CN118661134A - 防护膜组件、曝光原版和曝光装置以及防护膜组件的制作方法和掩模用粘着剂层的试验方法 - Google Patents

防护膜组件、曝光原版和曝光装置以及防护膜组件的制作方法和掩模用粘着剂层的试验方法 Download PDF

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Publication number
CN118661134A
CN118661134A CN202380020095.0A CN202380020095A CN118661134A CN 118661134 A CN118661134 A CN 118661134A CN 202380020095 A CN202380020095 A CN 202380020095A CN 118661134 A CN118661134 A CN 118661134A
Authority
CN
China
Prior art keywords
adhesive layer
mask
pellicle
residual
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380020095.0A
Other languages
English (en)
Chinese (zh)
Inventor
吉村裕
柿原惠一
田中亮
丸山裕司
东昌嗣
山内理计
田中友和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of CN118661134A publication Critical patent/CN118661134A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/062—Copolymers with monomers not covered by C09J133/06
    • C09J133/066—Copolymers with monomers not covered by C09J133/06 containing -OH groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CN202380020095.0A 2022-02-04 2023-01-26 防护膜组件、曝光原版和曝光装置以及防护膜组件的制作方法和掩模用粘着剂层的试验方法 Pending CN118661134A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022-016697 2022-02-04
JP2022016697 2022-02-04
PCT/JP2023/002458 WO2023149343A1 (ja) 2022-02-04 2023-01-26 ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法

Publications (1)

Publication Number Publication Date
CN118661134A true CN118661134A (zh) 2024-09-17

Family

ID=87552282

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380020095.0A Pending CN118661134A (zh) 2022-02-04 2023-01-26 防护膜组件、曝光原版和曝光装置以及防护膜组件的制作方法和掩模用粘着剂层的试验方法

Country Status (6)

Country Link
US (1) US20250093767A1 (https=)
JP (1) JP7673258B2 (https=)
KR (1) KR20240132343A (https=)
CN (1) CN118661134A (https=)
TW (1) TWI870772B (https=)
WO (1) WO2023149343A1 (https=)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007156397A (ja) * 2005-05-09 2007-06-21 Mitsui Chemicals Inc 汚染の少ないペリクル及びその製造方法
JP2010210974A (ja) * 2009-03-11 2010-09-24 Shin-Etsu Chemical Co Ltd ペリクルの製造方法及びペリクル
JP6105188B2 (ja) * 2009-11-18 2017-03-29 旭化成株式会社 ペリクル
CN102971673B (zh) * 2010-07-09 2015-10-07 三井化学株式会社 防护膜组件及用于防护膜组件的掩模粘接剂
KR101514591B1 (ko) * 2011-05-18 2015-04-22 아사히 가세이 이-매터리얼즈 가부시키가이샤 펠리클, 펠리클용 점착제, 펠리클 부착 포토마스크 및 반도체 소자의 제조 방법
KR101821239B1 (ko) * 2015-09-04 2018-01-24 주식회사 이오테크닉스 접착제 제거장치 및 방법
JP2017090719A (ja) 2015-11-11 2017-05-25 旭化成株式会社 ペリクル
KR102446173B1 (ko) * 2018-06-26 2022-09-22 삼성전자주식회사 펠리클용 접착제, 포토 마스크용 펠리클 및 그 제조 방법
TWI740799B (zh) * 2019-04-16 2021-09-21 日商信越化學工業股份有限公司 附有黏著劑層的防塵薄膜框架、防塵薄膜組件、附有防塵薄膜組件的曝光原版、曝光方法、半導體裝置的製造方法、及液晶顯示板的製造方法
US11454881B2 (en) * 2019-07-31 2022-09-27 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle design for mask application
US20210185793A1 (en) * 2019-12-13 2021-06-17 Applied Materials, Inc. Adhesive material removal from photomask in ultraviolet lithography application
JP2020160466A (ja) * 2020-06-12 2020-10-01 旭化成株式会社 ペリクル

Also Published As

Publication number Publication date
JPWO2023149343A1 (https=) 2023-08-10
US20250093767A1 (en) 2025-03-20
KR20240132343A (ko) 2024-09-03
TWI870772B (zh) 2025-01-21
TW202340853A (zh) 2023-10-16
JP7673258B2 (ja) 2025-05-08
WO2023149343A1 (ja) 2023-08-10

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