CN1240872C - Vapor deposition apparatus - Google Patents

Vapor deposition apparatus Download PDF

Info

Publication number
CN1240872C
CN1240872C CNB991215710A CN99121571A CN1240872C CN 1240872 C CN1240872 C CN 1240872C CN B991215710 A CNB991215710 A CN B991215710A CN 99121571 A CN99121571 A CN 99121571A CN 1240872 C CN1240872 C CN 1240872C
Authority
CN
China
Prior art keywords
evaporation
container
nozzle tube
coating device
pipeline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB991215710A
Other languages
Chinese (zh)
Other versions
CN1251866A (en
Inventor
G·克莱姆
K·奥伯勒
J·克里斯彻
T·福格特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials GmbH and Co KG
Original Assignee
Applied Films GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Films GmbH and Co KG filed Critical Applied Films GmbH and Co KG
Publication of CN1251866A publication Critical patent/CN1251866A/en
Application granted granted Critical
Publication of CN1240872C publication Critical patent/CN1240872C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physical Vapour Deposition (AREA)
  • Nozzles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

A vaporsation device, for vapour depositing a release agent strip in the form of longitudinal strips on a film 8 in a film coating plant, has an evaporation vessel 1 heated with an electric heater 5 for the release agent and a jet body 3 with outlet openings 7 for directing the produced release agent vapour against the film 8. The jet body 3 is designed as a closed hollow body, and the evaporation vessel 1 is connected in a lockable manner to the jet body 3 by means of a shut-off device 4.

Description

Evaporation coating device
Technical field
The present invention relates to a kind of in film plated equipment on evaporation on the film evaporation coating device of the separating agent bar of elongate in shape, it has the separating agent container for evaporation of an electricity consumption heater heats and one and has the nozzle tube of the separating agent steam that is produced being guided into the spout of film.
Background technology
A kind of evaporation coating device of prior art is the theme of DE4309717.The described evaporation coating device of this document is made of a cylinder that keeps flat as container for evaporation, and it has the crack on the side of film, and described crack is covered by a nozzle tube that is designed to the pressing plate form.Transmit film to be deposited along this pressing plate.Therefore, container for evaporation length must be the same with thin-film width at least.For especially volume is standby in order to pack new one into when treating that the plating film was filled plating equipment originally just again must additional separating agent, then design the container for evaporation volume so big, so that the storage separating agent that is stored in the container is enough.
The shortcoming of this known evaporation coating device is, because container for evaporation has a large amount of storage separating agents, thereby has to no avail evaporated many separating agents when filling container and subsequently plating equipment being found time, and has wet equipment unit by condensation.To consider that in this case because of the pressure that reduces reduces, therefore when correspondingly not weakening the heating of container for evaporation, steam output has increased the separating agent boiling temperature when finding time.This is because the evaporation coating device volume greatly and in practice may be fast inadequately.Another shortcoming of known evaporation coating device is, the heating period of evaporation coating device is many and evaporation coating device is bulky undesirably long slowly because of storing separating agent, and work as a result setup time is correspondingly long slowly.
Summary of the invention
Task of the present invention is so to design the evaporation coating device of the above-mentioned type, and promptly the separating agent loss is low as much as possible in plating equipment perfusion and when finding time, and makes the evaporation coating device work of getting ready as far as possible apace.
According to the present invention, for addressing these problems a kind of evaporation coating device that is used for becoming on evaporation on the film at film plated equipment the separating agent bar of elongate in shape has been proposed, it has separating agent container for evaporation and the nozzle tube with spout of the separating agent steam alignment thin film that will be produced of an electricity consumption heater heats, wherein, nozzle tube is designed to hollow body, container for evaporation can link to each other with nozzle tube by a cut-off equipment with blocking, the cylinder that nozzle tube is designed to keep flat, container for evaporation links to each other with nozzle tube by a pipeline with cut-off equipment, and nozzle tube has a row successive, spout along the length distribution of nozzle tube.
Owing to according to the present invention container for evaporation being linked to each other with nozzle tube with blocking and it being designed to individual member, so if do not need the film condensation steam, then people can reliably stop steam to flow out evaporation coating device in the cost lowland.Therefore, people can perfusion and prevent find time plating equipment the time steam flow into equipment and thereby be condensate on the environment division, can obviously be reduced in the separating agent consumption in the plating process thus.Spatially separately container for evaporation and nozzle tube have prevented that separating agent fog or other filths from appearing on the film by uncontrolled condensation.In addition, people can make evaporation coating device remain the preparation work state by continuous heating evaporation container.When reinstating equipment, in order to make the pending film of steam flow following closely, people only need open cut-off equipment just.Evaporation coating device of the present invention is particularly useful for producing capacitor foil.The separating agent of replacement plating strip on film, people are equipped with a common print seat can also for the container for evaporation that can block, so that giving separating agent on the coating surface that vertically interrupts on the film.A kind of layout with container for evaporation and print seat has so for example illustrated in DE4311581.Because ground has separated container for evaporation and nozzle tube according to the present invention, so container for evaporation does not need to have the width for the treatment of the plating film.Therefore, it can be that volume is especially little, can change rate of evaporation fast according to the processing condition that change such as the fluctuation of metallic vapor ratio or film speed fluctuation thus.People for example can accurately regulate the width of plating separating agent bar by changing the container for evaporation temperature by the present invention.
If the cylinder that nozzle tube is designed to keep flat then can consistently design nozzle tube with present container for evaporation shell.
When another improvement project according to the present invention was arranged in container for evaporation below the nozzle tube and connects nozzle tube and container for evaporation by a pipeline with shut off valve, people can be used for appointment the shut off valve of pipeline as cut-off equipment.Even such line blind valve (it is present in the plating equipment in the course of the work) under high vacuum also can be worked reliably.
Container for evaporation can be that volume is especially little, links to each other with container for evaporation so that when going into the parting liquid after-teeming in the container for evaporation when a storage vessel that parting liquid is housed thus, and the power regulation of evaporation coating device can be made a response especially apace.
When storage vessel linked to each other with container for evaporation with a pressure compensation pipeline by an after-teeming pipeline, the parting liquid after-teeming of container for evaporation can be carried out when equipment work.
When being positioned to by an improvement storage vessel of the present invention when being higher than container for evaporation and a shut off valve and being arranged in the after-teeming pipeline, parting liquid replenishes and can only just can realize by opening shut off valve as requested, and without the forced conveyance parting liquid.
With storage vessel with container for evaporation is arranged on the sustained height and after-teeming pipeline when being permanent open, fluid infusion need not be operated shut off valve ground and also can carry out continuously when according to another embodiment of the invention.
When spout has rectangular cross section, evaporation coating device few especially with oil.In addition, treating to have formed less excess oil and good especially plating district rib cutting edge of a knife or a sword on the film of plating by such nozzle configuration.
Nozzle tube has an electricradiator, can avoid vapor condensation simply in nozzle tube thus.
Description of drawings
The present invention allows various embodiment.In order to go on to say principle of the present invention, be schematically shown in the accompanying drawings wherein two embodiment and described hereinafter, wherein:
Fig. 1 is the skeleton view of evaporation coating device of the present invention;
Fig. 2 is the side-view of second embodiment of evaporation coating device.
Embodiment
Evaporation coating device shown in Figure 1 has a container for evaporation 1, and it links to each other with nozzle tube 3 by a pipeline 2.In pipeline 2, be connected into a cut-off equipment 4, can have prevented that thus steam from flowing into nozzle tube 3 from container for evaporation 1.
Container for evaporation 1 has an electric heater 5 and for attemperation with and then regulate the separating agent rate and have a temp probe 6.
Nozzle tube 3 surface thereon has a row successive and the rectangular spout 7 of cross section, and separating agent steam flows to the film 8 shown in the dotted line by this spout and formed on film along the bar of film 8 longitudinal extensions by condensation.This is not coated with metal in plating process subsequently, also prevented metal deposition thus because separating agent evaporates in the plating process.As shown in the figure, film 8 contacts nozzle tube 3 and holds nozzle tube by an one very little periphery district in spout 7 zones.In order to heat nozzle tube 3, can make electric current its shell of flowing through.But also can indirect heating nozzle tube 3, this be for fear of the vapour condensation that flows into nozzle tube in nozzle tube 3.
Container for evaporation 1 can be designed to big volumetrical container, thereby will charge into the enough at least material amounts of once wanting plating in the work period of storage separating agent in the container.But, heated an and storage vessel 9 that be filled with parting liquid also can be set, it links to each other with container for evaporation 1 by after-teeming pipeline 10.In the embodiment shown in fig. 1, in after-teeming pipeline 10, insert a shut off valve 11.Seal storage vessel 9 airtightly, but it links to each other with container for evaporation 1 upper side by a pressure compensation pipeline 12 above its parting liquid liquid level.People arrange storage vessel 9 to such an extent that be higher than container for evaporation 1, and therefore, parting liquid flows out storage vessel 9 and flows into container for evaporation 1 after opening shut off valve 11.Storage vessel 9 allows to have seldom the container for evaporation 1 of parting liquid and still works and allow parting liquid to flow into container for evaporation 1 subsequently in the course of the work.
In the embodiment of Fig. 2, container for evaporation 1 and storage vessel 9 are on the sustained height.Therefore, people can save the shut off valve in the after-teeming pipeline 10.The samely, pressure compensation pipeline 12 is always opened in the above-described embodiments.Liquid levels is always the same high in container for evaporation 1 and storage vessel 9 by after-teeming pipeline 10.Do not need to heat all parting liquids in order to change rate of evaporation, as long as a small amount of parting liquid more or less in the heating evaporation container 1.
The Reference numeral list
The 1-container for evaporation; The 2-pipeline; The 3-nozzle tube; The 4-cut-off equipment; The 5-heater; The 6-temperature is visited Head; The 7-spout; The 8-film; 9-stores container; 10-after-teeming pipeline; The 11-shutoff valve; 12-presses The force compensating pipeline;

Claims (8)

1. evaporation coating device that is used on evaporation on the film, becoming the separating agent bar of elongate in shape at film plated equipment, it has separating agent container for evaporation and the nozzle tube with spout of the separating agent steam alignment thin film that will be produced of an electricity consumption heater heats, it is characterized in that, nozzle tube (3) is designed to hollow body, container for evaporation (1) can link to each other with nozzle tube (3) by a cut-off equipment (4) with blocking, the cylinder that nozzle tube (3) is designed to keep flat, container for evaporation (1) links to each other with nozzle tube (3) by a pipeline (2) with cut-off equipment (4), and nozzle tube (3) has a row successive, spout (7) along the length distribution of nozzle tube (3).
2. evaporation coating device as claimed in claim 1 is characterized in that, container for evaporation (1) is arranged in below the nozzle tube (3).
3. evaporation coating device as claimed in claim 1 or 2 is characterized in that, the storage vessel (9) that parting liquid is housed links to each other so that the parting liquid after-teeming is gone in the container for evaporation (1) with container for evaporation (1).
4. evaporation coating device as claimed in claim 3 is characterized in that, storage vessel (9) links to each other with container for evaporation (1) with a pressure compensation pipeline (12) by an after-teeming pipeline (10).
5. evaporation coating device as claimed in claim 4 is characterized in that, storage vessel (9) is arranged to such an extent that be higher than container for evaporation (1), and a shut off valve is arranged in after-teeming pipeline (10).
6. evaporation coating device as claimed in claim 4 is characterized in that, storage vessel (9) and container for evaporation (1) are arranged on the sustained height and after-teeming pipeline (10) is permanent open.
7. evaporation coating device as claimed in claim 1 or 2 is characterized in that, spout (7) has rectangular cross section.
8. evaporation coating device as claimed in claim 1 or 2 is characterized in that, nozzle tube (3) has an electricradiator.
CNB991215710A 1998-10-20 1999-10-19 Vapor deposition apparatus Expired - Fee Related CN1240872C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19848177.2 1998-10-20
DE19848177A DE19848177A1 (en) 1998-10-20 1998-10-20 Vapor deposition of release agent for capacitor film has a closed hollow body evaporation vessel connected to the jet body with a shut off device

Publications (2)

Publication Number Publication Date
CN1251866A CN1251866A (en) 2000-05-03
CN1240872C true CN1240872C (en) 2006-02-08

Family

ID=7884969

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB991215710A Expired - Fee Related CN1240872C (en) 1998-10-20 1999-10-19 Vapor deposition apparatus

Country Status (6)

Country Link
JP (1) JP4230068B2 (en)
KR (1) KR100614131B1 (en)
CN (1) CN1240872C (en)
DE (1) DE19848177A1 (en)
GB (1) GB2342929B (en)
IT (1) IT1313766B1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10128091C1 (en) * 2001-06-11 2002-10-02 Applied Films Gmbh & Co Kg Device for coating a flat substrate used in the production of flat TV screens with organic illuminating diodes comprises a fixed vaporizer source for vaporizing materials
DE10330401B3 (en) * 2003-07-04 2005-02-24 Applied Films Gmbh & Co. Kg Method and device for the area-wise application of release agents
CN100412226C (en) * 2004-10-18 2008-08-20 中华映管股份有限公司 Method for manufacturing front substrate of plasma display, vapor deposition process and apparatus therefor
CN100491584C (en) * 2005-09-22 2009-05-27 中国科学院半导体研究所 Method for preparing different refractivity film layer
ATE520799T1 (en) * 2005-10-26 2011-09-15 Applied Materials Gmbh & Co Kg DEVICE FOR STEAMING SUBSTRATES
ATE509131T1 (en) 2005-10-26 2011-05-15 Applied Materials Gmbh & Co Kg EVAPORATOR DEVICE WITH A CONTAINER FOR RECEIVING MATERIAL TO BE EVAPORATED
DE102008026001B4 (en) * 2007-09-04 2012-02-16 Von Ardenne Anlagentechnik Gmbh Method and device for producing and processing layers on substrates under a defined process atmosphere and heating element
WO2011065999A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
KR20120101425A (en) * 2009-11-30 2012-09-13 비코 인스트루먼츠 인코포레이티드 Linear deposition source
FR2956412B1 (en) * 2010-02-16 2012-04-06 Astron Fiamm Safety CONSTANT VOLUME SHUT-OFF VALVE OF A VAPOR PHASE DEPOSITION SOURCE
TWI600470B (en) * 2016-05-19 2017-10-01 康廷 熊 Coating apparatus and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3922187A1 (en) * 1989-07-06 1991-01-17 Leybold Ag DEVICE FOR PRODUCING METAL-FREE STRIPS ON FILM COATS COATED IN A VACUUM, IN PARTICULAR FOR CAPACITORS
DE4309717C2 (en) * 1993-03-25 2002-03-28 Unaxis Deutschland Holding Process for evaporating a layer
US5863336A (en) * 1996-04-08 1999-01-26 General Electric Company Apparatus for fabrication of superconductor

Also Published As

Publication number Publication date
ITMI992081A1 (en) 2001-04-06
GB2342929A (en) 2000-04-26
CN1251866A (en) 2000-05-03
KR100614131B1 (en) 2006-08-22
DE19848177A1 (en) 2000-04-27
JP4230068B2 (en) 2009-02-25
JP2000129429A (en) 2000-05-09
ITMI992081A0 (en) 1999-10-06
GB9924608D0 (en) 1999-12-22
IT1313766B1 (en) 2002-09-17
GB2342929B (en) 2003-05-21
KR20000028990A (en) 2000-05-25

Similar Documents

Publication Publication Date Title
CN1240872C (en) Vapor deposition apparatus
EP1255876B1 (en) Condensation coating method
DE3503160C2 (en)
US5480488A (en) Apparatus for supplying CVD coating devices
EP1264002B1 (en) Gas supply device for precursors with a low vapor pressure
EP1970474B1 (en) Vaporisation device for molecular beam vaporisation and molecular beam epitaxy
DE10048759A1 (en) Method and device for separating organic layers in particular by means of OVPD
CN1209041A (en) Coffee kettle
DE60220573T2 (en) Pumping system and method for pumping liquids
EP2087145B1 (en) Vacuum coating method, and arrangement for carrying out said method
US5029553A (en) Apparatus for providing a uniform coating on a continuous horizontally moving metal strip
BR112017015443B1 (en) WATER STEAM GENERATING DEVICE, WATER STEAM GENERATING APPARATUS, AND INCRUSTATION COLLECTION METHOD IN A WATER STEAM GENERATING DEVICE
MXPA00000740A (en) Process for preparing a ziegler-type spherical catalyst for alpha-olefin polymerization process.
DE69631713T2 (en) Dispensing device for a cryogen
CN1084819A (en) The apparatus and method of dispense liquid refrigerant
DE102010060292A1 (en) Method and apparatus for continuous coating of substrates
CN85108596A (en) The vapo(u)r-deposition of tin
CN1325693C (en) Process and apparatus for the localized deposition of release agents
JP2653492B2 (en) Equipment for liquefaction of polymeric thermoplastics.
KR20030059263A (en) Method and device for the metered delivery of low volumetric flows of liquid
DE102004041855B4 (en) Apparatus and method for continuous thermal vacuum coating
DE4442733C2 (en) Device for the vapor deposition of ribbon-shaped substrates in a vacuum
US2665944A (en) Instantaneous coating material heating unit
NO820132L (en) SURFACE TENSION BOILER
DE4024181C1 (en) Vapour phase soldering installation - has valve in by=pass opening in dependence on preset temp. of sec. medium in soldering tank

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG

Free format text: FORMER OWNER: LEYBOLD AG

Effective date: 20020906

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20020906

Address after: Federal Republic of Germany, Kazakhstan

Applicant after: Balzers Und Leybold Deutschland Holding AG

Address before: Federal Republic of Germany, Kazakhstan

Applicant before: Leybold Systems GmbH

ASS Succession or assignment of patent right

Owner name: BAOERZESI PROCESS SYSTEMS CO.LTD.

Free format text: FORMER OWNER: BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG

Effective date: 20020906

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20020906

Address after: Federal Republic of Germany, Kazakhstan

Applicant after: Bauer Ze J process systems, Limited by Share Ltd

Address before: Federal Republic of Germany, Kazakhstan

Applicant before: Balzers Und Leybold Deutschland Holding AG

ASS Succession or assignment of patent right

Owner name: LEIPOLD PAINT LIMITED PARTNERSHIP

Free format text: FORMER OWNER: BAOERZESI PROCESS SYSTEMS CO.LTD.

Effective date: 20020906

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20020906

Address after: Federal Republic of Germany

Applicant after: Laborde paint Co Ltd

Address before: Federal Republic of Germany, Kazakhstan

Applicant before: Bauer Ze J process systems, Limited by Share Ltd

C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: APPLIED MATERIALS SHARES LIMITED PARTNERSHIP

Free format text: FORMER NAME OR ADDRESS: APPLIED PHILIN GMBH + CO. KG

CP03 Change of name, title or address

Address after: In Germany

Patentee after: Applied Films GmbH & Co. KG

Address before: Federal Republic of Germany

Patentee before: Applied Films GmbH & Co. KG

C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060208

Termination date: 20091119