CN1215094C - 有机抗反射涂料及其制备 - Google Patents

有机抗反射涂料及其制备 Download PDF

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Publication number
CN1215094C
CN1215094C CNB991263812A CN99126381A CN1215094C CN 1215094 C CN1215094 C CN 1215094C CN B991263812 A CNB991263812 A CN B991263812A CN 99126381 A CN99126381 A CN 99126381A CN 1215094 C CN1215094 C CN 1215094C
Authority
CN
China
Prior art keywords
anthracene
hydrogen
chemical formula
polymkeric substance
vinylformic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB991263812A
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English (en)
Chinese (zh)
Other versions
CN1271720A (zh
Inventor
郑旼镐
洪圣恩
白基镐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
Hyundai Electronics Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Industries Co Ltd filed Critical Hyundai Electronics Industries Co Ltd
Publication of CN1271720A publication Critical patent/CN1271720A/zh
Application granted granted Critical
Publication of CN1215094C publication Critical patent/CN1215094C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/12Esters of monohydric alcohols or phenols
    • C08F20/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/017Esters of hydroxy compounds having the esterified hydroxy group bound to a carbon atom of a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54Acrylic acid esters; Methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/02Ortho- or ortho- and peri-condensed systems
    • C07C2603/04Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/24Anthracenes; Hydrogenated anthracenes
CNB991263812A 1999-04-23 1999-12-15 有机抗反射涂料及其制备 Expired - Fee Related CN1215094C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR14763/1999 1999-04-23
KR10-1999-0014763A KR100395904B1 (ko) 1999-04-23 1999-04-23 유기 반사방지 중합체 및 그의 제조방법

Publications (2)

Publication Number Publication Date
CN1271720A CN1271720A (zh) 2000-11-01
CN1215094C true CN1215094C (zh) 2005-08-17

Family

ID=19582078

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB991263812A Expired - Fee Related CN1215094C (zh) 1999-04-23 1999-12-15 有机抗反射涂料及其制备

Country Status (10)

Country Link
US (2) US6368768B1 (US06368768-20020409-C00052.png)
JP (1) JP3851476B2 (US06368768-20020409-C00052.png)
KR (1) KR100395904B1 (US06368768-20020409-C00052.png)
CN (1) CN1215094C (US06368768-20020409-C00052.png)
DE (2) DE19962784A1 (US06368768-20020409-C00052.png)
FR (4) FR2792633B1 (US06368768-20020409-C00052.png)
GB (1) GB2349148B (US06368768-20020409-C00052.png)
IT (1) IT1308674B1 (US06368768-20020409-C00052.png)
NL (1) NL1014997C2 (US06368768-20020409-C00052.png)
TW (1) TW546318B (US06368768-20020409-C00052.png)

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US6605394B2 (en) 2001-05-03 2003-08-12 Applied Materials, Inc. Organic bottom antireflective coating for high performance mask making using optical imaging
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KR100351459B1 (ko) * 2001-05-30 2002-09-05 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
KR100351458B1 (ko) * 2001-05-30 2002-09-05 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
US6703169B2 (en) 2001-07-23 2004-03-09 Applied Materials, Inc. Method of preparing optically imaged high performance photomasks
JP2004206082A (ja) * 2002-11-20 2004-07-22 Rohm & Haas Electronic Materials Llc 多層フォトレジスト系
EP1422566A1 (en) * 2002-11-20 2004-05-26 Shipley Company, L.L.C. Multilayer photoresist systems
US7361447B2 (en) 2003-07-30 2008-04-22 Hynix Semiconductor Inc. Photoresist polymer and photoresist composition containing the same
KR100636938B1 (ko) * 2003-09-29 2006-10-19 주식회사 하이닉스반도체 포토레지스트 조성물
JP2005314453A (ja) * 2004-04-27 2005-11-10 Sumitomo Chemical Co Ltd アクリル樹脂及び該樹脂を含有する粘着剤
KR101156973B1 (ko) * 2005-03-02 2012-06-20 주식회사 동진쎄미켐 유기 반사방지막 형성용 유기 중합체 및 이를 포함하는 유기 조성물
EP1762895B1 (en) * 2005-08-29 2016-02-24 Rohm and Haas Electronic Materials, L.L.C. Antireflective Hard Mask Compositions
KR100703007B1 (ko) 2005-11-17 2007-04-06 삼성전자주식회사 감광성 유기 반사 방지막 형성용 조성물 및 이를 이용한패턴 형성 방법
KR100871770B1 (ko) * 2007-09-12 2008-12-05 주식회사 효성 안트라세닐 벤질기 발색단을 포함하는 공중합체, 상기공중합체의 제조방법, 상기 공중합체를 포함하는유기반사방지막 조성물 및 상기 조성물을 포함하는유기반사방지막
KR100920886B1 (ko) * 2007-12-13 2009-10-09 주식회사 효성 현상 가능한 유기 반사방지막 형성용 조성물 및 이로부터형성된 유기 반사방지막
KR100952465B1 (ko) * 2007-12-18 2010-04-13 제일모직주식회사 방향족 (메타)아크릴레이트 화합물 및 감광성 고분자, 및레지스트 조성물
KR101585992B1 (ko) * 2007-12-20 2016-01-19 삼성전자주식회사 반사방지 코팅용 고분자, 반사방지 코팅용 조성물 및 이를 이용한 반도체 장치의 패턴 형성 방법
KR100975913B1 (ko) * 2008-10-31 2010-08-13 한국전자통신연구원 유기 박막 트랜지스터용 조성물, 이를 이용하여 형성된 유기 박막 트랜지스터 및 그 형성방법
CN105732883B (zh) * 2016-03-01 2018-07-03 中国科学技术大学 一种发射室温磷光的水性聚丙烯酸酯的制备方法

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Also Published As

Publication number Publication date
JP2001098024A (ja) 2001-04-10
ITTO991099A0 (it) 1999-12-15
US6368768B1 (en) 2002-04-09
DE19964382B4 (de) 2008-08-14
FR2793254A1 (fr) 2000-11-10
ITTO991099A1 (it) 2001-06-15
US20020132183A1 (en) 2002-09-19
NL1014997C2 (nl) 2001-06-26
GB9927833D0 (en) 2000-01-26
KR100395904B1 (ko) 2003-08-27
DE19962784A1 (de) 2000-10-26
IT1308674B1 (it) 2002-01-09
FR2792633A1 (fr) 2000-10-27
FR2793254B1 (fr) 2006-09-22
GB2349148B (en) 2004-08-04
FR2793244A1 (fr) 2000-11-10
GB2349148A (en) 2000-10-25
TW546318B (en) 2003-08-11
FR2793255B1 (fr) 2006-09-22
NL1014997A1 (nl) 2000-10-24
FR2792633B1 (fr) 2007-06-08
CN1271720A (zh) 2000-11-01
FR2793255A1 (fr) 2000-11-10
JP3851476B2 (ja) 2006-11-29
KR20000067184A (ko) 2000-11-15

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