CN1240872C - 蒸镀装置 - Google Patents

蒸镀装置 Download PDF

Info

Publication number
CN1240872C
CN1240872C CNB991215710A CN99121571A CN1240872C CN 1240872 C CN1240872 C CN 1240872C CN B991215710 A CNB991215710 A CN B991215710A CN 99121571 A CN99121571 A CN 99121571A CN 1240872 C CN1240872 C CN 1240872C
Authority
CN
China
Prior art keywords
evaporation
container
nozzle tube
coating device
pipeline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB991215710A
Other languages
English (en)
Chinese (zh)
Other versions
CN1251866A (zh
Inventor
G·克莱姆
K·奥伯勒
J·克里斯彻
T·福格特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials GmbH and Co KG
Original Assignee
Applied Films GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Films GmbH and Co KG filed Critical Applied Films GmbH and Co KG
Publication of CN1251866A publication Critical patent/CN1251866A/zh
Application granted granted Critical
Publication of CN1240872C publication Critical patent/CN1240872C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Nozzles (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CNB991215710A 1998-10-20 1999-10-19 蒸镀装置 Expired - Fee Related CN1240872C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19848177.2 1998-10-20
DE19848177A DE19848177A1 (de) 1998-10-20 1998-10-20 Bedampfungsvorrichtung

Publications (2)

Publication Number Publication Date
CN1251866A CN1251866A (zh) 2000-05-03
CN1240872C true CN1240872C (zh) 2006-02-08

Family

ID=7884969

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB991215710A Expired - Fee Related CN1240872C (zh) 1998-10-20 1999-10-19 蒸镀装置

Country Status (6)

Country Link
JP (1) JP4230068B2 (ja)
KR (1) KR100614131B1 (ja)
CN (1) CN1240872C (ja)
DE (1) DE19848177A1 (ja)
GB (1) GB2342929B (ja)
IT (1) IT1313766B1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10128091C1 (de) * 2001-06-11 2002-10-02 Applied Films Gmbh & Co Kg Vorrichtung für die Beschichtung eines flächigen Substrats
DE10330401B3 (de) * 2003-07-04 2005-02-24 Applied Films Gmbh & Co. Kg Verfahren und Vorrichtung zum bereichsweisen Auftragen von Trennmitteln
CN100412226C (zh) * 2004-10-18 2008-08-20 中华映管股份有限公司 等离子体显示器之前基板的制造方法、蒸镀工艺与蒸镀装置
CN100491584C (zh) * 2005-09-22 2009-05-27 中国科学院半导体研究所 不同折射率膜层的制备方法
EP1788113B1 (de) * 2005-10-26 2011-05-11 Applied Materials GmbH & Co. KG Verdampfervorrichtung mit einem Behälter für die Aufnahme von zu verdampfendem Material
ATE520799T1 (de) * 2005-10-26 2011-09-15 Applied Materials Gmbh & Co Kg Vorrichtung zum bedampfen von substraten
DE102008026001B4 (de) * 2007-09-04 2012-02-16 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Erzeugung und Bearbeitung von Schichten auf Substraten unter definierter Prozessatmosphäre und Heizelement
US20100282167A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
WO2011065999A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
TW201118961A (en) * 2009-11-30 2011-06-01 Veeco Instr Inc Linear deposition source
FR2956412B1 (fr) * 2010-02-16 2012-04-06 Astron Fiamm Safety Vanne d'obturation a volume constant d'une source de depot en phase vapeur
TWI600470B (zh) * 2016-05-19 2017-10-01 康廷 熊 鍍膜裝置及方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3922187A1 (de) * 1989-07-06 1991-01-17 Leybold Ag Vorrichtung zum herstellen von metallfreien streifen bei im vakuum beschichteten folienbahnen, insbesondere fuer kondensatoren
DE4309717C2 (de) * 1993-03-25 2002-03-28 Unaxis Deutschland Holding Verfahren zum Aufdampfen einer Schicht
US5863336A (en) * 1996-04-08 1999-01-26 General Electric Company Apparatus for fabrication of superconductor

Also Published As

Publication number Publication date
ITMI992081A1 (it) 2001-04-06
CN1251866A (zh) 2000-05-03
JP2000129429A (ja) 2000-05-09
GB9924608D0 (en) 1999-12-22
GB2342929B (en) 2003-05-21
DE19848177A1 (de) 2000-04-27
JP4230068B2 (ja) 2009-02-25
IT1313766B1 (it) 2002-09-17
GB2342929A (en) 2000-04-26
KR100614131B1 (ko) 2006-08-22
KR20000028990A (ko) 2000-05-25
ITMI992081A0 (it) 1999-10-06

Similar Documents

Publication Publication Date Title
CN1240872C (zh) 蒸镀装置
EP1320636B9 (de) Verfahren und vorrichtung zum abscheiden insbesondere organischer schichten im wege der ovpd
DE69523226T2 (de) Verfahren und vorrichtung für die beschichtung von hohlen behältern mit inerter oder undurchlässiger innenfläche hergestellt durch plasmaunterstützte beschichtung mit einer hauptsächlich anorganischen substanz
US5480488A (en) Apparatus for supplying CVD coating devices
DE10005820C1 (de) Gasversorungsvorrichtung für Precursoren geringen Dampfdrucks
EP1970474B1 (de) Bedampfungseinrichtung zur Molekularstrahlbedampfung und Molekularstrahlepitaxie
EP1255876A2 (de) Kondensationsbeschichtungsverfahren
DE102007056121B3 (de) Breitschlitzdüse und Anlage zum Beschichten mit thermoplastischem Beschichtungsmaterial
EP2087145B1 (de) Vakuumbeschichtungsverfahren und anordnung zur durchführung des verfahrens
CN112538604B (zh) 一种真空镀膜补液和稳定金属蒸汽供应量的装置及其方法
WO2008116526A2 (de) Freistrahlfüllsystem mit wägeeinheit
BR112017015443B1 (pt) Dispositivo para gerar vapor d'água, aparelho gerador de vapor d'água, e método de coleta de incrustação em um dispositivo para gerar vapor d'água
US3379171A (en) Release agent coating apparatus
MXPA00000740A (es) Proceso para preparar un catalizador esferico para polimerizacion de alfa-olefinas.
US7899308B2 (en) Evaporation device with receptacle for receiving material to be evaporated
CN1084819A (zh) 分配液体制冷剂的装置和方法
CN85108596A (zh) 锡的蒸法镀敷
CN1325693C (zh) 局部涂覆分离剂的方法和装置
JP2653492B2 (ja) 高分子熱可塑性物質の液化のための装置
KR20030059263A (ko) 소유량 액체의 계량공급방법 및 장치
DE4442733C2 (de) Einrichtung zur Bedampfung bandförmiger Substrate im Vakuum
US2665944A (en) Instantaneous coating material heating unit
KR100833014B1 (ko) 합금 증착용 증발 장치
NO820132L (no) Overflatespenningskjele
DE4024181C1 (en) Vapour phase soldering installation - has valve in by=pass opening in dependence on preset temp. of sec. medium in soldering tank

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG

Free format text: FORMER OWNER: LEYBOLD AG

Effective date: 20020906

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20020906

Address after: Federal Republic of Germany, Kazakhstan

Applicant after: Balzers Und Leybold Deutschland Holding AG

Address before: Federal Republic of Germany, Kazakhstan

Applicant before: Leybold Systems GmbH

ASS Succession or assignment of patent right

Owner name: BAOERZESI PROCESS SYSTEMS CO.LTD.

Free format text: FORMER OWNER: BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG

Effective date: 20020906

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20020906

Address after: Federal Republic of Germany, Kazakhstan

Applicant after: Bauer Ze J process systems, Limited by Share Ltd

Address before: Federal Republic of Germany, Kazakhstan

Applicant before: Balzers Und Leybold Deutschland Holding AG

ASS Succession or assignment of patent right

Owner name: LEIPOLD PAINT LIMITED PARTNERSHIP

Free format text: FORMER OWNER: BAOERZESI PROCESS SYSTEMS CO.LTD.

Effective date: 20020906

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20020906

Address after: Federal Republic of Germany

Applicant after: Laborde paint Co Ltd

Address before: Federal Republic of Germany, Kazakhstan

Applicant before: Bauer Ze J process systems, Limited by Share Ltd

C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: APPLIED MATERIALS SHARES LIMITED PARTNERSHIP

Free format text: FORMER NAME OR ADDRESS: APPLIED PHILIN GMBH + CO. KG

CP03 Change of name, title or address

Address after: In Germany

Patentee after: Applied Films GmbH & Co. KG

Address before: Federal Republic of Germany

Patentee before: Applied Films GmbH & Co. KG

C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060208

Termination date: 20091119