JP7544415B2 - プラズマ源及び当該プラズマ源を用いた原子時計 - Google Patents

プラズマ源及び当該プラズマ源を用いた原子時計 Download PDF

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Publication number
JP7544415B2
JP7544415B2 JP2023529588A JP2023529588A JP7544415B2 JP 7544415 B2 JP7544415 B2 JP 7544415B2 JP 2023529588 A JP2023529588 A JP 2023529588A JP 2023529588 A JP2023529588 A JP 2023529588A JP 7544415 B2 JP7544415 B2 JP 7544415B2
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Prior art keywords
magnet
magnetic pole
electrode
magnetic field
plasma source
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Japanese (ja)
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JPWO2022264603A1 (https=
Inventor
優一 倉島
大成 本村
真也 柳町
秀樹 高木
栄治 日暮
貴司 松前
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National Institute of Advanced Industrial Science and Technology AIST
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National Institute of Advanced Industrial Science and Technology AIST
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/02Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/10Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball
    • GPHYSICS
    • G04HOROLOGY
    • G04FTIME-INTERVAL MEASURING
    • G04F5/00Apparatus for producing preselected time intervals for use as timing standards
    • G04F5/14Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03LAUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
    • H03L7/00Automatic control of frequency or phase; Synchronisation
    • H03L7/26Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
JP2023529588A 2021-06-14 2022-03-24 プラズマ源及び当該プラズマ源を用いた原子時計 Active JP7544415B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021098407 2021-06-14
JP2021098407 2021-06-14
PCT/JP2022/013803 WO2022264603A1 (ja) 2021-06-14 2022-03-24 プラズマ源及び当該プラズマ源を用いた原子時計

Publications (2)

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JPWO2022264603A1 JPWO2022264603A1 (https=) 2022-12-22
JP7544415B2 true JP7544415B2 (ja) 2024-09-03

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JP2023529588A Active JP7544415B2 (ja) 2021-06-14 2022-03-24 プラズマ源及び当該プラズマ源を用いた原子時計

Country Status (5)

Country Link
US (1) US12389520B2 (https=)
EP (1) EP4357860A4 (https=)
JP (1) JP7544415B2 (https=)
CN (1) CN117461109A (https=)
WO (1) WO2022264603A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006511921A (ja) 2002-12-18 2006-04-06 バリアン・インコーポレイテッド スパッタイオンポンプ用磁石アセンブリ
JP2011003425A (ja) 2009-06-19 2011-01-06 Jeol Ltd イオンポンプ
US20110233397A1 (en) 2008-05-30 2011-09-29 Barofsky Douglas F Radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers
JP2016513787A (ja) 2013-03-06 2016-05-16 インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング 電離真空測定セル

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2643149B2 (ja) 1987-06-03 1997-08-20 株式会社ブリヂストン 表面処理方法
JPH0592953U (ja) 1992-05-13 1993-12-17 日本電子株式会社 スパッタイオンポンプ
GB0608582D0 (en) * 2006-05-02 2006-06-07 Univ Sheffield Hallam High power impulse magnetron sputtering vapour deposition
KR100782579B1 (ko) 2006-09-26 2007-12-06 가부시키가이샤 나노빔 Ecr 이온소스
JP2009303065A (ja) 2008-06-16 2009-12-24 Panasonic Corp 通過帯域可変高周波フィルタとその製造方法、及び通信機器
DE102011007828A1 (de) 2011-04-21 2012-04-19 Carl Zeiss Smt Gmbh Füllgase mit optischer Wirkung für EUV-Lithographieanlagen
EP2729955B1 (en) * 2011-07-15 2018-12-19 IHI Hauzer Techno Coating B.V. Apparatus and method for the pretreatment and/or for the coating of an article in a vacuum chamber with a hipims power source
RU2636389C2 (ru) 2013-02-06 2017-11-23 Арселормитталь Инвестигасион И Десаррольо Сл Источник плазмы
JP6327974B2 (ja) 2014-06-30 2018-05-23 国立研究開発法人情報通信研究機構 積層型超高真空作成装置
JP7114399B2 (ja) 2018-08-13 2022-08-08 株式会社アルバック 成膜装置及び成膜方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006511921A (ja) 2002-12-18 2006-04-06 バリアン・インコーポレイテッド スパッタイオンポンプ用磁石アセンブリ
US20110233397A1 (en) 2008-05-30 2011-09-29 Barofsky Douglas F Radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers
JP2011003425A (ja) 2009-06-19 2011-01-06 Jeol Ltd イオンポンプ
JP2016513787A (ja) 2013-03-06 2016-05-16 インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング 電離真空測定セル

Also Published As

Publication number Publication date
JPWO2022264603A1 (https=) 2022-12-22
US12389520B2 (en) 2025-08-12
CN117461109A (zh) 2024-01-26
EP4357860A1 (en) 2024-04-24
WO2022264603A1 (ja) 2022-12-22
US20240276626A1 (en) 2024-08-15
EP4357860A4 (en) 2025-06-18

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