CN1240872C - Vapor deposition apparatus - Google Patents
Vapor deposition apparatus Download PDFInfo
- Publication number
- CN1240872C CN1240872C CNB991215710A CN99121571A CN1240872C CN 1240872 C CN1240872 C CN 1240872C CN B991215710 A CNB991215710 A CN B991215710A CN 99121571 A CN99121571 A CN 99121571A CN 1240872 C CN1240872 C CN 1240872C
- Authority
- CN
- China
- Prior art keywords
- evaporation
- container
- nozzle tube
- coating device
- pipeline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007740 vapor deposition Methods 0.000 title 1
- 230000008020 evaporation Effects 0.000 claims abstract description 85
- 238000001704 evaporation Methods 0.000 claims abstract description 85
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 28
- 239000011248 coating agent Substances 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 29
- 239000010408 film Substances 0.000 claims description 23
- 238000003860 storage Methods 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 16
- 230000000903 blocking effect Effects 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 3
- 230000002459 sustained effect Effects 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 238000009826 distribution Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 abstract 1
- 239000007888 film coating Substances 0.000 abstract 1
- 238000009501 film coating Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 description 15
- 238000009833 condensation Methods 0.000 description 6
- 230000005494 condensation Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 230000010412 perfusion Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000009835 boiling Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physical Vapour Deposition (AREA)
- Nozzles (AREA)
- Chemical Vapour Deposition (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
Claims (8)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19848177.2 | 1998-10-20 | ||
DE19848177A DE19848177A1 (en) | 1998-10-20 | 1998-10-20 | Vapor deposition of release agent for capacitor film has a closed hollow body evaporation vessel connected to the jet body with a shut off device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1251866A CN1251866A (en) | 2000-05-03 |
CN1240872C true CN1240872C (en) | 2006-02-08 |
Family
ID=7884969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB991215710A Expired - Fee Related CN1240872C (en) | 1998-10-20 | 1999-10-19 | Vapor deposition apparatus |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP4230068B2 (en) |
KR (1) | KR100614131B1 (en) |
CN (1) | CN1240872C (en) |
DE (1) | DE19848177A1 (en) |
GB (1) | GB2342929B (en) |
IT (1) | IT1313766B1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10128091C1 (en) * | 2001-06-11 | 2002-10-02 | Applied Films Gmbh & Co Kg | Device for coating a flat substrate used in the production of flat TV screens with organic illuminating diodes comprises a fixed vaporizer source for vaporizing materials |
DE10330401B3 (en) * | 2003-07-04 | 2005-02-24 | Applied Films Gmbh & Co. Kg | Method and device for the area-wise application of release agents |
CN100412226C (en) * | 2004-10-18 | 2008-08-20 | 中华映管股份有限公司 | Method for manufacturing front substrate of plasma display, vapor deposition process and apparatus therefor |
CN100491584C (en) * | 2005-09-22 | 2009-05-27 | 中国科学院半导体研究所 | Method for preparing different refractivity film layer |
ATE520799T1 (en) * | 2005-10-26 | 2011-09-15 | Applied Materials Gmbh & Co Kg | DEVICE FOR STEAMING SUBSTRATES |
ATE509131T1 (en) | 2005-10-26 | 2011-05-15 | Applied Materials Gmbh & Co Kg | EVAPORATOR DEVICE WITH A CONTAINER FOR RECEIVING MATERIAL TO BE EVAPORATED |
DE102008026001B4 (en) * | 2007-09-04 | 2012-02-16 | Von Ardenne Anlagentechnik Gmbh | Method and device for producing and processing layers on substrates under a defined process atmosphere and heating element |
WO2011065999A1 (en) * | 2008-12-18 | 2011-06-03 | Veeco Instruments Inc. | Linear deposition source |
WO2011065998A1 (en) * | 2008-12-18 | 2011-06-03 | Veeco Instruments Inc. | Linear deposition source |
KR20120101425A (en) * | 2009-11-30 | 2012-09-13 | 비코 인스트루먼츠 인코포레이티드 | Linear deposition source |
FR2956412B1 (en) * | 2010-02-16 | 2012-04-06 | Astron Fiamm Safety | CONSTANT VOLUME SHUT-OFF VALVE OF A VAPOR PHASE DEPOSITION SOURCE |
TWI600470B (en) * | 2016-05-19 | 2017-10-01 | 康廷 熊 | Coating apparatus and method |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3922187A1 (en) * | 1989-07-06 | 1991-01-17 | Leybold Ag | DEVICE FOR PRODUCING METAL-FREE STRIPS ON FILM COATS COATED IN A VACUUM, IN PARTICULAR FOR CAPACITORS |
DE4309717C2 (en) * | 1993-03-25 | 2002-03-28 | Unaxis Deutschland Holding | Process for evaporating a layer |
US5863336A (en) * | 1996-04-08 | 1999-01-26 | General Electric Company | Apparatus for fabrication of superconductor |
-
1998
- 1998-10-20 DE DE19848177A patent/DE19848177A1/en not_active Withdrawn
-
1999
- 1999-10-06 IT IT1999MI002081A patent/IT1313766B1/en active
- 1999-10-12 KR KR1019990043933A patent/KR100614131B1/en not_active IP Right Cessation
- 1999-10-18 GB GB9924608A patent/GB2342929B/en not_active Expired - Lifetime
- 1999-10-18 JP JP29559499A patent/JP4230068B2/en not_active Expired - Fee Related
- 1999-10-19 CN CNB991215710A patent/CN1240872C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
ITMI992081A1 (en) | 2001-04-06 |
GB2342929A (en) | 2000-04-26 |
CN1251866A (en) | 2000-05-03 |
KR100614131B1 (en) | 2006-08-22 |
DE19848177A1 (en) | 2000-04-27 |
JP4230068B2 (en) | 2009-02-25 |
JP2000129429A (en) | 2000-05-09 |
ITMI992081A0 (en) | 1999-10-06 |
GB9924608D0 (en) | 1999-12-22 |
IT1313766B1 (en) | 2002-09-17 |
GB2342929B (en) | 2003-05-21 |
KR20000028990A (en) | 2000-05-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG Free format text: FORMER OWNER: LEYBOLD AG Effective date: 20020906 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20020906 Address after: Federal Republic of Germany, Kazakhstan Applicant after: Balzers Und Leybold Deutschland Holding AG Address before: Federal Republic of Germany, Kazakhstan Applicant before: Leybold Systems GmbH |
|
ASS | Succession or assignment of patent right |
Owner name: BAOERZESI PROCESS SYSTEMS CO.LTD. Free format text: FORMER OWNER: BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG Effective date: 20020906 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20020906 Address after: Federal Republic of Germany, Kazakhstan Applicant after: Bauer Ze J process systems, Limited by Share Ltd Address before: Federal Republic of Germany, Kazakhstan Applicant before: Balzers Und Leybold Deutschland Holding AG |
|
ASS | Succession or assignment of patent right |
Owner name: LEIPOLD PAINT LIMITED PARTNERSHIP Free format text: FORMER OWNER: BAOERZESI PROCESS SYSTEMS CO.LTD. Effective date: 20020906 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20020906 Address after: Federal Republic of Germany Applicant after: Laborde paint Co Ltd Address before: Federal Republic of Germany, Kazakhstan Applicant before: Bauer Ze J process systems, Limited by Share Ltd |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: APPLIED MATERIALS SHARES LIMITED PARTNERSHIP Free format text: FORMER NAME OR ADDRESS: APPLIED PHILIN GMBH + CO. KG |
|
CP03 | Change of name, title or address |
Address after: In Germany Patentee after: Applied Films GmbH & Co. KG Address before: Federal Republic of Germany Patentee before: Applied Films GmbH & Co. KG |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060208 Termination date: 20091119 |