CN117461109A - 等离子体源及包含该等离子体源的原子钟 - Google Patents

等离子体源及包含该等离子体源的原子钟 Download PDF

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Publication number
CN117461109A
CN117461109A CN202280041517.8A CN202280041517A CN117461109A CN 117461109 A CN117461109 A CN 117461109A CN 202280041517 A CN202280041517 A CN 202280041517A CN 117461109 A CN117461109 A CN 117461109A
Authority
CN
China
Prior art keywords
magnet
magnetic pole
electrode
magnetic field
plasma source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280041517.8A
Other languages
English (en)
Chinese (zh)
Inventor
仓岛优一
本村大成
柳町真也
高木秀树
日暮荣治
松前贵司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute of Advanced Industrial Science and Technology AIST filed Critical National Institute of Advanced Industrial Science and Technology AIST
Publication of CN117461109A publication Critical patent/CN117461109A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/10—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball
    • G—PHYSICS
    • G04—HOROLOGY
    • G04F—TIME-INTERVAL MEASURING
    • G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
    • G04F5/14—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
    • H03L7/00—Automatic control of frequency or phase; Synchronisation
    • H03L7/26—Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
CN202280041517.8A 2021-06-14 2022-03-24 等离子体源及包含该等离子体源的原子钟 Pending CN117461109A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021098407 2021-06-14
JP2021-098407 2021-06-14
PCT/JP2022/013803 WO2022264603A1 (ja) 2021-06-14 2022-03-24 プラズマ源及び当該プラズマ源を用いた原子時計

Publications (1)

Publication Number Publication Date
CN117461109A true CN117461109A (zh) 2024-01-26

Family

ID=84527060

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280041517.8A Pending CN117461109A (zh) 2021-06-14 2022-03-24 等离子体源及包含该等离子体源的原子钟

Country Status (5)

Country Link
US (1) US12389520B2 (https=)
EP (1) EP4357860A4 (https=)
JP (1) JP7544415B2 (https=)
CN (1) CN117461109A (https=)
WO (1) WO2022264603A1 (https=)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2643149B2 (ja) 1987-06-03 1997-08-20 株式会社ブリヂストン 表面処理方法
JPH0592953U (ja) 1992-05-13 1993-12-17 日本電子株式会社 スパッタイオンポンプ
US6835048B2 (en) 2002-12-18 2004-12-28 Varian, Inc. Ion pump having secondary magnetic field
GB0608582D0 (en) * 2006-05-02 2006-06-07 Univ Sheffield Hallam High power impulse magnetron sputtering vapour deposition
KR100782579B1 (ko) 2006-09-26 2007-12-06 가부시키가이샤 나노빔 Ｅｃｒ 이온소스
US8723113B2 (en) 2008-05-30 2014-05-13 The State of Oregon Acting by and through the State Board of Higher Education of behalf of Oregon State University Radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers
JP2009303065A (ja) 2008-06-16 2009-12-24 Panasonic Corp 通過帯域可変高周波フィルタとその製造方法、及び通信機器
JP2011003425A (ja) 2009-06-19 2011-01-06 Jeol Ltd イオンポンプ
DE102011007828A1 (de) 2011-04-21 2012-04-19 Carl Zeiss Smt Gmbh Füllgase mit optischer Wirkung für EUV-Lithographieanlagen
EP2729955B1 (en) * 2011-07-15 2018-12-19 IHI Hauzer Techno Coating B.V. Apparatus and method for the pretreatment and/or for the coating of an article in a vacuum chamber with a hipims power source
RU2636389C2 (ru) 2013-02-06 2017-11-23 Арселормитталь Инвестигасион И Десаррольо Сл Источник плазмы
CH707685A1 (de) 2013-03-06 2014-09-15 Inficon Gmbh Ionisations-Vakuummesszelle mit Abschirmvorrichtung.
JP6327974B2 (ja) 2014-06-30 2018-05-23 国立研究開発法人情報通信研究機構 積層型超高真空作成装置
JP7114399B2 (ja) 2018-08-13 2022-08-08 株式会社アルバック 成膜装置及び成膜方法

Also Published As

Publication number Publication date
JPWO2022264603A1 (https=) 2022-12-22
US12389520B2 (en) 2025-08-12
JP7544415B2 (ja) 2024-09-03
EP4357860A1 (en) 2024-04-24
WO2022264603A1 (ja) 2022-12-22
US20240276626A1 (en) 2024-08-15
EP4357860A4 (en) 2025-06-18

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