WO2002033489A3 - Compositions for microlithography - Google Patents

Compositions for microlithography Download PDF

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Publication number
WO2002033489A3
WO2002033489A3 PCT/US2001/042743 US0142743W WO0233489A3 WO 2002033489 A3 WO2002033489 A3 WO 2002033489A3 US 0142743 W US0142743 W US 0142743W WO 0233489 A3 WO0233489 A3 WO 0233489A3
Authority
WO
WIPO (PCT)
Prior art keywords
fluorine
group
integer ranging
microlithography
olefins
Prior art date
Application number
PCT/US2001/042743
Other languages
French (fr)
Other versions
WO2002033489A2 (en
Inventor
Larry L Berger
Michael Karl Crawford
Jerald Feldman
Lynda Kaye Johnson
Iii Frank L Schadt
Jr Fredrick Claus Zumsteg
Original Assignee
Du Pont
Larry L Berger
Michael Karl Crawford
Jerald Feldman
Lynda Kaye Johnson
Iii Frank L Schadt
Jr Fredrick Claus Zumsteg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont, Larry L Berger, Michael Karl Crawford, Jerald Feldman, Lynda Kaye Johnson, Iii Frank L Schadt, Jr Fredrick Claus Zumsteg filed Critical Du Pont
Priority to EP01987900A priority Critical patent/EP1326903A2/en
Priority to US10/380,922 priority patent/US6974657B2/en
Priority to AU2002232383A priority patent/AU2002232383A1/en
Priority to KR10-2003-7005196A priority patent/KR20040004403A/en
Priority to JP2002536611A priority patent/JP2004512396A/en
Publication of WO2002033489A2 publication Critical patent/WO2002033489A2/en
Publication of WO2002033489A3 publication Critical patent/WO2002033489A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1'-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: -C(Rf)(Rf')Orb wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is an integer ranging from 2 to about 10 and Rb is a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm-1 at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.
PCT/US2001/042743 2000-10-18 2001-10-16 Compositions for microlithography WO2002033489A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP01987900A EP1326903A2 (en) 2000-10-18 2001-10-16 Compositions for microlithography
US10/380,922 US6974657B2 (en) 2000-10-18 2001-10-16 Compositions for microlithography
AU2002232383A AU2002232383A1 (en) 2000-10-18 2001-10-16 Compositions for microlithography
KR10-2003-7005196A KR20040004403A (en) 2000-10-18 2001-10-16 Compositions for microlithography
JP2002536611A JP2004512396A (en) 2000-10-18 2001-10-16 Composition for microlithography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69128000A 2000-10-18 2000-10-18
US09/691,280 2000-10-18

Publications (2)

Publication Number Publication Date
WO2002033489A2 WO2002033489A2 (en) 2002-04-25
WO2002033489A3 true WO2002033489A3 (en) 2002-11-21

Family

ID=24775897

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/042743 WO2002033489A2 (en) 2000-10-18 2001-10-16 Compositions for microlithography

Country Status (7)

Country Link
EP (1) EP1326903A2 (en)
JP (1) JP2004512396A (en)
KR (1) KR20040004403A (en)
CN (1) CN1214054C (en)
AU (1) AU2002232383A1 (en)
TW (1) TW569079B (en)
WO (1) WO2002033489A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6830870B2 (en) 2002-05-28 2004-12-14 Arch Speciality Chemicals, Inc. Acetal protected polymers and photoresists compositions thereof

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030130452A1 (en) * 2001-10-12 2003-07-10 Johnson Lynda Kaye Copolymers of ethylene with various norbornene derivatives
CN1639640A (en) * 2002-03-01 2005-07-13 E·I·内穆尔杜邦公司 Fluorinated copolymers for microlithography
US7264914B2 (en) * 2002-08-09 2007-09-04 E. I. Du Pont De Nemours And Company Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography
JP2007525543A (en) 2003-02-20 2007-09-06 プロメラス， エルエルシー Dissolution rate modifier for photoresist compositions
JP4377174B2 (en) 2003-07-25 2009-12-02 富士フイルム株式会社 Positive resist composition
JP6419212B2 (en) 2013-12-20 2018-11-07 ビーエイエスエフ・コーティングス・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢＡＳＦ Ｃｏａｔｉｎｇｓ ＧｍｂＨ Aqueous primary dispersion, process for its production and use thereof
CN106444281A (en) * 2016-09-22 2017-02-22 京东方科技集团股份有限公司 Photoresist and etching method
JP6986986B2 (en) * 2018-01-30 2021-12-22 三井化学株式会社 Fluorine-containing cyclic olefin-based copolymers and molded products

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000017712A1 (en) * 1998-09-23 2000-03-30 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000017712A1 (en) * 1998-09-23 2000-03-30 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
K. PATTERSON ET AL.: "Polymers for 157 nm Photoresist Applications: A Progress Report", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, vol. 3999, no. 1, March 2000 (2000-03-01), USA, pages 365 - 374, XP002211109 *
M.H. SOMERVELL ET AL.: "Using Alicyclic Polymers in Top Surface Imaging Systems to Reduce Line Edge Roughness", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, vol. 3999, no. 1, March 2000 (2000-03-01), USA, pages 270 - 282, XP002211110 *
R.R. KUNZ ET AL.: "Outlook for 157-nm resist design", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, vol. 3678, no. 1, March 1999 (1999-03-01), USA, pages 13 - 23, XP002211108 *
S. CHO ET AL.: "Negative Tone 193 nm resists", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, vol. 3999, no. 1, March 2000 (2000-03-01), USA, pages 62 - 72, XP002209052 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6830870B2 (en) 2002-05-28 2004-12-14 Arch Speciality Chemicals, Inc. Acetal protected polymers and photoresists compositions thereof

Also Published As

Publication number Publication date
TW569079B (en) 2004-01-01
JP2004512396A (en) 2004-04-22
CN1214054C (en) 2005-08-10
KR20040004403A (en) 2004-01-13
AU2002232383A1 (en) 2002-04-29
CN1484659A (en) 2004-03-24
EP1326903A2 (en) 2003-07-16
WO2002033489A2 (en) 2002-04-25

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