JPWO2022264603A1 - - Google Patents
Info
- Publication number
- JPWO2022264603A1 JPWO2022264603A1 JP2023529588A JP2023529588A JPWO2022264603A1 JP WO2022264603 A1 JPWO2022264603 A1 JP WO2022264603A1 JP 2023529588 A JP2023529588 A JP 2023529588A JP 2023529588 A JP2023529588 A JP 2023529588A JP WO2022264603 A1 JPWO2022264603 A1 JP WO2022264603A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/10—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball
-
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
- G04F5/14—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
- H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
- H03L7/00—Automatic control of frequency or phase; Synchronisation
- H03L7/26—Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021098407 | 2021-06-14 | ||
| JP2021098407 | 2021-06-14 | ||
| PCT/JP2022/013803 WO2022264603A1 (ja) | 2021-06-14 | 2022-03-24 | プラズマ源及び当該プラズマ源を用いた原子時計 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022264603A1 true JPWO2022264603A1 (https=) | 2022-12-22 |
| JP7544415B2 JP7544415B2 (ja) | 2024-09-03 |
Family
ID=84527060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023529588A Active JP7544415B2 (ja) | 2021-06-14 | 2022-03-24 | プラズマ源及び当該プラズマ源を用いた原子時計 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12389520B2 (https=) |
| EP (1) | EP4357860A4 (https=) |
| JP (1) | JP7544415B2 (https=) |
| CN (1) | CN117461109A (https=) |
| WO (1) | WO2022264603A1 (https=) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0592953U (ja) * | 1992-05-13 | 1993-12-17 | 日本電子株式会社 | スパッタイオンポンプ |
| JP2006511921A (ja) * | 2002-12-18 | 2006-04-06 | バリアン・インコーポレイテッド | スパッタイオンポンプ用磁石アセンブリ |
| JP2011003425A (ja) * | 2009-06-19 | 2011-01-06 | Jeol Ltd | イオンポンプ |
| US20110233397A1 (en) * | 2008-05-30 | 2011-09-29 | Barofsky Douglas F | Radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers |
| JP2016012501A (ja) * | 2014-06-30 | 2016-01-21 | 国立研究開発法人情報通信研究機構 | 積層型超高真空作成装置 |
| JP2016513787A (ja) * | 2013-03-06 | 2016-05-16 | インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング | 電離真空測定セル |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2643149B2 (ja) | 1987-06-03 | 1997-08-20 | 株式会社ブリヂストン | 表面処理方法 |
| GB0608582D0 (en) * | 2006-05-02 | 2006-06-07 | Univ Sheffield Hallam | High power impulse magnetron sputtering vapour deposition |
| KR100782579B1 (ko) | 2006-09-26 | 2007-12-06 | 가부시키가이샤 나노빔 | Ｅｃｒ 이온소스 |
| JP2009303065A (ja) | 2008-06-16 | 2009-12-24 | Panasonic Corp | 通過帯域可変高周波フィルタとその製造方法、及び通信機器 |
| DE102011007828A1 (de) | 2011-04-21 | 2012-04-19 | Carl Zeiss Smt Gmbh | Füllgase mit optischer Wirkung für EUV-Lithographieanlagen |
| EP2729955B1 (en) * | 2011-07-15 | 2018-12-19 | IHI Hauzer Techno Coating B.V. | Apparatus and method for the pretreatment and/or for the coating of an article in a vacuum chamber with a hipims power source |
| RU2636389C2 (ru) | 2013-02-06 | 2017-11-23 | Арселормитталь Инвестигасион И Десаррольо Сл | Источник плазмы |
| JP7114399B2 (ja) | 2018-08-13 | 2022-08-08 | 株式会社アルバック | 成膜装置及び成膜方法 |
-
2022
- 2022-03-24 US US18/568,770 patent/US12389520B2/en active Active
- 2022-03-24 EP EP22824599.9A patent/EP4357860A4/en active Pending
- 2022-03-24 CN CN202280041517.8A patent/CN117461109A/zh active Pending
- 2022-03-24 JP JP2023529588A patent/JP7544415B2/ja active Active
- 2022-03-24 WO PCT/JP2022/013803 patent/WO2022264603A1/ja not_active Ceased
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0592953U (ja) * | 1992-05-13 | 1993-12-17 | 日本電子株式会社 | スパッタイオンポンプ |
| JP2006511921A (ja) * | 2002-12-18 | 2006-04-06 | バリアン・インコーポレイテッド | スパッタイオンポンプ用磁石アセンブリ |
| US20110233397A1 (en) * | 2008-05-30 | 2011-09-29 | Barofsky Douglas F | Radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers |
| JP2011003425A (ja) * | 2009-06-19 | 2011-01-06 | Jeol Ltd | イオンポンプ |
| JP2016513787A (ja) * | 2013-03-06 | 2016-05-16 | インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング | 電離真空測定セル |
| JP2016012501A (ja) * | 2014-06-30 | 2016-01-21 | 国立研究開発法人情報通信研究機構 | 積層型超高真空作成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US12389520B2 (en) | 2025-08-12 |
| JP7544415B2 (ja) | 2024-09-03 |
| CN117461109A (zh) | 2024-01-26 |
| EP4357860A1 (en) | 2024-04-24 |
| WO2022264603A1 (ja) | 2022-12-22 |
| US20240276626A1 (en) | 2024-08-15 |
| EP4357860A4 (en) | 2025-06-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231214 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240806 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240815 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7544415 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |