粉,制备该铌粉的方法、该铌粉的烧结体,制备该烧结体的方法及电容器 | |
JP4592034B2 (ja) | ニオブ粉、ニオブ焼結体、該焼結体を用いたコンデンサおよびそのコンデンサの製造方法 | |
CN1265919C (zh) | 含氮金属粉末及其制造方法和采用该粉末的多孔质烧结体及固体电解电容器 | |
CN1320104A (zh) | 部分还原某些金属氧化物的方法和脱氧金属氧化物 | |
CN1180101C (zh) | 含氮的钽或铌粉末的制备和固体电解质电容器 | |
CN100339917C (zh) | 铌烧结体及其生产方法以及使用这种铌烧结体的电容器 | |
CN1437753A (zh) | 电容器粉末 | |
CN1474422A (zh) | 电解电容及其制造方法 | |
CN1201349C (zh) | 铌电容器 | |
CN1050562A (zh) | 控制钽材料中氧含量的方法 | |
CN1180447C (zh) | 铌粉、铌粉烧结体、使用了该烧结体的电容器及其制作方法 | |
CN1196552C (zh) | 用于电解电容器的钽烧结体的制造方法 | |
CN1534703A (zh) | 固体电解电容器及其制造方法 | |
CN1463456A (zh) | 一氧化铌粉、一氧化铌烧结体以及使用一氧化铌烧结体的电容器 | |
CN1221994C (zh) | 铌粉、其烧结体和使用该烧结体的电容器 | |
CN1539031A (zh) | 酸土金属的合金构成的金属箔和具备该金属箔的电容器 | |
CN1478287A (zh) | 用于电容器的粉末、其烧结体及使用该烧结体的电容器 | |
CN100338702C (zh) | 电容器用铌粉及其烧结体和使用该烧结体的电容器 | |
CN1486498A (zh) | 铌粉、铌烧结体、铌烧结体的化学改性体以及使用它们的电容器 | |
CN1226112C (zh) | 铌粉、其烧结体和电容器 | |
CN1175442C (zh) | 用于电容器的粉体组合物、使用该组合物的烧结体和使用该烧结体的电容器 | |
CN1509483A (zh) | 用于电容器的铌和使用铌烧结体的电容器 | |
CN1602533A (zh) | 铌合金、其烧结体以及用其制成的电容器 | |
CN1471717A (zh) | 用于电容器的粉、烧结体及使用该烧结体的电容器 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
BB1A | Publication of application | ||
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CI01 | Publication of corrected invention patent application |
Correction item: Priority day Correct: 19990216 False: 20000216 Number: 19 Page: 165 Volume: 17 |
|
CI02 | Correction of invention patent application |
Correction item: Priority day Correct: 19990216 False: 20000216 Number: 19 Page: The title page Volume: 17 |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20041215 Termination date: 20190216 |
|
CF01 | Termination of patent right due to non-payment of annual fee |