CN1214054C - 微刻用组合物 - Google Patents

微刻用组合物 Download PDF

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Publication number
CN1214054C
CN1214054C CNB01817583XA CN01817583A CN1214054C CN 1214054 C CN1214054 C CN 1214054C CN B01817583X A CNB01817583X A CN B01817583XA CN 01817583 A CN01817583 A CN 01817583A CN 1214054 C CN1214054 C CN 1214054C
Authority
CN
China
Prior art keywords
fluoropolymer
contain
alkyl
carbon atom
photoetching compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB01817583XA
Other languages
English (en)
Chinese (zh)
Other versions
CN1484659A (zh
Inventor
L·L·博格
M·K·克劳福德
J·费尔德曼
L·K·约翰逊
F·L·沙德特三世
F·C·小祖姆斯特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN1484659A publication Critical patent/CN1484659A/zh
Application granted granted Critical
Publication of CN1214054C publication Critical patent/CN1214054C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
CNB01817583XA 2000-10-18 2001-10-16 微刻用组合物 Expired - Fee Related CN1214054C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69128000A 2000-10-18 2000-10-18
US09/691,280 2000-10-18

Publications (2)

Publication Number Publication Date
CN1484659A CN1484659A (zh) 2004-03-24
CN1214054C true CN1214054C (zh) 2005-08-10

Family

ID=24775897

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB01817583XA Expired - Fee Related CN1214054C (zh) 2000-10-18 2001-10-16 微刻用组合物

Country Status (7)

Country Link
EP (1) EP1326903A2 (enExample)
JP (1) JP2004512396A (enExample)
KR (1) KR20040004403A (enExample)
CN (1) CN1214054C (enExample)
AU (1) AU2002232383A1 (enExample)
TW (1) TW569079B (enExample)
WO (1) WO2002033489A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030130452A1 (en) * 2001-10-12 2003-07-10 Johnson Lynda Kaye Copolymers of ethylene with various norbornene derivatives
AU2003213568A1 (en) 2002-03-01 2003-09-16 E.I. Du Pont De Nemours And Company Fluorinated copolymers for microlithography
TWI307819B (en) 2002-05-28 2009-03-21 Arch Spec Chem Inc Acetal protected polymers and photoresist compositions thereof
AU2003259727A1 (en) * 2002-08-09 2004-02-25 E. I. Du Pont De Nemours And Company Photoresists, fluorinated polymers and processes for 157 nm microlithography
JP2007525543A (ja) 2003-02-20 2007-09-06 プロメラス， エルエルシー フォトレジスト組成物のための溶解速度調整剤
JP4377174B2 (ja) 2003-07-25 2009-12-02 富士フイルム株式会社 ポジ型レジスト組成物
US9920140B2 (en) 2013-12-20 2018-03-20 Basf Coatings Gmbh Aqueous primary dispersions, process of their production and use thereof
CN106444281A (zh) * 2016-09-22 2017-02-22 京东方科技集团股份有限公司 一种光刻胶及刻蚀方法
JP6986986B2 (ja) * 2018-01-30 2021-12-22 三井化学株式会社 フッ素含有環状オレフィン系共重合体および成形体
JP2024128554A (ja) * 2023-03-10 2024-09-24 ポリプラスチックス株式会社 フッ素含有環状オレフィン（共）重合体及びその製造方法
CN117756987B (zh) * 2023-12-27 2025-01-24 福建泓光半导体材料有限公司 一种丙烯酸酯光刻胶成膜树脂和ArF光刻胶及其制备方法与应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000017712A1 (en) * 1998-09-23 2000-03-30 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography

Also Published As

Publication number Publication date
EP1326903A2 (en) 2003-07-16
JP2004512396A (ja) 2004-04-22
CN1484659A (zh) 2004-03-24
AU2002232383A1 (en) 2002-04-29
WO2002033489A3 (en) 2002-11-21
WO2002033489A2 (en) 2002-04-25
TW569079B (en) 2004-01-01
KR20040004403A (ko) 2004-01-13

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